TW200418150A - Multilayer laminating structure of IC packing substrate and method for fabricating the same - Google Patents

Multilayer laminating structure of IC packing substrate and method for fabricating the same Download PDF

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Publication number
TW200418150A
TW200418150A TW92105161A TW92105161A TW200418150A TW 200418150 A TW200418150 A TW 200418150A TW 92105161 A TW92105161 A TW 92105161A TW 92105161 A TW92105161 A TW 92105161A TW 200418150 A TW200418150 A TW 200418150A
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layer
substrate
conductive
patent application
scope
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TW92105161A
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Chinese (zh)
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TWI231013B (en
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Shih-Ping Hsu
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Phoenix Prec Technology Corp
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Abstract

A multilayer laminating structure of IC packing substrate and method for fabricating the substrate are provided. An inner-layer substrate is formed with inner circuits on an upper surface and a lower surface thereof, and a plurality of conductive posts having predetermined thickness are formed on the inner circuits. A set of unit circuit boards with dielectric layers and first circuit layers mounted thereon, such as Resin Coated Copper (RCC), are laminated with the inner-layer substrate by adhesive layers. Openings through the circuit layer and the dielectric layer are formed in the unit circuit board, corresponding to the conductive post of the inner-layer substrate. Then, the post formed on the inner-layer substrate can penetrate the adhesive layer to pierce into the opening of the unit circuit board, so as to electrically contact with second circuit layers applied over the other side of the dielectric layer. Therefore, inner-layer substrates and unit circuit boards are produced separately and laminated a multilayer board, so as to simplify processes and reduce working time.

Description

200418150 •五、發明說明(l) [發明所屬之技術領域】: 本發明係關於一種I C封裝基板多層疊合結構及其製作 方法’尤指一種適於提供南積集度(Integration)半導 體晶片承載以及封裝之I C封裝基板多層疊合結構及其製作 方法。 -【先前技術】: 隨著電子產業的蓬勃發展,電子產品亦逐漸邁入多功 能、高性能的研發方向。為滿足半導體封裝件高積集度 (Integration)以及微型化(Mini aturiza.t ion)的封裝 ’提供多數主被動元件及線si載接之印刷電路板 (P r i n t e d C i r c u i t B 〇 a r d)亦逐漸由雙層板演變成多層 板(Multi-layer Board),俾於有限的空間下,藉由層 間連接技術(I n t e r 1 a y e r C ο η n e c t i ο η)擴大電路板上可 利用的電路面積而配合高電子密度之積體電路 (Integrated Circuit)需求。傳統多層電路板之製造方 法’一般是藉由壓合法(Lam i na t i ng P r e s s)及增層法 (Bu i 1 d-up)兩種方式。 如第4A至4C圖所示,預備一如銅落與絕緣基材所製成 之^复數個電路板41,4 2,4 3,電路板41係形成有上下電路層 4·,4 1 b以及導電通孔4 1 c,而電路板4 2,4 3亦分別於一側 形成有電路層42a,43a,其相對於電路層42a,43&之另一侧 =^別形成有導電金屬層42d,43d,於該電路板4丨,42,43 ‘間^ ^ —由纖維或熱固性樹脂等(如環氧樹脂、盼聚等 )衣成之預浸材44 ( Prepreg)作為黏著層(200418150 • V. Description of the invention (l) [Technical field to which the invention belongs]: The present invention relates to a multi-layered structure of an IC package substrate and a manufacturing method thereof, particularly a semiconductor wafer carrier suitable for providing South Integration (Integration) And a multi-layer structure of a packaged IC package substrate and a manufacturing method thereof. -[Previous Technology]: With the vigorous development of the electronics industry, electronic products have gradually moved into a multi-functional, high-performance research and development direction. In order to meet the packaging of semiconductor packages with high integration (Miniature Integration) and miniaturization (Mini aturiza.t ion) of the package 'provided most active and passive components and printed circuit boards (Printed C ircuit B 0ard) carried by the line si also gradually Evolved from a double-layer board to a multi-layer board, confined in a limited space, and expanded the available circuit area on the circuit board by interlayer connection technology (I nter 1 ayer C ο η necti ο η) to cooperate Demand for integrated circuits with high electron density. Traditional multi-layer circuit board manufacturing methods are generally two methods: compression method (Lam i na t ng P ree s s) and layer build-up method (Bu i 1 d-up). As shown in Figs. 4A to 4C, a plurality of circuit boards 41, 4 2, 4 3, such as a copper plate and an insulating substrate, are prepared. The circuit board 41 is formed with upper and lower circuit layers 4 ·, 4 1 b. And conductive vias 4 1 c, and the circuit boards 4 2 and 4 3 are also formed with circuit layers 42a and 43a on one side, and the other side of the circuit layers 42a and 43 is formed with a conductive metal layer 42d, 43d, on the circuit board 4 丨, 42,43 'between ^ ^ — a prepreg 44 (Prepreg) made of fiber or thermosetting resin (such as epoxy resin, hope polymer, etc.) as an adhesive layer (

17047. ptd $ 6頁 20041815017047. ptd $ 6 pages 200418150

200418150 五、發明說明(3) 53 2,俾於電鍍作業完成後在該介電樹脂層5 5外露表面 (包含盲孔孔壁)鍍覆一金屬導電層5 5 3。故圖案化該金 屬導電層可透過盲孔55 2孔壁上之金屬導電層電性連接至 銅箔圖案5 1 2而形成一第一增層電路層5 6 ;同樣地,該第 \一增層電路層5 6最外層表面上亦得運用相同方法重複形成 —第二增層電路層57,如第5D圖所示可逐步增層形成一具六 層電路層之多層電路板50。然於上述製程中,形成增層電 路必須由内至外逐層堆疊方能完成,而重複相同製程,於 增層製程中若有某一層為廢品,其損失即至為嚴重,因此 ♦ / 產(Mass Production)上極為耗時而且成本極高, 不利於大量生產。 是故,如何獲取一有效解決上述壓合及增層技術存在 問題之多層I C封裝基板製造方法,實已成為目前亟欲解決 之課題。 【發明内容】: 本發明之主要目的在於提供一種可以分別製作内層基 板以及單元電路板,再一併壓合形成I C封裝基板多層疊合 結構,藉以縮短製程時程並且簡化製程步驟之I C封裝基板 多層疊合結構及其製作方法。 _為達成上揭及其他目的,本發明之I C封裝基板多層疊 合結構之製作方法包含内層基板(Inner Substrate)製 程及單元電路板疊層製程兩部分,並且按照下列步驟實施 之: 首先進行内層基板製程:200418150 V. Description of the invention (3) 53 2. After the electroplating operation is completed, a metal conductive layer 5 5 3 is plated on the exposed surface of the dielectric resin layer 5 5 (including the wall of the blind hole). Therefore, the patterned metal conductive layer can be electrically connected to the copper foil pattern 5 1 2 through the metal conductive layer on the wall of the blind hole 55 2 to form a first build-up circuit layer 5 6; similarly, the first The circuit layer 56 can also be formed on the outermost surface repeatedly using the same method-the second layer circuit layer 57 can be gradually increased to form a multi-layer circuit board 50 with six circuit layers as shown in FIG. 5D. However, in the above process, the formation of the build-up circuit must be completed layer by layer from the inside to the outside, and the same process is repeated. If one of the layers in the build-up process is a waste product, the loss will be serious, so ♦ / product (Mass Production) is extremely time-consuming and costly, which is not conducive to mass production. Therefore, how to obtain a multi-layer IC packaging substrate manufacturing method that effectively solves the problems of the above-mentioned lamination and build-up technology has become a problem to be solved at present. [Summary of the invention]: The main object of the present invention is to provide an IC package substrate that can separately produce an inner substrate and a unit circuit board, and then press together to form an IC package substrate multi-layer structure, thereby shortening the process time and simplifying the process steps. Multi-layer structure and manufacturing method thereof. _ In order to achieve the disclosure and other purposes, the manufacturing method of the IC package substrate multi-layered laminate structure of the present invention includes two parts: an inner substrate process and a unit circuit board stacking process, and is implemented according to the following steps: First, the inner layer Substrate process:

17047. ptd 第8頁 200418150 五、發明說明(4) 具有一 有一導 在 形成有 著,佈 應於導 口之第 二開口 之導電 柱形成 接 即 層及形 開設有 該内層 其 合層黏 穿該黏 及開孔 該第二 層基板 係備妥一芯層基板( 及一相對之 層(如底銅); 金屬層上佈覆一第 複數個第一開口,俾沉積 層於第一光 處上 上表面 電金屬 該導電 覆一第 電線路 二開口 ;再清 金屬層 於預定 著實施 預備多 成於該 貫穿該 基板上 次,取 二光阻 層預定 ;然後 除該第 ,俾形 之内層 單元電 片單元 介電層 介電層 各銲柱 ,沉 一 一 、 成複 線路 路板 電路 表面 與第17047. ptd page 8 200418150 V. Description of the invention (4) There is a conductive post with a guide formed in the second opening of the guide opening to form the immediate layer and the inner layer is formed, and the laminated layer passes through the inner layer. Bonding and opening the second substrate is prepared with a core substrate (and an opposite layer (such as copper); a metal layer is covered with a plurality of first openings, and the plutonium layer is deposited on the first light. The upper surface of the electric metal is conductively covered with a first electric circuit and two openings; then the metal layer is scheduled to be implemented and prepared more than the last time through the substrate, and two photoresist layers are scheduled; and then the first and second inner-shaped units are removed. Each soldering post of the dielectric layer and the dielectric layer of the film unit, Shen Yiyi, the circuit surface of the complex circuit board and the first

Core Substrate),該芯層基板 下表面,且該上下表面上各形成 形成有 積銲柱 第二光 數個具 上,而 疊層製 板,該 之第一 一電路 光阻層 導電線 阻層上, 複數個孔 (Metal 阻層,並 預定高度 完成内層 程: 單元電路 電路層, 層之多數 ,該第 路於該 該第二 徑小於 Posts) 移/除非 之銲柱 基板製 一光阻層 開口 :接 光阻層對 該第 開 於該第 導電線路 ,使各銲 作0 _ 板係具有一介電 該單元 開孔, 電路板上 以對應至 内層 合一單元電路 合層而 上形成 電路層 與單元 板結構,如此 製得一 I C封裝 頂入該 一第二 電性連 電路板 重複前 基板多 基板為核心,於其上下表面分別以黏 板;使形成於該内層線路上之銲柱刺 單元電路板之開孔後,再於該介電層 電路層,如此,更外層之電路可藉由 接至第一電路層及内層線路;使該内 得以分開製作後,再壓合成一疊層基 述銲柱及單元電路板疊層步驟,即可 層疊合結構。Core Substrate), the lower surface of the core substrate, and a plurality of second light beams are formed on each of the upper and lower surfaces, and the laminated board is made of the first and the first circuit photoresist layer and the conductive wire resistance layer. A plurality of holes (Metal barrier layer, and a predetermined height to complete the inner layer process: the unit circuit circuit layer, the majority of the layer, the first path is smaller than the second diameter of the Posts) Opening: The photoresist layer is connected to the first conductive line, so that each soldering 0 _ board system has a dielectric opening for the unit, and the circuit board is formed to correspond to the inner layer to form a unit circuit laminated layer to form a circuit. Layer and unit board structure, so that an IC package is pushed into the second electrically connected circuit board to repeat the front substrate and multiple substrates as the core, and the upper and lower surfaces are respectively bonded to each other; so that the solder pillars formed on the inner layer circuit After puncturing the hole of the circuit board of the unit, the circuit layer of the dielectric layer is formed. In this way, the outer circuit can be connected to the first circuit layer and the inner circuit; after the inner is separately produced, it is pressed into a stack. Floor Based on the steps of laminating the solder post and the unit circuit board, the laminated structure can be obtained.

11

哪SI 17047. ptd 第9頁 200418150 五、發明說明(5) ' 本發明製法之一實施例,係在内層基板與單元電路板 之間佈設由介電材料(如聚丙烯(Ρ ο 1 y p r 〇 p y 1 e n e, P P )、聚亞驢胺(P ο 1 y i m i d e)、預浸材(P r e p r e g)等)製 成之黏合層,並以熱壓方法(Heat Press)取代逐層增層 ~技術將各單元電路板一次壓合成多層電路板,使各内層基 ‘板及單元電路板之間得藉由銲柱電性連接,進而簡化製作 流程並且縮短製程時間。 若以結構角度觀之,依上述製法製得之I C封裝基板多 層疊合結構包含有至少一内層基板,該内層基板具有一芯 板及形成於芯層基板上下表面之内層線路,該内層線 路於預定位置上形成有複數個導電銲柱;複數個單元電路 板,其具有一介電層與形成於該介電層表面之第一電路層 及第二電路層;多數黏合層,用以黏接該内層基板及單元 電路板.;該單元電路板上設有電性連接第一、二電路層之 多數導電孔,且至少一導電孔與内層基板上相對應之銲柱 電性連接。外部電路可藉由第二電路層與導電孔電性連接 至第一電路層以及内層線路。因單元電路板之導電孔係與 内層線路之銲柱電性連接,其所形成之多層封裝基板疊合 結構可大量減少習用技術以電鍍通孔(Ρ 1 a 1: i n g t h 〇 u g h h·^, PTH )貫穿多層基板之佈置,而可得一具高線路密 度之封裝基板。 【實施方式】: 一第一實施例: 請參閱第1圖說明本發明之I C封裝基板多層疊合結構Which SI 17047. ptd page 9 200418150 V. Description of the invention (5) '' An embodiment of the manufacturing method of the present invention, a dielectric material (such as polypropylene (P ο 1 ypr 〇) is arranged between the inner substrate and the unit circuit board. py 1 ene (PP), polyimide (P ο 1 yimide), prepreg (P repreg), etc., and the hot press method (Heat Press) instead of layer-by-layer build-up ~ technology will Each unit circuit board is laminated into a multi-layer circuit board at a time, so that each inner-layer base board and the unit circuit board are electrically connected by soldering posts, thereby simplifying the manufacturing process and shortening the process time. If viewed from a structural perspective, the multi-layered structure of the IC package substrate produced according to the above-mentioned manufacturing method includes at least one inner substrate, the inner substrate having a core board and inner layer circuits formed on the upper and lower surfaces of the core substrate. A plurality of conductive soldering posts are formed at predetermined positions; a plurality of unit circuit boards have a dielectric layer and a first circuit layer and a second circuit layer formed on the surface of the dielectric layer; most of the adhesive layers are used for bonding The inner layer substrate and the unit circuit board. The unit circuit board is provided with a plurality of conductive holes electrically connected to the first and second circuit layers, and at least one conductive hole is electrically connected to a corresponding solder post on the inner layer substrate. The external circuit can be electrically connected to the first circuit layer and the inner circuit through the second circuit layer and the conductive hole. Because the conductive holes of the unit circuit board are electrically connected to the solder pillars of the inner layer circuit, the multilayer packaging substrate stack structure formed by it can greatly reduce the conventional technology for plating through holes (P 1 a 1: ingth 〇ughh · ^, PTH ) Through the arrangement of the multilayer substrate, a package substrate with high circuit density can be obtained. [Embodiment]: A first embodiment: Please refer to FIG. 1 to explain the multi-layer structure of the IC package substrate of the present invention.

17047. ptd 第10頁 200418150 五、發明說明(6) ^~ ----—-〜 之面示〜圖以/、層封裝基板為例,本發明之I c封事夷 板1係包含至少一内層基板10( Inner Substrate)、最; 於内層基板10正反面上之複數片單元電路板Η,以及:二 黏合该内層基 '反1 〇與單元電路板i i之黏合層i 2,其中,該 内層基板1 G係藉由其内層線路丨Q 2上所形成的複數個導: 銲柱103 ( Conductlve posts)電性導接至各單元電路二 11° 田 以下请苓閱第2 A至2 K圖詳細說明此一 I c封裝基板多層 豐合結構之整體製作流程,惟本發明之丨〇封裝基板製造方 法係土 ^内層基板製程及單元電竑板疊層製程兩階段,因 此本貫施例分別以第2人至2F圖及第2(^至2}[圖依序說明内層 基板製程以及單元電路板疊層製程。 首先進行内層基板製程: 如,第2A圖所示,備妥一如玻璃布(Giass Cloth)、 順雙丁稀二酸亞酸胺三氮樹脂(Bismaleimide Triazine17047. ptd Page 10 200418150 V. Description of the invention (6) ^ ~ -------- The surface is shown ~ The figure takes / and the layer package substrate as an example. The I c sealing board 1 of the present invention contains at least An inner substrate 10 (Inner Substrate), a plurality of unit circuit boards 正 on the front and back surfaces of the inner substrate 10, and: two adhesive layers i 2 which adhere the inner substrate 'inverse 10' and the unit circuit board ii, wherein, The inner substrate 1 G is formed by a plurality of conductors formed on its inner circuit 丨 Q 2: Welding posts 103 (Conductlve posts) are electrically connected to each unit circuit 11 ° Below the field, please read 2A to 2 Figure K details the overall manufacturing process of the multi-layer abundance structure of this IC packaging substrate. However, the manufacturing method of the packaging substrate of the present invention is a two-stage process including an inner substrate process and a unit electrical panel stacking process. For example, the second person to 2F and the second (^ to 2} [figure] are used to explain the inner substrate process and the unit circuit board stacking process in order. First, the inner substrate process is performed: as shown in Fig. 2A, prepare one Such as glass cloth (Giass Cloth), maleic acid diamine nitrite resin (Bismaleim ide Triazine

