TWI274142B - Apparatus and method for sequentially measuring multiple optical parameters of birefringence material - Google Patents

Apparatus and method for sequentially measuring multiple optical parameters of birefringence material Download PDF

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TWI274142B
TWI274142B TW94100413A TW94100413A TWI274142B TW I274142 B TWI274142 B TW I274142B TW 94100413 A TW94100413 A TW 94100413A TW 94100413 A TW94100413 A TW 94100413A TW I274142 B TWI274142 B TW I274142B
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wave plate
optical
light
angle
electro
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TW94100413A
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TW200624776A (en
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Yu-Lung Lo
Jing-Fung Lin
Yu-Tsan Jeng
Hung-Wei Chih
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Univ Nat Cheng Kung
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Abstract

Apparatus and method for sequentially measuring multiple optical parameters of birefringence material and two-dimensional full field measurement are provided. The apparatus consists of an incident light source and an optical frame. The measurement method includes the following steps. Let the incident light sequentially pass the polarizer, electro-optical modulator, a first quarter-wave plate, an object under measurement, a second quarter-wave plate and an analyzer of, and then an optical detector receives the optical signal. Remove the first quarter-wave plate and pass the optical signal through a band pass filter and phase lock amplifier for signal processing. Then, obtain optical parameters such as main axis angle, phase delay, rank, thickness, refraction index of ordinary light and unordinary light respectively by employing an arithmetic unit to do calculation. When combined with CCD and electronic control device, the invention can act as a two-dimensional full field measurement apparatus and method.

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1274142 九、發明說明: 【發明所屬之技術領域】 本發明係一種順序量測雙折射材料多 -場量測之裝置及方法,主要係提供-種利用f予參數與二維全 '配合鎖城大器之量測裳置,並!^壯路徑外差干涉儀 率等多項光學參數;·由加人=與麵常光的折射 w刀八及雷批驻 為一種二維全場量測裝置及方法。 i 本鲞明亦 >【先前技術】 近年由於奈米科技的快速發展,使得具有雙折 的晶體或生化㈣,其絲參數解界的_令 = =趣,如具雙折射性的波片或液晶已經被大量使用在光2= 中’滅發展出-套可量測光學參數的量測架構是必铁的。、 2紅學制巾,共職外差干涉儀是—翻當穩定且 精準的董測技術,在此_下因為參考光和制光為共光程, 所以可必免因環境擾動造成的影響。為了測量待測物的雙^射 現象或晶體的相位延遲現像,通常會使用調變器以調變控制系 統之訊號,早在1974年,即有Serreze和Goldner等人揭露利 用電光调變器、(E-0 modulator )作為系統調變源量測雙折射材 料birefringence的方法;後來亦有shindo和Hanabusa等人揭 硌利用光彈調變器(Photoelastic modulator )作為系統調變源 而量測雙折射(birefringence)材料的方法,這兩個量測系統 1274142 得到的訊號都直接輸入至鎖相放大器中(Lock-in Amplifier) 〇 在1997年,陽明大學以葡萄糖(giucose)為試件,提出 - 一以同樣以外差干涉(heterodyne interference)為基本概念的 ' 量測方法,上述陽明大學所發展之圓偏振光的外差干涉儀 (circular heterodyne interferometer )可用來量測葡萄糖主軸由 於濃度變化形成的主轴旋轉變化量,Circular heterodyne interferometer是一種高靈敏度的相位變化量測系統,故可很精 修 確地測量到因光學性質變化造成的相位差,而此量測方法是以 塞曼雷射(Zeeman Laser)作為入射光源,產生兩頻率大小不 同的線性偏振光,作為系統調變源,利用偏振分光鏡 (polarizer beam splitter,PBS)來改變感測光的偏振狀態,並 同時進行合光干涉(coherence),以得一外差干涉訊號,但這 個方法需利用不同頻率大小的雷射作為入射光源,在量測上即 造成許多的不便。 春 另外Huang專人在1997提出一種Mach_Zehnder偏極干涉 儀,其係一種利用兩個聲光調變器來調變訊號形成的的雙迴路 系統的外差干涉術,可同時測量石英波片中尋常光和非尋常光 的折射率,但此法需特殊設計一楔形試片且要精確知道斜角的 角度’製造上不易光學架構上也相當複雜。 ;在2001年%等人利用類似橢圓偏光術的量測方式,接收 彳文待測物表面反射出的圓偏振光信號,此信號將會埋入相位 中,再利用相位儀(Phase_meter)將相位解析出來,由 12741421274142 IX. Description of the Invention: [Technical Field] The present invention is a device and method for sequentially measuring multi-field measurement of birefringent materials, mainly providing a kind of use of f-preparation parameters and two-dimensional full-fit cooperation The measurement of the big device is set, and! ^Strong path heterodyne interferometer rate and other optical parameters; · Addition of people = and the normal light refraction w knife eight and mine batch station is a two-dimensional full field measurement device and method. i 本明明>[Prior Art] In recent years, due to the rapid development of nanotechnology, it has a double-folded crystal or biochemical (4), and its silk parameter is bounded by _ ̄ = = interesting, such as birefringent wave plate Or the liquid crystal has been used extensively in the light 2 = 'developed out' - the measurement architecture of the set of measurable optical parameters is bound to iron. 2, Hongxue towel, the joint heterodyne interferometer is a stable and accurate Dong measurement technology, because the reference light and the light are the common optical path, so the impact caused by environmental disturbances must be avoided. In order to measure the phenomenon of the incident or the phase delay of the crystal, a modulator is usually used to modulate the signal of the control system. As early as 1974, Serreze and Goldner et al. disclosed the use of electro-optical modulators. (E-0 modulator) as a method for measuring the birefringence of birefringent materials by the system modulation source; later, Shindo and Hanabusa et al. used the photoelastic modulator as the system modulation source to measure the birefringence. (birefringence) material method, the signals obtained by the two measurement systems 1271442 are directly input into the lock-in amplifier (Lock-in Amplifier). In 1997, Yangming University proposed the use of glucose (giucose) as a test piece. With the same method of heterodyne interference as the basic concept, the circular heterodyne interferometer developed by Yangming University can be used to measure the spindle rotation caused by the concentration change of the glucose spindle. The amount of variation, Circular heterodyne interferometer is a highly sensitive phase change measurement system, so it can be very refined Correctly measuring the phase difference caused by the change of optical properties, and this measurement method uses Zeeman Laser as the incident light source to generate linearly polarized light with different frequency of two frequencies, which is used as a system modulation source. A polarizer beam splitter (PBS) is used to change the polarization state of the sensed light and simultaneously perform coherence to obtain a heterodyne interference signal. However, this method requires lasers of different frequency as the incident light source. In the measurement, it causes a lot of inconvenience. In addition, Huang et al. proposed a Mach_Zehnder polar interferometer in 1997, which is a heterodyne interferometry of a two-loop system using two acousto-optic modulators to modulate signals, which can simultaneously measure ordinary light in quartz wave plates. And the refractive index of unusual light, but this method requires a special design of a wedge-shaped test piece and it is necessary to know the angle of the bevel accurately. It is also difficult to manufacture optical structures. In 2001, % et al. used a measurement method similar to ellipsometry to receive a circularly polarized light signal reflected from the surface of the object to be tested. This signal will be buried in the phase, and then phased using a phase meter (Phase_meter). Parsed out by 1271442

Fresnel方程式的關係式可得此相位信號是折射率狀和肋的函 數,如此轉動待測物記錄兩個相位值,即可用兩個方程式來決 定兩個未知數。 在全場量測中,1987年Sasaki等人提出一套以弦波調變 搭配四相積分(f〇urintegrating_bucket)方法來量測物件表面 的輪廓。在2001年’ Dubois等人也同樣利用此方式來量測, 但Dubois等人亦討論到最佳的相位調變以及誤差所造的影 響。The relationship of the Fresnel equation can be obtained as a function of the refractive index and the rib. Thus, by rotating the object to be recorded and recording two phase values, two equations can be used to determine two unknowns. In the whole field measurement, in 1987, Sasaki et al. proposed a set of sine wave modulation combined with four-phase integral (f〇urintegrating_bucket) method to measure the contour of the surface of the object. In 2001, Dubois et al. also used this method to measure, but Dubois et al. also discussed the effects of optimal phase modulation and error.

以上方法中,其調變方式皆以介電材料致動器(ρζτ)來 ,機械式的調變機置,且需取得調變週期中的四張圖來做運 异’此處理方式略顯複雜。 在1998年,Chou等人也提出 、 左丁次的二維量測 法,其理論是利用到介電材料致動器(ρζτ) &移動待測物, 藉由單點量測來做掃描而擴展至二維量測的方式。 【發明内容】 上述習知裝置及方法無法-起量測出具雙折射特性材 主軸改變量、相位延遲量、快軸與慢軸折射率等光學表炎、 缺點,且其架構複雜。 予4為其 本發明係為一種順序量測雙折射材料多項光學參數壯 置,其裝置由包括-人射錢及1學架構,其中該光2 = 包括偏振片、電光調變器、第一又/4波片、第二Λ/4波^木 偏片、光偵測器、帶通濾波器、鎖相放大器和 男片二檢 件。 早凡等元 1274142 電光凋又為係為同源,而CCD所接受之光訊號係傳送 至一運算單元者。 本纟月之目的在提供—種架構簡單的量測裝置,其可順序 '查:又折射特性材料之主軸角度改變量、相位延遲量”皆 、 吊尤和非尋常光折射率等多項參數,並可使量測 精度更加提高。 1、,之目的亦疋提供一種量測方法,以順序量測具雙折 • ^特性材料之主軸改變量、相位延遲量、階數、厚度和尋常光 非寻^折射轉W參數,並可使量珊度更加提高。 、本《明之另—目的在提供-種二維全場量測之裝置及方 法,藉以求得全場主軸肖度和她延遲量。 【實施方式】 首先’晴残第-圖,本發明之裝置包括—人射光源⑴ 及-光學架構(2),其中該光學架包括偏振片(21) 、電光調變器 (22)〔 EO Modulator〕、第 _ λ /4 波片(23)、第二 λ /4 波片 • (24)、檢偏片(25)、光偵測器(26)、帶通濾波器(27)、鎖相放大 器(28)和運算單元(29)等元件。上述偏振⑽)與光行進方向爽 45角,電光賴益(22)的快軸方向則與光行進方向夾9〇。角。上 述第一又/4波片(23)與上述第二又/4波片㈣的主轴方向個別 與光行進方向夾45。及―45。角。檢偏片(25)與光行進方向夾角零 度。 實施時,待測物(Α)置於第一 λ/4波片(23)與第二λ/4波 片Ρ4)之間,使上述入射光源(1)依序經過偏振片(21)、該電光 1274142 72 _ 4(1 + a/(cos 2asin^)2 + (cos々)2 sin(^/ - tan-1 (cos2a tan β))) =Idc + R2 sin(^ ~ Φ2) (式 9) 其中及2代表為4dos2asin々)2 +(coSy^)2,Φ2代表為: tan'1 (cos 2α tan β) 器(28)量出 由步驟一可知主軸角度,所以經由鎖相放大 Φ2,可解析出相位遲延角度夕:In the above method, the modulation method is based on the dielectric material actuator (ρζτ), the mechanical modulation machine is set, and the four maps in the modulation period need to be obtained to make the difference. complex. In 1998, Chou et al. also proposed, Zuo Ding's two-dimensional measurement method, which uses the dielectric material actuator (ρζτ) & moving the object to be tested, and scans by single point measurement. And expand to the way of two-dimensional measurement. SUMMARY OF THE INVENTION The above conventional devices and methods are incapable of measuring the optical appearance and the disadvantages of the spindle change amount, the phase retardation amount, the fast axis and the slow axis refractive index, and the structure thereof is complicated. 4 is the invention for a sequential measurement of birefringent material multiple optical parameters, the device consists of including - human shooting and 1 learning architecture, wherein the light 2 = including polarizing plate, electro-optical modulator, first Also / 4 wave plate, second / 4 wave ^ wood partial film, light detector, band pass filter, lock-in amplifier and male two inspection parts. The first element is 1274142. The electro-optical light is also homologous, and the optical signal received by the CCD is transmitted to an arithmetic unit. The purpose of this month is to provide a simple measuring device that can sequentially check the parameters of the spindle angle change and the phase retardation of the refractive material, the hanging and the extraordinary refractive index. And the measurement accuracy can be further improved. 1. The purpose is also to provide a measurement method, which can measure the spindle change amount, phase delay amount, order, thickness and ordinary light non-linearity of the material. Finding the refraction to W parameter, and making the amount of the degree more improved. This "the other is the purpose of providing a two-dimensional full-field measurement device and method, in order to obtain the full-field spindle shaman and her delay. [Embodiment] Firstly, the device of the present invention comprises a human light source (1) and an optical structure (2), wherein the optical frame comprises a polarizing plate (21) and an electro-optical modulator (22). EO Modulator], _λ /4 wave plate (23), second λ /4 wave plate • (24), analyzer (25), photodetector (26), bandpass filter (27), Elements such as a lock-in amplifier (28) and an arithmetic unit (29). The above-mentioned polarization (10)) is 45 degrees cooler with the direction of light travel, and is electrically The fast axis direction of Laiyi (22) is 9〇 with the direction of travel of the light. The angle of the main axis of the first /4 wave plate (23) and the second /4 wave plate (4) is different from the direction of light travel. 45. and -45. Angle. The detection piece (25) is at an angle of zero to the direction of travel of the light. In implementation, the object to be tested (Α) is placed in the first λ/4 wave plate (23) and the second λ/4 wave plate. Ρ4), the incident light source (1) is sequentially passed through the polarizing plate (21), the electric light 1274142 72 _ 4 (1 + a / (cos 2asin^) 2 + (cos 々) 2 sin (^ / - tan -1 (cos2a tan β))) =Idc + R2 sin(^ ~ Φ2) where Equation 2 represents 4dos2asin々)2 +(coSy^)2, and Φ2 represents: tan'1 (cos 2α tan The β) (28) measures the spindle angle from step 1. Therefore, the phase delay angle can be resolved by the phase-locked amplification Φ2:

"tan-i)) cos 2α (3)階數 將第二圖所示裝置中的待測物㈧主軸固定在y軸方向,旅 將它沿光前進方向轉動一角度,使之如第三圖所示。 在第二圖中,待測物(A)為多階四分之波片(CVI,Model"tan-i)) cos 2α (3) The order of the object to be tested (8) in the device shown in the second figure is fixed in the y-axis direction, and the Brigade turns it in the direction of the light to make it as a third. The figure shows. In the second figure, the object to be tested (A) is a multi-order quarter-wave plate (CVI, Model

(式 10) Q:PM]63MQ4-R15),其分別旋轉—角度01與^,此純粹為了 改變光行走的光程,於公式(1〇)記錄其相位遲延角度A,(…與 舰}由射寅相放大裔(28)〔L〇ck七細p腿打〕才陳量測範圍 僅在-1财〜ISO◦,所以真正多階波片的相位延遲量為: 一、(式 n) 其中m為階數(為整數),為待測物的厚度,a是入射光波 長°且對應旋轉後的相位延遲量則為·· 12 1274142(Formula 10) Q: PM] 63MQ4-R15), which are respectively rotated - angles 01 and ^, which are purely for changing the optical path of the light travel, and the phase retardation angle A is recorded in the formula (1〇), (... with the ship} The range of the phase measurement is only in the range of -1 to ~ISO◦, so the phase delay of the true multi-order wave plate is: (Formula n) Where m is the order (integer), which is the thickness of the object to be tested, a is the wavelength of the incident light ° and the phase delay amount after the corresponding rotation is ·· 12 1274142

其中為了減化公式的複雜度, 略光在待測物(A)中行走時的因折射 另外將公式(11)整理為(1為111的 即可整理成In order to reduce the complexity of the formula, the refracting of the light when walking in the object to be tested (A), and the formula (11) are also arranged as (1 is 111)

(式 12) (式 13) 所以以小角度下旋轉,可忽 的影響。 [函數代入(式12)與(式13)中 (式 14) (4)厚度 、因為待測物(A)的階數決定了待測物⑷製作時的厚度, 所以在皆數後,下一個參數所要量的是待測物⑷的厚 度。在實驗過程中我們需要已知厚度的λ/2波片⑷以及λ/8 波片(5),其中,待測物(a)的材質須與λ/2波片(4)以及入/8 φ 波片相同。如第四圖所示,係先移除第一;1/4波片(23), 再將該λ/2波片(4)置於待測物(Α)與第二λ/4波片(24)之 間,使上述入射光源(1)依序經過偏振片(21)、該電光調變器 (22)、待測物(a)、又/2波片(4)和第二λ/4波片(24)、檢偏 片(25),接著以光偵測器(26)接受其光訊號,再將光訊號分別 、纟過f通滤波裔(27)和鎖相放大器(28)作訊號處理,最後經運 算單元(29)之運算。然後移除λ/2波片(4),如第五圖所示, 將該λ/8波片⑸置於待測物(Α)與第二λ/4波片(24)之間, 13 1274142 轴方所示裝置中的待測物(A)主軸固定在x 示。旋轉一肖产θΡτ⑴進方向轉動一角度,使之如第七圖所 差# 又矛、了改變光行走的光程外也改變了折射率的 是值,由(式⑼記錄其相位遲延心",可表示成:了斤射羊的 (〜峰¥(一(式 20) 因為有政折射率為ne、〜和^的函數,(式2〇)為〜、n。、 Θ和d的函數,若在給一定厚度的情況下,由(式u)和(式加) 兩個方程式就可解出兩個未知數,尋常光和非尋常光折射率㈨ & n〇) 〇 (6)二維全場量測 (6.1)影像處理部分: 由於CCD元件具有積分特性,本發明提供一種二維全場 影像處理演算法,在前揭(式6)由單點擴展至二維的範圍,可 表示成: Ιλ (t, X, y) = Idc (x, y) ~ Rx (x? y) ήη{ωί + θ{ (x> y)) (式 21) 將這個時變信號^連續積分三個四分之一的調變週期, 如第八圖所示。 其三次積分結果分別可表示成 (式 22) /•Γ/4 15 1274142 Γ2Γ/4 (式 23) &0,少)=ίΓ/4’ι(%,少,⑽ (式 24) 將(式22)與(式μ)相減’(式μ)又與(式μ)相減分別可得 21一1(以(式 25) (式 26) 最後將(式25)與(式26)相除取反正切函數(arctangem) 即可得二維關係下的相位值 (式 27) 所以應用CCD(31)搭配以上的影像處理演算求,可报成功 求解相位,如同之前用鎖相放大器鎖住相位一樣,如此再代入 (式7)或(式10)就能求得全場主軸角度和相位延遲量。 (6·2)電控裝置: 電控裝置如第九圖所示,在電控裝置⑺中,因為一 準型CCD⑻最高的觸發頻率為3() ,而_ = 為1 kHz ’因此需藉由外在的電控_部份來克服受限的取樣 頻率。本發明加上高_度可程式控㈣㈤〔肌〇,内建 2 MHz的石英震魅〕同時在不_位輸出ikHz^ 頻率,其巾10 Hz时外部轉咖⑼,域—料可克服 16 1274142 CCD(31)最高30 Frames/Sec的受限;而高複雜度可程式控制 器(32)輸出1 kHz到信號產生器(33),並調整信號產生器(33) 接受外部方波(external clock)模式,此時信號產生器(33)的 方波(Clock)來自高複雜度可程式控制器(32)並且輸出让沿 ; 的鋸齒波給電光調變器(22)進行調變機制後,再通過擴束器 (35),此步驟主要是確保觸發CCD(31)的信號與電光調變器(功 的信號能夠同源(同相位)。(Equation 12) (Equation 13) Therefore, rotation at a small angle can be affected suddenly. [Function substitution (Equation 12) and (Equation 13) (Equation 14) (4) Thickness, because the order of the object (A) determines the thickness of the object (4) when it is produced, so after all, The amount of one parameter is the thickness of the object (4) to be tested. In the course of the experiment, we need λ/2 wave plate (4) and λ/8 wave plate (5) with known thickness, wherein the material of the object to be tested (a) must be combined with λ/2 wave plate (4) and input /8 The φ wave plate is the same. As shown in the fourth figure, the first; 1/4 wave plate (23) is removed, and then the λ/2 wave plate (4) is placed on the object to be tested (Α) and the second λ/4 wave plate. Between (24), the incident light source (1) is sequentially passed through the polarizing plate (21), the electro-optical modulator (22), the object to be tested (a), the /2-wave plate (4), and the second λ. /4 wave plate (24), detector (25), then the optical detector (26) receives its optical signal, and then the optical signal, respectively, through the f-pass filter (27) and lock-in amplifier (28 ) for signal processing, and finally by the operation unit (29). Then, the λ/2 wave plate (4) is removed, and as shown in the fifth figure, the λ/8 wave plate (5) is placed between the object to be tested (Α) and the second λ/4 wave plate (24), 13 1274142 The object to be tested (A) in the device shown on the axis is fixed at x. Rotating a θ Ρ ( ( ( ( ( ( ( ( ( ( ( Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ ;, can be expressed as: a pound to shoot the sheep (~ peak ¥ (one (style 20) because the political refractive index is a function of ne, ~ and ^, (formula 2〇) is ~, n., Θ and d The function, if given a certain thickness, can solve two unknowns by the two equations (formula u) and (formula), ordinary light and extraordinary light refractive index (9) & n〇) 〇 (6) Two-dimensional full-field measurement (6.1) image processing part: Since the CCD element has integral characteristics, the present invention provides a two-dimensional full-field image processing algorithm, which is extended from a single point to a two-dimensional range (Formula 6). It can be expressed as: Ιλ (t, X, y) = Idc (x, y) ~ Rx (x? y) ήη{ωί + θ{ (x> y)) (Equation 21) Continuously integrate this time-varying signal ^ Three quarters of the modulation period, as shown in the eighth figure. The three integral results can be expressed as (Equation 22) /•Γ/4 15 1274142 Γ2Γ/4 (Equation 23) & 0, less) =ίΓ/4'ι(%, (10) (Equation 24) Subtracting (Expression 22) from (Formula μ) '(Formula μ) and Substituting (Formula μ) respectively to obtain 21 to 1 (to (Equation 25) (Equation 26) Finally ( Equation 25) and (Expression 26) are divided by the arctangem to obtain the phase value in the two-dimensional relationship (Equation 27). Therefore, the CCD (31) is used together with the above image processing calculation, and the phase can be successfully solved. As before, the phase is locked by the lock-in amplifier, so that the full-field spindle angle and phase delay amount can be obtained by substituting (Equation 7) or (Equation 10). (6·2) Electronic control device: Electronic control device In the ninth figure, in the electronic control unit (7), because the highest trigger frequency of a quasi-type CCD (8) is 3 () and _ = 1 kHz ', it is necessary to overcome the limitation by the external electronic control part. The sampling frequency. The invention adds high _ degree programmable (four) (five) [tendon, built-in 2 MHz quartz enchantment] simultaneously outputs the ikHz^ frequency at the _ bit, and the external turn coffee (9), domain - The material can overcome the limitation of 16 1274142 CCD (31) up to 30 Frames/Sec; while the high complexity programmable controller (32) outputs 1 kHz to the signal generator (33) and adjusts the signal generator (33) Subject to the external square mode, the square wave (Clock) of the signal generator (33) is from the high complexity programmable controller (32) and outputs the sawtooth wave of the edge to the electro-optic modulator (22). After the modulation mechanism, the beam expander (35) is used. This step is mainly to ensure that the signal of the CCD (31) is triggered and the electro-optical modulator (the signal of the work can be homologous (in phase).

