TWI252568B - Device and method for cavity-down package - Google Patents

Device and method for cavity-down package Download PDF

Info

Publication number
TWI252568B
TWI252568B TW093136670A TW93136670A TWI252568B TW I252568 B TWI252568 B TW I252568B TW 093136670 A TW093136670 A TW 093136670A TW 93136670 A TW93136670 A TW 93136670A TW I252568 B TWI252568 B TW I252568B
Authority
TW
Taiwan
Prior art keywords
crystal
cavity
hole
wafer carrier
wafer
Prior art date
Application number
TW093136670A
Other languages
Chinese (zh)
Other versions
TW200618218A (en
Inventor
Shun-Yen Ku
Original Assignee
Advanced Semiconductor Eng
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Semiconductor Eng filed Critical Advanced Semiconductor Eng
Priority to TW093136670A priority Critical patent/TWI252568B/en
Application granted granted Critical
Publication of TWI252568B publication Critical patent/TWI252568B/en
Publication of TW200618218A publication Critical patent/TW200618218A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16151Cap comprising an aperture, e.g. for pressure control, encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16152Cap comprising a cavity for hosting the device, e.g. U-shaped cap
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

A cavity-down package is disclosed. A chip is disposed inside a cavity of the chip carrier. The chip is electrically connected to the chip carrier by a plurality of electrically connecting elements. A shaping cover is disposed on the chip carrier to form an encapsulant filling space defined by the cavity and the shaping cover. A liquid compound is formed inside the encapsulant filling space to seal the chip and the electrically connecting elements. The thickness and shape of the liquid compound are controlled by the shaping cover. Therefore, it can prevent the problem that the cavity-down package cannot be disposed on a PCB caused by the unusual thickness of the liquid compound. In addition, the electrically connecting elements are not exposed out of the liquid compound.

Description

1252568 五、發明說明(1) ' ~ ------— 【發明所屬之技術領域】 本發明係有關於—種晶穴朝下型封裝構造及其方法, j,係有關於一種能控制點塗膠體厚度與形狀之晶穴朝下 型封裝構造及其方法。 【先前技術】 a自知阳^朝下型封裝(cavity-down package)係為一 之二2 21導體5裝型態,其係具有較佳之散熱性與較短 專1^路徑等優點。在習知晶穴朝下型封裝構造中之 :=ϋ體係用以密封保護一晶片與複數個銲線’而形成該 =膠體之方式係主要區分為壓模(molding)形成與點塗 一 i^pensing)形成,其中壓模形成之封膠體係以模具壓合 =片載體再注膠固化而成,該壓模㈣之優點係為外型 二缺.,』則疋要δ又置模具時,會有對位之問題,且在注 體二:^發生溢膠污染該晶片載體上之球墊。該點塗膠 利用點膠之方式形成,且在點膠前會先在晶片周邊 體^二 冓造,以避免點膠時膠體溢膠污染該晶片載 _ ;墊,但其缺點則為不易控制該點塗膠體之厚度,且 之外型較不平整,尤其是膠體 後,當其向於銲球,會導致無法裝設於PCB板 ^诗,者當該點塗膠體低於該些電性導接元件時,則會造 ^坠電性導接元件裸露在該點塗膠體之外。、 圖^用點塗膠體之晶穴朝下型封裝,請參閱第1 係具有下型封裝構造1〇0中,-晶片載體11〇 有朝向其一表面U1之晶穴112,該晶片載體110係1252568 V. INSTRUCTION DESCRIPTION (1) '~ ------— TECHNICAL FIELD OF THE INVENTION The present invention relates to a crystal-hole type package structure and method thereof, j, relating to a controllable A cavity-down type package structure and method for coating the thickness and shape of a gel. [Prior Art] A self-awareness-cavity-down package is a two-conductor type 2 conductor type, which has the advantages of better heat dissipation and shorter specific path. In the conventional crystal-cavity downward-facing package structure: the =ϋ system is used to seal and protect a wafer and a plurality of bonding wires', and the method of forming the gel is mainly divided into molding forming and spot coating. Forming, wherein the sealing system formed by the stamper is formed by mold pressing = sheet carrier and then injection molding, and the advantage of the stamper (4) is that the outer shape is lacking, and then the δ is placed on the mold, There is a problem with the alignment, and in the injection body 2: ^ the overflow of the ball on the wafer carrier. The glue is formed by dispensing, and is first fabricated in the peripheral body of the wafer before dispensing to avoid contamination of the wafer by the gel when the glue is dispensed, but the disadvantage is that it is difficult to control. The point is coated with the thickness of the gel, and the outer shape is relatively uneven, especially after the colloid, when it is directed to the solder ball, it will not be installed on the PCB board, and when the point is coated, the gel is lower than the electrical properties. When the component is connected, the electrical conduction component is exposed outside the point of the coating. Figure 2 is a face-down type package with a dot-coated gel. Please refer to the first package having a lower package structure 1〇0, and the wafer carrier 11 has a cavity 112 facing a surface U1 thereof. The wafer carrier 110 system

