TW473854B - Polishing system and polishing method - Google Patents

Polishing system and polishing method Download PDF

Info

Publication number
TW473854B
TW473854B TW089124423A TW89124423A TW473854B TW 473854 B TW473854 B TW 473854B TW 089124423 A TW089124423 A TW 089124423A TW 89124423 A TW89124423 A TW 89124423A TW 473854 B TW473854 B TW 473854B
Authority
TW
Taiwan
Prior art keywords
grinding
polishing
chemical
solution
abrasive
Prior art date
Application number
TW089124423A
Other languages
English (en)
Chinese (zh)
Inventor
Tetsu Kawasaki
Mitsuaki Iwashita
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW473854B publication Critical patent/TW473854B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
TW089124423A 1999-11-19 2000-11-17 Polishing system and polishing method TW473854B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32907499A JP3767787B2 (ja) 1999-11-19 1999-11-19 研磨装置及びその方法

Publications (1)

Publication Number Publication Date
TW473854B true TW473854B (en) 2002-01-21

Family

ID=18217338

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089124423A TW473854B (en) 1999-11-19 2000-11-17 Polishing system and polishing method

Country Status (4)

Country Link
US (1) US6660124B1 (https=)
JP (1) JP3767787B2 (https=)
KR (1) KR100790913B1 (https=)
TW (1) TW473854B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6352595B1 (en) * 1999-05-28 2002-03-05 Lam Research Corporation Method and system for cleaning a chemical mechanical polishing pad
JP4945857B2 (ja) * 2001-06-13 2012-06-06 Ｊｓｒ株式会社 研磨パッド洗浄用組成物及び研磨パッド洗浄方法
KR100444605B1 (ko) * 2001-12-29 2004-08-16 주식회사 하이닉스반도체 반도체 소자의 화학적 기계적 연마 방법
KR100886698B1 (ko) * 2002-06-28 2009-03-04 매그나칩 반도체 유한회사 화학적기계적연마의 플래튼 장치
JP2005040916A (ja) * 2003-07-24 2005-02-17 Ebara Corp ポリッシング方法
JP2006159317A (ja) * 2004-12-03 2006-06-22 Asahi Sunac Corp 研磨パッドのドレッシング方法
JP2007030157A (ja) * 2005-06-20 2007-02-08 Elpida Memory Inc 研磨装置及び研磨方法
KR100908017B1 (ko) 2007-11-13 2009-07-15 조선대학교산학협력단 연마패드 컨디셔닝 장치
KR101229972B1 (ko) * 2011-09-14 2013-02-06 주식회사 엘지실트론 웨이퍼 연마 장치
US9966281B2 (en) * 2013-11-15 2018-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and systems for chemical mechanical polish cleaning
CN104044087B (zh) * 2014-06-18 2016-09-07 蓝思科技股份有限公司 一种蓝宝石抛光用铜盘及其修盘方法
US9530655B2 (en) * 2014-09-08 2016-12-27 Taiwan Semiconductor Manufacting Company, Ltd. Slurry composition for chemical mechanical polishing of Ge-based materials and devices
US12017322B2 (en) * 2018-08-14 2024-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Chemical mechanical polishing method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07108453A (ja) 1992-01-24 1995-04-25 Kyushu Electron Metal Co Ltd 半導体ウェーハ用研磨布のドレッシング方法
JP3435698B2 (ja) * 1992-03-11 2003-08-11 三菱瓦斯化学株式会社 半導体基板の洗浄液
JP3256355B2 (ja) 1992-09-24 2002-02-12 株式会社荏原製作所 ポリッシング装置
JP3192346B2 (ja) 1995-03-15 2001-07-23 株式会社東芝 半導体装置の製造方法及び半導体製造装置
JP3778594B2 (ja) * 1995-07-18 2006-05-24 株式会社荏原製作所 ドレッシング方法
JPH0957608A (ja) 1995-08-11 1997-03-04 Sony Corp 研磨パッド及びこれを用いた被表面処理加工物の研磨方法
US5785585A (en) * 1995-09-18 1998-07-28 International Business Machines Corporation Polish pad conditioner with radial compensation
JPH10217104A (ja) 1997-02-07 1998-08-18 Nippon Steel Corp 半導体基板用研磨布のドレッシング方法
JPH11138426A (ja) * 1997-11-11 1999-05-25 Tokyo Electron Ltd 研磨装置
US6132289A (en) * 1998-03-31 2000-10-17 Lam Research Corporation Apparatus and method for film thickness measurement integrated into a wafer load/unload unit
US6126848A (en) * 1998-05-06 2000-10-03 International Business Machines Corporation Indirect endpoint detection by chemical reaction and chemiluminescence
JP3001054B1 (ja) * 1998-06-29 2000-01-17 日本電気株式会社 研磨装置及び研磨パッドの表面調整方法

Also Published As

Publication number Publication date
KR100790913B1 (ko) 2008-01-03
JP2001138211A (ja) 2001-05-22
KR20010051754A (ko) 2001-06-25
US6660124B1 (en) 2003-12-09
JP3767787B2 (ja) 2006-04-19

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MM4A Annulment or lapse of patent due to non-payment of fees