TW494794U - Exhaust gas processing device for semiconductor production process - Google Patents

Exhaust gas processing device for semiconductor production process

Info

Publication number
TW494794U
TW494794U TW90221465U TW90221465U TW494794U TW 494794 U TW494794 U TW 494794U TW 90221465 U TW90221465 U TW 90221465U TW 90221465 U TW90221465 U TW 90221465U TW 494794 U TW494794 U TW 494794U
Authority
TW
Taiwan
Prior art keywords
exhaust gas
processing device
production process
gas processing
semiconductor production
Prior art date
Application number
TW90221465U
Other languages
English (en)
Inventor
Toshio Awaji
Original Assignee
Toshio Awaji
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshio Awaji filed Critical Toshio Awaji
Publication of TW494794U publication Critical patent/TW494794U/zh

Links

TW90221465U 1997-03-27 1998-09-22 Exhaust gas processing device for semiconductor production process TW494794U (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09508297A JP4053112B2 (ja) 1997-03-27 1997-03-27 半導体製造工程の排ガス処理方法及び半導体製造工程の排ガス処理装置

Publications (1)

Publication Number Publication Date
TW494794U true TW494794U (en) 2002-07-11

Family

ID=14128033

Family Applications (1)

Application Number Title Priority Date Filing Date
TW90221465U TW494794U (en) 1997-03-27 1998-09-22 Exhaust gas processing device for semiconductor production process

Country Status (2)

Country Link
JP (1) JP4053112B2 (zh)
TW (1) TW494794U (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108295613A (zh) * 2018-04-18 2018-07-20 无锡红旗除尘设备有限公司 一种可自动除垢的多管式冷却及团聚装置

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006026614A (ja) * 2004-07-21 2006-02-02 Akiji Nishiwaki 排ガス処理方法および排ガス処理装置
JP5696348B2 (ja) 2008-08-09 2015-04-08 東京エレクトロン株式会社 金属回収方法、金属回収装置、排気系及びこれを用いた成膜装置
KR101287064B1 (ko) * 2011-10-27 2013-07-17 강상희 반도체 제조장비의 부산물 포집장치
PL220161B1 (pl) * 2011-12-08 2015-09-30 Univ Jagielloński Sposób równoczesnego usuwania NO i cząstek węglowych oraz pyłów nieorganicznych ze spalin i reaktor katalityczny do usuwania NO i cząstek węglowych oraz pyłów nieorganicznych ze spalin
KR101479969B1 (ko) * 2013-05-14 2015-01-07 (주)클린팩터스 입자 포집용 트랩장치
JP6854600B2 (ja) * 2016-07-15 2021-04-07 東京エレクトロン株式会社 プラズマエッチング方法、プラズマエッチング装置、および基板載置台
CN110624356A (zh) * 2018-06-21 2019-12-31 东泰高科装备科技有限公司 废气处理装置、真空镀膜系统以及废气处理装置的操作方法
US20230233982A1 (en) * 2020-07-07 2023-07-27 Kanken Techno Co., Ltd. Gas processing furnace and exhaust gas processing device in which same is used

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108295613A (zh) * 2018-04-18 2018-07-20 无锡红旗除尘设备有限公司 一种可自动除垢的多管式冷却及团聚装置
CN108295613B (zh) * 2018-04-18 2024-05-14 无锡红旗除尘设备有限公司 一种可自动除垢的多管式冷却及团聚装置

Also Published As

Publication number Publication date
JPH10263355A (ja) 1998-10-06
JP4053112B2 (ja) 2008-02-27

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MK4K Expiration of patent term of a granted utility model