TW428048B - The method to enhance the capability of removing the photoresist after metal layer etching and anti-corrosion - Google Patents

The method to enhance the capability of removing the photoresist after metal layer etching and anti-corrosion

Info

Publication number
TW428048B
TW428048B TW87106570A TW87106570A TW428048B TW 428048 B TW428048 B TW 428048B TW 87106570 A TW87106570 A TW 87106570A TW 87106570 A TW87106570 A TW 87106570A TW 428048 B TW428048 B TW 428048B
Authority
TW
Taiwan
Prior art keywords
photoresist
metal layer
atom
polymer
corrosion
Prior art date
Application number
TW87106570A
Other languages
English (en)
Inventor
Jia-Jie You
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW87106570A priority Critical patent/TW428048B/zh
Application granted granted Critical
Publication of TW428048B publication Critical patent/TW428048B/zh

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  • Drying Of Semiconductors (AREA)
TW87106570A 1998-04-28 1998-04-28 The method to enhance the capability of removing the photoresist after metal layer etching and anti-corrosion TW428048B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW87106570A TW428048B (en) 1998-04-28 1998-04-28 The method to enhance the capability of removing the photoresist after metal layer etching and anti-corrosion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW87106570A TW428048B (en) 1998-04-28 1998-04-28 The method to enhance the capability of removing the photoresist after metal layer etching and anti-corrosion

Publications (1)

Publication Number Publication Date
TW428048B true TW428048B (en) 2001-04-01

Family

ID=21629995

Family Applications (1)

Application Number Title Priority Date Filing Date
TW87106570A TW428048B (en) 1998-04-28 1998-04-28 The method to enhance the capability of removing the photoresist after metal layer etching and anti-corrosion

Country Status (1)

Country Link
TW (1) TW428048B (zh)

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Legal Events

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees