TWI274129B - Burner assembly of a device for purifying exhausted gas - Google Patents

Abstract

The present invention provides burner assembly of a device for purifying exhausted gas. This device includes a gas burner that will burn the discharged gas to remove the combustible and explosive gases, wet cleaner that will dilute the soluble toxic gas from the gas burner in the water, and pipe fittings that will connect to the gas burner and wet cleaner. The gas burner includes a primary convex ridge, a ceramic tube located inside the primary convex ridge, a water cooling recycler that is located between the primary convex ridge and ceramic tube to regulate the temperature inside the ceramic tube, gas supply manifold that supplies different kinds of gas exhaust located at the upper middle section of the primary convex ridge, and multiple gas exhaust burner nozzles that provide flame while delivering the gas exhaust. These nozzles are located at the top of the convex ridge forming a triangle with the gas supply manifold as the center. This device will use the direct flames from the nozzles of gas burner to produce the indirect flames on the gas exhaust.

Description

[1271129] IX. Description of the Invention: [Technical Field] The present invention relates to an exhaust gas purification treatment device connected to a semiconductor manufacturing facility for removing harmful components contained in exhausted exhaust gas; more specifically, An exhaust gas purification treatment device capable of simultaneously processing a large-capacity exhaust gas, which is provided with a burner assembly (using only a few direct flame nozzles to perform a plurality of direct flame nozzle-like performances, reducing fuel consumption, and improving energy saving effect and Combustion performance, etc., and a set of wet cleaning parts are connected in parallel on one burner section. [Prior Art] Exhaust gas emitted from chemical processes and semiconductor processes, because of its toxicity, explosiveness and corrosiveness, is not only harmful to the human body, but also directly discharged into the atmosphere, causing environmental pollution. Therefore, it is necessary to have a purification treatment for reducing the content of harmful components in the exhaust gas to below the allowable concentration. It is necessary to discharge the harmless gas to the atmosphere through a purification treatment process capable of removing the toxic substance. The treatment method of the harmful gas discharged from the semiconductor process or the like can be roughly divided into two: one is mainly a burning method in which a combustible gas containing a hydrogen group or the like is decomposed, reacted or burned at a high temperature of ~% to the middle; Second, when the water-soluble gas passes through the water stored in the water tank, it dissolves: in the wet type (4) (4)) method; finally, the non-flammable property and the water are not absorbed into the body: when the milk body passes through the adsorbent, The physical or chemical adsorption of the adsorbent. In more detail, the exhaust gas purification treatment can be subdivided into a wet mode ((4) 1274129

Scrubber), using electric heaters for inter-oxidation (Thermal Wet)

Scrubber), direct oxidation using a fuel gas burner (Direct

Burn Wet Scrubber), physicochemical adsorption method using adsorbent (Dry

Scrubber), and the use of plasma plasma (piasma Scnibber). Fig. 1 and Fig. 2 are respectively a plan view and a cross-sectional view showing a structure in which gas combustion of a conventional exhaust gas purification treatment apparatus is a squib. Further, Fig. 3 is a schematic view showing a process of a general exhaust gas purifying treatment apparatus, and the characteristics of the present invention are crying in the process of the conventional exhaust gas purifying apparatus, and a coaxial technique of a conventional technique In the burner 2 for the flow diffusion flame, a plurality of nozzles coaxial with each other are disposed in order from the inside to the outside in the order of the exhaust gas supply squirt 1 , the fuel supply nozzle 20, and the oxidant supply nozzle 3〇. The exhaust gas supply nozzle 1〇 supplies an exhaust gas 12 discharged by a semiconductor process or a chemical process, and the exhaust gas 12 is discharged by chemical vapor deposition ((10).C(10)d Vapor Deposltl〇n) or an etching process. Dori harmful substances are the cause of environmental pollution. The material supply nozzle 20' injects the fuel gas of the flame fuel. The fuel gas 22 mainly uses liquefied natural gas, liquefied petroleum gas, gas, and the like. ^: Supply nozzle 3. The oxidizing gas 32 is generated by a reaction with the fuel gas to generate a flame, and oxygen (02) or air is used. " Soil Next' simply illustrates the process of diffusing the exhaust gas 12 supplied from the exhaust nozzle 10 by the coaxial flow. "Combustion mixes the fuel gas 22 (the fuel supply nozzle is shot) with the oxidation 1274129 ^ gasification agent supply nozzle 3 )), and transfers it to the combustion chamber 0 匕 匕 , , , , , , , , , , , Not shown) ignition, the fuel gas is burned by the flame 2 2 rabbit 4 / μ a bump, and a condensed milk mash 32. At this time, the exhaust gas 12 and the fuel gas 22 are burned while being corpse and forced to oxidize. ^ Since the fuel supply nozzle 20 and the oxidant supply nozzle 3 are coaxially and flush with each other, the fuel gas 22 injected from the fuel supply nozzle 20 is from the female oxygen mountain, /, and the oxidant supply nozzle 30. The oxidized gas 32 injected may be sprayed in parallel. On the other hand, the fuel gas 22 injected from the fuel supply nozzle 20 and the oxidizing gas 32 injected from the oxidant supply nozzle 30 are mixed at a predetermined place by diffusion, and are generated by ignition combustion. The combustion process of the flame. However, since the fuel gas 22 and the oxidizing gas 32 are mutually radiated, the material U2 and the oxidizing gas 32 hardly diffuse, and accordingly, a part of the fuel gas 22 cannot be oxidized. The gas 32 reacts and can be discharged from the combustion chamber in an unreacted state. b = the total treated exhaust gas of the _ oxidized carbon ((3)) generated in the burning _12. The m丄 rate is lowered, resulting in incomplete and proportional The fuel gas 22 (the fuel supply nozzle 20 and the oxidizing gas enthalpy 32 (injected by the oxidant supply nozzle 30), the injection velocity of the gas 2: and the oxidizing gas 32 is increased:; the diffusion degree of the gas 22 and the oxidizing gas 32 is The side + is reduced, so the fuel gas 22 is oxidized 1 ^ w 苋 + speed is inversely proportional... If the injection speed of the oxygen body 32 is increased, the diffusion degree of the fuel gas 2 2 and the oxidizing gas 3 2 is reduced in 1274129. The more the injection speed of the gas 22 and the oxidizing gas 32 is increased, the mixing of the fuel gas 22 and the oxidizing gas 32 is mainly performed at a distance from the feed supply nozzle 20 and the oxidant supply nozzle, and the combustion center of the mixed gas 22, 32 is separated. When the sneeze is 1 〇, 2 〇, or 3, the combustion efficiency is reduced in proportion. In particular, if the fuel gas 22 and the oxidizing gas 32 are sprayed in parallel, the fuel emulsion 22 and the oxidizing gas 32 are mutually Contact and then burn The burning time will be reduced, and carbon monoxide (c〇) will be added, resulting in a significant decrease in combustion efficiency. Moreover, since the exhaust gas 12 can also be used as a fuel like the fuel gas 22, it is used as a fuel for the oxidizing gas 32. c ^ 仃 仃 combustion reaction, during the combustion reaction, heat: should react with the heat reaction at the same time. Therefore, the exhaust gas 12 will be diffused with the ::: body at a given location, but due to the waste It is said that the mouthpiece 10 and the oxidant supply nozzle 30 are coaxial and parallel, so that the exhaust gas 12 and the oxidizing gas 3 2 are difficult to be bucketed; it is difficult to spread at an appropriate place, and there is a problem that the burning efficiency is lowered. 'λ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Fuel 22: The agent supply nozzle is 3〇, so it is impossible to supply the gas smoothly, and there is a problem that the fire is inefficient and the efficiency is poor. In addition, by making the exhaust gas purification treatment # ^ # Λα ^... set to operate for a long period of time, the burner group is sturdy...', resulting in a flame reduction test at a temperature higher than the appropriate temperature.

