TWI261317B - Multiport polishing fluid delivery system - Google Patents

Abstract

A method and system for delivering a polishing fluid to a chemical mechanical polishing surface is provided. In one embodiment, the system includes an arm having a delivery portion disposed at least partially over the polishing surface. A first nozzle and a second nozzle are disposed on the delivery portion of the arm. The first nozzle is adapted to flow the polishing fluid at a first rate while the second nozzle is adapted to flow the polishing fluid at a second rate that is different than the first rate. A method for delivering a polishing fluid to a chemical mechanical polishing surface generally includes the steps of supplying the polishing fluid to a semiconductor polishing surface in one location at a first rate and providing the polishing fluid to the polishing surface at a second location at a second rate which is different than the first rate.

Description

1261317 A7 B7 V. INSTRUCTIONS () Field of the Invention: Embodiments of the present invention generally relate to a method and apparatus for grinding a substrate in a chemical mechanical polishing system. BACKGROUND OF THE INVENTION: In semiconductor wafer processing, the use of chemical mechanical planarization, or CMP' should have been favored because of the increased density of components on a semiconductor workpiece, or substrate (e.g., a wafer). The chemical mechanical planarization system generally utilizes a polishing head to hold a substrate and press the substrate against an abrasive surface of the abrasive material while providing relative motion therebetween. Some flattening systems utilize a phase-to-phase grinding head that moves against a stationary platform that supports the abrasive material. Other systems utilize different architectures to provide relative motion between the abrasive material and the substrate, for example, to provide a rotatable platform. A grinding fluid is typically provided between the substrate and the abrasive material during milling to provide chemistry to aid in the removal of material from the substrate. Some abrasive fluids may also contain abrasives. One of the many challenges in developing robust grinding systems and processes is the removal of uniform materials from the entire surface of the substrate being ground. For example, as the substrate moves through the abrasive surface, the edge of the substrate is typically ground at a higher rate. This is due in part to the tendency of the substrate to have a 'nose drive' of the substrate as it moves through the abrasive surface. Another problem that affects the uniformity of the surface of the substrate is that certain materials are removed more quickly than other materials around them. For example, copper on the 5th page of this paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm). (Please read the note on the back and fill out this page.) Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives 1261317 A7 __ _B7 V. Description of invention () The Intellectual Property Office of the Ministry of Economic Affairs, the staff of the Consumer Cooperatives, printed the copper of the copper, and it is more, }g) n Shi Shi di /|\ The oxygen trap is a concave fill. The code is often plagued by the material k of the copper in addition to U cough 4,? Move the temple package to compare the five times. The degree of grinding and smashing is the result of the slashing of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations. The more high-small, more succinct and flat-to-shoulders are all produced in this way. The degree of intimacy is full of human elements, and the whole high uniformity is ground in the grinding. Research and measurement equipment 6V learning white to be t in the best is to change. However, the demand is still in demand, and the cause of the need is still

A brief description of I and I | send I send, transfer the system of the flow of grinding and grinding research \ one will. To provide for the use of gt - TV species # unified system, the state of the surface of the table, a grinding of the research and development of the machine, the school in the 1 to a set of less to the face of the nozzle, the second mill, the first research and The nozzle is sprayed one by one. The part of the bag that is sent to the arm of the I-il is divided into the part of the system. The part of the machine is made to be able to be made into a design, and the design of the tr is set by the nozzle to be sprayed with the first nozzle, Ο 4^ ^ The upper flow fractional unit sends the first arm of the first movement to the first rate of the flow, and the flow is in the same state as the first one, and the original flow is used to grind the flow rate. Body flow grinding - send, research in the system to introduce semi-real \ \ to the body. The flow supply grinding research is applied to the party's rate of supply, and the flow surface \ table is the first to be studied, and the machine is covered by the method of the method, and the surface is ground and the body is placed. This surface of the flow grinding mill is used for the table grinding rate. Page 6 The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm). (Please read the back note and fill out this page.) Set the stream two. 3⁄4 #πν步1261317 A7 B7 V. INSTRUCTION DESCRIPTION () DETAILED DESCRIPTION OF THE INVENTION: The first figure shows an embodiment of a grinding system 1 ο 0 for grinding a substrate 1 1 2 having a grinding fluid delivery system 1 〇 2 which controls the distribution of the grinding fluid 1 14 over the entire abrasive mass 108. Examples of abrading systems that can be used in various aspects of the present invention are disclosed in U.S. Patent Application Serial No. 9/1,44,456, filed on Apr. U.S. Patent No. 5,73,574, the entire disclosure of which is incorporated herein by reference. Although the abrasive fluid transfer system 102 is described with reference to an exemplary polishing system 100, the present invention is also applicable to other polishing systems for processing substrates. In general, the exemplary polishing system 100 includes a platform 104 and a polishing head 106. The platform 104 is disposed under the polishing head 1〇6, which holds the substrate 1丨2 during grinding. The platform 丨04 is disposed on a base library 122 of the system 1 且 and coupled to a motor (not shown). The motor can rotate the platform 104 to provide at least a portion of the relative grinding motion between the abrasive mass 8 disposed on the platform 1 〇 4 and the substrate 1 12. It will be appreciated that the relative motion between substrate 丨丨2 and abrasive material 1 〇 8 can be provided in other ways. For example, at least 4 points of the relative grinding motion between the abrasive material 1 〇 8 and the substrate 1 12 can be moved linearly by moving the polishing head 1 〇 6 over a stationary platform 1 〇 4 The abrasive is moved under the substrate 11 2 while moving both the abrasive material 108 and the polishing head 1 〇 6 to achieve this. The abrasive substance 108 is supported by the platform 1〇4 so that the paper size of the 7th page of a grinding table is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 male pipe) (please read the back note first and then fill in the page) - Installed - Booked · Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed Α 261317

, invention description ((Please read the note on the back and then fill out this page): 116 face up to the polishing head 106. Typically, the abrasive material 1〇8: by the adhesive 'vacuum, mechanical clamping or This is fixed to the β 纟 1G4 during grinding. Optionally, and in particular in the application of the abrasive substance (10): 乍-network, the abrasive substance 1G8 releasably fixes the 'edge 104 The above is typically achieved by a vacuum between the abrasive material 1 〇 8 and the flat wafer 104, as described in the aforementioned U.S. Patent Application Serial No. 09/144,456. It may be a conventional or a stationary abrasive material. The conventional abrasive material 1 is generally composed of a foamed polymer and is disposed on the platform 104 as a mat. In an embodiment The conventional abrasive substance 1〇8 is a foamed polyurethane. This conventional abrasive substance 108 is commercially available from R〇dd Company, Delaware, USA. Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperative, Printing and Grinding The particulate fixed abrasive material 108 is generally suspended by many It is composed of abrasive particles in a resin binder which is disposed in a dispersing member on a backing plate. The abrasive particle-fixed abrasive material 108 can be used in the form of a mat or a net. When it is contained in the abrasive itself, the polishing system using the abrasive particle-fixed abrasive material will no longer use the abrasive fluid containing the abrasive. An example of the abrasive particle-fixed abrasive material is disclosed in Dec. U.S. Patent No. 5,692,950 issued to Rutherford et al., and U.S. Patent No. 5,45,312, issued to Haas et al. In this paper, the abrasive particle-fixed abrasive material is commercially available from the 3rd Company of St. Paul, Minnesota, USA. The first paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm). 1261317 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 5, Invention Description () The grinding head 1 0 6 is supported on the platform 1 〇 4. The grinding head 1 〇 6 will be the substrate 112 Hold in a recess 120 that faces the abrasive surface 116. The abrasive head 106 moves typically toward the platform 104 and presses the substrate against the abrasive material during processing. The abrasive head 106 can be stationary. Or a rotatable 'isolated, orbiting, linearly moving, or various combinations of motions simultaneously pressing the substrate 1 2 against the abrasive material 1 〇 8. An example of the polishing head 106 is disclosed in 2010. U.S. Patent No. 6,1,83,354, issued to U.S. Pat. An example of a polishing head 106 is a HEADHEADTM wafer carrier manufactured by Applied Materials, Inc., Santa Clara, California. The abrasive fluid transfer system 102 generally includes a transfer arm 130, a plurality of nozzles 133 disposed on the arms 130, and at least one source of abrasive fluid 134. The transfer arm 130 is configured to control the distribution of the abrasive fluid 1 14 on the abrasive surface 116 of the abrasive material 108. In one embodiment, the transfer arm 130 is measurable with the abrasive fluid 1 1 4 along the arm 130 at different flow rates. Since the abrasive fluid 1 14 is supplied from a single source, the abrasive fluid 1 14 is applied at a uniform concentration but the amount varies along the width (or diameter) of the abrasive 108. The transfer arm 130 is generally coupled to the base 122 proximate the platform 104. The transfer arm 130 generally has at least a portion 136 that is suspended above the abrasive material 108. The transfer arm 130 can be coupled to the remainder of the system 100 as long as the portion 136 can be configured to deliver the abrasive fluid 1 1 4 to the abrasive surface 116. Page 9 This paper scale applies to China National Standard (CNS) A4 specification (210X 297 mm) (Please read the note on the back and fill out this page) 丨装·, 可·线:· 1261317 A7 B7 V. Description of invention () 胄 胄 胄 1 32 is set along the ▲ #刀1 3 6 of the transmission I 1 3 0 set above the 纟 104. In one embodiment, the nozzles are 3 2 I to V and 14 〇 and a second nozzle 142. Typically, the first nozzle 140 is disposed on the arm 13 , at a position radially inward of the second nozzle M2 with respect to the center of rotation of the abrasive substance 1 〇 8 . The dispersion of the polishing fluid 114 over the entire abrasive mass 1 is controlled by flowing the grinding fluid 114 from the first nozzle 140 at a different flow rate than flowing through the second nozzle 142. As shown in FIG. 2, the first nozzle 140 causes the polishing fluid 114 to flow to a first portion 2〇2 of the polishing surface 116 at a first flow rate, and the second nozzle 142 is ground at a second flow rate. Fluid 114 flows to a second portion 2〇4 of the abrasive surface 116. In this way, the distribution of the grinding fluid 丨丨4 across the width of the abrasive substance 108 can be adjusted. Returning to Fig. 1, leaving the first and second nozzles 丨4 〇, the flow rates of 丨4 2 are different from each other. The flow rates can be fixed or controllable relative to each other. In one embodiment, the fluid transfer arm 130 includes a grinding fluid supply line 124 that is divided into the first and second fluids 14, 142. A T-shaped kit 126 is coupled to the supply line 124 and has a first delivery line 144 and a delivery line 146 that are branched out and coupled to the nozzles 140, 142, respectively. At least one of the nozzles 132 has a flow control mechanism 15 〇. The flow control mechanism 15 can be a device capable of providing a fixed flow rate between the nozzles 140, 142, or the flow control mechanism 15 can be adjusted to provide dynamic flow rate control. Flow Control Mechanism 1 5 〇 Example Page 10 This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) (please read the note on the back and fill out this page) - 丨装· -订· Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

, invention description (1261317 sub-compounds include a fixed orifice 'pinchvalve', proportional valve, restrictor, needle valve 'metering pump, mass flow controller and the like. Or, the flow control mechanism 1 50 may be provided by a relative pressure drop difference between the fluid delivery lines 144, 146 of each of the nozzles 1 4 〇, 14 2 and the T-shaped kit U6. The abrasive fluid source 134 is typically disposed at The external portion of the system 。. In one embodiment, the source of abrasive fluid 134 generally includes a Rong Rong 1 5 2 and a pump 145. The pulverizing fluid 丨丨 4 will grind the fluid 丨丨 4 from The vessel 152 is pumped through the supply line 124 to the nozzle 132. The grinding fluid crucible 4 contained in the vessel 152 is typically deionized water with a chemical additive to provide assistance in The chemical action removed from the surface of the ground substrate 112. When the abrasive fluid 114 is supplied from a single source (i.e., container 152) to the nozzle 132, the fluid 1 1 flowing from the spray angle 132 4 is homogeneous, ie there will be no difference in the concentration of chemical reactants or abrasive particles. The abrasive fluid can include abrasives to aid in the mechanical removal of material on the surface of the substrate. The abrasive fluid can be obtained from several commercial sources, such as Cabot Corporation, Delaware, located in Aurom, Illinois, USA. R〇dei Company of Newark City, Japan, Hitachi Chemical Company of Japan, DuPont Company of Wilmington City, Delaware, etc. In operation, the substrate 1 12 is placed on the polishing head 丨〇6 and sent To contact with the abrasive material 108 on the rotating platform 1〇4. The polishing head 1〇6 can hold the substrate stationary or rotate the substrate or perform other movements to aggravate the abrasive substance 108 and the substrate 1 12 Relative movement between the grinding fluid delivery system 102 allows the brazing fluid 114 to flow through the supply line 124. Page 11 This paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the precautions on the back) Fill in this page)

Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1261317 V. Invention description (A7 arrives at the first and second grinding nozzles 1 4 〇, 1 4 2. Figure 2 is a plan view of the system 其 showing the arrival of abrasive substances The grinding fluid 114 of the 202 and 2 04 portions of 1 〇 8 flows. A first grinding fluid stream 206 flows out of the first nozzle 14 at a first flow rate to the first portion 202' while a second grinding fluid stream 2 〇 2 〇 8 exits the second nozzle 142 at a second flow rate to the first portion 204. The first abrasive fluid stream 206 is different from the second abrasive fluid stream 2〇8 to provide over the abrasive surface 1 16 of the entire abrasive mass 108. A controllable abrasive fluid is distributed in a ratio of 14. 4 In one embodiment, the flow rate of the first abrasive fluid stream 2〇6 is at least 1丨5 times the flow rate of the second abrasive fluid stream 20. The abrasive material丨The controllable polishing fluid distribution on the abrasive surface 1 of the crucible 8 can be allowed to surface across the width of the substrate 112 by controlling the relative flow of the abrasive fluid over the abrasive material 108. Material removal on can be adjusted. Refer to Figure 2 to be provided to The grinding fluid 1 1 4 of the first portion 2 〇 2 of the abrasive material 1 〇 8 is more than the grinding fluid 1 1 4 supplied to the second portion 2 〇 4 (or vice versa). Optionally, additional nozzles may be used. A different amount of abrasive fluid 114 is provided to different portions of the abrasive mass 108, wherein the abrasive fluid on at least two of the abrasive materials 1 〇 8 钧 portion is provided at a different flow rate. In an operational mode, The substrate u 2 ground by the system 丨00 is treated with the grinding fluid n 4 from the first nozzle 1400 and the second nozzle 丨 42. The grinding fluid 144 is applied from the first nozzle 第一4 at the first flow rate. On the abrasive substance 108. The grinding fluid 丨丨4 is simultaneously applied to the abrasive substance 1 〇8 from the second nozzle 142 at a second flow rate. In an embodiment, the first top paper size is applicable to the Chinese country. Standard (CNS) A4 specification (21〇X297 mm) (Please read the notes on the back and fill out this page)

Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 1261317 Five Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing B7 invention description (), the first flow rate is about 2. 2 to 2 times the second flow rate. The polishing uniformity 4 〇 2 obtained by this treatment using the abrasive fluid transport system 1 0 2 is shown in Fig. 4. A conventional substrate grinding uniformity 404 obtained using a conventional abrasive fluid delivery system (i.e., a system in which the abrasive fluid is delivered from a single nozzle to the abrasive material) is provided for comparison. As shown in Fig. 4, the uniformity 4 02 is significantly improved compared to the conventional result 4〇4. In a structure with a dynamic (controllable) control mechanism, such as a proportional valve, a flow restrictor, a needle valve 'metering pump' mass flow controller and the like, the grinding fluid 114 is in the abrasive substance 1〇8 The distribution above can be controlled during processing. For example, the abrasive fluid from the first nozzle 140 can be applied to the abrasive substance 108 during a portion of the process at a first flow rate and adjusted to one during another portion of the process. Second flow rate. The flow rate of the polishing fluid delivered from the first nozzle 14 2 can likewise be varied during the grinding process. It should be noted that the adjustment of the abrasive fluid from the nozzles 1 40 ' 1 42 is infmite. Providing an additional nozzle between the first nozzle 140 and the second nozzle 142 allows for greater control of uniformity and can be provided at the first nozzle by providing more or less abrasive fluid 1 1 4 The additional nozzle between 1 40 and the second nozzle 1 4 2 is locally changed (see description of Figure 3 below). Optionally, the abrasive fluid delivery system having dynamic control of the flow rate from the nozzles 140, 14 can include a metering device 8 for providing processing feedback for immediate adjustment of the abrasive fluid distribution. Typically, page 13 applies to the Chinese National Standard (CNS) A4 specification (210X 297 mm). A7 B7 1261317 V. Invention Description (1) The measuring device 1 1 8 detects a grinding metric such as grinding Time, the thickness of the surface film being polished on the substrate, surface topography or other surface characteristics. In one embodiment, the abrasive material 1 8 may include a window 16 that allows the metering device 1 18 to view the surface of the substrate 112 against which the abrasive material 8 is disposed. The 'measurement device 118 generally includes a sensor 162 that emits a beam of light 164 that can pass through the window 16 to the substrate 1 12 . A first portion of the beam 164 is reflected back by the surface of the abrasive material 丨〇8, and a second portion of the beam 164 is reflected back by a layer of material beneath the surface of the substrate n2 being ground. The reflected beam is received by the inductor 162 and the wavelength difference between the two portions of the reflected beam is calculated to determine the thickness of the material on the surface of the substrate 112. Typically, the thickness information is provided to a controller (not shown) that adjusts the distribution of the abrasive fluid on the abrasive material 108 to produce a desired abrasive result on the surface of the substrate. A monitoring system that can be used in an advantageous manner is described in U.S. Patent Application Serial No. 08/689,930, the entire disclosure of which is incorporated herein by reference. in. Optionally, the metrology device 118 may include additional sensors for monitoring the grinding parameters across the width of the substrate 112. An additional inductor allows the distribution of the abrasive fluid 1 14 across the width of the substrate 112 to be adjusted such that a portion of the substrate 112 has more or less material than the other portion. Remove. In addition, the process of adjusting the flow rate from the nozzles 140, 142 can be alternately implemented during the grinding process to dynamically apply the Chinese National Standard (CNS) A4 specification (210X297 mm) on page 14 of this paper size (please Read the notes on the back and fill out this page. έ·················································································· Except rate. For example, the center of the substrate can be removed at the beginning of the grinding process by providing more grinding fluid to the center of the substrate, while the periphery of the substrate can be at the end of the grinding process. The material there can be removed more quickly by providing more abrasive fluid to the periphery of the substrate. Figure 3 shows another embodiment of a grinding fluid delivery system 300 having a plurality of nozzles 302. The system 300 can be made similar to the fluid delivery system 102 of Figure 1 (i.e., having a single abrasive fluid supply line) or can be configured to have a dedicated supply tube for each nozzle 302. Get to the fluid source 3 0 6 . Fluidly coupled to each supply line 3 〇 4 is a metering device 308. The metering device 308 can be a metering pump such as a gear pump, a peristaltic pump, a positive displacement pump, a diaphragm pump and the like. Each metering device 308 is coupled to a controller (not shown) that controls the amount of grinding fluid 1 14 supplied to each nozzle 3〇2 of the system 300. Since each metering device 3〇8 is independently controllable, the amount of grinding fluid from the parent-nozzle 320 can be controlled independently of each other such that the grinding fluid 1 1 4 on the abrasive substance 1 〇8 The distribution gives you fine control. As indicated above, each metering device can vary the flow of abrasive fluid delivered to the abrasive material 1 〇 8 throughout the grinding process. For example, one of the nozzles 3〇2 can increase the flow of abrasive fluid therethrough as the substrate is ground. The other of the nozzles can reduce the flow of the grinding fluid therethrough during grinding. Of course, the nozzle flow rate at any point in time is slightly changed. Page 15 This paper scale applies to the Chinese National Standard (CNS) A4 specification (210χ297 mm) .......!::f (please read the back first) Note: Please fill out this page) Order · Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1261317 A7 B7 V. Invention Description (Ministry of Commerce, Intellectual Property Bureau, employee consumption cooperative printing can be arranged to generate a desired The result of the grinding. Since the flow of the grinding fluid can be independently controlled via each nozzle .30, the grinding characteristics can be controlled across the width of the substrate throughout the substrate grinding process. Fluid delivery source 3 0 6 can be used with a metrology device 3 0 8 to control the rate at which material is removed from the surface 3 1 8 of the substrate 1 1 2 being removed and the location to be removed. Usually 'deposited on the base The removal rate or the remaining thickness of the material on the surface 3] 8 of the material 2 can be detected by the measuring device 3丨8 and sent to the controller, which then adjusts the movement away from each nozzle 03. Different flow rates are used to produce a desired grinding result, For example, the periphery of the substrate 1 12 is ground faster. In one embodiment, the abrasive material 108 can include a window 31 that allows the metering device 3 18 to be viewed against the abrasive substance 8 The surface 318 of the substrate 112. The metrology device 318 generally includes an inductor 314 that emits a beam 316 that passes through the window 31 to the substrate 112. A first portion of the beam 316 is abraded. The surface 3 1 8 of 8 is reflected back, and a second portion of the beam 3 16 is reflected back by a substance layer 3 2 底 under the ground surface 3 18 of the substrate 112. The wavelength difference between the two tracks of the beam received by the sensor 3 14 and reflected is used to determine the thickness of the substance on the surface of the substrate 1 1 2 . Typically, the thickness information is Provided to the controller, which adjusts the distribution of the abrasive fluid on the abrasive material 108 to produce a desired abrasive result on the surface 3 18 of the substrate. Optionally, the metrology device 3 0 8 can Includes additional sensors for use on page 16 of this paper scale for Chinese countries Associate (CNS) A4 size (210X297 mm) (Please read the back issues of the note and then fill in this page)

1261317 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 5. Inventive Note () to monitor the grinding parameters across the width of the substrate 丨i 2 . An additional inductor allows the distribution of the abrasive fluid 1 14 across the width of the substrate 112 to be adjusted such that a portion of the substrate 112 has more or less material than the other portion. Remove. Furthermore, the process of adjusting the flow rate from the nozzle 312 can be alternately implemented during the grinding process to dynamically control the removal rate of the material on the entire substrate 丨丨2 at any point in time. For example, the center of the substrate can be removed at the beginning of the grinding process by providing more grinding fluid to the center of the substrate, and the periphery of the substrate can be at the end of the grinding process. The material there can be removed more quickly by providing more abrasive fluid to the periphery of the substrate. FIG. 5 shows another embodiment of a abrasive fluid delivery system 500. System 500 includes an arm 502 that is designed to position a plurality of abrasive fluid delivery tubes 506 over an abrasive surface 570. The arm 502 is constructed to selectively provide a flow of abrasive fluid to different locations of the abrasive surface 570 to control the distribution of the abrasive fluid over the width (diameter) of the abrasive surface 570, and the rate of polishing. In one embodiment, the distribution of the abrasive fluid on the abrading surface 570 can be controlled by placing the tube 506 at a location that allows the abrasive fluid to flow to a predetermined location. In another embodiment, fluid passing through tube 506 can be selectively opened and closed. In the embodiment illustrated in Figure 5, the arm 502 has a plurality of abrasive fluid delivery tube receiving apertures 504 through which the tubes 506 can selectively pass. Generally, arm 502 has a number of holes 504 that is greater than the number of tubes 506 to enable tube 506 to be selectively disposed along arm 502. Because the tube is page 17 (please read the notes on the back and fill out this page);

This paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) 1317 126 A7 B7 Description of invention (5 0 6 Which position can be determined along the position of arm 502), which abrasive surface of Scorpio 570 (Please read the note on the back and fill out this page) The grinding fluid can be received during grinding, so which holes 5〇4 are selected to place the tube 506 can control the distribution of the grinding fluid on the grinding surface 57〇, and can be The local abrasive rate on the width of the substrate 574 (shown in phantom). The tube 506 can be mounted by other squirting +, upper/, 匕 or 10,000 methods, such as clips, sliding kits, belt clips. And the slot is fixed or adjusted along the arm 5〇 2. The arm 502 includes a first side turn 5〇8 and an opposite second side 51 which is typically perpendicular to the abrasive surface 570. A distal end 512 The two sides 508, 5 1 0 are joined. The grinding fluid delivery tube receiving hole 5〇4 is disposed at least along one side 508, 510. The arm 5〇2 may include a bend along its length for Providing a margin for the polishing head 572 that maintains the substrate 5 7 4 (shown in phantom) during the grinding process Grinding surface 5 7 〇. Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed in the embodiment shown in Figure 5, the holes 5 〇 4 are arranged on the sides 508, 510 and end 512 of the arm 500. A first set 514 of apertures 504 is disposed along the first side 508, a second set 516 of apertures 504 is disposed along the second side 5 1 0, and a third set 5 of apertures 5 〇4 The 18 series are disposed along the end portion 5 12. The number and position of the apertures 508 can be varied to provide the tubes 5〇6 at a predetermined spacing to provide a predetermined degree of grinding uniformity during grinding. For example, the first aperture The set 514 can include nine (9) holes 504 that are disposed at a half inch spacing, and the second hole set 516 can include ten (1 inch) holes 504 that are disposed at a half inch spacing and the third hole set 5 1 8 can be Two (2) holes 504 are included. Thus, the position of the tube 506 along the arm 502 can be selected to flow the abrasive fluid onto separate portions of the abrasive surface to control localized abrasive rates across the width of the substrate. Page 18 This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) 1317 126 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperation PRINTED A7 B7 DESCRIPTION OF THE INVENTION () In the embodiment shown in Figure 5, the tube 5 〇6 can be placed in a pre-filled hole group 04 04 to produce a desired degree of grinding uniformity. On the material 5 74. A first tube 506A is placed in a hole in the first hole group 514 for flowing the grinding fluid to a first portion 5 62 of the grinding surface 507. A second tube 506B is The other hole in the first set of holes 514 is placed to flow the abrasive fluid to a second portion 564 of the abrasive surface 57. A third tube 506c is placed in a hole in the second set of holes 516 for flowing the abrasive fluid to a third portion 566 of the abrasive surface 507. A fourth tube 506D is placed in a hole in the third set of holes 518 to flow the abrasive fluid to a first portion 562 of the abrasive surface 57A. By moving any one of the tubes 506A-D to the other aperture 504, the distribution of the abrasive fluid on the abrasive surface 507 can be altered and the material removal rate on the diameter of the substrate 574 can be varied accordingly. The position of tubes 506A-D can be moved along arm 502 to produce a desired abrasive result when grinding a single substrate, increasing the flexibility of the system when grinding different materials' and adjusting one Greater flexibility is provided for a particular treatment to achieve a particular abrasive uniformity or profile of the substrate being abraded. For example, the tube 506 AD can be repositioned from the first set of holes 514 to the second set of holes 516 as a response to changes in the surface properties of the substrate, such as from oxide grinding to copper grinding, between the incoming substrates. A change in the surface profile or a change in the width of the feature structure, and the like.

Alternatively, the distribution of the abrasive fluid on the abrasive surface 570 can be varied by sequentially flowing the abrasive fluid through the tube 506. For example, the grinding flow bean can be supplied through the tube during a part of the grinding process. 5 0 6 A - C Page 19 This paper scale applies to the Chinese National Standard (CNS) A4 specification (210χ 297 mm) (please Read the notes on the back and fill out this page)

