CN108531856A - A kind of preparation method of electrode coating - Google Patents

A kind of preparation method of electrode coating Download PDF

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Publication number
CN108531856A
CN108531856A CN201810358042.0A CN201810358042A CN108531856A CN 108531856 A CN108531856 A CN 108531856A CN 201810358042 A CN201810358042 A CN 201810358042A CN 108531856 A CN108531856 A CN 108531856A
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preparation
electrode coating
electrode
line packet
frequency
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CN108531856B (en
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廖斌
欧阳晓平
张丰收
张旭
吴先映
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Beijing Normal University
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Beijing Normal University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605Carbon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • C23C14/022Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a kind of preparation methods of electrode coating, include the following steps:1S:High low energy is carried out using gas ion source to electrode matrix surface alternately to clean;2S:Using carbon target as cathode, the deposition of electrode coating is carried out on the electrode matrix using Kai Saiao arc Magnetic filter deposition methods.This method deposition rate is high, at low cost, can realize large-scale roll-to-roll production.Use electrode coating prepared by this method for the mixing and doping structure of tetrahedral amorphous shape carbon and hydrogeneous DLC;The coating has highly corrosion resistant, has higher temperature-resistance characteristic than hydrogeneous DLC;There is high conductivity simultaneously, and film layer compactness is good.

Description

A kind of preparation method of electrode coating
Technical field
The invention belongs to fuel cell electrode production fields, and in particular to a kind of preparation method of electrode coating.
Background technology
It is reported that France energy secretary Nicolas Hulot are indicated:Since the year two thousand forty, France will stop selling comprehensively Gasoline car and diesel vehicle.France's plan will become carbon-free country before the year two thousand fifty.And in last Jun, Holland proposes " 2025 Start to forbid gasoline and diesel vehicle " suggestion also obtained congressional support.Last October, in the Germany that automotive giant converges, ginseng Legislative assembly has passed through a resolution, it is specified that forbidding selling fuel vehicle after the year two thousand thirty.Electric vehicle is one of the solution in future, But the reason of lithium battery is because of energy storage density, cruising ability are always the bottleneck that it is really applied on a large scale.
Fuel cell is the following solution most potential battery variety of electric vehicle cruising ability.Fuel cell be it is a kind of not Burning fuel and the efficient generating apparatus that the chemical energy of fuel is changed into electric energy directly in a manner of electrochemical reaction.The base of power generation Present principles are:Anode (fuel electrodes) inputting hydrogen (fuel) of battery, hydrogen molecule (H2) dissociated under anode catalyst effect As hydrogen ion (H+) and electronics (e-), H+Electrolyte layer across fuel cell is moved to cathode (oxidation pole) direction, e-Because logical But electrolyte layer and cathode is flowed to by an external circuit;In cell cathode input oxygen (O2), oxygen is in cathod catalyst The lower dissociation of effect becomes oxygen atom (O), with the e for flowing to cathode by external circuit-The H of electrolyte is passed through with fuel+In conjunction with generation Water (the H of rock-steady structure2O), complete electrochemical reaction and release heat.The play that this electrochemical reaction occurs with hydrogen in oxygen Strong combustion reaction is entirely different, as long as anode continually enters hydrogen, cathode continually enters oxygen, and electrochemical reaction will connect It is continuous constantly to go on, e-It constantly will flow to form electric current by external circuit, to continuously provide to automobile Electric power.Also entirely different with the rotary machine electricity generating principle of traditional electric conductor cutting magnetic line, this electrochemical reaction belongs to A kind of static generation mode obtaining electric power without object of which movement.Thus, fuel cell has efficient, low noise, without dirt The advantages that contaminating object discharge, which ensure that fuel cell car becomes efficient, cleaning vehicle truly.But fuel cell closes One of key technology is the service life of electrode, because chemical reaction occurs for inside battery so it generates H because of partial reaction2SO4And HF, Electrode surface seriously affects the service life of electrode because being easy to happen corrosion under acidic environment.Now concerning in electrode surface plated film The technique study of processing is less, seldom similar relevant report.
