CN109082635A - A kind of large area pulse magnetic filter - Google Patents
A kind of large area pulse magnetic filter Download PDFInfo
- Publication number
- CN109082635A CN109082635A CN201811091114.6A CN201811091114A CN109082635A CN 109082635 A CN109082635 A CN 109082635A CN 201811091114 A CN201811091114 A CN 201811091114A CN 109082635 A CN109082635 A CN 109082635A
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- magnetic filter
- cathode
- packet
- line
- beam spot
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- Engineering & Computer Science (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of large area pulse magnetic filter, which includes: pulsed cathode arc head, extraction electrode, focuses straight tube, magnetic filter duct and expansion line.By implementing the present invention, apparent change occurs for the shape of ion beam spot, becomes strip beam spot by original circular beam spot, beam spot size maximum can be 60mm × 260mm, the longitudinal width for substantially increasing ion beam spot has obviously advantage in elongated member surface treatment.Large area pulse magnetic filter of the invention simultaneously can be realized being coated with for poorly conductive point cathode film layer.Educt beaming flow can be made to greatly increase by extraction electrode and being used cooperatively for focusing electrode, ion beam spot size can substantially be unfolded under the cooperation of diffuser and magnetic filter duct line packet electric current simultaneously, the service life of cathode targets can be greatly increased under identical beam intensity.
Description
Technical field
The present invention is the large area pulse Magnetic filter that proposes the problems such as solving pulsed magnetic filter ions beam uniformity, service life
Device.
Technical background
With the fast development of science and technology, the requirement to material surface modifying technology is higher and higher, the single table of tradition
Face modification technology has been increasingly difficult to meet the technical requirements in industrial production;Synthesisization, integrated and multifunction become
The trend of technology development.
In recent years, the modified complex technique in some surfaces constantly comes out and puts into industry in succession, and plays and focus on to make
With.Such as the complex technique of magnetron sputtering technique and arc ion plating (aip), big face can be deposited by being compatible with magnetron sputtering technique
The advantages of long-pending and high uniformity film advantage and ion plating technique prepare high-bond film, improves technique practicability.Again
If multi-arc ion coating is by multiple arc sources collective effect, multiple elements design film deposition is not only realized, but also significantly improve deposition
Efficiency, the technology is in cutter, parts machining industry using relatively broad at present.Multi-arc ion coating in existing surface diposition
It is wherein very important modified method.But there are a significant drawbacks for it, i.e. the compactness of depositional coating is not high, and there is microns
Grade bulky grain, temperature sensitivity matrix are not applicable etc..Magnetically filtered vacuum arc deposition technology is developed in recent years
A kind of novel ion beam method for manufacturing thin film, it filters out the bulky grain and neutral atom of the generation of arc source by Magnetic filter technology,
The pure plasma beam of no bulky grain is obtained, effectively overcomes in the deposition method of common arc source and is generated due to the presence of bulky grain
The problem of, the film of preparation has an excellent performance, but temperature when the important disadvantage of DC magnetic filtering deposition technique is film deposition
It spends or higher, surface coating can not achieve to substrate of some matrixes to temperature extreme sensitivity;Meanwhile plating some oxides
It because its target is easy poisoning is very easy to that current interruption etc. occurs when film layer, is unfavorable for the serialization deposition of film layer.Moreover, being led some
Common DC magnetic filtering can not achieve being coated with for the material when electrically poor material is as cathode.
Summary of the invention
In view of the above-mentioned problems, the present invention is based on original pulsed magnetic filtration system, by changing the trigger voltage of itself, touching
It sends out cathode construction and magnetic is drawn and filter type, propose a kind of large area pulse magnetic filter.
The first purpose of the embodiment of the present invention be by propose a kind of large area pulse magnetic filter effectively to from
Beamlet stream is regulated and controled, and realizes the strip beam spot that can handle wider component, while can greatly improve cathode life, while because
It is the problems such as film deposition continuity is deteriorated caused by pulse-triggered can be avoided because of target poisoning, Neng Goushi for triggering mode
It is existing.The material of poorly conductive also can realize that the film layer of the material is coated with as the cathode targets of pulse Magnetic filter.
For further, a kind of large area pulse magnetic filter include: pulsed cathode arc head, extraction electrode, focus it is straight
Pipe, magnetic filter duct and expansion line.
In some embodiments, pulsed cathode arc head cathode diameter is 20-30mm, and pulse-triggered voltage is 5-10KV, touching
Frequency 0-1KHz is sent out, pulsewidth is 10-2400 μ s;Extraction electrode is apart from cathode surface 20-50mm;Length of straight pipe 10-70mm is focused,
Diameter is 80mm;Magnetic filter duct geometric center radius of curvature is 160mm, and diameter 80mm, Magnetic filter angle is 90 degree;Extension tube
Road be it is tubaeform, section is rectangle, maximum draw beam spot diameter, be 260mm.By applying the present invention, the shape of ion beam spot is sent out
Raw apparent change, becomes strip beam spot by original circular beam spot, beam spot size can be (10-60mm) × (30-
260mm)。
Compared with the existing technology, various embodiments of the present invention have the advantage that
1, the embodiment of the present invention proposes a kind of large area pulse magnetic filter, and maximum extraction diameter is for 260mm and directly
It is suitable to flow the beam dimensions that Magnetic filter deposition cathode targets Φ 100mm is drawn;The device is set than traditional pulsed magnetic filter deposition
The standby beam diameter drawn is big 3 times or more of 80mm.
It 2, is the pulsed magnetic filter deposition device of 10mm cathode construction compared to existing diameter, which improves 1-
2 times, it can be improved 1-4 times of service life of cathode targets under identical line size cases;
3, compared to existing pulsed magnetic filter deposition device, when device depositional coating, controllable substrate temperature was at 40 degree
Hereinafter, being very suitable to modified to the surface of the matrix of temperature extreme sensitivity;
4, the material of high insulation is able to achieve because it is high to the tolerance of resistance compared to existing pulse magnetic filter
The surface coating of the material is realized as cathode targets.
5, compared to existing pulse magnetic filter, voltage is higher when which triggers, and identical target material is able to achieve more
The ion excitation of high-valence state, i.e., the mean charge state that ion is drawn in plasma is higher, is conducive to the deposition of film layer.
It should be noted that for the aforementioned method embodiment, for simple description, therefore, it is stated as a series of
Combination of actions, but those skilled in the art should understand that, the present invention is not limited by the sequence of acts described, because according to
According to the present invention, some steps may be performed in other sequences or simultaneously.Secondly, those skilled in the art should also know that,
The embodiments described in the specification are all preferred embodiments, and related movement is not necessarily essential to the invention.
The above description is only an embodiment of the present invention, is not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
More features and advantages of the embodiment of the present invention will be explained in specific embodiment later.
Detailed description of the invention
The attached drawing for constituting a part of the embodiment of the present invention is used to provide to further understand the embodiment of the present invention, the present invention
Illustrative embodiments and their description be used to explain the present invention, do not constitute improper limitations of the present invention.In the accompanying drawings:
Fig. 1 provides a kind of large area pulse magnetic filter side view for the embodiment of the present invention;
Fig. 2 is the total figure of pulsed cathode arc head;
The beam spot size figure of Fig. 3 embodiment 1;
The beam spot size figure of Fig. 4 embodiment 2;
The beam spot size figure of Fig. 5 embodiment 3;
Fig. 6 present invention and traditional Magnetic filter depositing system cathode life curve graph under different lines;
Fig. 7 is pulse current magnitude and beam spot size curve graph in two impulse line packets in expansion line.
Description of symbols
100 pulse magnetic filtering cathodes
101 pulse-triggered electrodes
102 extraction systems
103 focus straight tube
104 transition wire packets
105 curve line packet
106 divergence line packets
107 tubaeform magnetic tube roads
108 transition wire packets
109,110 strong current pulsed line packet
201 trigger electrodes
202 boron nitride insulation sleeves
203 ceramic insulation electrodes
204 cathode targets
205 limit electrodes
206 fixed electrodes
207 indirect cooling copper sheathings
208 cathode flanges
209 cooling copper tubes
210 cooled cathode pipes
211 triggering insulation sleeves
212 fixed insulation sleeves
213 triggering binding posts
Embodiment of the method 1
Cathode size Φ 25mm;
Trigger voltage is 15KV, triggers frequency 12Hz, and pulsewidth is 100 μ s;
Extraction electrode is apart from cathode surface 30mm, aperture Φ 60mm, extraction voltage 300V;
Focus straight tube: length 30mm, diameter of phi 80mm, line packet electric current 100A, frequency 2KHz;
Magnetic filter duct: geometric center radius of curvature is 160mm, and diameter of phi 80mm, Magnetic filter angle is 90 degree;Transition wire
Packet: it is passed through Constant Direct Current, current strength is in 8A;It curves line packet: being passed through Impulsive Current, current strength 80A, pulse frequency is
8KHz, 6000 μ s of pulsewidth;Diffusing lines packet: current strength 5A;
Diffuser: having a size of 30mm × 250mm, it is 250mm that maximum, which draws side length,;Transition wire packet electric current is 15A;Upper left
Impulse line packet current strength with lower-left is 30A, pulse frequency 10KHz.
Embodiment of the method 2
Cathode size Φ 25mm;
Trigger voltage is 15KV, triggers frequency 12Hz, and pulsewidth is 100 μ s;
Extraction electrode is apart from cathode surface 30mm, aperture Φ 60mm, extraction voltage 300V;
Focus straight tube: length 30mm, diameter of phi 80mm, line packet electric current 100A, frequency 2KHz;
Magnetic filter duct: geometric center radius of curvature is 160mm, and diameter of phi 80mm, Magnetic filter angle is 90 degree;Transition wire
Packet: it is passed through Constant Direct Current, current strength is in 8A;It curves line packet: being passed through Impulsive Current, current strength 80A, pulse frequency is
8KHz, 6000 μ s of pulsewidth;Diffusing lines packet: current strength 5A;
Diffuser: having a size of 30mm × 250mm, it is 250mm that maximum, which draws side length,;Transition wire packet electric current is 15A;Upper left
Impulse line packet current strength with lower-left is 25A, pulse frequency 10KHz.
Embodiment of the method 3
Cathode size Φ 25mm;
Trigger voltage is 15KV, triggers frequency 12Hz, and pulsewidth is 100 μ s;
Extraction electrode is apart from cathode surface 30mm, aperture Φ 60mm, extraction voltage 300V;
Focus straight tube: length 30mm, diameter of phi 80mm, line packet electric current 100A, frequency 2KHz;
Magnetic filter duct: geometric center radius of curvature is 160mm, and diameter of phi 80mm, Magnetic filter angle is 90 degree;Transition wire
Packet: it is passed through Constant Direct Current, current strength is in 8A;It curves line packet: being passed through Impulsive Current, current strength 80A, pulse frequency is
8KHz, 6000 μ s of pulsewidth;Diffusing lines packet: current strength 5A;
Diffuser: having a size of 30mm × 250mm, it is 250mm that maximum, which draws side length,;Transition wire packet electric current is 15A;Upper left
Impulse line packet current strength with lower-left is 15A, pulse frequency 10KHz.
Fig. 3-5 is the beam spot size figure of embodiment 1-3 educt beaming flow, from the point of view of complex chart 3-5 test result, the beam spot of extraction
Maximal side size is respectively 250mm, 240mm and 233mm;Narrow elongated size is respectively 50mm, 45mm and 40mm.It can be with
It sees that pulse magnetic filter of the present invention can carry out expansion regulation to ion, is that Φ 25mm is capable of forming strip in cathode size
Ion beam spot, three kinds of embodiment intermediate ion beam beam spot maximum lengths are 250mm, than traditional pulse magnetic filter full-size
The length for improving 3 times is very beneficial for the processing of strip workpiece, while from the point of view of beam spot color, beam homogeneity is obvious
It improves, without the area apparent intense beam Liu Qiang and weak area.If Fig. 6 is conventional traditional Magnetic filter depositing system and Magnetic filter system of the present invention
It unites cathode life under different beam intensities, discovery that can be apparent, present invention cathode longevity under the beam intensity of not phase
Life improves 2 times or more, can be realized the saving of raw material, reduces because changing cathode, the increased time cost such as vacuumizes.Fig. 7
It is passed through influence of the different pulse currents to size is drawn for pulsed magnetic field in expansion line, can be evident that expansion line
Upper pulse current is stronger, and magnetic field is stronger, and full-size can be 260mm.Therefore, the present invention passes through in diffuser and Magnetic filter pipe
Ion beam spot size can substantially be unfolded under the cooperation of diatom packet electric current, cathode targets can be greatly increased under identical beam intensity
Service life.
Claims (7)
1. a kind of large area pulse magnetic filter characterized by comprising
A) pulsed cathode arc head: cathode arc head is made of target cathode, trigger electrode, boron nitride insulation sleeve, cooling device;
B) extraction electrode: for extraction electrode apart from cathode surface 20-50mm, extraction electrode aperture is φ 20-60mm, extraction electrode electricity
Pressure is 1-300V;
C) it focuses straight tube: focusing length of straight pipe 10-70mm, diameter 80mm;
D) magnetic filter duct: magnetic filter duct geometric center radius is 160mm, and diameter 80mm, Magnetic filter angle is 90 degree;
E) expansion line: expansion line be it is tubaeform, section is rectangle, and having a size of 30mm × 250mm, maximum draws side length and is
250mm;The beam spot size maximum of extraction can be 60mm × 260mm;
F) the device cathode targets are not necessarily to be highly conductive cathode, can be the cathode targets of poorly conductive, resistance can be 1 Ω -1M
Ω。
G) substrate temperature is 20-40 DEG C during pulsed magnetic filter deposition.
2. feature includes: that cathode cooling device is indirect water-cooling, cathode targets according to pulsed arc head described in claims 1
Diameter is 20-30mm, length 20-50mm;Cathode pulse trigger voltage is 5-20KV, triggers frequency 0-1KHz, pulsewidth 10-
2400μs。
3. trigger electrode according to claim 1, it is characterized in that: under normal condition between trigger electrode and target cathode
Resistance is in 1-40M Ω.
4. focusing straight tube according to claims 1, feature includes: winding line packet on straight tube, and current strength is in line packet
0-200A, frequency 0-3KHz.
5. feature includes: to wind three groups of line packets: transition on magnetic filter duct according to magnetic filter duct described in claims 1
Line packet curves line packet and divergence line packet;Transition wire packet is passed through Constant Direct Current, and current strength is in 1-10A;Line packet is curved to be passed through by force
Pulse current, current strength 20-200A, pulse frequency 1Hz-1KHz, pulsewidth 1-10000 μ s;Diffusing lines packet is AC line packet,
Current strength 1-10A.
6. feature includes: that diffuser is distributed three groups of line packets, close to Magnetic filter according to diffuser described in claims 1
The pulse current line packet of the transition wire packet of divergence line packet, the pulse current line packet in the upper left corner and the lower left corner;Transition wire packet is direct current
Line packet, current strength 1-20A;Upper left and the lower left corner are impulse line packet, current strength 1-200A, pulse frequency 1-10KHz.
7. a kind of use the described in any item devices of claim 1~6.
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CN109881160A (en) * | 2019-03-08 | 2019-06-14 | 北京师范大学 | A kind of precipitation equipment |
CN111668080A (en) * | 2020-04-30 | 2020-09-15 | 北京师范大学 | Metal ion source emitter |
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CN109763112A (en) * | 2019-03-01 | 2019-05-17 | 深圳南科超膜材料技术有限公司 | A kind of non-isometrical Magnetic filter system |
CN109881160A (en) * | 2019-03-08 | 2019-06-14 | 北京师范大学 | A kind of precipitation equipment |
CN109881160B (en) * | 2019-03-08 | 2020-06-30 | 北京师范大学 | Deposition device |
CN111668080A (en) * | 2020-04-30 | 2020-09-15 | 北京师范大学 | Metal ion source emitter |
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