Jn. The problem that the various parts of the temple are difficult to operate normally. Further, the process of the exhaust gas purification treatment device is such that the exhaust gas 12 discharged from the half 1274129 conductor manufacturing device 40 or the like is subjected to lamp-time treatment in the burner unit (50), and is combustible by combustion. After the gas and the explosive gas are removed, the wet cleaning unit 6 is subjected to secondary treatment to dissolve the water-soluble toxic gas in the water. That is, the exhaust gas discharged from the semiconductor manufacturing device 4〇! 2, the primary treatment burner unit 5 is burned by combustion or thermally decomposed (b_lng); untreated gas such as untreated gas and dust particles is exhausted from the exhaust gas discharged from the burner portion 5G 22 Then, it is transferred to the rubbing type cleaning unit 60 for secondary treatment, and the water is sprayed from the wet type washing unit 6 to separate the wetting process of the powder in the oxidizing gas. Then, the cleaned gas 32 is discharged into the atmosphere through the filter and the conduit. ~ Due to the high level of integration of semiconductors and the increase in the size of liquid crystal display devices (TFT LCDs), the emission of exhaust gas has increased remarkably, and the types of special gases used in the emerging industries have been increasing day by day. Therefore, the conventional exhaust gas purification treatment device processes a plurality of exhaust gases simultaneously in the head unit, and an exhaust gas purification treatment device can be used to treat various exhaust gases. However, in the apparatus for discharging large-capacity exhaust gas like a TFT-LCD semiconductor device, it is necessary to increase the capacity of the burner portion 50 and the wet cleaning portion 60 in order to apply the conventional exhaust gas purification treatment device, but if a conventional burner is used, Part 5〇 (constructed by integrating an inconel chamber with a heating rod of a ceramic material) to treat a large-capacity exhaust gas, the combustion efficiency is lowered, and since the size of the inflow port is technically limited, The treatment efficiency of the PFC (Per flu oro-compound) gas is lowered, and the problem of corrosion resistance is very weak. For example, in order to handle a large-capacity exhaust gas, the wet cleaning unit 60 must be made to handle a large capacity even if the conventional burner portion is increased. However, in order to increase the capacity of the conventional wet cleaning unit 60, it is necessary to lengthen the length of the i-slot which constitutes the wet-washing pleading 60 by a factor of two. In this case, more power must be required to operate the wet-washing. The net part has a question that makes this setting complicated. SUMMARY OF THE INVENTION The present invention is made up of the problems of the prior art, and is aimed at providing a burner assembly of an exhaust gas purification treatment device that uses only a few direct flame nozzles to perform a plurality of direct Flame nozzle-like performance, therefore: reducing fuel consumption, and having excellent energy saving effect and combustion. The other object of the present invention is to provide an exhaust gas purification treatment device: Brush remover (5) (4) to remove more adsorption

The loss of foreign matter in the mouth can improve energy conservation, efficiency and combustion performance. Another object of the present invention is to provide a burner assembly for exhaust gas purification treatment, and to operate the ring device at an appropriate temperature, and to operate normally in a plurality of parts, and to improve the genuine About energy effects and combustion performance. ^ ^ ^ The purpose of the month is to provide an exhaust gas purification treatment device that can simultaneously process large-capacity waste milk. In order to achieve the purpose of purifying the semiconductor, the present invention provides an exhaust gas purification treatment device, an exhaust gas purification treatment device that is discharged after exhausting the exhaust gas discharged from the process and the chemical process, and is characterized in that it includes : combusting the exhaust gas to remove the burner portion of the combustible gas and the explosive gas; a wet cleaning portion in which the water-soluble toxic gas in the exhaust gas treated by the burning portion is dissolved in water, and a piping portion for connecting the burner portion and the wet cleaning portion; The utility part is composed of a burner assembly, comprising: a main flange; a ceramic tube disposed in the main flange is disposed between the main flange and the ceramic tube for adjusting the temperature cooling in the ceramic tube a water circulation portion; an exhaust gas supply portion disposed at an upper center of the main flange for supplying various helium, and a plurality of gas burner nozzles disposed at an upper portion of the main flange, centered on the exhaust gas supply manifold A triangle is formed to generate a direct flame while supplying the exhaust gas; the gas burner is used. The direct flame generated by the bellmouth causes the exhaust gas (discharged through the exhaust gas supply manifold) to produce an indirect flame for processing. Further, the helium gas purification processing apparatus further includes a sensor provided on the upper flange of the main flange portion for detecting a flame in the ceramic tube. Further, the exhaust gas purification treatment device further includes a brush remover 5 disposed at an exhaust gas supply manifold located inside the main flange and one of a plurality of combustion nozzles for removing the generated and adsorbed in the burner assembly Foreign matter and by-products on these. Further, the 忒 exhaust gas purification treatment device further includes: a rotary brake assembly 'for driving the brush, disposed at a center of the waste hole at the center of the upper portion of the main flange; and a 'rotation shaft, which is disposed on the brush Between the divider and the rotary brake assembly, the power of the rotary brake assembly is transmitted to the brush remover. 11 1274129. Further, in the exhaust gas purification treatment device, the ceramic tube is composed of a heat transfer coefficient π _ f. The direct flame generated by the gas burner nozzle is integrated by the heat insulation effect of the heat generated by the isolation, and the heat is not integrated. The same amount of heat is generated from the exhaust gas supply manifold of the direct flame to create an indirect flame.

Further, in the silk gas purification treatment device, the gas burner nozzle includes: a flange for forming an exhaust gas supply portion and an exhaust gas supply (4) for injecting exhaust gas; Also placed on the top side of the flange! a metal sealing portion; a fuel gas supply portion having a fuel supply nozzle combined with a flange on a lower side of the third metal sealing portion; and an oxidant supply unit having a flange combined with the flange on the lower side of the fuel gas supply portion a head unit base mounted on the lower side of the flange. A cooling water (pcw; Process CooHng Water) supply portion disposed on the base of the head unit below the oxidant supply portion; and a second sealing portion sealed between the base unit base and the head unit. Further, in the exhaust gas purification treatment device, an exhaust gas supply nozzle is disposed on a concentric circle at the innermost center of the gas burner nozzle, and is disposed on a concentric circle on the outer side of the exhaust gas supply nozzle to have a predetermined axis different from the exhaust gas supply nozzle The fuel supply nozzle is disposed so as to be inclined to the inner side, and the oxidant supply nozzle is disposed at an interval other than mm (four) at equal intervals with the exhaust gas supply nozzle. Further, in the exhaust gas purification treatment device, the sealing action of the second metal sealing portion is such that the fuel supplied from the fuel supply nozzle does not leak: the outside; the sealing action of the second metal sealing portion enables the self-oxidizing agent supply portion The injected oxidant does not flow back to the external Y from the oxidant supply nozzle. In the exhaust gas purification treatment device, the central vehicle for generating a direct fire train of 12 1274129 gas burner nozzles is set to be the main convex The central axis of the edge maintains a predetermined slope. Further, in the exhaust gas purification treatment device, the central axis of the exhaust gas supply manifold is disposed parallel to the central axis of the main flange. Further, in the exhaust gas purification treatment device, the oxidant is supplied through The flow rate of the oxidant injected by the nozzle is faster than the flow rate of the fuel injected through the fuel supply nozzle. Further, in the exhaust gas purification treatment device, the wet cleaning unit is connected in parallel to the burner unit and provided with one set. In the exhaust gas purification treatment device, the wet cleaning unit includes: a waste gas for passing through the burner portion a purifying mesh-like dust, a collecting portion; a circulation (four) washing mechanism for injecting the exhaust gas from the burning crotch into the lower end of the dust collecting portion; The net water sprayed on the lower end of the sub-dust collection section by the waste oxygen-vacuum 0 / d hole of the i-thin dust collection section; the surface of the second dust-collecting part; A filler material that increases the contact surface area between the exhaust gas and the water between the dust collection units. According to the present invention, the zinc is provided as a foreign matter that is attached to the plurality of nozzles by the brush. , can be long section of beer _ with the improvement of the burning performance. Also - ^ a certain amount of water is appropriate, the fine is set by the cooling water circulation device and can be hanged in the η ^ 'parts month, so you can seek the overall This source and the improvement of combustion performance. Connected flame ^ by using the coaxial split diffusion combustion method, using only a few straight", and playing the performance of many direct flame nozzles, can reduce the fuel amount of 13 1274129, Meng Wen can media to save energy With improved combustion performance. M, the straw is minimized by a gas burner nozzle having a complicated structure, and a nozzle having a simple structure is provided in the same manner as the burner of the body burner, so that the burner portion as a whole is simple and easy. Composition. , as described above, by setting the injection angle of the oxidant injection nozzle to increase the 'second rate s, causing the combustion heat generated by the flame to rise, so that the gas is cleaned, the cost of helium treatment is increased, and the perfluorocarbon can be treated. Compound (pfc) gas. Further, hunting is performed by setting the nozzle for spraying the oxidant to a predetermined angle, and forming a warm flow between the waste and the CH4 of the fuel, so that the fuel (3) 4 and the waste milk have a long contact with the oxidant and the reaction time. Further, the generation of '(3)' comes from all combustion mechanisms using a fuel containing c as a main component. The production of C0 is mainly caused by insufficient combustion time. However, according to a preferred embodiment of the present invention, the combustion efficiency is promoted by adjusting the angle of the emulsifier, and the contact between the fuel (3) and the oxidant 02 can be improved and mixed at about 2 _ from the injection port. Therefore, there is an effect of lowering the production of C0. ...70 Furthermore, the upper: the most: the side is set to have a high heat insulation effect, can isolate the radiant heat, and the ceramic tube that separates the heat from the outside, so that the heat produced by the burner and the king can be returned to the inside, so that the combustion efficiency can be improved, so that the combustion efficiency can be improved. The temperature rises to the highest. Finally, the group-wet-washing unit and the burner unit are connected in parallel, and the large-capacity exhaust gas can be simultaneously processed. [Embodiment] Next, a preferred embodiment of the present invention will be described in detail based on the attached drawings. 14 1274129 Fig. 3 is a schematic view showing a process of a conventional exhaust gas purifying apparatus. Fig. 3 is a view showing a process of the conventional exhaust gas purifying apparatus. Fig. 4 and Fig. 5 are a plan view and a cross-sectional view showing a configuration of a burner portion of an exhaust gas purification treatment device according to an embodiment of the present invention. Main > The exhaust gas purification process of the present invention for purifying exhaust gas discharged after use in a semiconductor process or a chemical process to be clean air is generally composed of two stages of combustion type and wet type. As shown in FIG. 3, according to the exhaust gas purification processing apparatus, the exhaust gas 12 discharged from the semiconductor manufacturing unit 40 is burned and oxidized in the burner unit 5, or burned in a method of "noon". Among the exhaust gas discharged from the burner portion, a part of untreated gas, dust particles, and the like are transferred to the wet cleaning unit 60. Next, the water is sprayed from the wet cleaning unit 60 by the secondary treatment, and the process of separating the powder in the oxidizing gas is washed and squeed. The cleaned gas 32 is vented to the atmosphere through a filter and a conduit. The child combustion method has an indirect oxidation mode by means of a heater operation and a direct oxidation mode by means of ignition. The emulsion burner nozzle of the present embodiment is a direct b_ wet scrubber. The radiation type of the fire has a downward downward direction and an upward upward direction. This embodiment is described by taking a downward direction as an example. 4A and 4B are perspective views for explaining a burner portion of an exhaust gas purification treatment device according to an embodiment of the present invention; and FIG. 5 is a view for explaining a waste disposal process of the present invention. FIG. 6 is a top view of the burner portion of the exhaust gas purification treatment device according to the embodiment of the present invention. FIG. 7A to FIG. 7C are diagrams showing the burner portion of the burner device. A bottom view; to illustrate a cross-sectional view of an exhaust gas purification section of an embodiment of the present invention. As shown in the figure, a burner assembly 100 of an exhaust gas purification treatment apparatus according to an embodiment of the present invention is a right-hand main body, a 彖1 09, a two-part ring 1〇5 installed inside the main flange 109, The lower part of the inner ring 1〇5, which is mounted on the main protrusion and the edge 109, is assembled between the main flange 109 and the inner ring 105.

^ 〇 7 and δ are again placed in the cooling water circulation portion 112 between the king flange 109 and the ceramic tube. And, in the upper center of the main flange 109, an exhaust gas supply manifold is disposed 1〇, and the i-th to third gas burner nozzles 12〇a are disposed in a triangular manner centering on the exhaust gas supply manifold. 12〇c. Further, a plurality of & gas injection ports 1 〇 1 and a plurality of burner cooling units 108 are provided around the i-th to third gas burner nozzles 120a to 12C. Further, the i-th to third ignition portions 1 and 2, the flame sensor 1 15 and the PU sensor corresponding to the third to third gas burner nozzles i20a to 120c are disposed on the side of the main flange 109. Department 1〇3. As shown in FIG. 6, according to an embodiment of the present invention, the rotary device S 4 and the rotating shaft 8 are used to mount the brush n 9 so as to be accessible to the first to the inside of the main flange 109. The third gas burner nozzles 120a to 12〇c and one end portion of the exhaust gas supply manifold 11〇. Therefore, after the exhaust gas purification treatment I is placed on the combustion component 100 for a long period of time, the rotary brake assembly 1 14 can be operated to rotate the brush 丨丨9 to remove the adsorption inside the main flange 109. The third to third gas burner nozzles 12a to 12〇c and 16 1274129 are foreign matter and by-products at one end portion of the exhaust gas supply manifold 110. As shown in FIG. 7A to FIG. 7C, according to the embodiment of the present invention, the cooling water circulation portion H2 is disposed between the main flange 1〇9 and the Tao competition tube ,6, and is injected through the cooling water injection portion 113. Cooling water can keep the temperature of the burner assembly (10) at a constant level H. Even if the exhaust gas purification treatment device is operated for a long time, the burner group #1〇〇 will not exceed the appropriate temperature, and the flame sensor and other parts will be made. It works normally. As shown in Figures 4 and 5, the exhaust gas purification portion of the preferred embodiment of the present invention: the burner assembly 10" in the interior of the present invention will produce the direct flame! To the 3rd gas burner nozzle ma, position, i2Qe is arranged in a way that is slightly equilateral triangle from the center to the outside, and, in addition, the exhaust gas supply of the direct flame is not generated, and the time is in a positive three-dimensional manner. It is disposed at the center of the burner assembly, and the triangle formed by the upper surface of the exhaust gas supply is placed in a triangle formed by the nozzles of the first to third gas burners. According to a preferred embodiment of the present invention, the burner group #100 of the exhaust gas purification treatment device functions to isolate the heat generated by the burner assembly 1 by forming the ceramic tube 1 with a substance having a low heat transfer coefficient. For the purpose, the direct flames generated by the first to third gas burner nozzles i2a, 12i, i2〇c are integrally formed only in the ceramics f1〇6. Therefore, the same amount of heat as the exhaust gas supply 11G which does not generate a direct flame can be imparted. According to a preferred embodiment of the present invention, the first to third gas burner nozzles 1 20a, 1 20b, 1 2〇c of the direct fire & are generated by the upper end of the enamel s 106 The ceramic tube 1 〇 6 # center axis maintains a predetermined angle 17 1274129 degrees. The direct flame generated by each of the mouthpieces is assembled in such a manner that a predetermined position in the ceramic tube 形成 06 forms a focus. Therefore, according to a preferred embodiment of the present invention, three nozzles of the third to third gas burner nozzles 120a, 120b, and 120c are used to supply fuel to treat helium/,,,,,, Since the direct flame treats the same effect of the exhaust gas purification treatment device of the exhaust gas, the overall cost can be reduced. Figure 8 is a perspective view showing a gas burner nozzle assembled to a burner assembly of an exhaust gas purification treatment apparatus according to an embodiment of the present invention; and Figure 9A and Figure 9 are an exhaust gas purification assembled in an embodiment of the present invention. A cross-sectional view of the gas burner nozzle of the combustion benefit assembly of the processing unit. - As shown in FIG. 8 and FIG. 9A, the exhaust gas purifying unit to the gas-fired device nozzle 20 of the embodiment of the present invention is provided with an exhaust gas supply unit 丨28 and a waste supply direct flame nozzle 12 1 a, and includes a flange 1 2 1 having a structure for injecting the exhaust gas; a first metal seal port r 1 22 formed on the upper side of the flange 12 1 , and a flange 12 1 formed on the lower side of the first metal seal portion 22 a fuel gas supply unit 23 having a fuel supply nozzle 123a, an oxidant supply unit 124 having an oxidant supply nozzle 丄Ma on the lower side of the fuel gas supply unit 123, and an oxidant supply unit 124 provided in the oxidant supply unit 丨24. a cooling water supply portion 上 on the unit base 126; a head unit base 1 26 coupled to the lower side of the flange 1 2 ; and a flange 1 2 and a head unit 12 The second metal sealing portion 1 2 7 sealed between the six. According to an embodiment of the present invention, as shown in FIG. 9A, an exhaust gas supply direct flame 18 1274129 is provided on the concentric circle of the innermost center of the gas burner nozzle 120, and is arranged on the outer side of the exhaust gas supply direct flame nozzle 121a. The fuel supply nozzle 123a is disposed coaxially with the exhaust gas supply direct flame nozzle 〗2 a. Next, the oxidant supply nozzle 12 is disposed on the outer concentric circle of the fuel supply nozzle 123a at equal intervals but at a different axis from the fuel supply nozzle and inclined inwardly at a predetermined inclination angle. Further, the fuel supply nozzle 123a and the oxidant supply nozzle 124a are located on the center line on the same plane, and the number of the nozzles is the same. Further, the oxidant supply nozzle 丨24a is sprayed at an angle of about! Hey. When the inclination is toward 1, 1, and the direction of the squirt 123a, the 〇2 gas injected from the oxidant supply nozzle a and the gas injected from the fuel supply nozzle 交叉 intersect at about 20 mm from the nozzle. According to this, a warm current can be formed, which causes the 〇2 gas injected from the oxidant supply nozzle 124a and the (10) gas injected from the fuel supply nozzle i23a to accelerate the diffusion in the exhaust gas supply direct fire (4) nozzle (2) & with the nozzle (123a, The angle of ma) controls the middle of the flame. According to an embodiment of the present invention, the injection flow rate of the nozzle is used in addition to the injection f of the nozzle, so that the warm flow can be formed more efficiently. That is, the flow rate of the 02 gas injected from the flow emulsifier supply nozzle i24a of the CH4 gas injected from the fuel supply nozzle 123a is taken as fast. The nozzles 124a of the + are arranged to be inclined - so that (4) the material is supplied: the distance between the two 3 and 3 is overlapped, but the flow rate from the fuel supply = gas must be made to be compared with the flow rate from the oxidant supply: the flow rate of the second reading (four), Keep the flame radiant. If the flow rate of the gas injected from the oxidant supply nozzle 124a is 19 19,274,129, the flow rate of the ch4 gas injected by the fuel supply nozzle 123a is fast, and the damage is from the fuel supply nozzle 123a. The flame of the CH4 fuel gas is so bad that the flame cannot be controlled. Moreover, since the fuel and the oxidant are short and fast, the combustion efficiency is poor, so in fact, the temperature of the flame: the flame: the length of the flame is also inversely proportional to the decrease. Right Li Qing came up to explain that the composition of the fuel and the combustion-supporting gas is in accordance with the following reaction formula 1. _ [Chemical Formula 1] CH4 + 2〇2 Today c〇2 + 2H2〇, therefore, injecting 1kg of fuel gas, it is necessary to inject 2kg of oxygen, ·__ to increase efficiency, it is better to supply 0.2% oxygen than theoretical oxygen . - In addition, the sealing function of the metal sealing portion 122 is such that the fuel (for example, CH4) supplied from the fuel core 觜123a does not leak to the outside of the gas igniting tube 120; the second metal sealing portion 丨The sealing action of 27 causes the oxidizing agent (for example, % or open space) injected from the oxidizing agent supply portion 124 to flow back from the yttrium oxide supply nozzle 124a to the outside of the gas burner nozzle 120. ^ Furthermore, the waste milk supply nozzle 1 2 1 a supplies semiconductor process and chemical process = exhaust gas, the exhaust gas system c2, F4, cf4, c3f8, _3, SF6 and other king fluoride (PFC · perfiuor〇_c〇mp 〇iind) gas is harmful to the human body and is corrosive. Since the content of the harmful component is above the allowable concentration, it is necessary to have a harmful treatment of the content of the harmful component below the allowable concentration. . 20 ' 1274129 4Supply Department] 2 8 , , t Λ > r-mouth 121a is the middle of the burner's exhaust gas supply of natural gas, liquefied petroleum gas, helium, side surrounded by fuel, wind and fuel The gas of the gas is supplied to the sound nozzle i23a, which is such that the exhaust gas, the genus, the yttrium, and the sputum can be well mixed. Further, the oxidant supply squirting Μ ^ ^ Λ ^ > φ ι , a is used to inject oxygen (〇2) which generates a flame with the fuel gas to generate 1, /, and vice versa. In the chaotic body, the deuterated gas is mainly used as shown in Fig. 9B. According to the corpse n, t X generalized corpse, and the truncation, the exhaust gas supply nozzle 1 2 1 a is connected with / the main exhaust gas for exhaust gas 4 # 128 The central axis is parallel fuel supply nozzle 123a, and the emulsifier is supplied to the exhaust gas supply nozzle 121a, and the gas supply nozzle 121a is inclined to form a hole of about 20 μ. From this, it can be seen that the inclination angle is particularly about 1 〇. + One of the h-shaped 'auto-oxidant supply nozzles 124a's oxidizing gas and self-igniting people's fuel gas, which will be placed on the exit side of the gas burner nozzle 12〇+山, Also, a diffusion phenomenon occurs, thereby mixing and burning. Therefore, since the dilute gas and the oxidizing gas will cross each other at a predetermined place, a thirst flow will occur, and the warming phenomenon of the mixed gas caused by the thirsty flow can accelerate the expansion phenomenon. The intersection is adjusted by adjusting the inclination of the oxidant supply nozzle 1 2 4 a for θ7 and tens of (2). In addition, by the expansion of the 4^ mouth of the mixed animal in the vicinity, the combustion characteristics of the mixed gas such as spontaneous combustion (gmtl〇n) and flame propagation (fhme propagation) can be enhanced, and the extraordinary combustion can be prevented. This forms a stable flame zone. change. In the case where the flow rates of the exhaust gas, the fuel gas, and the oxidant gas are set to be different, the combination is too shouting to form a warm current in the direction of the shot. The formation of warm current makes 21 1274129 different combinations of exhaust gas, fuel gas and oxidant gas efficient: the factor, at this time, due to the mixing of fuel and oxidant will produce a diffusion flame, the formation of warm current is also determined coaxial Split-flow expansion|combustion type: an important factor in the length, shape, and combustion efficiency of the burner flame. So known that the flame is called a warm-flow flame. Furthermore, the method of forming the inclination angle θ with respect to the fuel supply nozzle by the oxidant supply squirt 124a, and the speeding of the gas and the oxidizing gas at a given location is important for stably forming the flame region, but compared to this The importance is determined by adjusting the burner mass of the fuel supply nozzle and the oxidizing gas injection velocity I of the oxidant supply nozzle.反应 反应 之 之 之 , , , 之 之 之 之 之 之 之 之 之 之 之 之 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化The length of the control fire is also shortened...the method...=anti-"will become shorter, the fire will be..., π will form a stable flame area. Because 2' will (4) the gas injection speed is adjusted to be more oxidized gas jet fans: more specifically, The oxidizing gas injection speed is set to "the gas injection speed is set to 1 3 7 / too", the fuel supply nozzle of the body is the second hunter, and the oxidant supply area of the emulsified milk body of the Bama squad is controlled. The fuel gas and the oxidizing gas are sprayed, and preferably, the cross-sectional area of the oxidizing agent supply nozzle ma is opened, and the cross-sectional area of the nozzle (2)a is large. The 哉 fabric becomes a fuel supply spray. Since the injection speed of the exhaust gas is slower than that of the oxidizing gas, 22 1274129 preferably forms the cross-sectional area of the exhaust gas supply squirting 1 2 1 a to be the largest in the nozzle. Also, in order to maximize combustion efficiency, the use of fuel gas and oxidizing gas is also important. In the embodiment of the present invention, if the fuel gas is exemplified by methane Cl which is one of liquefied natural gases, and the oxidizing gas is exemplified by oxygen, it is as follows. When decane CH4 is based on 1 mole, the molecular weight is! 6. Oxygen (〇2) is based on 1 mole and has a molecular weight of 32. Further, if the ratio of the different brothel (CH: 4) to oxygen (〇2) is calculated based on the molecular spring, it is j: 2. Therefore, in the case of supplying decane (CH4) lkg, oxygen must be supplied (〇〇2 kg, in order to increase the combustion efficiency, about 2% of oxygen must be supplied in excess. Figure 1 is used to illustrate an embodiment of the present invention. A schematic diagram showing the result of the operation of the exhaust gas purification treatment device. According to an embodiment of the present invention, the third to third gas burner nozzles 120a, 120b, and 120c are disposed on the outer side in the form of an equilateral triangle to directly generate a flame. A method in which a direct flame is not generated and the exhaust gas supply of the exhaust gas is supplied as a center in a regular triangle shape and intersects with a triangle formed by the i-th to third gas burner nozzles 120a, 12〇b, and 12〇c To configure 'and use the indirect flame to treat the injected exhaust gas. Again' as shown, the central axis of the exhaust gas supply manifold 丨1〇 and the middle-shaft system of the ceramic tube 06 are arranged parallel to each other, and further, a direct flame is generated. • The central axes of the first to third gas burner nozzles 120a, i20b, and 120c are arranged to be condensed at a predetermined point and form a predetermined inclination with respect to the central axis of the ceramic tube 106. 23 ^ 1274129 Therefore, According to a preferred embodiment of the invention, three gas burner nozzles 120a, 120b, 12〇c are used to supply fuel for direct flame treatment of the exhaust gas and two indirect flames are used to treat the exhaust gas. Thus, six direct and The same effect as the exhaust gas purification treatment device for treating exhaust gas with a flame. Fig. 11 is a configuration diagram of an exhaust gas purification treatment device according to an embodiment of the present invention. As shown in Fig. 11, the exhaust gas purification treatment device 1 of the present invention is linked. The semiconductor device includes: a burner assembly (10) for performing a net treatment on the injected exhaust gas; and a 'fi wet cleaning unit 200 and a second wet cleaning unit, which are juxtaposed to the burner The assembly (10) receives the treated waste gas from the burner group #100 and purifies it in a wet manner. Conventional burners have low efficiency for PFC gas treatment due to technical limitations of combustion efficiency and exhaust gas inlet size. Corrosion resistance is also very weak, and the embodiment according to the invention is characterized in that since the exhaust gas inlet is 'expanded by about 3 times compared with the conventional burner, The pipeline will be blocked due to the inflow of the exhaust gas, and since the relative inflow speed is low, the direct flame can be used for a longer period of time, so that the PFC gas which is not easily decomposed can be processed by more than 99%. For example, the chemical formula of pFC gas decomposition in the burner assembly is as follows: [Chemical Formula 2] + 4CH4 + g〇2 8HF + 8C02 + 4H2〇24 1274129 [Chemical Formula 3] C3F8 + 3CH4 + 6〇2 8HF + 6C02 + 2H2〇[Chemical Formula 4] 2C2F6 + 4CH4 + % + 12Ηρ + 8C〇2 + 2H2〇[Chemical Formula 5] CF4 + 2CH4 + 4〇2 4HF + 3c〇2 + 2H2〇

/ contends 4,200, 3 〇〇 for the ion treatment of hf. The exhaust gas systems C2, F4, and cF4 discharged according to an embodiment of the present invention are harmful to the human body and corrosive. The P100 gas for processing the PFC gas, the semiconductor process, the chemical process, and the like, and the PFC gas such as C3F8, NF3, and SF6, which are separated from the burner group according to the above chemical formula, can be wet-washed in two treatments, that is, according to the present invention. In one embodiment, the exhaust gas of the HF, which can be processed by the burner assembly i, and the worker-man, is separated and sent to the first wet cleaning unit 2 (by the first Piping part 24〇 is connected to

The burner unit 1〇0) and the second wet cleaning unit 3〇〇 are connected to the burner unit 并 in parallel by the second piping unit. Fig. 1 is a partial cross-sectional view for explaining a wet cleaning portion of the exhaust gas purifying treatment apparatus of the embodiment of the present invention. As shown in FIG. 12, the wet cleaning unit 2 of the embodiment of the present invention includes a first-time dust collecting unit 231; a circulating water spray mechanism (circulati〇n water spray) 234; Dust collection unit 232; and water spray mechanism (such as water spray) 235 ° Specifically, the exhaust gas discharged from the semiconductor manufacturing device is burned or oxidized in the burner 25 1274129, or burned by thermal decomposition. After the primary purification, the first and second wet cleaning units 200 and 3 are flowed through the piping portion. The exhaust gas that has been purified once still contains untreated gas and dust particles. In addition, the circulating water spray mechanism 234 of the first and second wet cleaning units 2〇〇' 3〇〇, the once-purified exhaust gas sprayed into the through-pipe portions 240 and 242, once after being sprayed with water The purified exhaust gas passes through the primary dust collecting portion 23 1 . According to this, powdery dust or the like contained in the exhaust gas which has been purified once can be washed. The pick-up can be washed with higher precision by passing the washed exhaust gas again through the secondary dust collecting unit 232 and the fresh water spray mechanism 235. According to a preferred embodiment of the present invention, the filler 239 is placed between the primary dust collecting portion 231 and the secondary dust collecting portion 232, so that the contact area between the exhaust gas and the water is doubled. The efficiency is washed. According to an embodiment of the present invention, the primary purge gas from the burner assembly is injected into the tray 236 of the wet cleaning unit 200, and the water sprayed by the self-circulating water spray mechanism 234 is used! The secondary dust collecting unit 23 treats the water-soluble gas. At this time, the size of the treated by-product is about 5 #1 or less. Second, the specific surface area of the tray 236 of the wet cleaning unit 200 is maximized, and the most suitable filling material is used. The exhaust gas passing through the 1-person private dust collecting unit 231 is first passed through the water collecting unit 235 and the filling #239', and then passed through the second dust collecting unit. At this time, the exhaust gas 3 purified once in the tower tank 236 of the wet cleaning unit 200 is i-formed. In the case of the material gas, the water sprayed by the water spray mechanism encounters ions in a water-soluble state. The aqueous solution is acidic, and 26 1274129 is an aqueous solution when the wet treatment is performed to dissolve the nh3 gas in water. In general, the acid gas reacts easily with the organic (Na〇H, k〇h) substances, and the reactivity with all acid gases such as c〇 is good not only with acid gases such as HF and cl2, but also A掏^

