TWD237985S - Collimator for use in a physical vapor deposition (pvd) chamber - Google Patents

Collimator for use in a physical vapor deposition (pvd) chamber Download PDF

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Publication number
TWD237985S
TWD237985S TW111300791D01F TW111300791D01F TWD237985S TW D237985 S TWD237985 S TW D237985S TW 111300791D01 F TW111300791D01 F TW 111300791D01F TW 111300791D01 F TW111300791D01 F TW 111300791D01F TW D237985 S TWD237985 S TW D237985S
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TW
Taiwan
Prior art keywords
design
pvd
collimator
chamber
vapor deposition
Prior art date
Application number
TW111300791D01F
Other languages
Chinese (zh)
Inventor
萊克馬丁李
馬丁李 萊克
張富宏
富宏 張
仲蘭蘭
卡拉瑟帕蘭比爾奇索庫瑪
奇索庫瑪 卡拉瑟帕蘭比爾
Original Assignee
美商應用材料股份有限公司 (美國)
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 美商應用材料股份有限公司 (美國), 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司 (美國)
Priority to TW111300791D01F priority Critical patent/TWD237985S/en
Publication of TWD237985S publication Critical patent/TWD237985S/en

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Abstract

【物品用途】;本設計所請求係用於物理氣相沉積（PVD）腔室中的準直器。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;本衍生設計案與原設計(第111300791號申請案)案差異在於，本衍生設計之螺孔和凹槽係以虛線表示(即不主張設計之部分)。[Article Use];This design is for a collimator in a physical vapor deposition (PVD) chamber.;[Design Description];The dashed line portion disclosed in the diagram is the portion that this case does not claim to design.;The difference between this derivative design and the original design (Application No. 111300791) is that the screw holes and grooves of this derivative design are represented by dashed lines (i.e., the portion that is not claimed to design).

Description

用於物理氣相沉積（PVD）腔室中的準直器Collimators for Physical Vapor Deposition (PVD) Chambers

本設計所請求係用於物理氣相沉積（PVD）腔室中的準直器。This design request is for a collimator used in a physical vapor deposition (PVD) chamber.

圖式所揭露之虛線部分，為本案不主張設計之部分。The dotted line part in the diagram is not the design advocated by this case.

本衍生設計案與原設計(第111300791號申請案)案差異在於，本衍生設計之螺孔和凹槽係以虛線表示(即不主張設計之部分)。The difference between this derivative design and the original design (Application No. 111300791) is that the screw holes and grooves of this derivative design are represented by dotted lines (i.e., the parts not claimed in the design).

TW111300791D01F 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber TWD237985S (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW111300791D01F TWD237985S (en) 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW111300791D01F TWD237985S (en) 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber

Publications (1)

Publication Number Publication Date
TWD237985S true TWD237985S (en) 2025-05-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW111300791D01F TWD237985S (en) 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber

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TW (1) TWD237985S (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD200242S (en) 2018-03-16 2019-10-11 美商應用材料股份有限公司 A collimator for use in a physical vapor deposition (pvd) chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD200242S (en) 2018-03-16 2019-10-11 美商應用材料股份有限公司 A collimator for use in a physical vapor deposition (pvd) chamber

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