# 在影像處理演算法中,須將調變信號週期〇〜I、ΐ〜Z 4 4 4 2Τ 3Τ 7〜丁做積分,若調變頻率為則CCD(31)的曝光 時間需選擇4F(45,並且再將觸發CCD(31)的d〇ck經過 相移an (34)移相奶及⑽。分別做積分,如此即得到三張影像強 又幻52 53,後續的影像處理演算法就以此三張強度來做計 算。 • 本發明使用CVI,Model QWPM-633-10-4_iU5多階四分之 波片為實驗之樣本,其折射率為ne=15518, n〇=1划在波長 為627.8 nm,厚度為〇.5mm。我們依照上述之步驟逐次量測 待測物之主軸角度、相位延遲、階數、厚度和尋常光與非尋常 光的折射率。第十圖即為以1G。為量測間隔,其主軸角度由 至副°的量測範圍下’所得的單點主轴角度和相位延遲的實驗 結果圖。 、 17 1274142 在第十圖中’我們可很明顯看出其實驗結果與模擬值是相 當接近的’主軸和相位延遲的平均絕對誤差分別為〇.2167〇和 0.15%是洛在一般的商業波片相位延遲5%的誤差範圍内。 — 再者令待測物(A)分別轉動1°與2°下改變其光行走的光 :程,我們可測出相位延遲角度Α.=90·42。與α=91·57。,代入公式 (14)後计异出來的結果為m=6 73673(實際上階數㈤需為整 數),此實驗值受實驗誤差和受限儀器的精度影響 ,所以此待 測物真實的階數應為7階。 春 隨的轉動待測物使其同時改變光行走的絲與折射率的 差值〇#(0) %) ’我們可再次測出另一相位延遲角度π。在 1°的轉動下,經計算可得出ne=1·5524應和^154324102。 第十、十一圖分別為全場量測架構下所量測出來主軸角 =及相位延遲的數據,我們擷取64GX48G像素(pixels)中的 其中點來與理論驗證,發現實驗數據與理論數據相當接近, 主軸角度的絕對誤差為〇·4Γ,相位延遲絕對誤差為〇·63??,相 • 位延遲的誤差百分比為0.7%。 【圖式簡單說明】 第圖係為本發明之量測裝置示意圖。 第二圖係為第一圖所示之裝置移去第-又/4波片後之裝置示 意圖。 ^ :第三圖係為本發明之裝置實施時,將待測物固定在γ轴方向, 並沿光前進方向轉動一角度後之示意圖。 18 1274142 圖 圖 第四圖係為本發明之裝置置入 第,為本發明之裝〜知 第六圖係為有效折射率之趨勢變化圖。 第七圖係為本發明之裝置實施時^待測物肢在^ 並沿光前進方向轉動—肖度後之示意圖。 ° 第八圖係為時變信號連續積分之調變週期圖。 第九圖係為本發明之二維全場量難置之示音圖。 第十圖係為本發用GVI多階四分之波版爾單點主 度和相位延遲之圖表。 用 料一圖係為本發明之二維全場量職置之主軸肢數據圖。 弟十-圖係為本發明之二維全場量難置之相位延遲數據圖。 【主要元件符號說明】 (1) 入射光源 (2) 光學架構 (21) 偏振片 (22) 電光調變器 (23) 第一 λ/4波片 (24) 第二λ/4波片 (25) 檢偏片 (26) 光偵測器 (27) 帶通濾波器 (28) 鎖相放大器 (29) 運算單元 (3) 電控裝置 (31) CCD (32) 高複雜度可程式控制器 (33) 信號產生器 (34) 相移器 (35) 擴束器 (4) λ/2波片 ⑸ λ/8波片 (Α) 待測物 19# In the image processing algorithm, the modulation signal period 〇~I, ΐ~Z 4 4 4 2Τ 3Τ 7~丁 must be integrated. If the conversion rate is CCD (31), the exposure time needs to be 4F (45). And then trigger the CCD (31) d〇ck to phase shift an (34) phase shifting milk and (10). Integral respectively, so that three images are strong and illusory 52. The subsequent image processing algorithm is The three intensities are used for calculation. • The present invention uses a CVI, Model QWPM-633-10-4_iU5 multi-order quarter-wave plate as an experimental sample with a refractive index of ne=15,518, n〇=1 at the wavelength 627.8 nm, the thickness is 〇.5mm. We measure the spindle angle, phase delay, order, thickness and refractive index of ordinary light and extraordinary light in turn according to the above steps. The tenth figure is 1G. For the measurement interval, the experimental results of the single-point spindle angle and phase delay obtained from the measurement range of the spindle angle to the sub-°., 17 1274142 In the tenth figure, we can clearly see the experimental results. The average absolute error of the 'spindle and phase delay is quite close to the analog value 〇.2167〇 0.15% is within the error range of 5% of the general commercial wave plate phase delay. - Again, the object to be tested (A) is rotated by 1° and 2°, respectively, to change the light walking: we can measure The phase delay angle Α.=90·42. and α=91·57., after substituting into the formula (14), the result is m=6 73673 (actually the order (five) needs to be an integer), and the experimental value is experimental. The error and the accuracy of the limited instrument, so the actual order of the object to be tested should be 7th. Spring rotates the object to be tested to change the difference between the wire and the refractive index of the light walking 〇#(0) % ) 'We can again measure another phase delay angle π. Under the rotation of 1°, it can be calculated that ne=1·5524 and ^154324102. The tenth and eleventh figures are the measured spindle angle = and phase delay data under the whole field measurement architecture. We take the midpoint of 64GX48G pixels and theoretical verification, and find experimental data and theoretical data. Quite close, the absolute error of the spindle angle is 〇·4Γ, the absolute error of phase delay is 〇·63??, and the error percentage of phase-to-bit delay is 0.7%. BRIEF DESCRIPTION OF THE DRAWINGS The figure is a schematic view of the measuring device of the present invention. The second figure is a schematic representation of the device after the first-and-four-wave plate is removed from the device shown in the first figure. ^: The third figure is a schematic diagram in which the object to be tested is fixed in the γ-axis direction and rotated by an angle in the traveling direction of the light when the apparatus of the present invention is implemented. 