TWI231013B - Multilayer laminating structure of IC packing substrate and method for fabricating the same - Google Patents
Multilayer laminating structure of IC packing substrate and method for fabricating the same Download PDFInfo
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1231013 五、發明說明(1) 【發明所屬之技術領域】·· 本發明係關於一種I C封裝基板多層疊合結構及其製作 ’尤指一種適於提供高積集度(Integration)半導 體晶片承載以及封裝之IC封裝基板多層疊合結構及其製作 方法。 【先前技術】:1231013 V. Description of the invention (1) [Technical field to which the invention belongs] ... The present invention relates to a multi-layered structure of an IC package substrate and its fabrication 'especially a semiconductor wafer carrier suitable for providing high integration (Integration) and Multi-layer structure of packaged IC package substrate and manufacturing method thereof. [Prior art]:
^著電子產業的蓬勃發展,電子產品亦逐漸邁入多功 能、高性能的研發方向。為滿足半導體封裝件高積集度 上 Integration)以及微型化(Miniaturizati〇n)的封裝 需求,提供多數主被動元件及線路載接之印刷電路板 (Printed Circuit Board)亦逐漸由雙層板演變成多層 板(Multi-layer Board),俾於有限的空間^,藉由層 間連接技術(Interlayer Connection)擴大電路板上可 利用的電路面積而配合高電子密度之積體電路 (Integrated Circuit)需求。傳統多層電路板之製造方 法,一般是藉由壓合法(Laminating Press)及增層法 (Build-up)兩種方式。^ With the vigorous development of the electronics industry, electronic products have gradually entered the direction of multi-function and high-performance research and development. In order to meet the packaging requirements for integration and miniaturization of semiconductor packages, the printed circuit board (Printed Circuit Board) that provides most active and passive components and circuit loading has gradually evolved from a double-layer board. Multi-layer board (Multi-layer Board), confined to a limited space ^, through the use of interlayer connection technology (Interlayer Connection) to expand the available circuit area on the circuit board to meet the needs of integrated circuits with high electronic density (Integrated Circuit). Traditional multi-layer circuit board manufacturing methods generally use two methods: laminating press and build-up.
如第4A至4C圖所示,預備一如銅箱與絕緣基材所製成 之複數個電路板4 1,4 2,4 3,電路板4 1係形成有上下電路層 4 1 a,4 1 b以及導電通孔4 1 c,而電路板4 2,4 3亦分別於一側 形成有電路層42a,43a,其相對於電路層42a,43 a之另一側 則分別形成有導電金屬層42d,43d,於該電路板41,42, 43 間夾設一由纖維或熱固性樹脂等(如環氧樹脂、酚聚酯等 )製成之預浸材44( Prepreg)作為黏著層(AdhesiveAs shown in Figures 4A to 4C, prepare a plurality of circuit boards 4 1, 4, 2, 4 3, such as a copper box and an insulating substrate. The circuit board 4 1 is formed with upper and lower circuit layers 4 1 a, 4 1 b and conductive vias 4 1 c, and circuit boards 4 2, 4 3 are also formed with circuit layers 42a, 43a on one side, and conductive metals are formed on the other side of the circuit layers 42a, 43a Layers 42d, 43d. A prepreg 44 (Prepreg) made of fiber or thermosetting resin (such as epoxy resin, phenol polyester, etc.) is sandwiched between the circuit boards 41, 42, 43 as an adhesive layer.
17047. ptd 第6頁 1231013 五、發明說明(2)17047. ptd Page 6 1231013 V. Description of the invention (2)
Layer),經過疊層(Laminating)及熱壓(Heat Press )步驟將交相疊置之電路板41,4 2, 43壓合成一多層接合板 以後;再運用鑽孔技術(D r i 1 1 i ng)鑽設複數個貫穿通孔 4 5 ’該貫穿通孔4 5孔壁表面上鑛覆一導電金屬層,並於最 外層之導電金屬層4 2d,4 3d上進行線路圖案化 (Patterning)製作電路層 42b,43b,各電路板 41,42, 43 之間即可藉通孔4 5電性連接,而製得一具有六層電路層之 多層電路板4 0。然以壓合法製造多層電路板,在層數及孔 數的製造上具有明顯限制,故難適用於具高密度電性連接 端(I/0 Connect i ons)之封裝產品,而無法作為多晶片 模組(Multiple Chip Module, MCM)或晶片規袼封裳 (Chip Scale Package, CSP)等半導體封裝件之基板來 源。 有鑑於此,業者於是提出以增層方式(Bui Id〜Up)製 作多層板的方法。以增層法製造多層板一般包含兩個階 段,即内層基板製程以及電路增層製程。