Resin,BT Resin)或FR-4樹脂、FR-5樹脂(均為商品名 )材貝之芯層基板1 0 Q ( C〇r e s u b s t r a t e),該芯層基板 10 0具有一上表面100 a及一相對之下表面l〇〇b,於該芯層 基板1 0 0上以習用鑽孔技術(Dr i 1 1 i ng)鑽製多數貫孔 1 0 0 c 〇 接著’如第2 B圖所示,於該芯層基板1 〇 〇之上下表面 100a,100 b以及貫孔1〇〇说壁預鍍一導電金屬層ι〇ι(如底 銅),再如第2C圖所示,於該導電金屬層1〇1上佈覆/第 一光阻層1 3,該第一光阻層1 3具有複數個第一開口 i 3 〇,(Resin, BT Resin) or FR-4 resin, FR-5 resin (both trade names) core substrate 10 Q (Cresubstrate), the core substrate 100 has an upper surface 100 a and a Relative to the lower surface 100b, a large number of through holes 1 0 0 c are drilled on the core substrate 100 by conventional drilling technology (Dr i 1 1 i ng), and then 'as shown in FIG. 2B A conductive metal layer (such as copper) is pre-plated on the top and bottom surfaces 100a, 100b and the through hole 100 of the core substrate 100, and then as shown in FIG. 2C, The metal layer 101 is covered with a first photoresist layer 13, and the first photoresist layer 13 has a plurality of first openings i 3.

17047. ptd17047. ptd

200418150 五、發明說明(7) 禅供沉積導電線路而於該第一開口 1 3〇處形成内層線路 102° 一 接著,如第2D圖所示,於該第一光阻層丨3上另佈覆一 =二光阻層1 4,該第二光阻層1 4對應於該内層線路1 〇2預 疋處上形成有複數個孔徑小於該第一開口 1 3 0之第二開口 '14 0。 之後,如第2 E圖所示,於該第二開口 1 4 0處以傳統電 解式 /無電鍍(Electro Plating / Electr〇iess Platiru )、蒸鍍(Evaporation)、物理氣相沉積 f Physical _dor Deposition)、化學氣相沉積(chemical Vapor /Position)等方式沉積金屬銲料或其他導電物質,使得 ,阻層移除後,可於預定之内層線路i 〇 2上形成複數個導 1〇3( (其中尤以銅、銅合金 銲柱(Metal P〇sts)者為佳)。該導電銲柱1〇3可 、目銅、銅合金、紹、奴人a μ # 鋁。金或其他導電材料製成。 接著,如第2 F圖所示,清哈馀 除韭道+ △ 、蓄+人 〆月除弟一及第二光阻層,並移 導電峙玖1 η 9箱—冷报λ、 1〇1使芯層基板1 〇 〇表面上之 ^ %緣路1 〇 2預疋處形成呈遴奴h α 板10的製程步驟。 /、 個銲柱10 3,而完成内層基 •而後,進入單元電路板聂 笔路板與内層基板之間的連 Υ自段,惟為清楚示意單元 單元電路板及一下層單元#狄關係’本實施例僅以一上層 史疊層過程,其他於上下層單_為例簡單敘述單元電路板 多層I C封裝基板,如有使用2几電路板外部所實施製作 述内層基板與單元電路板200418150 V. Description of the invention (7) An inner layer circuit 102 ° is formed at the first opening 130 by depositing a conductive line. Then, as shown in FIG. 2D, another line is placed on the first photoresist layer 3 Covering one = two photoresist layers 14, the second photoresist layer 14 corresponds to the second opening '14 0 having a plurality of apertures smaller than the first opening 1 3 0 at the pre-position of the inner layer circuit 102. . After that, as shown in FIG. 2E, traditional electrolytic / electroless plating (Electroplating / Electroplating), evaporation, and physical vapor deposition (f Physical _dor Deposition) are performed at the second opening 140. Or chemical vapor deposition (chemical Vapor / Position) and other methods to deposit metal solder or other conductive materials, so that, after the removal of the resistive layer, a plurality of conductors 103 (of which Copper or copper alloy welding rods (Metal P0sts) are preferred. The conductive welding rod 103 can be made of copper, copper alloy, Shao, slaves, a μ # aluminum. Gold or other conductive materials. Next, as shown in Fig. 2F, Qingha removes the chives + △, storage + the person's first month and the second photoresist layer, and moves the conductive 峙 玖 1 η 9 box-cold report λ, 1〇 1 Make the ^% edge on the surface of the core substrate 100. The process steps to form the slave plate α 10 at the preliminaries are formed at the preliminaries. / 、 Welding pillars 10 3, and complete the inner layer base, and then enter the unit Circuit board Niebi circuit board and the internal connection between the base board from the paragraph, but to clearly indicate the unit circuit board and Unit # Di relation 'This embodiment only uses a stacking process of the upper layer, other than the upper and lower layers_ as an example to briefly describe the unit circuit board multi-layer IC package substrate. If two or more circuit boards are used to implement the inner substrate and the Unit circuit board

五、發明說明(8) 電性連結方式時,仍未脫 現即以第2G圖至第1 ^电明之可實施範圍。 元電路板及下層單元電二砰細說明本實施例中, 電路板與下層單元電路然因該上以 口’是故’下層單元電路:、中製作方式完全相 同之兀件,蓋依照上層路=::電路板功效相 如第2G圖所示,先::板之兀件付說表示。 於該介電層11味面之第片具有一介電層11〇及形成 單元電路板1 1上開設有貫穿八層+1 1 1之早元電路板丄丨,該 ⑴之多數開孔112’且每層110與气第—電路層 =銲柱(未圖示)相互對應ϋ各與内層基板上形成 可於玻璃纖維(GUSS Flb 又早兀笔路板11之選用 P〇lyester)或環氧樹脂層Γ 、聚酚樹脂(Ph e no i i c 合銅落(Resm C0ated c曰〉几積二銅層,或使用樹脂壓 製作俱為習知’故不於此贅述6: 惟此單元電路板之 接著,如第2H圖所示,' =二 内層基板10正反兩面之内居内層基板10為核心,於該 醢胺(Poly wide)、環氧曰料7路1 02上分別佈覆一如聚亞 製成之黏合層12,使一黏接( Epoxy)或其他黏合材料 電路板1 1 (稱作上層單元恭跤内層基板1 0正面1 0 〇 a之單元 1 0反面1 0 0 b之單元電路板^板)以及二黏接於内層基板 以其第一電路層1 11面向内稱作下層單元電路板)分別 10壓合黏接,俾令形成於泉路1〇2之方式與該内層基板 刺穿該黏合層12,而頂入^ S層線路1〇2上之導電銲柱103 、上層及下層單元電路板^^之 200418150 五、發明說明(9) --—-- 開_孔1 1 2,如第2 I圖所示。 :後,如第2J圖所示,於單元電路板以介電層11〇 7 I . 1 2表面形成一導電金屬層,沉積整層導電層11 3後 且、顯影、'虫刻等方法,“製作—第二電路層1“ :複數個填滿導電材質之導電孔115,如第_所示。此 外丄亦可如前述第2C圖所示形成内層線路1〇2之方法形成 第1電路層114。是以,外部電路(未圖示)應用於如 性^之封裝基板卜可藉由第二電路層11慎導電孔 上層及下層單元電路層電性導接…,該内層 i = f單元電路板11得以分開製作後,再壓合成-多 層I層基板結構,藉此縮短量產時間並 驟的目的。 沒巧間化衣步 再·如第1圖所示,以結構角度觀之,卜、+.剧、t制 1C封裝基板多層疊合結構m含有至少—内=二付; 内層基板1 0具有一芯層基板i 00及形 ^ 2 以 表面100a,l〇〇b之内層線g 1Q2, #成 ' '。層基板1〇〇上下 置上护占古、-把加,.. °亥内層線路102於預定位 = ^銲請;複數個單元電路板11, #電路層1 1 1及第-雷路厗]彳4 · / u 0表面彼此對應之 接該内層基板10及|—4層 多數黏合層12,用以黏 電性連接;:::;路板11;該單元電路板11上設有 少-導電孔115與内、美:上114:二數導電孔115’且至 接。外部電路可藉由目:,枝103電性連 弟'-I路層1 1 4與導電孔1丨5電性連接V. Explanation of the invention (8) When the electrical connection method is not found, the implementation range of the second graph to the first ^ Tianming is implemented. Element circuit board and lower-level unit are described in detail. In this embodiment, the circuit board and the lower-level unit circuit are the same as the upper-level circuit. = :: The efficiency of the circuit board is similar to that shown in Figure 2G. The first piece of the dielectric layer 11 has a dielectric layer 110 and a unit circuit board 11 is formed with an early element circuit board 丄 through eight layers +1 11, and most of the openings 112 of the ⑴ 'And each layer 110 corresponds to the gas-circuit layer = soldering post (not shown). Each and the inner layer substrate are formed on glass fiber (GUSS Flb and early choice of circuit board 11). Oxygen resin layer Γ, polyphenol resin (Ph e no iic) (Resm C0ated c)> two copper layers, or using resin pressing is well known ', so I will not repeat them here 6: But this unit circuit board Then, as shown in FIG. 2H, '= the inner substrate 10 on the front and back sides of the two inner substrates 10 are the cores, and one of them is respectively coated on the poly wide and epoxy resin 7 and 102. For example, the adhesive layer 12 made of Juya makes an adhesive (epoxy) or other adhesive material circuit board 1 1 (called the upper layer unit to respect the inner layer substrate 1 0 front 1 0 〇a unit 1 0 reverse 1 0 0 b Unit circuit board (^ board) and two bonded to the inner substrate with the first circuit layer 11 11 facing inward is called the lower unit circuit board) 10 respectively The order is formed in the way of spring road 102 and the inner substrate penetrates the bonding layer 12, and the conductive pillars 103 on the ^ S layer circuit 102, the upper and lower unit circuit boards ^^ 200418150 V. Description of the invention (9) ----- Opening the hole 1 1 2 as shown in FIG. 2I .: Later, as shown in FIG. 2J, a dielectric layer 1107 I is applied to the unit circuit board. 1 2 A conductive metal layer is formed on the surface, and the entire conductive layer 11 is deposited. The method of “production—the second circuit layer 1” after the development of “3,” and “insect engraving”: a plurality of conductive holes 115 filled with a conductive material, such as the first _ Shown. In addition, the first circuit layer 114 can also be formed by the method of forming the inner layer circuit 102 as shown in the aforementioned FIG. 2C. Therefore, an external circuit (not shown) can be applied to a packaging substrate such as With the second circuit layer 11 carefully conducting the conductive holes of the upper and lower unit circuit layers, the inner layer i = f unit circuit board 11 can be manufactured separately, and then pressed into a multi-layer I-layer substrate structure, thereby reducing the amount. The purpose of the production time is not coincident. As a coincidence, as shown in Figure 1, from a structural point of view, Bu, +. Drama, t 1C package substrate The multilayer structure m contains at least -inner = two pairs; the inner substrate 10 has a core substrate i 00 and a shape ^ 2 with an inner layer line g 1Q2, # 成 'on the surface 100a, 100b. The layer substrate 1 〇〇Upper and lower guards Zangu, -Banga, .. ° Inner layer line 102 is at the predetermined position = ^ welding please; a plurality of unit circuit boards 11, #circuit layer 1 1 1 and first-thunder road 厗] 厗 4 · / U 0 surface is connected to the inner substrate 10 and | —4 most adhesive layers 12 for adhesive electrical connection; :::; circuit board 11; the unit circuit board 11 is provided with few-conductive holes 115 and inner and beauty: upper 114: two conductive holes 115 'and reach. The external circuit can be electrically connected to the conductive hole 1 丨 5 by the branch 103-I circuit layer 1 1 4

17047. ptd 第14頁 2P0418150 五、發明說明(10) 至第一電路層111以及内層線路1〇2。因此,内層基板與單 兀電路板得以分開製作,再壓合成一封裝基板多層疊合結 構。另因單元電路板之導電孔1 1 5係與内層線路1 0 2之銲柱 1 〇 3電性連接,其所形成之多層封裝基板疊合結構1可大量 減> 4用技術以電鍍通孔(Piating though hole, PTH ) 貝穿多層基板之佈置,而可得一具高線路密度之封裝基 板。 差〜三Ijj例: , 第3 A及3 C圖係顯示本發明之I c封裝基板/多層疊合結構 之另—實施例,多層封裝基板2 0可如第2 J圖所示於表面形 成—導電金屬層,重複如第2B圖至第2F圖所示之製程步 驟’即可於基板表面之電路層2 1 4形成有導電銲柱2 0 3如第 3A圖所示。接著,如第3B圖與第3C圖所示,依前述實施例 壓合單,元電路板2卜黏合層2 2與多層封裝基板2 0之製程步 並進行沉積導電層、蝕刻等製程,以於基板製作電路 層2 1 6及複數個填滿導電材質之導電孔2 1 5。如第3 C圖所示 即係具有十層線路層之封裝基板2多層疊合結構,本實施 例以熱壓方法(Heat Press)取代逐層增層技術將各單元 笔路板2 1 ~次壓合成多層疊層基板結構,使得該内層基板 與各單元電路板2 1之間可如前述實施例藉由銲柱2 0 3電性 連接’藉此縮短量產時間兼可簡化製作流程。 以上所述僅為本發明之較佳實施例而已,並非用以限 疋本兔明之實質技術内容範圍’本發明之實質技術内容係 -義地疋義於下述之申請專利範圍中,任何他人完成之技17047. ptd page 14 2P0418150 V. Description of the invention (10) to the first circuit layer 111 and the inner layer circuit 102. Therefore, the inner substrate and the single circuit board can be manufactured separately, and then pressed into a multi-layer structure of a package substrate. In addition, because the conductive holes 1 1 5 of the unit circuit board are electrically connected to the solder pillars 1 0 3 of the inner layer circuit 102, the multilayer packaging substrate stack structure 1 formed by the circuit board can be greatly reduced > The arrangement of holes (Piating though hole, PTH) through the multilayer substrate can obtain a packaging substrate with high circuit density. Poor ~ Three Ijj cases:, Figures 3 A and 3 C show another example of the I c package substrate / multi-layer laminated structure of the present invention—an embodiment, a multilayer package substrate 20 can be formed on the surface as shown in Figure 2 J —Conductive metal layer, repeating the process steps shown in FIG. 2B to FIG. 2F, the conductive layer 2 0 3 can be formed on the circuit layer 2 1 4 on the substrate surface as shown in FIG. 3A. Next, as shown in FIG. 3B and FIG. 3C, according to the foregoing embodiment, a single step is performed, the process steps of the meta circuit board 2 and the adhesive layer 22 and the multi-layer packaging substrate 20 are performed, and a process of depositing a conductive layer and etching is performed. A circuit layer 2 1 6 and a plurality of conductive holes 2 1 5 filled with a conductive material are fabricated on the substrate. As shown in Figure 3C, it is a multi-layer laminated structure of the packaging substrate 2 with ten circuit layers. In this embodiment, the heat press method (Heat Press) is used to replace the layer-by-layer build-up technology to place each unit pen board 2 1 ~ times. The laminated multi-layered substrate structure is pressed, so that the inner layer substrate and each unit circuit board 21 can be electrically connected through the soldering posts 20 as in the foregoing embodiment, thereby reducing mass production time and simplifying the manufacturing process. The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the essential technical content of the present invention. The essential technical content of the present invention is-in the true meaning of the scope of the patent application described below. Completion

第15頁 200418150Page 15 200418150

17047. ptd 第16頁 200418150 I圖式簡單說明 ί【圖式簡單說明】: 第1圖係本發明之I C封裝基板多層疊合結構之剖面示 丨意圖; ’17047. ptd page 16 200418150 I Schematic description ί [Schematic description]: Figure 1 is a cross-sectional view of the multi-layered structure of the IC package substrate of the present invention 丨 Intent; ’

