1274710 Λ 、'玖、發明說明： 、 【發明所屬之技術領域】 本發明有關於製造平板顯示器的裝置。 【先前技術】 I考圖1 ’ 2 ’圖中顯不-習知平板顯示器⑽^製造裝置。FPD製造裝置 包括·負載鎖至100 ’饋入室2〇〇，及處理室3〇〇，其串聯以處理用於卿 的基板。 _ 貞載鎖I 100接到外部站以接收將於FPD製造裝置中處理的基板，以載 入絲板’或是將FPD製造裝置中處理過的基板釋出，以卸載該基板。負 载鎖至1GG重覆地在真空狀態與大氣狀態之間切換，以便負載鎖室刪選 擇性地與外部站連通。 饋入至200接在負載鎖室1〇〇與處理室3〇〇之間。如圖2所示，饋入室 200 σ又置;t位於饋入至200内部的饋入機械人21〇，以便饋入室細作為 中間通路用以在負載鎖室100與處理室期之間饋入基板，用以載入/卸載 _ 3基板饋入至200維持在真空狀態，以便處理室3〇〇能維持在真空狀態。 在圖2處理至300 ,又置有-處理裝置31〇，以執行一期望處理用於載入 處理室300的基板。例如在處理室3〇〇中建立的真空狀態下執行侧處理。 同日寸FPD的最新麵叙具有較大的尺寸，這需要加大·製造裝置的各 至、、、口果也必須增加清潔室的大小，該清潔室中安裝有卿製造裝置。 因此，FPD製造裝置的安裝成本大幅增加。 即使使用單-FPD製造裝置，為了減少用於FpD的基板製造成本，而將 高安裝成本考慮料，必綱加FPD製造裝置的基城理效率。 1274710 惟’因基板尺寸的增加，載入/卸載各基板所需時間，亦即，完成基板處 理後，將基板載入負載鎖室100及將基板從負載鎖11〇〇卸載所需時間也 增加。因此，極需要減少載入/卸载各基板所需時間。 同時，在負載鎖室1〇〇相鄰處設置一基板傳輸裝置400，以傳輸基板到負 載鎖室100如圖3所示。在錢壓之下驅動基板傳輪裝置4〇〇，基板傳輸裝 置棚配置成將«反送入負载鎖室100，而基板則堆疊在絲板傳輸裝置 400相鄰的基板儲存盒5〇〇上面。 惟，以上述方式將基板送入負載鎖室1〇〇時，由於FpD製造裝置的安裝 面積增加，所以清潔室（其中安裝FPD製造裝置）的大小也增加。結果，產 生FH)製造裝置的安裝成本增加的問題。而且，製造裝置所製造的基板 製造成本也增加。 近來這些問題變的更嚴重，這是因為FpD製造裝置中包括的各室大小， 因FPD尺寸增加的趨勢而變的更大。 雖然一饋入室200中可使用複數個處理室3〇〇以減少FPD製造裝置佔據 的面積(如圖4 ’ 5所示），此方法也產生一問題即負載鎖室100四周有未使 用的空間。 【發明内容] 因此本發明的—目的是提供-種FPD製造裝置，其包括-負载鎖室，能 大巾田減少將基板載入負載鎖室及將基板從負載鎖室卸載所需時間。 本發明的另—目的是提供一種FPD製造裝置，其中在一負载鎖室側邊設 置一基板支架，以迅速使用安裝該FPD製造裝置的空間。 i 1274710 Μ 勢 • t 本發明的另一目的是提供一種基板饋入裝置，其能在短時間内穩定地饋 入一大型基板。 榻:據一特點，本發明提供一種平板顯示器製造裝置，包括：一負載鎖室， 一饋入室’及一處理室，該裝置尚包括··一基板入口，設置在負載鎖室將 負載鎖室與負載鎖室外界連通；複數個閘，設置在負載鎖室以開閉基板入 口；及複數個基板支撐件，分別接到該等閘以允許基板置於基板支撐件之 上表面。 _ 根據另一特點，本發日月提供—種平板顯示器製造裝置，包括一負載鎖室， 一饋入室及至少一處理室，其接到饋入室，該裝置尚包括：至少一基板支 撐單元，各設置在負載鎖室之側邊，其與接到饋入室之負載鎖室之側壁相 鄰’以便各基板支撐單元經由貞載鎖室之繼而連通貞載鎖室，該負載鎖 室與接到負載鎖室之負載鎖室之側壁相鄰，以便將一基板載入負载鎖室及 將該基板從負載鎖室卸载。 根據另—_，本發明提供—種平板顯示n製m包括：至少一負 载鎖室，用以從負載鎖室外接收一基板及將基板傳送到負載鎖室外，同時 又日地建立真工狀恶及一大氣狀態；二饋入室，互相分離且維持在一大 乳狀態，各饋人室從負载鎖室接收—基板，傳送基板至另_饋人室，從另 -饋入室接收基板，及傳送基板至負載鎖室；至少―處理室，接到各饋入 至且在處理至甲设置有一處理裝置，以執行一預設處理用於載入處理室 之基板；及一共同室，位於饋入室之間，且在與饋入室相鄰之共同室之相 對側壁分別設置有複數個閘，以便從饋入室接收基板及將基板饋入饋入室。 1274710 根據另i點，本㈣提供__造平油㈣之方法，制一平板顯 不裔製造线，«統包迪少二平行之平板顯示賴造裝置，各平板顯 示器製造裝膽一負_，令室，—树，及—共同室，位 於平板顯示ϋ製造裝置之饋人室之間，該方法包括以下步驟㈦檢查各負 载鎖室是_L_ ; b)若各_室正f操作，_各貞載鎖室之饋 入室供應-基板，從接到各輯鎖室之饋人室接收_完成處理之基板，及 處理該收到之基板，及若_負載鎖室不正f操作，經由另—負載鎖室向接 J另負載鎖至之饋入至供應一基板；c)根據接到另一負載鎖室之饋入室 操作而將基板傳送到共同室，該基板供應給制另—負載鎖室之饋入室； d)根據制不正㈡呆作之負載鎖室之饋入室操作，而將基板傳送到共同 室，該基板將基板從翻室卸載及鶴_叙基板讀理室，其接到與 不正常操作負載鎖室連接之饋人室；e)根據接到不正常操作之負载鎖室之 饋入至婦’轉完成處理之基紐處雜卸載，該處理室制不正常操 作之負載鎖室及傳送該域基板至翻室；及〇輯接到另_貞載鎖室之 饋入至#作’而將完成處理之基板從制室傳送到另_貞載鎖室。 【實施方式】 以下將茶考P付圖以說明本發明的典型實例，在以下說明巾對顧丨至3 中元件的各元件將以相同數字表示。 第一實例 參考圖4，5以說明根據本發明第一實例的FPD製造裝置。在圖4或5， FPD製造裝置包括負載鎖室1〇〇及饋入室2〇〇如同習知在圖j至3所示。Fp]) 12747101274710 Λ, '玖, invention description: [Technical Field of the Invention] The present invention relates to an apparatus for manufacturing a flat panel display. [Prior Art] I show a conventional flat panel display (10) manufacturing apparatus in Fig. 1 '2'. The FPD manufacturing apparatus includes a load lock to the 100' feed chamber 2A, and a process chamber 3A, which are connected in series to process the substrate for the cleavage. The load I 100 is connected to an external station to receive the substrate to be processed in the FPD manufacturing apparatus to be loaded into the wire board or to release the substrate processed in the FPD manufacturing apparatus to unload the substrate. The load lock to 1GG repeatedly switches between a vacuum state and an atmospheric state so that the load lock chamber is selectively connected to the external station. The feed to 200 is connected between the load lock chamber 1〇〇 and the process chamber 3〇〇. As shown in FIG. 2, the feeding chamber 200 is again set; t is located in the feeding robot 21〇 fed into the interior of the 200, so that the feeding chamber is finely used as an intermediate passage for feeding between the load lock chamber 100 and the processing chamber. The substrate is used for loading/unloading _ 3 substrate feeding to 200 to maintain a vacuum state so that the processing chamber 3 can be maintained in a vacuum state. Processed to 300 in Fig. 2, a processing device 31 is further provided to perform a desired process for loading the substrate of the process chamber 300. The side processing is performed, for example, in a vacuum state established in the processing chamber 3A. The latest aspect of the same-day FPD has a large size, which requires an increase in the size of the manufacturing equipment, and the size of the clean room, which is installed in the clean room. Therefore, the installation cost of the FPD manufacturing apparatus is greatly increased. Even if a single-FPD manufacturing apparatus is used, in order to reduce the manufacturing cost of the substrate for FpD and to consider the high mounting cost, it is necessary to add the efficiency of the FPD manufacturing apparatus. 1274710 Only the time required to load/unload each substrate due to the increase in substrate size, that is, the time required to load the substrate into the load lock chamber 100 and unload the substrate from the load lock 11 after the substrate processing is completed is also increased. . Therefore, it is highly desirable to reduce the time required to load/unload each substrate. At the same time, a substrate transfer device 400 is disposed adjacent to the load lock chamber 1 to transfer the substrate to the load lock chamber 100 as shown in FIG. The substrate transfer device 4 is driven under the pressure of money, and the substrate transfer device shed is configured to be fed back into the load lock chamber 100, and the substrate is stacked on the substrate storage case 5 adjacent to the wire transfer device 400. . However, when the substrate is fed into the load lock chamber 1 in the above manner, the size of the cleaning chamber (in which the FPD manufacturing device is mounted) is also increased because the mounting area of the FpD manufacturing apparatus is increased. As a result, the problem of an increase in the installation cost of the FH manufacturing apparatus is generated. Moreover, the manufacturing cost of the substrate manufactured by the manufacturing apparatus also increases. These problems have recently become more serious because the size of each chamber included in the FpD manufacturing apparatus has become larger due to the tendency of the FPD size to increase. Although a plurality of processing chambers 3 can be used in a feed-in chamber 200 to reduce the area occupied by the FPD manufacturing apparatus (as shown in FIG. 4'5), this method also creates a problem that the load lock chamber 100 has unused space around it. . SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide an FPD manufacturing apparatus that includes a load lock chamber that reduces the time required to load a substrate into a load lock chamber and unload the substrate from the load lock chamber. Another object of the present invention is to provide an FPD manufacturing apparatus in which a substrate holder is disposed on the side of a load lock chamber to quickly use a space in which the FPD manufacturing apparatus is mounted. i 1274710 势 Potential • Another object of the present invention is to provide a substrate feeding device capable of stably feeding a large substrate in a short time. According to one feature, the present invention provides a flat panel display manufacturing apparatus, comprising: a load lock chamber, a feed chamber and a processing chamber, the device further includes a substrate inlet, and the load lock chamber is disposed in the load lock chamber. Connected to the load lock outdoor boundary; a plurality of gates disposed in the load lock chamber to open and close the substrate inlet; and a plurality of substrate supports respectively connected to the gates to allow the substrate to be placed on the upper surface of the substrate support. According to another feature, the present invention provides a flat panel display manufacturing apparatus including a load lock chamber, a feed chamber and at least one processing chamber connected to the feed chamber, the apparatus further comprising: at least one substrate support unit, Each is disposed at a side of the load lock chamber adjacent to a sidewall of the load lock chamber connected to the feed chamber so that the substrate support units are further connected to the load lock chamber via the load lock chamber, and the load lock chamber is connected The sidewalls of the load lock chamber of the load lock chamber are adjacent to load a substrate into the load lock chamber and unload the substrate from the load lock chamber. According to another aspect, the present invention provides a flat panel display system comprising: at least one load lock chamber for receiving a substrate from the load lock outdoor and transferring the substrate to the load lock outdoor, and simultaneously establishing a real work evil And an atmospheric state; two feed chambers, separated from each other and maintained in a large milk state, each donor chamber receives a substrate from the load lock chamber, transfers the substrate to another feed chamber, receives the substrate from the other feed chamber, and transmits a substrate to the load lock chamber; at least a processing chamber, each of which is fed into and disposed in the processing unit to provide a processing device for performing a predetermined process for loading the substrate of the processing chamber; and a common chamber located in the feeding chamber A plurality of gates are disposed between the opposite sidewalls of the common chamber adjacent to the feed chamber to receive the substrate from the feed chamber and feed the substrate into the feed chamber. 1274710 According to the other point, this (4) provides the method of making __ flattening oil (4), making a flat display of the line of African origin, «Tong Bao Di Shao two parallel flat display display device, each flat panel display manufacturing jewels a negative _ The room, the tree, and the common room are located between the feeding rooms of the flat panel display manufacturing device, and the method comprises the following steps: (7) checking each load lock chamber is _L_; b) if each _ room is f operating, _ each of the feed chamber supply-substrate of the lock chamber receives the substrate from the feed chamber connected to each lock chamber, and processes the received substrate, and if the load lock chamber is not f operation, via In addition, the load lock chamber is fed to the load to supply a substrate; c) the substrate is transferred to the common chamber according to the operation of the feed chamber connected to the other load lock chamber, and the substrate is supplied to the other load. The feeding chamber of the lock chamber; d) transferring the substrate to the common chamber according to the operation of the feeding chamber of the load lock chamber which is not correct (2), the substrate unloading the substrate from the turning chamber and the crane-study substrate processing chamber To the feeder room connected to the load lock chamber that is not operating normally; e) according to the abnormal reception The loading lock chamber is fed to the base of the woman's completion processing, and the processing chamber is configured to operate the load lock chamber and transfer the domain substrate to the turn room; The lock chamber is fed to #作' and the finished substrate is transferred from the chamber to the other chamber. [Embodiment] The following is a typical example of the present invention, and the components of the components in the following description will be denoted by the same numerals. First Example Referring to Figures 4 and 5, there is illustrated an FPD manufacturing apparatus according to a first example of the present invention. In Fig. 4 or 5, the FPD manufacturing apparatus includes a load lock chamber 1 and a feed chamber 2 as shown in Figs. Fp]) 1274710
