TWI231586B - Chip module having high heat dissipation property and its substrate - Google Patents

Chip module having high heat dissipation property and its substrate Download PDF

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Publication number
TWI231586B
TWI231586B TW092127107A TW92127107A TWI231586B TW I231586 B TWI231586 B TW I231586B TW 092127107 A TW092127107 A TW 092127107A TW 92127107 A TW92127107 A TW 92127107A TW I231586 B TWI231586 B TW I231586B
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Taiwan
Prior art keywords
heat dissipation
scope
high heat
substrate
layer
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TW092127107A
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Chinese (zh)
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TW200512900A (en
Inventor
Ming-Hsing Liu
Ming-Hsiang Yang
Yuan-Fa Chu
Chih-Pen Chiu
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Neo Led Technology Co Ltd
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Priority to TW092127107A priority Critical patent/TWI231586B/en
Priority to US10/952,863 priority patent/US20050067690A1/en
Publication of TW200512900A publication Critical patent/TW200512900A/en
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Publication of TWI231586B publication Critical patent/TWI231586B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A kind of chip module having high heat dissipation property and its substrate are disclosed in the present invention. The invented chip module contains a substrate having high heat dissipation property; and plural chips are disposed on the substrate. For the substrate, an insulation layer is formed on the metal plate surface and is followed by disposing a copper circuit layer on the insulation layer, in which the copper circuit layer can be used to bond the chip. The material of the substrate is selected from an aluminum composite having high heat transfer coefficient to achieve the lightness and avoid thermal deformation. The insulation layer also is formed by the material with excellent heat transfer property and, particularly, is the metal oxide of which the heat transfer coefficient is higher than that of resin or fiber. Thus, the chip is capable of uniformly diffusing heat to the entire circuit board such that heat can be quickly dissipated in the air of the ambient.

Description

1231586 五、發明說明(1) 【發明所屬之技術領域】 別e m:、關於一種高散熱性之晶片模組及其基板,特 mi::使用,基複合材料來形成金屬複合 【先前技術】 隹化::^ t產品逐漸往高性能化、高頻化、高速化與輕 :::方::展’1「輕、薄、短、小、多功能」的設計 曰:::rt 相關主要零件如中央處理器_, :mi s等均朝向高速度、多功能、高功率、 體積小的方向研究與發展。因此,造雨 抑 菜繼續發展的關鍵。 v A j /生 積體電路(I c)晶片性能之所u At执& ^, 因為每平方英口寸可容納的電晶體:句持、、、貝提升,就是 晶體數的成長,消耗的功率也跟增力::致。隨著電 丁I跟者變大。過去幾车由, =器從32位元(bit)、66百萬赫兹(MHz)、耗電量3瓦的規处 才。,演進為64bit、30 0 MHz,而耗電量也成 夕。功率消耗直接產生熱量,若過彡& #胃> + 乜之 會縮短晶片的使用壽命。作苹二的熱!無法排除,便 2用壽命就縮短:半…,為維持晶片的使;::曰 必須採用各式的散熱方法來移除過多的熱量。 7 為了移除1C晶片的熱量,熱量需透過熱傳路 :片的熱量能傳送至外部空氣中。其中,電路板之金屬線 路之面積和散熱能力…主要仍需藉由佔整體比例:大1231586 V. Description of the invention (1) [Technical field to which the invention belongs] Don't em :, about a high heat dissipation chip module and its substrate, special mi :: use, matrix composite materials to form metal composite [previous technology] 隹:: ^ t products gradually go to high-performance, high-frequency, high-speed and light ::: Fang :: exhibition '1 "light, thin, short, small, multifunctional" design said ::: rt Related major Parts such as the central processing unit _,: mi s, etc. have been researched and developed in the direction of high speed, multifunction, high power, and small size. Therefore, the key to the continued development of rain suppression and vegetable development. v A j / Integrated circuit (I c) The performance of the chip u At & ^, because the transistor can be accommodated per square inch: sentence holding, ,, and shell improvement, is the growth of the number of crystals, consumption The power is also related to Zengli :: To. With Ding I followers get bigger. In the past, cars were handled by 32 bits, 66 million hertz (MHz), and 3 watts of power. , It has evolved to 64bit, 300 MHz, and power consumption is also important. Power consumption directly generates heat. If it is too large, the life of the chip will be shortened. Hot for Ping Er! Can not be ruled out, it will shorten the service life with two: half ..., in order to maintain the use of the chip; :: All kinds of heat dissipation methods must be used to remove excess heat. 7 In order to remove the heat of the 1C chip, the heat needs to pass through the heat transfer path: the heat of the chip can be transferred to the outside air. Among them, the area and heat dissipation capacity of the metal wiring of the circuit board ... mainly still needs to account for the overall proportion: large

I231586 五、發明說明(2) 之·複合基材,例如姑减 而一般的玻璃纖維布或軟 j权性基材來進行散熱。然 印刷電路板上的元:Si生導㈣^ 傳導方式散熱,無法將元:熱傳導介質。㉟而以空氣 而使得元件的效r p久根 斤累積的熱迅速有效的散失, 多層電路板更為嚴‘:’甚至減少元件的壽命,此情形在 【發明内容】I231586 V. Description of the invention (2). • Composite substrates, such as ordinary glass fiber cloth or soft substrates for heat dissipation. However, the element: Si raw conductor on the printed circuit board is conductive to dissipate heat, and the element: heat conductive medium cannot be dissipated. At the same time, the efficiency of the component is quickly dissipated by air, and the accumulated heat is quickly and effectively dissipated, and the multilayer circuit board is more stringent ‘:’ or even reduces the life of the component. This is described in [Inventive Content]

本發明之第—Η ίΛ /έ /XX 可有效將晶片產生= 種高散熱性之晶片模組, 表,廣大的面積生:熱= =表面,再藉由該 本的材-種降低晶片模組散熱成 散熱片等裝置用風扇散熱器、熱導管或 本發明之第三日的係在提供晶片模組一種可靠之散熱 $ % A擔^政熱I置發生故障而造成晶片模組或整個The first of the present invention—Η Λ / έ / XX can effectively generate wafers = high-heat-dissipation wafer modules. Table, a large area of heat: heat = = surface, and then reduce the wafer mold by the material-species The fan heat sink, heat pipe or the third day of the present invention is used to provide a reliable heat dissipation for the chip module. The heat dissipation of the chip module or the entire chip module or the whole

糸統的當機發生。 ,U 用古f發明之第四目的係在提供一種高散熱性之基板,利 回政熱性之鋁基複合材料形成金屬複合板材,直接在其 ^面形成絕緣層與電路層,藉由其輕量、高熱傳導性質以 ,熱膨脹係數的特質,可以直接將熱能量傳出,同時 免南溫環境下所產生的熱變形。 人本發明之第四目的係在提供一種基板之製造方法,利 用,屬複合板材直接在其表面形成絕緣層與電路層,相較 於夕層電路板有較簡易之製造步驟。為達成上述目的,本A traditional crash occurred. The fourth purpose of the ancient invention of U is to provide a substrate with high heat dissipation, and aluminum-based composite materials that can benefit from thermal management to form a metal composite plate, and directly form an insulating layer and a circuit layer on its surface. It has the characteristics of high thermal conductivity and high thermal conductivity. It can directly transfer thermal energy, and at the same time avoid the thermal deformation generated in the south temperature environment. A fourth object of the present invention is to provide a method for manufacturing a substrate, which is a composite board that directly forms an insulating layer and a circuit layer on its surface, and has simpler manufacturing steps than a circuit board. To achieve the above objectives, this

第8頁 !231586 五、發明說明(3) 發明揭示一 板’及一個 物係一金屬 層,該絕緣 分子材料之 上方設置電 接之用途。 佳之材料, 有效傳遞至 至空氣中。 種高散熱性 以上晶片设 複合板材 之晶片 置於該 並在金 層係為一種金屬化 膜層。經由 路層,讓電 由於金屬氧 所以能將設 整個基板, 高散熱 板之主 表面形 絕緣物 程,在 黏著及 皆為熱 產生之 之表面 表面活 路層係 化物及 置基板 使熱能 模組, 基板上 屬複合 合物所 化及電 作為電 金屬複 上之電 量藉由 包含一 。該基 板材之 形成之 鍍之製 子表面 合板材 子元件 更廣大 性之基 要構成 成絕緣 質或高 絕緣層 電氣連 傳導性 熱能量 積逸散 古由於鋁金屬複合材料所形成的金屬複合板材具有金屬 係:f I專:係I,以及其補強之填充物的高硬度、低膨脹 的^輕1化的特性,將其應用於構裝不僅可以達到良好 正體構奴重s,貫具有突破性的改良。 [實施方式】 圖。=1一圖為本發明之晶片模組之單層基板的結構示意 八:金屬複合板材23之上方覆蓋一層絕緣層22,絕緣 ^可=屬複合板材之金屬化合物即氧化膜層或氮化膜層, 板材2 一種絕緣的陶瓷材料或高分子材料沈積在金屬複合 作為雷之表面。利用絕緣膜22可取代習知之複合基材,即 茲取1路層21與金屬複合板材2 3之間的電絕緣體。例如, 基複八銘基複合材料做為金屬複合板材23之材料,並在鋁 材料表面形成一氧化鋁或氮化鋁之絕緣膜層。由表Page 8! 231586 V. Description of the invention (3) The invention discloses a board 'and a system and a metal layer, and the purpose of electrical connection is provided above the insulating molecular material. The best material is effectively transferred to the air. A kind of high heat-dissipating chip is set on the wafer, and the wafer is a metallized film layer on the gold layer. Via the circuit layer, electricity can be provided on the entire substrate due to metal oxygen. The main surface of the high heat dissipation plate is shaped as an insulating object. On the surface of the adhesive and heat-generating surface, the circuit layer compound and the substrate are used to make the thermal module. The amount of electricity formed on the substrate by the composite compound and electricity as an electric metal is included by one. The base plate is formed of a plated substrate surface and a broader element of the plate. The base is composed of an insulating or high insulating layer, electrically connected, and conductive heat energy accumulated and dissipated. The metal composite plate formed by the aluminum metal composite material. With metal system: f I Special: Department I, and its reinforcing filler has the characteristics of high hardness, low expansion and light weight. Applying it to the construction can not only achieve a good body weight s, it has always made breakthroughs. Sexual improvement. [Embodiment] FIG. = 1 The picture shows the structure of the single-layer substrate of the wafer module of the present invention. Eight: The metal composite plate 23 is covered with an insulating layer 22, and the insulation can be a metal compound of the composite plate, namely an oxide film layer or a nitride film. Layer, plate 2 An insulating ceramic material or polymer material is deposited on the surface of a metal compound as a thunder. The insulating film 22 can be used to replace the conventional composite substrate, that is, an electrical insulator between the first layer 21 and the metal composite plate 23 is obtained. For example, the base compound material is used as the material of the metal composite plate 23, and an aluminum oxide or aluminum nitride insulating film layer is formed on the surface of the aluminum material. By table

12315861231586

五、發明說明(4) 一可得知鋁之熱傳導係數是237W/M · κ、氧化鋁曰 4Μ/Μ .Κ及氮化銘是140至23〇w/M ·κ,而一搬來二 ::才料隨其填充物的改變具有不同的熱傳: 與鋁相近,甚或大於鋁。上述材料相較於心_4是…大致 〇. 2W/M,Κ而言,具有較優越的熱傳導性,同時疋也噔 二4^^熱的絕緣體。η面,無論是氧 ^呂或m呂亦呈很好的電絕緣體,可以防止電路声^之 子牙透至金屬複合板材23而造成短路。V. Explanation of the invention (4) One can know that the thermal conductivity of aluminum is 237W / M · κ, the alumina is 4M / M.K and the nitride inscription is 140 to 23〇w / M · κ. :: Talent has different heat transfer with its fillings: It is similar to aluminum, or even larger than aluminum. Compared with the core _4, the above materials are approximately 0.2 W / M. In terms of K, they have superior thermal conductivity, and at the same time, they are also 2 ^^ thermal insulators. The n-plane, whether it is oxygen or m-lu, also presents a good electrical insulator, which can prevent the teeth of the circuit sound from penetrating to the metal composite plate 23 and causing a short circuit.

表一 I 材料 熱傳導係數(W/M · Κ) 電阻值(Ω · 鋁 237 2.8x10-6 氧化鋁 46 >1〇ΐ4 氮化銘 140〜23 >1〇ΐ4 FR-4 0.2 >1〇!4 , 為避免金屬複合板材33外露而易造成碰觸系統中其他 電路而形成短路,所以需要於金屬複合板材33之底面^形 成:絕緣層34,如第2圖所示,係本發明之晶片模組之另/ 單層基板之結構示意圖。同樣地,基板3 〇有一絕緣声3 2 及電路層31是依序疊置在金屬複合板材33的上表面、”。θ 除了考慮表面黏著型元件適用之基板,本發明亦提供插孔 式元件使用的基板,如第3圖所示,係本發明之晶片模組 之通孔式雙層基板之結構示意圖。在通孔45之内33壁有吴垂、直Table 1 Material thermal conductivity (W / M · K) Resistance value (Ω · Al 237 2.8x10-6 Alumina 46 > 1〇ΐ4 Nitride 140 ~ 23 > 1〇ΐ4 FR-4 0.2 > 1 〇! 4, in order to prevent the metal composite sheet 33 from being exposed, which may cause short circuits due to contact with other circuits in the system, it is necessary to form an insulating layer 34 on the bottom surface of the metal composite sheet 33, as shown in FIG. 2, which is the present invention Schematic diagram of the structure of the wafer module / single-layer substrate. Similarly, the substrate 3 has an insulating sound 3 2 and the circuit layer 31 are sequentially stacked on the upper surface of the metal composite plate 33. "In addition to considering surface adhesion The substrate suitable for the type component, the present invention also provides a substrate for the socket type component, as shown in Figure 3, is a schematic diagram of the structure of the through-hole double-layer substrate of the wafer module of the present invention. Walls are vertical and straight

第10頁 1231586 五、發明說明(5) ------ 導線413使上下兩電路層411及412電性連通。在其柄4 稷合板^53之孔洞及上下表面皆形成保護之絕緣層42。 如第4圖所示為本發明之晶片模組之另一雙層基板之 結構示意圖。係另一種表面黏著型元件(SMD)適^ ^基板 50,亦是在金屬複合板材53上鑽孔,並在該通孔四周及上 I板材之表面形成保護之絕緣層52。在通孔的中間有垂直 導線513將上下兩電路層511及512之電性連通,此一形式 ,基板50可於其上下兩面均設置有電路圖案或焊接表面黏 者元件。 、#其中,熱傳路徑係由晶片内部產生之熱能量由電路層 傳導至基板,一小部分之熱能量則由晶片之上表面散射曰 ,,另一大部分則由上絕緣層傳導至下絕緣層而逸散至空 氣中而中間之金屬複合板材則將上絕緣層之熱能量迅速 傳導至下絕緣層。使熱能量能迅速地傳遞至整個基板的上 下表面’將散熱面積擴充到極致。 q上述之基板之製造方法可利用改良現有之印刷電路板 之製造方法,及結合半導體製程之優點加以完成。第5圖 係本發明之第一實施例製造流程圖。先選擇一熱傳導性佳 之金屬複合板材(步驟6 1 );在金屬複合板材表面上形成均 ^之纟巴緣層(步驟6 2 );形成絕緣層之方法很多,包含有熱 氧化^、氣相沈積或陽極處理等等。因絕緣層之表面不容 易附著其他物質,所以要先完成絕緣層表面活化(步驟 6 3 )’於絕緣層表面進行銅析鍍形成種子層(步驟6 4);再Page 10 1231586 V. Description of the invention (5) --- The wire 413 electrically connects the upper and lower circuit layers 411 and 412. Protective insulating layers 42 are formed in the holes and the upper and lower surfaces of the handle 4 plywood ^ 53. Fig. 4 is a schematic diagram showing the structure of another two-layer substrate of the wafer module of the present invention. It is another type of surface-adhesive element (SMD) -compatible substrate 50. It is also drilled in the metal composite plate 53, and a protective insulating layer 52 is formed around the through hole and on the surface of the upper plate. There is a vertical wire 513 in the middle of the through hole to electrically connect the upper and lower circuit layers 511 and 512. In this form, the substrate 50 may be provided with a circuit pattern or a soldering surface adhesive element on both the upper and lower sides. , # Among them, the heat transfer path is the thermal energy generated by the chip is transmitted from the circuit layer to the substrate, a small part of the thermal energy is scattered from the upper surface of the wafer, and the other part is transmitted from the upper insulating layer to the lower. The insulating layer escapes into the air and the middle metal composite plate quickly transmits the heat energy of the upper insulating layer to the lower insulating layer. The heat energy can be quickly transferred to the upper and lower surfaces of the entire substrate ', and the heat radiation area is expanded to the extreme. The above-mentioned manufacturing method of the substrate can be completed by improving the existing manufacturing method of the printed circuit board and combining the advantages of the semiconductor manufacturing process. Fig. 5 is a manufacturing flowchart of the first embodiment of the present invention. First select a metal composite sheet with good thermal conductivity (step 6 1); form a homogeneous slab edge layer on the surface of the metal composite sheet (step 6 2); there are many ways to form an insulating layer, including thermal oxidation ^, gas phase Deposition or anodizing, etc. Because the surface of the insulating layer is not easy to adhere to other substances, it is necessary to complete the activation of the surface of the insulating layer (step 6 3) ’to perform copper precipitation on the surface of the insulating layer to form a seed layer (step 6 4);

1231586 五、發明說明(6) 藉由種子層進行電鍍銅(步驟6 成Μ矣而合 均勾覆蓋-銅鑛層,再進:5上如此在絕緣層的= 圖型(步驟66),將電路以外二;^鍍層以形J :緣 層表面進行銅析鍵形成種子:二腐,掉。其:關= 銅析鑛的方法可使用化學^步驟64)之步驟中,其進灯 m pj 予銅析鍍法、物理銅析鍍法或可應 之熱塵合法,將銅箱以黏著劑並藉由 程條件與絕緣層完;而藉由 ;:f ;灯電鑛銅(步驟65)之步驟中,除了使用化學銅析 幵:成:;二形成銅鍍層外,亦可使用物理銅析鍍方法來 形成均勻的銅鍍層。 〜土〜Η 料,=是熱性質的銘基複合材 土-曰 々竿乂於其他的合屬戎合金,呈右 輕ϊ、耐磨耗、高比剛性及 ^ ' 的古埶值道总如i 強度的特性。再配合其獨特 的网熱傳導係數和低熱膨脹係數等性 2 熱傳導係數不僅能將電子亓#妬太貝,猎由其‘越的咼 去,還可以並r:f 所產生的熱有效的傳遞出 熱應力變形。鋁基複人姑粗勺八士⑴ 度升同所產生的 口材枓、妷纖維強化鋁基複合材料及 ^後 合材料等種類。 鑽石顆粒強化鋁基複 之第一亦二選:制其他的方法來形成電路層,第6圖係本發明1231586 V. Description of the invention (6) Electroplating copper by seed layer (step 6 becomes MW and combined cover-copper ore layer, and then enter: 5 on the insulation layer = pattern (step 66), then Outside the circuit; ^ The coating is formed in the shape of J: the surface of the edge layer is subjected to copper debonding to form a seed: two rots and drops. Its: off = the method of copper precipitation can use the step of chemical ^ step 64), which enters the lamp m pj Pre-copper plating method, physical copper plating method or applicable hot dust method, the copper box is finished with an adhesive, and the process conditions and the insulation layer are completed; and by: f; lamp electric copper (step 65) In this step, in addition to using chemical copper precipitation: to form a copper plating layer, a physical copper deposition method can also be used to form a uniform copper plating layer. ~ 土 ~ Η 料, = is the thermal base of Ming-based composite material soil-it is said to be a good combination of other alloys, showing a light weight, abrasion resistance, high specific rigidity and ^ '' Such as the intensity of i. Coupled with its unique network thermal conductivity and low thermal expansion coefficient, etc. 2 The thermal conductivity can not only remove the electron jealousy, but also the heat generated by r: f. Deformation due to thermal stress. Aluminium-based composites have a thick spoon of 8 liters, and are produced in the following materials: cast iron 妷, 妷 fiber-reinforced aluminum-based composite materials, and composite materials. Diamond particle reinforced aluminum-based composites. First and second choices: other methods to form circuit layers. Figure 6 shows the present invention.

ί。流程圖。先選擇-熱傳導性佳之金屬I 口 、,在孟屬複合板材上鑽孔(步驟7 1 )·為八屬、-人 板材表面上形成均勻之絕緣層( 点複a 法很多,包令右抽& , 广 ^丨㈠,形成絕緣層之方 有t虱化法、軋相沈積或陽極 第12頁 1231586 五、發明説明(7) 絕緣層之表面不容易附著其他物質,所以要先完成絕緣層 表面活化(步驟73);上抗電鍍阻劑在絕緣層之表面(步驟 74),於不需要電路的部分彼覆抗電鍍之材料;再於絕緣 層表面進打銅析鍍以形成一電路圖型(步驟75),在絕緣層 的表面沒有抗電鍍阻劑之處才會產生化學銅析鍍反應;於 電路圖型表面電鍍銅,以形成均勻的電路層(步驟76)。其 中關於、、巴、彖層表面進行銅析鑛以形成—電路圖型(步驟7 5) 之步驟::其進行銅析鍍的方法可使用化學銅析鍍法、物 理銅析Μ法或熱壓合法來加以達《;而⑨電路圖型表 鍍銅,1成均句的電路層(步驟76)之步驟中,除以 法來進仃外,亦可使用化學銅析鍍法或物理銅析鍍法加:ί. flow chart. First select-metal I port with good thermal conductivity, and drill holes in the Meng composite sheet (step 7 1) · for eight genus,-forming a uniform insulation layer on the surface of the sheet (there are a lot of methods of point a, including the right extraction &, Guang ^ 丨 ㈠, the method of forming the insulation layer is tick method, rolling phase deposition or anode Page 12 1231586 V. Description of the invention (7) The surface of the insulation layer is not easy to attach other substances, so the insulation must be completed first The surface of the layer is activated (step 73); an anti-plating resist is placed on the surface of the insulating layer (step 74), and the anti-electroplating material is coated on the part of the circuit that does not require the circuit; (Step 75), the chemical copper precipitation reaction will only occur where there is no anti-plating resist on the surface of the insulating layer; copper is electroplated on the circuit pattern type surface to form a uniform circuit layer (step 76). The surface of the sacrificial layer is subjected to copper ore ore formation to form a circuit pattern (steps 7 to 5). The method of copper leaching can be chemical copper leaching, physical copper crystallization or hot pressing. ; And circuit diagram type copper plated, 1 Sentences are circuit layer step (step 76) of, the method for dividing into the Ding, the analysis may use an electroless copper plating method, or a physical copper plating plus analysis:

達成。 A 姑J者喑ΐ緣層可以藉由熱氧化法、氣相沉積法、化學 所形成。氣相陽極處理法其中之- 人-層增黏層Ξΐίίϊ於絕緣層的附著性差,因此可加 請參考第7圖升電:/與絕緣層之間的附著力。 先選擇-熱傳導“土 *發明之第三實施例製造流程圖。 合板材表面1:1:;金屬複合板材(步驟81);在金屬複 方法很多,包絕緣層(步驟82);形成絕緣層之 因絕緣層之ί 有熱氧化法、氣相沈積或陽極處理等等。 成-增“ 易附著其他物質,所以先於絕緣層形 層(步驟84) , 於增黏層表面析鍍銅以形成鋼鍍 使其均勻覆蓋於絕緣層的表面;再進一步餘Reached. The marginal layer can be formed by thermal oxidation, vapor deposition, or chemistry. Among the gas phase anodizing methods, the human-layer tackifier layer has poor adhesion to the insulating layer, so it can be added. Please refer to Figure 7 for the adhesion between the power-up and the insulating layer. First select-the third embodiment of the invention of the "heat conduction" soil manufacturing flow chart. The surface of the composite board is 1: 1 :; the metal composite board (step 81); there are many methods of metal clad, the insulating layer is covered (step 82); the insulating layer is formed The reason for the insulation layer is thermal oxidation, vapor deposition, or anodizing, etc. It is easy to adhere to other substances. Therefore, before the insulating layer (step 84), copper is deposited on the surface of the adhesion layer to Form steel plating to evenly cover the surface of the insulation layer;

第13頁 1231586 五、發明說明(8) - 刻銅鐘u-電路的圖型(步驟85),將電路以外的部 分腐蝕掉。其中,於增黏層表面析鍍銅以形成鋼鍍声 驟8 4)之步驟,其進行析鍍銅的方法可使用仆又曰 或物理銅析鑛法。 使用化學銅析鑛法 增黏層可選用欽(Π)、氮化欽(TiN)、氮化鎮 氮化鈦鎢(TiWN)、鎳(Ni)、鋅(Zn)、氮化鋅(ZnN)、終 (Cr)、氮化鉻(CrN)、鈕(Ta)及氮化鈕(TaN)望 _ L ° 具有高溫熱穩定性及良好的導電性。或、,适坠材料 (A丨錫㈤、鎳⑴)等元素或其化含有銘 雖然本發明之較佳實施例揭 之㈢黏層。 以限定本發明,任何熟習相關技蓺:戶:述 '然其並非用 精神和範圍内,當可作些許之 A有’在不脫離本發明之 專利保護範圍須視本說明書所,,潤飾,因此本發明之 為準。 、申凊專利範圍所界定者Page 13 1231586 V. Description of the invention (8)-Engraving the copper bell u-circuit pattern (step 85), etch away the parts other than the circuit. Among them, in the step of copper plating on the surface of the thickened layer to form a steel plating step 8), the copper plating can be performed by physical method or physical copper precipitation method. The chemical copper ore precipitation method can be used to thicken the layer (Ch), Ti (N), TiWN, Ni (Ni), Zn (Zn), ZnN , Final (Cr), chromium nitride (CrN), button (Ta) and nitride button (TaN) Hope _ L ° Has high temperature thermal stability and good electrical conductivity. Or, elements such as suitable materials (Al, tin, nickel, etc.) or their compounds contain inscriptions. Although a preferred embodiment of the present invention discloses a gluing layer. In order to limit the present invention, any person familiar with the relevant technology: households: "But it is not within the spirit and scope, when it can be done a little" There is no need to depart from the scope of patent protection of the present invention. Therefore, the present invention prevails. As defined by the scope of patent application

1231586 圖式簡單說明 第1圖係本發明之晶片模組之單層基板之結構示意 圖, 第2圖係本發明之晶片模組之另一單層基板之結構示 意圖, 第3圖係本發明之晶片模組之通孔式雙層基板之結構 不意圖, 第4圖係本發明之晶片模組之另一雙層基板之結構示 意圖; 第5圖係本發明之第一實施例製造流程圖; 第6圖係本發明之第二實施例製造流程圖;及 第7圖係本發明之第三實施例製造流程圖。 【圖式符號說明】 10 晶片 20 基板 21 電路層 22 絕緣層 23 金屬複合板材 30 基板 31 電路層 32 絕緣層 33 金屬複合板材 34 絕緣層 40 基板 411 電路層1231586 Brief description of the drawings. Figure 1 is a schematic diagram of the structure of a single-layer substrate of the wafer module of the present invention, Figure 2 is a schematic diagram of the structure of another single-layer substrate of the wafer module of the present invention, and Figure 3 is a schematic diagram of the single-layer substrate of the wafer module of the present invention. The structure of the through-hole double-layer substrate of the wafer module is not intended, and FIG. 4 is a schematic diagram of the structure of another double-layer substrate of the wafer module of the present invention; FIG. 5 is a manufacturing flowchart of the first embodiment of the present invention; FIG. 6 is a manufacturing flowchart of the second embodiment of the present invention; and FIG. 7 is a manufacturing flowchart of the third embodiment of the present invention. [Illustration of Symbols] 10 wafers 20 substrates 21 circuit layers 22 insulation layers 23 metal composite plates 30 substrates 31 circuit layers 32 insulation layers 33 metal composite plates 34 insulation layers 40 substrates 411 circuit layers

第15頁 1231586Page 15 1231586

II I iII I i

圖式簡單說明 412 電路層 413 垂直導線 42 絕緣層 43 金屬複合板材 45 通孑L 50 基板 511 電路層 512 電路層 513 垂直導線 52 絕緣層 53 金屬複合板材 步驟61 選擇一熱傳導性佳之金屬複合板材 步驟6 2 在金屬複合板材表面上形成均勻之絕緣層 步驟63 完成絕緣層表面活化 步驟6 4 於絕緣層表面進行銅析鍍形成種子層 步驟6 5 藉由種子層進行電鍍銅 步驟6 6 蝕刻銅鍍層以形成一電路的圖型 步驟7 1 選擇一熱傳導性佳之金屬複合板材,並在金 屬複合板材上鑽孔 步驟72 在金屬複合板材表面上形成均勻之絕緣層 步驟7 3 完成絕緣層表面活化 步驟7 4 上抗電鍍阻劑在絕緣層之表面 步驟7 5 於絕緣層表面進行銅析鍍以形成一電路圖型 步驟7 6 於電路圖型表面電鍍銅,以形成均勻的電路 第16頁 1231586 圖式簡單說明 層 步驟8 1 選擇一熱傳導性佳之金屬複合板材 步驟82 在金屬複合板材表面上形成均勻之絕緣層 步驟83 於絕緣層形成一增黏層 步驟8 4 於增黏層表面析鍍銅以形成銅鍍層 步驟85 再進一步蝕刻銅鍍層以形成一電路的圖型Schematic description 412 Circuit layer 413 Vertical wire 42 Insulation layer 43 Metal composite plate 45 Through L 50 Substrate 511 Circuit layer 512 Circuit layer 513 Vertical wire 52 Insulation layer 53 Metal composite plate Step 61 Select a metal composite plate with good thermal conductivity 6 2 Form a uniform insulating layer on the surface of the metal composite sheet. Step 63 Complete the activation of the surface of the insulating layer. 6 4 Perform copper deposition on the surface of the insulating layer to form a seed layer. 6 5 Perform copper plating through the seed layer. 6 6 Etch the copper plating layer. To form a circuit pattern Step 7 1 Select a metal composite plate with good thermal conductivity and drill holes in the metal composite plate Step 72 Form a uniform insulating layer on the surface of the metal composite plate Step 7 3 Complete the surface activation of the insulating layer Step 7 4 Add anti-plating resist on the surface of the insulating layer. Step 7 5 Perform copper plating on the surface of the insulating layer to form a circuit pattern. Step 7 6 Plating copper on the surface of the circuit pattern to form a uniform circuit. Page 16 1231586 Step 8 1 Select a metal composite sheet with good thermal conductivity Step 82: Form a uniform insulating layer on the surface of the metal composite sheet. Step 83: Form a thickening layer on the insulating layer. Step 8: Deposition copper on the surface of the thickening layer to form a copper layer. Step 85: Etch the copper plating layer further to form a circuit. Pattern

第17頁Page 17

Claims (1)

12315861231586 六、申請專利範圍 1. 一種高散熱性之晶片模組,包含高散熱性 甘1 ” 、~ 才反及 於該基板上之一個以上的晶片,其特徵在 该基板包 含. 一金屬複合板材,係為一鋁基複合材料所形成· 一絕緣層,係在該金屬複合板材表面包覆二層絕緣 一電路層,係設於該絕緣層之表面。 2 ·如申請專利範圍第1項所述之高散熱性之晶片模組,其 中該絕緣層與該電路層之間具有一增黏層,使該電路層 藉由該增黏層彼覆於絕緣層上。 3 ·如申清專利範圍第2項所述之问政熱性之晶片模組,其 中該增%層係為鈦(Ti)、氮化鈦(TiN)、氮化鎢(WN)、 氮化鈦鎢(TiWN)、鎳(Ni)、鋅(Zn)、氮化鋅(ΖηΝ)、鉻 (Cr)、氮化鉻(CrN)、钽(Ta)及氣化組(TaN)的其中之一 所形成。 4 ·如申請專利範圍第2項所述之高散熱性之晶片模組,其 中該增黏層係含有鋁(A 1 )、錫(S n)、鎳(N 1)及其化合物 的其中之一。 斤 5. 如申請專利範圍第1、2、3頊或第4項所述之高散熱性之 晶片模組,其中該電路層係藉由電鍍法、化學銅析鍍 法、物理銅析鍍法及熱壓合法其中之一所形成。 6. 如申請專利範圍第1、2、3項或第4項所述之高散熱性之 晶片模組,#中該銘基複合材料係為石炭化石夕顆粒強化#呂 基複合材料、碳纖維強化鋁基複合材料及鑽石顆粒強化Six, the scope of the patent application 1. A highly heat-dissipative chip module, which contains high heat-dissipation chips 1 ", ~ is reflected in more than one wafer on the substrate, which is characterized in that the substrate contains a metal composite sheet, It is formed by an aluminum-based composite material. An insulation layer is formed by covering two layers of insulation and a circuit layer on the surface of the metal composite sheet. The insulation layer is provided on the surface of the insulation layer. High-heat-dissipation chip module, in which there is a tackifier layer between the insulation layer and the circuit layer, so that the circuit layer is covered on the insulation layer by the tackifier layer. The thermal wafer module described in 2 items, wherein the percentage increasing layer is titanium (Ti), titanium nitride (TiN), tungsten nitride (WN), titanium tungsten nitride (TiWN), nickel (Ni ), Zinc (Zn), zinc nitride (ZηN), chromium (Cr), chromium nitride (CrN), tantalum (Ta), and one of the gasification groups (TaN). 4 · As for the scope of patent application The high heat dissipation chip module according to item 2, wherein the adhesion-promoting layer contains aluminum (A 1), tin (S n), and nickel (N 1) and one of its compounds. 5. The wafer module with high heat dissipation as described in the scope of patent applications 1, 2, 3, or 4, wherein the circuit layer is formed by electroplating, chemical It is formed by one of the copper plating method, the physical copper plating method and the hot pressing method. 6. The high heat dissipation chip module as described in the scope of patent application No. 1, 2, 3 or 4. The Ming-based composite material is reinforced with carbonaceous stone and granite #Lu Ji composite material, carbon fiber reinforced aluminum-based composite material and diamond particle reinforcement 1231586 六、申請專利範圍 鋁基複合材料其中之一。 7. 如申請專利範圍第I、2、3項或第4項所述之高散熱性之 晶片模組,其中該絕緣層係該金屬複合板材之化合物。 8. 如申請專利範圍第1、2、3項或第4項所述之高散熱性之 晶片模組,其中該絕緣層係為一氧化物。 9. 如申請專利範圍第1、2、3項或第4項所述之高散熱性之 晶片模組,其中該絕緣層係為一氮化物。 1 0.如申請專利範圍第1、2、3項或第4項所述之高散熱性 之晶片模組,其中該絕緣層係一陶瓷材料。 1 1.如申請專利範圍第1、2、3項或第4項所述之高散熱性 之晶片模組,其中該絕緣層係一高分子材料。 1 2.如申請專利範圍第1、2、3項或第4項所述之高散熱性 之晶片模組,其中該絕緣層係藉由熱氧化法、氣相沉 積法、化學彼覆法、喷塗法、塗佈法、浸泡法及陽極 處理法其中之一所形成。 1 3.如申請專利範圍第1 2項所述之高散熱性之晶片模組, 其中該氣相沉積法係為物理氣相沉積法。 1 4.如申請專利範圍第1 2項所述之高散熱性之晶片模組, 其中該氣相沉積法係為化學氣相沉積法。 1 5.如申請專利範圍第1、2、3項或第4項所述之高散熱性 之晶片模組,其中該晶片係為電子元件。 1 6.如申請專利範圍第1 5項所述之高散熱性之晶片模組, 其中該電子元件係為表面黏著型元件。 1 7.如申請專利範圍第1、2、3項或第4項所述之高散熱性1231586 6. Scope of patent application One of aluminum-based composite materials. 7. The high-heat-dissipating wafer module as described in the scope of application for patents I, 2, 3 or 4, wherein the insulating layer is a compound of the metal composite sheet. 8. The high-heat-dissipating chip module as described in the claims 1, 2, 3 or 4, wherein the insulating layer is an oxide. 9. The wafer module with high heat dissipation as described in claims 1, 2, 3, or 4, wherein the insulating layer is a nitride. 10. The wafer module with high heat dissipation as described in claims 1, 2, 3 or 4 in the scope of the patent application, wherein the insulating layer is a ceramic material. 1 1. The wafer module with high heat dissipation as described in claims 1, 2, 3 or 4 in the scope of patent application, wherein the insulating layer is a polymer material. 1 2. The wafer module with high heat dissipation as described in claims 1, 2, 3, or 4, wherein the insulating layer is formed by a thermal oxidation method, a vapor deposition method, a chemical coating method, It is formed by one of a spray method, a coating method, a dipping method, and an anodizing method. 1 3. The wafer module with high heat dissipation as described in item 12 of the scope of patent application, wherein the vapor deposition method is a physical vapor deposition method. 1 4. The wafer module with high heat dissipation as described in item 12 of the scope of patent application, wherein the vapor deposition method is a chemical vapor deposition method. 1 5. The chip module with high heat dissipation as described in claims 1, 2, 3 or 4 in the scope of patent application, wherein the wafer is an electronic component. 16. The chip module with high heat dissipation as described in item 15 of the scope of patent application, wherein the electronic component is a surface-adhesive component. 1 7. High heat dissipation as described in the scope of patent applications 1, 2, 3 or 4 第19頁 1231586 六、申請專利範圍 之晶片模組,其中該基板之金屬複合板材更包含複數 個通孔,該通孔之内壁被該絕緣層覆蓋,另有^ ^個 垂直導線設於該通孔之絕緣層表面。 1 8·如申請專利範圍第丨7項所述之高散熱性之晶片模組, 其中該晶片係具有複數個針腳,複數個通孔可供該晶 片之針腳插入,並藉由該複數個垂直導線而電氣^妾 至该電路層。 ' 1 9 · 一種高散熱性之基板,包含: 一金屬複合板材,係為一銘基複合材料所形成; 一絕緣層,係在該金屬複合板材表面包覆一層絕緣 物質;及 一電路層,設於該絕緣層之表面。 2 0.如申請專利範圍第丨9項所述之高散熱性之基板,其中 該絕緣層與該電路層之間具有一增黏層,使該電路層 藉由該增黏層披覆於絕緣層上。 (Cr)、 所形成 2 1 ·如申請專利範圍第2 〇項所述之高散熱性之基板,其中 該增黏層係為鈦(Ti)、氮化鈦(TiN)、氮化鎢(WN)、氮 化鈦鎢(TiWN)、鎳(Ni)、鋅(Zn)、氮化鋅(ZnN)、鉻 、氮化鉻(CrN)、姐(了a)及氮化组(TaN)其中之^ 2 2 ·如申請專利範圍第2 〇項所述之高散熱性之基板,其中 該增黏層係含有鋁(A 1)、錫(Sn )、鎳(N丨)及其化合物 其中之一。 2 3.如申請專利範圍第19、2〇、21或第22項所述之高散熱Page 19, 1231586 6. The patent application scope of the wafer module, wherein the metal composite plate of the substrate further includes a plurality of through holes, the inner wall of the through hole is covered by the insulating layer, and ^ ^ vertical wires are provided in the through Surface of the insulating layer of the hole. 18. The high heat dissipation chip module as described in item 7 of the patent application scope, wherein the chip has a plurality of pins, a plurality of through holes can be inserted by the pins of the chip, and the plurality of vertical holes The wires are electrically connected to the circuit layer. '1 9 · A highly heat-dissipating substrate, comprising: a metal composite plate formed of a Ming-based composite material; an insulating layer coated with an insulating substance on the surface of the metal composite plate; and a circuit layer, It is provided on the surface of the insulating layer. 2 0. The substrate with high heat dissipation properties as described in item 9 of the scope of the patent application, wherein the insulating layer and the circuit layer have a tackifier layer, so that the circuit layer is coated on the insulation through the tackifier layer. On the floor. (Cr), formed 2 1 · The substrate with high heat dissipation as described in item 20 of the patent application scope, wherein the thickening layer is titanium (Ti), titanium nitride (TiN), tungsten nitride (WN ), Titanium tungsten nitride (TiWN), nickel (Ni), zinc (Zn), zinc nitride (ZnN), chromium, chromium nitride (CrN), sister (a) and nitride group (TaN) ^ 2 2 · The substrate with high heat dissipation properties as described in item 20 of the scope of patent application, wherein the thickening layer contains one of aluminum (A 1), tin (Sn), nickel (N 丨), and a compound thereof . 2 3. High heat dissipation as described in the scope of patent application No. 19, 20, 21 or 22 酬 第2〇頁 1231586 六、申請專利範圍 性基板,其中該電路層係藉由電鍍法、化學銅析鍍 法、物理銅析鍍法及熱壓合法其中之一所形成。 24·如申請專利範圍第1 9、20、21或第22項所述之高散熱 性之基板,其中該基板之絕緣層係一陶瓷材料。 25·如申请專利範圍弟19、20、21或第22項所述之兩散熱 性之基板,其中該鋁基複合材料係為碳化矽顆粒強化 紹基複合材料、碳纖維強化鋁基複合材料及鑽石顆粒 強化鋁基複合材料其中之一。 26·如申請專利範圍第19、20、21或第22項所述之高散熱 性之基板’其中該絕緣層係該金屬複合板材之化合 物。 2 7 ·如申請專利範圍第1 9、2 0、2 1或第2 2項所述之高散熱 性之基板,其中該絕緣層係為一氧化物。 28.如申請專利範圍第19、20、21或第22項所述之高散熱 性之基板,其中該絕緣層係為一氮化物。 2 9 ·如申請專利範圍第1 9、2 〇、2 1或第2 2項所述之高散熱 性之基板,其中該絕緣層係一高分子材料。 3 0 ·如申請專利範圍第丨9、2 〇、2 1或第2 2項所述之高散熱 性之基板,其中該絕緣層係藉由熱氧化法、氣相沉積 法、化學披覆法、噴塗法、塗佈法、浸泡法及陽極處 理法其中之一所形成。 3 1 ·如申请專利範圍第3 〇項所述之高散熱性之基板’其中 該氣相沉積法係為物理氣相沉積法。 3 2 .如申清專利範圍第3 〇項所述之尚散熱性之基板其中Page 20 1231586 6. The scope of the patent application substrate, in which the circuit layer is formed by one of the electroplating method, chemical copper deposition method, physical copper deposition method and hot pressing method. 24. The substrate with high heat dissipation as described in claim 19, 20, 21 or 22, wherein the insulating layer of the substrate is a ceramic material. 25. The two heat-dissipative substrates described in item 19, 20, 21 or 22. Particle reinforced aluminum-based composites. 26. The substrate having high heat dissipation properties according to item 19, 20, 21 or 22 of the scope of the patent application, wherein the insulating layer is a compound of the metal composite plate. 2 7 · The substrate with high heat dissipation as described in the scope of patent application No. 19, 20, 21 or 22, wherein the insulating layer is an oxide. 28. The substrate with high heat dissipation properties as described in the scope of claims 19, 20, 21, or 22, wherein the insulating layer is a nitride. 2 9 · The substrate with high heat dissipation as described in the scope of application for patent No. 19, 20, 21 or 22, wherein the insulating layer is a polymer material. 3 0 · The substrate with high heat dissipation as described in the scope of patent application No. 丨 9, 20, 21, or 22, wherein the insulating layer is formed by a thermal oxidation method, a vapor deposition method, or a chemical coating method. , Spray method, coating method, dipping method and anodizing method. 3 1 · The substrate with high heat dissipation as described in item 30 of the scope of patent application, wherein the vapor deposition method is a physical vapor deposition method. 3 2. The heat-dissipating substrate as described in item 30 of the patent application 1231586 六、申請專利範圍 該氣相沉積法係為化學氣相沉積法。 33.如申請專利範圍第19、20、21或第22項所述之高散熱 性之基板,其中該金屬複合板材更包含複數個通孔, 該通孔之内壁被該絕緣層覆蓋,另有複數個垂直導線 設於該通孔之絕緣層表面。1231586 6. Scope of patent application The vapor deposition method is chemical vapor deposition. 33. The substrate with high heat dissipation as described in the scope of application for patent No. 19, 20, 21 or 22, wherein the metal composite plate further includes a plurality of through holes, and the inner wall of the through holes is covered by the insulating layer, and A plurality of vertical wires are provided on the surface of the insulating layer of the through hole. 第22頁Page 22
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