1220264 指 是 其 尤 統 系 極 之 CtuJ ΪΙ 處 漿 電 U&ul 種一 於 _ ^ I «β 域有 領係 ⑴術明 明技發Τ本 發 並管 路極 迴、電 雙各 之短 差縮 位以 電置 具並 成作 形離 以距 地之 接近 一接 正極 一以 或管 負極 一 電 正各 一之 以使 種， 一置 漿電 電的 加質 增品 效之 有時 到潔 達清 此或 藉理 ，處 度漿 強電 場作 tfy&L J 加高 增提 。 以能者 可而用 ，度應 離勻先 距均首 之及統 間度系 線密極 2 置 裝 潔 清 漿 電一 為 1J示 術所 技圖 前九 先第 t如 真 有 括 包 XI/ IX 2 χ(ν 室 ίι 處 空 3 2 器應 應供 供源 源電 ιδίβΟ ΡΠ *^Η 、利 Ν)/ ， 2成 2而 C合 置組 裝等 氣} 抽4 空2 真C 、統 系 極 及 } 面 1表 2作 C件 室工 理的 處内 空} 真1 在2 \»y /IV 4室 2理 C處 統空 系真 極於 電置 合對 配以 ) ， 3漿 2電 C生 器產 空 真 用 利 係 X)/ 2 2 0 C空 置真 裝抽 氣以 抽予 空 真1 而2 〇 ( 潔室 清理 或處 理空 處真 漿將 電浦 之泵 統、 系正 極之 兩流 於直 置接 係連 }別 3分 () 件4 工 2 ， ( 示統 所系 圖極 十電 第兩 閱， 參間 再} 請4 2 •, 逐 場度 電強 生場 產電 間其 xly ， 4域 2區 C間 統中 系的 統間 系} 極4 電2 兩C 在統 可系 之極 使電 ，兩 源， 電時 負此 電室 的理' 圍處 外空 之真 }該 4與 2圍 C外 統} 系4 極2 電C 兩統 為系 因極 是電 要兩 主此 ，到 弱受 減會 外度 向強 漸場 2 響 影 所 放 之 間 進 象 現 之 勻 均 不 場 電。 成佳 造不另 而率係 ，效， 及 質 品 的一 理十 處第 漿閱 電參 響請 影 而 示 所 圖 統 系 極 ^¾ 之 理 處 漿 11220264 refers to the plasma electric U & ul species at the CtuJ ΪΙ of the U.S.A. system in the _ ^ I «β domain. The electric device is placed and formed to be close to the ground, one is connected to the positive electrode, the other is the tube negative electrode, one is positive, one is used for seeding, one is added to the quality and quality of the electric power, and sometimes it reaches Jie Daqing. This or reason, to deal with the strong electric field for tfy & LJ increase and increase. For those who can use it, the degree should be equal to the distance from the first and the inter-system degree, and the line is dense. 2 Install the clean and clean electricity. The first nine are the technical drawings of the first operation. IX 2 χ (ν room empty 3 2 devices should be supplied with power supply source δδβ β ΡΠ * ^ Η, profit N) /, 20% and 2C assembly and other gas} pump 4 empty 2 true C, system And} Inner space in Table 2 of Table 1 for the work of C-parts.} True 1 is in 2 \ »y / IV 4 rooms and 2 treatments in C. The air system is really paired with electricity. The C generator uses air for real production X) / 2 2 0 C vacant real installation to evacuate to empty 1 and 2 0 (clean room or clean the empty space, the real pulp will be the pump system and the positive electrode The two streams are connected directly to each other} 3 points (2) pieces 4 workers 2 ， (Second reading of the figure of the Institute of Electrical and Electronic Engineering, see again) Please 4 2 •, field-by-field power generation room Its xly, the inter-system of the system in the 4 domain 2 area C} pole 4 electricity 2 two C in the system can make electricity, two sources, when the electricity is negative to the principle of this electric room ' } The 4 and 2 Wai C system} is 4 poles 2 The two systems of electricity C are due to the fact that the poles are the two mainstays of electricity, and the current situation between the weakly weakened and the weakly faded to the strong gradual field 2 is no electricity. The system of efficiency, efficiency, and quality of the ten places. Please read the electrical parameters and show the picture.
