TWI277438B - Method and system for parallel separation of oxygen gas and nitrogen gas - Google Patents
Method and system for parallel separation of oxygen gas and nitrogen gas Download PDFInfo
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- TWI277438B TWI277438B TW094126529A TW94126529A TWI277438B TW I277438 B TWI277438 B TW I277438B TW 094126529 A TW094126529 A TW 094126529A TW 94126529 A TW94126529 A TW 94126529A TW I277438 B TWI277438 B TW I277438B
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- gas
- oxygen
- nitrogen
- membrane
- separation
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- 238000000926 separation method Methods 0.000 title claims abstract description 266
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 226
- 238000000034 method Methods 0.000 title claims abstract description 67
- 229910001873 dinitrogen Inorganic materials 0.000 title claims abstract description 10
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 title abstract description 3
- 229910001882 dioxygen Inorganic materials 0.000 title abstract description 3
- 239000007789 gas Substances 0.000 claims abstract description 521
- 239000001301 oxygen Substances 0.000 claims abstract description 235
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 235
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 233
- 239000012528 membrane Substances 0.000 claims abstract description 183
- 238000001179 sorption measurement Methods 0.000 claims abstract description 123
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 109
- 239000003463 adsorbent Substances 0.000 claims abstract description 29
- 238000007872 degassing Methods 0.000 claims description 47
- 239000012466 permeate Substances 0.000 claims description 47
- 230000006837 decompression Effects 0.000 claims description 15
- 230000009467 reduction Effects 0.000 claims description 9
- 238000007906 compression Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000002699 waste material Substances 0.000 claims description 3
- 206010036790 Productive cough Diseases 0.000 claims description 2
- 210000003802 sputum Anatomy 0.000 claims description 2
- 208000024794 sputum Diseases 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 1
- 210000003127 knee Anatomy 0.000 claims 1
- 239000002594 sorbent Substances 0.000 claims 1
- 238000003795 desorption Methods 0.000 abstract description 21
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 abstract description 14
- 230000008569 process Effects 0.000 description 49
- 238000003860 storage Methods 0.000 description 21
- 238000010494 dissociation reaction Methods 0.000 description 12
- 230000005593 dissociations Effects 0.000 description 12
- 239000008267 milk Substances 0.000 description 12
- 210000004080 milk Anatomy 0.000 description 12
- 235000013336 milk Nutrition 0.000 description 12
- 230000008859 change Effects 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 239000002994 raw material Substances 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000004913 activation Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 241001674044 Blattodea Species 0.000 description 3
- 238000005202 decontamination Methods 0.000 description 3
- 230000003588 decontaminative effect Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 241000282414 Homo sapiens Species 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 208000003251 Pruritus Diseases 0.000 description 1
- 241000239226 Scorpiones Species 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- URBPUTJAZQFYSR-UHFFFAOYSA-N [He].[N].[O] Chemical compound [He].[N].[O] URBPUTJAZQFYSR-UHFFFAOYSA-N 0.000 description 1
- KFVPJMZRRXCXAO-UHFFFAOYSA-N [He].[O] Chemical compound [He].[O] KFVPJMZRRXCXAO-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 210000003423 ankle Anatomy 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000000739 chaotic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002894 chemical waste Substances 0.000 description 1
- 210000001268 chyle Anatomy 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- JYIMWRSJCRRYNK-UHFFFAOYSA-N dialuminum;disodium;oxygen(2-);silicon(4+);hydrate Chemical compound O.[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Na+].[Na+].[Al+3].[Al+3].[Si+4] JYIMWRSJCRRYNK-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003204 osmotic effect Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-O oxonium Chemical compound [OH3+] XLYOFNOQVPJJNP-UHFFFAOYSA-O 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000010412 perfusion Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000009628 steelmaking Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/04—Purification or separation of nitrogen
- C01B21/0405—Purification or separation processes
- C01B21/0433—Physical processing only
- C01B21/0438—Physical processing only by making use of membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/047—Pressure swing adsorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/229—Integrated processes (Diffusion and at least one other process, e.g. adsorption, absorption)
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/02—Preparation of oxygen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/02—Preparation of oxygen
- C01B13/0229—Purification or separation processes
- C01B13/0248—Physical processing only
- C01B13/0251—Physical processing only by making use of membranes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/02—Preparation of oxygen
- C01B13/0229—Purification or separation processes
- C01B13/0248—Physical processing only
- C01B13/0259—Physical processing only by adsorption on solids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/04—Purification or separation of nitrogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/04—Purification or separation of nitrogen
- C01B21/0405—Purification or separation processes
- C01B21/0433—Physical processing only
- C01B21/045—Physical processing only by adsorption in solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/10—Nitrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/12—Oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/10—Single element gases other than halogens
- B01D2257/102—Nitrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/40001—Methods relating to additional, e.g. intermediate, treatment of process gas
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/0046—Nitrogen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Separation Of Gases By Adsorption (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
1277438 九、發明說明： 【發明所屬之技術領域】 田包括氧及氮之混合氣， 例如空氣）來併行及分離氧 a l乳及虱氧之方法及系統 【先前技術】 由空氣所分離得到之氧畜 , 虱虱及虱氣係利用在各種用 途上。氧氡係利用在例如垃圾 敬熔嘁爐或灰熔融爐、破璃 熔融爐之高温化、煉鋼用電爐之燃燒效率之提升、在化 學工廠之氧化反應、廢水處理裳置之氧曝氣等。另一方 面，氮氣係利用在例如垃圾炫融爐或者是化學工廢之氣 體密封或清除、熱處理爐之氣氛氣體之調整、食品之包 裝用氣體密封等。 作為用以由空氣來分離氧氣或氮氣之一種實用方 法係知道有壓力變動吸附法（PSA法）。在藉由psa法 所造成之氣體分離，將包括填充用以優先地吸附既定成 分之吸附劑之吸附塔之PSA氣體分離裝置予以使用，在 及附i合，至少執行吸附製程及脫合製程。在吸附製程， 在吸附塔，導入混合氣體，在高溫條件下，使得該混合 氣體中之易吸附成分，吸附於吸附劑，由吸附塔，來導 出由難吸附成分所構成之氣體。在脫合製程，降低塔内 壓力’由吸附劑，來脫合易吸附成分，由吸附塔，來導 出主要包括該易吸附成分之氣體。例如在使用能夠比起 氧還更加優先地吸附氮之吸附劑並且導入空氣至吸附 2215-7315-PF 5 1277438 吟采作為混 '-—-— 叫芍難 吸附成分而導出至塔外，氮係成為易吸附成分而 钿 &夂附 I裎，吸附於吸附劑，並且，在脫合製程，導出至塔外 在PSA法，比起在脫合製程來進行減壓脫合而導出 至i合外之易吸附成分氣體，在吸附製程來通過吸附塔之 難吸附成分氣體係就氣體濃度或氣體量而言，變得比較 穩定。因此，在PSA法，比起取得目的之氣體成為易= 附成分氣體者，則取得目的之氣體成為難吸附成分氣體 者係比較容易效率良好地取得該目的氣體。因此，在= 由PSA法而由空氣來分離及取得氧之時，一般係在使用^ 之PSA氣體分離裝置之吸附塔’填充氮吸附性之吸附 劑，在該吸附製程由該吸附塔所導出之氧富化氣體係成 為製品氣體而進行回收。此外，在藉自m法而由空氣 來分離及取得氮之時，—般係氧吸附性之吸附劑，填充 於吸附塔，在吸附製程由該吸附塔所導出之氮富化氣體 係成為製品氣體而進行回收。 士但是’有必須分離及取得空氣中之氧而進行利用同 %分離及取得空廣φ 仓/ 中之1而進行制之狀態發生，在該 狀怨下，要求能夠義山抑 々么^ hw 早糸統而呈併行地分離及取 侍匕括於二氣中之氧及氮之技術。 圖係表不成為用以呈併行地分離空氣中 氮之習知系統之草—η工々#〆 π之氧及 氧· ^〜 例子之乳•氣併行分離系統Χ5。 氮开仃为離系统Χ5係包括:pSA氣 膜式氣體分離琴m 0Π *展置81、 雕盗82、儲存槽83、壓縮機8卜85和真空1277438 IX. Description of the invention: [Technical field to which the invention pertains] Field method and system for parallel and separation of oxygen a milk and helium oxygen including a mixture of oxygen and nitrogen, such as air [Prior Art] Oxygen separated by air Animals, cockroaches and cockroaches are used in a variety of applications. The oxonium system utilizes, for example, a high temperature of a garbage melting furnace, an ash melting furnace, a glass melting furnace, an increase in combustion efficiency of an electric furnace for steelmaking, an oxidation reaction in a chemical plant, and an oxygen aeration in a wastewater treatment plant. . On the other hand, the nitrogen gas is used for gas sealing or cleaning in a garbage smelting furnace or a chemical waste, an atmosphere gas adjustment in a heat treatment furnace, and a gas sealing for food packaging. As a practical method for separating oxygen or nitrogen from air, a pressure fluctuation adsorption method (PSA method) is known. In the gas separation by the psa method, a PSA gas separation device including an adsorption column for adsorbing an adsorbent for preferentially adsorbing a predetermined component is used, and at least an adsorption process and a dissociation process are performed. In the adsorption process, a mixed gas is introduced into the adsorption tower, and under high temperature conditions, the easily adsorbable component of the mixed gas is adsorbed to the adsorbent, and the gas composed of the hardly adsorbed component is derived from the adsorption tower. In the dissociation process, the pressure in the column is lowered. The adsorbent is used to desorb the easily adsorbable component, and the adsorption tower is used to introduce a gas mainly comprising the easily adsorbable component. For example, in the case of using an adsorbent capable of adsorbing nitrogen more preferentially than oxygen and introducing air to the adsorption 2215-7315-PF 5 1277438, the mixture is extracted as a mixed----- It becomes an easily adsorbable component, and it is adsorbed to the adsorbent, and is discharged to the outside of the column in the PSA process in the desorption process, and is dehydrated and decoupled in the decoupling process. The easily adsorbable component gas is relatively stable in terms of gas concentration or gas amount in the adsorption process by the adsorption tower. Therefore, in the PSA method, it is easier to efficiently obtain the target gas than the gas to be used as the component gas. Therefore, when the air is separated and taken up by the PSA method, it is generally filled with a nitrogen-adsorbing adsorbent using an adsorption column of a PSA gas separation device, and the adsorption process is derived from the adsorption tower. The oxygen-rich gas system is recovered as a product gas. In addition, when the nitrogen is separated and obtained by the m method, the oxygen-adsorbing adsorbent is filled in the adsorption tower, and the nitrogen-rich gas system derived from the adsorption tower in the adsorption process becomes a product. The gas is recovered. However, there is a state in which it is necessary to separate and obtain oxygen in the air, and use the same % to separate and obtain the empty φ 仓 / zhongzhong1. In this grievance, it is required to be able to suppress it. ^hw SiS is a technology that separates and treats the oxygen and nitrogen contained in the two gases in parallel. The graph table does not become a conventional system for separating nitrogen in the air - η工々#〆 π Oxygen and Oxygen ^ ^ ~ Example of a milk/gas parallel separation system Χ5. Nitrogen reclamation is off-system Χ5 series including: pSA gas membrane gas separation piano m 0Π * exhibition 81, pirate 82, storage tank 83, compressor 8 850 and vacuum
2215-7315-PF 6 12774382215-7315-PF 6 1277438
幫浦86，這些係透過配管而進行連結。在配管之既定 部位’設置複數個之自動閥（省略圖示），藉由在系統 之稼動時，適當地選擇各個自動閥之開關狀態，而切換 糸統内之氣體流動狀態。p S A氣體分離裝置81係將填 充比起氧還更加優先地吸附氮之吸附劑之吸附塔（省略 圖示）予以包括。此外，膜式氣體分離器82係具有用 以優先地透過氧之氣體分離膜82a。此種氧•氮併行分 離系統係記載於例如下列之專利文獻！。 【專利文獻1】曰本特開平5 — 253438號公報 在氧•氮併行分離系統X5之稼動時，在pSA氣體 分離裝置81之吸附塔，重複地進行包括吸附製程和脫 合製程之1個循環，由空氣來分離及取得氧富化氣體。 在吸附製程，啟動壓縮機84而供應空氣至pSA氣體分 離裝置81之吸附塔，在塔内上升至既定壓力為1之I 態下’使得該空氣中之易吸附成分（主要包括氮）吸附 於吸附劑，由該吸附塔或PSA氣體分離裝置81開始， 來導出氧富化氣體。該氧富化氣體係例如連續地使用在 既定之用途。在脫合製程’在藉由真空幫浦86之啟動 而降低塔内至既定壓力為止之狀態下，由該吸附塔内之 吸附劑開始，來脫合易吸附成分（主要包括氮），殘留 於塔内之氧和該易吸附成分係—起成為脫合氣體而排 出至塔外或m氣體分離裝置81外。脫合氣體中之氧 濃度係有在脫合製程初期而變得比較高並且隨著時間 之經過而逐漸地降低之傾向發生。 7The pump 86, these are connected by piping. A plurality of automatic valves (not shown) are provided in a predetermined portion of the piping, and the gas flow state in the system is switched by appropriately selecting the switching state of each automatic valve when the system moves. The p S A gas separation device 81 is included in an adsorption tower (not shown) which is filled with an adsorbent which adsorbs nitrogen more preferentially than oxygen. Further, the membrane type gas separator 82 has a gas separation membrane 82a for preferentially permeating oxygen. Such an oxygen/nitrogen parallel separation system is described, for example, in the following patent documents! . In the adsorption tower of the pSA gas separation device 81, the adsorption tower including the adsorption process and the dissociation process is repeatedly performed in the adsorption column of the pSA gas separation device 81 in the case of the operation of the oxygen/nitrogen parallel separation system X5. The air is separated and the oxygen-rich gas is obtained. In the adsorption process, the compressor 84 is started to supply air to the adsorption tower of the pSA gas separation unit 81, and rises to a predetermined pressure of 1 in the column, so that the easily adsorbable components (mainly including nitrogen) in the air are adsorbed. The adsorbent is started by the adsorption tower or the PSA gas separation unit 81 to derive an oxygen-rich gas. The oxygen-rich gas system is used, for example, continuously for a given purpose. In the disengagement process, in the state in which the inside of the column is lowered to a predetermined pressure by the start of the vacuum pump 86, the adsorbent in the adsorption tower starts to desorb the easily adsorbable component (mainly including nitrogen), and remains in the residue. The oxygen in the column and the easily adsorbable component are discharged as a degassing gas to the outside of the column or outside the m gas separation device 81. The concentration of oxygen in the degassing gas tends to be relatively high at the beginning of the decoupling process and gradually decreases with the passage of time. 7
2215-7315-PF 1277438 來自PSA氣體分離装置81之脫合氣體之氧濃度係 經常糟由氧監視器而進行檢測，脫合製程初期之氧濃度 比較咼之脫合氣體係正如在箭號G，所示，廢棄至系統 外。接著，在脫合氣體之氧濃度降低至既定值為止之時 間點’停止該廢棄，切換成為脫合氣體回收至儲存槽 83之回收，開始進行脫合氣體之回收。此種脫合氣體 之笟棄及其後面之回收係執行於每次由氣體分離 裝置81來排出脫合氣體。 回收於儲存槽8 3之脫合氣體係藉由壓縮機8 5之啟 動而以既定之壓力，來供應至膜式氣體分離器Μ，分 離成為透過膜式氣體分離器82之氣體分離膜8“之透 匕氣體以及不透過膜式氣體分離器之氣體分離膜 82a之非透過氣體。㈤合氣冑中之氧係#先地透過氣體 ㈣膜82a，藉此而使得降低氧濃度且提高i純度之氣 田化氣體係成為非透過氣體而由膜式氣體分離器8 2來 排=。該非透過氣體係例如連續地使用在既定之用途。 在藉由氧·氮併行分灕系統χ5時，正如以上而由空氣 來刀離及取得氧富化氣體和氮富化氣體。 在氧•氮併行分離系統Χ5，假設來自psA氣體分 離裝置81之脫合氣體之全部係_旦在儲存槽⑽不進行 回收而連續地經過壓縮機85來持續地供應㈣式氣體 f離器f2時，由膜式氣體分㈣82來排出成為非透過 軋體之虱富化氣體量係經時地發生比較大之變動。由於 供應至膜式氣體分離器82之脫合氣體之氧分壓或氧濃2215-7315-PF 1277438 The oxygen concentration of the degassing gas from the PSA gas separation unit 81 is often detected by an oxygen monitor, and the oxygen concentration in the initial stage of the dissociation process is compared with that of the degassing system as in the arrow G. As shown, it is discarded outside the system. Then, the waste is stopped at the time point when the oxygen concentration of the degassing gas is lowered to a predetermined value, and the recovery of the degassed gas into the storage tank 83 is switched, and the recovery of the degassing gas is started. Disposal of such a degassing gas and subsequent recovery thereof are performed each time the degassing gas is discharged by the gas separation device 81. The degassing system recovered in the storage tank 83 is supplied to the membrane gas separator 以 at a predetermined pressure by the activation of the compressor 85, and is separated into a gas separation membrane 8 that passes through the membrane gas separator 82. The permeating gas and the non-permeating gas of the gas separation membrane 82a that does not pass through the membrane gas separator. (5) The oxygen system in the gas mixture is first permeated through the gas (four) membrane 82a, thereby reducing the oxygen concentration and improving the purity of i. The gas field gas system is non-permeate gas and is discharged by the membrane gas separator 82. The non-permeate gas system is continuously used, for example, in a predetermined application. When the system is 并行5 by the oxygen/nitrogen parallel system, as above In the oxygen/nitrogen parallel separation system Χ5, it is assumed that all of the degassing gas from the psA gas separation device 81 is not recovered in the storage tank (10). When the (four) type gas f-offer f2 is continuously supplied through the compressor 85 continuously, the amount of the rich gas which is discharged into the non-permeating rolling body by the membrane type gas (four) 82 is relatively large in time. supply Off membrane gas separator 82 of oxygen gas or an oxygen partial pressure of engagement concentrated
2215-7315-PF 1277438 又係發生比較大之變動，藉此而使得氣體分離膜82g 之氧透過之驅動力發生比較大之變動之緣故。該驅動力 之k動係發生氧之透過量或氧之非透過量相對於氣體 分離膜82a之變動，因此，發生由膜式氣體分離器82 所排出之非透過氣體（氮富化氣體）量之變動。因此， 在氧•氮併行分離系統χ5，在來自pSA氣體分離裝置 81之脫合氣體之全部係一旦在儲存槽83不進行回收而 ^續地持續供應至膜式氣體分離器82時，由於其供應 里變得不穩定，因此，發生無法適當地利用取得作為非 透過氣體之氮富化氣體來作為惰性氣體之狀態。 相對於此，在以前述之眉太+ / 、， 你 k疋原本之形悲來進行稼動之氧•氮 併打分離系統X5，藉著來自psA氣體分離裝置8ι之脫 合氣體之廢棄及回收’切換於既定之時間，而使得既定 之乳濃度區域（也就是氮濃度區域）之脫合氣體-旦回 收於儲存# 83,概略-定之氧濃度（也就是概 之氮純度）之脫合氣體，由儲存槽83開始供應 氣體分離器δ2。接著，供庫5 ^ ^ 、、 供應至膜式氣體分離器82 s氣體之氧分壓（或氧濃度）之變動小，因 量相對於氣體分離膜82a之徵命7 !丄 過 q之變動小，由膜式氣體分 82開始，以概略一定之流， - 富化氣體)。 末排出非透過氣體（氮 但是’分斷由PSA氣體分離裝置81開始 式氣體分離器82之脫合氣體之流動之切換用：：至膜 及儲存槽83係使得氮富化、、、、 構造 讀〜離取得操作成為不Further, 2215-7315-PF 1277438 is relatively large, and the driving force for oxygen permeation of the gas separation membrane 82g is relatively large. The k-actuation of the driving force causes the amount of permeation of oxygen or the amount of permeation of oxygen to be changed with respect to the gas separation membrane 82a, so that the amount of non-permeating gas (nitrogen-rich gas) discharged from the membrane type gas separator 82 occurs. Changes. Therefore, in the oxygen/nitrogen parallel separation system χ5, all of the degassing gas from the pSA gas separation device 81 is continuously supplied to the membrane gas separator 82 once it is not recovered in the storage tank 83, Since the supply becomes unstable, it is not possible to appropriately use a nitrogen-rich gas which is a non-permeating gas as an inert gas. On the other hand, in the above-mentioned eyebrows too + /, you k疋 the original shape of the sorrow to carry out the oxygen and nitrogen separation system X5, by the waste and recovery of the degassing gas from the psA gas separation device 8 Switching to a predetermined time, so that the degassing gas of the predetermined emulsion concentration region (that is, the nitrogen concentration region) is recovered in the storage gas, and the degassing gas of the oxygen concentration (that is, the nitrogen purity) is roughly determined. The gas separator δ2 is supplied from the storage tank 83. Then, the fluctuation of the oxygen partial pressure (or oxygen concentration) supplied to the membrane gas separator 82 s is small, and the amount is changed with respect to the gas separation membrane 82a. Small, starting from the membrane gas fraction 82, to a rough flow, - enriched gas). At the end, the non-permeate gas is exhausted (nitrogen is used to switch the flow of the degassing gas from the PSA gas separation device 81 to the gas separator 82: to the membrane and the storage tank 83 to make the nitrogen rich, and the structure Read ~ away from the operation becomes no
2215-7315-PF 9 1277438 連續化而導致系統之複雜化，因此，變得不理想。此外， 此種切換用線之構造及儲存槽83係導致系統之大型 化口此，變彳于不理想。此外，分斷由psa氣體分離裝 置81開始流動至膜式氣體分離器82之脫合氣體之流動 之期間越長，則儲存槽83係越加需要大容量而成為大 型化。例如在PSA氣體分離裝置81之吸附塔之3〇秒鐘 之脫合製程間，正如箭號G’所示，在將由脫合製程開 始2〇秒鐘之脫合勒期·中期所排出之脫合氣體（氧濃 度比較高、氮純度比較低）來廢棄至系統外而將由脫合 製=始2。〜30秒鐘之脫合末期所排出之脫合氣體 (氧濃度比較低、氮純度比較高）來儲存於儲存槽Μ 之狀態下，脫合初期·中期之2〇秒鐘係在儲存槽Μ 並無儲存脫合氣體，因此’在其間，為了由儲存槽83 開始’在膜式氣體分離H 82,供應氣體，因此，必, 在儲存槽83，不送出至膜錢體分離器82，預先額外 崎在目前為止之脫合製程所排出之脫合氣體。此 必須藉由真空幫浦86之動作而以相對應之壓力， 合氣體至儲存槽83,但是’在真空幫浦⑽之 83而二：一定之限度存在’因此’為了對於儲存槽 83而適*地導人脫合氣體，所以’在儲存槽83，必項 有充分之容量。前述之分斷時間越長，增大應該 ％ 外地儲存在儲存槽83之脫合氣體量，因此，也择大^ 存槽83所要求之容量而使得儲存槽83成為大/化2215-7315-PF 9 1277438 The continuation of the system complicates the system and, therefore, becomes undesirable. Further, the structure of the switching line and the storage tank 83 cause the system to be enlarged, which is undesirable. Further, the longer the period during which the flow of the degassing gas which is started to flow from the psa gas separation unit 81 to the membrane gas separator 82 is divided, the larger the storage tank 83 is, and the larger the capacity is. For example, in the 3 sec decoupling process of the adsorption tower of the PSA gas separation device 81, as shown by the arrow G', it is discharged from the desorption period and the middle stage which are 2 sec seconds from the start of the dissociation process. The gas (higher oxygen concentration and lower nitrogen purity) is discarded outside the system and will be decoupled from the beginning of the second. The degassing gas (lower oxygen concentration and higher nitrogen purity) discharged at the end of the desorption period of 30 seconds is stored in the storage tank, and the second and second phases of the debonding are in the storage tank. Since the degassing gas is not stored, "in the meantime, in order to start from the storage tank 83, the gas is supplied in the membrane gas separation H 82, and therefore, in the storage tank 83, it is not sent to the membrane body separator 82, in advance. Extras of the degassing gas discharged from the current dissociation process. This must be combined with the gas to the storage tank 83 by the action of the vacuum pump 86, but 'at the vacuum pump (10) 83 and two: a certain limit exists 'so' for the storage tank 83 * The ground guide decouples the gas, so 'in the storage tank 83, there must be sufficient capacity. The longer the breaking time is, the larger the amount of degassing gas stored in the storage tank 83 should be increased. Therefore, the capacity required for the storage tank 83 is also increased to make the storage tank 83 large/sized.
2215-7315-PF 10 1277438 【發明内容】 本發明係在此種情況下而考量出來的；其目的係提 供一種可以藉著PSA氣體分離裝置而由氧•氮混合氣 體來分離及取得高純度氧氣同時由該PSA氣體分離裝 置所連續供應之脫合氣體來連續且效率良好地分離及 取得高純度氮氣之方法以及系統。 ' 在藉由本發明之第1側面時，提供用以由包括氧及 氮之混合氣體來併行分離氧氣及氮氣之方法。該併行分 離方法係包括：壓力變動吸附式氣體分離製程以及膜式 氣體分離製程。在壓力變動吸附式氣體分離製程，藉由 使用將用以優先地吸附氮之吸附劑予以填充之吸附塔 所進行之壓力變動吸附式氣體分離法，而在吸附塔内呈 相對地成為高壓之狀態下，在吸附塔，導入混合氣體， 使得該混合氣體中之氮，吸附於吸附劑，由該吸附塔， 來導出氧富化氣體，並且，在吸附塔内呈相對地成為低 ”之狀心下，由吸附劑，來脫合氮，由該吸附塔，來導 出將殘留於吸附塔内之氧和該氮予以包括之含氧脫合 ^體體分離製矛呈，將^M憂先地透過氧之氣 :分離膜之透過侧，減壓至未滿大氣壓之壓力，並且， 2由該氣體分離膜，而將含氧脫合氣體，分離成為透過 氣體分離膜之透過氣體以及不透過氣體分離膜之非透 過氮富化氣體。 、人最好疋本併行分離方法係還包括：用以在前述含氧 脫口孔體附加於膜式氣體分離製程之前，來壓縮該含氧2215-7315-PF 10 1277438 SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances; the object of the present invention is to provide a high purity oxygen which can be separated and obtained by an oxygen/nitrogen mixed gas by means of a PSA gas separation device. At the same time, the method and system for continuously and efficiently separating and obtaining high-purity nitrogen gas by the degassing gas continuously supplied from the PSA gas separation device. In the first aspect of the present invention, a method for separating oxygen and nitrogen in parallel by a mixed gas including oxygen and nitrogen is provided. The parallel separation method includes a pressure swing adsorption gas separation process and a membrane gas separation process. In a pressure-variable adsorption gas separation process, a pressure-variable adsorption gas separation method is carried out using an adsorption column in which an adsorbent for preferentially adsorbing nitrogen is used, and is relatively high-pressure in the adsorption tower. Next, in the adsorption tower, the mixed gas is introduced so that the nitrogen in the mixed gas is adsorbed to the adsorbent, and the oxygen-rich gas is derived from the adsorption tower, and is relatively low in the adsorption tower. Next, the adsorbent is used to desorb nitrogen, and the adsorption tower is used to extract the oxygen remaining in the adsorption tower and the oxygen-containing desulfurization body including the nitrogen to separate the spears, and the Oxygen-permeable gas: the permeate side of the separation membrane, decompressed to a pressure less than atmospheric pressure, and 2, the gas separation membrane separates the oxygen-containing gas into a permeate gas permeating the gas separation membrane and is impermeable to gas. The non-permeability nitrogen-enriched gas of the separation membrane. The method of parallel separation of the human body further comprises: compressing the oxygen-containing gas before the oxygen-containing decanter is attached to the membrane gas separation process
2215-7315-PF 11 1277438 脫口氣體之壓縮製程。在該狀態下，最好是在壓縮製 ’王壓縮合氧脫合氣體，成為0 6MPa以上之壓力。 ^疋在由壓力變動吸附式氣體分離製程之吸附 ::3氧脫合氣體時之該吸附塔内之減壓以及膜 ，、亂體分離製程之透過側之減壓係藉由單—之減壓裝 田子疋構成在膜式氣體分離製程，不透過氣體分離 f將U脫合氣體之一部分，來導入至氣體分離膜之 透過側。 在藉由本發明之第2側面時，提供用以由包括氧 及氮之混合氣體來併行分離氧氣及氮氣之系統。該併行 鍋統係包括：壓力變動吸附式氣體分離裝置、膜式 氣體分離為以及減愿駐罢 朦：丄 ^ 减&凌置壓力變動吸附式氣體分離裝 置係具有將用以優先地吸附氮之吸附劑予以填充之吸 附塔’用以藉由使用該吸附塔所進行之壓力變動吸附式 氣體分離法，而在吸附塔内呈相對地成為高壓之狀態 下，在吸附塔，導入混合氣體，使得該混合氣體中之氮 吸附於吸附劑，由該吸附塔，來導出氧富化氣體，並且， 在吸附塔内呈相對地成為低壓之狀態下，由吸附劑，來 脫合氮，由該吸附塔，來導出將殘留於吸附塔内之氧和 該氣予以包括之含氧脫合氣體。膜式氣體分離器係且有 用以優先地透過氧之氣體分離膜，用以將含氧脫合氣 體，分離成為透過氣體分離膜之透過氣體以及不透過氣 體分離膜之非透過氮富化氣體，來進行導出。減壓裝置 2215-7315-PF 12 1277438 係用以使得膜式氣體分離器 屋成為未滿大氣屋…。在二離膜之透過侧，減 能夠料地進行本發明之第分離系統時， 最好是本併行分離系統係還包 氣體來供應至膜式氣體分離 纟3錢合 氣體之，縮裝置。 …而I缩該含氧脫合 壯K減壓衣置係在由壓力變動吸附式氣體分離 裝置之吸附塔來導出含氧 刀雕 用以時，也-併發揮作為 用以減壓該吸附塔内之裝置之功能。 、最好是本併行分離系統係還包括：用以迁迴 脫：：體《冑分而不透過氣體分離膜來導入至氣體 分球膜之透過侧之运迴裝置。 _ 【實施方式】 /圖1係顯示本發明之第1實施形態之氧·氮併行分 離系統XI。氧·氮併行分離系統X1係包括：壓力變動 吸附式（PSA)氣體分離裝置i、膜式氣體分離器2、原 料氣體供應裝置3、幫浦4、5、消音器6、壓縮機7、 氣液分離器8、氧濃度控制機構9以及連結這些之配 管，構成實施包括應該由空氣（含氧、氮之原料氣體） 呈併行地分離氧富化氣體及氮富化氣體之壓力變動吸 附式氣體分離製程、壓縮製程及膜式氣體分離製程之氧 •氮併行分離方法。 PSA氣體分離裝置丨係主要包括填充用以優先地吸2215-7315-PF 11 1277438 Compressing process for stripping gas. In this state, it is preferable to compress the oxygen-decomposing gas in the compression system to become a pressure of 0 6 MPa or more. ^疋In the adsorption by the pressure-variable adsorption gas separation process: 3 decompression in the adsorption tower when the oxygen is degassed, and the membrane, and the decompression on the permeate side of the chaotic separation process is reduced by a single The press-fitted field is formed in a membrane gas separation process, and a part of the gas is degassed by the gas separation f, and is introduced into the permeation side of the gas separation membrane. In the second aspect of the invention, a system for separating oxygen and nitrogen in parallel by a mixed gas comprising oxygen and nitrogen is provided. The parallel pan system includes: a pressure-variable adsorption gas separation device, a membrane gas separation, and a reduction of pressure: the reduction and the pressure fluctuation adsorption gas separation device have a function of preferentially adsorbing nitrogen. The adsorption tower filled with the adsorbent is used to introduce a mixed gas in the adsorption tower while the pressure is relatively high in the adsorption tower by the pressure fluctuation adsorption gas separation method using the adsorption tower. The nitrogen in the mixed gas is adsorbed to the adsorbent, and the oxygen-rich gas is derived from the adsorption tower, and the nitrogen is desorbed by the adsorbent in a state where the adsorption tower is relatively low-pressure. The adsorption tower is used to derive oxygen-containing gas to be contained in the adsorption tower and oxygen-containing degassing gas to be included in the gas. The membrane gas separator is also useful for preferentially permeating a gas separation membrane for oxygen to separate the oxygen-containing gas into a permeate gas that permeates the gas separation membrane and a non-permeation nitrogen-enriched gas that does not permeate the gas separation membrane. To export. The pressure reducing device 2215-7315-PF 12 1277438 is used to make the membrane gas separator house less than atmospheric... When the first separation system of the present invention is carried out on the permeate side of the membrane, it is preferable that the parallel separation system further supplies a gas to the membrane gas separation gas. And I shrink the oxygen-containing dissociation K decompression coat when the oxygen-containing knife engraving is used by the adsorption tower of the pressure-variable adsorption gas separation device, and also serves to decompress the adsorption tower. The function of the device inside. Preferably, the parallel separation system further comprises: a reciprocating device for relocating the off-body: the body is introduced into the permeate side of the gas separation membrane without passing through the gas separation membrane. [Embodiment] Fig. 1 shows an oxygen-nitrogen parallel separation system XI according to a first embodiment of the present invention. The oxygen-nitrogen parallel separation system X1 includes a pressure fluctuation adsorption type (PSA) gas separation device i, a membrane type gas separator 2, a raw material gas supply device 3, a pump 4, 5, a muffler 6, a compressor 7, and a gas. The liquid separator 8, the oxygen concentration control means 9, and the piping that connects these are configured to include a pressure fluctuation adsorption type gas in which an oxygen-rich gas and a nitrogen-rich gas are separated in parallel by air (a raw material gas containing oxygen and nitrogen). A separate separation process for oxygen and nitrogen in a separation process, a compression process, and a membrane gas separation process. PSA gas separation device tanning system mainly includes filling for preferentially sucking
2215-7315-PF 13 1277438 附氮之吸附劑之至少一個 合（嚙略圖不），可以is 由使用該吸附塔所進行之壓 斗' " 1力fe動吸附式氣體分 ;)，而：含 '、氮之原料氣體（在本實施形態、成為空 :“取出乳富化氣體。作為填充於吸附塔之吸附劑 係可以採用Ll-X型滞石分子筛、Ca—乂型滞石分子= 以及A型沸石分子筛等。可以在單一之吸附塔，填 充一種吸附劑，也可以填充複數種之吸附劑。 、 、a在藉由PSA氣體分離裝置！所執行之壓力變動吸附 式氣體分離法，就單—之吸附塔而言，重複地進行包括 ，附製程、脫合製程及再生製程之i個#環。吸附製程 係用以在塔内位處於既定之高壓狀態之吸附塔，導入处 氣」使得該原料氣體中之氮及其他成分（二氧化碳、^ 氣等）吸附於吸附劑，由該吸附塔開始導出氧富化氣2 之製程。脫合製程係用以對於吸附塔内，進行減壓，由 脫合劑來脫合氮，將該氮排出至塔外之製程。再生製程 係用以藉由應該在再度之吸附製程，包括吸附塔，例如 使得洗淨之氣體流通於塔内，而回復吸附劑對於氮之吸 附性能之製程。作為此種PSA氣體分離裝置1係可以使 用習知之PSA氧分離裝置。 膜式氣體分離2係具有導入口 2a及導出口 2b、 2c ’包括優先地透過氧之氣體分離膜2A。在膜式氣體 分離器2之内部，設置既定之氣體流路（並無具體地圖 示）’導入口 2a及導出口 2b係透過氣體流路之一部分 而進行連通。此外，在由導入口 2 a開始至導出口 & 2215-7315-PF 14 1277438 為止之氣體流路之既定部位，配晉* 乳體分離膜2A。氣 體分離膜2 A係例如由聚醯亞胺或♦ X心碾等之所構成之多 孔質樹脂膜。作為此種多孔質抖 、封月曰膜係可以使用2215-7315-PF 13 1277438 At least one of the nitrogen-adsorbing adsorbents (not shown) can be used by the press tower using the adsorption tower '" 1 force fe-adsorbed gas fraction;), and: The raw material gas containing ' and nitrogen' (in the present embodiment, it is empty: "the milk-rich gas is taken out. As the adsorbent system filled in the adsorption tower, Ll-X type stagnation zeolite molecular sieve, Ca-乂 type stagnation stone molecule can be used = And a type A zeolite molecular sieve, etc. It is possible to fill a single adsorption tower with an adsorbent or a plurality of adsorbents. a, a pressure-variable adsorption gas separation method performed by a PSA gas separation device, For the single-adsorption tower, the i-rings including the process, the dissociation process and the regeneration process are repeatedly performed. The adsorption process is used for the adsorption tower in the column at a predetermined high pressure state, and the gas is introduced. The nitrogen and other components (carbon dioxide, gas, etc.) in the raw material gas are adsorbed to the adsorbent, and the process of deriving the oxygen-rich gas 2 is started by the adsorption tower. The decoupling process is used to reduce the adsorption tower. Pressure Mixing the mixture to remove nitrogen and discharging the nitrogen to the outside of the column. The regeneration process is used to recover the adsorbent by re-adsorbing the process, including the adsorption column, for example, to allow the purged gas to circulate in the column. A process for adsorbing nitrogen can be used as the PSA gas separation device 1. A conventional PSA oxygen separation device can be used. The membrane gas separation 2 has an inlet 2a and outlets 2b, 2c' including gas separation through oxygen preferentially. In the membrane gas separator 2, a predetermined gas flow path (not specifically shown) is provided in the membrane gas separator 2, and the inlet port 2a and the outlet port 2b are connected to each other through a portion of the gas channel. The inlet portion 2 a starts from the predetermined portion of the gas flow path to the outlet port & 2215-7315-PF 14 1277438, and is equipped with a gold separation membrane 2A. The gas separation membrane 2 A is, for example, a polyimine or a ♦ X A porous resin film composed of a heart mill or the like can be used as such a porous shaker and a sealant film system.
Yupilex PT (宇部興產（股）公司製）。 原料氣體供應裝置3係用以佴虛^ 1，、應成為含氧•氮之 原料氣體之空氣至PSA氣體分離裝署7 ,,, 衣罝1之吸附塔，例如 空氣鼓風機。幫浦4係用以對於PSA # a ^ ^ ^ . 氣體分離裝置1 之吸附塔内，來進行吸引及減壓，例Yupilex PT (made by Ube Industries Co., Ltd.). The raw material gas supply device 3 is used for the air supply to the PSA gas separation unit 7 , and the adsorption tower of the clothes 1 , for example, an air blower. The pump 4 system is used for suction and decompression in the adsorption tower of the PSA # a ^ ^ ^ . gas separation device 1, for example
〜如真空幫浦。此外， 幫浦5係用以對於膜式氣體分離器2之氣體分離膜2A 之透過側（由氣體分離膜2A開始至導出口仏為止之氣 體流路）來進行吸引及減壓，例如真空幫浦。 消音器6係用以豸來自幫浦4之氣體之一部分來導 引至壓縮機7，將來自餐诸4· ^ 木S笫席4之乳體之殘留部，排出至 系統外’具有用以將來自幫浦4之氣體導引至壓縮機7 之氣體流路以及消音决自暫、、老」> 户 月曰木自繁席4之氣體且排出至系統 外之氣體流路。 壓縮機7係用以壓縮經過消音器6之氣體而供應至 氣液刀離器8。此外’氣液分離器8係具有排出口 8a， 用以由該氣體來分離由壓縮们所送出之氣體而包括 之扒刀排出口 8 a係用以將回收於氣液分離器8内之 水分來排出至氣液分離器8外。 、，乳/辰度控制機構9係由繼合於膜式氣體分離器2 之導出口 2b之配管u所設置之氧感測器&及自動閥 而構成用以配合於流通在配管L1内之氣體之氧濃~ As vacuum pump. Further, the pump 5 is used for suction and decompression of the permeate side (the gas flow path from the gas separation membrane 2A to the outlet port 仏) of the gas separation membrane 2A of the membrane type gas separator 2, for example, a vacuum gang Pu. The muffler 6 is used for guiding a portion of the gas from the pump 4 to the compressor 7, and discharging the residual portion of the milk from the meal 4 to the outside of the system. The gas flow path leading from the pump 4 to the compressor 7 and the gas flow path from the gas to the outside of the system are discharged from the gas of the household. The compressor 7 is for supplying the gas passing through the muffler 6 to the gas liquid knife separator 8. Further, the 'gas-liquid separator 8 has a discharge port 8a for separating the gas sent from the compressor by the gas, and the boring tool discharge port 8a included for collecting the moisture recovered in the gas-liquid separator 8 It is discharged to the outside of the gas-liquid separator 8. The milk/thinness control mechanism 9 is configured to be fitted in the pipe L1 by an oxygen sensor & and an automatic valve provided in the pipe u connected to the outlet port 2b of the membrane type gas separator 2 Oxygen concentration of gas
2215-7315-PF 15 1277438 度，藉由調節該氣體之流通量（ 里、也跣疋不透過膜式氣體 分離器2之氣體分離膜2 a之氣 ^ 礼餸里）而调整該氣體之 氧濃度二成為要求值。氧感測器9a係用以一直檢測流2215-7315-PF 15 1277438 degrees, adjust the oxygen of the gas by adjusting the flow of the gas (the gas is not permeable to the gas separation membrane 2 a of the membrane gas separator 2) Concentration 2 becomes the required value. Oxygen sensor 9a is used to detect flow all the time
通在配管L1内之齑艚之龛、、普痒 -b ^ ^ L 乱骽之虱/辰度。在虱濃度控制機構9， 構成配合於氧感測器9a之拾制纟士里=, 〜ya炙杈測結果而依照要求地調 自動閥9b之開口度。通 龛 、 、 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配 配The helium concentration control mechanism 9 is configured to adjust the opening degree of the automatic valve 9b as required in accordance with the result of the pick-up of the oxygen sensor 9a.
在”名以上構造之氧•氮併行分離系統χι之稼動 時，藉由原料氣體供應裝置3之啟動，而由原料氣體供 應裝置3，來供應空氣至PSA氣體分離裝置1。 、在軋體分離裝置丨，空氣係附加於壓力變動吸 附式氣體分離盤泡。g α _ —β ▲ I私具體地况，在PSA氣體分離裝置i， 藉^力文動吸附式氣體分離法而在每個吸附塔，重複 地進行包括吸附製程、脫合製程和再生製程之1個循 環。 在吸附製程’在塔内位處於既定之高壓狀態之吸附 採L , 導^入^处名 丄 ° 二X。在該吸附塔，藉由吸附劑而吸附及除去 空氣所包括之_ Μ甘A + γ γ ^ 虱及其他成分（二氧化碳、濕氣等h將 而純度氧氣f g 6儿々—、f f 田化氣體）v出至塔外。該高純度氧氣 係透過既定夕❿M ^ t ^ -己官而取出至乳•氮併行分離系統X1 在脫口製程，藉由幫浦4之啟動而減壓吸附塔，由 吸附劑來脫合_ β_ . t 、 I及其他成刀，將包括殘留於塔内之氧和 成刀之含氧脫合氣體，排出至塔内或PSA氣體分 卜將顯示由位處於脫合製程之吸附塔所排出When the oxygen/nitrogen parallel separation system of the above-mentioned structure is activated, the raw material gas supply device 3 is used to supply air to the PSA gas separation device 1 by the start of the raw material gas supply device 3. Device 丨, the air system is attached to the pressure fluctuation adsorption gas separation disk. g α _ — β ▲ I privately, in the PSA gas separation device i, by the force dynamic adsorption gas separation method in each adsorption The tower repeats one cycle including the adsorption process, the dissociation process, and the regeneration process. In the adsorption process, the adsorption in the column is at a predetermined high pressure state, and the introduction is in the name of 二° II X. The adsorption tower adsorbs and removes air including Μ A A + γ γ ^ 虱 and other components (carbon dioxide, moisture, etc., and purity oxygen fg 6 々 -, ff field gas) v out to the tower. The high-purity oxygen is taken out to the milk-nitrogen parallel separation system X1 through the established ❿ ❿ M ^ t ^ -, and in the stripping process, the adsorption tower is decompressed by the start of the pump 4, by adsorption Agent to dissociate _ β_ . t , I and He knife into the column comprising the remaining oxygen and oxygen-containing off gas of the knife into, or discharged to the tower PSA gas partial BU is displayed by a bit de-bonding process of the adsorption tower is discharged
2215-7315-PF 16 1277438 之含氧脫合氣體之壓力時間變化之某_例子之圖形，顯 不在圖2。在圖2之圖形’橫軸係表^料之脫合時 間（由脫合製程開始之經過時間），縱軸係表示脫合壓 力（含氧脫合氣體之壓力）。在本壓力變化例，在脫合 製程開始時之壓力係、大氣M，在_ 1〇秒鐘時之壓力 係〇.〇611MPa’在經過30秒鐘時之壓力係〇 〇332Mpa。 此外，在圖2，也一併顯示在脫合製程開始時、在經過2215-7315-PF 16 1277438 A graph of the pressure time change of the oxygen-containing degassing gas is not shown in Fig. 2. In the graph of Fig. 2, the horizontal axis system is decoupled (the elapsed time from the start of the dissociation process), and the vertical axis is the decompression pressure (pressure of the oxygen-containing degassing gas). In this pressure change example, the pressure system at the beginning of the disengagement process, the atmosphere M, and the pressure at _ 1 〇 second are 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 In addition, in Figure 2, it is also shown at the beginning of the disengagement process, after passing
1〇秒鐘時以及在經過3〇秒鐘時之含氧脫合氣體之氧濃 度（氧之體積比例）。 在再生製私，例如藉由洗淨之氣體流通在塔内而主 要:復吸附劑對於氮之吸附性能。在結束再生製程之吸 附塔’再度進行前述之吸附。 、在PSA氣體分離裝置，藉由進行前述之壓力變動吸 附式軋體分離製程，而取出高純度氧氣，同時，取出含 乳脫合氣體。高純度氧氣係例如連續地使用在既定之用 ，或者是儲存於既定之槽^另―方面，由位處於脫合製 程之吸附塔開始排出至PSA氣體分離裝置丨外之含氧脫 合:氣體係通過既定之配管及幫浦4而傳送至消音器6。 接著，含氧脫合氣體之—部分係通過消音器6而到達至 麗縮機7。含乳脫合氣體之殘留部係藉由消音器6而排 出至糸統外。 y通過消音益6之含氧脫合氣體係藉由壓縮機7而進 f壓縮（壓縮製程），經過氣液分離器8而供應至膜式 孔體刀離裔2。最好是含氧脫合氣體係藉由壓縮機7 ^The oxygen concentration (volume ratio of oxygen) of the oxygen-containing degassing gas at 1 sec. and after 3 sec. In the regenerative process, for example, by the flow of the purged gas in the column, the main adsorption: adsorption performance of the re-adsorbent for nitrogen. The adsorption is performed again at the end of the adsorption column where the regeneration process is completed. In the PSA gas separation apparatus, high-purity oxygen is taken out by performing the pressure fluctuation adsorption type separation process described above, and the milk-containing degassing gas is taken out. The high-purity oxygen is used, for example, continuously for a predetermined purpose, or is stored in a predetermined tank, and is discharged from the adsorption tower located in the desorption process to the oxygen-containing desorption outside the PSA gas separation device: gas It is transmitted to the muffler 6 through the predetermined piping and the pump 4. Then, the portion of the oxygen-containing degassing gas passes through the muffler 6 to reach the refiner 7. The residual portion containing the milk desorption gas is discharged to the outside of the system by the muffler 6. The oxygen-containing degassing system by the muffler 6 is subjected to compression (compression process) by the compressor 7, and is supplied to the membrane-type hole cutter 2 through the gas-liquid separator 8. It is best to use an oxygen-containing gas system with a compressor 7 ^
2215-7315-PF 17 1277438 I鈿至〇· 6MPa以上之壓力為止。外，氣液分離器 8， . 由含氧脫合氣體，來分離水分。該水分係透過排出 D 8a而由氣液分離器8來排出至外部。 ^ 在膜式氣體分離器2，含氧脫合氣體係附加於膜式 氣體分離製程。具體地說，由導入口 2a開始導入至膜 式氣體分離器2内之含氧脫合氣體G丨係藉由配置在膜 式氣體分離器2之氣體流路内之氣體分離膜2A而分離 • 成為透過氣體分離膜Μ之透過氣體G2和不透過氣體分 離膜2A之非透過氣體G3。透過氣體G2係根據氣體分 離膜2A之透過特性而提高氧濃度之氧富化氣體，非透 過氣體G3係根據氣體分離膜2A之透過特性而提高氮濃 度之高純度氮氣（氮富化氣體）。 在膜式氣體分離製程，藉由幫浦5之啟動而減壓氣 體刀離膜2A之透過側，成為未滿大氣壓之壓力。藉由 幫浦5所造成之減壓壓力係例如〇· 〇2〜〇· 〇5Μρ&。透過 • 氣體G2係由導出口 2c開始導出至膜式氣體分離器2 外，然後，通過幫浦5而排出至系統外。 這個係一起在膜式氣體分離製程，藉由氧濃度控制 機構9之啟動而直接地調節非透過氣體量，使得非透過 乳體G3之氧濃度維持在_定。氧濃度控制機構9之氧 感測器9a係就由導出口 2b開始導出至膜式氣體分離哭 2/卜而通過配管L1内之非透過氣體g3而言，一直檢； 虱濃度。在檢測之濃度超過要求值之狀態下，使得自動 閥9b之開口度變小，減低通過配管u内之非透過氣體2215-7315-PF 17 1277438 I钿 to 〇·6MPa or more. In addition, the gas-liquid separator 8, is separated from the water by an oxygen-containing gas. This moisture is discharged to the outside by the gas-liquid separator 8 through the discharge D 8a. ^ In the membrane gas separator 2, the oxygen-containing gas separation system is attached to the membrane gas separation process. Specifically, the oxygen-containing gas G gas introduced into the membrane gas separator 2 from the inlet 2a is separated by the gas separation membrane 2A disposed in the gas flow path of the membrane gas separator 2. The permeated gas G2 that has passed through the gas separation membrane and the non-permeated gas G3 that does not permeate the gas separation membrane 2A. The gas G2 is an oxygen-rich gas which increases the oxygen concentration according to the permeation characteristics of the gas separation membrane 2A, and the non-permeation gas G3 is a high-purity nitrogen gas (nitrogen-rich gas) which increases the nitrogen concentration according to the permeation characteristics of the gas separation membrane 2A. In the membrane gas separation process, the gas knife is decompressed from the permeation side of the membrane 2A by the start of the pump 5, and becomes a pressure less than atmospheric pressure. The decompression pressure caused by the pump 5 is, for example, 〇·〇2~〇·〇5Μρ&. The gas G2 is discharged from the outlet 2c to the outside of the membrane gas separator 2, and then discharged to the outside of the system through the pump 5. In the membrane gas separation process, the amount of non-permeate gas is directly adjusted by the activation of the oxygen concentration control mechanism 9, so that the oxygen concentration of the non-permeable emulsion G3 is maintained at _. The oxygen sensor 9a of the oxygen concentration control means 9 is guided from the outlet port 2b to the membrane gas separation cry 2/b, and the non-permeation gas g3 in the pipe L1 is continuously checked; When the detected concentration exceeds the required value, the opening degree of the automatic valve 9b is made small, and the non-permeate gas passing through the pipe u is reduced.
2215-7315-PF 18 1277438 之流I"、進而減低藉由y- n好 产 -母由在膜式氣體分離器2之 製程所產生之非透過氣體G3之量(每單㈣ =生量)。另一方面，在檢測之濃度低於要求值之 =下，使得綱9b之開口度變大，增加通過配管 之非透過氣體G3之流量、進而增加藉由在膜式 體分離器2之膜式氣體分離製、，、 Μ >旦 、 刀雖I私所產生之非透過氣體 里。在膜式氣體分㈣程之非透過氣體 及氧濃度料歧詩料㈣HU UP度 斗餻之發生量而發 : 因此’可以藉由此種非透過氣體G3之流量, 即而控制該非透過氣體G3之氧濃度。 在膜式氣體分離器2，藉由進;此種膜式氣體分離 衣％，而施行氧濃度之控 你山丄 4 p fJ並且，取出高純度氮氣。 =度氮氣係例如連續地使用在既定之 儲存於既定之槽。 疋 在藉由氧· i併行分離系統X1時，可以正如以上 而由空以併行地分離高純度氧氣及高純度氮氣。 在藉由氧·氮併行分離系統X1所造成之氧·氮併 灯分離方法’就由進行壓力變動吸附式氣體分離製程之 P:A氣體分離裝置i之吸附塔開始排 · 體：離器2之膜式氣體分離製程之含氧脫合氣體膜：： 氧分壓（或者是藉由每單” 體積之物質量所表示之氧濃 度）以及藉由氣體分離膜2A而分 …過氣體G2之氧分壓（或者是二减：氣體 物質量所表示之氧濃度)而言， ：位體積之 错由減壓氣體分離2215-7315-PF 18 1277438 Flow I", and thereby reduce the amount of non-permeate gas G3 produced by the process of membrane gas separator 2 by y- n good production - (single (four) = raw quantity) . On the other hand, when the detected concentration is lower than the required value, the opening degree of the class 9b is increased, the flow rate of the non-permeating gas G3 passing through the pipe is increased, and the film type in the membrane type separator 2 is further increased. Gas separation system,, Μ > Dan, the knife is privately produced in the non-permeate gas. In the case of the membrane gas, the non-permeate gas and the oxygen concentration material (4) HU UP degree are generated: Therefore, the oxygen of the non-permeate gas G3 can be controlled by the flow rate of the non-permeate gas G3. concentration. In the membrane type gas separator 2, by controlling the membrane gas separation, the oxygen concentration is controlled, and the high purity nitrogen gas is taken out. The degree of nitrogen is continuously used, for example, in a predetermined tank.疋 When the system X1 is separated in parallel by oxygen·i, high-purity oxygen and high-purity nitrogen can be separated in parallel by the above. The oxygen-nitrogen lamp separation method by the oxygen/nitrogen parallel separation system X1 is started by the adsorption tower of the P:A gas separation device i which performs the pressure fluctuation adsorption gas separation process: the separator 2 Oxygen-containing gas film of the membrane gas separation process:: partial pressure of oxygen (or oxygen concentration expressed by mass per single volume) and by gas separation membrane 2A ... by gas G2 The oxygen partial pressure (or the second reduction: the oxygen concentration expressed by the gas mass): the volume volume error is separated by the reduced pressure gas
2215-7315-PF 19 1277438 膜2A之透過膜，成為未滿大 充分之穴虱壓之要求壓办，而設置 兄刀之差異。此外，在壓縮機7之 吸附塔之含氧脫合氣體G 、，、ϋ就來自 ^ 2Α ^ ^ V . 虱刀屋以及藉由氣體分離 、4而進仃分隔之透過氣體G2之氣八 設置充分之差異。即使是在含氧而言’有助於 (或氧濃度)發生變動之狀離下广G1之氧分壓 氧分壓而言，設置充分之差::：以藉由就該兩個 之氧透過用之充分m體分離膜2A 之變動比例，因此，_寻到门氧目= 夠抑制該驅動力 之充分之透過旦，η栌 乳相對於氣體分離膜2Α 气w八 。里Ρ寸可以抑制該透過量之變動。有 虱肢分離膜2Α之氧透過量越领有 過量越少之傾h 4 氣體分離膜2A之氮透 王μ >之傾向發生，因此， 夕赠斗、γ 有在無式氣體分離哭 9 之膜式氣體分離製程之非透：…2 之發生量變多之傾向發生。另_ * 又氣氣）G3 2A之氧透過量之變動比例越小而膜：：：氣’分離膜 非透過氣俨^古A、式氣體分離製程之 处、虱體（南純度氮氣）G3 小之傾向發生。 $生里之變動比例越 像這樣，在藉由本發明 — 所造成之氧•氮併行分離方法行分離系統XI 來供應多量之非透錢富化㈣以穩定之流量， 分離方法時，能夠藉由PSA氣體八=在精由本併行 來分離及取得高纯产氧$ 71 '"置〗，而由空氣 行冋建度虱虱，同時， 1所連續供應之含氧脫合氣痒 乳體为離裝置 及取得高純度氮氣。因此，在:且效率良好地分離 在猎由本併行分離方法時，2215-7315-PF 19 1277438 The membrane of the membrane 2A is required to be pressed under the pressure of a large enough point, and the difference between the brothers and the knife is set. In addition, the oxygen-containing gas G, , and ϋ in the adsorption tower of the compressor 7 are from ^ 2 Α ^ ^ V. The shovel house and the gas venting gas G2 separated by gas separation and 4 Fully different. Even in the case of oxygen, the amount of oxygen (the oxygen concentration) is changed from the oxygen partial pressure of the G1, and the oxygen partial pressure is set to a sufficient difference: By using the variation ratio of the membrane 2A which is sufficient for the separation of the membranes 2A, it is found that the gate oxygen is sufficient to suppress the sufficient transmission of the driving force, and the η emulsion is enthalpy with respect to the gas separation membrane 2. The Ρ inch can suppress the change in the amount of transmission. There is a tendency that the amount of oxygen permeation of the separation membrane of the ankle limb is more than the excess. The tendency of the nitrogen gas permeation of the gas separation membrane 2A occurs. Therefore, the gift of the yoke and the gamma are separated in the non-formed gas. The tendency of the membrane gas separation process to be non-transparent: the amount of occurrence of ... 2 occurs. _ *又气气) The smaller the ratio of the oxygen permeation of G3 2A, the smaller the membrane:::gas' separation membrane is non-permeating gas 俨^古 A, the gas separation process, the scorpion (southern purity nitrogen) G3 Small tendencies occur. The more the ratio of change in the lifetime is, the more the non-penetration rich (4) is supplied to the separation system XI by the oxygen-nitrogen parallel separation method caused by the present invention to stabilize the flow rate, and the separation method can be used. PSA gas eight = Separate and obtain high-purity oxygen production $71 '" in the fine-grained parallel, and by the air line construction, at the same time, a continuous supply of oxygen-containing degassing itch milk is Separate the unit and obtain high purity nitrogen. Therefore, in: and efficiently separated when hunting by the parallel separation method,
