TWD174342S - 排氣處理裝置用內筒之部分 - Google Patents

排氣處理裝置用內筒之部分

Info

Publication number
TWD174342S
TWD174342S TW104303356F TW104303356F TWD174342S TW D174342 S TWD174342 S TW D174342S TW 104303356 F TW104303356 F TW 104303356F TW 104303356 F TW104303356 F TW 104303356F TW D174342 S TWD174342 S TW D174342S
Authority
TW
Taiwan
Prior art keywords
treatment device
design
exhaust gas
inner cylinder
item
Prior art date
Application number
TW104303356F
Other languages
English (en)
Inventor
Khotaro Kawamura
Makoto Kashiwagi
Hiroshi Ikeda
Original Assignee
荏原製作所股份有限公司
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荏原製作所股份有限公司, Ebara Corp filed Critical 荏原製作所股份有限公司
Publication of TWD174342S publication Critical patent/TWD174342S/zh

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Abstract

【物品用途】;本設計的物品是排氣處理裝置用內筒。;【設計說明】;本物品是由氧化鋁材質之類的陶瓷所製成，如「使用狀態參考圖」所示，係在半導體、液晶、太陽能電池製造工序、或其他工序中作為排氣分解處理的排氣處理裝置中，本物品是形成燃燒室的內壁的零件，並做定期的更換使用。;圖式所揭露之實線部分，為本案主張設計之部分，虛線部分為本案不主張設計之部分。;後視圖、左側視圖、右視圖與前視圖對稱，均省略之。
TW104303356F 2014-12-22 2015-06-22 排氣處理裝置用內筒之部分 TWD174342S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2014-28699F JP1534915S (zh) 2014-12-22 2014-12-22

Publications (1)

Publication Number Publication Date
TWD174342S true TWD174342S (zh) 2016-03-11

Family

ID=54258352

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104303356F TWD174342S (zh) 2014-12-22 2015-06-22 排氣處理裝置用內筒之部分

Country Status (2)

Country Link
JP (1) JP1534915S (zh)
TW (1) TWD174342S (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber

Also Published As

Publication number Publication date
JP1534915S (zh) 2015-10-13

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