I ， 省 $ —置也包括至處理室，操作地接到貞载鎖室，較佳地是至 ’少二處理室300。在圖4的例子中，設置二個處理室綱。在圖5的例子中， 处里至300。負載鎖室1〇〇包括複數個成對設置的閘如圖6所示， 在圖中的例子’一閘對(其包括二個閘ii〇，i2〇)則包括在負載鎖室剛中。 基板入口 13〇形成在饋入室2〇〇對面的負載鎖室應側壁。間11〇，伽 可開啟及關閉基板入口 130。各閘110，120具有的面積大於基板入口 130 的面積]^凡全覆盖基板入口 13〇，因而使負載鎖室副的内部與負載鎖室 φ 100的外部隔開。因此間11〇，⑽藉由完全關閉基板入口聊而能維持負 載鎖室100内部在真空狀態。 在圖6，第一及第二閘110，12〇裝在負載鎖室1〇〇的側壁，其中形成基 板入口 130，以便閘110，120重疊。尤其是第一及第二閘11〇，12〇的配置 是當第二閘12〇定位成關閉基板入口 13〇的狀態時，第一閘11〇即定位成 與基板入口 130成分離狀態，及當第二閘120定位成與基板入口 13〇成分 離狀態時，第一閘110即定位成關閉基板入口 13〇的狀態。 ^ 第一及第二閘11G，120在負載鎖室謂側壁的相對側端鉸合負載鎖室 100，在_入口 130巾，分別地第-及第二閘110，120能互相獨立地鉸 合如圖6所。冑第一及第一閘110 ’ 120之一，例如第一閘11〇關閉基板 入口 130時，第一及第二閘110，120的另一者，例如第二閘12〇定位在一 位置其中第二閘120開啟基板入口 130，這是根據第二閘12〇的鉸合操作。 較佳地，各第一及第二閘11〇，120藉由鉸鏈單元14〇而鉸合負載鎖室1〇〇 的相關側端，如圖7所示。 -10-I, the provincial $-position is also included in the processing chamber, operatively connected to the load lock chamber, preferably to the second processing chamber 300. In the example of Fig. 4, two processing chambers are provided. In the example of Figure 5, it is up to 300. The load lock chamber 1A includes a plurality of gates arranged in pairs as shown in Fig. 6. In the example of the figure, a gate pair (which includes two gates ii, i2) is included in the load lock chamber. The substrate inlet 13 is formed in the load lock chamber side wall opposite the feed chamber 2A. At 11 〇, the gamma can open and close the substrate inlet 130. Each of the gates 110, 120 has an area larger than the area of the substrate inlet 130, and the entire area of the load lock chamber is spaced apart from the outside of the load lock chamber φ 100. Therefore, the inside of the load lock chamber 100 can be maintained in a vacuum state by completely closing the substrate entrance. In Fig. 6, the first and second gates 110, 12 are mounted on the side walls of the load lock chamber 1 , in which the substrate inlets 130 are formed so that the gates 110, 120 overlap. In particular, the first and second gates 11〇, 12〇 are arranged such that when the second gate 12〇 is positioned to close the substrate inlet 13〇, the first gate 11〇 is positioned to be separated from the substrate inlet 130, and When the second gate 120 is positioned to be separated from the substrate inlet 13, the first gate 110 is positioned to close the substrate inlet 13A. ^ The first and second gates 11G, 120 are hinged to the load lock chamber 100 at opposite side ends of the load lock chamber, and the first and second gates 110, 120 can be hinged independently of each other at the inlet 130 As shown in Figure 6. When one of the first and first gates 110' 120, for example, the first gate 11 turns off the substrate inlet 130, the other of the first and second gates 110, 120, such as the second gate 12, is positioned in a position The second gate 120 opens the substrate inlet 130, which is a hinge operation according to the second gate 12〇. Preferably, each of the first and second gates 11, 120 is hinged to the associated side end of the load lock chamber 1 藉 by the hinge unit 14 ,, as shown in FIG. -10-
I 1274710 * N 4 、的大氣狀態中，第-閘11〇鉸合地移動以開啟基板入口 13〇。接著在基板置 ^閘11〇的基板支撐件15〇上面的狀態下，將基板從負載鎖室1〇〇卸 载在上述基板處理操作中，在第二閘12〇上面的基板從第卸載， 其又在-狀祕待次_操作，其中待處理的新基板置於第二閘⑽上。因 此在第-閘110開啟之後立刻關閉第二閘12〇，以便開始新的處理。 因此載入及卸載基板所需的時間大幅減少，以大幅增加卿製造裝置的 基板處理效率。 • 第二實例 參考圖10或11以說明根據本發明第二實例的Fpj)製造裝置。在圖或 11 ’ FPD製造裝置包括負載鎖室1〇〇及饋入室2〇〇 πρρ製造裝置也包括至 少一處理室300，操作地接到負載鎖室2〇〇，較佳地是至少二處理室洲〇。 在圖10的例子中，設置二個處理室3〇〇。在圖η的例子中，設置三個處理 室 300 〇 基板支撐單元160設置在負載鎖室1〇〇的側邊，以便基板支撐單元ι6〇 ® 能通過饋入室200對面的負載鎖室1〇〇側壁而伸入負載鎖室1〇〇以及從負 載鎖室100退出。根據它的伸入及退出，基板支撐單元160將基板载入負 載鎖室100及將該基板從負載鎖室1〇〇卸載。在習知例子中，門設置在饋 入室200對面的負載鎖室1〇〇側壁，以便將一基板載入負載鎖室100，而裁 入的基板是從負載鎖室100經由饋入室200以串列方向送入處理室300。惟 根據本發明，基板支撐單元160設置在負載鎖室100與處理室300之間界 定的剩餘空間如圖10或11所示，以便能使FPD製造裝置的空間效率極大。 -13 - 1274710 4 屬 FPD製造裝置包括一單一基板支撐單元wo以便仲通過負載鎖室i〇Q的側 • 壁而載入/卸載基板，或包括二基板支撐單元160以便通過負載鎖室1〇〇的 相對侧壁而載入/卸載基板。 亦即在FPD製造裝置其包括二個處理室30〇如圖1〇所示，一單一基板支 撐單元160設置在負載鎖室1〇〇側邊，以便基板支撐單元16〇通過饋入室 200對面的負載鎖室1〇〇側壁而伸入負載鎖室1〇〇以及從負載鎖室1〇〇退 出。另一方面，在FPD製造裝置其包括三個處理室3〇〇如圖η所示，二個 ® 基板支撐單元設置在負載鎖室100的相對側，以便基板支撐單元 分別通過負載鎖室100的相關側壁而伸入負載鎖室100以及從負載鎖室1〇〇 退出。 當設置二基板支撐單元⑽時，在負載鎖室⑽的相_壁形成二基板 入口 170以允許基板支撐單元16〇分別通過負載鎖室1〇〇賴壁而伸入負 載鎖至100以及從負載鎖至100退出。而且在負載鎖室1〇〇的相對侧壁設 置二門（未示）以分別關閉相關的基板入口 170。在此例，必須控制門以便驅 •動-基板支撐單元時，基板支樓單元⑽對面的門關閉基板入口口0， 其形成在基板支樓單元擺相關的負載鎖室⑽側壁。亦即在負載鎖室100 的-側驅動-基板支撐單元⑽時，必須封閉負載鎖室⑽的另一側以便 在負載鎖室100的另一側建立真空。因此各基板支撐單元⑽最好操作地 連接基板支樓單元160對面的門，以便用門封閉負載鎖室雇。 *基板支撐單元⑽包括：基板支撐件，具有—讀面以支撑基板，及 複數個饋入器190，調適成沿著負載鎖室往復地移動基板支樓件⑽。 -14- 1274710 $ 4 ' .1 裝置400包括-多重接頭旋轉，在其-端具有一末端作用器。末端作用器 ，的上表面設置-支樓面以支撐-基板。因此能根據機械人的操作而饋入基 板。 另一方面，當FPD製造裝置以直線配置安裝時，在負载鎖室1〇〇四周即 安裝基板饋入傳輸系統傳輸裝置，以便將基板載入基板支撐單元16〇以及 將該基板從基板支撐單元160卸載。 由於根據此實例的FPD製造裝置適於處理大型基板，所以FpD製造裝置 ® 最好是沈積裝置或蝕刻裝置。 第三實例 參考圖14以說明根據本發明第二實例的FpD製造裝置。在圖14，FpD製 造裝置包括：負載鎖室1〇〇，饋入室2〇〇，及處理室3〇〇。基板支撐單元 分別设置在負載鎖室1〇〇的側邊，其與接到饋入室2〇〇的負載鎖室⑽側 壁相鄰，以便各基板支撐單元16〇通過負載鎖室1〇(M則壁而伸入負載鎖室 100以及從負载鎖室⑽退出，該負載鎖室⑽與接到饋入室测的負載鎖 至100側壁相鄰。FPD製造裝置也包括一基板饋入裝置6〇〇卩便將基板8(圖 17)載入各基板支料元⑽及將基板s從基板支撐單元⑽卸載。 。土板支樓單元16〇具有能支架的結構，如圖μ所示，各基板支撐單元 160月匕通過負载鎖$ 1〇〇的相關側壁而伸入負載鎖室⑽以及從負載鎖室 100退出’ 4負载鎖室1〇〇與接到饋入室的負載鎖室⑽侧壁相鄰。雖 」未不但間疋设置在負載鎖室1〇〇的相對侧壁，以便基板支撐單元⑽ 能分別往復地移動通過閘以進出負載鎖室1〇〇。因此在一條件下（其中基板 -16- 1274710 Μ Λ ••置於基板支撐單元160上），各基板支標單元⑽將-基板載入貞载鎖室100 以及將該基板從負载鎖室100卸载。 在圖14，根據此實例的基板饋入裝置6〇〇使用一傳輸系、统。在此傳輸系 統是指-麟續在二織（其互彳目吨_麟分離)之_人基板的系統。 基板饋入衣置6GG包括-基板饋入器，其延伸某一距離且以定速持續移動 以饋入置於其上的基板。 在圖15，基板饋入裝謂〇(其使用傳輸系統）包括滚輪支撐帶⑽，及複 I數個滾輪620接在滾輪支撐㈣〇之間同時互載入模均等地分離。各滾輪 620有大於滾輪支樓帶61〇厚度的直徑，以便滾輪62〇的上表面位於比滾 輪支樓帶610高的位置。因此當基板置於基板饋入裝置_上面時，滚輪 620即支撐板如圖17所示，在此狀態，滾輪61〇旋轉即可饋入基板。 滾輪620可獨立地旋轉，較佳的各滾輪62〇可順向及逆向旋轉，以根據 順向旋轉而饋入基板至基板支撐單元16〇以載入基板，及根據逆向旋轉而 將基板從基板支撐單元16〇卸載。 在Θ 16基板饋入衣置β〇〇可垂直移動以便將一基板從基板饋入裝置 傳送到基板支撐單元16〇。 亦即如圖17所示，在一情況當基板饋入裝置600向下移動時(其中基板 支樓件180插入基板饋入裝置600的滾輪620與基板S界定的空間），能傳 运基板s到基板支樓件18〇。在此狀態，操作基板支撐單元⑽以饋入基板 S至負載鎖室1〇〇。 當一對基板支撐單元160設置在負載鎖室1〇〇的相對側，該負載鎖室1〇〇 -17 - 1274710 « ^ 4 . 與接到饋入室200的負載鎖室100側壁相鄰，則FPD製造裝置最好包括一 對基板饋入裝置600分別設置在負載鎖室1〇〇的相對側以饋入基板s至相 關的基板支撐單元160如圖14所示。而且各基板饋入裝置6〇〇必須延伸至 少至一位置，其中基板饋入裝置6〇〇與相關基板支撐單元16〇移動的路徑 重豐。该路控將稱為基板支標單元移動路徑。 尤其是如圖16，17所示，最好在各基板饋入裝置6〇〇的一端設置基板阻 擋件630以防止饋入期望位置（如上述的重疊位置）的基板s進一步的移 修動。當沿著基板饋入裝置600上表面饋入的基板s到達期望位置時，基板s 即接觸阻擋件630其又防止基板S的進一步移動。最好在各基板饋入裝置 600的另-端設置另-基板阻擋件_，以防止基板卸載操料基板的過度 移動。 以下將使用基板饋入裝置600以說明將基板s載入負載鎖室1〇〇及將基 板S從負載鎖室仰載的過程。以下說明將配合_例子，其中基板饋入 裝置600包括二個基板饋入單元，亦即橫向基板饋入單元嶋及縱向基板 •饋入單元600b。 當期望載入基板S時，橫向基板鎖入單元600a先向下移動以允許基板支 樓單元⑽自由地機。接絲板支料元戰其已定位在貞載鎖室刪 且從負載魅⑽向外移動，崎基板支撐單元⑽與縱向基板饋入單元 6〇〇b重疊。在此狀態’縱向基板饋入單元·b向上移動以定位基板支撐件 180的各部分在縱向基板饋入單元祕的相鄰滾輪之間如㈣所示。 接著縱向基板饋入單元嶋從橫向基板饋入單元_a接收一待處理基 '18- 1274710 ' *於根據此實例共同室期是包括在™製造系統中，所以此卿製造 系統在饋入室2〇〇a及200b之一接到負載鎖室時仍能操作。 以下將參考圖21以說明根據此實姻以操作FPD製造系統的方法。為了 利於說明’以下的說明將配合一例來敘述，其中FpD製造系統包括二個FpJ) 製造裝置，其稱為第一及第二FPD製造裝置。 首先將說明二個FPD製造裝置正常操作時，FpD製造系統的操作。 φ "又置在^基板供應裔棚中的外部基板供應機械人向各FPD製造 裝置la及lb供應基板，同時移動到一位置其中設置有FPD製造裝置la戒 lb，及接收完成處理過的基板。 例如外部基板供應機械人410先傳送待處理的第一基板到第一 FpD製造 裝置la的負載鎖室l〇〇a。第一負載鎖室施收到第一基板後，第一間闕 120a即關閉。在此狀態，泵激第一負載鎖室1〇〇a以便在其中建立真空。在 第-負載鎖室100a建立真空後，位於第一負載鎖室驗與第一饋入室爹 _之間的第二閘閥220a即接收載入第一負載鎖室1〇〇a中的第一基板，及將 該第一基板傳送到第一處理室300a。 接著在第一處理室300a中執行第一基板期望的處理。 同時外部基板供應機械人410移動到與第一 FpD製造裝置la相鄰的第二 FPD製造裝置lb，及將待處理的第二基板傳送到第二FPD製造裴置比的負 載鎖室100b。第二FPD製造裝置lb相關的基板傳送操作與第一 FpD製造裝 置la相關的基板傳送操作相同。雖然在第二FpD製造裝置lb的處理室3〇〇b -22> 1274710 Λ ' 4 中執行第二基板的期望處理，但外部基板供應機械人41〇則選擇的第一基 板（其已在第一 FPD製造裝置ia中處理過），而外部基板供應機械人41〇又 將第一基板饋入次一處理站。 當共同室700設置成處理室時，饋入室2〇〇a及2〇〇b中設置的饋入機械 人210a及210b即向共同室700供應基板以便在其中處理該等待處理的基 板。 現在將說明一 FPD製造裝置不正常操作時，FPD製造系統的操作。 • 為了利於說明，以下的說明將配合一例來敘述，其中第一 FPD製造裝置 的負載鎖室100a故障。 外部基板供賴械人410首先麟處理的第—基板傳賴正常操作的第 二負載鎖室臟。在第二饋入室2_巾的第二讀入機械人鳩接收第一 基板及傳送第-基板到第二處理室讓。歸在第二處理室襲中執行第 -基板的期望處理。同時又將第二基板送人第二負載鎖室臟。當然第二 負載鎖室100b可以在已供應複數個基板的狀態中。第二饋入機械人襲 鲁接著從第二負載鎖室1_接收第二基板，及傳送第二基板到共同室糊。 接著第-饋入室200a中的第-饋入機械人210a從共同室糊接收第二基 板’及傳送第二基板到第-處理室施，其又執行第二基板的期望處理。 在第二基板處理執行期間完成第一基板執行的處理時，第二饋入機械人 210b從第二處理室3_選擇第一基板，及經由第二負載鎖室臟而將第 -基板從外部域U人機械人施接著將第三紐送人第二處理室 300b。雖然在第二處理室屬中執行第三基板的處理，但第一饋入機械人 -23 - 4 1274710 i t 210a將第二基板從第一處理室3〇〇a中卸載，及將第二基板饋入共同室 * 700。接著第二饋入機械人210b經由第二負載鎖室l〇〇b而將載入共同室7〇〇 中的第二基板從外部卸載，及接著將第四基板送入共同室700。 因此根據上述操作的重覆即使在任一負載鎖室發生不正常情況時，仍可 使用所有的處理室。當FPD製造系統包括複數個並聯FPD製造裝置時，即 可提高FPD製造系統的效率，這是因為即使各fpd製造裝置中設置的處理 室數目不足以處理增加的基板數目，或因至少任一處理室的故障而產生不 φ 足時’使用相鄰FPD製造裝置中設置的處理室即可去除該不足。 由以上說明可知本發明提供許多優點。 亦即，根據本發明的第一實例，使用負載鎖室（其具有二個閘）以大幅減 少在大氣下載入/卸載基板所需時間，所以能提高基板處理的效率。 當使用根據本發明第二實例的基板支撐單元時，能減少將基板載入負載 鎖室以及將該基板從負載鎖室卸載所需時間，及簡化饋入基板中使用的裝 置結構。 • 根據本發明第二實例，儘管事實上FPD製造裝置的體積較大，仍可使安 裝有FPD製造裴置的空間使用效率極大。 根據本發明第三實例，饋入基板中使用的裝置較簡單，以便能減少裝置 的製造成本以提高基板饋入的效率，及減少饋入基板所需時間，因而增加 基板生產的效率。 在根據本發明第四實例的fpd製造系統中，共同室設置在相鄰饋入室之 間以便饋入室相關的FPD製造裝置能經由共同室而傳送基板。因此能減少 -24- 1274710 λ t * FPD製造系統佔據清潔室的面積，同時增加FPD製造系統的操作效率。 / 雖然已為了敘述目的而說明本發明的較佳實例，熟習此項技藝者可了 解可以在不違反後附申請專利範圍揭示的本發明精神及範圍下，作各種 良，添加及替代。 x 【圖式簡單說明】 由以上詳細說明且配合附圖已了解本發明的上述目的及其它特徵與優 點，其中： 圖1是一示意平面圖以說明一習知FPD製造裝置； 圖2是該習知FPD製造裝置的示意側視圖，以說明該習知製造裝置的 ⑩組成元件； 圖3是该習知FPD製造裝置的示意平面圖，以說明該習知FpD製造裝置的 組成元件的操作； 圖4，5分別說明根據本發明第一實例的FpD製造裝置的不同配置； 圖6是根據本發明第一實例的FPD製造裝置的示意平面圖，以說明裝在負 載鎖室中的閘； 圖7疋根據本發明第一實例的FpD製造裝置的示意立體圖，以說明接到各 ®閘的基板支撐件； 圖8是一示意平面圖以說明基板支撐件的操作； 圖9是一示意側視圖以說明具多層基板支撐件結構的閘，這是根據本發明 的一實例其改良自本發明的第一實例； 圖10，U是示意平面圖，以分別說明根據本發明第二實例的FPD製造裝置 的不同配置； 圖12是一示意立體圖以說明根據本發明第二實例的閘； -25- 1274710 圖13是一示意立體圖以說明根據本發明第二實例的基板支撐件，其接到閘，· - 圖14疋一示思平面圖以說明根據本發明第三實例的fpd製造裝置； 圖15是一立體圖以說明樹康本發明第三實例的基板饋入裝置的一部分； 圖16是一示意側視圖以說明基板饋入裝置，· 圖17是一示意側視圖以說明基板饋入裝置的操作； 圖18，19，20是示意平面圖以分別說明根據本發明第四實例的FpD製造裝 置的不同配置；及 #圖21是-流程圖以說明根據本發明用以操作平板顯示器製造系統的方法。 【元件符號說明】 la，lb FPD製造裝置 100，100a，100b 負載鎖室 110 ， 120 閘 120a，120b，200，200a，200b 饋入室 130，170基板入口 # 140鉸鏈單元 142鉸鏈元件 150，150a，150b，150c，180 基板支撐件 152基板接觸元件 154支撐臂 160基板支撐單元 190 饋入器 -26- 1274710 I * * ' * ' 192導執 ~ 194導塊 210，210a，210b饋入機械人 300, 300a，300b 處理室 310處理裝置 400基板傳輸裝置 410 外部基板供應機械人 φ 420 軌 500基板儲存盒 600基板饋入裝置 600a橫向基板饋入單元 60 Ob縱向基板饋入單元 610 滾輪支撐帶 620 滾輪 φ 630基板阻擋件 700 共同室 710 載入模 720a，720b 閘閥 S基板In the atmospheric state of I 1274710 * N 4 , the first gate 11〇 is hingedly moved to open the substrate inlet 13〇. Then, the substrate is unloaded from the load lock chamber 1〇〇 in the substrate processing operation in a state where the substrate is placed on the substrate support 15〇, and the substrate on the second gate 12〇 is unloaded from the first. In addition, the operation is performed in which the new substrate to be processed is placed on the second gate (10). Therefore, the second gate 12 is closed immediately after the first gate 110 is opened to start a new process. Therefore, the time required to load and unload the substrate is greatly reduced to greatly increase the substrate processing efficiency of the manufacturing apparatus. • Second Example Referring to FIG. 10 or 11 to explain an Fpj) manufacturing apparatus according to a second example of the present invention. In the Figure or 11 'FPD manufacturing apparatus comprising a load lock chamber 1〇〇 and a feed chamber 2〇〇πρρ manufacturing apparatus also includes at least one processing chamber 300 operatively coupled to the load lock chamber 2〇〇, preferably at least two Room continent. In the example of Fig. 10, two processing chambers 3 are provided. In the example of FIG. n, three processing chambers 300 are provided. The substrate supporting unit 160 is disposed on the side of the load lock chamber 1〇〇 so that the substrate supporting unit ι6〇® can pass through the load lock chamber 1 opposite the feeding chamber 200. The side walls extend into the load lock chamber 1 and exit from the load lock chamber 100. The substrate supporting unit 160 loads the substrate into the load lock chamber 100 and unloads the substrate from the load lock chamber 1 according to its insertion and exit. In a conventional example, the door is disposed on the side wall of the load lock chamber 1 opposite the feed chamber 200 to load a substrate into the load lock chamber 100, and the cut substrate is fed from the load lock chamber 100 via the feed chamber 200. The column direction is fed into the processing chamber 300. According to the present invention, the remaining space defined by the substrate supporting unit 160 between the load lock chamber 100 and the processing chamber 300 is as shown in Fig. 10 or 11, so that the space efficiency of the FPD manufacturing apparatus can be made extremely large. - 13 - 1274710 4 The FPD manufacturing apparatus includes a single substrate supporting unit for loading/unloading the substrate through the side wall of the load lock chamber i〇Q, or including two substrate supporting units 160 for passing through the load lock chamber 1〇 The substrate is loaded/unloaded with the opposite side walls of the crucible. That is, in the FPD manufacturing apparatus, which includes two processing chambers 30, as shown in FIG. 1A, a single substrate supporting unit 160 is disposed on the side of the load lock chamber 1〇〇 so that the substrate supporting unit 16 is opposed to the opposite side of the feeding chamber 200. The load lock chamber 1 〇〇 extends into the load lock chamber 1〇〇 and exits from the load lock chamber 1〇〇. On the other hand, in the FPD manufacturing apparatus, which includes three processing chambers 3, as shown in FIG. 11, two ® substrate supporting units are disposed on opposite sides of the load lock chamber 100 so that the substrate supporting units respectively pass through the load lock chamber 100. The associated side walls extend into and out of the load lock chamber 100. When the two substrate supporting unit (10) is disposed, the two substrate inlets 170 are formed in the phase-wall of the load lock chamber (10) to allow the substrate supporting unit 16 to extend into the load lock to and from the load through the load lock chamber 1 respectively. Lock to 100 to exit. Further, two doors (not shown) are provided on opposite side walls of the load lock chamber 1 to respectively close the associated substrate inlet 170. In this case, when the door must be controlled to drive the substrate support unit, the door opposite the substrate branch unit (10) closes the substrate inlet 0, which is formed in the side wall of the load lock chamber (10) associated with the substrate branch unit. That is, when the -side drive-substrate support unit (10) of the load lock chamber 100 is driven, the other side of the load lock chamber (10) must be closed to establish a vacuum on the other side of the load lock chamber 100. Thus, each of the substrate support units (10) is preferably operatively coupled to the door opposite the substrate sub-unit unit 160 for closing the load lock chamber with a door. * The substrate support unit (10) includes a substrate support having a read surface to support the substrate, and a plurality of feeders 190 adapted to reciprocally move the substrate support member (10) along the load lock chamber. -14- 1274710 $ 4 ' .1 The device 400 includes a multi-joint rotation with an end effector at its end. The upper surface of the end effector is provided with a branch floor to support the substrate. Therefore, the substrate can be fed in accordance with the operation of the robot. On the other hand, when the FPD manufacturing apparatus is installed in a straight line configuration, a substrate feeding transmission system transfer device is mounted around the load lock chamber 1 to load the substrate into the substrate supporting unit 16 and support the substrate from the substrate. Unit 160 is unloaded. Since the FPD manufacturing apparatus according to this example is suitable for processing a large substrate, the FpD manufacturing apparatus ® is preferably a deposition apparatus or an etching apparatus. Third Example Referring to Figure 14 to explain an FpD manufacturing apparatus according to a second example of the present invention. In Fig. 14, the FpD manufacturing apparatus includes a load lock chamber 1〇〇, a feed chamber 2〇〇, and a process chamber 3〇〇. The substrate supporting units are respectively disposed at the side of the load lock chamber 1〇〇, which is adjacent to the side wall of the load lock chamber (10) connected to the feed chamber 2〇〇, so that the substrate support units 16 〇 pass through the load lock chamber 1〇 (M is The wall extends into and out of the load lock chamber 100, and the load lock chamber (10) is adjacent to the load lock connected to the feed chamber to the side wall of the 100. The FPD manufacturing apparatus also includes a substrate feed unit 6〇〇卩The substrate 8 (Fig. 17) is loaded into each substrate support unit (10) and the substrate s is unloaded from the substrate support unit (10). The soil plate support unit 16 has a structure capable of supporting, as shown in Fig. The unit 160 伸 extends into the load lock chamber (10) through the associated side wall of the load lock $1〇〇 and exits from the load lock chamber 100 '4 load lock chamber 1 相邻 adjacent to the load lock chamber (10) side wall connected to the feed chamber Although not only the opposite side walls of the load lock chamber 1〇〇 are disposed, so that the substrate supporting unit (10) can reciprocally move through the gate to enter and exit the load lock chamber 1〇〇. Therefore, under one condition (wherein the substrate - 16- 1274710 Μ Λ •• placed on the substrate supporting unit 160), The substrate sizing unit (10) loads the substrate into the load lock chamber 100 and unloads the substrate from the load lock chamber 100. In Fig. 14, the substrate feed device 6 according to this example uses a transmission system. The transmission system refers to the system of the _ human substrate that the lining continues to be in the second woven fabric. The substrate feeding device 6GG includes a substrate feeder that extends a certain distance and continues at a constant speed. Moving to feed the substrate placed thereon. In Fig. 15, the substrate feeding device (which uses the transmission system) includes a roller support belt (10), and a plurality of rollers 620 are connected between the roller supports (four) and simultaneously The loading molds are equally separated. Each roller 620 has a diameter greater than the thickness of the roller support belt 61〇, so that the upper surface of the roller 62〇 is located higher than the roller support belt 610. Therefore, when the substrate is placed on the substrate feeding device _ In the above, the roller 620, that is, the support plate is as shown in Fig. 17. In this state, the roller 61 can be rotated to feed the substrate. The roller 620 can be rotated independently, and the preferred rollers 62 can be rotated in the forward and reverse directions. Feeding the substrate to the substrate supporting unit 16 according to the forward rotation The substrate is loaded into the substrate, and the substrate is unloaded from the substrate supporting unit 16 according to the reverse rotation. The substrate is fed in the Θ 16 substrate and can be moved vertically to transfer a substrate from the substrate feeding device to the substrate supporting unit 16 . That is, as shown in FIG. 17, in a case where the substrate feeding device 600 moves downward (in which the substrate branch member 180 is inserted into the space defined by the roller 620 of the substrate feeding device 600 and the substrate S), the substrate s can be transported to The substrate supporting member 18 is. In this state, the substrate supporting unit (10) is operated to feed the substrate S to the load lock chamber 1A. When a pair of substrate supporting units 160 are disposed on the opposite side of the load lock chamber 1〇〇, the load The lock chamber 1〇〇-17 - 1274710 « ^ 4. With the side wall of the load lock chamber 100 connected to the feed chamber 200, the FPD manufacturing apparatus preferably includes a pair of substrate feed devices 600 respectively disposed in the load lock chamber 1 The opposite side of the crucible is fed into the substrate s to the associated substrate supporting unit 160 as shown in FIG. Further, each of the substrate feeding means 6 must extend to at least one position in which the path of the substrate feeding means 6 and the associated substrate supporting unit 16 is heavy. This road control will be referred to as a substrate branch unit moving path. In particular, as shown in Figs. 16, 17, it is preferable to provide a substrate stopper 630 at one end of each of the substrate feeding means 6'' to prevent further movement of the substrate s fed into a desired position (e.g., the above-described overlapping position). When the substrate s fed along the upper surface of the substrate feeding device 600 reaches the desired position, the substrate s, that is, the contact stopper 630, in turn prevents further movement of the substrate S. Preferably, a further substrate stopper _ is provided at the other end of each substrate feeding device 600 to prevent excessive movement of the substrate unloading of the substrate. The substrate feeding device 600 will be used hereinafter to illustrate the process of loading the substrate s into the load lock chamber 1 and pushing the substrate S from the load lock chamber. The following description will be incorporated as an example in which the substrate feeding device 600 includes two substrate feeding units, that is, a lateral substrate feeding unit 嶋 and a vertical substrate • feeding unit 600b. When it is desired to load the substrate S, the lateral substrate locking unit 600a is first moved downward to allow the substrate building unit (10) to freely machine. The wire board support element warfare has been positioned in the load lock chamber and moved outward from the load charm (10), and the sacrificial substrate support unit (10) overlaps with the vertical substrate feed unit 6〇〇b. In this state, the longitudinal substrate feeding unit·b is moved upward to position the respective portions of the substrate support member 180 between the adjacent rollers of the longitudinal substrate feeding unit, as shown in (d). Then, the vertical substrate feeding unit 接收 receives a to-be-processed base '18-1274710' from the horizontal substrate feeding unit_a. * According to this example, the common chamber period is included in the TM manufacturing system, so the manufacturing system is in the feeding chamber 2 One of 〇〇a and 200b can still operate when connected to the load lock chamber. A method of operating an FPD manufacturing system according to this actuality will be described below with reference to FIG. For the sake of explanation, the following description will be described with reference to an example in which the FpD manufacturing system includes two FpJ manufacturing devices, which are referred to as first and second FPD manufacturing devices. First, the operation of the FpD manufacturing system when the two FPD manufacturing apparatuses are normally operated will be explained. φ "An external substrate supply robot placed in the substrate supply shed supplies the substrate to each of the FPD manufacturing devices 1a and 1b, and moves to a position where the FPD manufacturing device la or lb is disposed, and the received processing is completed. Substrate. For example, the external substrate supply robot 410 first transfers the first substrate to be processed to the load lock chamber 10a of the first FpD manufacturing device 1a. After the first load lock chamber receives the first substrate, the first port 120a is closed. In this state, the first load lock chamber 1A is pumped to establish a vacuum therein. After the vacuum is established in the first load lock chamber 100a, the second gate valve 220a located between the first load lock chamber and the first feed chamber 爹_ receives the first substrate loaded into the first load lock chamber 1A. And transferring the first substrate to the first processing chamber 300a. The desired processing of the first substrate is then performed in the first processing chamber 300a. At the same time, the external substrate supply robot 410 moves to the second FPD manufacturing apparatus 1b adjacent to the first FpD manufacturing apparatus 1a, and transfers the second substrate to be processed to the load lock chamber 100b of the second FPD manufacturing aspect ratio. The substrate transfer operation associated with the second FPD manufacturing apparatus 1b is the same as the substrate transfer operation associated with the first FpD manufacturing apparatus 1a. Although the desired processing of the second substrate is performed in the processing chamber 3〇〇b-22> 1274710 Λ ' 4 of the second FpD manufacturing apparatus 1b, the external substrate supply robot 41 selects the first substrate (which is already in the The FPD manufacturing apparatus ia is processed, and the external substrate supply robot 41 feeds the first substrate to the next processing station. When the common chamber 700 is disposed as a processing chamber, the feeding robots 210a and 210b provided in the feeding chambers 2a and 2B supply the substrate to the common chamber 700 to process the substrate to be processed therein. The operation of the FPD manufacturing system when an FPD manufacturing apparatus is not operating normally will now be described. • For the purpose of explanation, the following description will be described with reference to an example in which the load lock chamber 100a of the first FPD manufacturing apparatus is malfunctioning. The external substrate is supplied to the first substrate of the robot 410 to pass the second load lock chamber which is normally operated. The second reading robot in the second feeding chamber 2_the towel receives the first substrate and conveys the first substrate to the second processing chamber. The desired processing of the first substrate is performed in the second processing chamber. At the same time, the second substrate is sent to the second load lock chamber. Of course, the second load lock chamber 100b can be in a state in which a plurality of substrates have been supplied. The second feed robot then receives the second substrate from the second load lock chamber 1_ and transfers the second substrate to the common chamber paste. The first-feeding robot 210a in the first-feeding chamber 200a then receives the second substrate' from the common chamber paste and transfers the second substrate to the first processing chamber, which in turn performs the desired processing of the second substrate. When the processing performed by the first substrate is completed during the execution of the second substrate processing, the second feeding robot 210b selects the first substrate from the second processing chamber 3_, and removes the first substrate from the outside via the second load lock chamber The domain U-man robot then delivers the third button to the second processing chamber 300b. Although the processing of the third substrate is performed in the second processing chamber genus, the first feeding robot -23 - 4 1274710 it 210a unloads the second substrate from the first processing chamber 3A, and the second substrate Feed into the common room* 700. The second feed robot 210b then unloads the second substrate loaded into the common chamber 7A from the outside via the second load lock chamber 10b, and then feeds the fourth substrate into the common chamber 700. Therefore, according to the repetition of the above operation, all the processing chambers can be used even when an abnormality occurs in any of the load lock chambers. When the FPD manufacturing system includes a plurality of parallel FPD manufacturing apparatuses, the efficiency of the FPD manufacturing system can be improved because even if the number of processing chambers provided in each fpd manufacturing apparatus is insufficient to handle the increased number of substrates, or at least any processing If the failure of the chamber is not φ, the deficiencies can be removed by using the processing chamber provided in the adjacent FPD manufacturing apparatus. It will be apparent from the above description that the present invention provides many advantages. That is, according to the first example of the present invention, the load lock chamber (which has two gates) is used to drastically reduce the time required to download/unload the substrate at the atmosphere, so that the efficiency of substrate processing can be improved. When the substrate supporting unit according to the second example of the present invention is used, the time required for loading the substrate into the load lock chamber and unloading the substrate from the load lock chamber can be reduced, and the structure of the device used for feeding into the substrate can be simplified. • According to the second example of the present invention, despite the fact that the FPD manufacturing apparatus is bulky, the space in which the FPD manufacturing apparatus is mounted can be made extremely efficient. According to the third example of the present invention, the means for feeding into the substrate is relatively simple, so that the manufacturing cost of the device can be reduced to increase the efficiency of substrate feeding, and the time required for feeding into the substrate can be reduced, thereby increasing the efficiency of substrate production. In the fpd manufacturing system according to the fourth example of the present invention, the common chamber is disposed between adjacent feed chambers so that the feed chamber-related FPD manufacturing apparatus can transfer the substrates via the common chamber. Therefore, the -24-1274710 λ t * FPD manufacturing system can be reduced to occupy the clean room area while increasing the operational efficiency of the FPD manufacturing system. While the preferred embodiment of the present invention has been described for the purposes of illustration, it will be understood that BRIEF DESCRIPTION OF THE DRAWINGS The above and other features and advantages of the present invention will become apparent from the Detailed Description of the Drawings. A schematic side view of the FPD manufacturing apparatus is illustrated to illustrate the constituent elements of the conventional manufacturing apparatus; FIG. 3 is a schematic plan view of the conventional FPD manufacturing apparatus to illustrate the operation of the constituent elements of the conventional FpD manufacturing apparatus; 5, respectively, illustrate different configurations of the FpD manufacturing apparatus according to the first example of the present invention; FIG. 6 is a schematic plan view of the FPD manufacturing apparatus according to the first example of the present invention to explain the brakes installed in the load lock chamber; A schematic perspective view of an FpD manufacturing apparatus of a first example of the present invention to illustrate a substrate support member connected to each of the ® gates; Fig. 8 is a schematic plan view for explaining the operation of the substrate support member; and Fig. 9 is a schematic side view to illustrate a plurality of layers a gate of a substrate support structure, which is a first example of the improvement according to an embodiment of the present invention; FIG. 10, U is a schematic plan view, respectively, to explain according to the present invention Fig. 12 is a schematic perspective view for explaining a gate according to a second example of the present invention; -25-1274710. Fig. 13 is a schematic perspective view for explaining a substrate support member according to a second example of the present invention. , which is connected to the gate, and is a plan view of the fpd manufacturing apparatus according to the third example of the present invention; FIG. 15 is a perspective view for explaining a part of the substrate feeding device of the third example of the present invention; Figure 16 is a schematic side view for explaining a substrate feeding device, Fig. 17 is a schematic side view for explaining the operation of the substrate feeding device; Figs. 18, 19, and 20 are schematic plan views respectively illustrating a fourth example according to the present invention. Different configurations of FpD manufacturing apparatus; and FIG. 21 is a flow chart to illustrate a method for operating a flat panel display manufacturing system in accordance with the present invention. [Description of component symbols] la, lb FPD manufacturing apparatus 100, 100a, 100b load lock chamber 110, 120 gate 120a, 120b, 200, 200a, 200b feed chamber 130, 170 substrate inlet # 140 hinge unit 142 hinge element 150, 150a, 150b, 150c, 180 substrate support 152 substrate contact element 154 support arm 160 substrate support unit 190 feeder -26- 1274710 I * * ' * ' 192 guide ~ 194 guide block 210, 210a, 210b feeds the robot 300 300a, 300b processing chamber 310 processing device 400 substrate transfer device 410 external substrate supply robot φ 420 rail 500 substrate storage box 600 substrate feeding device 600a lateral substrate feeding unit 60 Ob vertical substrate feeding unit 610 roller support belt 620 roller Φ 630 substrate blocking member 700 common chamber 710 is loaded into the mold 720a, 720b gate valve S substrate