18 1274142 Fig. 4 is a view showing the arrangement of the apparatus of the present invention, which is a diagram showing the trend of the effective refractive index of the sixth embodiment of the present invention. The seventh figure is a schematic diagram of the object to be tested being rotated in the direction of advancement of light when the device of the present invention is implemented. ° The eighth diagram is the modulation period diagram of the continuous integration of time-varying signals. The ninth figure is a two-dimensional full-field audible sound map of the present invention. The tenth figure is a graph of the GVI multi-order quarter-wave kernel single-point principal and phase delay. The material map is the data of the spindle limb of the two-dimensional full-volume position of the present invention. The tenth-picture is the phase delay data of the two-dimensional full-field difficulty of the present invention. [Main component symbol description] (1) Incident light source (2) Optical architecture (21) Polarizer (22) Electro-optical modulator (23) First λ/4 wave plate (24) Second λ/4 wave plate (25 Polarizer (26) Photodetector (27) Bandpass filter (28) Lock-in amplifier (29) Arithmetic unit (3) Electronic control unit (31) CCD (32) High complexity programmable controller ( 33) Signal generator (34) Phase shifter (35) Beam expander (4) λ/2 wave plate (5) λ/8 wave plate (Α) Object to be tested 19

Claims (1)

1274142 4 丨~lsw | 修(更)正替換頁丨 十、申請專利範圍: ———一^^-----~一 1.一種順序量測雙折射材料多項光學參數之裝置,該裝置 包括一入射光源、偏振片、電光調變器、第一又/4波片、第二 =波片、檢偏片、光偵測器、帶通遽波器、鎖相放大器和運 算單元等元件’其中偏振片與光行進方向夾呀角;電光調變器 的快軸方向則與光行進方向夾90。角;第一 λ/4波片與第二又/°4 波片的主軸方向個別與光行進方向夾价及一45。角;檢偏片與光 φ 行進方向夾角為零度。 一 2·—種順序量測雙折射材料多項光學參數之裝置,該裝置 包括一入射光源、偏振片、電光調變器、擴束器、第一 λ/4波 片、第二;1/4波片、檢偏片、CCD、信號產生器、高複雜度可 程式控制器、相移器和運算單元等元件;上述偏振片與光行進 方向夾45角,電光調變器的快軸方向則與光行進方向夾%。 角,第一;1/4波片與第二又/4波片的主轴方向個別與光行進方 向夾45及一45角;檢偏片與光行進方向夾角為零度;前述 鲁CCD位於出射光之路徑上,其訊號係傳遞至運算單元,而高 複雜度可程式控制器係輸出不同之頻率以觸發CCD及調整信 號產生器之接受模式,該信號產生器並對電光調變器進行調 變0 3·—種順序量測雙折射材料多項光學參數之方法,其係使 一入射光源依序經過偏振片、電光調變器、第一 λ/4波片、待 測物、第二λ/4波片、檢偏片,並於光偵測器上接受其光訊 號’再將光訊號分別經過帶通濾波器和鎖相放大器作訊號處 20 1274142 理,經運算單元之運算以獲得主軸角度;復移除第一 λ/4波 片,再於光偵測器上接受其光訊號,將光訊號分別經過帶通遽 波器和鎖相放大器作訊號處理,經運算單元之運算以獲得相位 延遲、階數、厚度和尋常光與非尋常光的折射率等光學參數。 4·如申请專利範圍第3項所述之順序量測雙折射材料多項 光學參數之方法,其中厚度之測量,係先移除第一 λ/4波片, 再分別將一 λ/2波片及λ/8波片置於待測物與第二λ/4波片之 ^ 間,然後分別使一入射光源依序經過偏振片、該電光調變器、 待測物、;1/2波片和第二入/4波片、檢偏片,接著以光镇測器 接受其光峨,再將光減分職過帶城妓和鎖相放大器 作訊號處理,最後經運算單元之運算,分別記錄上述二次所測 得之相位,而得以求得厚度。 5·如申請專利制第4項所述之順序量測雙折射材料多項 光學參數之方法,其中該λ/2波片及λ/8波片之厚度係為已 知01274142 4 丨~lsw | Repair (more) is replacing the page 、10, the scope of patent application: ———一^^-----~1. A device for sequentially measuring multiple optical parameters of birefringent materials. Including an incident light source, a polarizing plate, an electro-optical modulator, a first / / 4 wave plate, a second = wave plate, a detector, a photodetector, a band pass chopper, a lock-in amplifier and an arithmetic unit 'Where the polarizer is at an angle to the direction of travel of the light; the direction of the fast axis of the electro-optic modulator is clipped 90 to the direction of travel of the light. The angle of the main axis of the first λ/4 wave plate and the second /4 wave plate is individually sandwiched by the light traveling direction and a 45. Angle; the angle between the test piece and the light φ travel direction is zero degrees. A device for sequentially measuring a plurality of optical parameters of a birefringent material, the device comprising an incident light source, a polarizing plate, an electro-optical modulator, a beam expander, a first λ/4 wave plate, and a second; Wave plate, analyzer, CCD, signal generator, high complexity programmable controller, phase shifter and arithmetic unit; the polarizer is at 45 angles with the direction of travel of the light, and the fast axis of the electrooptic modulator is % with the direction of travel of light. Angle, first; the main axis direction of the 1/4 wave plate and the second/4 wave plate are individually sandwiched by the light traveling direction 45 and a 45 angle; the angle between the detecting piece and the light traveling direction is zero degrees; the aforementioned Lu CCD is located at the outgoing light In the path, the signal is transmitted to the arithmetic unit, and the high-complexity programmable controller outputs different frequencies to trigger the CCD and adjust the acceptance mode of the signal generator, and the signal generator modulates the electro-optical modulator 0 3·—a method for sequentially measuring a plurality of optical parameters of a birefringent material, wherein an incident light source is sequentially passed through a polarizing plate, an electro-optical modulator, a first λ/4 wave plate, a test object, and a second λ/ 4 wave plate, analyzer, and receive its optical signal on the photodetector', then pass the optical signal through the bandpass filter and the lock-in amplifier for signal processing, and calculate the spindle angle by the operation unit. The first λ/4 wave plate is removed, and the optical signal is received by the photodetector, and the optical signal is processed by the band pass chopper and the lock-in amplifier respectively, and the operation is performed by the operation unit to obtain the phase. Delay, order, thickness, and vulgarity The refractive index of extraordinary light and other optical parameters. 4. A method for measuring a plurality of optical parameters of a birefringent material in the order described in claim 3, wherein the thickness is measured by first removing the first λ/4 wave plate and then separately for a λ/2 wave plate. And the λ/8 wave plate is placed between the object to be tested and the second λ/4 wave plate, and then an incident light source is sequentially passed through the polarizing plate, the electro-optical modulator, the object to be tested, and the 1/2 wave. The chip and the second input/4 wave plate, the analyzer, and then receive the aperture by the optical detector, and then divide the light into the signal processing with the city and the lock-in amplifier, and finally, through the operation of the operation unit, The thickness measured by the above two times is recorded separately, and the thickness is obtained. 5. The method for measuring a plurality of optical parameters of a birefringent material in the order described in claim 4, wherein the thickness of the λ/2 wave plate and the λ/8 wave plate is known to be 0. 之材質 糊細第4項賴之财制雙騎材料多項 先子參數之方法’其巾該待測物、λ/2波片及 係為相同。 入===測雙折射材料多項光學參數之方法,其係使 過偏振片、電光調變器,束器、第-"4 城,兮ccda#~A/4波片檢偏片’並以⑽接受其光 號係傳达至一運算單元者。 21The material of the fourth item Lai Zhicai double riding material multiple methods of the first sub-parameters 'the towel, the object to be tested, λ/2 wave plate and the system are the same. In === method for measuring multiple optical parameters of birefringent materials, which is to make an over-polarizer, an electro-optic modulator, a beamer, a -"4 city, 兮ccda#~A/4 wave test piece' (10) accepts that the light number is transmitted to an arithmetic unit. twenty one
TW94100413A 2005-01-07 2005-01-07 Apparatus and method for sequentially measuring multiple optical parameters of birefringence material TWI274142B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI405959B (en) * 2008-12-31 2013-08-21 Hannstar Display Corp Method and apparatus for measuring physical parameters of an anisotropic material by phase-sensitive heterodyne interferometry
CN108562547A (en) * 2018-03-13 2018-09-21 中国科学院福建物质结构研究所 Laser crystal thermal stress double refractive inde measuring device and its method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI405959B (en) * 2008-12-31 2013-08-21 Hannstar Display Corp Method and apparatus for measuring physical parameters of an anisotropic material by phase-sensitive heterodyne interferometry
CN108562547A (en) * 2018-03-13 2018-09-21 中国科学院福建物质结构研究所 Laser crystal thermal stress double refractive inde measuring device and its method

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