JP4160977B2 - Waste gas purification treatment equipment - Google Patents

Description

  The present invention relates to a waste gas purification treatment apparatus for removing harmful components contained in exhaust gas exhausted by being connected to semiconductor manufacturing equipment, and more particularly, a small number of direct flames. A burner assembly of a waste gas purification processing apparatus that can improve the energy saving effect and combustion performance, etc. by reducing the amount of fuel consumption by demonstrating the performance that a plurality of direct flame nozzles are provided with only the nozzle, and one The present invention relates to a waste gas purification processing apparatus capable of simultaneously treating a large volume of waste gas since a pair of wet cleaning parts are connected in parallel to a combustion part.

  In general, waste gases emitted from chemical processes and semiconductor manufacturing processes are highly toxic, explosive, and corrosive. It will cause deception. Therefore, the waste gas must be subjected to a purification process that reduces the content of harmful components below the allowable concentration, and only the harmless gas is discharged into the atmosphere through the purification process to remove such toxic substances. As required.

  There are roughly three methods for treating harmful gases emitted from semiconductor manufacturing processes. One is a burning method in which an ignitable gas containing mainly hydrogen groups is decomposed, reacted or burned in a high-temperature combustion chamber, and the second is mainly a water-soluble gas stored in a water tank. It is a wet method in which it is dissolved in water while being passed through it, and finally, while the harmful gas that is not ignited or insoluble in water passes through the adsorbent, it is physically treated by the adsorbent. This is an adsorption method in which purification is performed by chemical or chemical adsorption.

  More specifically, as described above, the waste gas purification treatment includes a wet method (Wet Scrubber), an indirect oxidation method using an electric heater (Thermal Wet Scrubber), and a direct oxidation method using a fuel gas burner (Direct Burn Wet Scrubber). ), A physicochemical adsorption method using an adsorbent (Dry Scrubber), a plasma method using an electric discharge (Plasma Scrubber), and the like.

  As shown in FIGS. 1 and 2, the configuration of a gas burner nozzle of a waste gas purification processing apparatus according to the prior art is shown as a plan view and a cross-sectional view, respectively. FIG. 3 is a schematic view showing a process of a general waste gas purification processing apparatus, and the present invention is characterized in the burner unit 50 during the process of the conventional waste gas purification processing apparatus.

  In the conventional coaxial diffusion flame burner 2, a plurality of arranged nozzles are arranged in the order of a waste gas supply nozzle 10, a fuel supply nozzle 20 and an oxidant supply nozzle 30 from the inside while being coaxial with each other. Yes.

  The waste gas supply nozzle 10 supplies a waste gas 12 discharged from a semiconductor manufacturing process, a chemical process, etc., and the waste gas 12 is a chemical vapor deposition (CVD) or etching process. As it contains a large amount of harmful substances, it causes environmental pollution.

  The fuel supply nozzle 20 injects a fuel gas 22 serving as a flame fuel. As the fuel gas 22, liquefied natural gas, liquefied petroleum gas, hydrogen gas, or the like is mainly used.

The oxidant supply nozzle 30 injects an oxidant gas 32 that forms a flame by a combustion reaction with the fuel gas 22, and oxygen (O ₂ ) or air is mainly used as the oxidant gas 32. .

  Below, the process in which the waste gas 12 supplied by the waste gas supply nozzle 10 is burned by the coaxial flow diffusion flame burner will be briefly described.

  The fuel gas 22 injected by the fuel supply nozzle 20 and the oxidizing gas 32 injected by the oxidant supply nozzle 30 are mixed and transferred to the combustion chamber. At this time, when ignited by an igniter (not shown), the fuel gas 22 and the oxidizing gas 32 can be burned by the flame. At this time, the waste gas 12 is burned while being mixed with the fuel gas 22, It will be forcibly oxidized.

  Since the fuel supply nozzle 20 and the oxidant supply nozzle 30 are arranged in parallel while being coaxial with each other, the fuel gas 22 injected from the fuel supply nozzle 20 and the oxidant supply nozzle 30 are arranged. Similarly, the oxidizing gas 32 can be injected in parallel.

  On the other hand, the fuel gas 22 injected from the fuel supply nozzle 20 and the oxidant gas 32 injected from the oxidant supply nozzle 30 are mixed at a predetermined point by a diffusion phenomenon and can be ignited by a flame to generate a flame. It is going to go through the combustion process that will be done.

  However, since the fuel gas 22 and the oxidizing gas 32 are injected in parallel with each other in this way, the fuel gas 22 and the oxidizing gas 32 are not diffused easily, so that a part of the fuel gas 22 is oxidized. There was a fear that the reaction chamber could come out of the combustion chamber in an unreacted state while it could not react with 32.

  Therefore, the amount of carbon monoxide (CO) produced in the combustion process is increased, the combustion rate required for treating the waste gas 12 is lowered, and the waste gas 12 is completely treated. There are limits.

  In addition, the injection speed of the fuel gas 22 and the oxidizing gas 32 increases in proportion to the pressure of the fuel gas 22 and the oxidizing gas 32 injected from the fuel supply nozzle 20 and the oxidant supply nozzle 30, and the fuel gas The degree of diffusion between the gas 22 and the oxidizing gas 32 decreases in half proportion to the injection speed, so that when the fuel gas 22 and the oxidizing gas 32 are increased in the injection speed, the diffusion between the fuel gas 22 and the oxidizing gas 32 is increased. The degree decreases.

  Accordingly, as the injection speed of the fuel gas 22 and the oxidizing gas 32 increases, the mixing of the fuel gas 22 and the oxidizing gas 32 is mainly performed at a position farther from the fuel supply nozzle 20 and the oxidant supply nozzle 30. As the center where the mixed gases 22 and 32 are burned is farther from the nozzles 10, 20 and 30, the combustion efficiency has to be reduced in proportion.

  In particular, when the fuel gas 22 and the oxidizing gas 32 are injected in parallel, the fuel gas 22 and the oxidizing gas 32 come into contact with each other and the time for combustion is shortened, so that the production of carbon monoxide (CO) increases. Therefore, the combustion efficiency is greatly reduced.

  Further, since the waste gas 12 can also be a fuel like the fuel gas 22, it undergoes a combustion reaction with the oxidizing gas 32, and an endothermic reaction and an exothermic reaction are simultaneously advanced in the combustion reaction process. From this, the waste gas 12 has a diffusing action at a predetermined point together with the oxidizing gas 32, but the waste gas supply nozzle 10 is parallel to the oxidant supply nozzle 30 while being coaxial, and thus waste gas 12 is discarded. There is a problem that the gas 12 is difficult to diffuse with the oxidizing gas 32 at a suitable point and the combustion efficiency is lowered.

  Further, when the waste gas purification process is operated for a long time, the waste gas that could not be completely combusted by the waste gas supply nozzle 10, the fuel supply nozzle 20, and the oxidant supply nozzle 30 and other gases are adsorbed. In addition, there is a problem that the gas cannot be supplied and the combustion efficiency is inferior.

  In addition, by operating the waste gas purification processing apparatus for a long time, the burner assembly can be heated and operated at a temperature higher than appropriate. This causes a problem that various parts such as a flame sensor are difficult to operate normally.

  Further, the process of the general waste gas purification treatment apparatus is such that the waste gas 12 discharged from the semiconductor manufacturing apparatus 40 or the like is first burned in a burner zone 50 to generate an ignitable gas and an explosive gas. Then, the water-soluble toxic gas is secondarily dissolved in water by the wet cleaning unit 60.

  That is, the waste gas 12 discharged from the semiconductor manufacturing apparatus 40 is burned by a method in which it is primarily burned / oxidized in the burner unit 50 or thermally decomposed, while the waste gas escaped from the burner unit 50. Among them, the untreated gas 22 such as a part of gas and dust particles that could not be treated is transferred to the wet cleaning unit 60 and secondarily by injecting water in the wet cleaning unit 60, It goes through a wetting process that can separate the powder in the oxidizing gas. The cleaned gas 32 can then be exhausted to the atmosphere via the filter and duct.

  Higher integration of semiconductors and higher capacity of liquid crystal display devices (TFT LCDs) will lead to a significant increase in waste gas emissions, as well as the use of special gases due to the emergence of new industries. Is also increasing day by day.

  Therefore, according to the process of the conventional waste gas purification processing apparatus, a plurality of intake units are attached to the head unit in order to simultaneously process various types of waste gas. This is a situation where various types of waste gas are being treated.

  However, in order to apply the conventional waste gas purification treatment apparatus as described above to equipment that discharges a large amount of waste gas such as TFT-LCD semiconductor equipment, the burner unit 50, the wet cleaning unit 60, However, if a large volume of waste gas is to be treated by using a burner unit 50 in which a ceramic heater rod covering a conventional Inconel chamber is integrally formed. However, due to technical limitations in the size of the inlet, the processing efficiency of PFC (perfluoro carbon) gas becomes low and the corrosion efficiency becomes very weak.

  Even if the capacity of the conventional burner unit 50 is increased in order to process a large volume of waste gas, the wet cleaning unit 60 must be manufactured so as to be able to process a large volume accordingly. However, in order to increase the capacity of the conventional wet cleaning unit 60, the length of the tower constituting the wet cleaning unit 60 must be doubled, which is necessary to operate the wet cleaning unit. There is a problem that a lot of power is required and the installation becomes troublesome.

  The present invention has been made in view of such problems of the prior art, and its purpose is to provide the same performance as that provided with a plurality of direct flame nozzles with only a few direct flame nozzles. It is an object of the present invention to provide a burner assembly for a waste gas purification processing apparatus that can be consumed with a small amount of fuel and that is excellent in energy saving effect and combustion performance.

  Another object of the present invention is to provide a burner assembly for a waste gas purification processing apparatus which can improve the energy saving effect and combustion performance by providing a wiper and removing foreign matter adsorbed by a plurality of nozzles. Is to provide.

  Still another object of the present invention is to provide a cooling water circulation device so that it can operate at an appropriate temperature, so that a plurality of parts can operate normally, and an overall energy saving effect and combustion performance can be achieved. An object of the present invention is to provide a burner assembly for a waste gas purification processing apparatus that can be improved.

  Finally, an object of the present invention is to provide a waste gas purification treatment apparatus capable of simultaneously treating a large volume of waste gas.

In order to achieve the above-mentioned object, the present invention is a waste gas purification treatment apparatus for purifying and releasing waste gas discharged from a semiconductor manufacturing process, a chemical process, etc. And a burner section for removing explosive gas,
A wet cleaning unit that is connected in parallel to the burner unit and dissolves a water-soluble toxic gas in the waste gas processed in the burner unit, and a pipe for connecting the burner unit and the wet cleaning unit And the burner portion is provided between the main flange, the ceramic tube provided in the main flange, and the main flange and the ceramic tube, and adjusts the temperature in the ceramic tube. A cooling water circulation section, a waste gas supply manifold for supplying various types of waste gas, provided at the center of the upper portion of the main flange, and an upper portion of the main flange in a triangular shape centering on the waste gas supply manifold. made is made from the burner assembly including a plurality of gas burner nozzle for generating a direct-flame while supplying the waste gas, The gas burner nozzle forms a waste gas supply part and a waste gas supply nozzle, and has a flange having a structure for injecting waste gas, a first metal sealing part provided on the upper side of the flange, A fuel gas supply unit including a fuel supply nozzle combined with the flange below the first metal sealing unit, an oxidant supply unit including an oxidant supply nozzle combined with the flange below the fuel gas supply unit, and the flange A head unit base to be attached to the lower side,
Including a cooling water supply unit disposed on the head unit base below the oxidant supply unit and a second metal sealing unit for sealing between the flange and the head unit base, the waste By providing a waste gas purification processing apparatus, wherein waste gas discharged through a gas supply manifold is processed by generating an indirect flame using a direct flame generated by the gas burner nozzle. Achieved.

  The sensor further includes a sensor provided on an upper portion of the main flange for detecting a flame in the ceramic tube.

  Further, a wiper for removing foreign substances and by-products, which are provided in the waste gas supply manifold and one side end portions located inside the main flanges of the plurality of burner nozzles and are generated in the burner portion and can be adsorbed thereto, is further provided. It is characterized by including.

  Further, a rotary actuator assembly provided at the center of a waste gas supply manifold provided at the upper center of the main flange to drive the wiper, and provided between the wiper and the rotary actuator assembly, the power of the rotary actuator assembly is A rotary shaft for transmitting to the wiper is further included.

  In addition, the ceramic tube is made of a material having a low heat transfer coefficient, and exhibits a flameproof action to block the generated heat so that a flame generated from a gas burner nozzle having a direct flame forms a flame as a whole. Thus, an indirect flame is generated because the same amount of heat is given to a waste gas supply manifold without a direct flame.

  Further, a waste gas supply nozzle is disposed on a concentric circle at the innermost center of the gas burner nozzle, and is not coaxial with the waste gas supply nozzle on the outer concentric circle of the waste gas supply nozzle, while having a predetermined inclination angle. A fuel supply nozzle is disposed so as to be inclined inward, and an oxidant supply nozzle is disposed on the outer concentric circle of the fuel supply nozzle at equal intervals and coaxial with the waste gas supply nozzle. .

  The first metal sealing part plays a role of sealing so that the fuel supplied from the fuel supply nozzle does not leak to the outside, and the second metal sealing part has an oxidant injected from the oxidant supply part. The oxidant supply nozzle flows backward from the nozzle and is sealed so as not to leak to the outside.

  Further, the central axes of the plurality of gas burner nozzles for directly generating a flame are provided so as to maintain a predetermined gradient with respect to the central axis of the main flange.

  Further, the central axis of the waste gas supply manifold is provided in parallel to the central axis of the main flange.

  In addition, the flow rate of the oxidant that can be injected through the oxidant supply nozzle can be injected through the fuel supply nozzle and is faster than the flow rate of the fuel.

  In addition, the wet cleaning unit is connected to the burner unit in parallel, and thus forms a set.

  In addition, the wet cleaning unit is configured to inject water into the waste gas injected from the burner unit, and a primary dust collecting unit having a net shape to primarily purify the waste gas that has passed through the burner unit. A circulating water spray provided at the lower end of the primary dust collecting unit, a secondary dust collecting unit made of a net for secondary purification of waste gas that has passed through the primary dust collecting unit, and secondary dust A fresh water spray provided at the lower end of the collection unit and a filler filled between the primary and secondary dust collection units to increase the contact surface area between waste gas and water are included. .

  According to the preferred embodiment of the present invention having the above-described configuration, since the wiper is provided, energy can be saved and combustion performance can be improved by removing foreign matter adsorbed by the plurality of nozzles. In addition, by providing a cooling water circulation device so that it can operate at an appropriate temperature, a large number of parts operate normally, so that overall energy saving and combustion performance improvement can be achieved.

  In addition, by adopting the coaxial shunt diffusion combustion method, it is possible to demonstrate the performance that a plurality of direct flame nozzles are provided with only a small number of direct flame nozzles. Performance can be improved.

  In addition, by minimizing the gas burner nozzle with a complicated structure and disposing the waste gas nozzle with a simple structure to have the same effect as the gas burner nozzle, the overall structure of the burner section is simple and easy. Can be made.

  In addition, as described above, the injection of the oxidant and the injection angle are given to the nozzle to increase the combustion efficiency, thereby increasing the combustion heat due to the flame and increasing the waste gas treatment efficiency, which is the purpose of the gas scrubber. In addition, PFC gas treatment is also possible.

Further, by providing the nozzle for injecting the oxidant at a predetermined angle, a warm current is formed between the waste gas and the fuel CH _4, and both the fuel CH ₄ and the waste gas are in contact with the oxidant. In addition, the reaction time is increased.

Further, CO can be generated from all combustion engines that use a fuel containing C as a main component. CO is generated mainly when the combustion time is short or the combustion energy is not sufficient. However, according to a preferred embodiment of the present invention, the combustion efficiency increase by adjusting the injection angle of the oxidant is mixed approximately 2 mm away from the injection port so as to make contact between the fuel CH ₄ and the oxidant O _2. Since it burns, it has the effect of reducing the generation of CO.

  Furthermore, on the outermost side, the heat generated from the burner is recirculated to the inside by providing a ceramic tube that has a high heat insulation effect and can cut off heat from the outside by blocking radiant heat. The efficiency can be increased and the temperature can be maximized.

  Finally, a large volume of waste gas can be treated simultaneously by connecting a set of wet cleaning sections in parallel to the burner section.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 3 is a schematic view showing the steps of a conventional waste gas purification processing apparatus, and the present invention has the characteristics in the burner section 50 during the steps of the conventional waste gas purification treatment apparatus. 4 and 5 are a plan view and a cross-sectional view showing the configuration of the burner part of the waste gas purification processing apparatus according to one embodiment of the present invention.

