1224550 五、發明說明（l) 【發明所屬之 本發明係 ，尤指一利用 寬大小 大小之 光源強 【先前 按 在於一 射容易 、下移 動之聚 施時， 内液體 平台浸 Y方向 直接照 呈現出 出之型 再令平 再以相 疊於加 詳 之處， ’並利 光束岣 度，俾 技術】 ，目前 儲液槽 硬化之 動之+ 光頭， 係令内 可由平 泡於該 在復移 射在浮 硬化之 態，而 台向下 同之方 工層上 觀上述 主要原 技術領域】 關於一種液態製程快速原型之加快成型方法 聚光頭具昇降功能，藉以調整投射光束之徑 用光源調整器改變光束強·度，以令不同焦距 能透過聚光頭投射功率之改變而維持相同之 以平均照射液體使其硬化成型者。 所使用之液 中預先儲存 液體，並於 台，且於儲 該聚光頭係 置於儲液槽 台上之通孔 液體中，而 動，且聚光 出在平台上 固體加工層 其他未照射 移動，使液 式使聚光頭 快速成型者 習用結構， 態製程 液狀之 儲液槽 液槽頂 可聚焦 内之平 浮出平 聚光頭 頭投射 之液體 ，如此 到的部 體溢過 移動照 快速原型 U V樹脂 内設置一 部設置一 投射出紫 台略向下 台表面適 則可依電 出之光束 機中， ，或其 可呈Z 呈X、 外線光 移動， 當之深 腦輸出 可依聚 上，被照射到的 一來，即形成一 份，則仍 原先硬化 射硬化成 維持液 加工層 型，並 其主要係 它受光照 軸方向上 Y軸向移 束；於實 使儲液槽 度，並使 而呈X、 光頭移動 地方將會 依電腦輸 狀型態， 之南度， 能逐層堆 實不難以發覺其 下·· 尚存有些許不足1224550 V. Description of the invention (l) [The invention belongs to the invention, especially a light source with a wide size. [Previously, when the light source is easy to shoot and move down, the inner liquid platform is immersed in the Y direction and it is directly displayed. The resulting shape then makes Ping again overlap with the details, 'Mingli beam intensity, technology], the current hardening of the storage tank + the optical head, the order can be rebubbled in the Shot in the floating hardened state, and the above main technical field is viewed from the same level as the stage] About a rapid prototyping method for a rapid prototype of the liquid process Condensing head with a lifting function to adjust the diameter of the projected beam with a light source adjuster Change the intensity and intensity of the light beam so that different focal lengths can pass through the change of the projection power of the condenser head and maintain the same. The liquid used is stored in advance and stored on the stage, and the condensing head is placed in the through-hole liquid on the liquid storage tank stage, and moved, and the light is focused on the solid processing layer on the platform. The liquid type makes the condenser head rapid prototyping structure customary. The liquid tank of the liquid storage tank in the liquid state process can focus on the flat floated liquid in the flat condenser head to project the liquid. Inside the UV resin, there is a beam machine that projects a purple stage to the lower stage and can be output according to electricity, or it can move in Z as X and external light. When the deep brain output can be focused on, Once it is irradiated, it forms a part, it is still hardened and shot hardened to maintain the liquid processing layer type, and it is mainly the Y-axis beam shift in the direction of the axis of light exposure; So that the X and the bald head will move according to the computer input mode. To the south, it can be piled up layer by layer. It is not difficult to detect it ... There are still some shortcomings.
1224550 五、發明說明（2) 5亥結構由於聚光頭 並無法隨所雲之井Φ #先束焦距及光源強度恆為一定， …得調整，為使該光束焦距 之行程中，聚光頭所浐糾層之邊緣輪廓，故在整個照射 與整個面積大小所使=極小’對於邊緣輪廓 照射整個加工層面積時，sn-致，於聚光頭移動 分佈，光是單一屑之昭h 4而耗費較多的時間予以平均 快速原型是以多i逐：堆ί =就：分緩慢，更何況該種 觀。 且而成’其所耗費之時間更是可 【發明内容】 本發明係一種液熊韌链也、由 要係在儲液槽中預二;'Π逮原型之加快成型方法，主 設-可呈;光硬化之液體，並於儲液槽内 J至Ζ軸方向上、下移動之平台，盆改 該，液槽上係設置一可呈χ、ΥΑΖ 移動 先頭，該聚光頭係可投射紫外绩本由*门移勤之水 強層間之距離而調整其所輸出之光束 一強产大;與加工層之距離無論遠近’均可維持同 強度大小之光源投射； 以適當珠度浸泡於儲液槽内之液體中，復令 以；而呈x、¥方向移動’並予投射光 2動，使光束徑寬變大並著落在液體上，並 以：=使聚集在加工層表面上不同焦距大= W、准持相同強度’藉以平均照射平台上的液體使其硬 第6頁 1224550 五、發力月說明（3) 化者。 【實施方式 本發明係關於一種液態製程快速原型之加快成型方法 、如第一、二圖所不，主要係在一儲液槽（丨）中預先儲存液 狀之U V樹脂〔或其它受光照射可硬化成型之液體〕，並 於儲液槽（1)内設置一可呈z軸方向上、下移動之平台 (u)，平台（11)上係設具通孔（111)，以供儲液槽（1)内液 •體得以由通孔（1 1 1 )流通，其改良在於：1224550 V. Description of the invention (2) Because of the condensing head of the 5H structure, the focal length of the first beam and the intensity of the light source are always constant, because of the condensing head.... The edge contour of the layer is corrected, so the entire irradiation and the entire area size = extremely small. When the edge contour illuminates the entire processing layer area, sn is caused by the movement of the condenser head, and the light is a single chip. The more time it takes to average the faster, the faster the prototype is, the more i it is: piled = = just: points are slow, not to mention the concept. And it becomes 'the time it takes is even more. [Summary of the invention] The present invention is a liquid bear tenacity chain, which must be tied in the liquid storage tank;' Π capture prototype accelerated molding method, the main-can It is a light-hardened liquid platform that moves up and down in the direction of the J to Z axis in the liquid storage tank. The basin is changed. A liquid moving head is set on the liquid tank, which can project χ and ΥΑZ. The condenser head can project ultraviolet light. The performance of the beam is adjusted by the distance between the water-strength layers of the gate and the output of the beam. The output of the beam is strong; the distance from the processing layer can maintain the projection of light sources of the same intensity regardless of distance. In the liquid in the liquid tank, the order is repeated; while moving in the x and ¥ directions and moving the projected light 2 to make the beam diameter wide and land on the liquid, and: = make the focus on the surface of the processing layer different Large focal length = W, quasi-holding the same intensity, so that the liquid on the platform is evenly irradiated to make it hard Page 6 1224550 Fifth, the force month description (3). [Embodiments The present invention relates to an accelerated molding method for a rapid prototype of a liquid process. As shown in the first and second figures, it is mainly a liquid UV resin stored in a liquid storage tank (丨) in advance [or other light-resistant A liquid formed by hardening], and a platform (u) capable of moving up and down in the z-axis direction is provided in the liquid storage tank (1), and a through hole (111) is provided on the platform (11) for liquid storage The liquid and body in the tank (1) can be circulated through the through hole (1 1 1). The improvement is:
该儲液槽（1)頂部係設置一呈X、γ軸向之導桿（1 2 )、 (^3)，並於其上設具一可呈z軸向昇降移動之聚光頭（2)， 該聚光頭（2)係可投射出紫外線光束，且其外接來源係可調 整輸出功率，適予依聚光頭（2)與欲加工物間之距離而自動 調整其所輸出之光束強弱，以令聚光頭（2 )與加工物之距離 無淪是近或遠，均可維持同一強度之光源大小，由於聚光 頭（2)投射紫外線光束時，如第二圖所示，其通過焦點（F) 之光束投射面（A )上之投射功率係與原未通過焦點（f )之光 束投射面（A)上之投射功率係互成對稱關係，亦即，該光束 投射面（A)之功率為多少焦耳，另一光束投射面（A,)之投射 功率即為多少焦耳，故無論是聚光頭（2)上移或下移，其在 通過焦點（F)相等之距離上，皆具有相同之照射功率予;^照 射； # 於實施時，請配合第一、四圖所示，係令内置於儲液 槽（1)内之平台（11)略向下移動，使儲液槽（1)内液體可由 平台（11)上之通孔（111)浮出平台（11)表面上，以令平台The top of the liquid storage tank (1) is provided with guide rods (1 2), (^ 3) in the X and γ axial directions, and a condenser (2) is provided on the top of the liquid storage tank (1). The condensing head (2) can project an ultraviolet beam, and its external source can adjust the output power. It is suitable to automatically adjust the intensity of the light beam output by the distance between the condensing head (2) and the object to be processed. So that the distance between the condenser head (2) and the processed object is not near or far, the light source of the same intensity can be maintained. Since the condenser head (2) projects an ultraviolet beam, as shown in the second figure, it passes through the focus (F The projection power on the beam projection surface (A) of) is symmetrical to the projection power on the beam projection surface (A) that did not pass the focus (f), that is, the power of the beam projection surface (A) How many joules is the projection power of the projection surface (A,) of the other beam, so whether the condenser head (2) moves up or down, it has the same distance across the focal point (F). The irradiation power I; ^ Irradiation; # When implementing, please match the first and fourth figures shown, the order is built in the storage Slot platform (11) within (1) is slightly moved downward, so that the reservoir (1) by the liquid platform (11) through the hole (111) on the float (11) surface of the platform, in order to make the platform
1224550 五、發明說明（4) (11)得以浸泡於儲液槽（1)内適當之深度，而聚光頭（2)則 可依電腦輸出而沿著導桿2)、（丨3)上呈X、Y方向往復 移動至定點後’再令聚光頭（2)定點沿Z軸下降（或上昇）， 使其投射出之光束焦點（F)可集中在液體上，並以適度之光 束強度予以直接照射，該聚光頭（2 )將依電腦輸出圖形而移 動成型’被照射到的地方將會呈現出硬化之固體狀態，如 此一來’聚光頭（2 )第一階段之移動路徑將依電腦輸出之加 工物輪廟’而形成第一加工層（3)之初步外形輪廓，如第 =、五圖所示，而其他未照射到的部份，則仍維持液狀型 恶’或可利用該種成型方式以聚光頭（2 )之焦點（F )成型其 它尺寸較為精密之處。 八 ^復令聚光頭（2)進行第二階段之加工，其主要係再下降 適當南度，如第六、七圖所示，令光束由聚光頭與加工層 =距離改變，而使得著落在液體上之徑寬亦隨之改變而變 寬’進而使得該處之光束強度增強；此時，聚光頭（2)可藉 改變投射功率而改變聚集在加工層（3)表面上光束之強度，曰 使該光束強度與原先用以硬化輪廓之光束焦點相同，並"以 較快之移動速度快速分佈照射整個加工層（3)表面，待整個 f型為固態後，再使整個平台（U)承托加工層（3)上昇即可 仔到一平面式之加工層。 如欲成型立體3 D模型時，係可藉由逐層堆疊之方式 堆疊出立體模型，主要係以相同之方式令平台（n)再向^ 移動，以令儲液槽（1)内之液體溢過原先已硬化之加工層 (3)之高度，再以相同之照射方式使聚光頭（2)先以小光曰點1224550 V. Description of the invention (4) (11) Can be immersed in a suitable depth in the liquid storage tank (1), while the condenser head (2) can be displayed along the guide rod 2), (3) according to the computer output After reciprocating to the fixed point in the X and Y directions, the focusing head (2) is lowered (or raised) along the Z axis, so that the focal point (F) of the light beam projected can be concentrated on the liquid, and the light beam is Direct irradiation, the condenser head (2) will be moved and formed according to the computer output graphics. The place to be irradiated will show a solid state of solidity. In this way, the movement path of the condenser head (2) in the first stage will be based on the computer. The output of the processed object is rounded to form the preliminary outline of the first processing layer (3), as shown in Figures 5 and 5, while other unexposed parts still maintain the liquid-type evil, or can be used. This molding method uses the focal point (F) of the condenser head (2) to form other precision parts. Eight ^ Fuling condensing head (2) for the second stage of processing, which is mainly lowered by an appropriate degree of south, as shown in Figures 6 and 7, the beam is changed from the focusing head to the processing layer = distance, so that the landing The path width on the liquid also changes and widens accordingly, thereby increasing the intensity of the beam there; at this time, the condenser head (2) can change the intensity of the beam focused on the surface of the processing layer (3) by changing the projection power. That is, the intensity of the beam is the same as the focus of the beam originally used to harden the contour, and the entire surface of the processing layer (3) is irradiated at a rapid speed with a faster moving speed. ) Supporting the processing layer (3) can rise to a flat processing layer. If you want to form a 3D 3D model, you can stack the 3D model by layer by layer. The main way is to move the platform (n) to ^ in the same way to make the liquid in the reservoir (1). Over the height of the previously hardened processing layer (3), then use the same irradiation method to make the condenser head (2) first point with a small light
12245501224550
依電腦輸出之輪廓而移動照射，適 ，再改變聚光頭（2)相對於加卫層（3) = 固定輪廓後 出光束徑寬改變，復而改變功率調 I拭使其所投射 在加工層m表面上之光束強度均與原先先束之強光^ 工層（3 )輪廓之光束焦點相同，藉以利用較大之〜σ 相同之速度加速硬化該層加工層(3) ’如此類 同之方式重覆硬化成型’直待整個加工層(3) ::才曰目 以形成一立體，之模型者。 且而仔 是以，本發明於製作成型時，亦可先行製作一層某 層並予以黏著固定於平台（11)上，且令後續之成品彳^ 】 接成型於該基底層上，待整個成品完成後，再 層去除即可得到一完整之立體模型者。 4底 綜上所述，本發明所提供之液態製程快速原型之加快 成型方法，其可藉由聚光頭而呈現Ζ軸·昇降，進而改變其 投射光束之大小’並配合光源調整器調整光束之光源強弓尋 ，以令光束得以平均而快速的分佈於加工物表面，誠已合 乎發明相關要件，爰依法提出申請。Move the irradiation according to the outline of the computer output, and then change the focusing head (2) relative to the guard layer (3) = the beam width of the beam changes after the fixed outline, and then change the power to adjust the projection to the processing layer The intensity of the light beam on the surface of m is the same as the original strong light beam ^ The thickness of the beam of the contour of the working layer (3) is the same, so that the processing layer (3) of the layer (3) is accelerated and hardened with the same speed of larger ~ σ, so the same The method is repeated hardening molding until the entire processing layer (3) :: is said to form a three-dimensional model. In addition, when the present invention is used for forming, the present invention can also make a layer and fix it on the platform (11), and then make the subsequent product 彳 ^] on the base layer and wait for the entire product. After completion, the layer can be removed to obtain a complete solid model. 4 In summary, the rapid prototyping method for the rapid prototype of the liquid manufacturing process provided by the present invention can present a Z-axis · elevation through a condenser head, and then change the size of its projected beam 'and cooperate with the light source adjuster to adjust the beam The light source is strongly searched, so that the light beam can be evenly and quickly distributed on the surface of the processed object. It has already met the relevant requirements of the invention, and applied according to law.
1224550 圖式簡單說明 第一圖係本發明之結構示意圖。 第二圖係本發明聚光頭之焦距示意圖。 第三圖係本發明之組合示意圖。 第四圖係本發明之第一製程作動示意圖。 第五圖係本發明之第一製程成品示意圖。 第六圖係本發明之第二製程作動示意圖。 第七圖係本發明之第二製程成品示意圖。 【元件符號說明】 ·1224550 Brief Description of Drawings The first drawing is a schematic diagram of the structure of the present invention. The second figure is a schematic diagram of the focal length of the condenser head of the present invention. The third figure is a schematic combination diagram of the present invention. The fourth diagram is a schematic diagram of the operation of the first process of the present invention. The fifth figure is a schematic diagram of the first process finished product of the present invention. The sixth diagram is an operation schematic diagram of the second process of the present invention. The seventh diagram is a schematic diagram of the finished product of the second process of the present invention. [Description of component symbols] ·
(1) 儲液槽 (11) 平台 (111) 通孔 (12) 導桿 (13) 導桿 (2) 聚光頭 (3) 力U工層 (F) 焦點 (A) 光束投射面（A’） 光束投射面 第10頁(1) Liquid storage tank (11) Platform (111) Through hole (12) Guide rod (13) Guide rod (2) Condensing head (3) Force U layer (F) Focus (A) Beam projection surface (A ' ) Beam projection surface 第 10 页