TWD156030S - Liner for plasma processing apparatus - Google Patents
Liner for plasma processing apparatusInfo
- Publication number
- TWD156030S TWD156030S TW100304783F TW100304783F TWD156030S TW D156030 S TWD156030 S TW D156030S TW 100304783 F TW100304783 F TW 100304783F TW 100304783 F TW100304783 F TW 100304783F TW D156030 S TWD156030 S TW D156030S
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma processing
- processing device
- article
- inner lining
- processing container
- Prior art date
Links
- 239000000463 material Substances 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000012790 confirmation Methods 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Abstract
【物品用途】;本創作的物品是電漿處理裝置用內襯材,係構成可利用電漿在基板上進行氧化膜等之成膜和蝕刻之類的處理的電漿處理裝置之處理容器的一部分之電漿處理裝置用內襯材。;【創作特點】;從各視圖觀之,本物品的本體呈圓形中空碗狀體,本體中央為貫通圓孔,該圓孔係由底部向上擴展成兩不同直徑大小之同心圓,使該貫通圓孔內呈現一段差;如使用狀態參考圖所示,該處理容器1具有確認窗8、處理室及排氣室6,在處理容器1內,係設置有用來載置處理基板9的載置台7,該載置台7的周圍係配設有擋板3,本物品之電漿處理裝置用內襯材5係在處理容器1之內壁上,於其他電漿處理裝置用內襯材2、4之下方;具有防止因處理容器1之構成材料所產生的金屬污染之功能。[Application of the article]: The article of this invention is an inner lining material for a plasma processing device, which is an inner lining material for a plasma processing device that constitutes a part of a processing container of a plasma processing device that can perform processes such as film formation and etching of an oxide film on a substrate using plasma. ;【Creative Features】;From each view, the main body of the article is a circular hollow bowl-shaped body, and the center of the main body is a through circular hole, and the circular hole expands from the bottom to the top into two concentric circles of different diameters, so that a step is presented in the through circular hole; as shown in the reference figure of the use state, the processing container 1 has a confirmation window 8, a processing chamber and an exhaust chamber 6, and a mounting table 7 for mounting a processing substrate 9 is provided in the processing container 1, and a baffle 3 is arranged around the mounting table 7. The inner lining material 5 for the plasma processing device of the article is on the inner wall of the processing container 1, and is below other inner lining materials 2 and 4 for the plasma processing device; it has the function of preventing metal contamination caused by the constituent materials of the processing container 1.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011007263 | 2011-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD156030S true TWD156030S (en) | 2013-09-11 |
Family
ID=45991333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100304783F TWD156030S (en) | 2011-03-30 | 2011-09-09 | Liner for plasma processing apparatus |
Country Status (2)
Country | Link |
---|---|
US (1) | USD658693S1 (en) |
TW (1) | TWD156030S (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1551512S (en) * | 2015-06-12 | 2016-06-13 | ||
USD796562S1 (en) * | 2016-04-11 | 2017-09-05 | Applied Materials, Inc. | Plasma outlet liner |
USD826300S1 (en) * | 2016-09-30 | 2018-08-21 | Oerlikon Metco Ag, Wohlen | Rotably mounted thermal plasma burner for thermalspraying |
USD854067S1 (en) * | 2017-03-04 | 2019-07-16 | Sandmarc, LLC. | Camera lens adapter |
USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
US10837556B2 (en) | 2017-09-20 | 2020-11-17 | Fardner Denver Petroleum Pumps Llc | Packing for a well service pump |
USD895777S1 (en) * | 2017-09-20 | 2020-09-08 | Gardner Denver Petroleum Pumps Llc | Header ring |
USD909439S1 (en) * | 2018-11-30 | 2021-02-02 | Ferrotec (Usa) Corporation | Two-piece crucible cover |
JP1638504S (en) * | 2018-12-06 | 2019-08-05 | ||
USD904066S1 (en) * | 2019-09-19 | 2020-12-08 | Georgia-Pacific LLC | Core plug |
USD1028712S1 (en) * | 2022-01-01 | 2024-05-28 | Abdou Bobb | Neck finish of a bottle |
-
2011
- 2011-09-07 US US29/401,106 patent/USD658693S1/en active Active
- 2011-09-09 TW TW100304783F patent/TWD156030S/en unknown
Also Published As
Publication number | Publication date |
---|---|
USD658693S1 (en) | 2012-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD156030S (en) | Liner for plasma processing apparatus | |
TWD149224S (en) | Liner for plasma processing apparatus | |
TWD149223S (en) | Liner for plasma processing apparatus | |
TWD154352S (en) | Focusing ring | |
TWD167986S (en) | part of reaction tube | |
TWD154353S (en) | Focusing ring | |
TWD193611S (en) | Electrode plate peripheral ring for plasma processing equipment | |
TWD155016S (en) | Focusing ring | |
TWD180125S (en) | part of reaction tube | |
WO2012125560A3 (en) | Method and apparatus for plasma dicing a semi-conductor wafer | |
TWD142850S1 (en) | Plasma inducing plate for semiconductor deposition apparatus | |
TWD168774S (en) | part of reaction tube | |
TWD155015S (en) | Focusing ring | |
TWD190344S (en) | Shield ring for plasma processing unit | |
TWD139509S1 (en) | Quartz cover for semiconductor manufacturing equipment | |
JP2016530705A5 (en) | ||
WO2011100293A3 (en) | Process chamber gas flow improvements | |
TWD167985S (en) | part of reaction tube | |
TWD174924S (en) | reaction tube | |
TWD193438S (en) | Jet ring for plasma processing unit | |
WO2013009542A3 (en) | Variable thickness globe | |
WO2012047035A3 (en) | Substrate processing device for supplying reaction gas through symmetry-type inlet and outlet | |
TWD186396S (en) | Rings for plasma treatment equipment | |
TWD176127S (en) | part of reaction tube | |
TW201614101A (en) | Film forming apparatus, susceptor, and film forming method |