Invention content
Present invention seek to address that problem as described above.The object of the present invention is to provide a kind of preparation sides of electrode coating Method.This method deposition rate is high, at low cost, can realize large-scale roll-to-roll production.The electrode coating prepared using this method For the mixing and doping structure of tetrahedral amorphous shape carbon and hydrogeneous DLC;The coating has highly corrosion resistant, has more than hydrogeneous DLC High temperature-resistance characteristic;There is high conductivity simultaneously, and film layer compactness is good.
According to an aspect of the present invention, the present invention provides a kind of preparation method of electrode coating, include the following steps:
1S:High low energy is carried out using gas ion source to electrode matrix surface alternately to clean;
2S:Using carbon target as cathode, electrode painting is carried out on the electrode matrix using Kai Saiao arc Magnetic filter deposition methods The deposition of layer.
Wherein, the Kai Saiao arcs Magnetic filter deposition method is specially:The carbon ion that the carbon target generates is set to sequentially pass through First flash line packet inhibits line packet and magnetic filter.
Wherein, the second flash line packet, medium line packet and high impulse caustic are disposed on the magnetic filter Packet.
Wherein,
0.1~100Hz of frequency of the first flash line packet is set, and electric current is 0.1~50A;
The frequency that the inhibition line packet is arranged is 0.1~200Hz, and electric current is 0.1~10A;
The frequency that the second flash line packet is arranged is 20~80Hz, and electric current is 0.1~20A;
The medium line packet is AC line packet, and it is 0.1~5A that its electric current, which is arranged,;
The frequency that the high impulse caustic packet is arranged is 30~300Hz, and electric current is 30~200A.
Wherein, in the step 2S, when carrying out the deposition, high power pulse bias is applied to the electrode matrix Compound Dc bias.
Wherein,
The voltage that the high power pulse bias is arranged is 1~10kV, and pulse width is 0.1~1.2ms, and pulse frequency is 1~100Hz, duty ratio are less than 1/10000, and peak power is 0.1~5MW;
The voltage that the Dc bias is arranged is 1~600V, duty ratio 1~80%.
Wherein, in the step 2S, when carrying out the deposition, setting striking current is 50~100A, tolerance S= 250sin (π * x/120) sccm, 0.1~10min of sedimentation time.
Wherein, to the magnetic filter apply pulsed positive bias, be arranged the pulsed positive bias frequency 20~ 100Hz, 10~30V of voltage.
Wherein, in the step 1S, the gas ion source is anode layer ion source, the energy of the anode layer ion source Amount is 1~3000eV, 1~500mA of beam intensity;After carrying out the high low energy and alternately cleaning, the electrode matrix surface Roughness is less than 0.01 micron.
According to another aspect of the present invention, it provides and is deposited on electrode matrix surface according to the preparation method of above-mentioned electrode coating Tetrahedral amorphous shape carbon and hydrogeneous DLC mixing and doping structure coating.
The preparation method of the electrode coating of the present invention, includes the following steps:
Wet abrasive blasting, oil removing, grease removal processing are carried out to electrode matrix surface.When to electrode matrix surface wet shot, the grain size of sand For 200-500 mesh, wet shot processing time 60-120s;Then electrode matrix is immersed successively acetone, alcohol carries out ultrasonic cleaning With oil removing grease removal.
1S:High low energy is carried out to electrode matrix surface using anode layer ion source alternately to clean, to electrode matrix surface into Row polishing or etching obtain the electrode matrix surface that roughness is less than 0.01 micron.Wherein, anode layer ion source energy is 1 ~3000eV, 1~500mA of beam intensity.
In the present invention, gas ion source selects anode layer ion source.Compared to other ion sources, anode that the present invention selects Leafing component equipment cost is simple, maintenance cost is low;Secondly, anode layer ion source can carry out the surface treatment of large area, work It is good to make stability;In addition, anode layer ion source is high current ion source, beam current density adjustable extent is big.Select the above parameter area Quick, stable matrix can be processed by shot blasting, and handle roughness to control effectively by energy.
2S:Using carbon target as cathode, tetrahedral amorphous is carried out on electrode matrix using Kai Saiao arc Magnetic filter deposition methods Shape carbon (ta~C) adulterates the deposition of hydrogeneous DLC coatings.
Kai Saiao arc Magnetic filter deposition methods are specially:The carbon ion that carbon target generates is set to sequentially pass through the first flash line Packet inhibits line packet and magnetic filter.In the present invention, magnetic filter be 90 °, be disposed with the second flash line packet, Medium line packet and high impulse caustic packet.
First flash line packet and inhibition line packet are successively set on anode canister;One end of magnetic filter connects with anode canister It connects, the second flash line packet is adjacent with anode canister;The other end of magnetic filter is connected with vacuum deposition chamber, and high impulse defocuses Line packet is adjacent with vacuum deposition chamber.
The electric current of first flash line packet is Impulsive Current, mainly controls spots moving;The strong pulsed magnetic field direction with Between the angle 0.01-90 degree of cathode target plane, spots moving can be caused unstable more than the range, which can be greatly decreased The Partial ablation of long-time arcing point, substantially reduces drop;
Inhibition line packet is transition wire packet, is the line packet for connecting the first flash line packet and magnetic filter, which packages Stabilising arc acts on.It needs to be disposed near the geometric center position of the first flash line packet and magnetic filter;Deviate the position The line packet for setting magnetic filter can be very big on the influence of cathode targets Surface field so that the starting the arc is unstable.
The second flash line packet in magnetic filter, electric current are pulse current, primarily serve and draw plasma Effect.Second flash line packet line packet intensity when being matched with medium line packet has to be larger than the magnetic field intensity of medium line packet, otherwise Beam breakup can be caused, or is drastically declined.Medium line packet is used for deflecting plasma;High impulse caustic packet is plasma Egress line packet, primarily serve diffusion plasma effect so that the beam spot diameter, of plasma be 300-500mm.
In the present invention, 0.1~100Hz of frequency of the first flash line packet is set, electric current is 0.1~50A;Inhibit line packet Frequency is 0.1~200Hz, and electric current is 0.1~10A;The frequency of second flash line packet be 20~80Hz, electric current be 0.1~ 20A;Medium line packet is AC line packet, and it is 0.1~5A that its electric current, which is arranged,;The frequency of high impulse caustic packet is 30~300Hz, electricity Stream is 30~200A.Pulsed positive bias, pulsed positive bias 20~100Hz of frequency, voltage are applied to magnetic filter simultaneously 10~30V.
Position by studying each line packet is arranged, and considers mutual between each line bag parameter and positive bias parameter Effect;Influence each other between each parameter, the above parameter area inner cathode arc source can normal table work, and draw etc. from Daughter beam intensity is high, and diverging is small.
When being deposited, setting striking current is 50~100A, is passed through methane, acetylene or propyne gas, tolerance S =250sin (π * x/120) sccm, 0.1~10min of sedimentation time.In addition, also applying high power pulse bias to electrode matrix Compound Dc bias;The voltage of high power pulse bias be 1~10kV, pulse width be 0.1~1.2ms, pulse frequency be 1~ 100Hz, duty ratio are less than 1/10000, and peak power is 0.1~5MW;The voltage of Dc bias be 1~600V, duty ratio 1~ 80%.The process integrates the ultrashort duty ratio of high power (duty ratio is less than 1/10000) and low pressure high duty ratio, Ji Nengli Internal stress is reduced with the moment thermal spike effect of high power bias and improves binding force, can also low pressure high duty ratio be utilized to improve film layer Continuity and the reduction film layer caused by long-time high negative pressure sputter.
When carrying out coating deposition, above each parameter influences each other;Air inflow, striking current and the compound bias ginseng of matrix Number cooperates and mutually restricts, and the film layer advantage of the compound preparation under the above parameter has:1, film-substrate cohesion is excellent;2, in film layer Stress is small;3, film layer elasticity modulus is high, good toughness;4, film deposition rate is fast;5, plasma is diffractive good when plated film;6, film Layer surface roughness is low, and film layer is smooth, and film layer compactness is high, excellent anti-corrosion performance.
The present invention completes the preparation of electrode coating using a set of gas ion source and Kai Saiao arc Magnetic filter deposition methods, The coating is the accumulation of multi-cycle period tapered sinusoidal modulation, and overall thickness is less than 1 micron;For tetrahedral amorphous shape carbon (ta~C) With the mixing and doping structure of hydrogeneous DLC, the film layer is without other elements (removing C, H).
To sum up, the preparation method of electrode coating of the invention has the advantage that compared with prior art:
1, coating compactness is good, has highly corrosion resistant, can take into account resistivity simultaneously.
2, have higher temperature-resistance characteristic than hydrogeneous DLC, while there is high conductivity.
3, deposition rate is high, at low cost, can realize large-scale roll-to-roll production.
Being described below for embodiment is read with reference to the drawings, other property features of the invention and advantage will become clear It is clear.
Description of the drawings
It is incorporated into specification and the attached drawing of a part for constitution instruction shows the embodiment of the present invention, and with Principle for explaining the present invention together is described, in the drawings, similar reference numeral is used to indicate similar element, under Attached drawing in the description of face is some embodiments of the present invention, rather than whole embodiments, and those of ordinary skill in the art are come It says, it without creative efforts, can be obtain other attached drawings according to these attached drawings.
Fig. 1 shows a kind of flow chart of the preparation method of electrode coating according to the present invention;
Fig. 2 shows the vertical views of Kai Saiao arcs according to an embodiment of the invention;Wherein, 200 for cathode targets, 201 be the first flash line packet, 202 be anode canister, 203 be inhibit line packet, 204 be the second flash line packet, 205 be Magnetic filter Bend pipe, 206 be medium line packet, 207 be high impulse caustic packet;
Fig. 3 shows the vertical view of vacuum deposition chamber in the preparation process of electrode coating according to the present invention;
Wherein, 3~1 be external tapping 1, is connect with anode layer ion source;3~2,3~3 be external tapping 2~3, with Kai Saiao The magnetic filter of arc connects;3~4 be spare mouth, and 3~5 be emptying roller, and 3~6 be chill roll, and 3~7 be guide roller, and 3~8 are Material receiving roller;
Fig. 4 shows the electrode coating prepared by the one of embodiment of the preparation method of electrode coating according to the present invention Electrochemistry dynamic potential polarization curve figure;
Fig. 5 shows the electrode coating prepared by the one of embodiment of the preparation method of electrode coating according to the present invention Electrochemistry dynamic potential polarization curve figure;
Fig. 6 shows no a~C:The electrochemistry dynamic potential polarization curve figure of the electrode matrix of H coatings.
Specific implementation mode
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention In attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is A part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art The every other embodiment obtained without making creative work, shall fall within the protection scope of the present invention.It needs Illustrate, in the absence of conflict, the features in the embodiments and the embodiments of the present application mutually can be combined arbitrarily.
The preparation method of the electrode coating of the application, includes the following steps:Electrode matrix surface is squirted, oil removing removes Fat processing;
High low energy is carried out using anode layer ion source to electrode matrix surface alternately to clean, anode layer ion source energy is 1 ~3000eV, 1~500mA of beam intensity;Obtain the electrode matrix surface that roughness is less than 0.01 micron.
Using carbon target as cathode, the carbon ion of generation is made to sequentially pass through the first flash line packet, inhibit line packet and Magnetic filter curved Then the second flash line packet, medium line packet and the high impulse caustic packet being arranged on pipe carry out ta~C on electrode matrix and mix The deposition of miscellaneous hydrogeneous DLC coatings.
Depositing operation:Setting striking current is 50~100A, and tolerance is S=250sin (π * x/120) sccm, high power arteries and veins The voltage for rushing bias is 1~10kV, and pulse width is 0.1~1.2ms, and pulse frequency is 1~100Hz, and duty ratio is less than 1/ 10000, peak power is 0.1~5MW;The voltage of Dc bias is 1~600V, duty ratio 1~80%.
Each line bag parameter is set:0.1~100Hz of frequency of first flash line packet 201, electric current are 0.1~50A;Inhibit 0.1~200Hz of frequency of line packet 203, electric current are 0.1~10A;The frequency of second flash line packet 204 is 20~80Hz, electric current For 0.1~20A;Medium line packet 206 is AC line packet, and electric current is 0.1~5A;The frequency of high impulse caustic packet 207 is 30 ~300Hz, electric current are 30~200A.Magnetic filter pulsed positive bias 20~100Hz of frequency, 10~30V of voltage.
Embodiment
Embodiment 1
1S:High energy (1500~2000V) is carried out using anode layer ion source and cleans base material, is carried out using anode layer ion source Low energy (100~500V) cleans base material;
2S:Using carbon target as cathode, striking current 100A is set, tolerance is changed by S=250sin (π * x/120) sccm;If It is 7kV, pulse width 1.2ms, pulse frequency 50HZ that set high power pulse bias, which be ceiling voltage,;Dc bias is 300V, is accounted for Sky is than being 80%.Sedimentation time 5 minutes.
Each line packet magnetic field parameter is as follows:
201:Frequency 18Hz, electric current 30A;
203:Frequency 50Hz, electric current 5A;
204:Frequency 80Hz, electric current 20A;
206:Electric current 3A;
207:Frequency 150Hz, 100A.
Embodiment 2
1S:High energy (2000~2500V) is carried out using anode layer ion source and cleans base material, is carried out using anode layer ion source High energy (100~300V) cleans base material;
2S:Using carbon target as cathode, striking current 100A is set, tolerance is changed by S=250sin (π * x/120) sccm;If It is 7kV, pulse width 1.2ms, pulse frequency 50Hz that set high power pulse bias, which be ceiling voltage,;Dc bias is 300V, is accounted for Sky is than being 80%.Sedimentation time 5 minutes.
Each line packet magnetic field parameter is as follows:
201:Frequency 50Hz, electric current 10A;
203:Frequency 50Hz, electric current 10A;
204:Frequency 80Hz, electric current 20A,;
206:Electric current 3A;
207:Frequency 100Hz, electric current 200A.
The embodiment of the present invention data can also show that specific data are as shown in table 1 in table form.
Table 1
Contrast test example
In order to further show the advantageous effect of electrode coating of the invention, respectively to passing through a in Examples 1 and 2 ~C:H coatings deposition electrode and without a~C:The resistance to corrosion of the electrode matrix (comparative example) of H depositions is tested pair Than.
1. test event:Electrochemistry dynamic potential polarization curve;
2. test condition:Solution:0.5M H2SO4, 2ppm HF, 80 DEG C of temperature;
3. test result:
Embodiment 1:From fig. 4 it can be seen that the electrode coating of embodiment 1 is in 0.5M H2SO4Under 2ppm HF, 0.2~ Corrosion electric current density is less than 1 microampere/centimetre under 0.6V voltages2, have very strong resistance to corrosion,
Embodiment 2:It is seen from fig 5 that the electrode coating of embodiment 2 is in 0.5M H2SO4Under 2ppm HF, 0.2~ Corrosion electric current density is in 0.5~10 microampere/centimetre under 0.6V voltages2, have very strong resistance to corrosion.
Comparative example:As seen from Figure 6, comparative example is in 0.5M H2SO4It is rotten under 0.2~0.6V voltages under 2ppm HF Erosion current density reaches as high as 100 milliamperes/centimetre2, resistance to corrosion is very poor.
The electrode coating prepared by preparation method it can be seen from the above contrast test result using the application is in acidity Under the conditions of, there is apparent resistance to corrosion.
In addition, in the industrial production, a roll of stainless steel/Titanium base overall length 500m is needed by 0.5m/min rate processings 16.6 hours, still, the service life of magnetic filtering cathode target was no more than 15 hours.The present invention passes through certain line packet type and parameter Setting can be easily achieved the movement of control arc spot, and the service life of cathode targets can be greatly improved, make its service life can Up to 50 hours.Therefore, a roll of base material has been handled to carry out changing target without midway destruction vacuum.
One month (being calculated with 24 days), the area of processing in 1 year are:24 × 500m × 0.5m=7200m2, sales volume 7200m2× 1000 yuan=7,200,000 yuan.One metalized equipment price is about at 10,000,000 yuan, every year based on 15% depreciation cost Calculate, every month about 12.5 ten thousand yuan of depreciation cost, in addition the labour cost of factory, fee of material, rental charge etc. are monthly paid wages 300,000 yuan, profit Space is considerable.
In conclusion the preparation method deposition rate of the electrode coating of the present invention is high, and it is at low cost, it can realize large-scale volume Volume is produced, productivity effect is improved.The electrode coating film layer compactness produced using this method is good, has extraordinary corrosion-resistant Performance can take into account resistivity simultaneously.
Descriptions above can combine implementation individually or in various ways, and these variants all exist Within protection scope of the present invention.
Finally it should be noted that:The above embodiments are merely illustrative of the technical solutions of the present invention, rather than its limitations.Although Present invention has been described in detail with reference to the aforementioned embodiments, it will be understood by those of ordinary skill in the art that:It still may be used With technical scheme described in the above embodiments is modified or equivalent replacement of some of the technical features; And these modifications or replacements, various embodiments of the present invention technical solution that it does not separate the essence of the corresponding technical solution spirit and Range.

Claims (10)

1. a kind of preparation method of electrode coating, which is characterized in that include the following steps:
1S:High low energy is carried out using gas ion source to electrode matrix surface alternately to clean;
2S:Using carbon target as cathode, electrode coating is carried out on the electrode matrix using Kai Saiao arc Magnetic filter deposition methods Deposition.
2. the preparation method of electrode coating as described in claim 1, which is characterized in that the Kai Saiao arcs Magnetic filter deposition side Method is specially:The carbon ion that the carbon target generates is set to sequentially pass through the first flash line packet, inhibit line packet and magnetic filter.
3. the preparation method of electrode coating as claimed in claim 2, which is characterized in that set gradually on the magnetic filter There are the second flash line packet, medium line packet and high impulse caustic packet.
4. the preparation method of electrode coating as claimed in claim 3, which is characterized in that
0.1~100Hz of frequency of the first flash line packet is set, and electric current is 0.1~50A;
The frequency that the inhibition line packet is arranged is 0.1~200Hz, and electric current is 0.1~10A;
The frequency that the second flash line packet is arranged is 20~80Hz, and electric current is 0.1~20A;
The medium line packet is AC line packet, and it is 0.1~5A that its electric current, which is arranged,;
The frequency that the high impulse caustic packet is arranged is 30~300Hz, and electric current is 30~200A.
5. the preparation method of electrode coating as described in claim 1, which is characterized in that in the step 2S, carrying out institute When stating deposition, the compound Dc bias of high power pulse bias is applied to the electrode matrix.
6. the preparation method of electrode coating as claimed in claim 5, which is characterized in that
Be arranged the high power pulse bias voltage be 1~10kV, pulse width be 0.1~1.2ms, pulse frequency be 1~ 100Hz, duty ratio are less than 1/10000, and peak power is 0.1~5MW;
The voltage that the Dc bias is arranged is 1~600V, duty ratio 1~80%.
7. the preparation method of electrode coating as described in claim 1, which is characterized in that in the step 2S, carrying out institute When stating deposition, setting striking current be 50~100A, tolerance be S=250sin (π * x/120) sccm, sedimentation time 0.1~ 10min。
8. the preparation method of electrode coating as claimed in claim 2, which is characterized in that apply pulse to the magnetic filter The pulsed positive bias 20~100Hz of frequency, 10~30V of voltage is arranged in formula positive bias.
9. the preparation method of electrode coating as described in claim 1, which is characterized in that in the step 1S, the gas Ion source is anode layer ion source, and the energy of the anode layer ion source is 1~3000eV, 1~500mA of beam intensity;
After carrying out the high low energy and alternately cleaning, the roughness on the electrode matrix surface is less than 0.01 micron.
10. a kind of preparation method using such as claim 1~9 any one of them electrode coating deposits on electrode matrix surface Tetrahedral amorphous shape carbon and hydrogeneous DLC mixing and doping structure coating.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109082635A (en) * 2018-09-19 2018-12-25 北京师范大学 A kind of large area pulse magnetic filter

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