  The waste gas purification process for purifying waste gas that can be discharged into clean air after being used in the semiconductor manufacturing process or chemical process of the present invention is usually composed of two stages: a combustion type and a wet type.

  As shown in FIG. 3, according to the waste gas purification treatment apparatus, the waste gas 12 that can be discharged from the semiconductor manufacturing apparatus 40 is primarily burned and oxidized in the burner unit 50 or thermally decomposed. Of the waste gas leaked from the burner unit 50, the gas, dust particles, etc. that could not be processed are transferred to the wet cleaning unit 60. Then, a cleaning process is performed in which the powder in the oxidizing gas can be separated by the water that is secondarily sprayed from the wet cleaning section 60. The cleaned gas 32 can then be exhausted to the atmosphere via the filter and duct.

  The burning method may include an indirect oxidation method by driving a heater and a direct oxidation method by ignition. In this embodiment, the gas burner nozzle of the waste gas purification processing apparatus relates to a direct oxidation method.

  There may be a downward flow method in which a flame can radiate downward and an upward flow method in which a flame can radiate upward. In this embodiment, the downward flow method will be described as an example.

  4A and 4B are perspective views for explaining a burner portion of a waste gas purification processing apparatus according to an embodiment of the present invention, and FIG. 5 is a burner of the waste gas purification processing apparatus according to an embodiment of the present invention. FIG. 6 is a bottom view for explaining a configuration in which a wiper is attached to a burner portion of a waste gas purification processing apparatus according to an embodiment of the present invention, and FIG. 7C is a cross-sectional view for explaining a burner portion of the waste gas purification processing apparatus according to one embodiment of the present invention.

  As shown in the drawings, a burner assembly 100 of a waste gas purification apparatus according to an embodiment of the present invention includes a main flange 109, an inner ring 105 attached to the inside of the main flange 109, and an inner ring 105 of the main flange 109. A ceramic tube 106 attached to the lower part, an outer ring 107 combined between the main flange 109 and the inner ring 105, and a cooling water circulation part 112 provided between the main flange 109 and the ceramic tube are included.

Further, a waste gas supply manifold 110 is disposed at the center of the main flange 109, and the first to third gas burner nozzles 120a to 120c are formed in a triangular shape with the waste gas supply manifold 110 as a center. Provided. A plurality of N ₂ gas injection ports 101 and a plurality of burner cooling units 108 are provided around the first to third gas burner nozzles 120a to 120c.

  On the other hand, on the side surface of the main flange 109, first to third ignition units 102, a flame sensor 115, and a PU sensor unit 103 are arranged to correspond to the first to third gas burner nozzles 120a to 120c.

  As shown in FIG. 6, according to an embodiment of the present invention, the wiper 119 is located inside the main flange 109 of the first to third gas burner nozzles 120 a to 120 c and the waste gas supply manifold 110. The rotary actuator assembly 114 and the rotary shaft 118 are tightened to touch one end. Therefore, after operating the burner assembly 100 of the waste gas purification processing apparatus for a long time, one side end located inside the main flange 109 of the first to third gas burner nozzles 120a to 120c and the waste gas supply manifold 110. The foreign matter and by-products adsorbed on the part can be removed by operating the rotary actuator assembly 114 and rotating the wiper 119.

  As shown in FIGS. 7A to C, according to one embodiment of the present invention, the cooling water circulation part 112 is provided between the main flange 109 and the ceramic tube 106 and is cooled through the cooling water injection part 113. By injecting water, the temperature of the burner assembly 100 can be maintained at a constant level. Therefore, even if the waste gas purification processing apparatus is operated for a long time, various components such as a flame sensor normally operate without the burner assembly 100 appropriately exceeding the temperature.

  As shown in FIGS. 4 and 5, in the burner assembly 100 of the waste gas purifying apparatus according to the preferred embodiment of the present invention, first to third gas burner nozzles 120a, 120b, which can generate a direct flame, 120c is arranged so as to form a substantially equilateral triangle outward from the center, and a waste gas supply manifold 110 capable of supplying waste gas without generating a direct flame is provided at the center of the burner assembly. The portion is substantially equilateral triangular, and is disposed in a triangle formed by the first to third gas burner nozzles so as to cross the triangle formed by the upper surface of the waste gas supply manifold 110.

  In addition, according to a preferred embodiment of the present invention, the burner assembly 100 of the waste gas purification processing apparatus is configured to prevent the heat generated from the burner assembly 100 by forming the ceramic tube 106 from a material having a low heat transfer coefficient. By performing the flame action, the flame generated from the first to third gas burner nozzles 120 a, 120 b, 120 c having a direct flame is formed entirely in the ceramic tube 106. Therefore, the same amount of heat is given to the waste gas supply manifold 110 without a direct flame.

  In addition, according to a preferred embodiment of the present invention, the first to third gas burner nozzles 120a, 120b, 120c having a direct flame hold a predetermined angle with respect to the central axis of the ceramic tube 106 at the upper end of the ceramic tube 106. Thus, the direct flame generated from each nozzle is characterized in that it is assembled so that it can be focused at a predetermined position in the ceramic tube 106.

  Therefore, according to a preferred embodiment of the present invention, three first to third gas burner nozzles 120a, 120b, 120c are used to supply fuel and treat waste gas. Since it is possible to produce a flame directly and achieve the same effect as a waste gas treatment apparatus that treats waste gas, the overall cost can be reduced.

  FIG. 8 is a perspective view for explaining a gas burner nozzle attached to a burner assembly of a waste gas treatment apparatus according to an embodiment of the present invention. FIGS. 9A and 9B are diagrams according to an embodiment of the present invention. It is sectional drawing of the gas burner nozzle attached to the burner assembly of a waste gas purification processing apparatus.

  As shown in FIGS. 8 and 9A, the gas burner nozzle 120 of the waste gas purification processing apparatus according to the embodiment of the present invention includes a waste gas supply unit 128 and a waste gas supply direct flame nozzle 121a to inject waste gas. A flange 121 having a structure for performing the above operation, a first metal sealing portion 122 formed on the upper side of the flange 121, and a fuel supply nozzle 123a that is combined with the flange 121 to the lower side of the first metal sealing portion 122. Formed on the combustion gas supply unit 123, the oxidant supply unit 124 that is combined with the flange 121 on the lower side of the fuel gas supply unit 123 and includes the oxidant supply nozzle 124a, and the head unit base 126 below the oxidant supply unit 124. The cooling water supply unit 125 provided, the head unit base 126 and the flange 121 that are fastened to the lower side of the flange 121. Comprising a second metal sealing section 127 for sealing between the head unit base 126.

  According to the embodiment of the present invention, as shown in FIG. 9B, a waste gas supply direct flame nozzle 121a is disposed on a concentric circle at the innermost center of the gas burner nozzle 120. A fuel supply nozzle 123a is disposed on the outer concentric circle while being coaxial with the waste gas supply direct flame nozzle 121a. Then, the oxidant supply nozzles are arranged on the outer concentric circles of the fuel supply nozzle 123a at equal intervals but are inclined inward while having a predetermined inclination angle without being coaxial with the fuel supply nozzle 123a. 124a is disposed.

  The fuel supply nozzle 123a and the oxidant supply nozzle 124a are located on the center line on the same plane, and the number of these nozzles is the same.

Further, the oxidizing agent supply nozzle 124a, when the spray angle and the direction of the fuel supply nozzle 123a with a gradient of about 10 °, and 0 ₂ gas injected from the oxidizing agent supply nozzle 124a, which is injected from the fuel supply nozzle 123a The CH ₄ gas intersects at a location approximately 20 mm away from the nozzle. Thus, although warm current can be formed, diffusion of the該暖flow, CH ₄ gas injected from 0 ₂ gas and the fuel supply nozzle 123a ejected from the oxidizing agent supply nozzle 124a in the waste gas supply direct-flame nozzle 121a It can be accelerated and the center of the flame can be controlled with the angle of the nozzles (123a, 124a).

On the other hand, according to an embodiment of the present invention, since the nozzle injection angle is used as well as the nozzle injection angle, the warm current can be formed more efficiently. In other words, it is preferable that the flow rate of CH ₄ gas injected from the fuel supply nozzle 123a faster than the flow rate of 0 ₂ gas injected from the oxidizing agent supply nozzle 124a. In other words, since the oxidant supply nozzle 124a is disposed at an angle of about 10 °, it overlaps the fuel supply nozzle 123a at a specific distance, but the flow rate of CH ₄ gas that can be injected from the fuel supply nozzle 123a is increased. set to be faster than the flow rate of 0 ₂ gas can be injected from the oxidizing agent supply nozzle 124a, it must be adapted to contain the injection mode of the main energy source of the flame formed. If the flow rate of _{0 2} gas can be injected from the oxidizing agent supply nozzle 124a is, if faster than the flow rate of CH ₄ gas can be injected from the fuel supply nozzle 123a, the injection mode of the CH ₄ gas in the fuel which can be injected from the fuel supply nozzle 123a Because it is destroyed, the fire cannot be controlled. In addition, since the reaction time between the fuel and the oxidant is short and fast, the combustion efficiency is rather inferior, so the temperature of the flame actually decreases and the length of the flame also decreases inversely.

To explain theoretically, the components of the fuel used and the auxiliary combustion gas follow the reaction chemical formula 1 as follows.
(Chemical formula 1)
CH ₄ +20 ₂ → CO ₂ + 2H ₂ O

  Therefore, when 1 kg of fuel gas is injected, 2 kg of oxygen must be injected, and it is preferable to add 0.2% of excess oxygen to the theoretical oxygen amount in order to increase efficiency.

The first metal sealing part 122 plays a role of sealing so that fuel (for example, CH ₄ ) supplied from the fuel supply nozzle 123a does not leak to the outside of the gas burner nozzle 120, and the second metal sealing part 122 127 plays a role in sealing so that the oxidant (for example, O ₂ or air) injected from the oxidant supply unit 124 flows backward from the oxidant supply nozzle 124 a and does not leak outside the gas burner nozzle 120. .

On the other hand, the waste gas supply nozzle 121a supplies waste gas that can be discharged in the semiconductor manufacturing process, chemical process, etc., and the waste gas is C ₂ , F ₄ , CF ₄ , C ₃ F ₈ , NF ₃ , SF _6, etc. Detoxification process that reduces the content of harmful components below that because it is toxic to human body and corrosive, and the content of such harmful components is above the allowable concentration It is a gas that always requires.

  The waste gas supply nozzle 121a for injecting the waste gas injected from the waste gas supply unit 128 serves as a central nozzle of the burner and injects a fuel gas such as liquefied natural gas, liquefied petroleum gas, or hydrogen gas to the outside thereof. Although surrounded by the supply nozzle 123a, this is for mixing the waste gas and the fuel gas well.

The oxidant supply nozzle 124a injects an oxidizing gas that forms a flame by a combustion reaction with the fuel gas, and oxygen (O ₂ ) is mainly used as the oxidizing gas.

  As shown in FIG. 9B, based on the cross section of the nozzle, the waste gas supply nozzle 121a is extended in parallel to the central axis of the waste gas supply unit 128 into which the waste gas is injected, but the fuel supply The nozzle 123a and the oxidant supply nozzle 124a are formed in a state inclined about 10 ° to 20 ° with respect to the waste gas supply nozzle 121a. In particular, when the inclination angle is about 10 °, the oxidizing gas that can be injected from the oxidant supply nozzle 124a and the fuel gas that can be injected from the fuel supply nozzle 123a intersect each other at a predetermined point on the outlet side of the gas burner nozzle 120 and diffuse. It can be seen that when the phenomenon occurs, it is mixed and burned.