2215-7315-PF 20 1277438 不需要使用用以—旦2215-7315-PF 20 1277438 does not need to be used
氧脫合氣體之槽等自PSA氣體分離裝置1之含 在本發明，就I 氣體G1而言，使得屡力：式氣體分離器2之含氧脫合 體積比例)成為:1體^ 膜式氣體分離器2所；2成為曝V小時)’就由 力（也'是氣體分離膜2A之透過側之塵力）成吏：二 (MPa)，、乳濃度成為χ2，氣體量成為Q2 ( NmV小日:）2 崎離器2所導出之非透過氣體(高純度氮 …“…吏得氧濃度成為χ3，氣 _ /小時)，氣體分離膜2A之面積及厚度成為二()： LOO,氣體分離膜2A之氧透過係數成為咖 • MPa) ’就由於氣體分離膜2八所造成之氣體分離而 言，在理論上，成立下列之公式（1)〜（3)。公式㈠） 係表示氣體量之平衡，公式（2)係表示氧量之:衡， 公式（3)係表示氣體分離膜以之氧透過特性。 【數學式1】 Q】 = Q2 + Q3 .... (1)The oxygen desorption gas tank or the like is contained in the present invention from the PSA gas separation device 1, and the I gas G1 is such that the hydrogen gas desorption volume ratio of the gas separator 2 is: 1 body membrane type In the gas separator 2; 2 is exposed to V hours), the force (also 'the dust force on the permeate side of the gas separation membrane 2A') becomes 二: two (MPa), the milk concentration becomes χ2, and the gas amount becomes Q2 ( NmV small day:) 2 Non-permeate gas derived from the smear device 2 (high-purity nitrogen... "...the oxygen concentration becomes χ3, gas _ / hour", and the area and thickness of the gas separation membrane 2A become two (): LOO The oxygen permeation coefficient of the gas separation membrane 2A becomes kPa·MPa) 'In terms of gas separation caused by the gas separation membrane 2, in theory, the following formulas (1) to (3) are established. Formula (I)) It represents the balance of the amount of gas, and the formula (2) represents the amount of oxygen: the formula (3) represents the oxygen permeation characteristics of the gas separation membrane. [Math 1] Q] = Q2 + Q3 .... (1 )
Qi χΧι =:Q2 XX2 + Q3 xX3 ____ (2 ) Q2xX2 = Kx-x(P1xX1-p2xX2) ···· (3) 例如可以採用成為聚酿亞胺多孔質膜1 Yupilex PT(宇部興產（股）公司製）來作為氣體分離膜2A， 設定公式（3)之K(S/L)之值成為186，在由psA 氣體分離裝置1開始而正如圖2所示來進行排出之脫合 2215-7315-PF 21 !277438 製程開始時（脫合初期），藉由壓縮機7而壓縮氧濃度 (11)成為20.6%之含氧脫合氣體，來作為〇79評3 (Pl)，在膜式氣體分離器2，以i25Nm3/小時（Q〇之 供應量，來進行導入，減壓氣體分離膜2A之透過側之 壓力至0· 0332MPa ( P2) ’在藉由氧濃度控制機構g而調 整非透過氣體流量來得到殘留氧濃度（Χ3 )成為丨％之 非透過氣體（高純度氮氣）之狀態下，能夠求出3個未 知數X2、Q2、Qs，來作為由前述公式（丨）〜（3 )所構 成之連立方程式之解。判定在脫合初期，發生氧濃度 (X2)成為88. 9%之透過氣體27. 9Nm3/小時（q9)，非 透過亂體里（Q3)成為97. INm3/小時。脫合初期之這 些值係揭示於圖3之表。 & 、判定在…川、^”心之值保持 並且由脫合製程開始經過丨0秒鐘時（脫合中期）， 氧脫合氣體之氧灌声^ 虱/辰度（Χι)正如圖2所示而到達 %時，藉由求出χ2、Q2、Q · 0 ^ 木作為由前述公式r 4 λ :⑺所構成之連立方程式之解，而在該 !生氧濃度㈤成為52篇之透過氣體22.。二二； 時，，非透過氣體量⑻成為1〇3.2NmVN:(小 脫合中期之這些值係也揭示於圖3之表。 日” 判疋在K ( S/L)、Pl、Ql、ρ2、χ3之值保 並且由脫合製寇„私彡- I於一定 開始經過30秒鐘時（脫合末期）和乂 乳脫合氣體之氧濃产f __ )，在含 %時，藉由求出γ , 』建至5. ϋ 尺出Xp Q2、Q3,來作為由前述公式 2215-7315-pp 22 1277438 〜（3)所構成之連立方程式之解，而在該脫合末期， 以14.4NmV小時之量⑻，來發生氧濃度（χ2).成為 35. 7%之透過氣體，非透過氣體量（Q3)成為⑴爲3 /小時。脫合末期之這些值係也揭示於圖3之表。 另一方面，在除了不進行減壓而使得氣體分離膜 2A之透過侧成為大氣壓（〇1〇1Mpa)以外，其餘係、 同於前述條件’在根據公式（1)〜（3)而求出在： PSA氣體分離裝置！開始正如圖2所示來排出含氧脫人 氣體之狀態下之脫合勒期、脫合中期及脫合末期之二 Q2、Q3時，其結果係正如圖4之表所示。 可以由圖3之表及圖4之表之比較而理解:在膜式 氣體：離製程而不減壓氣體分離膜2A之透過側之狀態 (蒼考圖4)，透過氣，吾「η、〆 ♦ 體里（Q〇係比較多是由 開Π蓋至脫合末期’因此，非透過氣體量⑻係:: 車由脫合初期開始涵蓋至脫合末期。此外，隨著含 二氧濃度(Xl)之降低而造成之透過氣體量 過氣體量（Q3)之變化旦f或去）艾大，因此，非透 相對於此，在膜4、 是變動比例）也變大。Qi χΧι =:Q2 XX2 + Q3 xX3 ____ (2) Q2xX2 = Kx-x(P1xX1-p2xX2) ···· (3) For example, it can be used as a porous polyimide membrane 1 Yupilex PT (Ube Industries, Ltd.) As a gas separation membrane 2A, the value of K (S/L) of the formula (3) is set to 186, and the desorption 2215 is started as shown in Fig. 2 by the psA gas separation device 1. 7315-PF 21 !277438 At the beginning of the process (in the initial stage of desorption), the oxygen concentration (11) is compressed by the compressor 7 to become 20.6% of the oxygen-containing degassing gas, and is used as the 〇79 rating 3 (Pl) in the membrane type. The gas separator 2 is introduced at a flow rate of i25 Nm 3 /hr (the supply amount of Q〇, and the pressure on the permeate side of the decompressed gas separation membrane 2A is 0. 0332 MPa (P2)' is adjusted by the oxygen concentration control mechanism g. In the state where the residual oxygen concentration (Χ3) is 非% of the non-permeate gas (high-purity nitrogen gas), the three unknown numbers X2, Q2, and Qs can be obtained as the above formula (丨)~(3). The osmotic gas concentration (X2) is 88.9% of the permeated gas 27. 9Nm3/ At the time (q9), the non-transmissive disorder (Q3) becomes 97. INm3/hour. These values at the beginning of the dissociation are revealed in the table of Fig. 3. &, judged in the value of ... Chuan, ^" heart is maintained and When the debonding process starts to pass 丨0 seconds (the middle of the disengagement), the oxygen perfusion of the oxygen desorption gas ^ 虱 / 辰 ( () is as shown in Figure 2 and reaches %, by finding χ 2, Q2 Q · 0 ^ Wood is the solution of the cubic equation consisting of the above formula r 4 λ :(7), and the oxygen concentration (5) becomes 52 pieces of permeating gas 22. 22.2, the amount of non-permeate gas (8) It becomes 1〇3.2NmVN: (These values in the middle of small dissociation are also revealed in the table of Fig. 3. The date is judged at the values of K (S/L), Pl, Ql, ρ2, χ3 and is separated by the system.寇„私彡- I will start to pass 30 seconds (end of the end) and the oxygen concentration of the dehydration gas f __ ), in the case of %, by γ, 『Build to 5. ϋ Xp Q2, Q3 are taken as the solution of the simultaneous equation formed by the above formula 2215-7315-pp 22 1277438 to (3), and at the end of the desorption, the oxygen concentration is generated at an amount of 14.4 NmV hours (8). ( 2). Becomes 35.7% of the permeated gas, and the amount of non-permeate gas (Q3) becomes (1) 3 / hr. These values of the end of the desorption are also shown in the table of Figure 3. On the other hand, except for not reducing The pressure is made such that the permeation side of the gas separation membrane 2A becomes atmospheric pressure (〇1〇1Mpa), and the rest of the conditions are the same as those in the equations (1) to (3): PSA gas separation device! At the beginning of the degassing period, the middle of the desorption period and the end of the desorption period, as shown in Fig. 2, the results are shown in Fig. 4 . It can be understood from the comparison between the table of FIG. 3 and the table of FIG. 4: in the state of the membrane gas: the process side without the pressure-removing gas separation membrane 2A on the permeate side (Calculation Figure 4), through the gas, I "η, 〆♦ In the body (Q〇 is more from the opening to the end of the decontamination period) Therefore, the amount of non-permeate gas (8) is:: The car is covered from the initial stage of decontamination to the end of desorption. In addition, with the concentration of dioxane When the decrease in (Xl) is caused by the change in the amount of gas passing through the amount of gas (Q3), or not, the amount of the permeation gas (Q3) is large, and therefore, the film 4 is in a variable ratio.