如第5 A圖所示, 製備一内層基板51( Inner Substrate),該内層基板51 係由一具預定厚度之樹脂芯層5 1 1及形成於該芯層5 1丨正反 兩面上之銅箔圖案5 1 2所構成,該樹脂芯層5 1 1上形成有複 數個電鍍貫穿孔 513( Plating Through Hole, PTH),藉 此電性連結該樹脂芯層5 1 1正反兩面上之銅箱圖案5丨2;而 後,如第5 B及第5 C圖所示,將該内層基板5 1實施增層製 程,於該内層基板5 1正反兩面佈設一介電樹脂層5 5,該介 電樹脂層5 5上開設有複數個連通至該銅箔圖案5 1 2之盲孔Layer), after the steps of laminating and heat pressing (Heat Press) the cross-over stacked circuit boards 41, 4 2, 43 are laminated into a multilayer bonding board; then drilling technology (D ri 1 1 i ng) drill a plurality of through-holes 4 5 'a conductive metal layer is overlaid on the surface of the through-hole 45 5 wall, and the circuit patterning is performed on the outermost conductive metal layers 4 2d, 4 3d (Patterning ) The circuit layers 42b and 43b are made, and the circuit boards 41, 42, 43 can be electrically connected through the through holes 45 to obtain a multilayer circuit board 40 having six circuit layers. However, manufacturing multilayer circuit boards by pressing has obvious limitations on the number of layers and holes, so it is difficult to apply to package products with high-density electrical connection ends (I / 0 Connect i ons), and it cannot be used as a multi-chip. Sources of substrates for semiconductor packages such as Multiple Chip Module (MCM) or Chip Scale Package (CSP). In view of this, the industry proposes a method for manufacturing multilayer boards by a build-up method (Bui Id ~ Up). The multi-layer board manufacturing by the build-up method generally includes two stages, namely the inner substrate process and the circuit build-up process. As shown in FIG. 5A, an inner substrate 51 (Inner Substrate) is prepared. The inner substrate 51 is composed of a resin core layer 5 1 1 having a predetermined thickness and copper formed on both sides of the core layer 5 1 丨A foil pattern 5 1 2 is formed. The resin core layer 5 1 1 is formed with a plurality of plating through holes 513 (Plating Through Holes, PTH), thereby electrically connecting copper on both sides of the resin core layer 5 1 1. Box pattern 5 丨 2; Then, as shown in Figures 5B and 5C, the inner substrate 51 is subjected to a build-up process, and a dielectric resin layer 55 is arranged on the front and back sides of the inner substrate 51. The dielectric resin layer 5 5 is provided with a plurality of blind holes connected to the copper foil pattern 5 1 2.
17047. ptd 第7頁 1231013 五、發明說明(3)17047. ptd Page 7 1231013 V. Description of the invention (3)
5 5 2,俾於電鍍作業完成後在該介電樹脂層5 5外露表面 (包含盲孔孔壁)鍍覆一金屬導電層553。故圖案化該金 屬導電層可透過盲孔55 2孔壁上之金屬導電層電性連接至 銅箔圖案5 1 2而形成一第一增層電路層5 6 ;同樣地,該第 一增層電路層5 6最外層表面上亦得運用相同方法重複形成 第二增層電路層5 7,如第5 D圖所示可逐步增層形成一具六 層電路層之多層電路板50。然於上述製程中,形成增層電 路必須由内至外逐層堆疊方能完成,而重複相同製程,於 增層製程中若有某一層為廢品,其損失即至為嚴重,因此 在量產(Mass Production)上極為耗時而且成本極高, 不利於大量生產。 是故,如何獲取一有效解決上述壓合及增層技術存在 問題之多層I C封裝基板製造方法,實已成為目前亟欲解決 之課題。 【發明内容】: 本發明之主要目的在於提供一種可以分別製作内層基 板以及單元電路板,再一併壓合形成I C封裝基板多層疊合 結構,藉以縮短製程時程並且簡化製程步驟之I C封裝基板 多層疊合結構及其製作方法。5 5 2. After the electroplating operation is completed, a metal conductive layer 553 is plated on the exposed surface of the dielectric resin layer 5 5 (including the blind hole hole wall). Therefore, the patterned metal conductive layer can be electrically connected to the copper foil pattern 5 1 2 through the metal conductive layer on the wall of the blind hole 55 2 to form a first build-up circuit layer 5 6; similarly, the first build-up layer On the outermost surface of the circuit layer 56, a second build-up circuit layer 57 can be repeatedly formed using the same method. As shown in FIG. 5D, a multi-layer circuit board 50 with six-layer circuit layers can be gradually added. However, in the above process, the formation of the build-up circuit must be completed layer by layer from the inside to the outside, and the same process is repeated. If one of the layers in the build-up process is a waste product, the loss is serious, so it is in mass production. (Mass Production) is extremely time-consuming and costly, which is not conducive to mass production. Therefore, how to obtain a multi-layer IC packaging substrate manufacturing method that effectively solves the problems of the above-mentioned lamination and build-up technology has become a problem to be solved at present. [Summary of the invention]: The main object of the present invention is to provide an IC package substrate that can separately produce an inner substrate and a unit circuit board, and then press together to form an IC package substrate multi-layer structure, thereby shortening the process time and simplifying the process steps. Multi-layer structure and manufacturing method thereof.
