546264 五、發明說明（i) (一）發明背景 〔發明之範疇〕 本發明乃針對壓克力黑框樹備遮光層遮光方式之彩 色濃光片不良品之再生回收提供所需的方法及技術。 特別以筆記型電腦（Note Book PC)，及工作站（Work Station)，或移動交通工具之顯示器，或液晶電視所用之彩 色液晶顯示器。該彩色液晶顯示器生產製造所需之重要材 料-壓克力黑框樹脂遮光層彩色濾光片，其不良品之再生 回收使用之方法及技術。 〔目前他人的技術〕 使用鉻黑框來作顏色光阻（Color Resist)之遮光方式 的顏料分散法彩色濾光片，其製程爲：先將玻璃基板上之 鉻黑框遮光層作格式化（Patterning)，再順序的將紅CR)， - 綠（G)，藍（B)三色顏色的樹脂格式化（？扣^11丨1^)塗 著上。必要時再將ο/c之二氧化矽（Sio2)膜塗佈成膜； 最後氧化銦錫物（ITO)透明電極成膜後完成。（特開平 9-86968 ;平成9年（1997) 3月31日；住友化學工業提 出）；另（特開平11-52123;平成11年（ 1999) 2月26日； 荒川化學工業提出） 最近由於液晶顯示器（LCD)爲提高大量生產產能， 玻璃基板必須大型化；即將已形成數個彩色濾光片（C/F) 之大型玻璃基板與同樣畫素電極之Array玻璃基板模板 (Pattern)灌入液晶組合後而作成。特別指3·〇世代以上 之大型玻璃基板。例如：取6面之彩色濾光片’其不良率 就比以前取一片時6倍不良率大幅度的提高’也就是會產 出大量不良的彩色濾光片。 546264 經濟部中央標準局员工消费合作社印製 A6 B6 五、發明説明（2 ) 使彩色濾光片生產時良率提高的方法爲：改善由於彩色濾' 光片生產過程中所產生之不良的原因，有微塵粒（Particle ) 混入之不良；白黑點或缺色等之缺點，及玻璃基板不夠平.坦 所造成的異常原因•但是要將上述異常完全排除乃非常困 難之事，且若在製造生產過程中採嚴格管理勢必排除的話， 其工業上所需付出成本也絕非有利之事· 因此，爲使彩色濾光片生產過程能達低成本化，就必須將彩 色濾光片之不良基板作處理•使得彩色濾光片之基版得以 再生使用•例如從最上層之ITO,利用鹽酸之酸性水溶液去 光阻處理後再用氫氧化鈉等鹼液去除彩色濾光層之處理方 :法•但是用鹽酸酸性之水溶液及鹼液處理法時彩色濾光層 去光阻時間長且彩色濾光層去除的同時也會有侵腐到玻璃 基板等其他素材之問題發生•另外尙有利用乙醇等有機溶 媒與高純度硫酸於高溫下對彩色濾光層剝去之處理法，但 是，由於有機溶媒與高純度硫酸在高溫下處理時去光阻能力 低；將會造成彩色濾光層溶解度降低，而有剝離效果不確 實的情形發.生·、（特開平9-86968;住友化學工業提出）· 另外，僅使用硫酸之去ITO方式，會導致ITO剝離不完全（特 開平11-52123;荒川化學工業提出）· (二)·發明槪述 [本發明所欲解決的課題] 上述所發生的不良彩色濾光片，若用前述的再生技術將無法 再使用·因此，大量昂貴的玻璃基板將於顏色樹脂或樹脂遮 光層成膜狀態下被廢棄，無論從環保或經濟的觀點來看都將 本紙尺度適用中國國家標準（CNLS)甲4規格（210 X 297公资） (請先閲讀背面之注t-Ϋ-項再塡寫本頁) 丨裝· *1T. 546264 五、發明說明（3) 是一大問題。且環保問題日益嚴重。彩色濾光片之鉻遮光 層將會被樹脂黑框所取代。本發明將對今後彩色濾光片製 造提供不使玻璃素材受侵腐，且能有效去除不良膜，以利 於各色顏料光阻再塗佈之彩色濾光片玻璃基板再生回收 技術。 〔解決課題的方法〕 發明人團隊硏究後，提出達成上述課題方法之結果， 經以下列所述之特定處理，可達成前述課題之目的此乃本 發明宗旨。 本發明中，第一發明爲：將使用壓克力黑框樹脂遮光 層之彩色濾光片不良品，經（A)〜（C)製程處理。能使 得使用壓克力黑框樹脂遮光層之彩色濾光片素玻璃基板 得以再生使用。 (A) 將彩色濾光片浸泡於三價鐵鹽水溶液或三價鐵鹽水溶 液與硝酸之混合液中的浸泡（DIP)方式製程。 (B) 將彩色濾光片浸泡於硫酸如（A)製程後的浸泡（mp) 方式製程。 (C) 上述彩色濾光片（B)製程後的毛刷洗淨之製程。 (三）.發明之詳細說明 〔發明之竇際應用〕 適用於本發明之彩色瀘光片不良品之定義爲：於玻璃 發明說明（4) 基板上形成壓克力黑«樹脂遮光層且將紅（R)綠（G)藍 (B)之晝素薄膜成膜使成爲彩色漉光片；製程中有晝素未 著色、畫素間之分離不順造成滲色，或保護層（〇verC〇at) 之成膜不良造成平坦性不足、牛頓紋產生，或壓克力黑框樹 脂遮光餍與RGB位置不正，或ITO未達所定範圍之抗阻値， 及製程上由於微麈粒混入造成之不良品等，但本發明並未適 用包括玻璃基板自身所造成之傷痕或缺陷，若異常原因爲玻 璃基板自身異常時較無回收値，需排除之。 Θ首先對專利申請範圍第一項之再生回收方法作說明— 由於彩色德光片之最上層爲銦鍚化合物（ITO)之成膜， 故需先將不良之彩色濾光片浸泡於三價鐵鹽水溶液或三價 鐵鹽水溶液輿硝酸之混合液以去除ITO層。 三價鐵鹽水溶液或三價鐵鹽水溶液與硝酸之混合液乃 Η價鐵鹽水溶液濃度爲5〜重量％，硝酸濃度爲〇〜$〇重 量％之水溶液，纏用於ΙΤΟ之蝕刻。 浸泡的溫度爲〇°C起用之水溶液沸點範圍，因太低溫 時，浸泡時間過長；太高溫時又_硝酸蒸氣大量發生，於安 全上不利°故一般限制於室溫〜85°C之間浸泡。浸泡時間可 由Η價鐵鹽水溶液的溶液濃度與浸泡溫度條件作調整，直轰 使ΙΤΟ膜完全除去而設定之，通常爲數分鐘到數小時。 546264 五、發明說明（5) 由上述方法取得已去除ITO膜之不良彩色濾光片，接 著需去除顔色光阻層（以及保護層0/C層）。 顏色光阻層（以及保護層o/c層），一般爲壓克力系樹 脂與高分子（Polyimide)系樹脂；若爲單純之成膜物，僅 用硫酸就可去除，彩色濾光片用成膜後通常會作加熱理， 故需在硫酸浸泡後再用毛刷洗淨，使能確實去除顏色光阻 層，硫酸浸泡前可先做水洗製程，藉由水洗可防止三價鐵 鹽水溶液等混入硫酸中，各處理液之使用壽命也可延長。 此製程所使用的硫酸濃度爲60重量％以上。基於去 除能力與成本之考量，最好爲70〜98重量％之成分。60 重量％以下時浸泡時間變長，不適於工業上量產使用。 浸泡溫度在常溫以上時，無特殊之限制，但爲使浸泡 時間縮短，可在製程上加熱。而浸泡時間因所用之液體濃 度，去除目的之顏色光阻層之種類，浸泡溫度及毛刷洗淨 條件之不同而異；重點在於考量前述各項條件組合後，能 完全的將顏色光阻層除去爲原則下即可。 本發明乃針對彩色濾光片之製程上不良玻璃基板，使 其經前述之去光阻劑方法，使不良之ITO膜與各顏色光阻 層（以及保護層ο/e層）從彩色濾光片用玻璃基板上剝去， 留下再生回收之素玻璃基板。彩色濾光片去除不良膜之 玻璃收納方法則較無特殊之限制，例如：將彩色濾光片的 不良基板收納於指定的治具中（Cassette)後再作浸泡製 程也可。而浸泡的同時，也可以作搖動，搭配去光阻液循 環或超音波處理等均可。 546264 五、發明說明（6 ) 毛刷洗淨可以用液晶顯示器（LCD)、或是大規模機體 迴路（LSI)、或彩色濾光片生產製程上所用之附毛刷之洗 淨機且也可經由人手來洗淨。毛刷洗淨所用的毛刷原則上 以柔軟布（Sponze)，毛刷，紙輪，布及橡皮板等不會在玻 璃基板上留下傷痕之材料爲基本，無特別限定◊另外毛刷 洗淨時，前述去光阻液或水同時灑注在基板上更好，於洗 淨液中實施毛刷洗淨效果會更好。另外毛刷洗淨前作去除 殘留去光阻液之水洗，可使毛刷洗淨效果更佳。之後，再 用純水洗淨；更進一步乾燥後，就可獲得再生回收之设有 壓克力黑框樹脂遮光層玻璃基板。 以上述再生回收方式得到可回收再使用之素玻璃基 板0 五、發明説明（7) 以下針對本發明作一個執行的例子，各個條件均作實驗數 據化之實例。對本發明作一個更詳盡的說明，各例之百分 比不同，意指重量基準不同。 <實例1> 由彩色濾光片不良品中挑出玻璃基板以及壓克力黑 框樹脂遮光層無問題者。先將該不良品置於38%，30。(：之 三價鐵鹽水溶液中浸泡1小時；之後，不改變其濕潤性的 情況下，浸泡於水中洗去過程之硫酸；再以PE製Sporue 毛刷在25°C之水溫的水沖洗下刷洗，接著以25°C水沖洗 洗淨，放置於l〇〇°C下乾燥1個小時後即可獲得再生回收 素玻璃基板。再生回收玻璃基板以目視及光學顯微鏡觀察 該玻璃基板之ITO膜與顏料光阻層（以及ο/c層）的去除 狀態。另外，用表面粗度計（（株）日本真空）對玻璃基 板的蝕刻狀態檢測，取玻璃基板上無傷痕或欠缺等缺點之 玻璃檢測。 <實例2〜7以及比較例1〜8> 表1所示爲實施例1，其他實施例之評價結果。其他 實施例之條件，如表1所示，在去光阻劑之組成比或去光 阻成分，處理溫度略作變化，其他條件同實施例1。 546264 Αβ Β6 五、發明説明（8 ) <ITO.剝離能力、去光阻剝離能力、樹脂遮光層剝離能力> 將彩色濾光片用玻璃基板的ΙΤΟ層及顏料光阻層之去光阻 效能，用顯微鏡(約50倍)作目視判定，定出以下供參考基礎 之判斷基準·546264 V. Description of the invention (i) (I) Background of the invention [Scope of the invention] The present invention is to provide the methods and technologies required for the reproduction and recovery of the defective products of the color dense light sheet of the acrylic black frame tree with a light shielding layer and a light shielding method. . In particular, note book PCs and Work Stations, or displays for mobile vehicles, or color LCD monitors for LCD TVs. The important material required for the manufacture of the color liquid crystal display-the acrylic black frame resin light-shielding layer color filter, and the methods and technologies for the regeneration and recycling of defective products. [Current technology of others] Use a chrome black frame as a color-resistance light-shielding pigment dispersion method color filter. The process is: first format the chrome black frame light-shielding layer on the glass substrate ( Patterning), and then sequentially red (CR),-green (G), blue (B) three-color resin format (? Buckle ^ 11 丨 1 ^) coated. If necessary, the silicon dioxide (Sio2) film of ο / c is coated into a film; finally, the indium tin oxide (ITO) transparent electrode is formed into a film and completed. (Japanese Patent Application Laid-open No. 9-86968; March 31, 1997; proposed by Sumitomo Chemical Industries); other (Japanese Patent Application Laid-open No. 11-52123; February 26, 1999; proposed by Arakawa Chemical Industries) Recently In order to increase the mass production capacity of liquid crystal displays (LCDs), glass substrates must be enlarged; large glass substrates with several color filters (C / F) and Array glass substrate patterns with the same pixel electrodes are being filled. The liquid crystals are combined to make them. In particular, it refers to large glass substrates of more than 3.0 generations. For example, if a 6-sided color filter is used, its defect rate is much higher than that of a 6-fold defect rate when it was taken before, which means that a large number of defective color filters will be produced. 546264 Printed by A6 B6 of the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the Invention (2) The method to improve the yield of color filters is to improve the causes of the defects in the production process of color filters There are poor mixing of fine particles (Particles); shortcomings such as white and black spots or lack of color; and the glass substrate is not flat. Causes of abnormalities caused by tanks, but it is very difficult to completely eliminate the above abnormalities, and if If strict management in the manufacturing process is inevitably excluded, the industrial cost is definitely not a good thing. Therefore, in order to reduce the cost of the color filter production process, the color filter must be defective. The substrate is processed. • The base plate of the color filter can be reused. • For example, from the top layer of ITO, the acidic aqueous solution of hydrochloric acid is used to remove the photoresist, and then the color filter layer is removed with an alkali solution such as sodium hydroxide: Method, but when the acidic aqueous solution of hydrochloric acid and alkaline solution are used, the color filter layer has a long photoremoval time, and the color filter layer is removed, and it will also invade the glass substrate. Problems with other materials occur • In addition, there is no treatment method that uses an organic solvent such as ethanol and high-purity sulfuric acid to strip the color filter layer at high temperature. However, the organic solvent and high-purity sulfuric acid remove photoresistance when processed at high temperature. Low; it will cause the solubility of the color filter layer to decrease, and the peeling effect may not be assured. Health (, JP 9-86968; proposed by Sumitomo Chemical Industry) · In addition, using only sulfuric acid to remove ITO will cause Incomplete peeling of ITO (Japanese Patent Application Laid-Open No. 11-52123; proposed by Arakawa Chemical Industries) · (II) · Description of invention [Problems to be solved by the present invention] If the above-mentioned defective color filter is used, Can no longer be used. Therefore, a large number of expensive glass substrates will be discarded under the condition that the color resin or resin light-shielding layer is formed. Regardless of the environmental or economic point of view, the paper size will be applied to the Chinese National Standard (CNLS) A4 specification ( 210 X 297 public capital) (Please read the note t-Ϋ-item on the back before writing this page) 丨 Installation * 1T. 546264 V. Description of the invention (3) is a big problem. And environmental issues are getting worse. The chrome shading layer of the color filter will be replaced by a resin black frame. The present invention will provide a color filter glass substrate recycling technology for color filter manufacturing in the future, which will not damage the glass material and effectively remove the bad film, so as to facilitate the recoating of pigment photoresist of various colors. [Methods of Solving the Problem] After researching by the inventor team, the results of the method for achieving the above-mentioned problems are proposed, and the above-mentioned problems can be achieved by the specific treatment described below. This is the object of the present invention. In the present invention, the first invention is that a defective color filter using an acrylic black frame resin light-shielding layer is processed through (A) to (C). The color filter element glass substrate using the acrylic black frame resin light-shielding layer can be reused. (A) A process of immersion (DIP) in which a color filter is immersed in an aqueous solution of a ferric iron salt or a mixed solution of a ferric iron salt solution and nitric acid. (B) The immersion (mp) process after immersing the color filter in sulfuric acid such as (A). (C) The process of brush cleaning after the above-mentioned color filter (B). (III) Detailed description of the invention [Sinus interstitial application of the invention] The definition of the defective product of the color phosphor film applicable to the present invention is: the description of the invention of the glass (4) the acrylic black «resin light-shielding layer is formed on the substrate and the The red (R) green (G) blue (B) daytime thin film is formed into a color phosphor film; in the process, there is no daytime pigment, the separation between pixels is not smooth, causing bleeding, or a protective layer (〇verC〇). at) due to poor film formation, resulting in insufficient flatness, Newtonian pattern, or acrylic black frame resin shading RGB and RGB position are not correct, or ITO is not within the specified range of resistance 値, and the process is caused by the mixing of micro particles Defective products, etc., but the present invention is not applicable to include scratches or defects caused by the glass substrate itself. If the abnormal cause is that the glass substrate itself is abnormal, there is no recovery, and it needs to be ruled out. Θ First of all, the method of regeneration and recovery of the first item in the scope of patent application is explained. Since the top layer of the color German light film is formed of indium osmium compound (ITO), it is necessary to soak the bad color filter in ferric iron first. The salt solution or the ferric salt solution is mixed with nitric acid to remove the ITO layer. An aqueous solution of a ferric iron salt solution or a mixed solution of an aqueous solution of a ferric iron salt and nitric acid is an aqueous solution of a ferric iron salt solution having a concentration of 5% to 5% by weight and a nitric acid concentration of 0 to $ 0% by weight, and is used for etching of ITO. The immersion temperature is the boiling point range of the aqueous solution used at 0 ° C. When the temperature is too low, the immersion time is too long; when it is too high, _ nitric acid vapor occurs in large quantities, which is unsafe for safety °, so it is generally limited to room temperature to 85 ° C soak. The immersion time can be adjusted by the solution concentration of the trivalent iron salt aqueous solution and the immersion temperature conditions, and is set by direct bombardment to completely remove the ITO film, which is usually several minutes to several hours. 546264 V. Description of the invention (5) Obtain the defective color filter from which the ITO film has been removed by the above method, and then remove the color photoresist layer (and the protective layer 0 / C layer). The color photoresist layer (and the protective layer o / c layer) is generally acrylic resin and polymer (Polyimide) resin; if it is a simple film-forming product, it can be removed only with sulfuric acid, and for color filters After film formation, it is usually heated, so it needs to be washed with a brush after soaking in sulfuric acid to ensure the removal of the color photoresist layer. The water washing process can be performed before soaking in sulfuric acid. Water washing can prevent the trivalent iron salt aqueous solution. When mixed into sulfuric acid, the service life of each treatment liquid can be extended. The sulfuric acid concentration used in this process is 60% by weight or more. Based on considerations of removal capacity and cost, the content is preferably 70 to 98% by weight. When the weight is less than 60% by weight, the soaking time becomes longer, which is not suitable for industrial mass production. When the immersion temperature is above normal temperature, there are no special restrictions, but in order to shorten the immersion time, it can be heated in the manufacturing process. The immersion time varies depending on the concentration of the liquid used, the type of color photoresist layer to be removed, the immersion temperature, and the cleaning conditions of the brush; the key point is that after considering the combination of the foregoing conditions, the color photoresist layer can be completely It can be removed under the principle. The present invention is directed to the defective glass substrate in the process of manufacturing a color filter, so that the defective ITO film and each color photoresist layer (and the protective layer ο / e layer) are filtered from the color through the aforementioned photoresist removing method. The sheet was peeled off from the glass substrate, leaving the recycled glass substrate. There are no special restrictions on the glass storage method for removing the defective film from the color filter. For example, the defective substrate of the color filter can be stored in a designated fixture and then immersed. While soaking, it can also be shaken, and it can be used with photoresist circulation or ultrasonic treatment. 546264 V. Description of the invention (6) Brush cleaning can be done with liquid crystal display (LCD), large-scale body circuit (LSI), or color filter production process with brush cleaning machine. Wash by hand. In principle, the brushes used for cleaning the brushes are based on materials such as soft cloth (sponze), brushes, paper wheels, cloths, and rubber plates that do not leave scratches on the glass substrate. When cleaning, it is better to spray the aforementioned photoresist solution or water on the substrate at the same time, and it is better to perform brush cleaning in the cleaning solution. In addition, the brush is washed with water to remove the residual photoresist solution before washing, which can make the brush better. After that, it was washed with pure water; after further drying, a recycled glass substrate with an acrylic black frame resin light-shielding layer was obtained. A recyclable plain glass substrate was obtained by the above-mentioned regeneration and recovery method. V. Description of the invention (7) The following is an implementation example of the present invention, and each condition is an example of experimental data. For a more detailed explanation of the present invention, the percentages of the examples are different, which means that the weight basis is different. < Example 1 > A glass substrate and an acrylic black frame resin light-shielding layer were selected from the defective color filters without any problems. First place the defective product at 38%, 30. (: Soak in trivalent iron salt solution for 1 hour; after that, do not change its wettability, soak in the water to remove the sulfuric acid during the process; then rinse with a Sporue brush made of PE at 25 ° C Brush down, rinse with 25 ° C water, and dry at 100 ° C for 1 hour to obtain recycled glass substrate. The recycled glass substrate is observed by visual and optical microscope for the ITO of the glass substrate. The removal status of the film and the pigment photoresist layer (and ο / c layer). In addition, the surface roughness meter (Japan Vacuum Co., Ltd.) was used to detect the etching state of the glass substrate. Glass inspection. ≪ Examples 2 to 7 and Comparative Examples 1 to 8 > Table 1 shows the evaluation results of Example 1 and other examples. The conditions of other examples, as shown in Table 1, are shown in Table 1. Composition ratio or photoresist removal component, processing temperature slightly changed, other conditions are the same as in Example 1. 546264 Αβ B6 V. Description of the invention (8) <ITO.; Color filter ΙΤΟ pigment layer and a photoresist layer to photoresist performance of the glass substrate, with a microscope (about 50 times) for visual determination, set the basis for the reference determination reference ·
◎ ΔX 確實的剝離成功 稍許殘留· 大部分殘留· <玻璃基板的狀態> 將彩色濾光片用玻璃基板的樹脂遮光層以及玻璃基板部之 表面狀態，用顯微鏡(約50倍)作目視判定，定出以下供參考 基礎之判斷基準· 玻璃基板部◎ ΔX has been peeled off with certainty. Most of it remains. ≪ State of glass substrate > The surface state of the resin light-shielding layer of the glass substrate for color filters and the surface of the glass substrate was observed with a microscope (approximately 50 times). Judgment and determination of the following criteria for reference and glass substrate section
◎ △X 白濁、青澀、蝕腐傷痕全無· 白濁、青澀、蝕腐傷痕幾乎無 白濁、青鑑、鈾腐傷痕有· (請先閲讀背面之注念事項再填寫私頁) •裝· 、1Τ· i 表一實測値:(參考下頁） 部 中 標 消 告 it 本紙張尺度適用中國國家標準（CNS)甲4規格（210 X 297父泛） 546264 A6 B6 五、發明説明（9 ) i 經濟部中失標準局Α工消費合作社印製◎ △ X No white turbidity, green astringency, no corrosion scars · White turbidity, green astringency, almost no white turbidity scars, Qingjian, uranium corrosion scars · (Please read the notes on the back before filling in the private page) • Packing · ， 1Τ · i Table 1 Actual measurement: (Refer to the next page) The Ministry won the bid to cancel it. This paper size applies to China National Standard (CNS) A4 specification (210 X 297 parent pan). 546264 A6 B6 V. Description of the invention (9) i Printed by the Bureau of Industrial Standards, Ministry of Economic Affairs
δ^ίίζ 〜SIM 玻璃損傷 0 〇 0 〇 〇 〇 ◎ X ◎ ο ◎ Ο 〇 〇 ◎ 除去的效果 _ 0 〇 0 〇 〇 ◎ ◎ ο X X X X X X X 光阻 讎性 0 ◎ 0 〇 ◎ ◎ ◎ .◎ X X X X X X X 窣礙 0 〇 0 〇 〇 〇 ◎ ο ο ο o 0，. ◎ 〇 X 毛刷洗淨 有.無 擗 擗 擗 擗 擗 m m m 顔色光阻(保護層)去光阻劑 题I 雔工= 一 一 — — 一 — — —: — — — — 一 一 蕤。 30-95 _ . J 30-95 1 30-95 30-95. 30-95 g 〇〇 CTD 〇〇 ο oo OD CO 链 氍 趙 m 硫酸 氍 氍 -，氍 經 苟性鹼 氍 m m K 氍 馐 氍 趦 m 氧化銦錫物剝離條件 ^ i—. 一 一 一 一 一 1~' '~' ί * — 一 一 一 — — 一 一 1 ^ cr> CO | s | cr> CO L 1 CO CTP CO 喊份 rtt 1 1 | 1 1 LT7* r Γ-— j j 1 1 j ] i 1 1 I I ! ! 1 ί j 1 氧化銦錫物(no)去光阻劑 A成份 oo ΓΟ 1 LTD 〇〇 ΓΟ 〇〇 CO CO ；一 ί I S ί I oo 1 co j 〇〇 CO oo i c〇 ! ! 〇〇 ! CO 〇〇丨 CO : 1 ! 1 CO j ΓΟ 〇〇 CO ! s ： j 成份B 1 1 丨；t 1 \m m m 丨觀 丨寒 ί j I 1 l 1 > 1 1 1 ! ! !- 1 1 1 成份Λ 1 >三償鐵JT j j 1 氍： 三償鐵鹽 三價鐵嬝 三谓鐵殲 w^^===rr：rrrr5^rr.^"™ 三償鐵* !三償鐵嬤 每 i怒 —藏祕! 三價鐵Μ 三償鐵m 三價鐵* 三償孅.犧 1餘 ! 0 | m j u? r * 實施例1 實施例2 ___________________________一.一 實施例3 實施例4 實施例5 實施例6 實施例7 1 比較例1 mwi 比較例3 比較例4 比較例5 比較例6 um 比較例8δ ^ ίίζ ~ SIM glass damage 0 〇0 〇〇〇 ◎ X ◎ ο ◎ 〇 〇〇 ◎ Removal effect_ 0 〇0 〇〇 ◎ ◎ XXXXXX Photoresistance 0 ◎ 0 〇 ◎ ◎ ◎ XX XXXXXXX 窣00 〇0 〇〇〇 ◎◎ ο ο ο o 0 ,. ◎ 〇X brush cleaning is there. No 擗 擗 擗 擗 擗 mm mm color photoresist (protective layer) photoresist removal problem I 雔 工 = 一一 — — One — — —: — — — — One by one. 30-95 _. J 30-95 1 30-95 30-95. 30-95 g 〇〇CTD 〇〇ο oo OD CO chain 氍 Zhao m 氍 氍 Sulfate-, 氍 Economic base 氍 mm K 氍 馐 氍趦 m Indium tin oxide stripping conditions ^ i—. One by one 1 ~ '' ~ 'ί * — one by one — — one by one ^ cr > CO | s | cr > CO L 1 CO CTP CO shout Rtt 1 1 | 1 1 LT7 * r Γ-— jj 1 1 j] i 1 1 II!! 1 ί j 1 Indium tin oxide (no) photoresist A component oo ΓΟ 1 LTD 〇〇Γ〇 〇〇 CO CO ； 一 ί IS ί I oo 1 co j 〇〇CO oo ic〇!! 〇〇! CO 〇〇 丨 CO: 1! 1 CO j Γ〇 〇〇CO! S: j component B 1 1 丨; t 1 \ mmm 丨 View 丨 寒 ί j I 1 l 1 > 1 1 1!!!-1 1 1 Ingredient Λ 1 > Triple Compensation Iron JT jj 1 ^^ === rr: rrrr5 ^ rr. ^ " ™ Three-compensated iron *! Three-compensated iron i i—! 藏! Three-valent iron M Three-compensated iron m Three-valent iron * Three-compensated iron. Sacrifice more than 1 ! 0 | mju? R * Example 1 Example 2 ___________________________ Example 4 Example 5 Example 6 7 1 Example Comparative Example 1 mwi Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 8 UM
本紙張尺度適用中國國家標4MCNS)甲4規格（210 X 297公釐） 546264 A6 B6 五、發明說明（1〇 ) <實例8> 由彩色濾光片不良品中挑出玻璃基板以及樹脂遮光層無問 題者·先將該不良品至於30°C，90%之硫酸中浸泡1小時；之· 後，不改變其濕潤性的情況下，移改於25°C水中沖洗去硫酸； 再以PE製Sponze毛刷在25°C之純水沖洗下刷洗，接著以25 。(:水沖洗洗淨，放置於l〇〇°C下乾燥1個小時後即可獲得麟j 樹脂遮光層之再生回收玻璃基板•以目視及光學顯微鏡觀 察該玻璃基板之IT0膜與顏料光阻層(以及o/c層)以及樹脂 遮光層的去除狀態•取玻璃基板無傷痕或欠缺.、白濁、青 澀等缺點之玻璃檢測· 〈實例9〜11以及比較例9~12> 實例8所用之去光阻劑組成比、處理溫度僅不於表2· 另表2所示之其他實例與實例8同樣實驗方法，丨堇處理條件 不同•評價結果示於表2· 表2實測値 實施例11比較例9〜〗2 _____ 〔表2〕 顏色光阻(保護層)去光阻劑 洗淨 效果 除去的效果 ι 有無損傷 —成份 成份 wt% 温度 Cc 時間 hr ΪΤ0 剝離性 樹脂 遮半層 玻璃 實施例-8 硫酸 98 30 1 有 ◎ ο 一 ◎ 茶依 ! ◎ 實施例-9 硫酸 90 50 1 有 "^~~-— ο ◎ ◎ 實施例-10 硫酸 80 30 ;1 有 〇 ο 一 ◎ Vr^ | ◎ 實施例-11 硫酸 70 30 1 有 ◎ Ο 1 〇 〇 _ —--------- ； ---------- 賺例-9 硫酸 98 30 1 4nt X X X 〇 | 比較例-10 硫酸 90 30 1 無 ◎ "—-X X ◎ | i比較例-I】 硫酸 90 50 1 無 ◎ '**〜^ X X 〇' ί比較例-12 硫酸 50 30 1 有 ◎ X X (Π) 經濟部中丧桴準局3工消费合作社印製 (請先閲讀背面之注*彖項再塡寫本頁) 丨裝.This paper size is applicable to Chinese National Standard 4MCNS) A4 specification (210 X 297 mm) 546264 A6 B6 V. Description of the invention (10) < Example 8 > Pick out the glass substrate and resin shading from the defective color filter If there is no problem in the layer, first immerse the defective product at 30 ° C, 90% sulfuric acid for 1 hour; after that, without changing its wettability, transfer to 25 ° C water to remove the sulfuric acid. PE sponze brushes are washed with pure water at 25 ° C, then 25 ° C. (: Rinse and wash with water, place at 100 ° C and dry for 1 hour to obtain a recycled glass substrate of Linj resin light-shielding layer. • Observe the IT0 film and pigment photoresist of the glass substrate with a visual and optical microscope. Layer (and o / c layer) and the state of removal of the resin light-shielding layer • Take the glass substrate without any flaws or defects. Glass detection of defects such as white turbidity, greenness, etc. <Examples 9 to 11 and Comparative Examples 9 to 12> Used in Example 8 The photoresist composition ratio and processing temperature are not only in Table 2. The other examples shown in Table 2 are the same as in Example 8. The treatment conditions are different. The evaluation results are shown in Table 2. Table 2 11 Comparative Example 9 ~〗 2 _____ 〔Table 2〕 Color photoresist (protective layer) removal effect of photoresist removal effect with or without damage-ingredients wt% temperature Cc time hr Τ0 peelable resin cover half-layer glass implementation Example-8 Sulphuric acid 98 30 1 Yes ◎ ο ◎ Cha Yi! ◎ Example-9 Sulfuric acid 90 50 1 Yes " ^ ~~ --- ο ◎ Example -10 Sulfuric acid 80 30; 1 Yes 〇ο A ◎ Vr ^ | ◎ Example-11 Sulfuric acid 70 30 1 Yes ◎ 〇 1 〇_ —---------; ---------- Earning Example-9 Sulfuric Acid 98 30 1 4nt XXX 〇 | Comparative Example-10 Sulfuric Acid 90 30 1 None ◎ " —- XX ◎ | i Comparative Example-I] Sulfuric acid 90 50 1 None ◎ '** ~ ^ XX 〇' 〈Comparative example-12 Sulfuric acid 50 30 1 Yes ◎ XX (Π) Printed by the Ministry of Economic Affairs, Bureau of Standards and Industry 3 Cooperative Cooperative (Please read the note * on the back before writing this page) 丨 installation.
II 家標準（CNS)甲4規格（2K) X 297公兑） 546264 A6 B6 五、發明説明（11 ) [發明之成果] 經過本發明之處理，可將彩色濾光片之不良玻璃基板在不侵 腐玻璃基板等其他素材的情況下，確實有效率的能將ITO 層及顏料光阻層（以及ο/e層）剝去，提供热樹脂遮光層之 彩色濾光片用再生回收基板，能再次的供予彩色濾光片廠商 生產使用，對於彩色濾光片大量生產成本之降低有莫大功 勞•此外，在日益艱困之環境保護政策下，也能爲國內減少 玻璃，重金屬等高污染性產業廢棄物，成效可謂一舉數得· [簡單的圖面說明] · <圖1) :樹脂遮光層之彩色遮光片斷面圖· <符號說明> : 1. 玻璃基板 2. 樹脂遮光層（Bhck/Matrix) 3. 彩色濾光層（顏料光阻膜） 4. 〇/C層（Over Coat)，二氧化石夕層，Sio2層 5. 氧化銦錫物（ITO膜） (請先閲讀背面之注念蓼項再塡寫本頁) •裝. 經濟部中丧標準局β工消赀合作社印’^ 本紙张尺渡適用中國國家標半（CNS〉甲4規格（210 X 297公釐-) 546264 A6 B6 五、發明説明（12) 疫濟部中央標準局爲工消贽合作社印製II National Standard (CNS) A4 Specification (2K) X 297 Kg) 546264 A6 B6 V. Description of the Invention (11) [Achievements of the Invention] After the treatment of the present invention, the defective glass substrate of the color filter can be removed. When the glass substrate and other materials are eroded, the ITO layer and the pigment photoresist layer (and ο / e layer) can be peeled off efficiently and the recycled substrate for color filters that provides a thermal resin light-shielding layer can Once again for the production of color filter manufacturers, it has contributed a lot to the reduction of the cost of mass production of color filters. In addition, under the increasingly difficult environmental protection policy, it can also reduce the high pollution of glass and heavy metals in China. Industrial waste, the results can be described in one fell swoop. [Simple illustration of the drawing] · < Figure 1): Color light-shielding fragment view of the resin light-shielding layer < Explanation of symbols >: 1. Glass substrate 2. Resin light-shielding layer (Bhck / Matrix) 3. Color filter layer (pigment photoresist film) 4. 〇 / C layer (Over Coat), stone dioxide layer, Sio2 layer 5. Indium tin oxide (ITO film) (Please read first (Notes on the back of this article will be rewritten on this page) • Equipment. Ministry of Economic Affairs Printed by the China Bureau of Standards and Technology, β Industry and Consumer Cooperatives' ^ This paper ruler is applicable to China National Standard Half (CNS> A4 Specification (210 X 297mm-) 546264 A6 B6 V. Explanation of the Invention (12) Central Standard of the Ministry of Epidemiology Printed by the Bureau for Industrial Cooperatives
中英文名詞對照： 彩色濃光片- Color Filter 黑色遮光膜- Black Matrix 顏色光阻- Color Resist 格式化- Patterring 保護膜- o/c 二氧化矽- Sio2 氧化銦錫物- IT〇 電樞- Array 微塵粒- Particle 液晶顯示器- LCD ( Liquid Chrystal Display) 浸泡- DIP (請先閲讀背面之注*1項再塡寫本頁) 本紙^民尺度適用中國國家標準（CNS)甲4規格（210 X 297公兌）Chinese and English glossary: Color light film-Color Filter black light-shielding film-Black Matrix color photoresist-Color Resist formatting-Patterring protective film-o / c silicon dioxide-Sio2 indium tin oxide-IT〇 armature-Array Micro dust particles-Particle Liquid crystal display-LCD (Liquid Chrystal Display) Immersion-DIP (Please read the note on the back * 1 before writing this page) This paper ^ civil standard applies to China National Standard (CNS) A4 specifications (210 X 297 Conversion