1=二 分離製程而減壓氣體分離膜2A 體二：：未滿大氣堡之狀態（參考圖3)，透過氣 期里因此！比較少是由脫合初期開始涵蓋至脫合末 門…至：：過氣體量（Q3)係比較多是由脫合初期 開始涵盍至脫合末期。此外，隨著 = 度（xo之降低而造成之透過老興θ脫σ風體之乳浪 珉之透過乳體量（Q2)之變化量（或1 = 2 Separation process and decompression gas separation membrane 2A Body 2:: The state of the atmosphere is not full (refer to Figure 3), so it is through the gas period! Less is covered from the beginning of the disintegration to the end of the decontamination... to:: The amount of excess gas (Q3) is more from the initial stage of desorption to the end of desorption. In addition, with the decrease in the degree of x (the decrease in xo, the amount of milk through the milk wave (Q2) through the Laoxing θ σ wind body (or
2215-7315-PF 23 1277438 者是變動比你丨彳 ^ J )蜒小，因此，非透過氣體量（Q3)之變 (或者是變動比例）也變小。可以由以上· 在蕻由龛·— ）王肝· 曰 乳併行分離系統XI之膜式氣體分離製程 時，能夠以釋中+、士 Θ + ^ ^ 轭疋之流ϊ，來供應多量之高純度氮氣。 圖5係表示本發明之第2實施形態之氧•氮併 離系統Χ2。氧·发/〜 乳 虱併行分離系統X 2係在不包括幫浦5 之方面以及包括繼合膜式氣體分離器2之導出口 和 > 幫南之吸引侧之配管L2之方面，不同於氧·氮併行 分離系統X1。 氧•氮併行分離系統X2之幫浦4係發揮作為用以 $壓ργ氣體分離裝置i之吸附塔内之減壓裝置之功 同守也發揮作為用以減壓膜式氣體分離器2之氣 體分離膜2A之读#也丨+ #厭@ ^ 心遷過侧之滅Μ裝置之功能。此種構造係 適合於呈小型地構築系統之方面。 在氧•氮併行分離系統Χ2之稼動時，在pSA氣體 | 分離裝置1，關於氧•氮併行分離系統XI，相同於前面 敛述’藉由進行壓力變動吸附式氣體分離製程，而取出 高純度氧氣及含氧脫合氣體。此外，在膜式氣體分離器 2 ’除了氣體分離膜2 a之透過側之減壓方法以外，關於 氧•氮併行分離系統X1，相同於前面敘述，藉由進行 膜式氣體分離製程’而取出高純度氮氣。在本實施形態 之膜式氣體分離製程，藉由幫浦4之啟動而使得氣體分 離膜2A之透過側’減壓成為未滿大氣壓之壓力。例如 藉由幫浦4之啟動而對於吸附製程之吸附塔内，來進行2215-7315-PF 23 1277438 The change is smaller than your 丨彳 ^ J ), so the change (or the change ratio) of the non-permeate gas amount (Q3) is also small. In the membrane gas separation process of the above-mentioned 王 龛 — ) 王 王 王 王 王 王 并行 XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI XI Purity nitrogen. Fig. 5 is a view showing an oxygen/nitrogen separation system Χ2 according to a second embodiment of the present invention. Oxygen/fat/~ chyle parallel separation system X 2 is different from the aspect that does not include the pump 5 and includes the outlet of the membrane-type gas separator 2 and the piping L2 of the suction side of the south. Oxygen-nitrogen is separated in parallel with system X1. The pumping system 4 of the oxygen/nitrogen parallel separation system X2 functions as a decompression device in the adsorption tower for the pressure gamma gas separation device i, and also functions as a gas separation for the membrane gas separator 2 for decompression. Membrane 2A reading #也丨+ #厌@ ^ The function of the cockroach device on the side of the heart. Such a structure is suitable for constructing a system in a small size. In the oxygen-nitrogen parallel separation system Χ2, in the pSA gas|separation device 1, the oxygen/nitrogen parallel separation system XI is the same as the above-mentioned condensed' by the pressure fluctuation adsorption gas separation process, and the high purity is taken out. Oxygen and oxygen-containing gas. Further, in the membrane gas separator 2' except for the pressure reduction method on the permeate side of the gas separation membrane 2a, the oxygen/nitrogen parallel separation system X1 is taken out by the membrane gas separation process as described above. High purity nitrogen. In the membrane type gas separation process of the present embodiment, the pressure on the permeate side of the gas separation membrane 2A is reduced to a pressure less than atmospheric pressure by the activation of the pump 4. For example, by the start of the pump 4, for the adsorption tower of the adsorption process,
2215-7315-PF 24 1277438 吸引減壓，同日寺’也減壓氣體分離膜2A之透過側。 "因此，在藉由利用氧·氮併行分離系統χ2所造成 =乳4併行分離方法時，概略相同於藉由氧•氮併行 为離糸統X1所造点本 ^ 成者’除了能夠供應高純度氧氣以2215-7315-PF 24 1277438 The suction pressure is reduced, and the same day temple is also the side of the gas separation membrane 2A. " Therefore, in the parallel separation method of the milk 4 by the use of the oxygen/nitrogen parallel separation system χ2, it is roughly the same as the one made by the oxygen and nitrogen behavior from the system X1. High purity oxygen
還此夠以^、疋之流量，來供應多量之高純度氮氣。 /圖6係表不本發明之第3實施形態之氧·氮併行分 離系‘ Χ3。乳·氮併行分離系統χ3係在還包括：設置 於膜式氣體分離器2之氣體分離膜2Α之透過側之導入 、首、麄口 [縮冑7之上游側和膜式氣體分離器2之 ^ 之配官L3、以及設置在配管L3之流量調節 間1〇,方广、,，不同於氧·氮併行分離系統X2。 氧氮併仃分離系統X3之配管L3係發揮用以由位 处；脫口製紅之PSA氣體分離裝置1之吸附塔開始排出 :朝向至膜式氣體分離器、2所流動之含氧脫合氣體之 -部分不透過氣體分離膜2A來進行迁迴而導入至氣體 分離膜2A之透過側之迂迴裝置之功能之部分。 八f氧•氮併行分離系統X3之稼動時，在PSA氣體 分離裝，卜關於氧•氮併行分離系統XI，相同於前面 j述藉由進订星力變動吸附式氣體分離製程，而取出 阿純度虱规及含氧脫合氣體。在本實施形態之膜式氣體 刀離製#壬，相同於氧•氮併行分離系統X2，藉由幫浦4 之啟動而使得氣體分離膜2A之透過側，減壓成為未滿 大氣£之£力。在本實施形態’藉由配管U而繼合麗 縮機7之上游側和膜式氣體分離器2之導入口 2d，因It is also sufficient to supply a large amount of high-purity nitrogen gas at a flow rate of ^ and 疋. Fig. 6 shows an oxygen/nitrogen parallel separation system > Χ3 according to the third embodiment of the present invention. The milk-nitrogen parallel separation system χ3 further includes: introduction, first, and sputum on the permeate side of the gas separation membrane 2 of the membrane gas separator 2 [the upstream side of the condensate 7 and the membrane gas separator 2) ^ The officer L3 and the flow adjustment chamber provided in the pipe L3 are 1〇, Fang Guang, and are different from the oxygen/nitrogen parallel separation system X2. The pipe L3 of the oxygen-nitrogen helium separation system X3 is used to start the discharge from the adsorption tower of the PSA gas separation device 1 for the red-cutting process: toward the membrane gas separator, the oxygen-containing degassing gas flowing The portion that does not pass through the gas separation membrane 2A and is relocated to be introduced into the function of the bypass device on the permeate side of the gas separation membrane 2A. When the eight-f oxygen-nitrogen parallel separation system X3 is moved, the PSA gas separation device is installed, and the oxygen-nitrogen parallel separation system XI is the same as the above-mentioned J. Purity 虱 and oxygen-containing degassing gas. In the membrane gas knife of the present embodiment, the same as the oxygen/nitrogen parallel separation system X2, the permeation side of the gas separation membrane 2A is activated by the activation of the pump 4, and the decompression becomes less than the atmosphere. force. In the present embodiment, the upstream side of the condensing machine 7 and the inlet 2d of the membrane type gas separator 2 are connected by the pipe U, because
2215-7315>PF 25 1277438 此，由PSA氣體分離裝置1之吸附塔開始排出而朝向至 膜式氣體分離器2之含氧脫合氣體之一部分係透過配 管L3及導入口 2d而導入至氣體分離膜2A之透過侧。 也就是說，該含氧脫合氣體之一部分係（以下，稱為氧 分壓減低用氣體G4。）係不透過氣體分離膜2A而進行 迂迴來供應至氣體分離膜2A之透過侧。在此，藉由減 壓氣體分離膜2 A之透過侧，而使得透過氧分壓減低用 氣體G4之配管L3之對於氣體分離膜2A之透過側之供 > 應，連續且穩定地進行。此外，氧分壓減低用氣體G4 供應至氣體分離膜2A之透過側之供應量係藉由流量調 節閥1 0而依照要求地進行調整。 在氣體分離膜2A之透過側，透過氣體分離膜2A 之氧濃度相對高之透過氣體G2以及不透過氣體分離膜 2A而進行迂迴之氧濃度相對低之氧分壓減低用氣體G4 (以下，將該合流之氣體稱為合流氣體G5。）係進行 合流。因此，合流氣體G5之氧濃度係更加低於透過氣 > 體G2之氧濃度。另一方面，氣體分離膜2A之透過側係 減壓至未滿大氣壓之既定壓力，因此，合流氣體G5之 氧分壓係比起透過氣體G2之氧分壓，還更加減低。 因此，可以在藉著由於氧•氮併行分離系統X3所 造成之氧•氮併行分離方法時，藉由使得氣體分離膜 2A之透過側，減壓成為未滿大氣壓之既定壓力，同時， 將氧分壓減低用氣體G4，導入至氣體分離膜2A之透過 側，而就來自吸附塔之含氧脫合氣體G1之氡分壓以及 2215-7315-PF 26 1277438 藉由氣體为離膜2A而隔開於該含氧脫合氣體G1且存在 於透過側之氣體（由透過氣體G2和氧分壓減低用氣體 G4所構成之合流氣體G5 )之氧分壓而言，設置更加大 之差異°足個係也有助於增大氣體分離膜2A之氧透過 用之驅動力而增大非透過氣體（高純度氮氣）G3之量。 圖7係表不本發明之第4實施形態之氧•氮併行分 離系統X4。氧•氮併行分離系統X4係在還包括配管L4 來取代配官L3之方面以及還包括壓力控制閥11之方 面…不同於氧•氮併行分離系統X3。配管L4係構成繼 合壓縮機7之下游侧和膜式氣體分離器2之導入口 2d配& U係相同於氧•氮併行分離系統之X3之配管 L3 ’因為使得由位處於脫合製程之PSA氣體分離裝置1 之吸附塔開始排出而朝向至膜式氣體分離器所流動之 合乳脫合氣體之一部分（氧分壓減低用氣體G4)，不透2215-7315>PF 25 1277438 Here, the portion of the oxygen-containing gas to be discharged to the membrane gas separator 2 is discharged from the adsorption tower of the PSA gas separation device 1 and introduced into the gas separation through the pipe L3 and the inlet 2d. The permeate side of the membrane 2A. In other words, part of the oxygen-containing degassing gas (hereinafter referred to as oxygen partial pressure reducing gas G4) is supplied to the permeate side of the gas separation membrane 2A without being permeated through the gas separation membrane 2A. Here, by reducing the permeation side of the gas separation membrane 2A, the supply of the gas L2 to reduce the permeation side of the gas separation membrane 2A by the oxygen partial pressure is continuously and stably performed. Further, the supply amount of the oxygen partial pressure reducing gas G4 supplied to the permeate side of the gas separation membrane 2A is adjusted as required by the flow rate adjusting valve 10. On the permeate side of the gas separation membrane 2A, the permeated gas G2 having a relatively high oxygen concentration in the gas separation membrane 2A and the oxygen partial pressure reduction gas G4 having a relatively low oxygen concentration which is bypassed without passing through the gas separation membrane 2A (hereinafter, The merged gas is referred to as a merged gas G5.) The joining is performed. Therefore, the oxygen concentration of the combined gas G5 is further lower than the oxygen concentration of the permeated gas > On the other hand, since the permeation side of the gas separation membrane 2A is depressurized to a predetermined pressure which is less than atmospheric pressure, the oxygen partial pressure of the combined gas G5 is further reduced as compared with the oxygen partial pressure of the permeated gas G2. Therefore, by the oxygen/nitrogen parallel separation method by the oxygen/nitrogen parallel separation system X3, by decompressing the gas separation membrane 2A, the pressure is reduced to a predetermined pressure less than atmospheric pressure, and oxygen is simultaneously The partial pressure reducing gas G4 is introduced to the permeate side of the gas separation membrane 2A, and the partial pressure of the oxygen-containing degassing gas G1 from the adsorption tower and 2215-7315-PF 26 1277438 are separated by the gas as the membrane 2A. The oxygen partial pressure of the gas containing the oxygen-containing degassing gas G1 and present on the permeate side (the confluent gas G5 composed of the permeating gas G2 and the oxygen partial pressure reducing gas G4) is set to a larger difference. The system also contributes to an increase in the driving force of oxygen permeation of the gas separation membrane 2A to increase the amount of the non-permeating gas (high-purity nitrogen) G3. Fig. 7 is a view showing an oxygen/nitrogen parallel separation system X4 according to a fourth embodiment of the present invention. The oxygen/nitrogen parallel separation system X4 is different from the oxygen/nitrogen parallel separation system X3 in that it further includes a pipe L4 in place of the valve L3 and also includes a pressure control valve 11. The pipe L4 is formed on the downstream side of the relay compressor 7 and the inlet port 2d of the membrane gas separator 2 is equipped with the same system as the pipe L3 of the X3 of the oxygen/nitrogen parallel separation system because the position is in the disengagement process. The adsorption tower of the PSA gas separation device 1 starts to be discharged and faces one part of the dehydration degassing gas (the oxygen partial pressure reduction gas G4) flowing to the membrane type gas separator, and is impermeable.
^氣體刀離膜2A ’來進行迂迴而導入至氣體分離膜2A 2透過側之緣故。此外，在配管L4 ,相同於氧•氮併 订刀離系統之X3而設置流量調節閥1 0。壓力控制閥11 係设置在壓縮機7和膜式氣體分離器2之間，用以按照 要求地凋即導入至膜式氣體分離ϋ 2之含氧脫合氣體 G1之壓力。 在氧•氮併行分離系統Χ4，藉由配管L4而繼合壓 縮機7之下游側和膜式氣體分離器2之導入口 2d，因 ^在系、、先稼動時之膜式氣體分離製程，氧分壓減低用 氣體G4係透過配$ L4而供應至氣體分離膜2A之透過The gas knife is separated from the film 2A' and introduced into the gas-separating side of the gas separation membrane 2A 2 . Further, in the pipe L4, the flow regulating valve 10 is provided in the same manner as the oxygen/nitrogen and the knife is separated from the X3 of the system. The pressure control valve 11 is disposed between the compressor 7 and the membrane type gas separator 2 to be introduced to the pressure of the oxygen-containing degassing gas G1 of the membrane type gas separation cartridge 2 as required. In the oxygen/nitrogen parallel separation system Χ4, the downstream side of the compressor 7 and the inlet port 2d of the membrane gas separator 2 are relayed by the pipe L4, and the membrane gas separation process is performed in the system. The gas partial pressure reduction gas G4 is supplied to the gas separation membrane 2A through the distribution of $ L4.
2215-7315-PF 27 1277438 側。接者，在氣體分離膜2A之透過側，透過氣體分離 膜2A之氧濃度相對高之透過氣體以以及不透過氣體分 離膜2A而進行迁迴之氧濃度相對低之氧分壓減低用氣 體G4係進行合流，因此，該合流氣體⑵之氣濃度係更 加低於透過氣體G2之氧濃度。另—方面，氣體分離膜 2A之透過側係減壓至未滿大氣壓之既定壓力，因此， 合流氣體G5之氧分壓係比起透過氣體G2之氧分壓，還 更加減低。 因此可以在藉著由於氧•氮併行分離系統所 造成之氧•氮併行分離方法時，藉由使得氣體分離膜 2 A之透過側，減壓成為未滿大氣壓之既定壓力，同時， 將氧分壓減低用氣體G4，導入至氣體分離膜2A之透過 侧，而就來自吸附塔之含氧脫合氣體G1之氧分壓以及 藉由氣體分離膜2A而隔開於該含氧脫合氣體G1且存在 於透過側之氣體（由透過氣體G2和氧分壓減低用氣體 G4所構成之合流氣體G5 )之氧分壓而言，設置更加大 之差異。這個係也有助於增大氣體分離膜2Α<氧透過 用之驅動力而增大非透過氣體（高純度氮氣）G3之量。 【圖式簡單說明】 圖1係顯示本發明之第1實施形態之氧•氣併行分 離系統之概略構造。 圖2係就由圖1所示之壓力變動吸附式氣體分離裝 置所排出之含氧脫合氣體而顯示壓力時間變化之某一2215-7315-PF 27 1277438 side. In the gas-separating membrane 2A, the oxygen-converting gas G4 which is relatively low in oxygen concentration which is relatively high in oxygen concentration in the gas separation membrane 2A and which is not permeable to the gas separation membrane 2A Since the joining is performed, the gas concentration of the combined gas (2) is further lower than the oxygen concentration of the permeating gas G2. On the other hand, since the permeation side of the gas separation membrane 2A is decompressed to a predetermined pressure which is less than atmospheric pressure, the oxygen partial pressure of the combined gas G5 is further reduced as compared with the oxygen partial pressure of the permeated gas G2. Therefore, by the oxygen/nitrogen parallel separation method by the oxygen/nitrogen parallel separation system, by making the gas separation membrane 2A through the permeate side, the pressure is reduced to a predetermined pressure less than atmospheric pressure, and at the same time, the oxygen is divided. The reduced gas G4 is introduced into the permeate side of the gas separation membrane 2A, and the oxygen partial pressure of the oxygen-containing degassing gas G1 from the adsorption tower and the oxygen-containing degassing gas G1 are separated by the gas separation membrane 2A. Further, in the oxygen partial pressure of the gas on the permeate side (the combined gas G5 composed of the permeated gas G2 and the oxygen partial pressure reducing gas G4), a larger difference is set. This system also contributes to an increase in the amount of the non-permeating gas (high-purity nitrogen) G3 by increasing the driving force of the gas separation membrane 2 Α oxygen. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a schematic configuration of an oxygen/gas parallel separation system according to a first embodiment of the present invention. Fig. 2 is a view showing a change in pressure time with respect to the oxygen-containing degassing gas discharged from the pressure-variable adsorption gas separation device shown in Fig. 1.
2215-7315-PF 28 1277438 例子。 圖3係關於使用及勃耔 . 執仃圖1所示之氧•氮併行分碌. 糸統之本發明之氧•氮供 制^ 折仃分離方法之膜式氣體分離 I程，正如圖2所示而蔣婭 山A 寻、&過由PSA氣體分離裝置來排 出含氧脫合氣體之狀態下 D士、 #、下之脫合初期（脫合製程開始 脫口中期（經1^ 10秒鐘時）及脫合末期（經過 秒鐘時）之各個物理量之變化之某-例子予以整理2215-7315-PF 28 1277438 Example. Figure 3 is about the use and burgundy. The oxygen and nitrogen shown in Figure 1 are paralleled. The oxygen-nitrogen supply method of the present invention is a membrane gas separation I process, as shown in Figure 2. As shown in the figure, Jiang Yashan A seeks, & passes the PSA gas separation device to discharge the oxygen-containing degassing gas in the state of D, #, and the next disintegration (the disengagement process starts in the middle of the strip (after 1 ^ 10 seconds) In the hour and the end of the period (after the second), the change of each physical quantity - the example is sorted out
之表。 圖4係關於不減壓圄】— 产 ， 卜4氩圖1所不之氧•氮併行分離系統 之膜式氣體分離器之畜雜八 & 體分離膜之透過側而執行之膜 式氣體分離製程，t ‘闽、《 、 才正如圖2所示而將經過由PSA氣體分 離裝置來排出含氣脫入与舰 ® s氧脱合乳體之狀態下之脫合初期（脫合 製程開始時）、妝、人由如,， 脱口中期（經過1 0秒鐘時）及脫合末期 (經過3 0秒綠拉、+ a , 、* )之各個物理量之變化之某一例子予 以整理之表。 /圖5係表示本發明之第2實施形態之氧•氮併行分 離系統之概略構造。 圖6係衣示本發明之第3實施形態之氧•氮併行分 離糸統之概略構造。 圖7 ~ t ’、衣不本發明之第4實施形態之氧•氮併行分 離糸統之概略構迭。 廣I δ ^ ^ _ 节辰示習知之氧•氮併行分離系統之概略構 造。Table. Fig. 4 is a membrane gas which is carried out without the decompression of the permeation side of the membrane separation gas membrane of the membrane gas separator of the oxygen/nitrogen parallel separation system. Separation process, t '闽, ", is just as shown in Figure 2, and will be discharged through the PSA gas separation device to remove the gas-containing detachment and the ship's oxygen deionization emulsion (the beginning of the disengagement process) Time), makeup, human beings, and some examples of changes in physical quantities during the middle of the period (after 10 seconds) and at the end of the period (after 30 seconds of green pull, + a , , *) table. Fig. 5 is a view showing a schematic configuration of an oxygen-nitrogen parallel separation system according to a second embodiment of the present invention. Fig. 6 is a view showing a schematic structure of an oxygen-nitrogen parallel separation system according to a third embodiment of the present invention. Fig. 7 - t', the schematic configuration of the oxygen-nitrogen parallel separation system of the fourth embodiment of the present invention. The broad I δ ^ ^ _ section shows the schematic structure of the oxygen-nitrogen parallel separation system.
2215-7315-PF 29 1277438 【主要元件符號說明】 G，-〜箭號 G1〜含氧脫合氣體 G2〜透過氣體 G3〜非透過氣體 G4〜氧分壓減低用氣體 G5〜合流氣體 L1〜配管 > L2〜配管 L 3〜配管 L 4〜配管 XI〜氧•氮併行分離系統 X2〜氧•氮併行分離系統 X3〜氧•氮併行分離系統 X4〜氧•氮併行分離系統 X5〜氧•氮併行分離系統 > 1〜PSA氣體分離裝置 2〜膜式氣體分離器 2A〜氣體分離膜 2a〜導入口 2b〜導出口 2c〜導出口 2d〜導入口 3〜原料氣體供應裝置 302215-7315-PF 29 1277438 [Description of main components] G, -~ arrow G1 - oxygen-containing gas G2 - permeation gas G3 - non-permeation gas G4 - oxygen partial pressure reduction gas G5 - confluent gas L1 - piping > L2 ~ pipe L 3 ~ pipe L 4 ~ pipe XI ~ oxygen • nitrogen parallel separation system X2 ~ oxygen • nitrogen parallel separation system X3 ~ oxygen • nitrogen parallel separation system X4 ~ oxygen • nitrogen parallel separation system X5 ~ oxygen • nitrogen Parallel separation system > 1 to PSA gas separation device 2 to membrane gas separator 2A to gas separation membrane 2a to inlet 2b to outlet 2c to outlet 2d to inlet 3 to raw material supply device 30
2215-7315-PF 1277438 4〜幫浦 5〜幫浦 6〜消音器 7〜壓縮機 8〜氣液分離器 8a〜才非出口 9〜氧濃度控制機構 9 a〜氧感測器 9 b〜自動閥 1 0〜流量調節閥 11〜壓力控制閥 81〜PSA氣體分離裝置 8 2〜膜式氣體分離器 82a〜氣體分離膜 8 3〜儲存槽 8 4〜壓縮機 8 5〜壓縮機 8 6〜真空幫浦。 2215-7315-PF 312215-7315-PF 1277438 4~Gun 5~Board 6~Muffler 7~Compressor 8~Gas-liquid separator 8a~Non-outlet 9~Oxygen concentration control mechanism 9 a~Oxygen sensor 9 b~Auto Valve 10 to flow regulating valve 11 to pressure control valve 81 to PSA gas separating device 8 2 to membrane type gas separator 82a to gas separation membrane 8 3 to storage tank 8 4 to compressor 8 5 to compressor 8 6 to vacuum Pump. 2215-7315-PF 31
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| JP5027662B2 (en) * | 2005-08-22 | 2012-09-19 | 住友精化株式会社 | Method and system for parallel separation of oxygen gas and nitrogen gas |
| KR100856912B1 (en) * | 2007-11-13 | 2008-09-05 | 주식회사 와이 에치 씨 | Purifying nitrogen supply apparatus |
| CN102071963A (en) * | 2010-12-04 | 2011-05-25 | 北京科技大学 | Oxygen increasing method and device for working face of non-coal mine at plateau |
| CN103007674A (en) * | 2011-09-27 | 2013-04-03 | 上海弘中实业有限公司 | Composite high concentration oxygenerator based on combining molecular size arrangement priority filtering technology with pressure swing adsorption oxygen generating technology |
| KR102330572B1 (en) * | 2012-09-28 | 2021-11-25 | 아사히 가세이 케미칼즈 가부시키가이샤 | Method for driving internal combustion engine, and air supply device |
| KR101722045B1 (en) | 2016-08-26 | 2017-03-31 | 주식회사 엠에스엘 콤프레서 | The status of cylinder diagnosis system equipped breathing air compressor |
| JP6851839B2 (en) * | 2017-01-27 | 2021-03-31 | 大陽日酸株式会社 | Heat recovery type oxygen nitrogen supply system |
| JP6860197B2 (en) * | 2017-02-06 | 2021-04-14 | Ｖｉｇｏ Ｍｅｄｉｃａｌ株式会社 | Oxygen concentrator |
| CN108401605B (en) * | 2018-02-05 | 2020-12-08 | 日照方源机械科技有限公司 | Low pressure seed treatment device |
| CN112021636A (en) * | 2020-06-22 | 2020-12-04 | 武汉东昌仓贮技术有限公司 | Cyclic deoxidation nitrogen-rich insect prevention device and method for closed bin |
| JP2024021212A (en) * | 2022-08-03 | 2024-02-16 | 株式会社日立製作所 | Gas separation device |
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| ZA876419B (en) * | 1986-10-01 | 1988-06-29 | Boc Group Inc | Psa process and apparatus employing gaseous diffusion barriers |
| JPH0293282A (en) * | 1988-09-30 | 1990-04-04 | Hitachi Ltd | Method and device for manufacture of liquid nitrogen and nitrogen gas |
| JPH0312307A (en) * | 1989-06-08 | 1991-01-21 | Nippon Sanso Kk | Method for enriching oxygen |
| US5207806A (en) * | 1991-10-08 | 1993-05-04 | Praxair Technology, Inc. | Dual product pressure swing adsorption and membrane operations |
| US5827351A (en) * | 1997-02-14 | 1998-10-27 | Praxair Technology, Inc. | Air separation system and method |
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| KR101120992B1 (en) | 2012-06-13 |
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| KR20070053728A (en) | 2007-05-25 |
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