TW567514B - Glass substrate fixing seat - Google Patents
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- TW567514B TW567514B TW91112015A TW91112015A TW567514B TW 567514 B TW567514 B TW 567514B TW 91112015 A TW91112015 A TW 91112015A TW 91112015 A TW91112015 A TW 91112015A TW 567514 B TW567514 B TW 567514B
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Description
567514 五、發明說明(1) 本發明係有關於一種玻璃基板固定承座(二),尤指 一種可使場發射顯示器之陽極板的螢光粉體圖騰製作,以 習知的陰極射線管顯示屏螢光粉體圖騰塗佈之製程進行的 玻璃基板固定承座。 按’場發射顯示器與其它之平面顯示器(Flat Panel Display),如液晶顯示器(liquid Crystal Display, LCD)、電漿平面顯示器(piasma Display Panel, PDP) 、有機二極體平面顯示器(〇led Flat Display)等將成 為未來平面顯示器之主流。 場發射顯示器被業界之評價認為:有相對於液晶顯示 器較快之光學反應時間(〇ptical Response Time),亦 即可以有與陰極射線管比擬之較高品質顯示效果,此外就 t質上之物理結構還具有厚度更薄(可小於l〇mm)、重量 輕、,角^ (大於16 0度)、高亮度(大於100Cd/m2)、 工作,,範圍亦可比擬陰極射線管(介於—2 與7 〇它之 2 i Ϊ等優點,另外,場發射顯示器之製程也較為簡單, 骑合=Ϊ本也較為低廉。因此業界普遍認為場發射顯示器 將胃在未來光電平面顯示器之競爭中引人注目。 ° ^^於%發射顯示器係利用一高真空的環境下,以.高電 激發陰極板上之尖端突起產生電子’俾使該等顯 Τ & %極板螢光粉團被電子激發轉換為光子而表現复顯 不L樣,此與習用之陰極射線管係由電子搶產生電子束而 激發,示屏之螢光粉團之發光顯示機制近似,因此,此二 者之陽極部份,該場發射顯示器之陽極板結構與陰極射=567514 V. Description of the invention (1) The present invention relates to a fixed base for a glass substrate (2), especially a fluorescent powder totem that enables the anode plate of a field emission display to be displayed by a conventional cathode ray tube A glass substrate fixing base for the screen fluorescent powder totem coating process. According to the field emission display and other flat panel displays (such as liquid crystal display (LCD), plasma flat panel display (PDP), organic diode flat display (〇led Flat Display ), Etc. will become the mainstream of future flat panel displays. The field emission display is evaluated by the industry as having a faster optical response time than that of a liquid crystal display, that is, it can have a higher quality display effect compared with a cathode ray tube. In addition, the physical quality of t The structure also has a thinner thickness (can be less than 10mm), light weight, angle ^ (greater than 160 degrees), high brightness (greater than 100Cd / m2), work, and the range can also be compared to a cathode ray tube (between- 2 and 7 〇 Its 2 i Ϊ and other advantages, in addition, the field emission display manufacturing process is relatively simple, the riding equivalent = low cost is also relatively cheap. Therefore, the industry generally believes that the field emission display will lead the stomach in the future competition of optoelectronic flat display Attention. ° ^^% emission display uses a high vacuum environment to stimulate the tip protrusions on the cathode plate with high electricity to generate electrons. The excitation is converted into photons and the appearance is not L-like. This is similar to the conventional cathode-ray tube system which is excited by the electron beam to generate an electron beam. The luminous display mechanism of the phosphor powder of the display screen is similar. Therefore, the two Electrode portion, the anode plate of the field emission cathode structure of the emission display =
567514 五、發明說明(2) 管之顯示屏 如第一 極板1 ,其 (或導電層 又如第二圖 少具有一顯 塗佈一黑紋 於該螢光粉 此,陰極射 極板(如第 與場發射顯 請一併 場發射顯示 面玻璃基板 線管所謂的 示屏面盤2 射線管真空 璃厚度,重 使得於螢光 如第三 私·係以—種 包含一塗佈 定承座3 3 3 1係用以 螢光粉圖騰 圖所示,揭 至少包含一 )、一螢光 所示,習知 示屏面盤2 層(圖略) 體層(圖略 線管之顯示 一圖所示) 示器各該陰 參閱第一圖 器之結構差 1 1係為一 顯示屏面盤 1之面盤四 結構的要求 量相形較厚 粉塗覆之技 圖所示,習 旋轉塗佈之 機構載體3 及一旋轉驅 提供該塗佈 結構近乎等 示有一種習 平面玻璃基 粉體層1 3 的陰極射線 1 ’該顯示 5其上覆— )再覆一反 屏局部層體 近乎無異, 極結構上之 及第二圖所 異在於:該 面平薄片之 2 1係由一 周所構成的 ,顯示屏面 實,故兩者 術上各有區 知的陰極射 厚膜塗佈技 1 、一連接 動裝置3 4 機構3於一 同。 知的場發射 板 1 1、一 及一反射鋁 管之顯示屏 屏面盤2 1 螢光粉體層 射鋁膜層( 結構與場發 惟差別在於 不同。 示,上述陰 場發射顯示 玻璃平板, 管裙部2 2 矩形盤狀體 盤2 1亦具 間在結構上 別。 線管之顯示 術,其主要 承座3 2、 :其中之塗 執道(圖略 顯示器之陽 黑紋層1 2 膜層1 4 ; 結構2 ,至 之内側面盤 (圖略), 圖略),因 射顯示之陽 陰極射線管 極射線管與 器所謂的平 而該陰極射 圍繞於該顯 ,且因陰極 備一定之玻 之差異,會 屏的塗佈製 塗佈機構3 一顯示屏固 佈機構載體 )中運行,567514 V. Description of the invention (2) The display screen of the tube is like the first electrode plate 1, which (or the conductive layer as shown in the second figure has less display and a black pattern on the phosphor, and the cathode emitter plate ( For example, the first field emission display, the field emission display surface, glass substrate wire tube, the so-called display panel, the thickness of the vacuum glass, and the thickness of the vacuum glass are as follows: Block 3 3 3 1 is shown in a fluorescent totem, including at least one), a fluorescent display, a conventional display panel 2 layers (not shown), and a body layer (not shown) (Shown) The indicators are different from each other. Refer to the first diagram for the structure difference. 1 1 is a display of the display panel 1 and the structure of the four panels. The mechanism carrier 3 and a rotary drive provide the coating structure with a cathode ray 1 'showing a Xi-plane glass-based powder layer 1 3, the display 5 and its overlay —) and then a reverse-screen local layer almost The difference between the pole structure and the second figure lies in that: 2 1 of the plane flat sheet is constructed by one week , The real display screen, so that both regions have known surgical thick coating of cathode ray technology 1, a connecting means 34 move in a same mechanism 3. Known field emission panel 1 1. Display panel of reflective aluminum tube 1 and 2 1 Fluorescent powder layer and aluminum film layer (The difference between structure and field emission is the difference. It is shown that the above negative field emission display glass plate The tube skirt 2 2 rectangular disc-shaped body disk 21 also has a structural difference between them. The display of the wire tube, its main bearing 3 2: the coating of the road (shown in the figure, the black and black texture layer 1) 2 film layer 1 4; structure 2, to the inner side plate (picture omitted) (picture omitted), because the cathode ray tube of the cathode ray tube and the device are so-called flat and the cathode ray surrounds the display, and The cathode is prepared with a certain glass difference, and the coating system of the screen is coated.
567514 567514 五、發明說明(4) 已知的製作模式至少右·細广 I及薄膜蝕刻製程模式,由::刷式二高壓靜電吸附模式 其製程相較於陰極射線其gr、用於平板玻璃基板製作, 而,㈣製作以塗t製;較為簡化,然 式及而廢靜電吸附模式, ’ /、中之網板印刷 騰,雖可簡化製程 '、降低印=曝光顯影方式即可製程圖 寸的面板等優點,但並於 原料之用量及可製作較大尺 形成之點面積或條紋線寬亦較Π 2 ί光粉圖騰上所 體之製程模式,雖製二=s 2 f韻刻製程模式係採用半導 之解析度’然其製作面#,騰較細微,最終成品可有較佳 卜製作設備能偈限於小尺寸面板之製 板螢光粉圖騰製作若有較=^序對於中大型尺寸之陽極 |佳對策。 f问解析度之要求者顯然仍需一較 而參酌習知的降搞M θ I足前述中大型尺3 ί ϊ t線管顯示屏之塗覆結構,似可滿 沿用陰極射線管顧 问解析度之陽極板要求,因此若能 極板之塗佈製作,塗佈5史備套用於場發射顯示器陽 本;惟,如前所$ί之技術’必可降低製作開發成 管由於在玻璃έ士播L 7 Χ 、”、’員示器平面陽極板與陰極射線 套用場發射目當之差異’因此,若引用設備 "四圖所;L板之製作,仍有限制。 利用一夹具4 i,s,知的陰極管顯示屏之塗佈設備,係 1夹覆顯示屏之管错部2 2固定,故所會遭 第7頁 ^()7514 五、發明說明(5) 遇的問題有如下幾點 一、平面陽極板^一^ 顯示屏尚有一外圍管;部,不如陰極射線管之 無管裙部22而無法失覆。2 °構,故平面陽極板將因 一、陰極射線管之顧;m ^ 料後,進行低速延轉覆ί !!有管裙部22,於下塗佈 塗佈充分覆蓋於内面精管:部2 2的阻擋轉折可將 面陽極板亦因無該管裙部以=^控制塗佈料量,而平 造成塗佈料流失、增加塗H旦故ί低速延轉覆料過程將 個平面陽極板之表面。佈枓I,甚至難以全面塗覆於整567514 567514 V. Description of the invention (4) Known production mode is at least right, fine, wide, and thin film etching process mode, from :: brush type two high-voltage electrostatic adsorption mode, its process is compared with the cathode ray gr, used for flat glass Substrate production, and ㈣ production is made by coating; it is more simplified, and the electrostatic adsorption mode is discarded. '/, The screen printing in the middle can be simplified, although the process can be simplified, and the printing can be reduced by the exposure and development methods. Inch panel, etc., but in terms of the amount of raw materials and the area of the dots or the width of the stripe that can be made with a larger ruler, it is also more than the process mode of the Π 2 ί light powder totem. The process mode uses the resolution of the semi-conductor, and its production surface # is relatively fine. The final product can have better production equipment. It can be limited to the production of fluorescent powder totems for small-sized panels. Large and medium-sized anodes | Good countermeasures. Obviously, the requester of the resolution of f still needs to compare and learn about M θ I, which is the above-mentioned medium and large-scale ruler 3. The coating structure of the display screen of the t-wire tube seems to be able to use the cathode-ray tube. The anode plate is required. Therefore, if the electrode plate can be coated and coated, a 5 coat set is used for the field emission display. However, the technology as previously described will definitely reduce the production and development of the tube. Shibo L 7 X, "," Differences between the field emission of the flat anode plate of the indicator and the cathode ray application field. "Therefore, if the equipment is quoted in the" Four Pictures ", the production of the L plate is still limited. The use of a fixture 4 i, s, the known coating equipment for cathode tube display, which is fixed on the tube 1 and the wrong part 2 of the display, so it will be subject to page 7 ^ () 7514 V. Description of the problem (5) There are the following points: 1. The flat anode plate ^ a ^ The display still has a peripheral tube; the part is not as good as the tubeless skirt 22 of the cathode ray tube and cannot be lost. The 2 ° structure, so the flat anode plate will be Guan Gu; m ^ after the material, low-speed transfer ί !! There is a tube skirt 22, fully coated under the coating Cover the inner seminiferous tube: the barrier turning of the part 2 can also change the surface anode plate because the skirt of the tube is not used to control the coating material amount, and the coating material is lost, and the coating is increased. The surface of the flat anode plate is covered by the coating process. The cloth I is even difficult to fully coat the entire surface.
三、由於平面陽極板Α 滅工τ ^ 度約在W下,與一般二種△平/气的玻璃基板,厚 於8mm者之結構差g,胃片=面陪二『不屏*璃厚度大 將面臨運動應力變化產生裂之片千的面風:極板於旋轉塗佈過程 後段=程ίΐίίΪΐ可^ =設,之週邊區域’使得 物掉入塗佈面上而產生不;進而於以後之製程將因此殘留 有鑑於場發射顯示器 Τ屏在螢光粉體塗層有近 與顯示屏之結構又有顯著 面陽極板無法直接固著於 轉承座上以進行螢光粉體 良一種玻璃基板固定承座 極射線管之顯示屏螢光粉3. Because the flat anode plate A has a τ ^ degree of destruction at about W, it is inferior to the general two kinds of △ flat / gas glass substrates with a thickness greater than 8mm, and the stomach piece = face accompany "not screen * glass thickness The general will face a thousand winds that produce cracks due to changes in the motion stress: the pole plate is located at the back of the spin coating process = 程 ίΐίίΪΐ 可 ^ =, the surrounding area 'allows the object to fall onto the coating surface and not; The manufacturing process will therefore be left in view of the fact that the field emission display T screen has a fluorescent powder coating that is close to the structure of the display screen and has a significant surface. The anode plate cannot be directly fixed to the turntable to perform fluorescent powder. Good glass Fluorescent powder for display of polarizing tube of substrate fixing base
之平面陽極板與陰極射線管之顯 似之結構,惟,各該平面陽極板 之差異’俾使場發射顯示器之平 陰極射線管之顯示屏塗佈機構旋 之塗佈製程;職是,發明人乃改 ’以使平面玻璃基板可固著於陰 塗佈機構上,得以習知的顯示屏The structure of the flat anode plate and the cathode ray tube is similar, but the difference between the flat anode plates is the coating process of the flat cathode ray tube display mechanism of the field emission display. People are changed, so that the flat glass substrate can be fixed on the female coating mechanism, and the display screen is known.
567514 五、發明說明 螢光粉體 中大型尺 滿足產業 本發 座(二) 顯示屏螢 顯示器之 本發 座(二) 料之使用 本發 座(二) 璃基板固 之機率。 本發 座(二) 附著於玻 脫落或剝 為了 定承座( 板於一塗 程,進而 旋轉載體 體下端呈 (6) 塗佈製程’實施於該平面玻璃基板上以期可製作 寸及高解析場發射顯示器之平面陽極板,並同時 之需求。 明之主要目的, ,其係可固著平 光體圖騰製程實 平面陽極板的製 明之另一目的, ,其係於進行螢 量,以降低塗佈 明之又一目的, ,其係於進行螢 著裝置,可降低 明之再一目的, ,其係可減少於 璃基板固定承座 落於塗佈面而造 達成上述之目的 二),其係用以 佈機構上進行螢 製成場發射顯示 、一外圍罩體及 開放狀態以形成 在於可提供一種 面玻璃基板,使 施於玻璃基板上 作。 在於可提供一種 光粉體圖騰製作 料之成本。 在於可提供一種 光粉體圖騰製作 製程運動的過程 在於可提供一種 旋轉塗佈製程中 之週邊區域,減 成不良塗佈之結 ’本發明係提供 固定一玻璃基板 光粉圖騰塗佈作 之陽極板;該 一低壓吸附裝置 —起形開口 ,可 玻璃基板固定承 原陰極射線管之 ,而進行場發射 玻璃基板固定承 可有效運用塗佈 玻璃基板固定承 提供一穩定之玻 中玻璃基板破片 玻璃基板固定承 因溢出之塗佈料 免溢出之塗佈料 果。 一種玻璃基板固 ’以令該玻璃基 業之旋轉塗佈製 固定承座包括一 ;其中之外圍罩 供上述玻璃基板567514 V. Description of the invention Fluorescent powder medium and large scales meet the industry. (2) Display base (2) Display base (2) Use of materials This base (2) The probability of solidification of the glass substrate. This hair base (2) is attached to the glass to fall off or peel in order to fix the base (the board is in a coating process, and then the lower end of the rotating carrier body is (6) the coating process is implemented on the flat glass substrate in order to make inch and high resolution The flat anode plate of the field emission display, and the simultaneous demand. The main purpose of Ming is another purpose of the manufacture of the flat anode plate that can fix the flat light totem process, and it is based on the amount of fluorescent light to reduce the coating. Another purpose of the Ming is to perform a fluorescent device, which can reduce another purpose of the Ming. It is to reduce the number of glass substrates fixed on the coating surface to achieve the above purpose. 2) It is used to A field emission display, a peripheral cover and an open state are formed on the cloth mechanism to form a surface glass substrate, which can be applied on the glass substrate. It lies in the cost of providing a light powder totem making material. The process of providing a light powder totem production process is to provide a peripheral area in a spin coating process to reduce the poor coating knot. The present invention provides an anode fixed with a glass substrate light powder totem coating. This low-pressure adsorption device—a raised opening, can fix the glass substrate to the original cathode ray tube, and the field emission glass substrate fixation can effectively use the coated glass substrate fixation to provide a stable glass-in-glass substrate broken glass. The substrate is fixed to prevent the coating material from overflowing due to the overflowing coating material. A glass substrate is fixed to enable the glass substrate to be spin-coated. The fixing base includes a perimeter cover for the glass substrate.
第9頁 567514 五、發明說明(7) 容置,而該旋轉載體内部則 低壓吸附裝置内部設有一與 壓區域,該第一低壓區域係 表面四周而形成有複數吸附 與旋轉載體連結,且令該低 ,而能吸附上述玻璃基板以 轉塗佈製程。 為了使 貴審查委員能 技術内容,請參閱以下有關 而所附圖式僅提供參考與說 限制者。 請參閱第五圖、第五圖 明之局部剖面示意圖、仰視 面示意圖。本發明係提供一 該固定承座5主要包括一旋 、一低壓吸附裝置5 3 、一 5 4、複數供水管5 5及複 該旋轉載體5 1係與上 結一體’並藉由一塗佈機構 撐與旋轉運動;該低壓吸附 内部設有一第一低壓區域5 一與該第一低壓區域5 9相 ,且該第一低壓區域5 g係 端之表面四周而形成上述之 設有低壓氣體管路,另於上述 該低壓氣體管路相通之第一低 延伸至該低壓吸附裝置下端之 口,並使該低壓吸附裝置上端 壓吸附裝置設於外圍罩體内部 進行螢光粉圖騰塗佈作業之旋 更進一步瞭解本發明之特徵及 本發明之詳細說明與附圖,然 明用,並非用來對本發明加以 A及第五圖B ,係分別為本發 示意圖及設於塗佈機構上之平 種玻璃基板固定承座(二), 轉載體5 1 、一外圍罩體5 2 圓形橡膠環5 8、複數吸附口 數出水口 57 ;其中: 述之低壓吸附裝置5 3上端連 6 (如第五圖B所示)提供支 裝置5 3可為一低壓吸盤,其 9 ’而該旋轉載體5 1則内覆 連結之低壓氣體管路(圖略) 延伸至該低壓吸附置置5 3下 複數吸附口 5 4 ,俾使該第一 567514 五、發明說明(8) 低壓區域5 9可藉由連通於低壓吸附裝置5 3上之該等吸 附口 5 4而得以減壓以吸附一玻璃基板7。 該外圍罩體5 2係為一半開放式外罩,其下端呈開放 狀以形成一矩形開口 (如第五圖A所示),該矩形開口係 大於上述玻璃基板7之外圍,且該矩形開口之長寬比例與 該玻璃基板7之長寬比例實質相等,並由上而下漸漸擴大 ,以供該玻璃基板7容置於外圍罩體5 2之矩形開口内部 ,且為低壓吸附裝置5 3所吸附,而該低壓吸附裝置5 3 則設於該外圍罩體5 2内部。 , 該等吸附口 5 4 (如第五圖A所示)係延低壓吸附裝 置5 3四周呈矩形環狀排列,並於該低壓吸附裝置5 3四 周與外圍罩體5 2相鄰接之内侧嵌入上述之圓形橡膠環( 〇-Ring) 5 8 ,使部份之圓形橡膠環5 8露出於低壓吸附 裝置5 3下端之表面外,而可與被吸附之玻璃基板7接觸 ’以防止滲入之漿料被該等吸附口 5 4吸入而阻塞;另, 低壓吸附裝置5 3與玻璃基板7係以該圓形橡膠環5 8間 格作為一緩衝保護功能,可避免低壓吸附裝置5 3與玻璃 f板7因工作運動過程而成磨擦刮傷,並藉由該圓形橡膠 環5 8與低壓吸附裝置5 3及玻璃基板7三者所圍成之區 域而形成一第二低壓區域5 6 ,俾使該第二低壓區域5 6 内之吸附力量均勻分佈;又,該第二低壓區域56之表面 _ 大小近乎等同於玻璃基板7之表面,因此,該低壓吸附裝 f 5 3之吸附力量可均勻地吸附玻璃基板7 ,並使之後的 I# t #過程可減緩因吸附力與運動力不平均所產生玻璃Page 9 567514 V. Description of the invention (7) The inside of the rotating carrier is provided with a pressure region inside the low-pressure adsorption device. The first low-pressure region is formed around the surface to form a complex adsorption and rotation carrier connection. This is low, and it can absorb the glass substrate to transfer coating process. In order to enable your review committee to have technical content, please refer to the following and the drawings are provided for reference and limitation only. Please refer to Figure 5 and Figure 5 for a partial cross-sectional view and a bottom view. The invention provides that the fixed seat 5 mainly includes a screw, a low-pressure adsorption device 5 3, a 5 4, a plurality of water supply pipes 55, and a rotating carrier 5 1 that is integrated with the upper knot, and is coated by a coating. The mechanism supports and rotates; there is a first low-pressure region 5 inside the low-pressure adsorption, a phase with the first low-pressure region 59, and the first low-pressure region 5 g around the surface of the end to form the above-mentioned low-pressure gas pipe. And the mouth of the low-pressure gas pipeline extending from the first low to the lower end of the low-pressure adsorption device, and the upper pressure adsorption device of the low-pressure adsorption device is arranged inside the outer casing to perform the phosphor totem coating operation. Further understand the features of the present invention and the detailed description and drawings of the present invention, but it is not intended to add A and the fifth figure B to the present invention. It is a schematic diagram of the present invention and a flat surface provided on a coating mechanism. A kind of glass substrate fixing base (2), the transfer carrier 5 1, a peripheral cover 5 2 a circular rubber ring 5 8, a plurality of adsorption ports and a water outlet 57; of which: the low-pressure adsorption device 5 3 described above is connected to 6 (such as Fifth Figure B ) The supporting device 5 3 may be a low-pressure suction cup, 9 ′, and the rotating carrier 5 1 is covered with a low-pressure gas pipeline (not shown) connected to the low-pressure adsorption installation 5 3, and a plurality of adsorption openings 5 4, 俾The first 567514 V. Description of the invention (8) The low-pressure region 59 can be decompressed to connect a glass substrate 7 by being connected to the adsorption ports 54 on the low-pressure adsorption device 53. The peripheral cover 5 2 is a semi-open cover, and its lower end is open to form a rectangular opening (as shown in FIG. 5A). The rectangular opening is larger than the periphery of the glass substrate 7. The length-to-width ratio is substantially equal to the length-to-width ratio of the glass substrate 7, and is gradually enlarged from top to bottom, so that the glass substrate 7 can be accommodated inside the rectangular opening of the peripheral cover 5 2 and is a low pressure adsorption device 5 3 Adsorption, and the low-pressure adsorption device 5 3 is disposed inside the peripheral cover 5 2. The adsorption openings 5 4 (as shown in the fifth figure A) are arranged in a rectangular ring shape around the low-pressure adsorption device 5 3, and are located on the inner side of the low-pressure adsorption device 5 3 adjacent to the peripheral cover 5 2. The above-mentioned circular rubber ring (0-Ring) 5 8 is embedded, so that part of the circular rubber ring 5 8 is exposed outside the lower end surface of the low-pressure adsorption device 5 3 and can be contacted with the glass substrate 7 to be adsorbed to prevent The infiltrated slurry is sucked and blocked by these adsorption ports 54. In addition, the low-pressure adsorption device 5 3 and the glass substrate 7 use the circular rubber ring 58 as a buffer protection function to avoid the low-pressure adsorption device 5 3 The glass f plate 7 is abraded and scratched due to the working movement process, and a second low pressure area 5 is formed by the area surrounded by the circular rubber ring 5 8, the low pressure adsorption device 5 3 and the glass substrate 7. 6, so that the adsorption force in the second low-pressure region 5 6 is evenly distributed; and the surface _ size of the second low-pressure region 56 is almost the same as the surface of the glass substrate 7, so the adsorption of the low-pressure adsorption device f 5 3 The force can evenly adsorb the glass substrate 7 and make the subsequent I # The t # process can slow down the glass produced by the uneven adsorption and movement forces
第11頁 567514 五、發明說明(9) 基板7破片之 止來自玻璃基 塗佈漿料被該 上述該等 體5 2内壁處 於該旋轉載體 供機構外部液 該等出水口 5 俾使殘留於該 5 7 —併於製 體5 2内壁之 圍罩體5 2 、 共同沿該旋轉 轉。 機率; 板7與 等吸附 供水管 上,藉 5 1内 體流動 7相連 外圍罩 程中被 塗料殘 低壓吸 載體5 再者,該 外圍罩體 ϋ 5 4吸 5 5係由 通過低壓 部之給水 之通路; 通,可於 體5 2内 稀釋甩開 留;同時 附裝置5 1之軸心 圓形橡膠 5 2之鄰 入而造成 上而下順 吸附裝置 管路(圖 另,該等 旋轉塗佈 壁之塗料 或被回收 ,於旋轉 3以及該 Ζ軸(如 環5 8 接間隙 堵塞。 勢設置 5 3内 略)相 供水管 製程中 ,隨著 ,以降 塗佈製 等供水 第五圖 亦可阻擋防 小量的滲漏 於該外圍罩 部與一設置 連通,以提 5 5與上述 提供出水, 該等出水口 低該外圍罩 程中,該外 管5 5係可 Β所示)旋Page 11 567514 V. Description of the invention (9) The substrate 7 is broken only from the glass-based coating slurry by the above-mentioned body 5 2 The inner wall is located on the rotating carrier for the external liquid of the mechanism and the water outlet 5 so that it remains in the 5 7 —The enclosure 5 2 on the inner wall of the body 5 2 is rotated along this rotation. Probability; the plate 7 and the adsorption water supply pipe are connected by 5 1 inner body flow 7 connected to the outer casing by the paint residual low pressure suction carrier 5 Furthermore, the outer casing ϋ 5 4 suction 5 5 is supplied by the water passing through the low pressure part It can be diluted and left in the body 5 2; At the same time, the axial circular rubber 5 2 of the device 5 1 is attached to the top and bottom of the adsorption device pipeline (see the other, the spin coating) The paint on the wall of the cloth may be recovered. During the water supply control process of the rotation 3 and the Z axis (such as the ring 5 8 connection gap is blocked. Potential setting 5 3 is slightly omitted), the water supply is also reduced. It can prevent and prevent a small amount of leakage from communicating with the peripheral cover part and a device to provide 5 5 and the above to provide water outlets. The outlets are lower than the peripheral cover. The outer tube 5 5 can be shown as B).
是以,藉由上述之構造組成,即可得到本發明之玻璃 基板固定承座(二)。Therefore, the glass substrate fixing holder (2) of the present invention can be obtained by the above-mentioned structure and composition.
〃請一併參閱第五圖及第六圖Α至第六圖f所示,本發 ,係為一種玻璃基板固定承座,該固定承座5係可用以固 疋上述之平面玻璃基板7,以供該玻璃基板7進行螢光粉 圖騰塗佈作業之旋轉塗佈製程;如第六圖A所示,該固定 承座5係藉由其低壓吸附裝置5 3將玻璃基板7固接於外 圍罩體5 2内與低壓吸附裝置5 3之吸附口 5 4 —側減壓 吸附作用充分密合固著; 如第六圖B所示,隨後藉一連接承座β 1改變該固定〃Please refer to the fifth and sixth figures A to sixth f together. The present invention is a glass substrate fixing seat, and the fixing seat 5 can be used to fix the above-mentioned flat glass substrate 7, A spin coating process for the glass substrate 7 to perform a fluorescent powder totem coating operation; as shown in FIG. 6A, the fixed base 5 fixes the glass substrate 7 to the periphery by means of its low-pressure adsorption device 5 3 The inside of the cover body 5 2 is sufficiently tightly fixed with the adsorption opening 5 4 of the low-pressure adsorption device 53-the side decompression adsorption effect is shown in FIG. 6B, and then the fixing is changed by a connection socket β 1
567514 五、發明說明(ίο) 承座5之角度,以令該外園罩體5 2下端之矩形開口朝向 一清洗槽6 2 ,該清洗槽6 2内覆清洗溶液喷口,以使清 洗液喷向位於該外圍罩體5 2内之玻璃基板7的塗佈面, 同時藉由該旋轉載體5 1的轉動,即可使該外圍罩體5 2 及玻璃基板7產生轉動,以清潔玻璃基板7的塗佈面; 如第六圖C所示,藉由一加熱板6 3所形成的加熱區 對玻璃基板7進行熱輻射乾燥,以去除水份而使玻璃基板 7保持乾燥;567514 V. Description of the invention (ίο) The angle of the socket 5 so that the rectangular opening at the lower end of the outer cover 5 2 faces a cleaning tank 6 2, which is covered with a cleaning solution nozzle to spray the cleaning liquid toward The coating surface of the glass substrate 7 located in the peripheral cover 5 2 can be rotated by the rotation of the rotary carrier 51 to clean the glass substrate 7. Coating surface; as shown in FIG. 6C, the glass substrate 7 is dried by thermal radiation through a heating zone formed by a heating plate 63 to remove moisture and keep the glass substrate 7 dry;
如第六圖D所示,令該連接承座6 1作轉動,以使該 外圍罩體5 2下端之矩形開口朝上,但該旋轉載體5 1之 軸心Z軸不完全與水平面相垂直,同時以緩速進行旋轉, 並由一下料搶6 4進行下塗佈料動作,再藉由緩速延轉動 作使塗佈料充分覆蓋於玻璃基板7的塗佈面上;由於玻璃 基板7的塗佈面上有該外圍罩體5 2之遮擋,故可於旋轉 過程中令塗佈料的流動方向僅限於玻璃基板7的塗佈面上 ,而不致使塗佈料流失’進而有效控制塗佈料的使用量;As shown in the sixth figure D, the connecting socket 61 is rotated so that the rectangular opening at the lower end of the peripheral cover 5 2 is upward, but the axis Z of the rotating carrier 51 is not completely perpendicular to the horizontal plane. At the same time, it is rotated at a slow speed, and the lower coating material is moved by the next material grab, and then the coating material is fully covered on the coating surface of the glass substrate 7 by the slow rotation operation; because the glass substrate 7 The coating surface is covered by the outer cover 5 2, so that the flow direction of the coating material can be limited to the coating surface of the glass substrate 7 during the rotation process, so that the coating material is not lost, thereby effectively controlling the coating material. The amount of coating material used;
如第六圖E所示,再令該連接承座6 1作轉動使該固 定承座5略微朝下’且該旋轉載體5 1進行高速旋轉以使 塗佈面上之塗佈料均勻成膜,另於該固定承座5外設一回 收裝置6 5 ,以將因高速旋轉而溢出之塗佈料回收,同時 ,藉由該外圍罩體5 2内的出水口 5 7 ,於此時設定出水 ’併將殘留黏附在該外圍罩體5 2内壁的塗佈料移除入回 收裝置6 5 ;故該等出水口 5 7之設計,可避免塗佈料因 曰久殘留累積於該外罩本體5 2内壁,而影響玻璃基板7As shown in the sixth figure E, the connection support 61 is further rotated to make the fixed support 5 slightly downward 'and the rotating carrier 51 is rotated at a high speed to uniformly form the coating material on the coating surface into a film. In addition, a recovery device 6 5 is installed outside the fixed socket 5 to recover the coating material overflowing due to high-speed rotation. At the same time, the water outlet 5 7 in the outer casing 5 2 is set at this time. Water out 'and remove the remaining coating material adhered to the inner wall of the outer casing 5 2 into the recovery device 6 5; therefore, the design of the water outlets 5 7 can prevent the coating material from accumulating in the outer casing body due to long-term residue 5 2 the inner wall, which affects the glass substrate 7
第13頁 567514 五、發明說明(li) 的吸附固著, 成品之缺失產 如第六圖 加熱板6 6進 隨後即可 顯示器之陽極 因此,藉 具有下列幾項 一、 本發 程,利用習知 行,以製作高 圖騰製程更具 二、 本發 以降低原料 三、 本發 於旋轉塗佈過 之破片。 甚至累 生; F所示 行熱輻 進行曝 板。 由本發 優點: 明可使 的陰極 解析及 有產業 明可有 成本。 明可以 程,因 積之殘留物釗落撞 $早洛至塗佈面上影響 ,再次令該固定居 射乾燥; 承座5進入乾燥區以 光顯影等製程,以制 M製作完成一場發射 明玻璃基板固定承座(二),至少可 示:陽極板之螢光粉圖騰製 f線不屏之螢光屏製程之改良進 中大尘4面板之需求,並使原螢光粉 利用價值。 效控制塗佈料量,避免塗佈原料流失 均勻之吸附力固著玻璃基板,以避免 吸附力與運動力之差異造成玻璃基板 四、本發明可排除殘留於外罩本體内壁之塗佈料,以 減少塗佈面不良的發生。 綜上所述,本發明確可達到預期之使用目的,而解決 習知之缺失,又因極具新穎性及進步性,完全符合發明專 利申請要件,爰依專利法提出申請,敬請詳查並賜准本案 專利,以保障發明人之權利。 ” 惟以上所述僅為本發明之較佳可行實施例,非因此即Page 13 567514 V. Description of the invention (li) Adsorption and fixation, the absence of the finished product is as shown in the sixth figure, the heating plate 66, and then the anode of the display can be displayed. Therefore, by having the following items: Know how to make a high totem process. Second, the hair to reduce raw materials. Third, the hair is on the spin-coated fragment. It even accumulates; as shown in F, the thermal radiation is carried out to expose the plate. Advantages of this invention: The cathode can be analyzed and it can be cost-effective. It can be done in the future. Due to the impact of the accumulated residue, Zhao Zaoluo was affected by the coating surface, and the fixed shot was dried again; the seat 5 entered the drying area to perform photo development and other processes. The fixed base of the glass substrate (2) can at least show: the improvement of the phosphor screen totem of the anode plate, the f-line non-screen process of the screen has been improved, and the demand for the use of the original phosphor has been increased. Effectively control the amount of coating material, avoid the uniform loss of coating material to fix the glass substrate, and avoid the difference between the adsorption force and the movement force to cause the glass substrate. Fourth, the present invention can eliminate the coating material remaining on the inner wall of the cover body. Reduce the occurrence of coating surface defects. In summary, the present invention can indeed achieve the intended purpose of use, and solves the lack of knowledge. Because of its novelty and progress, it fully meets the requirements of the invention patent application. Grant the patent in this case to protect the rights of the inventor. "But the above is only a preferred embodiment of the present invention,
567514 五、發明說明(12) 拘限本發明之專利範圍,故舉凡運用本發明說明書及圖式 内容所為之等效結構變化,均同理皆包含於本發明之範圍 内,合予[j東明。567514 V. Description of the invention (12) The patent scope of the present invention is limited. Therefore, any equivalent structural changes made by using the description and drawings of the present invention are included in the scope of the present invention by the same principle. [J 东 明.
第15頁 567514 圖式簡單說明 第一圖 係習知場發射顯示器陽極板之結構示意圖 A B c A babcdef 圖圖圖 圖圖圖圖圖圖圖圖圖圖圖圖 二 三三 三 三 四五 五 五六六六六六六 第 第第 第 第 第第 第 第第第第第第第 圖 意 示 之 構 結 屏 示 顯 之 管 線 射 極 陰 知 習 係 圖 意 示 。之 圖式 意模 示業 面作 平程 之製 構構 機機 佈佈 塗塗 知知 習習 係係 圖 意 示 之 式 模 業 作 程 製 構 機 佈 塗 知。 習、 係1 一 圖 意 示 之 式 模 業 作 程 製 構 機 佈 塗 知。 習} 係三 璃 玻 附 吸 有 Γν 〇 圖 圖意 意示 示面 之剖 構部 機局 佈之 塗明 知發 習本 係係 板 基 璃 玻 附 吸 無 /(\ 圖 意 示 視 仰 之 。明 3發 板本 基係 圖 意 示 面 平 之 上 構 機 佈 塗 於 設 明 發 。本 J係 圖圖 意意 示示 之之 式式 模模 業業 作作 程程 製製 明明 發發 本本 係係 圖圖 意意 示示 之之 式式 模模 業業 作作 程程 製製 明明 發發 本本 係係 圖圖 意意 示示 之之 式式 模模 業業 作作 程程 製製 明明 發發 本本 係係 三四五六 第16頁 567514 圖式簡單說明 符號說明: 【習知】 1 陽極板 11 平面玻璃基板 12 黑紋層 13 螢光粉體層 14 反射鋁膜層 2 顯示屏結構 2 1 顯示屏面盤 22 管裙部 3 塗佈機構 3 1 塗佈機構載體 32 連接承座 33 顯示屏固定承座 34 旋轉驅動裝置 4 1 夾具 【本發明】 5 固 定 承 座 5 1 旋 轉 載 體 5 2 外 圍 罩 體 5 3 低 壓 吸 附 裝 置 5 4 吸 附 V 5 5 供 水 管 5 6 第 二 低 壓 區域 5 7 出 水 V 5 8 圓 形 橡 膠 環 5 9 第 —一 低 壓 區 域 6 塗佈機構 6 1 連接承座 62 清洗槽 567514 圖式簡單說明 6 3 加熱板 6 5 回收裝置 7 6 4 下料槍 6 6 加熱板 玻璃基板 ΙΒΪΙ 第18頁Page 15 567514 Brief description of the diagram The first diagram is the structure diagram of the anode plate of the conventional field emission display AB c A babcdef diagram diagram diagram diagram diagram diagram diagram diagram diagram diagram diagram two three three three three four five five five The six-six-six-sixth figure of the structured screen display shown in the first, second, third, second, and third diagrams is the meaning of the map. The pattern and pattern display of the pattern are used for the production of the machine structure of the plane. The application of knowledge is the pattern and pattern of the process of the pattern industry. Xi, Department 1 is a picture showing the pattern of the mold industry process machine cloth coating. Xi} Department of Sanli glass attached with Γν 〇 Tutu the figure of the surface of the cutting section of the machine is placed on the surface of the painting department knows that this system is based on the base glass glass attached suction / / \ The 3 hair board is based on the plan and surface of the machine, and the cloth is applied to the set of hair. The J series of the model is shown in the pattern mold industry. Tutu intends the model mold industry to make the process of making the system is clearly issued. Tutu intends the model mold industry to make the process of making the system is clearly issued. Three, four, five, six, page 16 567514 Symbols for simple illustration of symbols: [Knowledge] 1 Anode plate 11 Flat glass substrate 12 Black texture layer 13 Fluorescent powder layer 14 Reflective aluminum film layer 2 Display structure 2 1 Display surface Plate 22 Tube skirt 3 Coating mechanism 3 1 Coating mechanism carrier 32 Connection socket 33 Display fixing socket 34 Rotary driving device 4 1 Fixture [Invention] 5 Fixed socket 5 1 Rotating carrier 5 2 Peripheral cover 5 3 Low pressure suction Device 5 4 Adsorption V 5 5 Water supply pipe 5 6 Second low-pressure area 5 7 Water outlet V 5 8 Round rubber ring 5 9 First-low-pressure area 6 Coating mechanism 6 1 Connection base 62 Cleaning tank 567514 Brief description of the drawing 6 3 Heating plate 6 5 Recovery device 7 6 4 Feeding gun 6 6 Heating plate glass substrate ΙΒΪΙ page 18
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TW91112015A TW567514B (en) | 2002-06-04 | 2002-06-04 | Glass substrate fixing seat |
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TW91112015A TW567514B (en) | 2002-06-04 | 2002-06-04 | Glass substrate fixing seat |
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