TW464943B - Supplying system and supplying method of liquid material - Google Patents

Supplying system and supplying method of liquid material Download PDF

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Publication number
TW464943B
TW464943B TW089125999A TW89125999A TW464943B TW 464943 B TW464943 B TW 464943B TW 089125999 A TW089125999 A TW 089125999A TW 89125999 A TW89125999 A TW 89125999A TW 464943 B TW464943 B TW 464943B
Authority
TW
Taiwan
Prior art keywords
raw material
liquid
liquid raw
synthetic resin
resin tube
Prior art date
Application number
TW089125999A
Other languages
English (en)
Chinese (zh)
Inventor
Yukichi Takamatsu
Gakuo Yoneyama
Yoshiyasu Ishihama
Akiyoshi Asano
Hiroki Minagawa
Original Assignee
Japan Pionics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Pionics filed Critical Japan Pionics
Application granted granted Critical
Publication of TW464943B publication Critical patent/TW464943B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0005—Degasification of liquids with one or more auxiliary substances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
TW089125999A 1999-12-07 2000-12-06 Supplying system and supplying method of liquid material TW464943B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34815699A JP4384762B2 (ja) 1999-12-07 1999-12-07 液体原料の供給システム及び供給方法

Publications (1)

Publication Number Publication Date
TW464943B true TW464943B (en) 2001-11-21

Family

ID=18395131

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089125999A TW464943B (en) 1999-12-07 2000-12-06 Supplying system and supplying method of liquid material

Country Status (5)

Country Link
US (1) US6461407B2 (ko)
JP (1) JP4384762B2 (ko)
KR (1) KR100730828B1 (ko)
CN (1) CN1184671C (ko)
TW (1) TW464943B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002062446A1 (en) * 2001-02-07 2002-08-15 Mykrolis Corporation Process for degassing an aqueous plating solution
JP2003158122A (ja) 2001-09-04 2003-05-30 Japan Pionics Co Ltd 気化供給方法
US7428038B2 (en) * 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
JP5258560B2 (ja) * 2005-07-13 2013-08-07 レオダイン・リミテッド・ライアビリティ・カンパニー 統合された脱気および脱泡装置
US8495906B2 (en) * 2006-02-16 2013-07-30 Arkray, Inc. Degasifier and liquid chromatograph equipped therewith
US9370734B2 (en) * 2013-06-26 2016-06-21 Idex Health & Science, Llc Fluid degassing module with helical membrane
CN106075960B (zh) * 2016-08-11 2018-04-27 南京丰顿科技股份有限公司 一种牧场挤奶过程中的气液分离装置及工作方法
CN106890750A (zh) * 2017-05-09 2017-06-27 京东方科技集团股份有限公司 涂布液管路以及涂布装置
KR20210097744A (ko) * 2018-11-29 2021-08-09 티에스아이 인코포레이티드 액체 탈기의 감소 또는 제거
CN118302846A (zh) * 2021-11-01 2024-07-05 朗姆研究公司 用于衬底处理系统的液体输送系统的使用受控压强的惰性清扫气体的除气系统
CN116688867B (zh) * 2023-08-07 2023-10-20 内蒙古默锐能源材料有限公司 一种液体金属微量定量进料装置及其使用方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4917776A (en) * 1989-02-09 1990-04-17 Larry Taylor Flow through voltammetric analyzer and method using deoxygenator
EP0598424A3 (en) * 1992-11-16 1996-05-15 Novellus Systems Inc Apparatus for removing dissolved gases from a liquid.
KR100483434B1 (ko) * 1998-03-04 2005-08-31 삼성전자주식회사 반도체장치제조설비

Also Published As

Publication number Publication date
US20010002573A1 (en) 2001-06-07
KR100730828B1 (ko) 2007-06-20
JP2001164369A (ja) 2001-06-19
JP4384762B2 (ja) 2009-12-16
KR20010062204A (ko) 2001-07-07
CN1184671C (zh) 2005-01-12
CN1303125A (zh) 2001-07-11
US6461407B2 (en) 2002-10-08

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