TW428292B - InAlAs/InGaAs heterojunction field effect type semiconductor device - Google Patents

InAlAs/InGaAs heterojunction field effect type semiconductor device

Info

Publication number
TW428292B
TW428292B TW085115572A TW85115572A TW428292B TW 428292 B TW428292 B TW 428292B TW 085115572 A TW085115572 A TW 085115572A TW 85115572 A TW85115572 A TW 85115572A TW 428292 B TW428292 B TW 428292B
Authority
TW
Taiwan
Prior art keywords
inalas
semiconductor device
type semiconductor
field effect
heterojunction field
Prior art date
Application number
TW085115572A
Other languages
Chinese (zh)
Inventor
Tatsuo Nakayama
Original Assignee
Nippon Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co filed Critical Nippon Electric Co
Application granted granted Critical
Publication of TW428292B publication Critical patent/TW428292B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
    • H01L29/151—Compositional structures
    • H01L29/152—Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
    • H01L29/155—Comprising only semiconductor materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
    • H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material

Abstract

In an InAlAs/InGaAs heterojunction field type semiconductor device including an InP substrate (1), a superlattice layer (11 to 18) formed by periods of InAs/AlAs or InAs/AlGaAs is formed over an InGaAs channel layer (3) which is formed over the InP substrate.
TW085115572A 1995-12-19 1996-12-17 InAlAs/InGaAs heterojunction field effect type semiconductor device TW428292B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7330221A JP2718406B2 (en) 1995-12-19 1995-12-19 Field effect transistor

Publications (1)

Publication Number Publication Date
TW428292B true TW428292B (en) 2001-04-01

Family

ID=18230213

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085115572A TW428292B (en) 1995-12-19 1996-12-17 InAlAs/InGaAs heterojunction field effect type semiconductor device

Country Status (5)

Country Link
US (1) US5907164A (en)
EP (1) EP0780906B1 (en)
JP (1) JP2718406B2 (en)
DE (1) DE69622135T2 (en)
TW (1) TW428292B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105390541A (en) * 2015-10-30 2016-03-09 江苏能华微电子科技发展有限公司 HEMT epitaxial structure and preparation method thereof

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10223651A (en) * 1997-02-05 1998-08-21 Nec Corp Field effect transistor
US6531414B1 (en) * 1999-05-05 2003-03-11 The United States Of America As Represented By The National Security Agency Method of oxidizing strain-compensated superlattice of group III-V semiconductor
US6472695B1 (en) * 1999-06-18 2002-10-29 The Regents Of The University Of California Increased lateral oxidation rate of aluminum indium arsenide
TWI288435B (en) 2000-11-21 2007-10-11 Matsushita Electric Ind Co Ltd Semiconductor device and equipment for communication system
US6814738B2 (en) 2001-01-23 2004-11-09 Depuy Acromed, Inc. Medical impacting device and system
US6709439B2 (en) 2001-10-30 2004-03-23 Depuy Spine, Inc. Slaphammer tool
JP4050128B2 (en) * 2002-10-24 2008-02-20 松下電器産業株式会社 Heterojunction field effect transistor and manufacturing method thereof
JP4224423B2 (en) 2003-06-10 2009-02-12 パナソニック株式会社 Semiconductor device and manufacturing method thereof
US7479651B2 (en) 2004-12-06 2009-01-20 Panasonic Corporation Semiconductor device
JP2012227227A (en) * 2011-04-15 2012-11-15 Advanced Power Device Research Association Semiconductor device
US9947755B2 (en) 2015-09-30 2018-04-17 International Business Machines Corporation III-V MOSFET with self-aligned diffusion barrier
RU196935U1 (en) * 2019-10-09 2020-03-23 федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский ядерный университет "МИФИ" (НИЯУ МИФИ) InAlAs / InGaAs two-period gauge superlattice on an InP substrate
CN114481088B (en) * 2022-04-18 2022-07-01 苏州长光华芯光电技术股份有限公司 Manufacturing method of superlattice active layer and semiconductor light-emitting structure

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63311772A (en) * 1987-06-13 1988-12-20 Fujitsu Ltd Field-effect semiconductor device
JP2879250B2 (en) * 1990-07-30 1999-04-05 富士通株式会社 Field effect semiconductor device
JP2964637B2 (en) * 1990-11-30 1999-10-18 日本電気株式会社 Field effect transistor
EP0565054A3 (en) * 1992-04-09 1994-07-27 Hughes Aircraft Co N-type antimony-based strained layer superlattice and fabrication method
EP0569259A3 (en) * 1992-05-08 1995-03-01 Furukawa Electric Co Ltd Multiquantum barrier field effect transistor.
US5268582A (en) * 1992-08-24 1993-12-07 At&T Bell Laboratories P-N junction devices with group IV element-doped group III-V compound semiconductors
JP2500453B2 (en) * 1993-06-28 1996-05-29 日本電気株式会社 Field effect transistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105390541A (en) * 2015-10-30 2016-03-09 江苏能华微电子科技发展有限公司 HEMT epitaxial structure and preparation method thereof

Also Published As

Publication number Publication date
EP0780906A2 (en) 1997-06-25
JPH09172164A (en) 1997-06-30
JP2718406B2 (en) 1998-02-25
DE69622135D1 (en) 2002-08-08
DE69622135T2 (en) 2003-01-30
US5907164A (en) 1999-05-25
EP0780906B1 (en) 2002-07-03
EP0780906A3 (en) 1997-10-01

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Legal Events

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees