TW494794U - Exhaust gas processing device for semiconductor production process - Google Patents
Exhaust gas processing device for semiconductor production processInfo
- Publication number
- TW494794U TW494794U TW90221465U TW90221465U TW494794U TW 494794 U TW494794 U TW 494794U TW 90221465 U TW90221465 U TW 90221465U TW 90221465 U TW90221465 U TW 90221465U TW 494794 U TW494794 U TW 494794U
- Authority
- TW
- Taiwan
- Prior art keywords
- exhaust gas
- processing device
- production process
- gas processing
- semiconductor production
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP09508297A JP4053112B2 (ja) | 1997-03-27 | 1997-03-27 | 半導体製造工程の排ガス処理方法及び半導体製造工程の排ガス処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW494794U true TW494794U (en) | 2002-07-11 |
Family
ID=14128033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW90221465U TW494794U (en) | 1997-03-27 | 1998-09-22 | Exhaust gas processing device for semiconductor production process |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4053112B2 (zh) |
TW (1) | TW494794U (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108295613A (zh) * | 2018-04-18 | 2018-07-20 | 无锡红旗除尘设备有限公司 | 一种可自动除垢的多管式冷却及团聚装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006026614A (ja) * | 2004-07-21 | 2006-02-02 | Akiji Nishiwaki | 排ガス処理方法および排ガス処理装置 |
JP5696348B2 (ja) | 2008-08-09 | 2015-04-08 | 東京エレクトロン株式会社 | 金属回収方法、金属回収装置、排気系及びこれを用いた成膜装置 |
KR101287064B1 (ko) * | 2011-10-27 | 2013-07-17 | 강상희 | 반도체 제조장비의 부산물 포집장치 |
PL220161B1 (pl) * | 2011-12-08 | 2015-09-30 | Univ Jagielloński | Sposób równoczesnego usuwania NO i cząstek węglowych oraz pyłów nieorganicznych ze spalin i reaktor katalityczny do usuwania NO i cząstek węglowych oraz pyłów nieorganicznych ze spalin |
KR101479969B1 (ko) * | 2013-05-14 | 2015-01-07 | (주)클린팩터스 | 입자 포집용 트랩장치 |
JP6854600B2 (ja) * | 2016-07-15 | 2021-04-07 | 東京エレクトロン株式会社 | プラズマエッチング方法、プラズマエッチング装置、および基板載置台 |
CN110624356A (zh) * | 2018-06-21 | 2019-12-31 | 东泰高科装备科技有限公司 | 废气处理装置、真空镀膜系统以及废气处理装置的操作方法 |
US20230233982A1 (en) * | 2020-07-07 | 2023-07-27 | Kanken Techno Co., Ltd. | Gas processing furnace and exhaust gas processing device in which same is used |
-
1997
- 1997-03-27 JP JP09508297A patent/JP4053112B2/ja not_active Expired - Fee Related
-
1998
- 1998-09-22 TW TW90221465U patent/TW494794U/zh not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108295613A (zh) * | 2018-04-18 | 2018-07-20 | 无锡红旗除尘设备有限公司 | 一种可自动除垢的多管式冷却及团聚装置 |
CN108295613B (zh) * | 2018-04-18 | 2024-05-14 | 无锡红旗除尘设备有限公司 | 一种可自动除垢的多管式冷却及团聚装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH10263355A (ja) | 1998-10-06 |
JP4053112B2 (ja) | 2008-02-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4K | Issue of patent certificate for granted utility model filed before june 30, 2004 | ||
MK4K | Expiration of patent term of a granted utility model |