為達成上揭及其他目的,本發明之I C封裝基板多層疊 合結構之製作方法包含内層基板(Inner Substrate)製 程及單元電路板疊層製程兩部分,並且按照下列步驟實施 之: 首先進行内層基板製程:In order to achieve the disclosure and other purposes, the manufacturing method of the multi-layered structure of the IC package substrate of the present invention includes two parts, an inner substrate process and a unit circuit board lamination process, and is implemented according to the following steps: First, the inner substrate Process:
17047. ptd 第8頁 1231013 五、發明說明(4) 係備妥一芯層 具有一上表面及一 有一導電金屬層( 在該導電金屬 有複數個第一 (Core Substrate),該 之下表面,且該上下表面 銅); 形成 著,佈覆一第 應於導電 口之第二 二開口 ; 之導 柱形 層及 開設 該内 電金 成於 接著 即預 形成 有貫 層基 線路 開口 再清 屬層 預定 實施 備多 於該 穿該 板上 二光 層預 ;然 除該 ,俾 之内 X3X3 一 早兀 片單 介電 介電 各銲 基板 相對 如底 層上佈覆一 開口 阻層 定處 俾沉 於第 其次,取一内 合層黏合一單元電 穿該 及開 該第 層基 板結構,如此 製得一 I C封裝 黏合層而 孔上形成 二電路層 板與單元 頂入 一第二 電性 電路 重複 基板 後, 第一 形成 層線 電路 元電 層表 層與 柱; 層基 路板 該單 電 連接 板得 前述 多層 第一 積一 光阻 有複 柱( 光阻 具預 而完 製程 該單 芯層基板 上各形成 一光阻層 光阻層,該第 導電線路於該開口;接 層上,該第二光阻層對 數個孔徑小於該第一開 Metal Posts) 層,並移除非 定高度之銲柱 成内層基板製 上形成 沉積銲 、第二 複數個 路上, 板疊層 路板,該單元電路板係具有一介電 面之第一電路層,該單元 第一電路層之多數開孔, 於該第 導電線路 ,使各銲 作。 電路板上 以對應至 板為核心,於其上下表面分別以黏 ;使形成於該内層線路上之銲柱刺 元電路板之開孔後,再於該介電層 路層,如此,更外層之電路可藉由 至第一電路層及内層線路;使該内 以分開製作後,再壓合成一疊層基 銲柱及單元電路板疊層步驟,即可 疊合結構。17047. ptd Page 8 1231013 V. Description of the invention (4) A core layer is provided with an upper surface and a conductive metal layer (the conductive metal has a plurality of first core substrates, the lower surface, And the upper and lower surfaces are copper); forming, covering the first and second openings which should be at the conductive opening; the conductive pillar layer and the opening of the internal electric gold are formed in advance to form a through-layer base line opening and then clear the metal layer It is planned to implement more than the two optical layers on the board; otherwise, X3X3, an early chip, a single dielectric, and a dielectric substrate are relatively opposed to each other, and an opening resistance layer is laid on the bottom. Secondly, an inner bonding layer is used to bond a unit through the first substrate structure, and an IC package bonding layer is prepared, and two circuit layer boards are formed on the hole, and the unit is pushed into a second electrical circuit repeating substrate. The first layer of the circuit layer and the first layer of the circuit layer are formed; the single electrical connection board of the layered circuit board is obtained by the aforementioned multilayer first integrated photoresistor with multiple pillars (the photoresistor has completed the single core process) A photoresist layer is formed on the substrate, and the first conductive line is on the opening; on the connection layer, a pair of apertures of the second photoresist layer are smaller than the first open Metal Posts layer, and the non-constant height is removed The welding column is formed into an inner layer substrate to form a deposition weld, a second plurality of roads, and a laminated circuit board. The unit circuit board is a first circuit layer having a dielectric surface, and most of the first circuit layer of the unit has holes. Each of the first conductive lines is welded. The circuit board uses the corresponding board as the core, and the upper and lower surfaces are respectively adhered; after the welding holes formed on the inner layer circuit puncture the openings of the circuit board, the circuit layer is formed in the dielectric layer, and thus, the outer layer The circuit can be connected to the first circuit layer and the inner layer circuit; after the inner parts are separately produced, a laminated base welding post and a unit circuit board lamination step are laminated to form a laminated structure.
17047. ptd 第9頁 1231013 五、發明說明(5) 本發明製法之一實施例,係在内層基板與單元電路板 之間佈設由介電材料(如聚丙烯(p〇lypr〇pyiene, pp )、聚亞醯胺(P〇1yimide)、預浸材(prepreg)等)製 成之黏合層,並以熱壓方法(Heat press)取代逐層增乂 技術將各單元電路板一次壓合成多層電路板,使各内層^ 板及單兀電路板之間得藉由銲柱電性連接,進而簡化製^ 流程並且縮短製程時間。 场- : = 構角度觀之,依上述製法製得之IC封裝基板多 Ϊ L:: 有至少一内層基板,1亥内層基板具有-芯 :二 形成於芯層基板上下表面之内層線路,該内層線 上形成有複數個導電m复數個單元電路 介電層與形成於該介電層表面之第一電] 二:夕數黏合層,用以黏接該内層基板及單元 ^數!雷;匕 路板上設有電性連接第-、二電路層之 電性連拄 且至夕一導電孔與内層基板上相對應之銲柱 至第-電路芦由第二電路層與導電孔電性連接 内層線路之r曰4内層線路。因皁元電路板之導電孔係與 结構可大旦::f電性連#,其所形成之多層封裝基板疊合 -e,以之電佈鑛置通孔(Plat_ th〇ugh 、牙夕層基板之佈置,而可得一呈窯娩叻― 度之封裝基板。 叫』传具同線路密 【實施方式】: -第—二复巍盤: 凊芩閱第1圖說明本發明之Ic封裝基板多層疊合結構17047. ptd Page 9 1231013 V. Description of the invention (5) An embodiment of the manufacturing method of the present invention is a method in which a dielectric material (such as polypropylene (p0lypr〇pyiene, pp)) is arranged between the inner substrate and the unit circuit board. , Polyimide (P0yimide), prepreg (prepreg), etc.), and the heat press method (Heat press) instead of the layer-by-layer augmentation technology, each unit circuit board pressed into a multilayer circuit Board, so that the inner layer board and the single circuit board must be electrically connected by soldering posts, thereby simplifying the manufacturing process and shortening the manufacturing time. Field-: = From the perspective of structure, there are many IC package substrates produced according to the above manufacturing method. L :: There is at least one inner substrate, and the inner substrate has-core: two inner layers formed on the upper and lower surfaces of the core substrate. The inner layer line is formed with a plurality of conductive m and a plurality of unit circuit dielectric layers and a first electrical layer formed on the surface of the dielectric layer] 2: a bonding layer for bonding the inner substrate and the unit number! Thunder; there is electrical connection between the first and second circuit layers on the dagger board, and the first conductive hole and the corresponding solder post on the inner substrate are connected to the first circuit through the second circuit layer and the conductive hole. Electrically connected to the inner-layer circuit, R is 4 inner-layer circuit. Because the conductive hole system and structure of the saponin circuit board can be large :: f 电 性 联 #, the multilayer packaging substrate formed by it is superimposed -e, and the through holes (Plat_though, Yaxi) are arranged electrically. Layer substrate, you can get a package substrate in the form of a kiln. It is called “transistor with the same circuit density.” [Embodiment]:-The second Fuwei plate: See the first figure to explain the Ic of the present invention. Multilayer laminated structure of package substrate
17047.ptd 第10頁 1231013 五、發明說明(6) 之剖面示意圖。以六層封裝基板為例,本發明之丨c封裝基 板1係包含至少一内層基板10( Inner Substrate)、疊層 於内層基板10正反面上之複數片單元電路板1丨,以及用於 黏合該内層基板1 0與單元電路板丨丨之黏合層1 2,其中,該 内層基板1 〇係藉由其内層線路1 〇 2上所形成的複數個導電 銲柱103 ( Conductive Posts)電性導接至各單元電路板 1 1 〇 以下請參閱第2 A至2K圖詳細說明此一 I C封裝基板多層 疊合結構之整體製作流程,惟本發明之I C封裝基板製造方 法係包含内層基板製程及單元電路板疊層製程兩階段,因 此本實施例分別以第2A至2F圖及第2G至2K圖依序說明内層 基板製程以及單元電路板疊層製程。 首先進行内層基板製程: 如第2A圖所示,備妥一如玻璃布(Glass Cloth)、 順雙丁烯二酸亞醯胺三氮樹脂(B i s m a 1 e i m i d e T r i a z i n e Resin, BT Resin)或FR -4樹脂、FR-5樹脂(均為商品名 )材質之芯層基板1 〇 〇 ( C〇re Substrate),該芯層基板 10 0具有一上表面1〇〇 a及一相對之下表面l〇〇b,於該怎層 基板1 0 0上以習用鑽孔技術(Dr i 1 1 i ng)鑽製多數貫孔 1 0 0 c 〇 接著,如第2 B圖所示’於該怎層基板1 〇 〇之上下表面 10 0a,10 Ob以及貫孔100c孔壁預鍍一導電金屬層1〇1 (如底 銅),再如第2C圖所示,於該導電金屬層1〇1上佈覆一第 一光阻層1 3,該第一光阻層1 3具有複數個第一開口 1 3 〇,17047.ptd Page 10 1231013 V. Schematic sectional view of the description of the invention (6). Taking a six-layer package substrate as an example, the c-package substrate 1 of the present invention includes at least one inner substrate 10 (Inner Substrate), a plurality of unit circuit boards 1 laminated on the front and back surfaces of the inner substrate 10, and for bonding. The inner layer substrate 10 and the adhesion layer 12 of the unit circuit board 丨 丨, wherein the inner layer substrate 10 is electrically conductive by a plurality of conductive posts 103 (Conductive Posts) formed on the inner layer circuit 102. 1 1 〇 Connected to each unit circuit board. Please refer to Figures 2A to 2K below to explain the overall manufacturing process of the multi-layered structure of this IC package substrate. However, the manufacturing method of the IC package substrate of the present invention includes the inner substrate process and the unit. The circuit board stacking process has two stages. Therefore, in this embodiment, the inner substrate process and the unit circuit board stacking process are sequentially described with reference to FIGS. 2A to 2F and 2G to 2K, respectively. First, the inner substrate manufacturing process is performed: as shown in FIG. 2A, prepare as glass cloth (Glass Cloth), maleimide triazine resin (B isma 1 eimide Triazine Resin, BT Resin) or FR -4 resin, FR-5 resin (both trade names) core substrate 100 (Core Substrate), the core substrate 100 has an upper surface 100a and a relatively lower surface l 〇〇b, drill most through holes 1 0 0 c using conventional drilling technology (Dr i 1 1 ng) on the substrate 100, and then, as shown in FIG. 2B, The top and bottom surfaces of the substrate 100 are 100a, 10 Ob and the hole wall of the through hole 100c are pre-plated with a conductive metal layer 100 (such as copper), and then shown in FIG. 2C, on the conductive metal layer 101 Covering a first photoresist layer 13, the first photoresist layer 13 has a plurality of first openings 13.
17047. ptd 第11頁 1231013 五、發明說明(7) 俾供沉積導電線路而於該第一開口 1 3 0處形成内層線路 102〇 接著,如第2 D圖所示,於該第一光阻層1 3上另佈覆一 第二光阻層1 4,該第二光阻層1 4對應於該内層線路1 〇 2預 定處上形成有複數個孔徑小於該第一開口 1 3 0之第二開口 140° 之後,如第2 E圖所示,於該第二開口 1 4 0處以傳統電 解式 /無電鑛(Electro Plating / Electroless Plating )、蒸錢(Evaporation)、物理氣相沉積(Physical Vapor Deposition)、化學氣相沉積(Chemical Vapor17047. ptd Page 11 1231013 V. Description of the invention (7) 俾 An inner layer 102 is formed at the first opening 130 by depositing a conductive line. Next, as shown in FIG. 2D, the first photoresist A second photoresist layer 14 is further coated on the layer 13, and the second photoresist layer 14 corresponds to a predetermined position of the inner layer circuit 102 and a plurality of apertures smaller than the first opening 1 3 0 are formed. After the two openings are at 140 °, as shown in Figure 2E, traditional electroplating / electroless plating (Electro Plating / Electroless Plating), evaporation, physical vapor deposition (Physical Vapor) Deposition), Chemical Vapor
Deposition)等方式沉積金屬銲料或其他導電物質,使得 光阻層移除後,可於預定之内層線路1 〇 2上形成複數個導 電銲柱103( Conductive Posts)(其中尤以銅、銅合金 等金屬銲柱(Metal Posts)者為佳)。該導電銲柱1〇3可 選自銅、銅合金、鋁、鋁合金或其他導電材料製成。 接著,如第2F圖所示,清除第一及第二光阻層,並移 =非導電線路之導電金屬層1(Π,使芯層基板1〇〇表面上之 導電線路1〇2預定處形成具複數個鋒柱1〇3,而 板1 0的製程步驟。 而後,進入單元電路板叠 電路板與内層基板之間的連接 單元電路板及一下層單元電路 之疊層過程,其他於上下層單 多層I C封裝基板,如有使用上 層階段;惟為清楚示意單元 關係,本實施例僅以一上層 板為例簡單敘述單元電路板 疋電路板外部所實施製作之 述内層基板與單元電路板之Deposition) and other methods to deposit metal solder or other conductive materials, so that after the photoresist layer is removed, a plurality of conductive posts 103 (Conductive Posts) (especially copper, copper alloys, etc.) can be formed on the predetermined inner layer circuit 102. Metal Posts are preferred). The conductive pillar 10 may be made of copper, copper alloy, aluminum, aluminum alloy, or other conductive materials. Next, as shown in FIG. 2F, the first and second photoresist layers are removed and shifted to the conductive metal layer 1 (Π of the non-conductive circuit, so that the conductive circuit 102 on the surface of the core substrate 100 is predetermined. Form a process step with a plurality of pillars 103 and board 10. Then, enter the process of stacking the unit circuit board and the lower unit circuit between the unit circuit board stack circuit board and the inner substrate, and the others are above. The lower single-layer IC package substrate, if the upper layer is used; but to clearly show the unit relationship, this embodiment simply uses an upper layer as an example to briefly describe the unit circuit board and the inner circuit board and unit circuit board made outside the circuit board. Of
1231013 五、發明說明(8) 電性連結方式時,仍未脫離本發明之可實施範圍。 現即以第2G圖至第2K圖詳細說明本實施例中,上層單 元電路板及下層單元電路板的疊層步驟,然因該上層單元 電路板與下層單元電路板的組成元件以及製作方式完全相 同,是故,下層單元電路板中與該上層單元電路板功效相 同之元件,蓋依照上層單元電路板之元件符號表示。1231013 V. Description of the invention (8) The electrical connection mode has not deviated from the implementable scope of the present invention. Now, the steps of lamination of the upper unit circuit board and the lower unit circuit board in this embodiment will be described in detail in FIGS. 2G to 2K. However, because the components and manufacturing methods of the upper unit circuit board and the lower unit circuit board are completely It is the same because the components of the lower-layer unit circuit board having the same function as the upper-layer unit circuit board are covered according to the component symbols of the upper-layer unit circuit board.
如第2 G圖所示,先預備多片具有一介電層11 〇及形成 於該介電層110表面之第一電路層111之單元電路板11,該 單元電路板11上開設有貫穿該介電層11 0與該第一電路層 111之多數開孔11 2,且每一開孔11 2各與内層基板上形成 之銲柱(未圖示)相互對應。一般該單元電路板1 1之選用 可於玻璃纖維(Glass Fiber)、聚酚樹脂(phen〇lic Polyester)或環氧樹脂層上沉積一銅層,或使用樹脂壓 合銅结(Resin Coated C0pper)等,惟此單元電路板之 製作倶為習知,故不於此贅述。 肉爲ΐ f ,,如第2H圖所示,取一内層基板10為核心,於驾 製成之黏合層12,使一黏接於内As shown in FIG. 2G, a plurality of unit circuit boards 11 having a dielectric layer 110 and a first circuit layer 111 formed on the surface of the dielectric layer 110 are prepared. The unit circuit board 11 is provided with a through hole. The dielectric layer 110 and the plurality of openings 112 in the first circuit layer 111, and each of the openings 112 corresponds to a solder post (not shown) formed on the inner substrate. Generally, the unit circuit board 11 can be selected by depositing a copper layer on a glass fiber, a phenol resin, or an epoxy resin layer, or using a resin bonded copper junction (Resin Coated Copper). Etc. However, the production of this unit circuit board is not known, so it will not be described here. The meat is ΐf. As shown in FIG. 2H, an inner substrate 10 is taken as the core, and an adhesive layer 12 made of the inner substrate is used to adhere one
電路板1U稱作上層單元電路2層正面1GGa之單天 10反面100b之單元電路板黏接於内層基相 以其第一電路層m面向内層線稱敗作^層早元電路板)分另, ίο壓合黏接,俾令形成於該内路102之方式與該内層基相 刺穿該黏合層12,而頂入上;】線路ι〇2上之導電銲柱1〇 脅及下層單元電路板11511之The circuit board 1U is called the upper layer unit circuit. The front layer of 1 layer is 1GGa, and the unit circuit board of 10 days is opposite to 100b. The unit circuit board is glued to the inner layer. The first circuit layer m facing the inner layer line is called ^ layer early element circuit board.) , Ίο pressure bonding, order to form on the inner road 102 and pierce the bonding layer 12 with the inner layer base, and push into the top;] the conductive pillar 10 on the line ι2 and the lower unit Circuit board 11511
17047. ptd 1231013 五、發明說明(9) ~ -- 開孔^12’如第21圖所示。 及 2後’如第2 J圖所示,於單元電路板1 1之介電層1 1 0 、:7 1 1 2表面形成一導電金屬層,沉積整層導電層1 1 3後 以上光阻、§§办 n %如 々衫、蝕刻等方法,以製作一第二電路層1 1 4 外,,、口 兩v電材質之導電孔11 5,如第2K圖所示。此 I »亦可如别迷第2 C圖所示形成内層線路1 0 2之方法形成 二^一電路層11 4。是以,外部電路(未圖示)應用於如 弟。圖所不之封裝基板卜可藉由第二電路層π 4與導電孔 II 5電丨生連接至第一電路層111以及内層線路1 〇 2,致使内 層基板與上層及下層單元電路層電性導接。因此,該内層 基f 1 0與該單元電路板11得以分開製作後,再壓合成一多 層疊層基板結構,藉此縮短量產時間並且達到簡化製程步 驟的目的。 再如第1圖所示,以結構角度觀之,上述製法製得之 I C封裝基板多層疊合結構1包含有至少一内層基板1 〇,該 内層基板1 0具有一芯層基板1 〇 〇及形成於芯層基板1 〇 〇上下 表面1 0 0 a,1 0 0 b之内層線路1 〇 2,該内層線路1 〇 2於預定位 置上形成有複數個導電銲柱1 〇 3 ;複數個單元電路板11, 其具有一介電層11 0與形成於該介電層11 〇表面彼此對應之 第一電路層111及第二電路層114;多數黏合層12,用以黏 接該内層基板1 0及單元電路板11;該單元電路板1 1上設有 電性連接第一、二電路層1 1 1,1 1 4之多數導電孔1 1 5,且至 少一導電孔1 1 5與内層基板1 0上相對應之銲柱1 〇 3電性連 接。外部電路可藉由第二電路層1 1 4與導電孔11 5電性連接17047. ptd 1231013 V. Description of the invention (9) ~-The opening ^ 12 ’is shown in Figure 21. And after 2 ′, as shown in FIG. 2J, a conductive metal layer is formed on the surface of the dielectric layer 1 1 0,: 7 1 1 2 of the unit circuit board 1, and the entire layer of conductive layer 1 1 3 is deposited above the photoresist §§ Do n% methods such as blouses, etching, etc. to make a second circuit layer 1 1 4, the conductive holes 115 of the two v electrical materials, as shown in Figure 2K. This I »can also be used to form an inner layer circuit 102 as shown in Fig. 2C of Fig. 2. The circuit layer 11 4 can be formed. Therefore, an external circuit (not shown) is applied to Ruyi. The package substrate shown in the figure can be electrically connected to the first circuit layer 111 and the inner layer circuit 102 through the second circuit layer π 4 and the conductive hole II 5, so that the inner substrate and the upper and lower unit circuit layers are electrically Lead. Therefore, after the inner layer base f 10 and the unit circuit board 11 are separately manufactured, a multi-layer substrate structure is pressed to reduce the mass production time and achieve the purpose of simplifying the manufacturing steps. As shown in FIG. 1, viewed from a structural point of view, the IC package substrate multi-layered structure 1 obtained by the above manufacturing method includes at least one inner layer substrate 10, which has a core layer substrate 100 and The inner layer circuit 100 is formed on the upper and lower surfaces of the core substrate 100 and the inner layer circuit 100, and the inner layer circuit 100 is formed with a plurality of conductive solder pillars 10 at a predetermined position; a plurality of cells A circuit board 11 having a dielectric layer 110 and a first circuit layer 111 and a second circuit layer 114 formed on the surface of the dielectric layer 110 corresponding to each other; most of the adhesive layers 12 are used for bonding the inner substrate 1 0 and the unit circuit board 11; the unit circuit board 11 is provided with a plurality of conductive holes 1 1 5 electrically connecting the first and second circuit layers 1 1 1, 1 1 4 and at least one conductive hole 1 1 5 and the inner layer Corresponding solder pillars 103 on the substrate 10 are electrically connected. The external circuit can be electrically connected to the conductive hole 11 5 through the second circuit layer 1 1 4
17047. ptd 第14頁 1231013 五、發明說明(10) 一~-一'----_17047. ptd Page 14 1231013 V. Description of the invention (10) One ~ -One '----_
至第一電路層1 1 1以及内層後肷】〇 9 m lL 亓兩攸化π 、、良路1 0 2 °因此’内層基板與單 凡包路板得以分開製作,再靨人一 一早 構。另ra留-φj ^ 口成封竑基板多層疊合結 103雷,Λ &甘 電孔115係與内層線路102之銲柱 電!·連接,其所形成之多層封裝基板疊合結構丨可大量 =:技術以電鍍通孔(Plating th〇ugh hole,ΡΤΗ ) 2牙夕層基板之佈置,而可得一具高線路密度之封 才反0 羞二 _ 第3A及3C圖係顯示本發明之1(:封裝基板多層疊合結構 ,另:實施例,多層封裝基板20可如第2;圖所示於工=形 成一導電金屬層,重複如第2B圖至第2F圖所示之製程步 驟,即可於基板表面之電路層214形成有導電銲柱、2〇3=第 Μ圖=示。接著,如第3B圖與第3C圖所示,依前述實施例 壓合單元電路板2卜黏合層2 2與多層封裝基板2 〇之製程步 驟’並進行沉積導電層、餘刻等製程,以於基板製作電路 層2 1 6及複數個填滿導電材質之導電孔2丨5。如第^圖所示 即係具有十層線路層之封裝基板2多層疊合結構,本實施 例以熱壓方法(Heat Press)取代逐層增層技術將各單元 電路板2 1—次壓合成多層疊層基板結構,使得該内層基板 與各單元電路板2 1之間可如前述貫施例藉由銲柱2 〇 3電性 連接,藉此縮短量產時間兼可簡化製作流程。 以上所述僅為本發明之較佳實施例而已,並非用以限 定本發明之實質技術内容範圍,本發明之實質技術内容^ 廣義地定義於下述之申請專利範圍中,任何他人完成之技To the first circuit layer 1 1 1 and the inner layer back] 〇9 m lL 亓 two π, good road 1 0 2 ° Therefore, the 'inner layer substrate and Shanfan Bao road board can be produced separately, and then it ’s early in the morning结构。 Structure. On the other hand, the left-φj ^ mouth-sealed substrate is multi-layered and combined with 103 ray. Λ & Gan electrical hole 115 is electrically connected to the welding column of the inner layer circuit 102. The multilayer packaging substrate stack structure formed by it Large amount =: The technology uses the arrangement of plated through holes (PTT) 2 substrates, and a high-density seal can be obtained. 2 _ 3A and 3C show the present invention No. 1 (: multi-layered packaging substrate structure, another: embodiment, the multi-layered packaging substrate 20 can be processed as shown in Figure 2; a conductive metal layer is formed, and the processes shown in Figures 2B to 2F are repeated. In step, a conductive pillar is formed on the circuit layer 214 on the surface of the substrate, and 203 = Figure M = shown. Then, as shown in Figures 3B and 3C, the unit circuit board 2 is laminated according to the foregoing embodiment. The manufacturing steps of the adhesive layer 22 and the multi-layer packaging substrate 20 are performed, and a conductive layer is deposited, and other processes are performed to produce a circuit layer 2 1 6 on the substrate and a plurality of conductive holes 2 5 filled with a conductive material. Figure ^ shows a multi-layer structure of a package substrate 2 with ten circuit layers. This embodiment uses a hot-pressing method. (Heat Press) Instead of layer-by-layer build-up technology, each unit circuit board 21 is laminated to a multi-layer laminated substrate structure, so that the inner layer substrate and each unit circuit board 21 can be welded by the post as described in the previous embodiment. 2 〇 Electrical connection, thereby shortening mass production time and simplifying the manufacturing process. The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the essential technical content of the present invention, the essential technology of the present invention Content ^ Broadly defined in the scope of patent application below,
17047. ptd17047. ptd
第15頁 1231013Page 15 1231013
17047.ptd 第16頁 1231013 圖式簡單說明 ^ 【圖式簡單說明】·· 結構之剖面示 第1圖係本發明之I c封裝基板多層疊合 意圖; 第2A至2K圖係本發明第一實施例之封入 結構製法之製程示意圖; 我基板夕層且口 裝基板多層疊合 第3 A至3 C圖係本發明第二實施例之封 結構製法之製程示意圖; 第4A至4C圖係以習知熱壓方法製造多 意圖;以及 層封裝基板之示 意圖 第5 A至5 D圖係以習知增層方法製造多 層封裝基板之示 10, 41,51 100, 511 100a 100b 100c,41c, 513 101 102, 41a,41b, 512, 512 103,203 11,21,41,42, 43 110,55 111,42a,43a,553 封袭基板多層叠 内層基板 芯層基板 芯層上表面 &層下表面 芯層貫孔 導電金屬層 内層線路 導電銲柱 單元電路板 介電層 第〜電路層17047.ptd Page 16 1231013 Simple illustration of the drawings ^ [Simplified illustration of the drawings] ································································································································································ Schematic diagram of the manufacturing process of the sealing structure method of the embodiment; Figures 3A to 3C of the substrate and the multilayer substrate are laminated. Figures 4A to 4C are schematic diagrams of the manufacturing process of the sealing structure method of the second embodiment of the present invention. Conventional hot pressing method for manufacturing multiple intentions; and schematic diagrams of layer packaging substrates 5A to 5D are diagrams for manufacturing multilayer packaging substrates by conventional layer-increasing methods 10, 41, 51 100, 511 100a 100b 100c, 41c, 513 101 102 , 41a, 41b, 512, 512 103,203 11, 21, 41, 42, 43 110,55 111,42a, 43a, 553 Blocked substrate Multi-layered inner substrate Core layer Substrate core layer Upper surface & Lower surface core layer Hole conductive metal layer inner layer conductive conductive pillar unit circuit board dielectric layer ~ circuit layer
合結構Composite structure
17047.ptd 第17頁 1231013 圖式簡單說明 112,552 1 13, 42b,43b 115,215 12,22,44 13 130 14 140 40, 50 45 開孔 第二電路層 導電孔 黏合層 第一光阻層 第一開口 第二光阻層 第二開口 多層電路板 貫穿通孔17047.ptd Page 17 1231013 Brief description of the drawings 112,552 1 13, 42b, 43b 115,215 12,22,44 13 130 14 140 40, 50 45 Opening hole Second circuit layer conductive hole adhesive layer first photoresistive layer first opening Second photoresist layer, second opening, multilayer circuit board, through-hole
17047. ptd 第18頁17047.ptd Page 18
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TW92105161A TWI231013B (en) | 2003-03-11 | 2003-03-11 | Multilayer laminating structure of IC packing substrate and method for fabricating the same |
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TW92105161A TWI231013B (en) | 2003-03-11 | 2003-03-11 | Multilayer laminating structure of IC packing substrate and method for fabricating the same |
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TW200418150A TW200418150A (en) | 2004-09-16 |
TWI231013B true TWI231013B (en) | 2005-04-11 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI411072B (en) * | 2009-12-02 | 2013-10-01 | Unimicron Technology Corp | Method for fabricating chip-scale packaging substrate |
Families Citing this family (4)
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WO2011002208A2 (en) | 2009-07-03 | 2011-01-06 | 서울반도체 주식회사 | Light-emitting diode package |
TWI462678B (en) * | 2012-12-17 | 2014-11-21 | Ichia Tech Inc | Method of manufacturing printed circuit board |
CN106033753B (en) * | 2015-03-12 | 2019-07-12 | 恒劲科技股份有限公司 | Package module and its board structure |
WO2023272650A1 (en) * | 2021-06-30 | 2023-01-05 | 华为技术有限公司 | Packaging substrate and manufacturing method therefor, chip packaging structure, and electronic apparatus |
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2003
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI411072B (en) * | 2009-12-02 | 2013-10-01 | Unimicron Technology Corp | Method for fabricating chip-scale packaging substrate |
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