  Therefore, since the fuel gas and the oxidizing gas cross each other at a predetermined point, a vortex is generated, and the warm current phenomenon of the mixed gas due to such a vortex current further accelerates the diffusion phenomenon. The intersection may be variously adjusted by adjusting the inclination angle θ of the oxidant supply nozzle 124a. In addition, the diffusion of the mixed gas at a limited point can enhance the combustion characteristics such as self-ignition of the mixed gas and flame propagation, and prevent incomplete combustion. By doing so, the flame zone is stably formed.

  In other words, when the flow rates of waste gas, fuel gas and oxidant gas are made different, a warm current is formed in the direction of injection. The formation of the warm current is a main factor that efficiently mixes different waste gas, fuel gas, and oxidant gas. At this time, a diffusion flame is generated by mixing between the fuel and the oxidant. Furthermore, it is an important factor that determines the length, form, and combustion efficiency of a coaxial shunt diffusion combustion type burner flame by forming a warm current. The flame thus obtained is referred to as a warm flow flame.

  On the other hand, the method of accelerating the diffusion of the fuel gas and the oxidizing gas at a limited point by forming the inclination angle θ of the oxidant supply nozzle 124a with respect to the fuel supply nozzle 123a also stably forms the flame zone. It is important to adjust the fuel gas injection speed of the fuel supply nozzle 123a and the oxidizing gas injection speed of the oxidant supply nozzle 124a, thereby extending the reaction time of the oxidizing gas and the fuel, The most important method is to improve the combustion efficiency.

  That is, if the oxidizing gas injection speed is higher than the fuel gas injection speed, the oxidizing gas injection mode can be destroyed, the flame cannot be stably controlled, and the reaction time between the fuel gas and the oxidizing gas is shortened. Since the length of the flame is shortened, a stable flame zone cannot be formed.

  Accordingly, the fuel gas injection speed is adjusted to be higher than the oxidizing gas injection speed. More specifically, when the oxidizing gas injection speed is 1, the fuel gas injection speed is set to about 1.37. The injection speeds of the fuel gas and the oxidizing gas can be controlled by adjusting the cross-sectional areas of the fuel supply nozzle that injects the fuel gas and the oxidant supply nozzle that injects the oxidizing gas. For this reason, the cross-sectional area of the oxidant supply nozzle 124a is preferably larger than the cross-sectional area of the fuel supply nozzle 123a.

  The waste gas injection speed is slower than the oxidizing gas injection speed, and therefore, the cross-sectional area of the waste gas supply nozzle 121a is preferably the largest among the nozzles.

The amount of fuel gas and oxidizing gas used is also important to maximize combustion efficiency. In the embodiment of the present invention, the fuel gas is methane (CH ₄ ), which is one of liquefied natural gas, and the oxidizing gas is oxygen (O ₂ ) as an example.

Methane (CH ₄ ) corresponds to a molecular weight of 16 when based on 1 mole, and oxygen (O ₂ ) corresponds to a molecular weight of 32 when based on 1 mole. In addition, when the ratio of methane (CH ₄ ) and oxygen (O ₂ ) is calculated based on the molecular weight, the ratio is 1: 2. Therefore, when supplying 1 kg of methane (CH ₄ ), 2 kg of oxygen (O ₂ ) should be supplied, and supplying oxygen in excess of about 0.2% increases combustion efficiency. is necessary.

FIG. 10 is a schematic view for explaining the result of simulating the operation of the waste gas purification processing apparatus according to one embodiment of the present invention.
According to the embodiment of the present invention, the first to third gas burner nozzles 120a, 120b, 120c are arranged outside in the form of an equilateral triangle to directly generate a flame. Then, it intersects with the triangle formed by the first to third gas burner nozzles 120a, 120b, and 120c in the form of an equilateral triangle with the waste gas supply manifold 110 that supplies the waste gas as the center without generating a direct flame. The waste gas injected using an indirect flame is processed.

  As shown in the drawing, the central axis of the waste gas supply manifold 110 and the central axis of the ceramic tube 106 are provided so as to be parallel to each other, while the first to third direct flames are generated. The central axes of the gas burner nozzles 120a, 120b, 120c are formed with a predetermined gradient with respect to the central axis of the ceramic tube 106 so as to have a focal point at a fixed point.

  Therefore, according to a preferred embodiment of the present invention, fuel is supplied using three gas burner nozzles 120a, 120b, 120c, the waste gas is treated directly by flame, and the waste gas is treated using three indirect flames. Process. This produces the same effect as a waste gas purification treatment apparatus that generates six direct flames and treats waste gas.

FIG. 11 is a configuration diagram of a waste gas purification processing apparatus according to an embodiment of the present invention.
As shown in FIG. 11, a waste gas purification processing apparatus 1000 according to the present invention is connected to a semiconductor equipment, and a burner assembly 100 for injecting waste gas to be treated and primarily performing purification treatment. The first wet cleaning unit 200 and the second wet cleaning unit 300 are connected in parallel to the burner assembly 100 in order to receive the firstly processed waste gas from the burner assembly 100 and perform a purification process in a wet manner. .

  Conventional burners have low PFC gas processing efficiency and very weak corrosion due to technical limitations in combustion efficiency and waste gas inlet size, but according to one embodiment of the present invention, the waste gas inlet is Since it is expanded by about three times or more compared with the conventional burner, the pipeline is not blocked by the inflow of waste gas. In addition, since the relative inflow rate is low, it is possible to treat 99% or more of PFC gas which is difficult to decompose by giving a long residence time in the direct flame.

  According to an embodiment of the present invention, a chemical formula for decomposing PFC gas in the burner assembly 100 is as follows.

(Chemical formula 2)
C ₄ F ₈ + 4CH ₄ + 8O ₂ → 8HF + 8CO ₂ + 4H ₂ O
(Chemical formula 3)
_{C 3 F 8 + 3CH 4 +} 6O 2 → 8HF + 6CO 2 + 2H 2 O
(Chemical formula 4)
2C ₂ F ₆ + 4CH ₄ + 9O ₂ → 12HF + 8CO ₂ + 2H ₂ O
(Chemical formula 5)
CF ₄ + 2CH ₄ + 4O ₂ → 4HF + 3CO ₂ + 2H ₂ O

According to one embodiment of the present invention, the waste gas discharged like in a semiconductor manufacturing process or chemical _{process, C 2, F 4, CF} 4, C 3 F 8, NF 3, PFC gases such as SF ₆ And while being toxic to the human body, it is corrosive. The PFC gas is processed by the burner assembly 100 in accordance with the chemical formula, so that the primary and secondary wet cleaning units 200 and 300 perform separation using HF that can be ion-processed.

  That is, according to one embodiment of the present invention, the waste gas separated by HF that can be primarily processed by the burner assembly 100 is connected to the burner assembly 100 by the first piping unit 240. The first wet cleaning unit 200 and the second wet cleaning unit 300 connected in parallel by the second piping unit 242 are transmitted respectively.

  FIG. 12 is a partial cross-sectional view illustrating a wet cleaning unit of a waste gas purification processing apparatus according to an embodiment of the present invention.

  As shown in FIG. 12, the wet cleaning unit 200 according to an embodiment of the present invention includes a primary dust collecting unit 231, a circulation water spray 234, a secondary dust collecting unit 232, and fresh water. Includes a fresh water spray 235.

  Specifically, the waste gas discharged from the semiconductor manufacturing apparatus is primarily purified by burning / oxidizing in the burner assembly 100 or burning by a thermal decomposition method, and then through the piping section. It can flow into the first and second wet cleaning units 200 and 300.

  Thus, the first-purified exhaust gas contains some gases and dust particles that could not be processed yet. Then, the circulating water spray 234 of the first and second wet cleaning units 200 and 300 injects water into the first purified waste gas injected through the piping units 240 and 242, like this The primary purified waste gas sprayed with water passes through the primary dust collecting unit 231. As a result, powdery dust contained in the waste gas purified primarily is washed.

  Then, the cleaned waste gas can be cleaned more accurately by passing the secondary dust collection unit 232 and the fresh water spray 235 again.

  According to a preferred embodiment of the present invention, since the filler 239 is packed between the primary dust collecting portion 231 and the secondary dust collecting portion 232, the contact area between the waste gas and water is doubled. Thus, the cleaning can be performed efficiently.

  According to one embodiment of the present invention, primary cleaning gas from the burner assembly is injected into the tower 236 of the wet cleaning unit 200 and water collected from the circulating water spray 234 is used to collect primary dust. The water-soluble gas is processed by the unit 231. At this time, the size of the target by-product to be processed is approximately 5 μm or less. In order to maximize the specific surface area of the tower 236 of the wet cleaning unit 200, an optimal packing material is used.

The waste gas that has passed through the primary dust collection unit 231 passes through the secondary dust collection unit 232 through the water and the filler 239 by the fresh water spray 235. At this time, if the halogen group gas is included in the waste gas after the primary purification in the tower 236 of the wet cleaning unit 200, it is mixed with the water sprayed by the water sprays 234 and 235 to be in a water-soluble state. Will exist as an ion. The aqueous solution is acidic, and when the NH ₃ gas is wet-treated and dissolved in water, it becomes a basic aqueous solution. In general, acidic gas reacts well with basic (NaOH, KOH) substances and has good reactivity with not only acidic gases such as HF and Cl ₂ but also all acidic gases such as CO. Therefore, it is possible to add NaOH or KOH for the treatment.

  The primary dust collection unit 231 and the secondary dust collection unit 232 have a net shape and circulate to the lower end of the primary dust collection unit 231 so as to inject water into the waste gas injected from the burner assembly. A water spray 234 is provided. In addition, a fresh water spray 232 is provided at the lower end of the secondary dust collector 232 in order to secondarily purify the waste gas that has passed through the primary dust collector 231.

  Therefore, the waste gas cleaned with high precision can be purified, and the purified gas is discharged to the outside through the discharge ductor.

  As described above, the present invention has been described mainly with reference to the preferred embodiments. However, those skilled in the art can implement various modifications without departing from the spirit of the present invention. It is clear that.

It is a top view which shows the structure of the gas burner nozzle of the conventional waste gas purification processing apparatus. It is sectional drawing which shows the structure of the gas burner nozzle of the conventional waste gas purification processing apparatus. It is the schematic which showed the process of the general waste gas purification processing apparatus. It is a perspective view for demonstrating the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is a perspective view for demonstrating the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is a top view for demonstrating the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is a bottom view for demonstrating the structure which attached the wiper to the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is sectional drawing for demonstrating the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is sectional drawing for demonstrating the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is sectional drawing for demonstrating the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is a perspective view for demonstrating the gas burner nozzle attached to the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is sectional drawing of the gas burner nozzle attached to the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is another sectional drawing of the gas burner nozzle attached to the burner assembly of the waste gas purification processing apparatus by one Example of this invention. It is the schematic for demonstrating the result of having simulated the operation | movement of the waste gas purification processing apparatus by one Example of this invention. It is a block diagram of the waste gas purification processing apparatus by one Example of this invention. It is a fragmentary sectional view explaining the wet-cleaning part of the waste gas purification processing apparatus by one Example of this invention.

Explanation of symbols

100 Burner assembly 101 N ₂ gas inlet
102 Ignition unit 103 PU sensor unit 105 Inner ring 106 Ceramic tube 107 Outer ring 109 Main flange 110 Waste gas supply manifold 112 Cooling water circulation unit 113 Cooling water injection unit 114 Rotary actuator assembly 115 Flame sensor 118 Rotary shaft 119 Wiper 120, 120a, 120b 120c First to third gas burner nozzles 121 Flange 121a Waste gas supply direct flame nozzle
122 First metal sealing part 123 Fuel gas supply part 123a Fuel supply nozzle 124 Oxidant supply part 124a Oxidant supply nozzle 125 Cooling water supply part 126 Head unit base 127 Second metal sealing part 128 Waste gas supply part 130 Ceramic tube 200 First 1 wet cleaning section 240 first piping section 242 second piping section 300 second wet cleaning section

Claims (12)

In waste gas purification processing equipment that purifies and releases waste gas discharged from semiconductor manufacturing processes and chemical processes,
From burning the waste gas, a burner section for removing ignitable gas and explosive gas,
A wet cleaning unit that is connected in parallel to the burner unit and dissolves a water-soluble toxic gas in the waste gas treated in the burner unit, and a pipe for connecting the burner unit and the wet cleaning unit Part
Therefore, the burner portion has a main flange,
A ceramic tube provided in the main flange;
A cooling water circulation part that is provided between the main flange and the ceramic tube and adjusts the temperature in the ceramic tube;
A waste gas supply manifold provided in the upper center of the main flange for supplying various types of waste gas;
The upper part of the main flange comprises a burner assembly including a plurality of gas burner nozzles that are formed in a triangular shape centered on the waste gas supply manifold and that directly generate a flame while supplying waste gas,
And the gas burner nozzle is
A flange having a structure for injecting waste gas, forming a waste gas supply section and a waste gas supply nozzle;
A first metal sealing portion provided on an upper side of the flange;
A fuel gas supply unit including a fuel supply nozzle combined with the flange under the first metal sealing unit;
An oxidant supply unit comprising an oxidant supply nozzle combined with the flange below the fuel gas supply unit;
A head unit base attached to the underside of the flange;
A cooling water supply unit disposed on the head unit base below the oxidant supply unit;
Including a second metal sealing portion for sealing between the flange and the head unit base;
A waste gas purification processing apparatus, wherein waste gas discharged through the waste gas supply manifold is processed by generating an indirect flame using a direct flame generated by the gas burner nozzle.   The waste gas purification processing apparatus according to claim 1, further comprising a sensor provided on an upper portion of the main flange portion for detecting a flame in the ceramic tube.   A wiper provided at the waste gas supply manifold and at one end located inside the main flange of the plurality of burner nozzles for removing foreign substances and by-products generated and adsorbed in the burner assembly. The waste gas purification processing apparatus according to claim 1, further comprising: A rotary actuator assembly provided at a center of the waste gas supply manifold formed at an upper center of the main flange to drive the wiper; and provided between the wiper and the rotary actuator assembly, The waste gas purification processing apparatus according to claim 3, further comprising a rotary shaft for transmitting the gas to the wiper.   The ceramic tube is made of a material having a low heat transfer coefficient, and exhibits a flameproof action to block the generated heat so that a flame generated from the gas burner nozzle having a direct flame can be formed entirely. The waste gas purification processing apparatus according to claim 1, wherein the same amount of heat is given to the waste gas supply manifold that does not have a direct flame to generate an indirect flame. A waste gas supply nozzle is disposed on a concentric circle at the innermost center of the gas burner nozzle, and has a predetermined inclination angle without being coaxial with the waste gas supply nozzle on an outer concentric circle on the waste gas supply nozzle. However, the fuel supply nozzle is disposed so as to be inclined inward, and the oxidant supply nozzle is disposed on the outer concentric circle of the fuel supply nozzle at equal intervals and coaxial with the waste gas supply nozzle. The waste gas purification processing apparatus according to claim 1 , wherein The first metal sealing part serves to seal the fuel supplied from the fuel supply nozzle so as not to leak to the outside, and the second metal sealing part is an oxide injected from the oxidant supply part. The waste gas purification treatment apparatus according to claim 1 , wherein the agent is sealed so that the agent flows backward from the oxidant supply nozzle and does not leak outside. The central axis of the plurality of gas burner nozzle for generating the direct flame, while the claims 1 to 7, characterized in that it is provided to maintain a predetermined slope with respect to the central axis of the main flange, The waste gas purification treatment apparatus according to any one of the above. The waste gas purification processing apparatus according to claim 8 , wherein central axes of the waste gas supply manifolds are provided in parallel to each other with respect to a central axis of the main flange. Flow rate of the oxidizing agent which can be injected through the oxidizing agent supply nozzle, while the claims 1, 7 and 8, characterized in that faster than the flow rate of the fuel can be injected via the fuel supply nozzle, according to any one The waste gas purification treatment apparatus described in 1.   The waste gas purification processing apparatus according to claim 1, wherein the wet cleaning unit is connected in parallel to the burner unit to form a set. The wet cleaning section is
A primary dust collecting part made of a net for primary purification of waste gas that has passed through the burner part;
A circulating water spray provided at the lower end of the primary dust collecting part to inject water into the waste gas injected from the burner part;
A secondary dust collecting part made of a net for secondary purification of waste gas that has passed through the primary dust collecting part;
Fresh water spray provided at the lower end of the secondary dust collecting section; and
The waste gas purification processing apparatus according to claim 11 , further comprising a filler that is filled between the primary and secondary dust collection units to increase a contact surface area between the waste gas and water.

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