TWI263703B - Method enabling effective storage of metal ion supply source in plating equipment - Google Patents
Method enabling effective storage of metal ion supply source in plating equipmentInfo
- Publication number
- TWI263703B TWI263703B TW092103019A TW92103019A TWI263703B TW I263703 B TWI263703 B TW I263703B TW 092103019 A TW092103019 A TW 092103019A TW 92103019 A TW92103019 A TW 92103019A TW I263703 B TWI263703 B TW I263703B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal ion
- supply source
- plating
- ion supply
- solution
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
Abstract
To avoid a change in plating performance, even where operation of the plating equipment is interrupted, the properties of the plating solution need to be preserved. For plating equipment having an insoluble anode, add a reservoir (7) for storing a replacement solution to the tank (4) having a metal ion supply source (copper ball (5)) and, upon termination of the plating operation, the entire plating solution is discharged from the tank (4) containing the metal ion supply source, while the solution for replacement is transferred from the reservoir (7) to the empty tank having a metal ion supply source, and immediately prior to the resumption of the plating operation transfer the solution for replacement back to the reservoir (7) and return the plating solution to the tank (4) containing the metal ion supply source.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002044679A JP3725083B2 (en) | 2002-02-21 | 2002-02-21 | Method for enabling effective preservation of metal ion source in plating equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200303937A TW200303937A (en) | 2003-09-16 |
TWI263703B true TWI263703B (en) | 2006-10-11 |
Family
ID=27750561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092103019A TWI263703B (en) | 2002-02-21 | 2003-02-13 | Method enabling effective storage of metal ion supply source in plating equipment |
Country Status (11)
Country | Link |
---|---|
US (1) | US20050139477A1 (en) |
EP (1) | EP1476590B1 (en) |
JP (1) | JP3725083B2 (en) |
KR (1) | KR100858503B1 (en) |
CN (1) | CN1636086B (en) |
AT (1) | ATE369446T1 (en) |
CA (1) | CA2473054A1 (en) |
DE (1) | DE60315422T2 (en) |
MY (1) | MY132672A (en) |
TW (1) | TWI263703B (en) |
WO (1) | WO2003071010A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11352710B2 (en) * | 2019-09-30 | 2022-06-07 | Abdurrahman Ildeniz | Leak free brush electroplating system |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4469546A (en) * | 1981-12-16 | 1984-09-04 | Cooper Tire & Rubber Company | Transfer ring for a tire building machine |
US4469564A (en) * | 1982-08-11 | 1984-09-04 | At&T Bell Laboratories | Copper electroplating process |
JPH0559598A (en) * | 1991-08-30 | 1993-03-09 | Kawasaki Steel Corp | Method and device for supplying metal ion of zn-ni electroplating |
DE4344387C2 (en) * | 1993-12-24 | 1996-09-05 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of copper and arrangement for carrying out the process |
DE69929967T2 (en) * | 1998-04-21 | 2007-05-24 | Applied Materials, Inc., Santa Clara | ELECTROPLATING SYSTEM AND METHOD FOR ELECTROPLATING ON SUBSTRATES |
CN1170965C (en) * | 1998-05-16 | 2004-10-13 | 布拉斯伯格表面技术股份有限公司 | Method for electro copperplating substrates |
US6200436B1 (en) * | 1999-04-27 | 2001-03-13 | Advanced Micro Devices, Inc. | Recycling consistent plating system for electroplating |
JP3523555B2 (en) * | 2000-02-28 | 2004-04-26 | 古河電気工業株式会社 | Plating equipment |
TW501277B (en) * | 2000-03-29 | 2002-09-01 | Sanyo Electric Co | Plating device |
US6575111B2 (en) * | 2001-05-01 | 2003-06-10 | Drillmar, Inc. | Method for tendering |
-
2002
- 2002-02-21 JP JP2002044679A patent/JP3725083B2/en not_active Expired - Fee Related
-
2003
- 2003-02-13 TW TW092103019A patent/TWI263703B/en not_active IP Right Cessation
- 2003-02-17 WO PCT/EP2003/001588 patent/WO2003071010A1/en active IP Right Grant
- 2003-02-17 EP EP03717186A patent/EP1476590B1/en not_active Expired - Lifetime
- 2003-02-17 KR KR1020047011656A patent/KR100858503B1/en not_active IP Right Cessation
- 2003-02-17 CA CA002473054A patent/CA2473054A1/en not_active Abandoned
- 2003-02-17 DE DE60315422T patent/DE60315422T2/en not_active Expired - Lifetime
- 2003-02-17 US US10/502,557 patent/US20050139477A1/en not_active Abandoned
- 2003-02-17 AT AT03717186T patent/ATE369446T1/en active
- 2003-02-17 CN CN038042835A patent/CN1636086B/en not_active Expired - Fee Related
- 2003-02-19 MY MYPI20030580A patent/MY132672A/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP1476590A1 (en) | 2004-11-17 |
KR20040083096A (en) | 2004-09-30 |
TW200303937A (en) | 2003-09-16 |
EP1476590B1 (en) | 2007-08-08 |
JP2003253497A (en) | 2003-09-10 |
MY132672A (en) | 2007-10-31 |
WO2003071010A1 (en) | 2003-08-28 |
DE60315422D1 (en) | 2007-09-20 |
KR100858503B1 (en) | 2008-09-12 |
DE60315422T2 (en) | 2008-04-30 |
ATE369446T1 (en) | 2007-08-15 |
CN1636086B (en) | 2010-04-28 |
CN1636086A (en) | 2005-07-06 |
CA2473054A1 (en) | 2003-08-28 |
JP3725083B2 (en) | 2005-12-07 |
US20050139477A1 (en) | 2005-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |