TWD180128S - sealing ring part - Google Patents
sealing ring partInfo
- Publication number
- TWD180128S TWD180128S TW105302078F TW105302078F TWD180128S TW D180128 S TWD180128 S TW D180128S TW 105302078 F TW105302078 F TW 105302078F TW 105302078 F TW105302078 F TW 105302078F TW D180128 S TWD180128 S TW D180128S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- case
- wafer
- sealing ring
- advocated
- Prior art date
Links
- 238000007789 sealing Methods 0.000 title abstract 2
- 238000007747 plating Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 238000010586 diagram Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是密封環。;【設計說明】;本物品如「使用狀態參考圖」所示，是覆蓋在晶圓的周端部(邊緣部)的構件，該晶圓是被保持在基板電鍍裝置等的基板座的支承面上；該物品是當將晶圓被浸漬於電鍍液時，防止要進行電鍍的面以外的邊緣部、背面等接觸到電鍍液。本物品因應晶圓的尺寸而製作成直徑約20cm~45cm的大小供使用。;後視圖與前視圖對稱，後視圖省略。;圖式所揭露之實線部分，為本案主張設計之部分，虛線部分為本案不主張設計之部分。;圖式所揭露之一點鏈線，係界定本案所欲主張之範圍，該一點鏈線本身為本案不主張設計之部分。[Use of item]; The item in this design is a sealing ring. ;[Design Description];As shown in the "Usage Reference Picture", this article is a member that covers the peripheral end portion (edge portion) of a wafer that is held by a substrate holder in a substrate plating device or the like. Surface; This article is used to prevent the edges and back surfaces other than the surface to be plated from coming into contact with the plating solution when the wafer is immersed in the plating solution. This product is produced with a diameter of about 20cm~45cm according to the size of the wafer for use. ;The rear view is symmetrical to the front view, and the rear view is omitted. ; The solid line part disclosed in the drawing is the part where the design of this case is advocated, and the dotted line part is the part of this case where the design is not advocated. ;The dotted chain line disclosed in the diagram defines the scope of the claim in this case. The dotted chain line itself is a part of the design that is not claimed in this case.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-26518F JP1556327S (en) | 2015-11-27 | 2015-11-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD180128S true TWD180128S (en) | 2016-12-11 |
Family
ID=56612270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105302078F TWD180128S (en) | 2015-11-27 | 2016-04-20 | sealing ring part |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1556327S (en) |
| TW (1) | TWD180128S (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD871561S1 (en) | 2017-11-17 | 2019-12-31 | Valqua, Ltd. | Seal member for use in semiconductor production apparatus |
| USD897504S1 (en) | 2017-11-17 | 2020-09-29 | Valqua, Ltd. | Seal member for use in semiconductor production apparatus |
| USD927656S1 (en) | 2018-09-11 | 2021-08-10 | Valqua, Ltd. | Seal for vacuum gate valve |
-
2015
- 2015-11-27 JP JPD2015-26518F patent/JP1556327S/ja active Active
-
2016
- 2016-04-20 TW TW105302078F patent/TWD180128S/en unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD871561S1 (en) | 2017-11-17 | 2019-12-31 | Valqua, Ltd. | Seal member for use in semiconductor production apparatus |
| USD897504S1 (en) | 2017-11-17 | 2020-09-29 | Valqua, Ltd. | Seal member for use in semiconductor production apparatus |
| USD922545S1 (en) | 2017-11-17 | 2021-06-15 | Valqua, Ltd. | Seal member for use in semiconductor production apparatus |
| USD923158S1 (en) | 2017-11-17 | 2021-06-22 | Valqua, Ltd. | Seal members for use in semiconductor production apparatus |
| USD923159S1 (en) | 2017-11-17 | 2021-06-22 | Valqua, Ltd. | Seal member for use in semiconductor production apparatus |
| USD927656S1 (en) | 2018-09-11 | 2021-08-10 | Valqua, Ltd. | Seal for vacuum gate valve |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1556327S (en) | 2016-08-15 |
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