第6頁 1220264 、發明說明（2) 八兩電極系統（2 4 )的輸入端（2 4 1 ) 、 （ 2 4 2 ) =f連接電源供應器（2 3 )的兩輸出端（2 3 1 )、（ 2 ) ’使兩電極系統（2 4 )之間可以產生電場；其 ’電源供應器（2 3 )所供應之電源為中頻電源。Page 6 1220264, description of the invention (2) Input terminals (2 4 1) of the two-electrode system (2 4), (2 4 2) = f are connected to the two output terminals (2 3 1) of the power supply (2 3) ), (2) 'enables an electric field to be generated between the two electrode systems (2 4); the power supplied by its' power supply (2 3) is an intermediate frequency power supply.
、 此時兩電極系統（2 4 )形成加了二個不同相位之電 源’使兩電極系統（2 4 )間的電場強度大幅加強，可以 改f兩電極系統（2 4 )之中間部位的電場不均勻現象。 但疋’兩電極系統（2 4 )之外圍區域仍受到電極外圍與 真空處理室（2 1 )之間的放電所影響，電場仍有不均勻 的現象’也造成電漿密度較低的缺失。同時，由於該工件 (3)之周圍電場分布不均勻，故對於真空處理室（2 1 )内之工件（3 )處理效率與均勻性均較差，處理時間相 =也會增加’對於凡事講求效率的現代要求來說是相當不 符經濟效益的。所以申請人於9 1年提出第9 1 2 0 4 2 2 6號專利案提出解決改善之道，並蒙鈞局准以專利在 案。惟该案之電極系統仍有諸多改善之處，故申請人再針 對该案的電極系統予以再研究改良，提供一種更佳的電 處理之電極系統。 【内容】 ^本發明主要在於提供一種電漿處理之電極系統，將該 系統以同一平面中將電極線予以交錯設置有兩電極，並= 正、負極、或接地分別連接形成具所需之電位差之雙回u 電極系統，使對應通電之電極可以極為接近並產生路 且分布相當均勻之電場，能有效增加工作效率以減=處度At this time, the two-electrode system (2 4) is formed by adding two power sources with different phases, so that the electric field strength between the two-electrode system (2 4) is greatly strengthened, and the electric field in the middle part of the two-electrode system (2 4) can be changed. Uneven phenomenon. However, the peripheral area of the two-electrode system (2 4) is still affected by the discharge between the electrode periphery and the vacuum processing chamber (2 1), and the electric field is still non-uniform. At the same time, due to the uneven electric field distribution around the workpiece (3), the processing efficiency and uniformity of the workpiece (3) in the vacuum processing chamber (2 1) are poor, and the processing time phase = will also increase. The modern requirements are quite uneconomical. Therefore, the applicant filed a patent case No. 9 1 2 0 4 2 2 6 in 2011 to propose a solution for improvement, and Meng Jun Bureau allowed the patent to be filed. However, the electrode system in this case still has many improvements. Therefore, the applicant has made further research and improvement on the electrode system in this case to provide a better electrode system for electrical treatment. [Content] ^ The present invention is mainly to provide a plasma-treated electrode system. The system has two electrodes interleaved with electrode wires in the same plane, and is connected to positive, negative, or ground to form the required potential difference. The double-loop u-electrode system enables the correspondingly-connected electrodes to be extremely close to each other and generate a relatively uniform electric field, which can effectively increase the working efficiency to reduce
第7頁 1220264 五、發明說明（3) 的時間’並確保處理之優良品質。 本發明另外在於提供一種電漿處理之電極系統，該電 極系統由二電極組成，且該二電極之電極管線呈二平面分 布且在該電極為接近的二平面上形成交錯置放，再將二平 面上的兩組電極予以連接形成一具來回交錯組成立體狀的 電極系統，可以產生高強度且分布相當均勻的電場，以縮 短工件之電漿清潔處理時間，確保品質且可以達到增加效 率之積極目的。 【實施方式】 為使本發明使用之技術手段、發明特徵、達成目的與 功效易於明白了解，茲配合圖式及圖號詳細說明如下： 首先，請參閱第一、二圖所示，本發明之電極系統（ 1)由同一平面上的第一、二電極（11) 、 （12)組 成，且每一組電極系統（1 )之間恰可供置放待處理的工 件（3 )。 電極系統（1 )之第一、二電極（1 1 ) 、 （ 1 2 ) 分別為正、負極且直接連接電源供應器（2 3 )為例。第 一電極（1 1 )為正極，以實線表示；第二電極（1 2) 為負極，以虛線表示〔如第一圖所示〕，亦可為接地。 第一電極（1 1 )的管線與第二電極（1 2 )的管線 兩者在同一平面上以等間隔及依序迴旋相互交錯依序進入 中心處，至交錯處（1 3 )剛好形成不接觸之交錯，且接 近交錯處（1 3 )的一條管線，如第二電極（1 2 )的電 極管線呈凹凸段（1 2 1 )、（ 1 2 2 )，其凹凸之大小Page 7 1220264 V. The time of invention description (3) 'and ensure the excellent quality of the treatment. The present invention further provides a plasma-treated electrode system. The electrode system is composed of two electrodes, and the electrode pipelines of the two electrodes are distributed in two planes and are staggered on the two planes where the electrodes are close to each other. The two sets of electrodes on the plane are connected to form a three-dimensional electrode system that staggers back and forth, which can generate a high-intensity and fairly evenly distributed electric field to shorten the plasma cleaning processing time of the workpiece, ensure quality and achieve positive efficiency. purpose. [Embodiment] In order to make the technical means, the features of the invention, the purpose and the effect of the invention easy to understand, the detailed description with the drawings and numbers is as follows: First, please refer to the first and second figures. The electrode system (1) is composed of first and second electrodes (11) and (12) on the same plane, and a workpiece (3) to be processed can be placed between each group of electrode systems (1). For example, the first and second electrodes (1 1) and (1 2) of the electrode system (1) are respectively positive and negative electrodes and are directly connected to a power supply (2 3). The first electrode (1 1) is a positive electrode, which is represented by a solid line; the second electrode (1 2) is a negative electrode, which is represented by a dotted line [as shown in the first figure], or may be grounded. Both the pipeline of the first electrode (1 1) and the pipeline of the second electrode (1 2) enter the center in an alternating interval and in a sequential order on the same plane and enter the center in sequence, until the intersection (1 3) just forms The contact line is staggered, and a pipeline close to the intersection (1 3), such as the electrode line of the second electrode (1 2) has bumps (1 2 1), (1 2 2), and the size of the bumps
1220264 五， 與 間 波 段 發明說明（4) 間隔與第一、二電 隔相當。此凹凸段 狀〔如正弦波〕 浪 在 處 的 距 均 之 極 成 1 其中藉由 同一平 負極管 作不接 間距或 離極為 勻之電 另外第一電 的負極15) 管線與 -^ 正 4 ) C 2 .)且 )分置 兩電極 之電極 、負極 ，第二電極 上述第一、 面交錯而組 線以一正負 觸的交錯’ 交錯並置’ 接近且極性 場。 ，請再參閱 極（1 1 ) 管線在同一 分別連接於 第二電極（ 負交錯對應 1 5 )，並 雙回路之電 於工件（3 系統（1 ) (1 1 )〜 管線又交錯 極（11) (12)的電極管線的(1 2 1 ) 、（ 1 2 2 )可為對應之 ，亦玎為如第三圖所示直接形成平直(1 2 )可為接地。 士電極（1 1 ) 、（ 1 2 )經此方式 成一組兩電極及該兩電極所形成的正 對應錯開並置且依涔迴旋並盤入中間 且每一電極管線之間的距離形成對應 其極性方向剛好相反，使之成為一種 方向相反並可藉此產生高強度且分布 第四〜 所形成 平面， 另一平 12) 迴旋盤 藉此形 極系統 )之兩 可以對 (12 對應形 六圖所 的正極 並將之 面上的 的負極 入至中 成兩平 (1 ) 側〔如 工件（ )，其 成極性 示，該電 管線與第 極系統（ 二電極（ 利用連接段（1 4 12 )、 的正 每一平面均形 折成連接段（ (1 1 )、（ 組電極系統（ 不〕。即利用 理，並藉兩平 極為接近，且 之通電，可以 第一電極（1 1 ) 管線，且 央處再彎 面之電極 ’且將數 第七圖所 3 )作處 電極管線 方向相反 兩 面 正1220264 Fifth, and inter-band invention description (4) The interval is equivalent to the first and second electrical intervals. This concave and convex section (such as a sine wave) is 1. The distance between the waves and the poles is equal to 1. Among them, the same flat negative electrode is used to connect the electrodes with no distance or even distance from each other. 15) The pipeline and-^ positive 4 ) C 2.) And) Separate the two electrodes of the electrode and the negative electrode, the second electrode above the first and the surface are staggered and the group lines are intersected by a positive and negative staggered 'interlaced juxtaposition' approaching and polar fields. Please refer to the pole (1 1). The pipeline is connected to the second electrode (negative staggered corresponding to 15) in the same line, and the double circuit is connected to the workpiece (3 systems (1) (1 1)). The pipeline is staggered (11 ) (1 2 1) and (1 2 2) of the electrode line of (12) can be corresponding, and also can be directly formed as shown in the third figure (1 2) can be grounded. ), (1 2) In this way, a group of two electrodes is formed, and the corresponding correspondence formed by the two electrodes is staggered and juxtaposed, and is rotated and coiled in the middle, and the distance between each electrode pipeline is formed to correspond to the opposite direction of its polarity, so that It becomes a kind of opposite direction and can generate a high-strength and distributed fourth to form a plane, the other flat 12) The rotating disk uses this pole-shaped system) The two can be paired (12 corresponds to the positive electrode of the shape six figure and faces it) The negative electrode on the top is connected to the two flat (1) sides of Zhongcheng [such as the workpiece (), its polarity is shown, the electrical line and the first electrode system (the two electrodes (using the connection section (1 4 12), positive each plane Uniformly folded into connection sections ((1 1), (group electrode system (not). Use , And by two flat very close, and the power, may be the first electrode (11) line, and then the central electrode at the meniscus' and the number of the seventh FIG. 3) of the electrode line at the opposite direction as the two surfaces n
$ 9頁 1220264 五、發明說明（5) 產生極高且分布均勻之電場。 藉由上述之組成及實施可知，本發明與習用相較具有 下列優點，如： 1 ·電極系統（1 )由第一、二電極（1 1 ) 、 （ 1 2 )組成，分別作為正、負極，且其管線以一正一負錯開交 互迴旋盤入組成同一平面狀，形成雙迴路且極性方向相反 ，正、負極錯開，每一正、負極管極為接近並間距以相當 均勻組設而成，是故可以產生高強度之電場且電場。以全 面性作相當均勻分布在整個電極系統上，不會有電極系統 之外圍的電場受真空處理室之放電的影響而減弱之缺失， 以確保整體之均勻性。 2 ·電極系統（1 )以第一、二電極（1 1 ) 、 （ 1 2 )組成，並將此第一、二電極（1 1 ) 、 （ 1 2 )分別作 為正、負極，其管線以一電極的正極管線配合另一電極的 負極管線作一正一負之對應交錯迴旋盤入結合成二個平面 組成之立體結構之電極系統（1 )，兩平面及其各正負極 管線間之間距可極為接近並形成錯開對應予以通電形成極 性相反且立體的雙迴路電極系統（1 )，可以產生具有均 勻分布在整個電極系統（1 )且強度增加的電場，不會受 到真空處理室内之放電的影響而使電極系統（1 )的外圍 電場受到影響而減弱。 3 ·本發明之電極系統（1 )，可使整個電極系統（1 )作全面性且均勻分布之高強度電場，能有效提高清潔處 理的效率及品質，大幅縮短處理時間，對於電漿清潔處理$ 9 pages 1220264 V. Description of the invention (5) Generates an extremely high and uniformly distributed electric field. It can be known from the above composition and implementation that the present invention has the following advantages compared with the conventional ones, such as: 1 The electrode system (1) is composed of first and second electrodes (1 1) and (1 2), which are respectively used as positive and negative electrodes. And the pipelines are formed into a same plane by a positive and negative staggered alternating convolution disks, forming a double circuit with opposite polar directions, the positive and negative electrodes are staggered, each positive and negative tube is extremely close to each other, and the spacing is arranged in a fairly uniform group. Therefore, a high-intensity electric field can be generated. It is fairly uniformly distributed on the entire electrode system based on the comprehensiveness. There will be no loss of the electric field on the periphery of the electrode system due to the influence of the discharge in the vacuum processing chamber to ensure the overall uniformity. 2 · The electrode system (1) is composed of first and second electrodes (1 1) and (1 2), and the first and second electrodes (1 1) and (1 2) are used as positive and negative electrodes, respectively. The positive electrode line of one electrode is matched with the negative electrode line of the other electrode to form a positive-negative staggered convolute disk into an electrode system (1) combined into a three-dimensional structure composed of two planes. The distance between the two planes and the positive and negative electrode lines It can be very close to and form a staggered two-loop electrode system (1) with opposite polarity and three-dimensional polarity. It can generate an electric field with an even distribution throughout the electrode system (1) and increased strength, and will not be subjected to discharge in the vacuum processing chamber. The influence causes the external electric field of the electrode system (1) to be affected and weakened. 3 · The electrode system (1) of the present invention enables the entire electrode system (1) to be a comprehensive and uniformly distributed high-intensity electric field, which can effectively improve the efficiency and quality of cleaning processing, greatly shorten the processing time, and for plasma cleaning processing
第10頁 1220264 五、發明說明（6) 裝置的實用性有莫大的實質幫助。 再者，如第八圖所示，可將第一、二電極（1 1 )、 (1 2 )從左上角處依序迴旋盤入至中間，於最内層處的 第一、二電極（1 1 ) 、（ 1 2 )予以作等距之對應凹折 並再依序迴旋盤出至左下角處，使之成為正、負極相反對 應之組成的電極糸統。 1. 可避開兩極電極在中間交叉，通常在交叉點的附近 會有較強的電漿密度，這將會成電漿處理均勻度的問題。 2. 在不同相的電極之間，因所帶的相位不同〔其中一 極為正，另一極為負〕，故會有很強的電場強度，而產生 高密度的電漿。 3. 無論是正極或負極，其在兩同相的電極管之間，因 同相而產生中空陰極的效應〔Hollow Cathode Plasma〕 ο 綜上所述，本發明實施例確能達到所預期之使用功效 ，又其所揭露之具體構造，不僅未曾見諸於同類產品中， 亦未曾公開於申請前，誠已完全符合專利法之規定與要求 ，爰依法提出發明專利之申請，懇請惠予審查，並賜准專 利，則實感德便。Page 10 1220264 V. Description of the invention (6) The practicality of the device is of great help. Moreover, as shown in the eighth figure, the first and second electrodes (1 1), (1 2) can be rotated in a circular order from the upper left corner to the middle, and the first and second electrodes (1 at the innermost layer) 1) and (1 2) are made into correspondingly corresponding concave folds, and then sequentially turned out to the lower left corner to make it an electrode system composed of positive and negative electrodes. 1. It can be avoided that the two electrodes intersect in the middle. Generally, there will be a strong plasma density near the intersection, which will cause a problem in the uniformity of the plasma treatment. 2. The electrodes with different phases have different electric phases (one of them is very positive and the other is very negative), so there will be a strong electric field intensity, and a high-density plasma will be generated. 3. Whether it is a positive electrode or a negative electrode, between two electrode tubes of the same phase, a hollow cathode effect is generated due to the same phase [Hollow Cathode Plasma] ο In summary, the embodiment of the present invention can indeed achieve the expected use effect, Moreover, the specific structure disclosed by it has not only been found in similar products, nor has it been disclosed before the application. It has fully complied with the provisions and requirements of the Patent Law and applied for an invention patent in accordance with the law. A quasi-patent is a real virtue.
第11頁 1220264 圖式簡單說明 【圖式簡單說明】 第一圖：本發明之電極系統平面圖 第二圖··本發明之電極系統之立體實施示意圖 第三圖··本發明之電極系統之另一實施平面圖 第四圖：本發明之另一電極系統平面圖〔第一層〕 第五圖：本發明之另一電極系統平面圖〔第二層〕 第六圖：本發明之另一電極系統立體示意圖 第七圖：本發明之另一電極系統實施示意圖 第八圖：本發明之再一電極系統平面示意圖 第九圖：習用之電漿清潔處理裝置 第十圖：習用之電極系統示意圖（一） 第十一圖：習用之電極系統示意圖（二） 〔參照圖號〕 ( 1 ) 電極糸統 ( 1 1 ) 第一電極 ( 1 2 ) 第二電極 ( 1 2 1 ) 凹凸段 ( 1 2 2 ) 凹凸段 ( 1 3 ) 交錯處 ( 1 4 ) 連接段 ( 1 5 ) 連接段 ( 2 ) 電漿清潔裝置 ( 2 1 ) 真空處理室 ( 2 2 ) 真空抽氣裝置 ( 2 3 ) 電源供應器 (- 2 3 1 ) 輸出端 ( 2 3 2 ) 輸出端 ( 2 4 ) 電極系統 ( 2 4 1 ) 輸入端 ( 2 4 2 ) 輸入端 ( 3 ) 工件Page 11 1220264 Brief description of the drawings [Simplified description of the drawings] The first diagram: the plan view of the electrode system of the present invention the second diagram ... the three-dimensional implementation diagram of the electrode system of the present invention the third diagram ... the other of the electrode system of the present invention A plan view of an implementation. A fourth view: a plan view of another electrode system of the present invention [first layer] A fifth view: a plan view of another electrode system of the present invention [second layer]. A sixth view: a schematic perspective view of another electrode system of the present invention Fig. 7: Implementation diagram of another electrode system of the present invention. Fig. 8: Planar schematic diagram of another electrode system of the present invention. Fig. 9: Conventional plasma cleaning and processing device. Fig. 10: Schematic diagram of conventional electrode system (1). Figure 11: Schematic diagram of a conventional electrode system (2) [Reference drawing number] (1) Electrode system (1 1) First electrode (1 2) Second electrode (1 2 1) Bump section (1 2 2) Bump Section (1 3) Stagger (1 4) Connection section (1 5) Connection section (2) Plasma cleaning device (2 1) Vacuum processing chamber (2 2) Vacuum extraction device (2 3) Power supply (- 2 3 1) lose (241) input terminal (232) an output terminal (24) an electrode system (242) input terminal (3) of the workpiece
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