II

I ; 第2 Α至2 Κ圖係本發明第一實施例之封裝基板多層疊合 I結構製法之製程不意圖, i 第3 A至3 C圖係本發明第二實施例之封裝基板多層疊合 結構製法之製程示意圖; 第4A至4C圖係以習知熱壓方法製造多層封裝基板之示 意圖;以及 / 第5 A至5 D圖係以習知增層方法製造多層封裝基板之示 意圖。 1,2 | 10,41,51 1 00, 51 1 100a 100b 100c, 41c, 513 101 封裝基板多層疊合結構 内層基板 芯層基板 芯層上表面 芯層下表面 怎層貫孔 導電金屬層 1 0 2,4 1 a,4 1 b,5 1 2,5 1 2 内層線路 1 0 3, 2 0 3 導電銲柱 11,21,41,42, 43 單元電路板 110,55 介電層 第一電路層 1 1 1,42a,43a,553I; Figures 2A to 2K are not intended for the manufacturing process of the multi-layered packaging substrate of the first embodiment of the present invention and I structure manufacturing method, and Figures 3A to 3C are the multi-layered packaging substrates of the second embodiment of the present invention. Schematic diagram of the manufacturing process of the composite structure method; Figures 4A to 4C are schematic diagrams of manufacturing a multilayer package substrate by a conventional hot pressing method; and / Figures 5A to 5D are schematic diagrams of manufacturing a multilayer package substrate by a conventional layer increasing method. 1,2 | 10,41,51 1 00, 51 1 100a 100b 100c, 41c, 513 101 Package substrate multi-layer laminated structure inner layer substrate core layer substrate core layer upper surface core layer lower surface through hole conductive metal layer 1 0 2, 4 1 a, 4 1 b, 5 1 2, 5 1 2 Inner layer circuit 1 0 3, 2 0 3 Conductive welding posts 11, 21, 41, 42, 43 Unit circuit board 110, 55 Dielectric layer first circuit Layer 1 1 1, 42a, 43a, 553

17047. ptd 第17頁 200418150 第 第 圖式簡單說明 ίΐ2, 552 113, 42b, 43b 115,215 12, 22, 44 13 130 14 140 40,50 開孔 第二電路層 導電孔 黏合層 光阻層 開口 第二光阻層 第二開口 多層電路板 貫穿通孔'17047. ptd p. 17 200418150 Schematic description of ΐ2, 552 113, 42b, 43b 115,215 12, 22, 44 13 130 14 140 40,50 Opening second circuit layer conductive hole adhesive layer photoresist layer opening second Photoresist layer second opening multilayer circuit board through-hole '

17047.ptd 第18頁17047.ptd Page 18

Claims (1)

200418150 申請專利範圍 一種I C封裝基板多 1 . 提供至 内層基板具 面之内層線 預定高度之 及形成於該 該單元電路 路層之開孔 藉多數 令該内層基 路板之開孔 於該單 導電金屬層 少一内 有一芯 路,俾 導電銲 介電層 板上開 ,以與 黏合層 板上之 ;以及 元電路 ,以形 層疊合結構之製作方法,係包括: 層基板以及複數個單元電路板,該 層基板及形成於該芯層基板上下表 於預定之内層線路上形成複數個具 柱,而該單元電路板則由一介電層 表面之第一電路層所構成,其中, 設有複數個貫穿該介電層及第一電 各銲柱彼此對應; 黏接該内層基板及單元電路板,俾 , / 銲柱刺穿該黏合層而頂入該單元電 板外側表面與前述介電層開孔沉積 成一第二電路層於疊層基板之表面 2. 如申請專利範圍第1項之製作方法,其中,該銲柱係一 金屬材質所製成。 3. 如申請專利範圍第2項之製作方法,其中,該金屬材質 係為銅。 4. 如申請專利範圍第2項之製作方法,其中,該金屬材質 係為銅合金。 5. 如申請專利範圍第1項之製作方法,其中,該内層基板 與單元電路板之黏接係採熱壓方式(Heat Press)壓 合。 6. 如申請專利範圍第1項之製作方法,其中,該黏合層係200418150 The scope of patent application is more than one IC package substrate 1. The predetermined height of the inner layer line provided to the inner substrate surface and the openings formed in the circuit layer of the unit are made by the majority to make the openings of the inner substrate circuit board to the single conductive There is a core in one of the metal layers, and the conductive solder dielectric layer is opened to adhere to the laminated layer; and the manufacturing method of the element circuit and the laminated structure includes: a layer substrate and a plurality of unit circuits Board, the layer substrate and a plurality of pillars formed on the core layer substrate on a predetermined inner layer line, and the unit circuit board is composed of a first circuit layer on the surface of a dielectric layer, wherein: A plurality of soldering columns penetrating through the dielectric layer and the first electrical layer correspond to each other; bonding the inner substrate and the unit circuit board, 俾, / the soldering columns pierce the bonding layer and push into the outer surface of the unit electric plate and the aforementioned dielectric A layer of holes is deposited to form a second circuit layer on the surface of the laminated substrate. 2. The manufacturing method of item 1 in the scope of the patent application, wherein the welding post is made of a metal material. 3. The manufacturing method of item 2 in the scope of patent application, wherein the metal material is copper. 4. The manufacturing method according to item 2 of the patent application scope, wherein the metal material is a copper alloy. 5. The manufacturing method according to item 1 of the scope of patent application, wherein the bonding between the inner substrate and the unit circuit board is heat-pressed. 6. The manufacturing method according to item 1 of the scope of patent application, wherein the adhesive layer is 17047. ptd 第19頁 200418150 六、申請專利範圍 由選自聚亞酸胺(Ρ ο 1 y i m i d e)、環氧樹脂(Ε ρ ◦ X y) 、聚丙烯(P o 1 y p r o p y 1 e n e, P P)及其他黏合材料所組 組群之一者所製成。 7.如申請專利範圍第1項之製作方法,其中,該黏合層係 一由絕緣性樹脂膠片製成之預浸片(Prepreg)。 -8 . —種供形成封裝基板多層疊合結構之内層基板之製作 方法,係包括: 備妥一芯層基板,該芯層基板之上下表面各形成 有一導電金屬層; , / 佈覆一第一光阻層至該導電金屬層,該第一光阻 層具有複數個第一開口 ,俾供導電線路形成其中; 佈覆一第二光阻層至該第一光阻層,該第二光阻 層對應於該導電線路預定處形成有複數個第二開口; .沉積導電材質於該第二開口;以及 清除該第一、第二光阻層,並移除非導電線路之 導電金屬層,以於預定之内層導電線路上形成複數個 具預定高度之導電銲柱。 9.如申請專利範圍第8項之製作方法,其中,該芯層基板 係選自如玻璃布、順雙丁烯二酸亞醯胺三氨樹脂 ·( Bismaleimide Triazine Resin,BT Resin) 、FR-4 樹脂及F R - 5接f脂等材質製成。 1 0 .如申請專利範圍第8項之製作方法,其中,該導電性金 屬層係為銅。 1 1 .如申請專利範圍第8項之製作方法,其中,沉積導電材17047. ptd page 19 200418150 6. The scope of patent application is selected from the group consisting of polyimide (P ο 1 yimide), epoxy resin (E ρ ◦ X y), polypropylene (P o 1 ypropy 1 ene, PP) and Made of one of the other groups of adhesive materials. 7. The manufacturing method according to item 1 of the patent application scope, wherein the adhesive layer is a prepreg made of an insulating resin film (Prepreg). -8. A method for manufacturing an inner layer substrate for forming a multi-layer laminated structure of a package substrate, comprising: preparing a core substrate, each of which has a conductive metal layer formed on the upper and lower surfaces thereof; A photoresist layer to the conductive metal layer, the first photoresist layer has a plurality of first openings for forming conductive lines therein; a second photoresist layer is coated to the first photoresist layer, and the second light A plurality of second openings are formed in the resistive layer corresponding to the predetermined position of the conductive line; a conductive material is deposited on the second opening; and the first and second photoresistive layers are removed, and the conductive metal layer of the non-conductive line is removed, In order to form a plurality of conductive welding posts with a predetermined height on a predetermined inner-layer conductive line. 9. The manufacturing method according to item 8 of the scope of the patent application, wherein the core layer substrate is selected from the group consisting of glass cloth, maleimide triazine resin (BT Resin), FR-4 Made of resin and FR-5 with f grease. 10. The manufacturing method according to item 8 of the scope of patent application, wherein the conductive metal layer is copper. 1 1. The manufacturing method of item 8 in the scope of patent application, wherein the conductive material is deposited 17047. ptd 第20頁 200418150 六、申請專利範圍 質於該第二開口係 1 2 .如申請專利範圍第 質係為銅。 1 3 .如申請專利範圍第 質係為銅合金。 1 4 . 一種I C封裝基板多 至少一内層基 及形成於該芯層基 線路上形成有複數 複數個單元電 介電層表面之第一 多數黏合層, ;以及 ,該單元電路板 多數導電孔,且至 銲柱電性連接。 1 5 .如申請專利範圍第 該内層基板與單元 Press)壓合。 1 6.如申請專利範圍第 該單元電路板係以 一金屬材質所製成。 11項之製作方法,其中 該金屬材 1 1項之製作方法,其中,該金屬材 層疊合結構,係包括: 板,該内層基板包括有一芯層基板 板表面之内層線路,其中,該内層 個具預定高度之導電銲柱; 路板,其具有一介電層與形成於該 電路層及第二電路層; 用以黏接該内層基板與單元電路板 上設有電性連接第一、二電路層之 少一導電孔與内層基板上相對應之 1 4項之基板多層疊合結構,其中, 電路板之黏接係採熱壓方式(Heat 1 4項之基板多層疊合結構,其中, 疊層方式形成於該内層基板上。17047. ptd page 20 200418150 6. Scope of patent application The quality of the second opening is 1 2. If the scope of patent application is copper. 1 3. If the scope of patent application is the quality of copper alloy. 14. An IC package substrate having at least one inner layer base and a first plurality of adhesive layers formed on the surface of the core layer with a plurality of unit dielectric layers formed thereon; and a plurality of conductive holes of the unit circuit board, And it is electrically connected to the welding column. 1 5. According to the scope of the patent application, the inner substrate and the unit are pressed together. 1 6. According to the scope of patent application, the unit circuit board is made of a metal material. The manufacturing method of item 11, wherein the manufacturing method of item 11 of the metal material, wherein the laminated structure of the metal material includes: a board, the inner substrate includes an inner layer circuit having a core substrate surface, and the inner layer Conductive welding pillars with a predetermined height; a circuit board having a dielectric layer and formed on the circuit layer and the second circuit layer; an electrical connection for bonding the inner substrate and the unit circuit board is provided; The circuit layer has one less conductive hole and the corresponding 14-layer multi-layer laminated structure on the inner substrate. Among them, the circuit board is bonded by hot pressing (Heat 14 4-layer multi-layer laminated structure, of which, A lamination method is formed on the inner substrate. 17047.ptd 第21頁17047.ptd Page 21
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US8796706B2 (en) 2009-07-03 2014-08-05 Seoul Semiconductor Co., Ltd. Light emitting diode package
US9048391B2 (en) 2009-07-03 2015-06-02 Seoul Semiconductor Co., Ltd. Light emitting diode package
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