TWI227649B - Manufacturing method for organic EL device - Google Patents

Abstract

A method for manufacturing an organic EL display device is provided, capable of improving an opening ratio and providing narrower pitches for narrowing non-lighting portion between pixels, and, at the same time, capable of eliminating short-circuiting between display pixels for eliminating cross-talk and non-lighting pixels. In the deposition process of the cathode 6, the incident angle of the deposition material onto the substrate is optimized by optionally changing parameters such as a distance between the substrate 1 and the mask 11 and a distance between the substrate and the point deposition source 13. Thus, deposition material from a plurality of deposition sources impinges onto the substrate surface obliquely passing at a different incident angles though opening (slits 11a) of the mask 11, so that the width 10 of the electrode pattern 6 becomes broader than the width of the slit by superposition of the deposition material passing through the slits at different incident angles.

Description

1227649 V. Description of the invention (1) [Field of the invention] The present invention relates to a method for manufacturing an organic electro-laser element (〇rganic electro-luminescence deviCe; 〇rganic EL device). This component is used on computers and televisions or similar displays. [Know-how] An electro-laser element using an organic material as a cold light material is called an organic electro-laser element. An organic electro-laser display using an organic electro-laser element has the following advantages and characteristics: (1) High luminous efficiency

(2) Low driving voltage (3) Various colors can be displayed (4) Because it is spontaneous light emission, there is no need to use a backlight (5) No viewing angle limitation (6) Thin and light (7) High response speed ( 8) The use of a flexible substrate organic electro-optical laser element has attracted attention because they can replace liquid crystal display (LCD) elements.

Fig. 9 is a perspective view showing a schematic structure of an organic electro-optical laser element in a simple matrix system. A plurality of juxtaposed transparent anodes 2 are patterned on the surface of the transparent glass substrate 1 (substrate); an organic positive hole transporting layer 3 is formed on the anode 2. The organic light emitting layer is an organic light emitting layer. (Organic iuminescent

2162-3925-PF; amy.ptd Page 6 1227649 V. Description of the invention (2) layer) 4 and then an organic electron transporting layer 5 ° Then a layer is formed on the organic electron transporting layer 5 The cathode 6 is perpendicular to the plurality of parallel transparent anodes 2. The anode 2 is formed by depositing an indium tin oxide (I TO) layer by sputtering or the like, and then etching the ITO layer to form a plurality of parallel lines.

After the organic layer 7 is deposited on the anode 2 by a vacuum deposition method (such as resistance heating method); the cathode 6 is a vacuum deposition method (such as resistance heating deposition method or electron beam deposition method), or by using a shadow mask (sha (j 〇w mask) sputter deposition method) to form a plurality of lines parallel to each other. Alternatively, before forming the cathode 6, an inorganic thin film may also be formed. For example, an electron injection layer (electrON) composed of inorganic fluoride injection layer), this layer is formed by a vacuum deposition method such as resistance heating method, electron beam deposition method, or sputtering method. The anode 2 and the cathode 6 described above are staggered perpendicular to each other. The cathode 6 is usually made of aluminum, magnesium, and silver. Alloys, aluminum-lithium alloys, or indium alloys, etc. The thin film deposition process of the upper resistance heating method is often used in the formation of the cathode 6.

In this deposition step, in the aforementioned deposition material SQurce), the deposition source is made of Gao_Jiyouji such as urine, button, or molybdenum, and is placed under the substrate i. Fill the core material with the core material and heat the

2162-3925-PF; amy.ptd $ 7, page 1227649 V. Description of the invention (3) After reaching the pre-chill temperature, the sink substrate will be evaporated and deposited on the substrate surface. Generally speaking, the deposition source is placed directly in the center of the substrate. At the lower position of ~, the resulting film will be more uniform; sometimes it cannot be placed below the center of the substrate due to the shape restrictions in the sedimentation reactor, and it can also be placed below the place where the substrate is to be deposited. 3 For example, when the stripe cathode 6 is formed by using a masking method, the masking mask is formed by etching a thin metal flat plate to form a plurality of stripe patterns, and then attaching the etched metal plate to the substrate tightly. To facilitate the next deposition step.

When the cathode 6 is deposited under the substrate as described above, in order to increase the luminous opening ratio at the intersection between the cathode 6 and the anode 2, it is necessary to reduce the metal strip shape between the openings (slits). Part to widen the opening area of the metal mask. Generally speaking, this metal mask can be manufactured by many methods, such as laser processing, additional processing (electroforming)

Processing (electrforming) method), and wet etching method, however, it is difficult for the above method to handle fine spaces smaller than 0.1 mm. Since the mechanical strength of the strips between the slits is not very weak, it is difficult for the photomask to form such a fine metal texture, because a strip of metal may be deformed or damaged.

The uncounted patent application disclosed in the Japanese Patent No. 10-5047j for the first time is the counter measure, which attaches a reinforcing line r to the photomask to prevent it from happening. Light distortion.

Page 8 1227649 V. Description of the invention (4) However, in view of the conventional method of forming a cathode, in order to obtain the desired pattern width of the cathode 6, the width of the strip metal between the slits of the mask must be the same as the pattern of the cathode 6. This will lead to complicated process steps. In contrast, it is impossible for a general photomask to reduce the gap between the cathode strips == 〇 / long or smaller. Since the slit width of the photomask cannot be less than 0mm,-: slit: I can use the substrate 1 , Mask, and the relative position of the deposition source to make = I ^ see again finer. Therefore, a problem with the conventional method is that the slit width cannot be made smaller than 0. lnin. Chigu: The organic film of the lower cathode is formed, and the volatile matter or deposition material is on the organic film in the center of the substrate on the side of the mi deposition source. Therefore, the kinetic energy of the deposited material or deposited atoms sometimes causes σ γ to be destroyed or agglomerated, and pin-holes are usually caused by changes in the surface ft surface type of the organic film. Produced by the impact of the sedimentary material (bumPing) in the raw sedimentary source, = = (cluster) vertical action (impinge) to the organic film, especially when, especially when the damage to the organic film is particularly obvious. 2, Putian sedimentary material reacts with oxygen or nitrogen in the air to oxidize or nitride, so that this film does not have the short characteristics caused by small holes on the surface of the organic film. Shows normal rectification (rectification as shown in Fig. 10). The pole formation method will affect the operating characteristics of the conventional cathode electromechanical laser display element under the conventional single-array driving method.

1227649 V Description of the invention (5) White knot II =. The black-continuous driving mode of an organic electro-optical laser display with a 6 X 6 simple array structure (for Hne Se-tial components, as shown in Figure 7) The anode of the organic electro-laser element with a simple array structure is connected to The current source or voltage source is as shown in the figure "Voltage", while the cathode is regarded as the scanning electrode (1 1 EJ), and it is continuously scanned in time. H2 is transformed into a low-power organic holmium laser vowel that excites Λ at the intersection of the data electrode 11 and the potential V1, so a forward current flows in, and the organic electricity is relatively speaking, if the data electrode ι3 and the scan Electricity; ^ S > > & The light-emitting area at the intersection with the tracing electrode s4 will show no electricity ^ Therefore, at time B in Fig. 11, because the electricity is scanned ^, the bit is G ' The light-emitting area of the display is excited in the direction of current ^ 3 '^ 4 and the current flows in the direction of arrow 9. Bai Beishun When some organic electric laser elements are short-circuited, when selecting the current supplied from the data driver to the light-emitting area, Nowhere, so according to Figure 11 As shown in the timing diagram, when: ,, 'are in the ⑽ state, because the scanning voltage is different, the ^ L electrode is converted into a pixel that the current will flow into the data electrode 13, but the data pixel is constant and the short-circuit organic electric laser is Except for the components. The 3 way of it is therefore 'During driving organic electro-laser components, along page 10 2162-3925-PF; amy.ptd 1227649

V. Description of the invention (6) ’Some organic electro-laser elements are cross-talk. The vertical pixels are usually bright. The short circuit described above may cause non-light emitting pixels or crosstalk. [Objective and Summary of the Invention] Exciting Imoto! ::: To overcome the aforementioned problem, ‘provide a method of manufacturing organic electricity: the first method: the & method can increase the opening area of the display and reduce the gap between the lightless portions between pixels. Shifa: Another purpose is to provide a reduction in organic electro-optical laser display. ^ Avoid defective pixels and crosstalk caused by dullness.

According to a first aspect of the present invention, a process method for an organic electro-optical laser display element includes < Step 1 > first forming a first stripe electrode pattern on a substrate surface; < Step 2 > A multi-layered structure including an organic layer is formed on a substrate of an electrode pattern; < Step Three > A second stripe electrode pattern is formed on the first electrode pattern and perpendicular to the first electrode pattern. The pattern is formed by placing a photomask between the deposition source of the electrode substance and the substrate and a predetermined distance from the substrate, and depositing the deposition material on the surface of the multi-layer structure through the slit of the photomask; The deposition source will be placed at a specific position so that the deposition material is deposited on the substrate surface at a specific incident angle.

According to a second aspect of the present invention, in the aforementioned method for manufacturing an organic electro-optical laser display element, the second deposition source is placed at a specific position on a projected line at the position of the first deposition source, and is in the same shape as the second stripe. Electrodes are parallel 'and distance from a vertical line through the center of the substrate to the first deposition source

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V. Description of the invention (7) Same as the second deposition source According to the third aspect of the present invention, the manufacturing method of the organic electro-optical laser display element further includes: after completing < step three >, proceeding to < step four > pass The vertical axis of the center of the substrate rotates the substrate and the mask 180 degrees, but still & holds the relevant position between the substrate and the mask; < Step 5 > By providing a deposition material that passes through, > the mask slit, to continue < Step three > The second electrode pattern is photo-formed. According to the fourth aspect of the present invention, in accordance with the method for manufacturing an organic laser display element according to the first item of the application scope, the incident angle of the deposition material on the substrate is controlled by controlling the substrate and the aperture plane containing the deposition source and parallel to the substrate And the distance between the projection point of the center of the substrate on the plane containing the aperture of the deposition source and the center of the sinking source. & According to the fifth aspect of the present invention, in accordance with the method for manufacturing an organic electro-optical laser display element according to item 1 of the application scope, the substrate is placed in an inclined state maintaining a predetermined inclination angle with the horizontal plane, and the photomask is parallel to the substrate and is parallel to the substrate Keep a certain distance. 〃 According to the sixth aspect of the present invention, the incident angle of the deposition material on the surface of the substrate according to the method for manufacturing an organic electro-optical laser display element according to item 丨 of the application range is not in the range of 30 to 85 degrees. [Illustration] Fig. 1 is a schematic diagram of a method for manufacturing an organic electro-optical laser display element of the present invention. Fig. 2 有机 Organic electric laser produced by the manufacturing method shown in Fig. 1

2162-3925-PF; amy.ptd 1227649, Description of Invention (8) A cross-sectional view of a display element. Fig. 3 is a sectional view of a layered structure of the organic electro-optical laser display element of the present invention. Fig. 4 is a schematic diagram showing the arrangement of a substrate and a sinker in a vacuum deposition reaction chamber in a conventional organic electroluminescent display element manufacturing process according to Example 1 of the conventional method. Fig. 5 is a schematic diagram showing the arrangement of a substrate and a sinker in a vacuum deposition reaction chamber in a method for manufacturing an organic electro-optical laser display member according to the first embodiment of the present invention.

Fig. 6 is a schematic view showing the arrangement of a substrate and a sinker source in a vacuum deposition reaction chamber of a method for manufacturing an organic electro-optical laser display element according to the second, third, and fourth embodiments of the present invention. Fig. 7 is a schematic view showing the arrangement of a substrate and a sinker in a vacuum deposition reaction chamber in a method for manufacturing 70 organic electro-laser displays according to a fifth embodiment of the present invention. Fig. 8 is a schematic diagram showing the arrangement of a substrate and a sinker in a vacuum deposition reaction chamber in a method for manufacturing 70 organic electro-laser displays according to a sixth embodiment of the present invention. Fig. 9 is a schematic perspective view of a simple matrix using an organic electric laser element.

The $ 10 figure shows a block diagram of the structure of a simple matrix display composed of 6-pixel x 6-pixel organic electric laser elements. One. Fig. 11 is a timing chart of scanning signals when driving a simple matrix display using an organic electro-optical laser element. ·

1227649, Invention description (9) [Simplified explanation of symbols] Substrate: 1, 16 Organic positive hole transport layer: 3 Red light-emitting layer: 4a Blue light-emitting layer: 4c Cathode: 6 Anode: 2 Organic light-emitting layer ... 4 Green light emission Layer · 4b Organic electron transport layer: 5 Organic film: 7 Width of electrode pattern: 10 Mask: 11 Slit: 11a Slit width of mask: 12 Resistance heating deposition source: 1 3, 1 4 From the surface of the deposit Distance to the top surface of the substrate: 1 5 Distance from the center of the substrate to the line connecting the two deposition sources: 1 8 Distance between the deposition sources: 1 9 Distance between the mask and the substrate: 2 0 Area: 22 Resistance heating deposition source: 23a , 23b, 24a, 24b Tilt angle: 25 Detailed description of the invention] In the following, accompanying elements will be accompanied. The deposition (incident angle) on the surface of the manufacturing method according to the present invention is determined. These optimization parameters are, for example, a diagram describing the organic electric laser of the present invention, as shown in FIG. 1, for example, the substrate i material The angle of incidence optimizes some parameters to selectively determine the distance between the substrate 1 and the mask 11, '

1227649 V. Description of the invention (10) and the distance between the substrate 1 and the deposition source point (resistance heating deposition source) 1 3 0 The results are shown in Figure 3, from several deposition sources 3 (see Figure 1). The deposition material acts on the surface of the substrate 1 and is deposited after being inclined through the slit 11 a of the photomask 丨 丨. Therefore, the deposition materials from multiple deposition sources are removed and overlapped, respectively, so that the width of the stripe electrode pattern 6 becomes wider than the slit width 12 of the mask i i. In other words, the gap between the 'electrode patterns 6 may be smaller than the width 10 of the electrode 檨 (cathode) 6. ’

The above method makes it possible for the gap between the electrode patterns 6 to be less than 0.1 mm, and is obtained by the traditional method using a shadow mask, which makes the manufactured display have a wider &

Width of the pole 6), which means that it has large pores. As shown in Figure 1 of the U laser, #Introduction of #manufactured organic electric molecules by the method of the present invention] J Ϊ 'Because the incident angle of the deposited particle material (such as metal source, secondary knife) is dispersed, so the deposited particles The material amount is dispersed in a direction parallel to the surface of the organic film 7. ] The energy of the substrate 1: The particles incident on the organic film 7 have a reduction in impinging energy in the vertical direction, and can avoid damage. j to avoid organic film 7 In addition, during the deposition process, the impact of the deposition material ih is generated in a vertical direction and is different from the action position of the deposition material (P ng hair P-it.cn) in a different from the impacting material (bumping material) Bit = particles will act 罝, so you can

1227649 V. Description of the invention (11) Prevent small holes caused by general deposition materials. However, if the incident angle of the evaporated metal material is lower than 30 degrees, the result is not satisfactory. Because if the angle of incidence is too small, the film thickness will be uneven and the deposition equipment will become larger, and the pitch of the deposition pattern will not be very accurate. In the above manufacturing procedure, if the deposition area on the surface of the substrate can meet the aforementioned conditions, as long as the substrate is rotated, the deposition of the cathode 6 can be completed. In addition, when the cathode deposition material has only a single deposition source, it is first deposited on a solid horizontal position on the substrate, and then is deposited on the substrate rotated horizontally 180 degrees from the first position. The same is true of deposition by superposition of dispersed deposition particles by multiple deposition sources. In addition, when the organic electro-laser element is formed by first forming the cathode 6 and then depositing the anode 2 after forming the organic film 7, the method for manufacturing an organic electro-laser element of the present invention can also be applied to depositing an anode film. Examples of a method for manufacturing an organic electric laser element will be provided below. [First embodiment] A method for manufacturing an organic electroluminescent device according to a first embodiment of the present invention will be described below with reference to Fig. 2. Fig. 2 is a cross-sectional view of an organic electroluminescent device manufactured according to the first embodiment. A 1.1 mm thick glass plate (code No. 737, manufactured by Corning Glass Works) was used as a substrate (glass substrate), and a 100 nm thick indium tin oxide (IT〇) film was deposited on the substrate to serve as a substrate. For anode 2 to get

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To the substrate 1 with the anode of the I TO electrode film. I Τ 〇 transparent lightning film deposited on this substrate 1 ^ The film is lithographed and etched to form a strip-shaped anode 2 with a width of 0.1 mm and a pitch of 0.15 mm. . The visibility is as follows. After the strip-shaped anode 2 is formed, the surface of the substrate 1 is rinsed lightly with an organic solvent, and then an organic film is formed on the substrate w with ultraviolet light / ozone to form a hole transport layer. hole-transporting layer) 3. That is,

The crucible in the vapor deposition reactor was filled with an organic compound α —NpD (N, N ’-diphenyl N, N, bis (α

-naphtyl) -l, l'-bipheny (4,4 'diamine), then reduce the pressure in the reactor to less than 1, 10-5 Torr (= 7.5, 10-8 Pa), and then This organic substance is deposited on the I TO electrode 2. After the positive hole transport layer 3 is formed, a photomask (not shown) having a stripe pattern having a width of 0.1 mm and a pitch three times the pitch of the positive hole transport layer 3 is formed on the IT0 electrode 2 by The three organic color films composed of the red light emitting layer 4a, the green light emitting layer 4b, and the blue light emitting layer 4c are parallel to each other. The three-layer organic color film consisting of the red light-emitting layer 4a, the green light-emitting layer 4b, and the blue light-emitting layer 4c and the strip-shaped IT0 electrode 2 intersect the red light-emitting layer 4a perpendicularly to each other, using A 1 q3 (tris (8 -qinolylite) almiuium complex) and doped with DCM (4-dicyanomethylene-2-methyl-6- (p-dimethylaminost yryl) -4H-pyran, doping concentration 5 wt%), and the deposition was 50 nm thicker than

2162-3925-PF; amy.ptd Page 17 1227649 V. Description of the invention (13) Fixed film design. Subsequently, the photomask is moved a distance between the ττ2 electrodes 2 to form a green light emitting layer 4b. The green light-emitting layer 4b is made of A1% and doped with quinacridone (doping concentration 5 wt%), and is deposited 50 nm thick on a predetermined film pattern. After that, the photomask is moved a further distance between the IT0 electrodes 2 to form a blue light-emitting layer 4c. This blue light-emitting layer 4c is made of perylene, and is deposited on a predetermined film pattern with a thickness of 50 nm. The three-layer organic color film: the red light-emitting layer 4a, the green light-emitting layer 4b, and the blue light-emitting layer 4c are formed by the above steps.

Subsequently, a 50 nm thick organic film formed by Alq3 is equivalent to an electron transporting layer 5. It must be noted that the aforementioned films must be completed under vacuum. Subsequently, as shown in FIG. 5, a cathode 6 made of an aluminum alloy is formed by a dual simultaneous deposition method. In order to carry out this dual simultaneous deposition, aluminum is filled in the first resistance heating deposition source 13 and lithium is filled in the second resistance heating deposition source 14.

These resistance heating deposition sources 13 and 14 are arranged between the deposition surface 16 and the aperture surface of the resistance heating deposition source (including holes parallel to the surface to be deposited, the top surface of the diameter source of the deposition source). The height (distance) of 15 is 400 nm. The shape of the resistance heating deposition source is cylindrical, the pore diameter is 20 nm, and the height is 20 nm. The two resistance heating deposition sources 1 3 and 1 4 are placed on a flat surface.

2162-3925-PF; amy.ptd Page 18 1227649 V. Description of the invention (14) The horizontal plane of row I TO electrode 2 and the distance 18 between the center of the substrate and the line connecting the two deposition sources 1 3 and 1 4 is 190 nm ( The distance 18 is parallel to the center of the substrate of the IT0 electrode 2 and the midpoint of the line connecting the two deposition sources 13 and 14). The distance 19 between the two deposition sources 13 and 14 is 100 nm. When the incident angle of the deposited particles to the substrate is obtained by calculating the incident angle from the deposition source 13 to the region 17 on the substrate 16, the incident angle is in a range of a maximum angle of 76 degrees to a minimum angle of 56 degrees. Subsequently, in order to form the cathode 6, after the electron transfer layer 5 is formed, the substrate 16 is sent into a vacuum deposition reactor. A stainless steel plate (sus 304) is used as the photomask 11 to form a cathode pattern, and a plurality of slits 11a having a width of 0.4 nm are formed with a pitch of 0.5 mm. Then, the photomask 11 and the substrate 16 were placed horizontally in a vacuum deposition reactor 'without touching each other and maintaining a distance of 0.5 mm. The pattern width of the cathode 6 can be adjusted by controlling the incident angle of the deposition material, and controlling the gap between the photomask 11 and the substrate 16.

The cathode pattern has a thickness of 200 nm at a composition ratio of 10. The driving circuit of the organic driving display element manufactured by the above method, the input signal of the sequence diagram is used for evaluation, and it is over. The chain and bell alloy are deposited, and the electro-laser element is used to connect j and the organic electricity manufactured by the above method has been solved in the traditional example by following this point as shown in Figure 1 丨Laser element, its head is 0, with reasonable operation # display element to confirm "will produce": a few pixels or crosstalk. 9 ..., light

1227649

< Comparative Example > During the film formation process of the Ming-chain alloy electrode, a deposition step similar to that of the previous embodiment was used, except that the aluminum-containing deposition source 13 and the chain-containing deposition source π were placed in the center of the substrate. The distance 19 below is 100 mm, and the distance 15 from the surface of the deposit to the top surface of the substrate is 400 mm. In the aforementioned deposition process, the incidence angle of the deposited metals (aluminum and lithium) ranges from a maximum of 90 degrees to a minimum of 77 degrees. The organic electro-optical laser element is formed under such deposition conditions, and is evaluated by input signals following the timing diagram shown in the figure. For such a display element in which the cathode 6 is formed in the region 22 at a minimum incident angle range of 77 to 85 degrees, it has been confirmed that the number of defective pixels is zero. However, 'if the cathode 6 is formed in the region 22 at a minimum incident angle range of 85 to 90 degrees', the number of defective pixels will be greater than 10, and this will cause the generation of non-light pixels (non- 1 igh ting pixei) and Crosstalk interference. As described above, the first embodiment of the present invention has been described in detail with reference to the drawings. It should be noted, however, that the actual configuration is not limited to the first embodiment, and different configurations that do not exceed the scope of the present invention can also be conceived. [Second Embodiment] The photomask 11 (formed in the same shape as the first embodiment) and the substrate are arranged in the same manner as in the first embodiment (the positions of the cathode pattern 11 and the substrate 16). As a deposition material of the cathode 6, magnesium and silver were used. As shown in Figure 6, pack the magnesium

2162-3925-PF; amy.ptd Page 20 1227649 V. Description of the invention (16) The resistance heating deposition sources 23a and 23b are filled, and the silver is filled in the resistance heating deposition sources 24a and 24b. Two resistance heating deposition sources 23a and 24a are placed parallel to the ITO electrode pattern and at a distance of 190 mm from the center of the substrate, and the two deposition sources are placed perpendicular to the ITO electrode pattern, and the two deposition sources are separated by a distance 19 is 100 mm. The two resistance heating deposition sources 2 3 b and 2 4 b are placed at points symmetrical to the resistance heating deposition sources 23 a and 24 a. The resistance heating deposition sources 23 a and 24 a are spaced apart by a distance of 19 (190 mm). The dividing line connecting the resistance heating deposition sources 23b and 24b is located symmetric to the dividing line connecting the resistance heating deposition sources 2 3 a and 2 4 a. In other words, the dividing line between the connection resistance heating deposition sources 23b and 24b is located approximately symmetrical to the center line of the substrate, parallel to the cathode, and the separation between the connection resistance heating deposition sources 2 3 a and 2 4 a Lines are symmetrical. The height from the pore diameter of all the resistance heating deposition sources (23a, 23b, 24a, 24b) to the deposition surface of the substrate 16 is predetermined to be 400 mm. In the foregoing arrangement of the deposition sources, the incident angle of the deposition material to the substrate 16 ranges from a minimum of 55 to a maximum of 73 degrees. The shape of the cathode pattern photomask 11 and the configuration of the substrate 16 and the photomask. The white color is the same as in the first embodiment. The electrode film is deposited with a silver and silver alloy with a composition ratio of 10: 1, and the thickness is 40. 〇11111. According to the second embodiment, the organic electro-mechanical laser device manufactured by using the deposition method (cathode process) is tested by connecting it to the driving circuit of the organic electro-optical laser display. The result shows that the number of defective pixels is zero and there is no 1227649.

No light pixels were found and the operation was normal. In addition, this embodiment provides a display in which each width is 0.45 mm, and the distance between the stripe cathodes is 0.05. The first embodiment further reduces the distance by 50%. The stripe cathode mm, which is more than [Third Embodiment] ^ The organic electro-optical laser display element is the same as the second embodiment, except that the cathode manufacturing process is different. As shown in FIG. 6, the cathode pattern mask and the substrate The distance between the two is 0 · 08 mm, and the display element is tested. In a third embodiment, the incident angle of the deposition material to the substrate ranges from a minimum of 55 degrees to a maximum of 73 degrees. According to the third embodiment, the organic electro-optical laser device manufactured by using the deposition method (cathode process) was tested by connecting it to the driving circuit of the organic electro-optical laser display. The results showed that the number of defective pixels was zero. Light pixels, and operation is normal. 4'In addition, this embodiment provides a display, wherein the width of each stripe cathode is 0.48 mm, and the distance between the stripe cathodes is 0 02 mm, which is a distance of 80% smaller than that of the first embodiment. . [Fourth Embodiment] The organic electro-optical laser display element is the same as the second embodiment, except that the cathode manufacturing process is different. As shown in FIG. 6, the distance 20 between the cathode pattern mask and the substrate] 6 is 0. · 1 mm, distance 18 is set to 150 mm, and the display element is tested. ^

1227649 V. Description of the invention (18) In the fourth embodiment, the incident angle of the deposition material to the substrate ranges from a minimum of 59 degrees to a maximum of 79 degrees. According to the fourth embodiment, the organic electro-optical laser device manufactured by using the deposition method (cathode process) is tested by connecting it to the driving circuit of the organic electro-optical laser display. The result shows that the number of defective pixels is zero. Light pixels, and operation is normal. In addition, this embodiment provides a display in which the width of each stripe cathode is 0.48 mm, and the distance between the stripe cathodes is 0.02 mm, which is 80% smaller than that in the first embodiment. distance. [Fifth embodiment] In the formation of the negative sequence and the first real picture, the cathode mm ° firstly forms the deposition town and the clock source deposition sources 1 3 and 1 4 Therefore, the plate is blocked without the main baffle. Will the substrate and face. Before the electrode film is subsequently opened, the equipment and process examples of the organic electro-optical laser display element are the same, except that the cathode process is different. As shown in the seventh pattern, the distance 20 between the photomask 11 and the substrate 16 is 0. 05 cathode electrode 6 until The thickness reaches 20 Onm, and at the same time, the ratio is adjusted to 10 0, and then a main shutter placed between the substrate and the resistance heating is closed. The deposition materials of the self-resistance heating deposition sources 13 and 14 will be blocked to reach the substrate. Closed, and the relative position of the substrate 16 and the photomask 11 is fixed. The photomask 11 is rotated 180 degrees horizontally, as shown in the Y-square main baffle in FIG. 7, at this time from the resistance heating deposition sources 1 3 and 14

Page 23 2162-3925-PF; amy.ptd 1227649 V. Description of the invention (19) The deposited material will reach the surface of the base rhyme, and then the cathode 6 metal will be deposited until the thickness reaches 200 nm. This organic electro-optical laser element is formed according to the fifth embodiment according to the above-mentioned method (cathode process). According to the cathode process of the fifth embodiment, the incident angle of the deposition material to the substrate ranges from a minimum of 55 degrees to a maximum of 67 degrees. The test results of the organic electro-optical laser device manufactured according to the fifth embodiment show that the number of defective pixels is zero, no light-free pixels and crosstalk are generated, and the operation is normal. In addition, the present embodiment provides a display in which the width of each stripe cathode is 0.463 mm and the distance between the stripe cathodes is 0.0037 mm, which is a distance of 62.5% less than that in the first embodiment. 1 = 1 [sixth embodiment] set the distance between the mask forming the cathode and the sinker source and maintain the photomask 11 and the base from the resistance heating deposition south 15 set to 4 0 0 in in this organic electric laser element, to The formation, in addition to the above-mentioned organic electro-optical laser element, has no light-free pixels and crosstalk. Regardless of the deposition reactor process, as shown in FIG. 8, the substrate and the metal light are 18 mm away from 18 and the inclination angle 25 is 30 degrees. The distance between the plates 16 is 0.03 °. The components between the apertures of the sources 13 and 14 and the center of the substrate 16 are the same except that the conditions are determined in the same manner as in the first embodiment. The manufacturing test results according to the sixth embodiment show that the number of defective pixels is zero, interference is generated, and the operation is normal. What size can be used according to the sixth embodiment

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Cathode process' in a range of firing angles. [Seventh Embodiment] After forming an organic film (organic film 7), a vacuum deposition method (such as resistance heating method, electron beam deposition method, or sputtering method) A layer made of lithium fluoride (inorganic film) is formed on the film 7 and has a thickness of 0.5 nm. ) J film f aluminum film on the surface of an aluminum film is formed to form the cathode.

That is, aluminum is filled in the resistance heating deposition sources 23a, 23b, 2 "and 24b 'as shown in Fig. 6 and the cathode 6 is deposited. = The resistance heating deposition sources 23a, 23b, 24a * 24b and The distance between the substrate surfaces i is set at 400 mm. In the seventh embodiment, the entrance of the deposition material to the substrate 16 is as small as 55 degrees to a maximum of 73 degrees. Due to the shape of the cathode pattern photomask u related to the electrode 6, & Cap solid package :: rr: relative position of the substrate 16) setting method 1, a cathode having a thickness of 40 nm is deposited on a lithium fluoride film.

1 The organic electro-optical laser device manufactured in the seventh embodiment. The number of defective pixels is 0, there is no flying, and the operation is normal. In addition to the production of pixels without crosstalk and crosstalk, this embodiment provides a display, in which the degree of rabbits of each skin drop is 0.45 mm, and you can ask, The distance between the cathodes is 0.05 mm.

1227649 V. Description of the invention (21) The first embodiment further reduces the distance by 50%. Page 26 2162-3925-PF; amy.ptd

Claims (1)

6. The first step of applying for a patent, forming a first strip-shaped electrode on the surface of a substrate. Figure 1. A method for manufacturing an organic electric laser device, including: a sample; a first step, on the substrate including the first electrode pattern Forming a plurality of material layers including an organic layer on a surface; and In two steps, a photomask is placed between the plurality of deposition sources of the electrode material and the substrate, and is separated from the substrate by a predetermined distance, and a deposition material is provided through a plurality of slits through the photomask. To the surfaces of the material layers to form a second stripe electrode pattern on the first electrode pattern, and the first electrode pattern and the second stripe electrode pattern are perpendicular to each other, wherein the deposition sources are provided by At a specific position, the deposition material is deposited on the substrate surface at a specific incident angle. 2 · The method for manufacturing an organic electro-optical laser device according to item 1 of the scope of the patent application, wherein a second deposition source is placed at a specific position on a projection line of the position of the first deposition source, and the second deposition source is The electrodes are parallel, and the distance from a vertical line passing through the center of the substrate to the first deposition source is the same as the first deposition source. 3. The method for manufacturing an organic electric laser device as described in item 1 of the scope of the patent application, after the third step, the method further includes: In a fourth step, the substrate and the mask are rotated 180 degrees on a vertical axis passing through the center of the substrate, but the relative position between the substrate and the mask is still maintained; and in a fifth step, passing through the mask is provided For a deposition material of the slits, the third step is continued to form the second electrode pattern. 2162-3925-PF; amy.ptd Page 27 1227649 VI. Application for patent scope '-~-4 · The manufacturing method of the organic electro-laser element as described in the first item of Shen Jing's patent scope' where the deposition on the substrate The angle of incidence of the material is controlled by controlling the distance between the substrate and a plane containing the apertures of the deposition sources and parallel to the substrate, and controlling a center of the substrate on a plane containing the apertures of the deposition sources. The distance between the projection point and the center of the deposition sources. 5. The manufacturing method of the organic electric laser device according to item 1 of the scope of the patent application, wherein the substrate is placed at a predetermined inclination angle with the horizontal plane, and the photomask is parallel to the substrate and maintained at a specific level with the substrate. distance. 6. The method for manufacturing an organic electric laser device according to item 1 of the scope of the patent application, wherein the incident angle of the deposition material on the substrate surface is set within a range of 30 to 85 degrees. 2162-3925-PF; amy.ptd p. 28