The efficiency of the horse can be added by adding NaOH or K〇H. In addition, the dust collection unit 23 丨盥 /, the z-person dust collection unit 232 is in the form of a mesh, and the water is injected into the exhaust gas injected from the (four) unit. The secondary dust collecting unit 231 is provided with a circulating water spray mechanism 234. In addition, the water purging mechanism 235 is provided at the lower end of the second dust collecting portion 232 in order to perform secondary cleaning of the scorpion of the hemp, the sputum-u, which has passed through the primary dust collecting portion 231. Therefore, it is possible to purify the exhaust gas with a high precision, and the purified gas is discharged to the outside through the duct. As described above, the present invention has been described with reference to the preferred embodiments. However, it is to be understood that the present invention may be variously modified and practiced without departing from the spirit and scope of the invention. [Simple description of the drawing] Fig. 1 is a plan view showing the structure of a gas burner nozzle which is a conventionally used waste appliance, and a ginseng/b. Fig. 2 is a cross-sectional view showing the structure of the conventional waste. The gas burner nozzle is shown in Fig. 3. The process of the exhaust gas purification treatment device shown in Fig. 3 is shown in Fig. 4 and Fig. 4 is in the field, and is used to explain the exhaust gas purification treatment garment of the present invention. A perspective view of the burner assembly. 27 1274129 Fig. 5 is a plan view showing the fuel-emitting components of the exhaust gas purification treatment apparatus of the one-month embodiment of the present invention. Fig. 6 is a bottom plan view showing the configuration of a burn-in component mounting brush in an exhaust gas purification process according to an embodiment of the present invention. 7A through 7C are cross-sectional views showing a burner assembly of an exhaust gas purification treatment apparatus according to an embodiment of the present invention. Η 8 series is used to explain "and is too ~ 士, 、, 衣方; the gas component of the burner assembly of the exhaust gas purification treatment device of one embodiment of the present invention + 1 卞 卞 脰 。 。 。 。 。 。 。. Figure 9 is a perspective view of a gas burner nozzle assembled to a burner assembly of an exhaust gas purification treatment apparatus according to an embodiment of the present invention. Figure 4 is another cross-sectional view of the gas burner nozzle of the burner assembly of the exhaust gas purification treatment apparatus of one embodiment of the invention. Fig. 10 is a schematic view for explaining the result of an operation of simulating the exhaust gas purification treatment t of an embodiment of the present invention. Fig. 11 is a view showing the configuration of an exhaust gas purification treatment apparatus according to an embodiment of the present invention. Fig. 1 is a partial cross-sectional view showing the exhaust gas purifying apparatus of an embodiment of the present invention. [Main component symbol description] 2 Burner 10 Exhaust gas supply nozzle 12 Exhaust gas 20 Fuel supply nozzle 22 Fuel gas 28 1274129

30 oxidant supply nozzle 32 oxidizing gas 40 semiconductor manufacturing apparatus 50 burner part 60 wet cleaning part 100 burner assembly 101 N2 gas injection port 102 ignition part 103 PU sensor part 105 inner ring 106 ceramic tube 107 outer ring 108 burning Cooler 109 main flange 110 exhaust gas supply manifold 1 12 cooling water circulation portion 113 cooling water injection portion 114 rotary brake assembly 1 15 flame sensor 118 rotating shaft 119 brush remover 120, 120a, 120b, 120c 1st to 3rd gas burner nozzle 121 flange 121a exhaust gas supply direct flame nozzle 29 1274129

122 123 123a 124 124a 125 126 127 128 130 200 231 232 234 235 236 239 240 242 300 1000 1st metal seal fuel gas supply fuel supply nozzle oxidant supply oxidant supply nozzle cooling water supply head unit pedestal 2 Metal sealing part, exhaust gas supply part, ceramic tube, first wet type cleaning part, first-time dust collection part, second-time dust collection part, circulating water spray mechanism, water washing mechanism, tower tank filling material, first piping part, second piping part, second Wet cleaning department exhaust gas purification treatment device 30

Claims (1)

' 1274129 X. Patent application scope: 1 · An exhaust gas purification treatment device for purifying exhaust gas discharged from semiconductor processes and chemical processes, and then discharging, characterized in that it comprises: a burner portion for burning the exhaust gas a flammable gas and an explosive gas are removed; a wet cleaning unit is connected in parallel to the burner portion to dissolve a water-soluble toxic gas in the exhaust gas treated by the burner portion in water; and a piping portion for connecting the combustion The burner portion and the wet cleaning portion; the burner portion is composed of a burner assembly, comprising: a main flange; a ceramic tube disposed in the main flange; and a cold water circulation portion disposed on the main portion a flange and the ceramic tube for adjusting a temperature in the ceramic tube; an exhaust gas supply manifold disposed at an upper center of the main flange for supplying various exhaust gases; and a plurality of gas burner nozzles The supply manifold is centered to form a three-phase direct flame; it is disposed at an upper portion of the main flange and is angularly shaped to be used for the combustion of the exhaust gas. Direct flame generated by the exhaust gas nozzle (transmitted through the exhaust gas supply manifold discharge) be indirect flame treatment. 2. The exhaust gas purification treatment apparatus according to claim 2, further comprising a sensor disposed on an upper portion of the main flange portion for detecting a flame in the ceramic tube. 31 ' 1274129 3: The exhaust gas purification unit of the patent application scope fi includes a brush remover, which is arranged, and enters the "the exhaust gas supply inside the main flange of the sea" and the combustion nozzles of the sea On one side of the side, the field, the crying component meat "corner" is used to remove the burning of π, and the adsorption of foreign matter and by-products produced in the piece. 4·^ The exhaust gas purification treatment I of the third application patent scope includes: a rotary brake assembly for driving the brush, disposed at the center of the exhaust gas supply manifold formed at the upper center of the upper portion; And a rotating shaft disposed between the brush and the rotary brake assembly for transmitting power of the side-running brake assembly to the brush. The invention relates to an exhaust gas purification treatment device according to item 1 of the monthly patent range, wherein the lanthanum system is composed of a substance having a low heat transfer coefficient, and # is a direct flame generated by the gas burner nozzle by the heat insulation effect of the heat generated by the isolation. The shape, 胄, imparts the same heat to the exhaust gas supply manifold that does not produce a direct flame to create an indirect flame. 6. The exhaust gas purification treatment device of claim </RTI> wherein the gas burner nozzle comprises: eight flanges for forming an exhaust gas supply portion and an exhaust gas supply nozzle for injecting exhaust gas; the first metal sealing portion Provided on the upper side of the flange; a fuel gas supply unit provided with the combination of the first! a fuel supply nozzle of the flange on the lower side of the metal sealing portion; an oxidant supply portion provided with an oxidant supply nozzle combined with the flange of the fuel gas supply portion for J; 32 1274129 a head unit base mounted thereon The lower side of the flange. ... cooling water (PCW; Process co〇lmg Water) supply, with Luhai oxidant for 73⁄4 neighbor corporal... ^ ; " ° 卩 under the head unit base; and to the dense two. 2 a sealing portion for applying an exhaust gas purifying treatment device between the flange and the base of the head unit, such as the gas injector nozzle, the inner nozzle center The concentric circles are equipped with exhaust gas for the heart-to-heart meal, in which the exhaust gas supply is supplied to the reservoir: the τ member is on the outer side of the circle, in a manner different from the exhaust gas 仏To the outside of the concentric circle of the fuel supply nozzle, the nozzle should be provided. The oxidant is provided in the form of a coaxial method. The exhaust gas purification treatment is installed as in the patent application (4), and the first metal sealing part (1) is sealed. The fuel can be supplied from the fuel supply nozzle t, and the fuel should not leak to the outside; the sealing action of the second metal sealing portion can prevent the oxidizing agent injected from the oxidized Hungarian electrode (1) From the oxidation d ί, the mouth should be reversed and leaked to the outside. 9罟If any of the purging treatment devices in the scope of the patent application, in the middle, the idle U too ^ ^, the majority of the direct flame The center of the burner shell 33 is fine, and the 兮ru class goes, and the star maintains a predetermined slope with the central axis of the main flange. 1〇·If the exhaust gas purification treatment device of claim 9 is straight, the exhaust gas The central axis of the supply manifold is set to be parallel to the middle I axis of the main edge. 33 1274129 Ryo Zhuang. For example, the exhaust gas purification sound and clothing of any of the scopes of claims 6 to 8 The oxidizing agent sprayed by the oxidant supply nozzle cools the flow rate of the fuel injected by the fuel supply nozzle. • The exhaust gas purification treatment device of the first application patent scope, in the meter, 兮, 虫 I, Λ 洗Parallel link The burner unit is provided with a set of parts. 1 3 · For example, the exhaust gas purification treatment device of the first application of the scope of the patent application, the &quot;Hai Wet Washing Department includes ···&quot; a secondary dust collecting portion for purifying the gas by the burner; and a waste water washing mechanism for disposing the waste water injected from the burner portion in the first dust collecting portion a second-stage dust collection unit for refining the exhaust gas passing through the dust collection unit twice; the water cleaning mechanism is disposed under the two dust collection units and The 滇/U material is filled between the primary and secondary dust collecting portions to increase the contact surface area of the waste gas and water. * XI, schema: such as the next page. 34