TH29925B - Methods that can provide efficient storage of metal ion sources in the plating equipment - Google Patents

Abstract

DC60 (19/05/46) [problem] to avoid changes in plating performance. even when working The plating equipment is disrupted. The properties of the plating solution need to be preserved. [Troubleshooting Principles] For plating devices that use undissolved anodes, add a container (7) to store the replacement solution to the tank (4) which provides a source of metal ions. (copper ball (5)) and at the end of the plating process The entire plating solution is removed from the tank (4), where the metal ions are sourced, while the replacement solution is transferred from the storage (7) to the empty tank where the metal ions are sourced. And during the re-plating process, the replacement solution is transferred back to storage (7) and the plating solution is placed back into the tank (4), where the metal ion source is available. ] to avoid changes in plating performance even when working The plating equipment is disrupted. The properties of the plating solution need to be preserved. [Troubleshooting Principles] For plating devices that use undissolved anodes, add a container (7) to store the replacement solution to the tank (4) which provides a source of metal ions. (copper ball (5)) and at the end of the plating process The entire plating solution is removed from the tank (4), where the metal ions are sourced, while the replacement solution is transferred from the storage (7) to the empty tank where the metal ions are sourced. And during the re-plating process, the replacement solution is transferred back to storage (7) and the plating solution is placed back into the tank (4), which has a source of metal ions.

Claims (6)

1.Method for preventing deterioration of plating solutions When there is an interruption of the plating equipment Containing The process of generating an effective capacitor of the metal ion source in the aforementioned solution plating equipment is at least when the plating process is stopped. 2. Method for the prevention of degradation of plating solutions according to claim 1, where plating equipment with non-dissolving anodes A tank with a metal ion supply consists of Storage After the completion of the plating process. The entire plating solution is released from the tank containing the metal ion supply. The solution instead is transferred from the reservoir to an empty tank with an ion supply. And when the new plating process has been started Solution instead of being reverted back into the container. And the batch solution is then reverted back to the abortions containing the metal ion source afterwards. 3. Methods for the prevention of degradation of plating solutions according to claim 1, where plating equipment with non-dissolving anodes A plated tank contains such a repository. And solution storage tanks After completing the plating process The plating solution is transferred from the plating tank to the plating solution tank. And the solution instead of being transferred from storage to an empty plating tank. And when a new batch of processes has been started Solution instead of being reverted back into the container. And the chukana solution was returned to the plating tank after 4.Method for preventing degradation of plating solutions according to any of the 1-3 claim, where the substitutes are non-brightening solutions that undergo degradation in the presence of Stop the plating process 5.Method for preventing degradation of plating solutions according to any of Claim 1-4, where such plating is set with copper. 6. Method for the prevention of degradation of plating solutions according to claim 4, where the substituted solution will be sulfuric acid solution.