TW548709B - Method to improve uniformity of development - Google Patents

Abstract

A method to improve uniformity of development is disclosed, wherein a substrate and a developing solution supplying device are provided firstly, the developing solution supplying device is connected to the first pipe member and the second pipe member, the concentration of the second developing solution provided by the second piping member is less than that of the first developing solution provided by the first piping member. When the developing solution supplying device moves from one end of the substrate toward the other end of the substrate, the coated amount of the developing solution provided by the first pipe member is a constant, the coated amount of the developing solution provided by the second pipe member gradually decreases with the moving of the developing solution supplying device.

Description

548709 V. Description of the invention (1) This is clearly related to-a kind of lithography process (Li thQgraphy uniform τ: method and especially related to-a kind of improvement in the development of lithography process) 2 It is said that the entire semiconductor process The most important filmmaking process includes photoresist coating, exposure, and unfavorable substrate size, problems in the development process, especially the county ’s Lishibei: ϋ k L k T ^ Jianyuan 『Continent * 1 & 7 1 af DUO + Shiye applies the developer solution on a large substrate, because the helmet solution is applied to every part of the large substrate, so: = = development unevenness on the substrate is prone to produce uneven development. The image is shown in the figure below. Its green 7F is the developer supply device and the substrate. Refer to Figure 1 for the developer supply device used in large substrates. It is above a substrate 100, and the developer supply device 102 is connected to an official member 104 for conveying developer. The part of the developer supply device 102 facing the substrate 100 is provided with a plurality of nozzles. ) For spraying the developer to the surface of the substrate 100. The developing solution supply device 102 is used to spray the substrate 100 on the substrate 100, and the developing solution supply device 102 is used to align the substrate 10. == Keep, the developer supply device 102 is moved from one end of the substrate to the substrate 100, and one end is moved in parallel, so that the developer is sprayed on all parts of the substrate. However, since the developer supply device 102 stays at both ends of the substrate 100,

548709 V. The description of the invention (2) is different in time, that is, the area ^ substrate on the substrate. . Contacted only later = Unevenness: Q: This difference will cause the development time ... 'and development will occur as shown in Figure 2. It is shown in the conventional method, developer = development = should be installed on the substrate The relationship between the positions shows the efficiency diagram. In the method & development of each area on the board, please refer to Section 2®. The vertical axis indicates the amount of liquid coating provided by the tube 104, and the horizontal axis indicates the developer supply device. ι〇2 on the base 100 position. In the conventional developing solution supply device 10, the coating amount of the developing solution is a fixed value. Referring to the first image, the axis indicates the development efficiency on the substrate 100, and the horizontal axis indicates the position on the substrate 100. Since there is a time difference between the area on the substrate 100 that comes in contact with the developer solution first and the area on the substrate i 00 that comes into contact with the developer solution later, it can be seen from Figure 3 that each area on the substrate 100 is subject to development. The difference in the liquid coating time causes different regions on the substrate 100 to have different development efficiencies, which results in uneven development. _ This phenomenon of unevenness will become more serious as the size of the substrate becomes larger. Therefore, the object of the present invention is to provide a method for improving the uniformity of development to effectively solve the problem of uneven development in large substrates because the developer cannot be applied to each part of the substrate at the same time. Another object of the present invention is to provide a developer supply system,

8l71twf.ptd Page 5 548709 V. Description of the invention (3) Solution concentration and development time to improve the supply on a large substrate-2 Ϊ 2 J: ^ Method for developing uniformity, which is firstly provided by two tubes ;: Fang Digong :::: set; and-第-管 件 和-照 -Product developer concentration required; and == Degree is based on the developer on the substrate for this developer supply plate spray When the developing solution is supplied, the developing solution is supplied; it is moved on the other end of the substrate, where the first tube is installed; d; the coating amount is a fixed i, provided by the second tube. Move and gradually pass; Provide a method to improve the uniformity of the development, which is first mentioned in the ίί: Γ 应 装置 'where the developer supply device is equipped with :: one of the first developer solution provided by the pipe = system dependent device The method for coating the developing solution on the substrate is when the developing solution supplying device sprays the developing solution on the substrate, and the developing solution supplying device is moved from the two ends of the substrate to the other end of the substrate. The coating amount (VI) of a developing solution for the second developing provided by the second pipe The coating amount (V2) of the ratio (Vi / V2) with the movement of the developer supply system of the apparatus is gradually

548709 Five invention description (4) Increment. The invention provides a developer supply system, which includes a developer supply device, a first pipe member and a second pipe member. Among them, the developer supply device = several output heads are arranged on one output surface. The first tube is connected to a human face of a display device, and one of the stems provided by the first tube is turned over. J t ： & It depends on the density, and the first developer and the first developer coating amount of the first tube are a fixed value. A second tube, the input surface of the developer supply device, and the concentration of one of the shadow liquid provided by the second tube is less than the concentration of the first developer 'and the second tube = the amount of the second developer supplied is Gradually decreasing. The present invention proposes a developing solution supply reservoir association red n device, a first tube fitting-the m-th: includes-developing solution supply ^, the first & One of the devices of the developer supply device is on the input side, and a flute is connected to the developer supply 俜 ΐ ΐ The first tube provided by the -th-developing solution concentrated production: according to-the required concentration of the developing solution However, = the input surface of the liquid supply device, i the second total f :: pieces are also connected to the developing solution with a lower concentration than that of the first developing solution: the first developing solution and the second developing solution coating amount are V2. The coating amount of the first liquid (V. provided for the first and the first official parts) (for the second tube: the work :: the customer: the first-developed amount (V2) ratio (V1 / V2) is = The application of the second liquid solution_increment. T ", the liquid of the shirt liquid supply device is moved to improve the developing sound uniformly according to the invention to slow down the earlier on the substrate. Use a lower concentration to contact the display. Development of the area of the scene solution 548709 V. Description of the invention (5) rate to obtain better development uniformity. One of the developed solutions of the present invention is a high-concentration developer solution—f system uses two pipes to input separately. By adjusting the viscosity of the two developer solutions on a developer supply device. One coating amount to improve the development on the substrate is to make the present invention ## easy to understand. * 〇 ^ The purpose, characteristics, and advantages can be explained in more detail as follows: Lixinkou cadaver drawing drawing, detailed drawing description: 100, 400: substrate ^ 102, 402: developer supply device 104, 404, 406 : Pipe fittings' embodiment supply library ΓΛ, // will be shown as a developer supply according to a preferred embodiment of the present invention Schematic diagram of the arrangement between the application system and the substrate. Please refer to Section 4 ®, the developer supply system liquid supply device 402, a first tube 4 and a second tube 4 0 of the present invention. Complex = applicable An installation system is arranged above the substrate 4 °, and an input surface of the developer supply device 402 is connected to a first tube 404 and a second tube for inputting a first developer and A second developing solution. On the output side of the developing solution supply device 402, that is, the portion of the developing solution supply device 402 facing the substrate 400, for example, a plurality of nozzles (not shown) are configured to transfer the developing solution. Sprayed to the surface of the substrate 400. Among them, the concentration of the first developing solution provided by the first tube 404 is according to

Page 8 548709 V. Description of the invention (6) It depends on the required developer concentration of a product. The concentration of the second developing solution provided by the second tube 406 is less than that of the first developing solution. The first developing solution is, for example, tetramethylammonium hydroxide (TMAH) of 2.38%, tetramethylammonium hydroxide (TMAH), and tetramethylammonium hydroxide, for example, 0.4% of tetramethylammonium hydroxide. How the developer supply device 402 sprays the developer on the substrate 400 When the developer supply device 402 sprays the developer on the substrate 400, the supply device 402 is level with the supply device 402 from one end of the substrate 400 to the other end of the substrate 400. 'To spray the developer to all parts of the substrate 400.仃 _ In the developer supply system of the present invention, the positional relationship of the developer application device 402 on the substrate 400 is as shown in Fig. 5: The vertical axis in Fig. 1 shows the pipe fittings 404 and 4 06. Provides the coating amount with the second developer, and the horizontal axis indicates = == °, upper: position, the invention: = ί = the-developer solution, the coating amount is a fixed value, and y㈣ = For 402 shift Λ The amount of cloth gradually decreases as the developer supply device 4 U ^ < moves. Because the concentration of the second developing solution is lower than that of the first developing solution supply device 402 "From two", the degree of insolubility of the solution is low, and when it is displayed, the developer is coated and released on the iim board. In the area where more second developing solution is touched thinly, the second display man speeds down the movement of the 402 on the substrate 400 earlier, the first speed. After that, as the application amount of the second developing solution provided by the first official component 406 of the developing supply device is changed,

Page 9 548709 V. Description of the invention (7) Decreases accordingly ', so that the development rate on the substrate 400 later than later is higher than the area in which the developer solution has been contacted before. i μ < Developing rate When using the developer supply system of the present invention, the developing efficiency of the domain position is shown in FIG. 6. In FIG. 6 /, each area is the development efficiency, and the horizontal axis represents the area on the substrate 400 ~~, which is the area on the substrate 400 that earlier contacted the developing solution, 1 f. The concentration of the developing solution is low, but the developer stays in this area. The concentration of the developing solution is higher than that of the second part of the area where the developer was contacted later, but the developing solution is higher. The area in this area is very short. Therefore, by the concentration of the developer and the developer solution, the developer can be contacted earlier on 4.0? In the case of the domain: It is later than 400 on the slab. In the area of the developing solution, the effect is consistent, and the development uniformity on the substrate 400 is improved. In summary, the present invention has the following advantages: The method of producing uniformity of the developmental uniformity of the development method is to use Introduce the lower liquid Gu Gu liquid to slow down the development rate of the area on the substrate that earlier contacted the developing solution 'so that better developing uniformity can be obtained. 22 The supply system of the developing solution of the present invention uses two pipes to separate Input the developer with the same / agronomic level and a low-concentration developer in a developer #. In the device, by adjusting the coating amount of the two developers ... evenness on the Wenshan substrate. "— Although the present invention has been better The embodiment is disclosed as above, but it is not used to Cloth according to the present invention, any person skilled in this art, without departing from the spirit of the invention

548709

8171twf.ptd Page 11 548709 Brief description of the diagram The first diagram is a schematic diagram of the configuration between a conventional developer supply device and a substrate, and the second diagram is a conventional method in which the developer coating amount and the developer supply device are on the substrate Schematic diagram of the positional relationship above; Figure 3 is a schematic diagram of the development efficiency of each region on a substrate in the conventional method; Figure 4 is a configuration between a developer supply system and a grave according to a preferred embodiment of the present invention Figure 5 is a schematic diagram of the relationship between the coating amount of the developer and the position of the developing supply device on the substrate when the developer supply system of the present invention is used; and Figure 6 is a substrate when the developer supply system of the present invention is used Schematic diagram of the development efficiency of each area.

8171twf ptd Page 12

Claims (1)