1261317 A7 B7 V. INSTRUCTION DESCRIPTION () The diameter of the substrate 5 74 is traversed across the substrate at a predetermined polishing rate (i.e., the polishing rates are different across different points in the diameter of the substrate). During a second portion of the grinding process, fluid flow through the fourth tube 506D is provided to alter the distribution of the abrasive fluid on the abrasive surface 570 to change the abrasive rate profile. The fluid flow through tube 506Α-Ι can be turned on or off in different combinations to produce a corresponding abrasive performance. The sequence of fluid flow through tubes 506A-D can be controlled in response to a detected metric. Alternatively, the sequence of fluid flow through tubes 506A-D can be selected to achieve uniform substrate grinding by compensating for changes in other processing parameters that affect local grinding rates. Referring to Figure 6, the arm 502, generally supported by a post 602, facilitates rotation of the arm 502 over the abrading surface 570. The arm 5〇2 is oriented perpendicular to the post 602 and is deflected or bent along its length in one embodiment. Column 602 additionally provides a conduit for guiding tube 5〇6 to arm 502. The aperture 504 formed in the arm 502 typically includes an upper threaded portion 6〇6 and a lower portion 604. The lower portion 604 has a smaller diameter than the upper portion 606 and forms a first order 608 within the bore 506. The lower portion 604 is generally constructed to allow the tube 506 to pass snugly therethrough. Upper portion 606 includes a threaded section 612. Each tube 506 is secured in bore 504 by a tube clamp 610. Referring additionally to Figure 5, the pipe clamp 610 has a generally oblique cylindrical shape and has a threaded outer portion 502. The pipe clamp 610 is inclined from a center ring 5 〇 6 toward a narrow end 504. The narrow end 504 of the tube clamp 610 includes a plurality of slots 5〇8 that define a plurality of fingers 5 1 延伸 extending from the center ring 506. Ring 5 〇6 Page 20 This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) (Please read the note on the back and fill out this page) - Set · Department of Economic Affairs, Intellectual Property Bureau, employee consumption cooperative A7 B7 1261317 V. Description of the invention () is constructed to fit snugly over the tube 506. After the tube 506 is inserted into the hole 504 at an appropriate depth, the tube clamp 6 丨〇 and the thread of the hole 504 The segment 6 1 2 is engaged. When the pipe clamp 6 10 is screwed into the upper portion of the hole 5 0 4 , the push-pull shape of the pipe clamp 6 1 0 causes the finger 5 10 to be forced inward against the pipe 5 0 . 6. The tube 506 is thereby clamped within the aperture 504. The tube clamp 610 allows the tube 506 to extend a predetermined length under the arm 502. Thus, an outlet 614 of the tube 506 can be placed securely adjacent the abrasive surface. And the arm 052 is held at a relatively distance from the abrasive surface and away from contaminants and other debris deposited on the arm 502 and later contaminants, and/or damage to the base during grinding In one embodiment, the outlet 614 of the tube 506 extends at least 1 inch below the arm 502. Figures 6 and 8 show the use of An embodiment of the plug 620 that stops grinding fluid and other contaminants from entering the aperture 504 that is not used by any of the tubes 506. The plug 620 generally includes a cylindrical body 622 having a concentric post 624 extending from a first end 628 A threaded aperture 630 is concentrically formed on a second end 632. The post 624 is configured to fit snugly into the lower portion 604 of the aperture 504 to prevent abrasive fluid and other contaminants from entering the aperture 504. 624 is typically flush or slightly projecting with the bottom side 644 of the arm 502 facing the abrasive surface 570. A set screw 626 is threaded into the upper portion 606 of the bore 504 and forces the plug 620 against the step 608 to secure the plug to the bore. 5 0 4 . The plug 6 2 0 can be removed from the hole by removing the set screw 6 2 6 and inserting a threaded object (not shown) into the threaded hole 6 3 0 of the plug 6 2 0 Take out in 504. Page 21 This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) (Please read the back note first to write this page) - Armor · Booking · Ministry of Economic Affairs Intellectual Property Bureau employees Consumer cooperatives printed 1261317 V. Invention description (refer to Figure 6, arm 5 0 2 can #,, 2 An optional spray system 64A is included. The spray system 640 generally includes a "f(4) that engages to the upper side 644 of the arm 5〇2. The tube 642 includes a plurality of nozzles 646 that are consuming or spaced at intervals Formed on tube 642. 瞢/丄^ g 642 is coupled to/green fluid source 648 via a guide & 650 through 002. The cleaning fluid source 648 provides a pressurized cleaning fluid, such as deionized water, through a nozzle 646 to a grinding surface 570 to drive contaminants or debris away from the abrasive surface. A spray system that can be used in the practice of the present invention is described in U.S. Patent No. 6,319, issued toK. . Fig. 9 is a cross-sectional view showing another embodiment of a grinding fluid transfer device 9A. Apparatus 900 includes an arm 9〇2 having a first side edge 9〇4, an opposite second side edge 906 and a bottom side between the side edges 〇4, 906. The surface 910 is ground. The sides 9 〇 4, 9 〇 6 define a length of the arm 9 〇 2 ' a portion of the length extends beyond the abrasive surface. A manifold 9丨2 coupled to a source of abrasive fluid (not shown) extends along the length of the arm 092. The manifold 912 can be coupled to an arm 902 that can be disposed on or integrally formed with the arm 902. The manifold 912 includes a plurality of outlets 9 1 4 that are spaced apart along the length of the manifold 9丨2. The outlet 916 is designed to allow the grinding fluid to flow from the manifold 9丨2 to different portions of the abrasive surface 910. Each outlet 9 1 4 includes a flow control mechanism 9 1 6 that is integrated with it. The flow control mechanism 9 16 can be a manual or automatic flow control device, such as a pinch valve, a proportional valve, a shut-off valve, page 22 (please read the notes on the back and fill in the form) Page) - Loading · - Booking · Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 1261317

Description of the Invention (Needle Valve, Metering T-Pulse and Mass Flow Controller, etc. The flow control mechanism 9i6 allows fluid from each outlet 914 to be selectively opened or closed for control across the abrasive surface 9 1 0 The width of the abrasive fluid distribution is correspondingly controlled by the control of the abrasive profile on the surface 910 of the ground substrate. In one embodiment, the flow control mechanism 9 16 is a solenoid wide It is coupled to a controller 918. The controller 918 allows each flow control mechanism 916 to be opened or closed in a predetermined sequence to facilitate control of the removal rate of material across the diameter of a substrate being ground. The removal rate profile can be adjusted in-situ using a controller 918. For example, the # 918 can be coupled to an metric device ι 8 shown in Figure ii to change the grinding profile in response to a Grinding, such as grinding time, thickness of the surface film being polished on the material, surface topography or other surface characteristics. A spray system 920 can also be coupled to the arm 902 and designed to spray a cleaning fluid to the Grinding surface 91 0 The spray system 92 is similar to the spray system 640 shown in Fig. 6. (Please read the note on the back and fill out this page) • Install······································ The quality of the cloth is borrowed, the area is divided into parts, and the amount of the part of the arm flow is the same as that of the body, and the flow rate of the body is not the flow rate. The grinding table is ground and ground. The grinding rate of the research itself is in the domain. The research and development of the pass-through zone system to the transfer of the super-closed line of the delivery or the top-loading body-degree delay W material Leliu flow width in & The same pipe of the base mill Μ The flow material is not sent to the mill base to feed it to research the cross-arm body*. The rate is changed by the change of the cloth. The paper size can be applied to the Chinese National Standard (CNS) A4 specification (210X 297 public) 1261317

V. Description of the invention () The Ministry of Economic Affairs, the Intellectual Property Bureau, the employee consumption cooperative, printed the domain faster. By creating a more flexible processing window, controlling the portion of the abrasive fluid can advantageously reduce the amount of wear of the abrasive fluid during milling, thereby reducing processing costs. While the teachings of the present invention have been described and illustrated in detail herein, other embodiments may be readily made by those skilled in the art without departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS The above-described features, advantages and objects of the present invention will become more apparent from the detailed description of the invention. It is to be understood, however, that the invention is not limited by the scope of the invention 1 is a simplified schematic view of a polishing system having an embodiment of a polishing fluid delivery system; FIG. 2 is a plan view of the system of FIG. 1; and FIG. 3 is a simplified schematic view of another polishing fluid delivery system; Figure 4 is a comparison of the polishing uniformity of the substrate being ground in the conventional polishing system and the system of Figure 1; Figure 5 is a top view of another embodiment of the abrasive fluid delivery system; 5 is a cross-sectional view of the abrasive fluid transfer device taken along line 6-6, and FIG. 7 is a perspective view of the collet for attaching the abrasive fluid transfer tube to the abrasive fluid transfer device; page 24 Applicable to China National Standard (CNS) A4 specification (210Χ297 mm) (Please read the note on the back and fill out this page) ^.

1261317 A7 B7 V. INSTRUCTIONS (8) Figure 8 is a partial cross-sectional view of the abrasive fluid transfer device taken along line 8-8 of Figure 5; and Figure 9 is another embodiment of a polishing fluid transfer device. Everything in the example is a perspective view. For the sake of easy understanding, the same reference numerals are used to indicate that the Ministry of Economic Affairs, the Intellectual Property Office, and the Consumer Cooperatives print the same components. Figure No. Comparison Description * 100 Grinding System 102 Fluid Delivery System 104 Platform 106 Grinding Head 108 Abrasive Material 112 Substrate 114 Abrasive Fluid 116 Abrasive Surface 118 Metric Device 120 Concave 122 Base 124 Supply Line 126 T-Shaped Kit 130 Arm 132 Nozzle 134 Fluid Source 136 Portion 140 First Nozzle 142 Second Nozzle 144 • First Delivery Line 146 Second delivery line 150 Flow control mechanism 152 Container 154 Pump 160 Window 162 Sensor 164 Beam 202 Part 1 204 Part 2 300 Grinding System 302 Nozzle 304 Supply Line Page 25 This paper scale applies to China National Standard (CNS) A4 size (210X297 mm) (please read the notes on the back and fill out this page) - Booking·

1261317 A7 B7 V. INSTRUCTIONS () Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 306 Fluid Source 308 Metering Device 310 Window 3 12 Metric Device 314 Sensor 3 16 Beam 318 Surface 3 20 Material Layer 402 Uniformity Results 404 Traditional Results 500 Abrasive Fluid Delivery System 502 Arm 504 Hole 506 Abrasive Fluid Delivery Tube 506A First Tube 506B Second Tube 506C Third Tube 506D Fourth Tube 508 Side 510 Side 512 Remote End 514 First Hole Set 516 Second Hole Set 518 Third hole group 562 first portion 564 second portion 570 grinding surface 572 grinding head 574 substrate 602 column 604 lower portion 606 upper thread portion 608 step 610 pipe clamp 614 book 620 plug 622 cylindrical body 624 concentric column 628 first End 630 Threaded Hole 632 Second End 640 Spray System 642 Tube 644 Bottom Side 648 Cleaning Fluid Source 900 Grinding Fluid Delivery Set 902 Arm 904 First Side Page 26 (Please read the back note first and then fill out this page) ·

This paper scale applies to China National Standard (CNS) A4 specification (210X 297 mm) 1261317 A7 B7 V. Invention description () 906 opposite second side 908 bottom side 910 grinding surface 912 manifold 914 outlet 916 flow control mechanism 918 Controller Economics Department Intellectual Property Bureau Staff Consumer Cooperative Printed on page 27 (please read the notes on the back and fill out this page)

This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm)

Claims (1)

1261317 VI. Surface area of the application for patents grinding machine mechanics 1 to the delivery of the body V _ including the package grinding / research to the Iml · species, a unified grinding, research arm material research in the establishment of the branch As little as is divided into β! The mouth is delivered 1 has its own -tt set and the upper part is β, the mouth is sent and placed in the setting, jinn ;^ square spray on - the mass of the material is the next rate flow grinding research The first degree · a concentrated and in the fixed., can be pre-domain one area has a certain meaning of more than the mass of the body flow grinding research and development should be in the whole body flow 5 (please first -H read the back of the note and then this page The Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative prints at least one second nozzle disposed on the conveying portion and designed to circulate the grinding fluid at a second flow rate different from the first flow rate, thereby defining A second region having a polishing fluid of the same concentration as the polishing fluid in the first region on the abrasive material. 2. The system of claim 1, wherein at least one of the first nozzle or the second nozzle further comprises a flow control device coupled thereto. 3. The system of claim 2, wherein the flow control device is selected from the group consisting of an orifice, a needle valve, a proportional valve, a pinch valve, a flow restrictor, a mass controller, and A group of metering pumps. 4. For the system described in claim 1, wherein the arm further includes page 28. The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). VI. Application for Profits The Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperative, prints a grinding fluid delivery tube that is coupled to the first and second nozzles. 5. The system of claim 1, further comprising a first fluid source coupled to the first nozzle and a second fluid source coupled to the second nozzle. 6. The system of claim 1, further comprising a plurality of nozzles designed to flow the abrasive fluid at a flow rate under control, wherein each nozzle system is independently controllable. 7. The system of claim 1, further comprising a rotating platform designed to support the abrasive material, the abrasive material comprising an abrasive surface. 8. The system of claim 1, wherein the first nozzle is disposed at a radially inward position of the second nozzle relative to a center of rotation of the polishing pad, and wherein the first flow rate It is at least 1 · 15 times larger than the second flow rate. 9. The system of claim 1, wherein the first flow rate is 1⁄2 to 2 times the second flow rate. The system of claim 1, further comprising a metering device designed to provide at least one flow rate for controlling flow through the nozzle - page 29 of the paper size applicable to China National Standard (CNS) A4 Specifications (210 X 297 mm) ----I---:---.---Package-----1 (please read the back note on the front page again) Order----- -Line A8 B8 C8 D8 1261317 VI. Information on the scope of the patent application 1 1. A system for conveying abrasive fluid to a chemical mechanical polishing surface, comprising at least: a platform supporting the abrasive surface; An upper grinding head; an arm having a conveying portion at least partially disposed above the grinding surface; a first nozzle disposed on the conveying portion and designed to circulate at a first flow rate Grinding a fluid to define a first region having a predetermined concentration of abrasive fluid passing under the polishing head on the abrasive material; at least one second nozzle disposed on the delivery portion and designed to be different Second flow rate at the first flow rate Flowing the grinding fluid to define a second region having a polishing fluid having the same concentration as the polishing fluid in the first region traversing the polishing head over the abrasive material; and a metering device designed to provide Controlling at least one flow of information through the nozzle. 1 2. A system for delivering abrasive fluid to a chemical mechanical polishing surface, comprising at least: an arm having a bottom side facing the abrasive surface and a plurality of tubes Holder; and page 30 of this paper size applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back page first) Printed by the Intellectual Property Office of the Ministry of Economic Affairs f 4 E] Range of at least one tube designed to allow the flow of grinding fluid coupled to the arm to flow and to be repositionable between at least two tube holders. The system of claim 12, wherein the at least two tube receiving members define: a first set of tube retaining holes and spaced apart along a first side of the arm; and at least two of The other tube holders define: a second set of tube retaining holes formed on the arm and spaced apart equidistantly along the second side of the arm opposite the first side. 1 4. The system of claim 12, further comprising: a tube clamp disposed within each tube holder having a tube therethrough and coupling the tube to the arm. 1 5. The system of claim 12, further comprising: at least one plug disposed in a hole that is not occupied by the tube. 16. The system of claim 15 wherein the plug further comprises: a central body; and a post extending from the central body, the post being configured to be flush with the arm or protruding Extending beyond the arm, and each of the holes further comprises: a first portion having a threaded section; a second portion disposed coaxially with the first portion and having a page 31 of the present paper size applicable to Chinese national standards ( CNS)A4 specification (210 X 297 mm) -----I-----I------ (Please read the back note on the first page and then on the Hi page) Order 1-- 1! Line · Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed B8 C8 D8 1261317 ¥ Please patent the diameter is smaller than the diameter of the first part of the diameter, the plug of the plug is full of the second part; the first order, which is defined in the first a portion between the portion and the second portion; and a set screw that engages with the threaded segment and forces the central body of the plug to abut the step. The system of claim 12, further comprising: a mechanism for selectively changing a combination of tubes through which the abrasive fluid flows. 1 8. A system for delivering a grinding fluid to a chemical mechanical polishing surface, comprising: at least: an arm; a plurality of abrasive fluid delivery tubes; a plurality of apertures formed in the arms for receiving the abrasive flow delivery tubes Each tube is disposed through a hole and coupled to the arm; and wherein the relationship between the abrasive fluid delivery tube and the aperture is represented by the following equation: A/B>l, where A is the number of holes, And B is the number of grinding fluid delivery tubes. 1 9. A method of supplying a grinding fluid to a chemical mechanical polishing surface, the method comprising at least: the 32nd paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ----1I11J- --l·— - · 1 1 (Please read the back note on this page first) ·- --Line - Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative print? Take \p6mm Η Β8 C8 D8 Ministry of Economics intellectual property The employee consortium of the bureau prints an Am life, wherein the polishing fluid having a predetermined concentration flows to a first position on the mat at a first flow rate; and a second difference from the first flow rate Flowing at a flow rate to a second position on the mat, wherein the first level is at the same concentration as the second level of the grinding fluid. 20. The method of claim 19, wherein The first flow rate is independently controllable with respect to the second flow rate. The method of claim 20, wherein the adjusting step further comprises: adjusting a grinding metric during grinding Flow rate. 22. A method of delivering a grinding fluid to an abrasive surface of a chemical mechanical grinder, the method comprising: providing a grinding fluid delivery arm having a plurality of tube holding locations in excess of the number of abrasive fluid delivery tubes coupled to the arm From among the tube holding positions, selecting a relative spacing between at least one of the first and second grinding fluid delivery tubes along the arm to produce a desired polishing result; and placing a substrate with a single The volume distribution of the concentration abrasive fluid is contacted, and the single concentration slurry flow system is transported from the abrasive fluid delivery tube. Page 33 The paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ---- ---I ^---:---Shang--------Book·1ι — (Please read the notes on the back and then θ page) Line «· VI. Patent application scope B8 C8 D8 The method of claim 22, wherein at least one of the abrasive fluid delivery tubes is moved to a different position along the arm in response to surface characteristics of the substrate being ground. Change. Ministry of Economics intellectual property The method of claim 22, wherein the method of claim 22, wherein at least one of the abrasive fluid delivery tubes is moved to a different position along the arm for changing across a base Partial grinding rate of the diameter of the material. 25. A method of delivering a grinding fluid to an abrasive surface of a chemical mechanical grinder, the method comprising: flowing the grinding fluid into a manifold, the manifold being coupled to the plurality of An outlet disposed on the abrasive surface in a spaced apart manner; allowing the abrasive fluid to circulate around at least one outlet; preventing the flow of the abrasive fluid through at least one of the outlets, wherein the at least one outlet has a condition that may be due to Having a flow of abrasive fluid or no flow of abrasive fluid through the outlet is changed to an opposite condition; and contacting a substrate on the abrasive surface with a volume distribution of a single concentration of abrasive fluid, the single concentration abrasive flow system transporting Since the exit. Page 34 This paper size applies to China National Standard (CNS) A4 specification (210 X 297 public love) (please read the back note and then $this page) Binding----..--ιά «·