1252568 五、發明說明(2) 可由一具有通孔之電路基板11 3與一散熱片〗丨4所咁兮 ,穴U2係由該電路基板113之通孔與該散熱片⑴所構- 成。一晶片120係設置於該晶穴112中,並以複數個銲 130電性連接至該電路基板丨13。一攔壩" 妒2Ϊ 表# ,該攔壩140係圍繞該晶穴112而 形成為一封閉壞狀,一點塗膠體丨50係填充於該晶穴“ 2 :二Ϊ ΐ該晶片120與該些銲線13° ’複數個銲曰曰球:6。係 形成於该表面111之複數個球墊115。由於該攔壩14〇只能 阻隔該點塗膠體150在電路基板113之該表面11〗上> _莫 ,該點塗勝體150在填充之過程中,無法控制二二: 膠體150之厚度與形狀,因此容易造成該點塗膠體15〇之厚 f ^常,當該晶穴朝下形封裝結構1〇〇後欲裝設於一pcB板 日守,若該點塗膠體150高於銲球16〇時,則會導致該晶穴 =下型封裝構造1〇〇無法裝設於pcB板,或者當該點塗膠體 =0之低於該些銲線130時,則會造成該些銲線13〇裸露在 该點塗膠體1 5〇外。 明參閱第2 A至2 C圖,上述該晶穴朝下型封裝構造丨〇 〇 ,,,方法係說明如下。在第2A圖中,該晶片載體u〇之 /曰曰八11 2係朝向該電路基板11 3之該表面1 11,該些球塾 11 5係形成於該表面丨丨1,該晶片丨2〇係容置於該晶穴丨丨2中 ^黏設於該散熱片114(如第1圖所示);接著,進行一打線 1步驟’以+複數個銲線丨3〇電性連接該電路基板1丨3與該晶片 ’在第2B圖中,該攔壩140係形成於該電路基板111之 a亥表面113 ’該攔壩140係圍繞該晶穴112 ;在第2C圖中,1252568 V. Description of the Invention (2) A circuit board 11 3 having a through hole and a heat sink 丨 4 are formed, and the hole U2 is formed by the through hole of the circuit board 113 and the heat sink (1). A wafer 120 is disposed in the cavity 112 and electrically connected to the circuit substrate 13 by a plurality of solders 130. a dam " 妒 2 Ϊ Table # , the dam 140 is formed around the cavity 112 to form a closed bad shape, a layer of glue 丨 50 is filled in the crystal cavity " 2 : Ϊ ΐ the wafer 120 and the These bonding wires are 13° 'plurality of solder balls: 6. A plurality of ball pads 115 formed on the surface 111. Since the dam 14 〇 can only block the point of the glue 150 on the surface 11 of the circuit substrate 113上上> _ Mo, the point of the coating body 150 in the process of filling, can not control the two: the thickness and shape of the colloid 150, so it is easy to cause the point of the coating gel 15 〇 thick ^ ^ often, when the hole After the downward-facing package structure is installed, it is installed on a pcB board. If the point coating gel 150 is higher than the solder ball 16〇, the crystal hole = the lower package structure cannot be installed. When the pcB board, or when the point coating gel=0 is lower than the bonding wires 130, the bonding wires 13〇 are exposed to the surface of the coating gel. 5 to 2 C to the point. The method of the above-mentioned crystal-hole-down type package structure is as follows. In FIG. 2A, the wafer carrier u〇/曰曰8 11 2 is oriented toward the electricity. The surface 11 of the substrate 11 is formed on the surface 丨丨1, and the wafer 丨2 is placed in the cavity 丨丨2 and adhered to the heat sink 114 (eg 1)); then, a single-line 1 step is performed to electrically connect the circuit substrate 1丨3 and the wafer with a plurality of bonding wires 丨3〇, and in the 2B diagram, the dam 140 is formed in a sea surface 113' of the circuit substrate 111. The dam 140 surrounds the crystal cavity 112; in FIG. 2C,

第8頁 j252568 五、發明說明(3) f點堡膠體1 50係填充於該晶穴丨丨2中,以密封該晶片丨2() ί、"亥些鲜線1 30 ;最後再形成該些銲球160於該表面111之 j些球塾1 1 5 (如第1圖所示),以形成該晶穴朝下型封裝構 =1胃〇 。在上述之習知晶六朝下型封裝方法中,通常係利 〜點^之方式來形成該點塗膠體1 5 0,由於該點塗膠體1 5 0 杜j膠之過和中’僅受到該搁塌1 4 0之限制’並無其他元 麻' ^工制H '至.體1 5 0之厚度,因此容易造成該點塗膠 體15〇之厚度異常。 【發明内容】 t ^月之主要目的係在於提供一晶穴朝下型封裝構 ^ 曰日片仏设置於一晶片載體之一晶穴中,複 —π性導接元件係電性連接該晶片與該晶片載體,一成 駚盍』hamr^g c〇ver)係對應於該晶穴而設置於該晶片載 體係^成:ί與該曰曰曰穴係構成一膠體填充空間,—點塗膠 -件Γ f f體填充空間以密封該晶片與該些電性導接 ^ β忒成形蓋係可控制該點塗膠體之厚度與形狀,以避 免因该點塗取辦 m M避 * /體之厚度過咼而無法裝設於一PCL·板上,且 σΧ ^ ^亦可防止該點塗膠體溢膠污染該晶片載體。 法,一 ^明之次一目的係在於提供一種晶穴朝下型封裝方 二曰日片係設置於一晶片载體之一晶穴中,之後,形士 複數個電性壤拉_ ^ •交 幵乂成 著, V接兀件以電性連接該晶片與該晶片载體,接 蓋斑哕Γ ^亥晶穴,設置一成形蓋於該晶片載體,該成形 ;體二=穴係構成一膠體填充空間,之後,再形成一點‘ ♦體於该膠體填充空間内,該成形蓋係可控制該點塗;^^ v j 〇/i ^r\ \ /1 ) 度與形狀,以避免因該點塗膠體之厚度異常,而導致 Λ曰曰八朝下型封裝構造無法被後續的製程所使用。 _依本發明之晶穴朝下型封裝構造係包含一晶片載體、 :晶片、複數個電性導接元件、一成形蓋及一點 =載體係具有一表面以及一朝向該表面之晶穴,該晶 f I又置於该晶穴τ,該些電性導接元件係電性連接該晶 一省aa片載體,该成形蓋係對應於該晶穴而設置於該晶 =载體该成形蓋與該晶穴係構成一膠體填充空間,該點 塗膠體係形成於該膠體填充空間内,以密封該晶片與該些 電〖生導接元件’其中,該成形蓋係控制該點塗膠體之厚度 與形狀’以避免因該點塗膠體之厚度異常及防止該點塗膠 體溢膠污染該晶片載體,而導致該晶穴朝下型封裝構造無 法再進行後續之製程。 · 【實施方式】 參閱所附圖式,本發明將列舉以下之實施例說明。 本發明之一具體實施例,請參閱第3圖,一種晶穴朝 下型封裝構造20 0係包含一晶片載體210、一晶片22 0、複 數個電性導接元件230、一成形蓋(shaping cover) 240 及 一點塗膠體(potting compound) 250,於本實施例中,該 晶片載體210係由一電路基板211與一散熱片212所組成, 其中該電路基板21 1係可為混合有玻纖布強化纖維之FR-3、FR-4環氧樹酯或BT樹酯基板、聚醯亞胺膜、陶瓷基 板’該散熱片21 2之材質係可為銅或其他適當之金屬。該 晶片載體210係具有一表面2 13以及一朝向該表面21 3之晶Page 8 j252568 V. Description of the invention (3) F-Point Fort Colloid 1 50 is filled in the crystal hole 丨丨 2 to seal the wafer 丨 2 () ί, "Hai fresh line 1 30; finally formed The solder balls 160 are on the surface 111 by a number of balls 1 1 5 (as shown in FIG. 1) to form the crystal-cavity downward-facing package = 1 stomach sputum. In the above-mentioned conventional hexa-cold-type packaging method, the dot-coating body 150 is usually formed in a manner of a point-to-point method, since the point-coated colloid 1 5 0 The limitation of 1 40 is 'no other yuan hemp' ^Working system H ' to the thickness of body 1 50, so it is easy to cause the thickness of the coating gel 15 异常 to be abnormal. SUMMARY OF THE INVENTION The main purpose of t ^ month is to provide a crystal-cavity-type package structure, which is disposed in a crystal cavity of a wafer carrier, and the complex-π-conducting component is electrically connected to the wafer. And the wafer carrier, a 駚盍 駚盍 ham ham ham ham ham ham ham 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham ham - Γ ff body filling space to seal the wafer and the electrical conductive connection 忒 忒 忒 forming cover system can control the thickness and shape of the point coating gel to avoid the application of the point to avoid The thickness is too large to be mounted on a PCL board, and σΧ ^ ^ can also prevent the point coating gel from contaminating the wafer carrier. The second purpose of the method is to provide a crystal-hole-down type package, and the second film is placed in a crystal cavity of a wafer carrier, and then the plurality of electric soils are pulled. The V-junction is electrically connected to the wafer and the wafer carrier, and is covered with a spotted hole, and a shaped cover is disposed on the wafer carrier, and the forming is performed; The colloid fills the space, and then forms a little ' ♦ body in the gel filling space, the forming cover can control the spot coating; ^^ vj 〇 / i ^ r \ \ /1 ) degree and shape to avoid The thickness of the point coating gel is abnormal, and the Λ曰曰8 downward-facing package structure cannot be used by subsequent processes. The crystal-cavity downward-facing package structure according to the present invention comprises a wafer carrier, a wafer, a plurality of electrical conductive elements, a shaped cover, and a point = carrier having a surface and a crystal cavity facing the surface, The crystal f I is again placed in the crystal hole τ, and the electrical conductive elements are electrically connected to the crystal aa piece carrier, and the shaped cover is disposed on the crystal hole to form the forming cover corresponding to the crystal hole Forming a colloid filling space with the crystal system, the dot coating system is formed in the gel filling space to seal the wafer and the electrical conduction guiding elements, wherein the forming cover controls the point coating gel The thickness and shape 'to avoid the abnormality of the thickness of the coating gel at this point and to prevent the point coating colloid from contaminating the wafer carrier, so that the hole-down type package structure can no longer carry out the subsequent process. [Embodiment] The present invention will be described by way of the following examples. In one embodiment of the present invention, referring to FIG. 3, a crystal hole facing type package structure 20 includes a wafer carrier 210, a wafer 22, a plurality of electrical guiding members 230, and a forming cover (shaping). In the present embodiment, the wafer carrier 210 is composed of a circuit substrate 211 and a heat sink 212. The circuit substrate 21 1 may be mixed with a glass fiber. The FR-3, FR-4 epoxy resin or BT resin substrate, the polyimide film, and the ceramic substrate of the cloth reinforced fiber may be made of copper or other suitable metal. The wafer carrier 210 has a surface 2 13 and a crystal facing the surface 21 3

第10頁 1252568 五、發明說明(5) 穴2 1 4,其中該表面2 1 3係為該電路基板2 11可供表面接合 之表面,該晶八2 1 4係由該電路基板2 1 1之一通孔2 1 1 a與該 散熱片2 1 2構成,該表面2 1 3係另形成有複數個球墊2 1 5 (如 第4圖所示)’以供接合複數個鲜球2 7 0 ;此外,該晶片載 體2 1 0係可為一具有該晶穴2 1 4之電路基板(圖未繪出)。該 晶片2 2 0係設置於該晶穴2 1 4中,該晶片2 2 0係具有一主動 面2 2 1及一背面2 2 2並包含複數個位於該主動面2 2 1之銲塾 223,該些銲墊2 23係以該些電性導接元件230電性連接至 該電路基板2 1 1之該些球墊2 1 5,在本實施例中,該些電性 導接兀件2 3 0係為鲜線。 該成形蓋240係對應該晶穴2 14並設置於該晶片載體 210上,該成形蓋2 40與該晶穴214係構成一膠體填充空間 A。在本實施例中,該成形蓋24〇之尺寸係略大於該晶穴Page 10 1252568 V. Description of the Invention (5) Hole 2 1 4, wherein the surface 2 1 3 is a surface for the surface of the circuit substrate 2 11 to be bonded, and the crystal 8 1 4 is composed of the circuit substrate 2 1 1 One of the through holes 2 1 1 a is formed with the heat sink 2 1 2 , and the surface 2 1 3 is further formed with a plurality of ball pads 2 1 5 (as shown in FIG. 4 ) for engaging a plurality of fresh balls 2 7 In addition, the wafer carrier 210 can be a circuit substrate (not shown) having the crystal hole 2 14 . The wafer 220 is disposed in the crystal cavity 2 1 4 , the wafer 2 2 0 has an active surface 2 2 1 and a back surface 2 2 2 and includes a plurality of solder pads 223 located on the active surface 2 2 1 . The solder pads 2 23 are electrically connected to the ball pads 2 1 5 of the circuit substrate 2 1 1 , and in the embodiment, the electrical conductive devices 2 3 0 is a fresh line. The forming cover 240 is disposed on the wafer carrier 210 corresponding to the cavity 2, and the forming cover 420 and the cavity 214 form a colloid filling space A. In this embodiment, the size of the forming cover 24 is slightly larger than the hole.

2JL4之尺寸’在本實施例中該成形蓋24〇係以一黏膠25〇黏 著結合於該晶片載體21〇,該黏膠25〇係可具有熱固化性 經由一供烤過程可使該成形蓋24〇黏設固定於該晶片載體 2+10/較佳地,該成形蓋24〇係可為一金屬遮蓋,以增進$ 日日片22〇之導政熱與電性遮蔽(eiectrical shield)。i 點塗膠體260係形成於該膠體填充空間A内,用以密封該』2JL4 size 'In this embodiment, the forming cover 24 is adhesively bonded to the wafer carrier 21 by a glue 25, which can be thermally cured. The forming can be formed by a baking process. The cover 24 〇 is fixedly attached to the wafer carrier 2+10 / preferably, the forming cover 24 can be covered by a metal to enhance the heat conduction and electrical shielding of the Japanese wafer 22 . i point coating colloid 260 is formed in the gel filling space A for sealing the 』

?片4:Ϊ f些電性導接元件230。在本實施例中,該成形】 膠孔241,以供該點塗膠體260通過並填充 於該膠體填充空η Λ γ a u ^ 97n甘〆兄工間A。该晶片載體210係另包含複數個銲3 二合於該表面2U之該些球墊215上,並且該此 隹亍球270之向《係大於該成形蓋240之高度。 —? 4: Ϊ some electrical conductive elements 230. In the present embodiment, the shaped hole 241 is passed through the gel-coated body 260 and filled in the colloid-filled space η Λ γ a u ^ 97n Ganzi Brothers A. The wafer carrier 210 further includes a plurality of solders 3 on the ball pads 215 of the surface 2U, and the direction of the ball 270 is greater than the height of the forming cover 240. -

第11頁 1252568 五、發明說明(6)Page 11 1252568 V. Description of invention (6)

依據本發明之該晶穴朝下型封裝構造2 〇 〇,其係利用 遠成升> 蓋2 4 0設置於該晶片載體2 1 〇之該表面2 1 3,以供形 成该點塗膠體2 6 0時,控制該點塗膠體2 6 〇之厚度與形狀, 以避免因該點塗膠體260之厚度過高,導致該些銲球27〇無 法裝設於一PCB板上之情況發生,且該成形蓋24 〇亦可防止 該點塗膠體2 6 0溢膠污染該晶片載體2丨〇之該些球墊2丨5 ^According to the present invention, the crystal-hole-down type package structure 2 is provided on the surface 2 1 3 of the wafer carrier 2 1 利用 by using a far-reaching lid 420 for forming the dot-coating body. At 260 hours, the thickness and shape of the adhesive body 2 6 控制 are controlled to avoid the fact that the thickness of the glue 260 is too high, and the solder balls 27 〇 cannot be mounted on a PCB. And the forming cover 24 〇 can also prevent the point coating colloid 2 60 overflowing the ball carrier 2 丨 5 of the ball carrier 2 丨 5 ^

第4A至4B圖係為該晶六朝下型封裝構造2〇〇在封裝過 紅中之上視圖’請參閱第3圖及第4 a圖,首先,提供一晶 片載體2 1 0 ’該晶片載體2 1 〇係由一電路基板2工i與一散熱 片2 1 2所組成,該晶片載體2 1 〇係具有一表面2 J 3與一朝向 該表面213之晶穴214,之後,進行一黏晶步驟,其係設置 一晶片220於該晶穴214中。該晶片22〇係具有一主動面221 及一背面222,複數個銲墊223係形成於該主動面22ι,該 晶片2 2 0係以該背面2 2 2黏設於該散熱片21 2,接荖,形成 複數個電性導接元件230以電性連接該晶片22〇之該些銲墊 223至該電路基板2 11,再請參閱第3圖及第4β圖,對應於 該晶穴214 ’設置一成形蓋24〇於該晶片載體21〇之該表面 213,該成形蓋240與該晶穴214係構成一膠體填充空間a, 在本實施例中,該成形蓋24〇係具有一注膠孔241,以供該 點塗膠體2 6 0通過並填充於膠體填充空間a。 請參閱第4C圖及第5圖,最後,形成一點塗膠體26 0於 该膠體填充空間A内,該點塗膠體2 6 0係密封該晶片2 2 0與 4些電性導接元件2 3 〇,在本實施例中,該點塗膠體2 6 〇係 可利用一塗膠針頭280經由該成形蓋240之該注膠孔241注 |11 I S 1 1 i 1 11 1 1 I i 第12頁 1252568 五、發明說明(Ό 入該膠體填充空間A,藉由該成形蓋240限制該點塗膠體 260之厚度及形狀,並且防止該點塗膠體26〇溢膠污染該晶 片載體2 1 0、。在本實施例中,另包含有設置複數個銲球27〇 方、名曰曰^載體2 1 〇之该表面2 1 3,其中該些銲球2 7 〇之高度 ii、大 Λ成元盍2 4 〇之尚度(如第3圖所示),該些銲球2 7 〇 係設置於複數個球墊215上,以形成該晶穴朝下 造200。 在該晶穴朝下型封裝方法中,其係在形成該點塗膠體 2 6 0前,係先設置該成形蓋2 4 〇以防止該點塗膠體2 6 〇之厚 度異常及溢膠’且其他晶穴朝下型封裝構造,係亦可利7用 不同尺寸之成形蓋240來控制該點塗膠體26〇之厚度與形 狀。 本發明之保護範圍當視後附之申請專利範圍所界定者 為準,任何熟知此項技藝者,在不脫離本發明之精神和範 圍内所作之任何變化與修改,均屬於本發明之保護範圍。4A to 4B are top views of the hexagonal-down package structure 2 〇〇 in a packaged red. Please refer to FIGS. 3 and 4 a. First, a wafer carrier 2 1 0 'the wafer carrier is provided. 2 1 〇 is composed of a circuit substrate 2 and a heat sink 2 1 2, the wafer carrier 2 1 has a surface 2 J 3 and a cavity 214 facing the surface 213, and then a sticky A crystallization step is to place a wafer 220 in the crystal pocket 214. The wafer 22 has an active surface 221 and a back surface 222. The plurality of pads 223 are formed on the active surface 22i. The wafer 2200 is adhered to the heat sink 21 2 by the back surface 2 2 2 .荖, a plurality of electrical conductive elements 230 are formed to electrically connect the pads 223 of the wafer 22 to the circuit substrate 2, and then refer to FIG. 3 and FIG. 4β, corresponding to the crystal hole 214' A forming cover 24 is disposed on the surface 213 of the wafer carrier 21, and the forming cover 240 and the cavity 214 form a colloid filling space a. In the embodiment, the forming cover 24 has a glue injection. The hole 241 is passed through the colloid filling space a for the point coating colloid 210. Please refer to FIG. 4C and FIG. 5 . Finally, a layer of colloid 26 0 is formed in the colloid filling space A. The dot colloid 2 60 seals the wafer 2 2 0 and 4 electrical guiding elements 2 3 . That is, in the present embodiment, the point coating gel 26 can be injected through the glue hole 241 of the forming cover 240 by a glue needle 280. 11 IS 1 1 i 1 11 1 1 I i Page 12 1252568 V. DESCRIPTION OF THE INVENTION (Into the colloid filling space A, the thickness and shape of the point coating body 260 are restricted by the forming cover 240, and the point coating colloid 26 is prevented from overflowing the wafer carrier 210. In this embodiment, the surface 2 1 3 of the plurality of solder balls 27 and the carrier 2 1 〇 is further included, wherein the heights of the solder balls 27 ii, Λ成元元盍2 4 〇 尚 ( (as shown in Figure 3), the solder balls 27 7 are placed on a plurality of ball pads 215 to form the crystal hole facing down 200. In the crystal hole facing down package In the method, before forming the point coating colloid 2 60, the forming cover 24 4 is first set to prevent the thickness of the point coating colloid 2 6 异常 from being abnormal and overflowing and The crystal-cavity-down package structure can also be used to control the thickness and shape of the point coating body 26 by using differently shaped forming covers 240. The scope of protection of the present invention is defined by the scope of the appended patent application. It is intended that any changes and modifications may be made without departing from the spirit and scope of the invention.

1252568 圆式簡單說明 【圖式簡單說明 第 ] L 圖: 習知晶穴朝 下 塑 封 裝 構 造 之截 面示忍 圖; 第2A 至2C圖: 習知晶穴朝 下 封 裝 構 造在封 裝過程 中之 上 視圖 第 : 3 圖: 依據本發明 具 體 實 施 例 y 一— 晶穴朝 下型 封 裝構 造之戴面 示意圖; 第4A 至4C圖: 依據本發明 具 體 實 施 例 ,該 晶穴朝 下型 封 裝構 造在封裝 過程中之上 祝 圖 , 及 第 ! 5 圖: 依據本發明 具 體 實 施 例 ,該 晶穴朝 下型 封 裝構 造在形成 一點塗膠體 日寺 之 截 面 示 意 圖。 元件 符號簡單 說明: 100 晶穴朝下型封裝構造 110 晶片載體 111 表 面 112 晶穴 113 電路基板 114: 散 熱 片 115 球墊 120 晶片 130 銲線 140 攔 壩 150 點塗膠體 160 鲜球 200 晶穴朝下型封裝構造 210 晶片載體 211 電 路 基 板 211a 通孔 212 散熱片 213 表 面 214 晶穴 215 球墊 220 晶片 221 主 動 面 222 背面 223 銲墊1252568 Round simple description [Simple description of the figure] L Figure: Cross-section of the conventional cavity-down plastic package structure; Figure 2A to 2C: Conventional cavity-down package construction in the packaging process top view: 3 Figure: FIG. 4A to FIG. 4C is a schematic view of a face-down type package structure according to an embodiment of the present invention; FIG. 4A to FIG. 4C: the crystal hole-down type package structure is formed in a package process according to an embodiment of the present invention. Wishing the map, and the first! 5 Figure: In accordance with a specific embodiment of the present invention, the crystal-hole-down type seal is constructed to form a cross-sectional view of a little gel-coated Japanese temple. Brief description of the component symbol: 100 crystal hole facing type package structure 110 wafer carrier 111 surface 112 crystal hole 113 circuit substrate 114: heat sink 115 ball pad 120 wafer 130 bonding wire 140 dam 150 point coating colloid 160 fresh ball 200 crystal hole toward The lower package structure 210 wafer carrier 211 circuit substrate 211a through hole 212 heat sink 213 surface 214 crystal hole 215 ball pad 220 wafer 221 active surface 222 back 223 pad

第14頁 1252568 圖式簡單說明 230 電 性 導 接 元件 240 成 形 蓋 241 注膠孔 250 黏 膠 260 點塗膠 280 塗 膠 針 頭 A 膠 體 填 充 空間 2 7 0 焊球 ΦPage 14 1252568 Brief description of the diagram 230 Electrically conductive components 240 Formed cover 241 Injection hole 250 Adhesive 260 point glue 280 Adhesive needle A A gel Fill space 2 7 0 Solder ball Φ

第15頁Page 15

Claims (1)

1252568 ^ _案號 93136670 /月/尸日 條正 六、申請專利範圍 【申請專利範圍】 ~ 1、一種晶六朝下型封裝構造,包含: 一晶片載體,其係具有一表面以及一朝向該表面之晶 穴; 一晶片,其係設置於該晶穴中; 複數個電性導接元件,其係電性連接該晶片盥該晶片 載體; ^ 一成形蓋(shaping cover),其係對應於該晶穴而設 置於該晶片載體,該成形蓋與該晶穴係構成一膠空 間;及 乂 ' 一膠體,其係 其中該成形蓋 過。 2、 如申請專利範 其中該成形蓋之尺 3、 如申請專利範 其中該成形蓋係為 4、 如申請專利範 其中該成形蓋係以 5、 如申請專利範 其中用該膠體係具 6、 如申請專利範 另包含複數個銲球 7、 如申請專利範 形成於該膠體填充空間内; 係具有一注膠孔,以供該膠體點塗通 圍第1項所述 寸係略大於該 圍第1項所述 一金屬遮蓋。 圍第1項所述 一膠體黏著結 圍第4項所述 有熱固化性。 圍第1項所述 ,其係設於該 圍第6項所述 之晶穴朝下型 晶穴之尺寸。 之晶穴朝下型 之晶穴朝下型 合於該晶片載 之晶穴朝下型 之晶穴朝下型 晶片載體之該 之晶穴朝下型 封裝構造’ 封裝構造’ 封裝構造’ 體。 封裝構造’ 封裝構造’ 表面上。 封裝構造’1252568 ^ _ Case No. 93136670 / month / corpse Japanese version of the sixth, the scope of application for patents [Scope of Application] ~ 1, a crystal six-down package structure, comprising: a wafer carrier having a surface and a surface facing a wafer, which is disposed in the crystal cavity; a plurality of electrically conductive elements electrically connected to the wafer carrier; ^ a shaping cover corresponding to the crystal The hole is disposed on the wafer carrier, and the forming cover and the crystal cavity form a glue space; and a colloid, wherein the forming cover is over. 2. In the patent application, the rule of the forming cover is 3, as in the patent application, wherein the forming cover is 4, as in the patent application, wherein the forming cover is 5, as in the patent application, wherein the adhesive system is used. For example, the patent application method includes a plurality of solder balls 7 , such as a patent application form formed in the gel filling space; the system has a glue injection hole for the gel point to be coated, and the inch system is slightly larger than the circumference. A metal cover as described in item 1. According to the first item, the colloidal adhesion junction described in item 4 is thermally curable. As described in Item 1, it is provided in the size of the crystal-hole-down type crystal cavity described in Item 6 of the circumference. The crystal-cavity-down type of crystal-cavity is downwardly coupled to the crystal-cavity-down type package structure 'package structure' package structure' of the crystal-cavity-facing type downward-facing wafer carrier. The package construction 'package construction' is on the surface. Package construction 第16頁 1252568 ___案號 93136670 六、申請專利範圍 年月 日 條正Page 16 1252568 ___ Case No. 93136670 VI. Patent Application Scope Month Day 其中該些銲球之高度係大於該成形蓋之高度。 8、 如申請專利範圍第1項所述之晶穴朝下型封裝構造, 其中該晶片載體係包含一電路基板。 9、 如申請專利範圍第8項所述之晶穴朝下型封裝構造, 其中該電路基板係具有一通孔,該晶片載體係更包含有/ 散熱片,由該電路基板之通孔與該散熱片構成該晶穴。 1 〇、如申請專利範圍第1項所述之晶穴朝下型封裝構造, 其中該晶片載體係為一具有該晶穴之電路基板。 11、 如申請專利範圍第1項所述之晶穴朝下型封裝構造, 其中該膠體係密封該晶片與該些電性導接元件。 12、 一種晶穴朝下型封裝方法,包含: 提供一晶片載體,該晶片載體係具有一表面以及一朝 向該表面之晶穴; 設置一晶片於該晶穴中; 形成複數搞電性導接元件以電性連接該晶片與該晶片 載體; 、w曰 對應於該晶穴,設置一成形蓋於該晶片載體,該成形 蓋與該晶穴係構成一膠體填充空間,其中該成形蓋有 一注膠孔;及 …、 經由該注膠孔,點塗形成一膠體於該膠體填充空間 1 3、如申請專利範圍第1 2項所述之晶穴朝下型封裝方 法,其中該成形蓋之尺寸係略大於該晶穴之尺寸。 14、如申請專利範圍第1 2項所述之晶穴朝下型封裝方The height of the solder balls is greater than the height of the shaped cover. 8. The cavity-hole type package structure of claim 1, wherein the wafer carrier comprises a circuit substrate. 9. The crystal-cavity downward-facing package structure according to claim 8, wherein the circuit substrate has a through hole, and the wafer carrier further comprises/a heat sink, the through hole of the circuit substrate and the heat dissipation The sheet constitutes the crystal cavity. The crystal hole facing type package structure according to claim 1, wherein the wafer carrier is a circuit substrate having the crystal hole. 11. The cavity-hole type package structure of claim 1, wherein the glue system seals the wafer and the electrical conductive elements. 12. A method for packaging a crystal-cavity downward type, comprising: providing a wafer carrier having a surface and a crystal cavity facing the surface; providing a wafer in the crystal cavity; forming a plurality of electrical conduction contacts The component is electrically connected to the wafer and the wafer carrier; and w曰 corresponds to the crystal cavity, and a shaped cover is disposed on the wafer carrier, and the forming cover and the crystal cavity system form a gel filling space, wherein the forming cover has a note And a hole-forming type packaging method according to claim 12, wherein the size of the forming cover is formed by the injection molding to form a colloid in the colloid filling space 13 The system is slightly larger than the size of the crystal cavity. 14. The crystal-cavity-facing type package described in item 12 of the patent application scope. 1252568 _ 案號93136670_年月曰 佟毛__ 六、申請專利範圍 法,其中該成形蓋係為一金屬遮蓋。 1 5、如申請專利範圍第丨2項所述之晶穴朝下型封裝方 法,其中該成形蓋係以一黏膠黏著結合於該晶片載體。 1 6、如申請專利範圍第丨5項所述之晶穴朝下型封裝方 法,其中該黏膠係具有熱固化性。 1 7、如申請專利範圍第1 2項所述之晶穴朝下型封裝方 法’另包含有:設置複數個銲球於該晶片載體之該表面。 18、 如申請專利範圍第1 7項所述之晶穴朝下型封裝方 法’其中該些銲球之高度係大於該成形蓋之高度。 19、 如申請專利範圍第12項所述之晶穴朝下型封裝方 法其中该晶片載體係包含一電路基板。 =、如申請專利範圍第19項所述之晶穴朝下型封裝方 有一 ίI该電路基板係具有一通孔,該晶片載體係更包含 Θ "、、片,由該電路基板之通孔與該散熱片係構成該晶 21、 如申請專利範圍第12 法’其中該晶片載體係為 22、 如申請專利範圍第12 法’其中該膠體係密封該 項所述之晶穴朝下型封裝方 一具有該晶穴之電路基板。 項所述之晶穴朝下型封裝方 晶片與該些電性導接元件。1252568 _ Case No. 93136670_年月曰 佟毛__ Sixth, the patent application scope method, wherein the forming cover is covered by a metal. The cavitation-down type encapsulation method of claim 2, wherein the formed cover is bonded to the wafer carrier by an adhesive. The method of claim 5, wherein the adhesive is thermally curable. The crystal hole down-type packaging method as described in claim 12, further comprising: providing a plurality of solder balls on the surface of the wafer carrier. 18. The method according to claim 17, wherein the height of the solder balls is greater than the height of the shaped cover. 19. The cavity-hole type packaging method of claim 12, wherein the wafer carrier comprises a circuit substrate. The crystal hole facing package has a through hole, and the wafer carrier further comprises a Θ ", a sheet, and a through hole of the circuit substrate. The heat sink constituting the crystal 21, as in the 12th method of the patent application, wherein the wafer carrier is 22, as in the 12th method of the patent application, wherein the gel system seals the crystal cavity facing type package described in the item. A circuit substrate having the crystal cavity. The crystal-cavity-facing package wafer and the electrical conductive elements are described. 第18頁Page 18
TW093136670A 2004-11-29 2004-11-29 Device and method for cavity-down package TWI252568B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW093136670A TWI252568B (en) 2004-11-29 2004-11-29 Device and method for cavity-down package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093136670A TWI252568B (en) 2004-11-29 2004-11-29 Device and method for cavity-down package

Publications (2)

Publication Number Publication Date
TWI252568B true TWI252568B (en) 2006-04-01
TW200618218A TW200618218A (en) 2006-06-01

Family

ID=37565456

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093136670A TWI252568B (en) 2004-11-29 2004-11-29 Device and method for cavity-down package

Country Status (1)

Country Link
TW (1) TWI252568B (en)

Also Published As

Publication number Publication date
TW200618218A (en) 2006-06-01

Similar Documents

Publication Publication Date Title
TW201312669A (en) Chip package structure and method for manufacturing the same
TWI618205B (en) Chip on film package and heat dissipation method thereof
TWI359483B (en) Heat-dissipating semiconductor package and method
TW432558B (en) Dual-chip packaging process and method for forming the package
TWI244145B (en) Method for fabricating semiconductor package
TW200529386A (en) Semiconductor packaging element capable of avoiding electromagnetic interference and its manufacturing method
TW200939423A (en) Semiconductor package structure with heat sink
CN101091247A (en) Dual flat non-leaded semiconductor package
US10964627B2 (en) Integrated electronic device having a dissipative package, in particular dual side cooling package
TWI252568B (en) Device and method for cavity-down package
TW591727B (en) Method for producing a protection for chip edges and arrangement for the protection of chip edges
TWI242850B (en) Chip package structure
TWI220780B (en) Semiconductor package
TW200845354A (en) Multi-chip semiconductor device having leads and method for fabricating the same
TWI324029B (en) Circuit board structure having embedded semiconductor chip
TWI243463B (en) Chip on board package and method for manufacturing the same
TWI244171B (en) Semiconductor package and method for fabricating the same
TW518732B (en) A semiconductor packaging process for ball grid array (BGA)
TWI241003B (en) Method and device for cavity-down package
TWI237366B (en) Thermal-enhance package and manufacturing method thereof
TWI231590B (en) Window-type semiconductor package and fabrication method thereof
TW488046B (en) A process for packaging a window BGA to improve the efficiency of forming solder balls
TWI232562B (en) Window-type ball grid array semiconductor package
TW554505B (en) Semiconductor package
TWI240396B (en) Thermal enhanced chip package with wire bonding