548709 VI. Scope of patent application1. Provide a method to improve the uniformity of development-the substrate and a developer solution package: the following steps: The device is arranged above the substrate The second pipe fitting:, ;; = =: Department ;: The liquid concentration is lower than that provided by the-pipe fitting —; = two; 7-end pipetting supply device from the-end of the substrate to the other-== At the same time, the coating of the first developer provided by the first tube η: a fixed value, and the coating of the second developer provided by the second tube 1 is gradually decreased as the developer supply device moves . 2. The method for improving development uniformity as described in item 1 of the scope of the patent application, wherein the portion of the developer supply device facing the substrate has a plurality of nozzles for the first developer and the second developer Spraying onto the substrate method 3. The method for improving the uniformity of development as described in item 1 of the scope of patent application, wherein the first developing solution includes tetramethylammonium hydroxide. Method 4: The method for improving the uniformity of development as described in item 1 of the scope of the patent application, wherein the concentration of the first developer is determined according to the concentration of the developer required for a product. Method 5: The method for improving the uniformity of development as described in item 3 of the scope of the patent application, wherein the concentration of the first developing solution is 2.38%. Method 6: The method for improving the uniformity of the shadow of the I member as described in the first item of the patent application range, wherein the second developing solution includes tetramethyl hydroxide. 7 · Methods for improving development uniformity as described in item 6 of the scope of patent application ^ 171twf.ptd 548709 6. Method of applying for a patent method 'wherein the concentration of the second developing solution is 0.4%. 8. A developer supply system, including a developer supply device, wherein a plurality of nozzles are arranged on a surface of the developer supply device; a pipe fitting is connected to an input surface of the developer supply device, wherein A coating amount of a first developer provided by the first tube is a value; and a second tube is connected to the input surface of the developer supply device, wherein one of the second tube is provided by the first tube. The concentration of the second developing solution is less than that of the first developing solution, and the coating amount of the second developing solution gradually decreases. 9. The developer supply system according to item 8 of the scope of patent application, wherein the first developer comprises tetramethylammonium hydroxide. 10. The developer supply system according to item 8 of the scope of the patent application, wherein the concentration of the first developer is determined according to the developer concentration required for a product. 11. The developer supply system according to item 9 of the scope of the patent application, wherein the concentration of the first developer is 2.38%. 1. The developer supply system according to item 8 of the scope of the patent application, wherein the second developer comprises tetramethylammonium hydroxide. , 1 3 · The developer supply system as described in item 2 of the patent application scope, wherein the concentration of the second developer is 0.4%. 14 · A method for improving development uniformity 'includes the following steps: providing a substrate and a developer supply device, wherein the developer supply device is disposed above the substrate, and the developer supply device is connected with a 548709 Sixth, the scope of the patent application: the official document is connected to a second pipe, and the concentration of a second developing solution provided by the second pipe is lower than that of the first developing solution provided by the first pipe; When the developer supply device moves from one end of the substrate to the other of the substrate, the coating inside of the first developer provided by the first tube is v 1 'the first tube provided by the second tube The coating amount of the two developing solutions is V2, in which the coating amount of the first developing solution provided by the first pipe fitting ^ and the ratio V1 / V2 of the coating amount V2 of the second developing solution provided by the second pipe fitting is The movement of the developer supply device is gradually increased. < 1 5. The method of improving development uniformity as described in item 4 of the scope of the patent application, wherein the portion of the developer supply device facing the substrate has a plurality of nozzles, used to connect the first developer with The second developing solution is sprayed onto the substrate. ， 16. The method for improving the uniformity of development as described in item 4 of the patent application scope ', wherein the first developing solution includes tetramethylammonium hydroxide. 17. The method for improving the uniformity of development as described in item 14 of the scope of patent application, wherein the concentration of the first developing solution is determined according to the concentration of the developing solution required for a product. 18. The method for improving the uniformity of development as described in item 6 of the scope of the patent application, wherein the concentration of the first developing solution is 2.38%. 19. The method for improving the uniformity of development as described in item 4 of the patent application scope, wherein the second developing solution comprises tetramethylammonium hydroxide. 20. The method for improving the uniformity of development as described in item 19 of the scope of the patent application, wherein the concentration of the second developing solution is 0.4%. 548709 =, patent application scope 21 · A developer supply system, including: a surface configuration i: f supply device 'wherein the developer supply device-output back is configured with a plurality of nozzles; 复 中 # ϊ one piece, connection On one input surface of the developer supply device, and one of the first provided by Ning 3 Haidi a pipe fitting-the coating amount of the developer is νι; + ϊ — official part, connected to the input surface of the developer supply device, showing that the concentration of the m-th developer developed by the second tube is less than the -2 = degree of the liquid, and the coating of the second developer The amount of cloth is v2; the coating amount VI of the first developing solution provided by B to the second pipe is mentioned: The ratio V1 / V2 of the coating amount V2 of the second developing solution is based on the developing solution supply device. Move and gradually increase. 1 Φ I2 \ The developer supply system according to item 21 of the scope of the patent application, wherein the first developer in the eighth solution includes tetramethylammonium hydroxide. And 2. 3. According to the developer supply system described in item 21 of the scope of the patent application, the concentration of the first developer in the eighth is based on the developer concentration required for a product. Basin 24. The developer supply system described in item 22 of the scope of the patent application, wherein the concentration of the first developer is 2.%. 25. The developer supply system according to item 21 of the application, wherein the second developer comprises tetramethylammonium hydroxide. 26. The developer supply system according to item 25 of the scope of patent application, wherein the concentration of the second developer is 0.4%.