TW472315B - Platen with web release apparatus - Google Patents

Abstract

Generally, a method and apparatus for releasing polishing material in a polishing system. In one embodiment, the apparatus includes a platen having one or more nozzles coupled thereto. The platen has a support surface adapted to support the polishing material. The nozzles are adapted to flow a fluid therethrough that places the polishing material in a spaced-apart relation to the platen. In another embodiment, the one or more nozzles further include a centerline that forms an acute angle with the support surface. In one embodiment, the method includes the steps of supporting at least a portion of the polishing material on the platen, supplying a fluid between the polishing material, and lifting the polishing material to a spaced-apart relation to the platen.

Description

472315 Α7 Β7

V. Description of the invention () Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economics Field of the Invention: The embodiments of the present invention relate to a membrane lifting system for releasing a membrane from a platform in a milled bismuth i L ww τ 1 method. BACKGROUND OF THE INVENTION: In the processing of semiconductor wafers, the use of chemical mechanical polishing (or CMP) has gained popularity 'because it can increase the density of equipment on semiconductor workpieces or substrates (such as wafers). Increasing demand for planarization of layered substances formed on wafers in semiconductor manufacturing 'demands for larger systems (ie, processing tools) with less wafer damage and better wafer planarization have increased production capacity.

U.S. Patent No. 5,804,507, approved by Tolies et al. On April 15, 1998, describes a CMP system that addresses these issues. Tolies et al. Disclosed a CMP system 'wafer with a leveling system from a wafer in a liquid bath to a leveling system. A transport mechanism or robotic arm carries the wafers from the bath to the transport station. The transport station contains a load cup to place the wafer into one of four processing heads placed on a turntable. The turntable sequentially sends each processing head above the load cup to receive the wafer. When the wafer is sent to the processing head, the turntable passes the processing head and wafers through a flattening station for grinding. The wafer is moved relative to the abrasive material in the polishing fluid to flatten the wafer. The abrasive fluid usually contains chemicals that help remove material from the wafer. The mechanical part of the grinding process is achieved by placing the abrasive material in or on the abrasive fluid. After the flattening process is complete, the wafers are transported back to the appropriate bins in the bath via the transport station. One type of abrasive that can be used in chemical mechanical polishing is called a fixed abrasive. The fixed abrasive material includes many abrasive particles suspended on the resin. Page 2 This paper is applicable to the national standard of China T (CNS) A4 (^^ 10 x 297). ------------- -Install ------- 丨 Order -------- line (please read the precautions on the back before filling this page)

472315 Fifth, the invention description () agent, it is placed in a number of non-continuous components on the support film. When the abrasive material used in the system contains abrasive particles, the system usually uses an abrasive fluid that does not contain abrasive material. This abrasive fluid enhances the service life of the fluid delivery system. The fixed abrasive material is usually a bottom-attachment type, but it is often made into the form of a film. The film is supported on a platform, and the platform has a center or a work area, and the grinding process is performed in this area. The unused portion of the film not on the platform is stored in a roller attached to the side of the platform. When the film is consumed during the wafer grinding process, the film is moved and an unused piece of film is placed in the work area of the platform. The used part of the film leaving the platform is wound on a film roll, and the film is fortunately on the opposite side of the platform from the feed. However, it is sometimes difficult to move the film on the grinding platform. Abrasive fluids in contact with the membrane may cause surface tension or suction to occur between the membrane and the platform. When moving the film, the film moving device must overcome this surface tension. If the suction between the membrane and the platform is large, the mobile device may not be able to move the membrane or damage the membrane during the movement. Therefore, there is a need for a system and method for overcoming the suction of a film in a polishing system. "Jo and Fe": An aspect of the present invention provides an apparatus for releasing a film of an abrasive material. In one embodiment, the device includes a platform, the platform having-or more nozzles connected to it. The platform has a support surface to support grinding and grinding materials. The mouth allows fluid to flow through to the back of the abrasive material. This fluid forces the abrasive material to leave the platform at least partially. In another embodiment, the nozzle has a centerline and an acute angle with the support surface. Page 3 This paper is suitable for China. Standard (CNS) A4 specification (210 X 297 meals)-------- installation ---- fc ---- order · -------- line '(Please read the note on the back first Please fill in this page for further information.) Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315

5. Description of the invention () This allows the fluid to flow from the nozzle to the center of the platform β. Another aspect of the invention provides a method for releasing a film of abrasive material. In the-embodiment, the method includes several steps: supporting at least a portion of the abrasive material on the platform, providing fluid between the abrasive materials, and lifting at least a portion of the abrasive material away from the platform. In one embodiment, the abrasive material is removed from the platform. Brief description of the drawings: Fig. 1 is an elevation view of a chemical mechanical polishing system of the present invention. Fig. 2 is a cross-sectional view of an embodiment of the platform. Fig. 3 is a partial cross-sectional view taken along section line 3-3 of Fig. 2 and depicts an embodiment of the 'lifting system'. Fig. 4 is a sectional cross-sectional view taken along section line 4-4 of Fig. 2. Fig. 5 is a partial cross-sectional view of another embodiment of the lifting system. Figures 6A and 6B are cross-sectional views of the platform, showing the membrane in the processing and separation orientation. Fig. 7 is a cross-sectional view of another embodiment of the lifting system. Figure 8 is an elevation view of another chemical mechanical polishing equipment with a lifting system. Printed reference number printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 100 Chemical mechanical grinder 102 Drive system 104 Grinding media cassette 106 Platform 108 Lifting equipment 110 Grinding head Page 4 This paper applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) 472315 A7 B7 V. Description of the invention () Consumption cooperation with employees of the Intellectual Property Bureau of the Ministry of Economic Affairs Du printed 112 Carrier boards 114 Taiwan 116 Rails 118 Supports 122 Substrates 124 Central recesses 126 Fluid supply 128 Nozzles 130 times 塾 132 times plate 136 grinding, material film 138 film 140 feed roller 142 film roll 144 guide 146 regulator 150 driver 152 driver 154 first side recess 156 second side recess 158 blank 160 top surface 202 First side 204 Second side 206 Side 208 Groove 2 10 Channel 212 Channel 224 Mounting hole 226 Hole 228 Channel 230 Platform 252 Abrasive material 302 Side wall 304 Pipe 306 Vacuum source 308 Body 310 Top surface 3 12 First side 3 14 Second Side 3 16 bottom 3 18 holder 320 screw hole 322 angle 330 nozzle 332 top angle 402 first end 404 second end page 5 this Paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) — — — — — — — — — — — — III · -------— I —--- (Please read the back first Please pay attention to this page, please fill in this page) 472315 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (406 Stopper 408 Accessories 500 Lifting System 502 Body 504 Nozzle 506 Hole 508 Pipe 510 Accessories 512 Fluid Supply 514 Flow Control Mechanism 516 Membrane 518 Platform 700 Grinder 702 Membrane 704 Rotary platform 706 Grinding head 708 Substrate 710 Lifting equipment 800 Grinder 802 Lower pad 804 Rotating platform 808 Substrate 8 1 0 Lifting equipment Detailed description of the invention: Figure 1 is a A chemical mechanical grinder 100 using at least one lifting device 108. A grinder 100 that can benefit from the present invention is

FLAT LAND® 8200 Chemical Mechanical Grinder manufactured by Applied Materials, Inc. of Santa Clara, California. Although lifting equipment is described in specific chemical mechanical grinders, those skilled in the art may use the lifting equipment described herein in other chemical mechanical grinders using abrasive material films or |. An example of a grinder that benefits from the present invention is the grinder described in US Patent Application No. 60 / 185,812, filed on February 29, 1999 and assigned to Sommer, which was used in this case to become reference. Grinding machine 100 page 6 (please read the precautions on the back before filling this page) ---------- Order ------ I--line 'Consumption by employees of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the cooperative 472315 A7 ______-B7 V. Description of the invention () Including drive system 102, grinding media box 104 and platform 1 06 (yes-more lifting system 1 08). The drive system 102 includes a grinding head 10, which maintains the substrate 122 during processing. The abrasive media cassette 104 includes a sheet of abrasive material 136 'placed between the feed roll 140 and the film roll 142 across the platform 106. The polishing head 110 holds the substrate 122 against the shaw of the film 136 on the platform 106, and at the same time, the driving system 1 02 moves the polishing head j j 0 and the substrate 1 22 relative to the film 1 36 according to the polishing pattern. An example of abrasive media cassette 104 is found in U.S. Patent Application No. 08 / 833,278, filed April 4, 1997, by Donohue et al. The abrasive media cassette 104 pulls, mediates, and passes the abrasive material film 136 through the platform 106. Although the grinding media cassette 104 described herein handles a fixed abrasive material film 136 (eg, Minnesoa Manufacturing and Mining company, Saint Paul, Minnesota), the lifting device i 08 can also be ground using conventional foamed polyurethane. Materials (eg Rodel Inc., Newark, Delaware provider). The reader should also note that the lifting device 1 08 of the grinder may additionally use a stick-down pad of the abrasive material to assist in removing the ladle from the abrasive material. Generally, the unused portion of the film 136 is wound on the supply roll 140 and the used portion is wound on the film roll 142. The feed roll 140 and the roll film 142 are connected to drives 150 and 152, respectively, to provide tension to the film 136 across the platform 106 between the rolls 140 and 142. The drivers 150 and 152 may be stepper motors, air motors, servo motors, or the like. The abrasive media cassette 104 generally includes guides 144 on each side of the platform 106. The guide 144 makes the film 136 parallel to the platform 106. With the paper size on the platform 106, page 7, this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ^ ---------- ^ --------- (Please read the precautions on the back before filling this page) 47231 A7

Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. The part of the film 1 3 6 on the description of the invention is consumed during the grinding process, and the film 36 is sent to the platform 106 step by step. The advancement of the film 136 brings a new piece of unused film 136 from the supply roller 1 40 to the top of the platform 1 06 and removes the used film 1 3 6 'the used film I 36 is The film roll 1 42 is rolled up. The abrasive media cassette 104 also includes a regulator 146. The regulator 146 generally maintains the surface of the film 136 in a state that produces a uniform polishing result. For example, in the case where the film 1 3 6 includes a fixed abrasive material, the film 136 must be adjusted before use to uniformly expose some abrasive particles of the abrasive member on the film 136. The regulator 146 (which may include a brush, a post with a flat or textured surface or other surface) contacts the membrane 136 and the membrane 136 contacts the substrate 122 to pre-treat the surface of the membrane 1 36. Such a regulator 1 46 is usually used in conventional grinding In the system

US Patent Application No. 08 / 961,606, filed by Sommer on October 31, 997, describes an embodiment of a drive system i 02 that benefits from the present invention. The drive system 102 moves the polishing head 1 10 relative to the film 1 3 6 of the polishing material. The drive system 102 generally includes a platform 丨 4 and a carrier board 丨 2. The stage 114 moves linearly along the outline of the net 136 on the two parallel rails 116 (and the bearings). Each track 116 is connected to a support 118, which is connected to the platform 106. The first driver (not depicted) is connected to the stage 11 4 and the console moves along the track 6. The first driver may include one or more Sawyer motors, bamboo servo motors, and other equipment to generate and control linear displacement. A part of the first drive is connected to the supporting member 18 and a second part is connected to AJ 114. The carrier plate 11 2 is connected to A, J 〇 1 1 4 through two parallel rails 1 38 (and bearings). The rail 138 is set between the carrier plate 112 and the table U4, allowing respectfully j Qiudan plate 1 2 relative to page 8. This paper size applies the Chinese National Standard (CNS) A4 specification (21〇X 297). --------- I ----- II --- I ^ ----- I-^ --------- line (Please read the note on the back first? Matters Refill this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315 A7 ____ _ B7 V. Description of the invention () The movement of the platform 11 4 moves vertically. A second driver (not depicted) is connected to the carrier plate 112 and controls the movement of the carrier plate 112 along the rail 13. The second driver has the same structure as the first driver. A part of the second driver is connected to the carrier board 11 2 and the second part is connected to the stage 1 1 4. The carrier plate 112 supports a grinding head 11. The grinding head 11 〇_ is connected to an unillustrated starter 'so that the substrate in the grinding head may contact the film 1 3 6 during the grinding process. Several examples of grinding heads that may be used in the grinding machine 1000 are the TITAN HEADtm wafer carrier and the DIAMOND HEADtm wafer carrier manufactured by Applied Materials, Inc., of Santa Clara, California. In one embodiment, the combined action of the stage 114 and the carrier plate 112 causes the x-y or orbital scraping action of the substrate 112 held by the polishing head 110 with respect to the film 136. One or more nozzles 1 28 are provided in the grinder 100 to provide a grinding fluid between the substrate 122 and the film 136 during the grinding process. Nozzle 128 may be connected to drive system 02, platform 106, or otherwise located to allow the abrasive fluid to flow from nozzle 12 to membrane 138. The abrasive fluid includes deionized water and one or more chemicals that help remove material from the wafer. Abrasive fluids may include abrasive materials. The platform 106 is a flat surface. The substrate 122 is ground on this flat surface. The platform 106 is typically made of aluminum. The platform 106 has a top surface 160 supporting film 136. The top surface 1 60 includes a central recess 1 24 and a first side recess 1 54 and a second side recess 1 5 6. The secondary pad 1 30 and the secondary plate 3.2 are provided in the central recess 1 24. The secondary pad 1 3 0 is usually plastic, such as polycarbonate and foamed polyurethane. The hardness of the secondary pad 1 3 0 (combined with the secondary plate 1 3 2) may be selected to produce a specific 9th paper size applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) II 1! -Pack ---- t ---- Order ------! -Line (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315 A7 ---- B7 V. Description of the invention () Grinding results. The secondary pad 1 3 0 maintains a film of the abrasive material 3 6 parallel to the plane of the substrate 122 held by the polishing head 110 and promotes the overall planarization of the substrate 122. The secondary plate 1 3 2 is placed between the secondary pad 1 30 and the bottom of the recess 1 2 4 so that the top surface of the secondary pad 1 30 is in the top surface 1 60 of the platform 1 06, that is, coplanar. At least one of the undercuts 1 5 4 and _ 1 5 6 surrounds the lifting device 108. A lifting device 1 0 8 is connected to the fluid supply 12 6. The lifting device 108 may be activated to provide a fluid (such as air, nitrogen, and the like) between the platform 106 and the membrane 1 36 to force the membrane 1 36 to leave the platform 106. The fluid leaving from the lifting device 108 releases the attraction between the membrane 136 and the platform 106 (for example, the membrane attraction or surface tension caused by the fluid under the membrane). In one embodiment, the fluid exiting from the lifting device 108 separates the membrane 13 from the platform 106. One or more lifting devices 108 may be placed near one or more sides of the platform 106. In one embodiment, the lifting device 108 is close to the film roll 140 in the recess 154 of the platform 106. Typically, the blank 158 is in the second recess 156. Alternatively, another lifting device 108 may replace the blank 158 and be placed in the second recess, on one or two adjacent sides of the platform 106, or a combination thereof. Fig. 2 is a plan view of an embodiment of the platform 106. The top surface of the platform 106 has a first side 202 close to the feed roll 140, a second side 204 close to the film roll 142, and a pair of side edges 206. The top surface 160 of the platform 106 includes the edge of the trench 208 close to the platform 106 under the abrasive material film 136. The trench 208 includes two channels 210 in the top surface 160, near the side 206 of the platform. The trench 208 also includes two channels 2 1 2 which may include portions of undercuts 154 and 156. The channel 212 may be in the top surface 160. 'Concave 101' This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm) — II I ----- installation ---- I --- —Order --- I ----- line (please read the notes on the back before filling this page) Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315 A7 ________B7 V. Description of the invention () 154 and 156 inward . Referring to Fig. 3, in one embodiment of the trench 208, the channel 212 is defined between a side wall 302 of the recess 154 and the first side 312 of the lifting device 108. The channel 212 communicates with a tube 304, which is connected to a vacuum source, 3 06 vacuum source 3 06, and optionally provides a vacuum to the groove 20 8, which causes the membrane to adhere to the platform 10 06 during processing. An example of an abrasive material maintenance system is found in U.S. Patent Application No. 09/2 58,036, filed February 25, 1999 by Ye Yeyi et al. The claimant should use other types of equipment to release the abrasive material releasably 252 is fixed to platform 230, such as releasable adhesive, electrostatic chucks, mechanical clips, and other releasable holding mechanisms. The lifting device defining one side of the channel 2 12 includes one or more nozzles 330 to spray fluid. The fluid coming from the feeder 26 and ejected from the nozzle 300 forces the membrane 108 to leave the platform 106, overcoming the attraction between the membrane 108, the platform 106 and the time 130, and any possible presentation Surface tension caused by fluids (such as abrasive fluids) below the membrane. In one embodiment, the 'lifting device 108 includes a main body 308. The main body 308 has a first side 3 12, a second side 3 i 4, a top surface 3 1 0, and a bottom 3 1 6. A plurality of fasteners 318 pass through the mounting holes 224 from the top surface of the body 308 and are locked into the mating screw holes 320 in the first recess 154. A seal or gasket (not depicted) is used between the lifting member 108 and the platform 106 to prevent exposure therebetween. Alternatively ' other means (such as bolts, rivets, clips, adhesives, and the like) may be used to secure the lifting device 108 to the platform 106. Typically, the second side 3 1 4 of the body 308 and the top surface 3 1 0 form a radiused or chamfered angle. The radius of the corner 322 allows the film 1 36 to pass through from there. The 11th paper size applies to the Chinese national standard (CNS> A4 size (210 X 297 mm)

In —--- install! -----— Order ----- I I--line (Please read the notes on the back before filling this page} 472315

V. Description of the invention () Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The possibility of damage is reduced to a minimum β channel 228 runs through the body 308. One or more volume 3 丨 4 pores 226 are in the body 308 and cut through the channel 228. Typically, the end of the Gourmet® tab of the hole 226 becomes the nozzle 33 ° and it is on the first side of the body 308. The hole 226 is about 1% blood, and the top surface 160 of Xingshiyi 106 has an acute angle α. The hole 26 points inward to the center of the platform 〇〇6. The direction of the hole 2% causes the diameter of the extension of the hole 226 to leave the apex angle 332 of the opposite wall of the groove 208. 'Alternatively, the nozzle 330 may be provided on the top surface 31 of the body 308. The lifting device 108 has a nozzle 330 on the top surface of the body 308, and this configuration is particularly useful in trenchless platforms. In one embodiment, 'at least three nozzles 33 are provided in the body 308. Nozzle 3 3 0 has a diameter of about 0 to 03 to 13 inches and is subjected to a pressure of about 30 to 50 pounds per square pair. If the nozzle 3 3 0 receives too high pressure or flow rate, the film 1 3 6 may vibrate. Referring to Fig. 4, in an embodiment of the lifting device 108, the channel 228 has a first end 402 and a second end 404. A plug 406 is provided at the first end 402 to prevent fluid in the channel 228 from leaving the first end 402. An accessory 408 is provided in the second end 404 of the channel 226. The fitting 408 facilitates communication between the channel 226 and the fluid supply 126. Figure 5 depicts another embodiment 500 of a lifting system. The lifting system 500 is provided on the platform 106, similar to the lifting system 108 described with reference to FIGS. 1-4. The lifting system 500 includes a body 502 with one or more nozzles 504 therein. Each nozzle 504 is connected to a tube 508 through a hole 506. A fitting 510 is provided in the tube 5 0 8 and connected to the fluid supply 5 1 2. Optional 'Flow controller page 12 This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). ---- k ---- order --------- line (Please read the notes on the back before filling this page) 472315

V. Description of the invention ((Please read the notes on the back before filling this page) Structure 5 1 4 (such as regulator, hole, proportional valve or the like) is set between the supply 5 12 and the tube 508 to control the passage The flow of the fluid at each nozzle 504 is therefore 'possible to fine-tune the lifting of the film 5 1 6 close to the lifting system 5 00 such that a portion of the film 5 1 6 is higher than the other, or to ensure that the fluid passes uniformly through all the nozzles of the lifting system 500 504. For example, in a lifting system that includes three or more nozzles 504, the central nozzle may have a higher flow rate to provide more fluid (such as air) below the center of the membrane 5 丨 6. The higher flow rate corresponds to a larger lift to overcome the fluid tension in the center of the platform 5 丨 8 (farthest from the nozzle 504). Alternatively, the fittings in each tube 508 may be connected together. The single-fluid tube connects the fitting 5 10 to the fluid supplier 512. The Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs printed reference to Figures 6A and 6B. In operation, a vacuum is sent to the trench 208. The vacuum in the trench 208 is generated Downward force 602 causes film 136 to grind The platform is attached in the process (see Figure 6A). Once the grinding is completed and the membrane 136 is to be moved, the vacuum is removed from the groove 208 (ie, pressure is applied to the groove or the atmosphere is communicated) and the fluid is sent from the fluid supply 126 to the lift Apparatus 1 0. Fluid from the supplier 1 26 flows into the body 308 and is ejected from the nozzle 300. A stream 600 (usually a gas stream) impacts the membrane 1 3 8 and leaves the membrane 1 30 off the platform 10 06. The flow 600 from the platform The film 138 is released by 106 so that at least a portion of the film 138 is lifted from the platform 106. In one embodiment, the 'flow 600 lifts the film 138 away from the platform 106 »The angle α of the flow 600 impacting the film 136 has the first The vector 604 provides an upward force, flow 600, and a second vector 606 forces the flow 600 upward to the center of the membrane 136, so that the liquid flows below the membrane 1 36, and overcomes the surface tension and other. National Standard (CNS) A4 specification (210 X 297 mm) 472315 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (the attraction of the membrane 1 36 and the platform i06 by force. The angle of the nozzle 330 α allows lifting device 108 to be placed around platform 106 and membrane 136 ' Leave the grinding area sensitive to surface changes (which may cause uneven grinding) (that is, the area above the sub-pad 140). Also, the position of the lifting equipment around the platform 丨 〇6 simplifies the design 'Because no complicated technology is required to allow air to flow through the platform 106, the secondary 130, and the secondary plate 132. Figure 7 depicts another grinding machine 700, which uses a film 702 on a rotating platform 704. The grinding head 706 maintains the substrate during the grinding 7〇8 resisted the platform 7 04. At least one lifting device 70 is connected to the platform 704. Structurally, the lifting device 7 1 0 is approximately similar to the lifting device 1 08 described in FIG. 1_6B. Birang et al., U.S. Patent Application Serial No. 09 / 244,456, filed February 4, 1999, describes a grinder 700 that may benefit from lifting equipment 710. The lifting device 710 may be activated to push the membrane 702 away from the platform 704. In one embodiment, the lifting device 7 1 0 removes the film 702 from the platform 704 to facilitate the advancement of the film 702. Figure 8 depicts another grinding machine 800, which uses a lower-attach pad 802 of abrasive material on a rotating platform 804. The grinding head 806 keeps the substrate 808 against the platform 804 during the grinding process. The lifting device 810 is connected to the platform 804. The lifting device 8 1 0 is similar in construction to the lifting device 108 described in Figs. 1-6B. U.S. Patent No. 5,804,507, approved by Tolies et al. On April 15, 1998, describes a grinder 800 that may benefit from lifting equipment 810. The lifting device 810 may be activated to lift the film 802 from the platform 804, overcome the adhesion therebetween, and facilitate the intermittent removal and replacement of the pad 802. Section 141 " This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) III III ^ --— It --- t · —! --- II ^ {Please read the precautions on the back before (Fill in this page)

Claims (1)

472315 A8 B8 C8 D8 6. Scope of patent application 1. A device for releasing abrasive material film, the device contains at least: (Please read the precautions on the back before filling this page) A platform with a support surface to support the abrasive material; and One or more nozzles are attached to the platform, and the nozzles allow fluid to pass through, which fluid forces the abrasive material at least partially away from the platform. 2. The device as described in item 1 of the scope of patent application, wherein one or more of the nozzles above cause the abrasive material to leave the platform. 3. The device according to item 1 of the scope of patent application, wherein said nozzle has an acute angle with a center line and a supporting surface. 4. The device according to item 1 of the patent application scope, further comprising a nozzle body having at least one nozzle therein, and the nozzle body having a top surface and a support surface coplanar. 5. The device according to item 4 of the scope of patent application, wherein the above-mentioned support surface also has a recess to accommodate the nozzle body. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. The device described in item 4 of the scope of patent application, wherein the support surface has a first end and a recess at the first end, and the nozzle body is placed in this recess 〇07. The device according to item 1 of the scope of patent application, wherein the above-mentioned support surface is also communicated with a vacuum tube, and the groove is in the support surface. Page 15 This paper size applies to the Chinese National Standard (CNS) A4 (210 X 297 mm) 472315 A8 B8 C8 D8 6. Application for patent scope 8. The equipment described in item 1 of the scope of patent application, which also includes: A nozzle body having at least one nozzle therein; and a groove in the platform, the nozzle body includes at least a part of a wall of the groove. 9. The device according to item 8 of the scope of patent application, wherein the above-mentioned nozzle body further comprises: a top surface supporting the abrasive material; and a side surface communicating with the groove, with one or more nozzles in the side surface of the nozzle body 〇1 〇. The device according to item 8 of the scope of patent application, wherein the above-mentioned nozzle body further includes: a side surface communicating with the groove, and one or more nozzles are in the side surface of the nozzle body; Abrasive material with one or more nozzles in the top surface of the nozzle body. 11. The device according to item 4 of the scope of patent application, wherein said nozzle body includes a plurality of nozzles. 1 2. The device according to item 1 of the scope of patent application, further comprising: a first nozzle body in the first side of the platform; and a second nozzle body in the second side of the platform, '· _The first and second sides are opposite. Page 16 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) — — — — — — — — — — 1 'II * 1 丨 III Order-— — 1 丨 (Please read first Note on the back, please fill out this page again) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315 AS B8 C8 D8 VI. Patent application scope 1. A device for releasing abrasive material film, the device at least contains: (Please read the Note: Please fill in this page again) a platform with a support surface to support the abrasive material; and one or more nozzles connected to the platform, the nozzles allow fluid to pass through, this fluid forces the abrasive material to leave the platform at least partially. 2. The device as described in item 1 of the scope of patent application, wherein one or more of the nozzles above cause the abrasive material to leave the platform. 3. The device as described in item 1 of the patent scope, wherein the nozzle has an acute angle with the center line and the supporting surface. 4. The device according to item 1 of the patent application scope, further comprising a nozzle body having at least one nozzle therein, and the nozzle body having a top surface and a support surface coplanar. 5. The device according to item 4 of the scope of patent application, wherein the above-mentioned support surface also has a recess to accommodate the nozzle body. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. The device described in item 4 of the scope of patent application, wherein the support surface has a first end and a recess at the first end, and the nozzle body is placed in this recess In. 7. The device as described in item 1 of the scope of patent application, wherein the support side mentioned above also communicates with the vacuum tube, and the groove is in the support side. Page 15 This paper is applicable to the national standard (CNS) A4 specification (210 X 297 mm) 472315 A8 B8 C8 D8 6. Application for patent scope 8. The equipment described in item 1 of the scope of patent application, which also includes : A nozzle body having at least one nozzle therein; and a groove in the platform, the nozzle body including at least a wall portion of the groove. 9. The device according to item 8 of the scope of patent application, wherein the above-mentioned nozzle body further comprises: a top surface supporting the abrasive material; and a side surface communicating with the groove, with one or more nozzles in the side surface of the nozzle body 〇I 0. The device according to item 8 of the scope of patent application, wherein the above-mentioned nozzle body further comprises: a side surface communicating with the groove, with one or more nozzles in the side surface of the nozzle body; and a top surface, supporting Abrasive material with one or more nozzles in the top surface of the nozzle body. II. The device according to item 4 of the scope of patent application, wherein said nozzle body includes a plurality of nozzles. 1 2. The device according to item 1 of the scope of the patent application, further comprising: a first nozzle body in the first side of the platform; and a second nozzle body in the second side of the platform. One and two sides are opposite. Page 16 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) nn / i II n (I nn I. Nn .nnn I n ^ OJt n I n I n I n I (Please first Read the notes on the back and fill out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315 A8 B8 C8 D8 VI. Application for patent scope 1 3. The equipment described in item 12 of the scope of patent application, of which the above The first and second nozzle bodies have a top surface and a supporting surface coplanar. 1 4. The device according to item 1 of the scope of patent application, wherein the above nozzle has a diameter of about 0.03 to 0.13 inches. 1 5. The device according to item 1 of the scope, wherein one or more of the above nozzles include three nozzles. 1 6. The device according to item 1 of the patent scope, wherein the fluid is air or nitrogen. 1 7. The device according to item 1 of the scope of the patent application, wherein the above fluid is provided at about 30 to 50 pounds per square inch "1 8.-a device that releases the abrasive media film on the abrasive surface and the back surface, The device contains at least: a platform with a support surface to support the abrasive material And a device for leaving at least part of the abrasive material away from the platform. 1 9. The device according to item 18 of the scope of patent application, wherein the above device further comprises one or more fluid columns ejected from the platform. 20. — A device that releases the abrasive media film on the abrasive surface and the back surface. The page size of this paper applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). ^ 1 n I nn I nn Ha f SI n I nnn Order- 丨 n I nn I me (Please read the notes on the back before filling out this page) Printed by the Consumers 'Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 472315 Six Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 C8 D8 Patent Application The scope includes at least: a platform with a support surface to support the abrasive material; a groove in the top surface of the platform that communicates with a vacuum tube; and one or more nozzles connected to the platform, the nozzles allow fluid to flow out, and this fluid causes grinding A device that leaves at least part of the material off the platform. 2 1. The device according to item 20 of the scope of the patent application, wherein the nozzle has a centerline and an acute angle with the support surface. The device according to item 20 of the patent scope further comprises a body having at least one nozzle therein, and the body having a top surface and a support surface coplanar. 23. The device according to item 20 of the patent application scope, wherein, The above at least one nozzle includes three nozzles at one end of the flat hall. 2 4. A method for releasing abrasive material, the method includes at least the following steps: supporting at least part of the abrasive material on the platform; providing fluid to the abrasive material Between; and lifting at least a portion of the abrasive material away from the platform. 25. The method of claim 24, wherein the step of providing the fluid further comprises forming an acute angle between the flow direction of the fluid and the platform. Page 18 This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) -Line. 472315 A8 B8 C8 D8 VI. Patent application scope 26. The method described in item 24 of the patent application scope, wherein the step of providing the fluid further includes flowing at least part of the fluid to the center of the platform. 27. The method of claim 26, wherein the step of providing the fluid further comprises causing at least a portion of the fluid to flow parallel to the platform. 2 8. The method of claim 24, wherein the step of providing the fluid further comprises impacting the abrasive material with a jet of the fluid. 29. The method of claim 24, wherein the step of providing the fluid further comprises flowing air or nitrogen through one or more nozzles at least partially below the abrasive material. 30. The method of claim 24, wherein the pressure of air or nitrogen flowing through one or more nozzles is about 30 to 50 psi. 31. The method of claim 24, further comprising passing the abrasive material across the platform. — — — — — — — — — — — — — II Γ III —Order '. (Please read the notes on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Employee Cooperatives Page 19 China National Standard (CNS) A4 specification (210 X 297 mm)