TW558765B - Integrated post-etch treatment for dielectric etch process - Google Patents
Integrated post-etch treatment for dielectric etch process Download PDFInfo
- Publication number
- TW558765B TW558765B TW89108330A TW89108330A TW558765B TW 558765 B TW558765 B TW 558765B TW 89108330 A TW89108330 A TW 89108330A TW 89108330 A TW89108330 A TW 89108330A TW 558765 B TW558765 B TW 558765B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- dielectric
- post
- gas
- semiconductor structure
- Prior art date
Links
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- Drying Of Semiconductors (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30444999A | 1999-05-03 | 1999-05-03 | |
US09/320,251 US6379574B1 (en) | 1999-05-03 | 1999-05-26 | Integrated post-etch treatment for a dielectric etch process |
Publications (1)
Publication Number | Publication Date |
---|---|
TW558765B true TW558765B (en) | 2003-10-21 |
Family
ID=26974028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW89108330A TW558765B (en) | 1999-05-03 | 2000-05-16 | Integrated post-etch treatment for dielectric etch process |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2001007094A (ja) |
TW (1) | TW558765B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9126229B2 (en) | 2011-05-11 | 2015-09-08 | Tokyo Electron Limited | Deposit removal method |
US9177816B2 (en) | 2011-09-29 | 2015-11-03 | Tokyo Electron Limited | Deposit removal method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7169440B2 (en) * | 2002-04-16 | 2007-01-30 | Tokyo Electron Limited | Method for removing photoresist and etch residues |
JP2006286802A (ja) * | 2005-03-31 | 2006-10-19 | Fujitsu Ltd | 埋込配線の形成方法 |
-
2000
- 2000-05-02 JP JP2000134003A patent/JP2001007094A/ja not_active Withdrawn
- 2000-05-16 TW TW89108330A patent/TW558765B/zh not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9126229B2 (en) | 2011-05-11 | 2015-09-08 | Tokyo Electron Limited | Deposit removal method |
US9177816B2 (en) | 2011-09-29 | 2015-11-03 | Tokyo Electron Limited | Deposit removal method |
Also Published As
Publication number | Publication date |
---|---|
JP2001007094A (ja) | 2001-01-12 |
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Legal Events
Date | Code | Title | Description |
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GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |