CN109082635A - A kind of large area pulse magnetic filter - Google Patents

A kind of large area pulse magnetic filter Download PDF

Info

Publication number
CN109082635A
CN109082635A CN201811091114.6A CN201811091114A CN109082635A CN 109082635 A CN109082635 A CN 109082635A CN 201811091114 A CN201811091114 A CN 201811091114A CN 109082635 A CN109082635 A CN 109082635A
Authority
CN
China
Prior art keywords
magnetic filter
cathode
packet
line
beam spot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201811091114.6A
Other languages
Chinese (zh)
Other versions
CN109082635B (en
Inventor
廖斌
欧阳晓平
罗军
庞盼
左帅
张旭
吴先映
张丰收
韩然
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Normal University
Original Assignee
Beijing Normal University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Normal University filed Critical Beijing Normal University
Priority to CN201811091114.6A priority Critical patent/CN109082635B/en
Publication of CN109082635A publication Critical patent/CN109082635A/en
Application granted granted Critical
Publication of CN109082635B publication Critical patent/CN109082635B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a kind of large area pulse magnetic filter, which includes: pulsed cathode arc head, extraction electrode, focuses straight tube, magnetic filter duct and expansion line.By implementing the present invention, apparent change occurs for the shape of ion beam spot, becomes strip beam spot by original circular beam spot, beam spot size maximum can be 60mm × 260mm, the longitudinal width for substantially increasing ion beam spot has obviously advantage in elongated member surface treatment.Large area pulse magnetic filter of the invention simultaneously can be realized being coated with for poorly conductive point cathode film layer.Educt beaming flow can be made to greatly increase by extraction electrode and being used cooperatively for focusing electrode, ion beam spot size can substantially be unfolded under the cooperation of diffuser and magnetic filter duct line packet electric current simultaneously, the service life of cathode targets can be greatly increased under identical beam intensity.

Description

A kind of large area pulse magnetic filter
Technical field
The present invention is the large area pulse Magnetic filter that proposes the problems such as solving pulsed magnetic filter ions beam uniformity, service life Device.
Technical background
With the fast development of science and technology, the requirement to material surface modifying technology is higher and higher, the single table of tradition Face modification technology has been increasingly difficult to meet the technical requirements in industrial production;Synthesisization, integrated and multifunction become The trend of technology development.
In recent years, the modified complex technique in some surfaces constantly comes out and puts into industry in succession, and plays and focus on to make With.Such as the complex technique of magnetron sputtering technique and arc ion plating (aip), big face can be deposited by being compatible with magnetron sputtering technique The advantages of long-pending and high uniformity film advantage and ion plating technique prepare high-bond film, improves technique practicability.Again If multi-arc ion coating is by multiple arc sources collective effect, multiple elements design film deposition is not only realized, but also significantly improve deposition Efficiency, the technology is in cutter, parts machining industry using relatively broad at present.Multi-arc ion coating in existing surface diposition It is wherein very important modified method.But there are a significant drawbacks for it, i.e. the compactness of depositional coating is not high, and there is microns Grade bulky grain, temperature sensitivity matrix are not applicable etc..Magnetically filtered vacuum arc deposition technology is developed in recent years A kind of novel ion beam method for manufacturing thin film, it filters out the bulky grain and neutral atom of the generation of arc source by Magnetic filter technology, The pure plasma beam of no bulky grain is obtained, effectively overcomes in the deposition method of common arc source and is generated due to the presence of bulky grain The problem of, the film of preparation has an excellent performance, but temperature when the important disadvantage of DC magnetic filtering deposition technique is film deposition It spends or higher, surface coating can not achieve to substrate of some matrixes to temperature extreme sensitivity;Meanwhile plating some oxides It because its target is easy poisoning is very easy to that current interruption etc. occurs when film layer, is unfavorable for the serialization deposition of film layer.Moreover, being led some Common DC magnetic filtering can not achieve being coated with for the material when electrically poor material is as cathode.
Summary of the invention
In view of the above-mentioned problems, the present invention is based on original pulsed magnetic filtration system, by changing the trigger voltage of itself, touching It sends out cathode construction and magnetic is drawn and filter type, propose a kind of large area pulse magnetic filter.
The first purpose of the embodiment of the present invention be by propose a kind of large area pulse magnetic filter effectively to from Beamlet stream is regulated and controled, and realizes the strip beam spot that can handle wider component, while can greatly improve cathode life, while because It is the problems such as film deposition continuity is deteriorated caused by pulse-triggered can be avoided because of target poisoning, Neng Goushi for triggering mode It is existing.The material of poorly conductive also can realize that the film layer of the material is coated with as the cathode targets of pulse Magnetic filter.
For further, a kind of large area pulse magnetic filter include: pulsed cathode arc head, extraction electrode, focus it is straight Pipe, magnetic filter duct and expansion line.
In some embodiments, pulsed cathode arc head cathode diameter is 20-30mm, and pulse-triggered voltage is 5-10KV, touching Frequency 0-1KHz is sent out, pulsewidth is 10-2400 μ s;Extraction electrode is apart from cathode surface 20-50mm;Length of straight pipe 10-70mm is focused, Diameter is 80mm;Magnetic filter duct geometric center radius of curvature is 160mm, and diameter 80mm, Magnetic filter angle is 90 degree;Extension tube Road be it is tubaeform, section is rectangle, maximum draw beam spot diameter, be 260mm.By applying the present invention, the shape of ion beam spot is sent out Raw apparent change, becomes strip beam spot by original circular beam spot, beam spot size can be (10-60mm) × (30- 260mm)。
Compared with the existing technology, various embodiments of the present invention have the advantage that
1, the embodiment of the present invention proposes a kind of large area pulse magnetic filter, and maximum extraction diameter is for 260mm and directly It is suitable to flow the beam dimensions that Magnetic filter deposition cathode targets Φ 100mm is drawn;The device is set than traditional pulsed magnetic filter deposition The standby beam diameter drawn is big 3 times or more of 80mm.
It 2, is the pulsed magnetic filter deposition device of 10mm cathode construction compared to existing diameter, which improves 1- 2 times, it can be improved 1-4 times of service life of cathode targets under identical line size cases;
3, compared to existing pulsed magnetic filter deposition device, when device depositional coating, controllable substrate temperature was at 40 degree Hereinafter, being very suitable to modified to the surface of the matrix of temperature extreme sensitivity;
4, the material of high insulation is able to achieve because it is high to the tolerance of resistance compared to existing pulse magnetic filter The surface coating of the material is realized as cathode targets.
5, compared to existing pulse magnetic filter, voltage is higher when which triggers, and identical target material is able to achieve more The ion excitation of high-valence state, i.e., the mean charge state that ion is drawn in plasma is higher, is conducive to the deposition of film layer.
It should be noted that for the aforementioned method embodiment, for simple description, therefore, it is stated as a series of Combination of actions, but those skilled in the art should understand that, the present invention is not limited by the sequence of acts described, because according to According to the present invention, some steps may be performed in other sequences or simultaneously.Secondly, those skilled in the art should also know that, The embodiments described in the specification are all preferred embodiments, and related movement is not necessarily essential to the invention.
The above description is only an embodiment of the present invention, is not intended to limit the invention, it is all in spirit of the invention and Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
More features and advantages of the embodiment of the present invention will be explained in specific embodiment later.
Detailed description of the invention
The attached drawing for constituting a part of the embodiment of the present invention is used to provide to further understand the embodiment of the present invention, the present invention Illustrative embodiments and their description be used to explain the present invention, do not constitute improper limitations of the present invention.In the accompanying drawings:
Fig. 1 provides a kind of large area pulse magnetic filter side view for the embodiment of the present invention;
Fig. 2 is the total figure of pulsed cathode arc head;
The beam spot size figure of Fig. 3 embodiment 1;
The beam spot size figure of Fig. 4 embodiment 2;
The beam spot size figure of Fig. 5 embodiment 3;
Fig. 6 present invention and traditional Magnetic filter depositing system cathode life curve graph under different lines;
Fig. 7 is pulse current magnitude and beam spot size curve graph in two impulse line packets in expansion line.
Description of symbols
100 pulse magnetic filtering cathodes
101 pulse-triggered electrodes
102 extraction systems
103 focus straight tube
104 transition wire packets
105 curve line packet
106 divergence line packets
107 tubaeform magnetic tube roads
108 transition wire packets
109,110 strong current pulsed line packet
201 trigger electrodes
202 boron nitride insulation sleeves
203 ceramic insulation electrodes
204 cathode targets
205 limit electrodes
206 fixed electrodes
207 indirect cooling copper sheathings
208 cathode flanges
209 cooling copper tubes
210 cooled cathode pipes
211 triggering insulation sleeves
212 fixed insulation sleeves
213 triggering binding posts
Embodiment of the method 1
Cathode size Φ 25mm;
Trigger voltage is 15KV, triggers frequency 12Hz, and pulsewidth is 100 μ s;
Extraction electrode is apart from cathode surface 30mm, aperture Φ 60mm, extraction voltage 300V;
Focus straight tube: length 30mm, diameter of phi 80mm, line packet electric current 100A, frequency 2KHz;
Magnetic filter duct: geometric center radius of curvature is 160mm, and diameter of phi 80mm, Magnetic filter angle is 90 degree;Transition wire Packet: it is passed through Constant Direct Current, current strength is in 8A;It curves line packet: being passed through Impulsive Current, current strength 80A, pulse frequency is 8KHz, 6000 μ s of pulsewidth;Diffusing lines packet: current strength 5A;
Diffuser: having a size of 30mm × 250mm, it is 250mm that maximum, which draws side length,;Transition wire packet electric current is 15A;Upper left Impulse line packet current strength with lower-left is 30A, pulse frequency 10KHz.
Embodiment of the method 2
Cathode size Φ 25mm;
Trigger voltage is 15KV, triggers frequency 12Hz, and pulsewidth is 100 μ s;
Extraction electrode is apart from cathode surface 30mm, aperture Φ 60mm, extraction voltage 300V;
Focus straight tube: length 30mm, diameter of phi 80mm, line packet electric current 100A, frequency 2KHz;
Magnetic filter duct: geometric center radius of curvature is 160mm, and diameter of phi 80mm, Magnetic filter angle is 90 degree;Transition wire Packet: it is passed through Constant Direct Current, current strength is in 8A;It curves line packet: being passed through Impulsive Current, current strength 80A, pulse frequency is 8KHz, 6000 μ s of pulsewidth;Diffusing lines packet: current strength 5A;
Diffuser: having a size of 30mm × 250mm, it is 250mm that maximum, which draws side length,;Transition wire packet electric current is 15A;Upper left Impulse line packet current strength with lower-left is 25A, pulse frequency 10KHz.
Embodiment of the method 3
Cathode size Φ 25mm;
Trigger voltage is 15KV, triggers frequency 12Hz, and pulsewidth is 100 μ s;
Extraction electrode is apart from cathode surface 30mm, aperture Φ 60mm, extraction voltage 300V;
Focus straight tube: length 30mm, diameter of phi 80mm, line packet electric current 100A, frequency 2KHz;
Magnetic filter duct: geometric center radius of curvature is 160mm, and diameter of phi 80mm, Magnetic filter angle is 90 degree;Transition wire Packet: it is passed through Constant Direct Current, current strength is in 8A;It curves line packet: being passed through Impulsive Current, current strength 80A, pulse frequency is 8KHz, 6000 μ s of pulsewidth;Diffusing lines packet: current strength 5A;
Diffuser: having a size of 30mm × 250mm, it is 250mm that maximum, which draws side length,;Transition wire packet electric current is 15A;Upper left Impulse line packet current strength with lower-left is 15A, pulse frequency 10KHz.
Fig. 3-5 is the beam spot size figure of embodiment 1-3 educt beaming flow, from the point of view of complex chart 3-5 test result, the beam spot of extraction Maximal side size is respectively 250mm, 240mm and 233mm;Narrow elongated size is respectively 50mm, 45mm and 40mm.It can be with It sees that pulse magnetic filter of the present invention can carry out expansion regulation to ion, is that Φ 25mm is capable of forming strip in cathode size Ion beam spot, three kinds of embodiment intermediate ion beam beam spot maximum lengths are 250mm, than traditional pulse magnetic filter full-size The length for improving 3 times is very beneficial for the processing of strip workpiece, while from the point of view of beam spot color, beam homogeneity is obvious It improves, without the area apparent intense beam Liu Qiang and weak area.If Fig. 6 is conventional traditional Magnetic filter depositing system and Magnetic filter system of the present invention It unites cathode life under different beam intensities, discovery that can be apparent, present invention cathode longevity under the beam intensity of not phase Life improves 2 times or more, can be realized the saving of raw material, reduces because changing cathode, the increased time cost such as vacuumizes.Fig. 7 It is passed through influence of the different pulse currents to size is drawn for pulsed magnetic field in expansion line, can be evident that expansion line Upper pulse current is stronger, and magnetic field is stronger, and full-size can be 260mm.Therefore, the present invention passes through in diffuser and Magnetic filter pipe Ion beam spot size can substantially be unfolded under the cooperation of diatom packet electric current, cathode targets can be greatly increased under identical beam intensity Service life.

Claims (7)

1. a kind of large area pulse magnetic filter characterized by comprising
A) pulsed cathode arc head: cathode arc head is made of target cathode, trigger electrode, boron nitride insulation sleeve, cooling device;
B) extraction electrode: for extraction electrode apart from cathode surface 20-50mm, extraction electrode aperture is φ 20-60mm, extraction electrode electricity Pressure is 1-300V;
C) it focuses straight tube: focusing length of straight pipe 10-70mm, diameter 80mm;
D) magnetic filter duct: magnetic filter duct geometric center radius is 160mm, and diameter 80mm, Magnetic filter angle is 90 degree;
E) expansion line: expansion line be it is tubaeform, section is rectangle, and having a size of 30mm × 250mm, maximum draws side length and is 250mm;The beam spot size maximum of extraction can be 60mm × 260mm;
F) the device cathode targets are not necessarily to be highly conductive cathode, can be the cathode targets of poorly conductive, resistance can be 1 Ω -1M Ω。
G) substrate temperature is 20-40 DEG C during pulsed magnetic filter deposition.
2. feature includes: that cathode cooling device is indirect water-cooling, cathode targets according to pulsed arc head described in claims 1 Diameter is 20-30mm, length 20-50mm;Cathode pulse trigger voltage is 5-20KV, triggers frequency 0-1KHz, pulsewidth 10- 2400μs。
3. trigger electrode according to claim 1, it is characterized in that: under normal condition between trigger electrode and target cathode Resistance is in 1-40M Ω.
4. focusing straight tube according to claims 1, feature includes: winding line packet on straight tube, and current strength is in line packet 0-200A, frequency 0-3KHz.
5. feature includes: to wind three groups of line packets: transition on magnetic filter duct according to magnetic filter duct described in claims 1 Line packet curves line packet and divergence line packet;Transition wire packet is passed through Constant Direct Current, and current strength is in 1-10A;Line packet is curved to be passed through by force Pulse current, current strength 20-200A, pulse frequency 1Hz-1KHz, pulsewidth 1-10000 μ s;Diffusing lines packet is AC line packet, Current strength 1-10A.
6. feature includes: that diffuser is distributed three groups of line packets, close to Magnetic filter according to diffuser described in claims 1 The pulse current line packet of the transition wire packet of divergence line packet, the pulse current line packet in the upper left corner and the lower left corner;Transition wire packet is direct current Line packet, current strength 1-20A;Upper left and the lower left corner are impulse line packet, current strength 1-200A, pulse frequency 1-10KHz.
7. a kind of use the described in any item devices of claim 1~6.
CN201811091114.6A 2018-09-19 2018-09-19 Large-area pulse magnetic filtering device Active CN109082635B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811091114.6A CN109082635B (en) 2018-09-19 2018-09-19 Large-area pulse magnetic filtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811091114.6A CN109082635B (en) 2018-09-19 2018-09-19 Large-area pulse magnetic filtering device

Publications (2)

Publication Number Publication Date
CN109082635A true CN109082635A (en) 2018-12-25
CN109082635B CN109082635B (en) 2020-11-20

Family

ID=64842090

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811091114.6A Active CN109082635B (en) 2018-09-19 2018-09-19 Large-area pulse magnetic filtering device

Country Status (1)

Country Link
CN (1) CN109082635B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109763112A (en) * 2019-03-01 2019-05-17 深圳南科超膜材料技术有限公司 A kind of non-isometrical Magnetic filter system
CN109881160A (en) * 2019-03-08 2019-06-14 北京师范大学 A kind of precipitation equipment
CN111668080A (en) * 2020-04-30 2020-09-15 北京师范大学 Metal ion source emitter

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19739527A1 (en) * 1997-09-09 1999-03-11 Rossendorf Forschzent Magnetically filtered vacuum arc plasma source
US20030104142A1 (en) * 2001-11-30 2003-06-05 Nissin Electric Co., Ltd. Vacuum arc vapor deposition process and apparatus
US20040168637A1 (en) * 2000-04-10 2004-09-02 Gorokhovsky Vladimir I. Filtered cathodic arc deposition method and apparatus
CN104465284A (en) * 2014-10-22 2015-03-25 常州博锐恒电子科技有限公司 Magnetic filter MEVVA metal ion source
CN105887035A (en) * 2014-12-23 2016-08-24 北京师范大学 Circular target cathode vacuum arc source plasma magnetic filtration rectangular diversion device
CN206620354U (en) * 2016-10-09 2017-11-07 武汉光谷创元电子有限公司 PPE substrates
CN107620051A (en) * 2017-09-04 2018-01-23 武汉光谷创元电子有限公司 Copper-clad plate and its manufacture method
CN108359942A (en) * 2018-03-28 2018-08-03 北京师范大学 A kind of preparation method of wear-resistant diamond-like coating
CN108531856A (en) * 2018-04-20 2018-09-14 北京师范大学 A kind of preparation method of electrode coating

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19739527A1 (en) * 1997-09-09 1999-03-11 Rossendorf Forschzent Magnetically filtered vacuum arc plasma source
US20040168637A1 (en) * 2000-04-10 2004-09-02 Gorokhovsky Vladimir I. Filtered cathodic arc deposition method and apparatus
US20030104142A1 (en) * 2001-11-30 2003-06-05 Nissin Electric Co., Ltd. Vacuum arc vapor deposition process and apparatus
CN104465284A (en) * 2014-10-22 2015-03-25 常州博锐恒电子科技有限公司 Magnetic filter MEVVA metal ion source
CN105887035A (en) * 2014-12-23 2016-08-24 北京师范大学 Circular target cathode vacuum arc source plasma magnetic filtration rectangular diversion device
CN206620354U (en) * 2016-10-09 2017-11-07 武汉光谷创元电子有限公司 PPE substrates
CN107620051A (en) * 2017-09-04 2018-01-23 武汉光谷创元电子有限公司 Copper-clad plate and its manufacture method
CN108359942A (en) * 2018-03-28 2018-08-03 北京师范大学 A kind of preparation method of wear-resistant diamond-like coating
CN108531856A (en) * 2018-04-20 2018-09-14 北京师范大学 A kind of preparation method of electrode coating

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
王广甫等: ""磁过滤阴极真空弧沉积装置研究中的等效电路方法"", 《真空科学与技术》 *
祝士富等: ""磁过滤直流真空阴极弧制备类金刚石膜的结构和力学性能研究"", 《航空精密制造技术》 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109763112A (en) * 2019-03-01 2019-05-17 深圳南科超膜材料技术有限公司 A kind of non-isometrical Magnetic filter system
CN109881160A (en) * 2019-03-08 2019-06-14 北京师范大学 A kind of precipitation equipment
CN109881160B (en) * 2019-03-08 2020-06-30 北京师范大学 Deposition device
CN111668080A (en) * 2020-04-30 2020-09-15 北京师范大学 Metal ion source emitter
CN111668080B (en) * 2020-04-30 2021-06-08 北京师范大学 Metal ion source emitter
US11373837B2 (en) 2020-04-30 2022-06-28 Beijing Normal University Metal ion source emitting device

Also Published As

Publication number Publication date
CN109082635B (en) 2020-11-20

Similar Documents

Publication Publication Date Title
CN103298969B (en) For transmitting the method and apparatus of vacuum arc plasma body
CN109082635A (en) A kind of large area pulse magnetic filter
TWI393798B (en) Apparatus and method for forming film
CN108546920B (en) A kind of cathode vacuum arc plasma magnetic filter and its application
EP2602354A1 (en) Filtered cathodic vacuum arc deposition apparatus and method
WO2005038857A2 (en) Filtered cathodic arc plasma source
TW201119522A (en) Plasma processing apparatus and electrode for same
JP2009144236A (en) Evaporation source for arc ion plating device and arc ion plating device
CN102634761A (en) Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma
WO2011130092A1 (en) Method and apparatus for sputtering with a plasma lens
CN109295426A (en) A kind of ultra-wide and uniform Magnetic filter system and cylinder electric arc target and vacuum equipment
JP5554451B2 (en) Filter for removing macro particles from plasma beam
CN111748777B (en) Variable-angle variable-diameter magnetic filtration cathode arc film deposition equipment and method
CN105887035A (en) Circular target cathode vacuum arc source plasma magnetic filtration rectangular diversion device
CN105225917B (en) A kind of ion trap device and method for reducing straight type gun cathode pollution
CN109097744A (en) A kind of pulsed magnetic filter deposition device
CN214142510U (en) Ion coating device with scanning coil
RU2364003C1 (en) Device for cleaning off microparticles from plasma of arc evaporator
CN100460556C (en) Free open type coil filter
TWI325016B (en)
CN114574807B (en) Plasma transmission device
CN214115703U (en) Filtering device combining multistage magnetic field with lining conical pipe, straight pipe and porous baffle
RU2585243C1 (en) Device for cleaning plasma flow of arc evaporator from micro-droplet fraction
CN215365961U (en) Combined magnetic field and filter device with composite lining conical tube, straight tube and porous baffle
CN214115705U (en) Combined magnetic field and lining bias conical tube and porous baffle composite type filtering device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant