TW382668B - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
TW382668B
TW382668B TW085101635A TW85101635A TW382668B TW 382668 B TW382668 B TW 382668B TW 085101635 A TW085101635 A TW 085101635A TW 85101635 A TW85101635 A TW 85101635A TW 382668 B TW382668 B TW 382668B
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Taiwan
Prior art keywords
power supply
supply line
line
circuit
power
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TW085101635A
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Chinese (zh)
Inventor
Takahiro Tsuruda
Kazutami Arimoto
Masaki Tsukude
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Mitsubishi Electric Corp
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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/003Modifications for increasing the reliability for protection
    • H03K19/00346Modifications for eliminating interference or parasitic voltages or currents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0218Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of field effect structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • H01L27/11898Input and output buffer/driver structures

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computing Systems (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Dram (AREA)
  • Logic Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

To prevent the power noise generated at the time of the operation of a buffer circuit from affecting other internal circuits. An internal circuit (102) and an output circuit (104) are provided with power cables (142a, 142b) and ground cables (146a, 146b) respectively. Only between the power csble and the ground cable of the internal circuit, a capacitor (C1) for stabilization is provided. No capacitance coupling between the power cable 142b and the ground cable 146b of the output circuit 104 is provided, and ground voltage is not lowered and a constant voltage level is held, even if power source noise generated and the power source voltage is lowered at the time when the output circuit is operating.

Description

經濟部中央襟準局員工消費合作社印製 Α7 Β7 五、發明説明(1 ) ---- 本發明係關於半導體裝置,尤有關於用以降低在緩衝 電路<動作時之電源雜訊之影響的構成。更特定言之,本 發明係關於用降低在半導體記憶裝置中之餘出緩i電路之 電源雜訊對其他内部電路之影響的構成。 /前’在以個人電腦及工作站爲首之各種電氣產品, 均搭載有微電腦、記憶體及閘行列等各種之半導體裝置。 此等半導體裝置具有用以和裝置外部進行信號或資料之授 受的增損器。在半導體裝置係封在封套内之場合,此增損 器係連接在外部插頭端子上;而在半導體裝置係和其他之 丰導體裝置形成於同一晶片或晶圓上之場合,此增損器係 耗合於内邓哮線。對於輸出信號或資料之增損器,由於外 邓裝置讀入電容及配線電容等而存在有較大之自载,故 =騎出增損器,爲了將形成於裝置内部之信號或記憶 ^丁讀出’而設置具有巨大之電流驅動力的驅動電路 (輪出緩衝電路)。 =是在半導體裝置被封入於封套内而搭载於電氣產 二厂,此—半導體裝置之插頭端子係連接在實裝基板 導體奘番、认 連接於此一插頭端子之其他半 電袁^ 及印刷配線之漂移電容大,必須將此 大之負载電容(寄生電容)在-定時間内充放電, _此:輸出緩衝電路(驅動電路)之電流驅動力遠 電路夂電流驅動力爲大。 圖f爲顯示例如日本特開昭61_294929號公教所示之 又半導體記憶裝置中之輪出緩衝電路之構成圖式。在 (請先閱讀背面之注意事項再填寫本頁)Printed by the Consumers ’Cooperative of the Central Government Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the Invention (1) ---- This invention relates to semiconductor devices, especially to reduce the influence of power supply noise during snubber circuits < Composition. More specifically, the present invention relates to a configuration for reducing the influence of power supply noise on other internal circuits by mitigating the power of i circuits in semiconductor memory devices. / Qian 'is equipped with various semiconductor devices such as microcomputers, memory, and gates in various electrical products including personal computers and workstations. These semiconductor devices have a gain increaser for receiving signals or data from outside the device. When the semiconductor device is enclosed in an envelope, the gain increaser is connected to the external plug terminal; and when the semiconductor device is formed on the same wafer or other semiconductor conductor devices, the gain increaser is Consume in the inner Deng Xiao line. For the gain of the output signal or data, there is a large self-load due to the read capacitance and wiring capacitance of the external Deng device. Therefore, the gain increaser is driven out in order to store the signal or memory formed inside the device. Read out 'and install a drive circuit (wheel-out buffer circuit) with a huge current driving force. = Is when the semiconductor device is enclosed in an envelope and mounted in the second electrical plant. This—the plug terminals of the semiconductor device are connected to the conductors of the mounting substrate, and other semi-electrical elements that are connected to this plug terminal ^ and printed The drift capacitance of the wiring is large, and this large load capacitance (parasitic capacitance) must be charged and discharged within a fixed time. _This: The current driving force of the output buffer circuit (driving circuit) is far from the circuit. The current driving force is large. Fig. F is a diagram showing a configuration of a turn-out buffer circuit in a semiconductor memory device as shown in, for example, Japanese Patent Application Laid-Open No. 61_294929. (Please read the notes on the back before filling this page)

經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(2 ) 拉中出緩衝電路包含:p通道MOS電晶體3,連 接於接與輸㈣點2之間; :二。1電晶體4,連接於輸出節點2和接受接地電壓 1 4地節點16之間;NAND電路5,接受内部讀出 二料=及介由反相器7而饋人之資料輪出促成信號咖; Z ’接受内部讀出資料&amp;及資料輸出促成信號 、 AND電路5之輸出信號被饋入至MOS電晶體3 〈閑極。N〇R電路6之輸出信號則被饋入至MOS電晶體4 &lt;閘極。在輪出節點2存在有較大之寄生電容以。其次, 參照圖28所示之動作波形圖以説明此-圖27所示之輸出 緩衝電路之鄞作。 内部讀出資料dl由備用狀態之中間電位變化爲低位 準。在資料輪出促成信號z〇E爲高位準之時,反相器了之 輸出信號爲低位準,NAND電路5之輸出信號爲高位準, NOR電路6之輸出^號爲低位準。因此,M〇s電晶體3 4均爲OFF狀態’輸出緩衝電路成爲輸出高阻抗狀態 (Ηι-Ζ) ° 在時刻TG ’若令資料輸出促成信號z〇E爲低位準之 活性狀態,則反相器7之輸出信號成爲高位準,ναν〇電 路5及NOR電路6均作用爲一反相器,Ναν〇電路5與 NOR電路6之輸出信號均成爲高位準,因而令M〇s電晶 體^成爲0FF狀態及令_3電晶體4成爲〇n狀態。故輸 出節點2經由此一 ON狀態之M0S電晶體4朝接地節點16 放電,外部讀出資料信號D1由高阻抗狀態拓_2朝接地電 (請先閲讀背面之注意事項再填寫本頁)Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (2) The pull-out buffer circuit includes: p-channel MOS transistor 3, which is connected between connection and input point 2; 1 transistor 4, connected between output node 2 and ground node 14 receiving ground voltage 14; NAND circuit 5, accepting internal readout 2 = and feeding data through inverter 7 to promote signal Z 'accepts the internal read data &amp; and the data output enable signal, and the output signal of the AND circuit 5 is fed to the MOS transistor 3 <idle pole. The output signal of the NOR circuit 6 is fed to the MOS transistor 4 &lt; gate. There is a large parasitic capacitance at the round-out node 2. Next, the operation of the output buffer circuit shown in FIG. 27 will be described with reference to the operation waveform diagram shown in FIG. The internal readout data d1 changes from the intermediate potential in the standby state to the low level. When the data wheel enable signal z0E is at a high level, the output signal of the inverter is at a low level, the output signal of the NAND circuit 5 is at a high level, and the output ^ of the NOR circuit 6 is at a low level. Therefore, the M0s transistor 34 is all OFF state. The output buffer circuit becomes an output high impedance state (Ηι-Z) ° At time TG 'If the data output promotes the signal z0E to a low level active state, it will reverse. The output signal of the phaser 7 becomes a high level. Both the ναν〇 circuit 5 and the NOR circuit 6 function as an inverter, and the output signals of the Ναν〇 circuit 5 and the NOR circuit 6 both become a high level. The 0FF state and the _3 transistor 4 are brought to the ON state. Therefore, the output node 2 discharges to the ground node 16 through the M0S transistor 4 in this ON state, and the externally read data signal D1 goes from the high impedance state to _2 toward the ground (please read the precautions on the back before filling this page)

--- n n —KL— HI--- n n —KL— HI

,1T ..-uit:..r;.:.l·1-—·.主一一….ι.ΐ 本纸張目家辟(c叫A4· ( 2igx297公幻 A7 A7 經濟部中央楼準局負工消費合作社印 五、發明説明(3 ) 位位準降低。 , 】Tl ’若令資料輪出促成信號ZOE爲高位準, 貝不論此-内部讀出資料⑴之邏辑位準如何,NMD電 路5及NOR電路6夕鉍山/丄 令輪出㈣h 分職爲高位準及低位準, 輸出;^衝電路再度成騎出高阻抗狀態。 ’、'人’若其他之儲存單元被選擇,高位準之資料被讀 ^内部讀出資料dl成爲高位準,則於時刻口,令資 料輪出促成信號Ζ0Ε再度成爲低位準。於此一狀態下, NAND電路5及職電路6再度仙爲—反相器,令此等 : 6之輸出仏號成爲低位準。因此,M〇s電晶體3 成爲ON狀態、,使M〇s電晶體4成爲⑽狀態。輸出節點 由此ON狀態&lt;M0S電晶體3被充電至電源電壓〜 準’使外部讀出資料m成爲高位準。 在㈣T3 ’若再度令資料輸峡成信號ZQE成爲高 則此—輸出緩衝電路再度成爲輸出高阻抗狀態。 圖29爲顯示半導體裝置之電源線及接地線之配置樣 例之圖式。在圖29中,對於產生内部讀出資料 3部電路η及輸出緩衝電路12,共通設置電源線此 及接地線服。電源電壓Vcc被傳達至此—電源線此上 :接地電壓漏被傳達至接地線⑽上。在來自輪出緩衝 電路12之讀出資料信號⑴自低位準變成高位準之場人 如圖27所示,電流自電源節點13經则電晶體 至輸出節點2。輸錢衝電路12爲了以高速進行存在^ 輪出節點2之巨大寄生電容以的充電,故_s電晶體= . ___ 本纸張尺度適用 1¾¾準(CNS)艄絲(2】0X297/Jjy ------—— Λ4 、 (請先閱讀背面之注意事項再填寫本頁) —訂--- 線----- A7 B7 五、發明説明(4 ) ^~--— 及4具有巨大之電流驅動力。因此,於此-場合,在如圖 Ϊ所:ΐ自輪出緩衝電路12之讀出資料信號D1自低位準 =準升高時’此—電源線10a上之電流急速地被消 ”源線10a上之電源、電壓VCC降低至接近〇5V左右。 又’在來自輸出緩衝電路12之讀出資料信號D1由高位準 降低至低位準時,圖27所示之M〇s電晶體4即導通,有 f大&lt; 電流讀出節點2向接地節點lb急速地放電。於此 場合,接地線10b無法將由此一輸出緩衝電路/2急劇被放 電&lt;大電流全部吸收,此一接地電壓GNd之電位位準 約 0.5V。 。 電源線1 Oa及接地線1 Ob上之電源雜訊(在電源電 壓及接地電壓各自之雜訊)被傳達至内部電路11。於電源 電,Vcc爲5V左右之場合,此—電源雜訊爲電源電屢w 1 /10左右之大小,此雜訊相對地較小,於内部電路11 中不發生因電源雜訊而造成誤動作之問題。但是,近年 來隨著半導體裝置之高密度化,爲求達到低消耗電力化及 向速動作,通常令電源電壓Vcc之電位位準低於3 3V或更 低。於此場合,由於此一 〇 5V之電源雜訊對於電源電壓 Vcc具有约1/6左右之大小,故由於此一電源雜訊會使内 部電路11產生誤動作,將高位準之信號判定爲低位準之信 號,或將低位準之信號判定爲高位準,而造成誤動作,爲 其問題。 Μ 爲了吸收如上述之電源雜訊,而如圖31所示般,而在 内部電路11及輸出緩衝電路12各自之附近,設置爲達安 7 ...... ....... I I- - - - —^Γ.ί&gt;· -I —— I &quot;乂: (請先閲讀背面之注意事項再填寫本頁) 訂 I--- 經濟部中央標準局員.工消費合作社印製 A7 --------- B7 五、發明説明(5 ) &quot; —&quot; &quot;一一 定化之退搞電容C1及C2。此等退㈣容〇及〇分別連 接在電源線10a與接地線⑽之間。在輸出緩衝電路12動 作,消耗電源線10a上之電流,電源電壓vcc降低時,此 -退耦電容C2將蓄存之正電荷供給至電源線⑽,而抑制 電源電壓Vcc之降低。另一方面,在輪出緩衝電路動作, 將電流放電至接地線10b之場合,係以独電容c2吸收此 一放電電流,而抑制接地電壓之升高。 又,利用設於内部電路u附近之独電容〇,以抑 制對於此-内部電路U之電壓Vcc及刪之電源雜訊, 並防止因輸出緩衝電路12之動作所致之電源雜訊向内部 電路11傳達 此-退親電容係ϋ由其蓄存電荷(正電荷及負電荷)來 抑制電源雜訊’爲了抑制電源電壓Vcc之降低及接地電壓 經濟部中央標準局員工消費合作社印製 之升高’而具有例如45GPF左右之數百微微法拉之電 容値。藉由此退稱電容CUC2,電源線咖及接地線⑽ 乃受電容耦合。電源線10a上之電源電壓Vcc之降低速度 急劇,發生交流方式之變化。因此,如圖32所示,由於此 退輟電容C2,電源線i〇a及接地線1〇b乃以交流方式被耦 合,此一電源電壓Vcc之電位降低被傳達至接地線i〇b, 接地電壓GND乃降低。退搞電容ci及C2藉由立苦在自 電荷吸收接地電壓咖之升高。因此,在mD 降低之場合,無法以此退耦電容C1及C2吸收電位降低。 在半導體裝置爲半導體記憶裝置,而内部電路丨1爲驅動儲 存單元行列用之電路之場合,會發生如下之問題。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(6 ) 圖33爲顯示儲存單元之構成的圖式。於圖33中,儲 存單元MC包含存取電晶體QM及儲存電容器CM,該存 取電晶體QM係由具有連接於位元線BL之一邊之導通節 點、連接於儲存節點SN之另一邊之導通節點、連接於字 元線WL之閘極的η通道MOS電晶體所構成。而該儲存電 容器CM具有連接於儲存節點SN之一邊之電極及承受單 元板極電壓之另一邊之電極。通常,單元平板電壓係保持 於(Vcc+GND)/2之中間電位位準。記憶資訊係以電荷之形 態被保存於儲存節點SN。 現在考慮字元線WL爲非選擇狀態,其電位爲0V之 場合。在輸痒緩衝電路12之動作時,位元線BL被連接於 經選擇之字元線(與字元線WL不同之字元線),並依連接 於此位元線BL之儲存單元之記憶資料,而使其成爲高位 準或低位準。現在考慮位元線BL之電位爲低位準,0V之 場合。此時,在如圖32所示,輸出緩衝電路12動作,而 電源電壓Vcc降低之場合,接地電壓GND亦跟著降低。此 一接地電壓GND之降低,係如圖31所示般,被傳達至内 部電路11,位元線BL之電位OV降低爲負電位位準。字 元線WL之電位爲0V,故儲存電晶體QM之閘極與源極 之電位差變成大於OV之値,儲存電晶體QM·成爲弱導通 狀態,蓄存於儲存節點SN之電荷(正電荷)向位元線BL放 電。因此,非選擇儲存單元之蓄存電荷減少,儲存單元之 資料保持特性劣化,於最惡劣之場合,此非選擇儲存單元 之記憶資料會被破壞。 (請先閱讀背面之注意事項再填寫本頁) •裝·, 1T ..- uit: .. r;.:. L · 1-— ·. Master one one… .ι.ΐ This paper is a household name (c is called A4 · (2igx297 public magic A7 A7 Central Building of the Ministry of Economic Affairs) Printed by quasi-office consumer cooperatives 5. Description of invention (3) The level is lowered.,] Tl 'If the data rotation is enabled to cause the signal ZOE to be at a high level, regardless of this-the logical level of internally read data ⑴ , NMD circuit 5 and NOR circuit 6 bismuth mountain / order wheel out ㈣h divided into high level and low level, output; ^ red circuit again into a high impedance state. ',' Person 'if other storage units are Select, the high-level data is read ^ The internal read-out data dl becomes the high level, and at the moment, the data rotation enables the signal ZO0E to become the low level again. In this state, the NAND circuit 5 and the professional circuit 6 once again For the inverter, let these: the output number of 6 become low level. Therefore, the Mos transistor 3 is turned on, and the Mos transistor 4 is turned on. From this state, the output node is &lt;; M0S transistor 3 is charged to the power supply voltage ~ quasi 'to make the externally read data m high level. At ㈣T3' if the data is lost to the letter again If ZQE becomes high, the output buffer circuit becomes high-impedance state again. Figure 29 is a diagram showing a configuration example of a power supply line and a ground line of a semiconductor device. In FIG. 29, there are three circuits for generating internal readout data. η and the output buffer circuit 12, a power line and a ground line are provided in common. The power supply voltage Vcc is transmitted here-the power line is here: the ground voltage leakage is transmitted to the ground line 。. The readout from the round-out buffer circuit 12 The data signal is changed from a low level to a high level. As shown in Figure 27, the current flows from the power node 13 to the transistor 2 to the output node 2. The money-passing circuit 12 exists at high speed ^ for the huge parasitics of node 2 The capacitor is charged, so _s transistor =. ___ This paper size is suitable for 1¾¾ standard (CNS) reel (2) 0X297 / Jjy ------—— Λ4, (Please read the precautions on the back first (Fill in this page) — Order --- Line ----- A7 B7 V. Description of the invention (4) ^ ~ --- and 4 has a huge current driving force. Therefore, in this case, in the place shown in Figure Ϊ : Ϊ́ Read data signal D1 from the round-out buffer circuit 12 from low level = accurate When the time is high, the current on the power supply line 10a is rapidly eliminated. The power supply and voltage VCC on the power supply line 10a are reduced to approximately 0.5V. Also, the read data signal D1 from the output buffer circuit 12 is reduced from a high level At the lowest level, the MOS transistor 4 shown in FIG. 27 is turned on, and a large current <node 2 is rapidly discharged to the ground node lb. In this case, the ground line 10b cannot output an output buffer circuit from this. / 2 is suddenly absorbed by the discharge &lt; large current, and the potential level of this ground voltage GNd is about 0.5V. . Power supply noise (noise at the power supply voltage and ground voltage) on the power line 1 Oa and the ground line 1 Ob are transmitted to the internal circuit 11. In the case of power supply, Vcc is about 5V, this—power supply noise is about 1 / 10th of the power supply, this noise is relatively small, and no malfunction occurs due to power supply noise in the internal circuit 11. Problem. However, in recent years, with the increase in the density of semiconductor devices, in order to achieve low power consumption and fast speed operation, the potential level of the power supply voltage Vcc is generally lower than 33 V or lower. In this case, because the 105V power noise is about 1/6 of the power voltage Vcc, the power circuit noise will cause the internal circuit 11 to malfunction, and the high-level signal is determined to be the low-level. It is a problem that a signal of a low level is judged as a high level and a malfunction is caused. In order to absorb the power noise as described above, as shown in FIG. 31, Μ is set to Daan 7 near each of the internal circuit 11 and the output buffer circuit 12 ... I I-----^ Γ.ί &gt; · -I —— I &quot; 乂: (Please read the notes on the back before filling this page) Order I --- Member of the Central Standards Bureau of the Ministry of Economic Affairs. System A7 --------- B7 V. Description of the invention (5) &quot; — &quot; &quot; A certain retreat capacitors C1 and C2. These retraction capacitors 0 and 0 are connected between the power line 10a and the ground line 10, respectively. When the output buffer circuit 12 operates, consumes the current on the power supply line 10a, and the power supply voltage vcc decreases, this-the decoupling capacitor C2 supplies the stored positive charge to the power supply line 抑制, and suppresses the decrease of the power supply voltage Vcc. On the other hand, when the turn-out buffer circuit operates and discharges current to the ground line 10b, this discharge current is absorbed by the single capacitor c2 to suppress the increase of the ground voltage. In addition, a single capacitor 0 located near the internal circuit u is used to suppress the power noise of the internal voltage U and the voltage Vcc of the internal circuit U, and prevent the power noise caused by the operation of the output buffer circuit 12 from flowing to the internal circuit. 11 Communicating this-Retirement capacitors are designed to suppress power supply noise by their stored charges (positive and negative charges). 'It has a capacitance of hundreds of picofarads of about 45 GPF, for example. As a result, the capacitor CUC2 is renamed, and the power line and the ground line ⑽ are capacitively coupled. The decrease speed of the power supply voltage Vcc on the power supply line 10a is rapid, and a change in the AC mode occurs. Therefore, as shown in FIG. 32, due to the drop capacitor C2, the power supply line i0a and the ground line 10b are coupled in an AC manner, and the potential decrease of the power supply voltage Vcc is transmitted to the ground line i0b, The ground voltage GND decreases. The capacitors ci and C2 are designed to increase the ground voltage by self-absorption. Therefore, when mD is reduced, the absorption potential of the decoupling capacitors C1 and C2 cannot be reduced by this. When the semiconductor device is a semiconductor memory device and the internal circuit is a circuit for driving the ranks of the memory cells, the following problems occur. This paper size applies to the Chinese National Standard (CNS) A4 (210X297 mm). Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. A7 B7 V. Description of the invention (6) Figure 33 shows the structure of the storage unit. In FIG. 33, the memory cell MC includes an access transistor QM and a storage capacitor CM. The access transistor QM is connected by a conductive node connected to one side of the bit line BL and connected to the other side of the storage node SN. A node and an n-channel MOS transistor connected to the gate of the word line WL. The storage capacitor CM has an electrode connected to one side of the storage node SN and an electrode connected to the other side of the cell plate voltage. Generally, the cell plate voltage is maintained at the intermediate potential level of (Vcc + GND) / 2. The memory information is stored in the storage node SN as a charge. Now consider a case where the word line WL is in a non-selected state and its potential is 0V. When the itching buffer circuit 12 operates, the bit line BL is connected to the selected word line (a word line different from the word line WL), and according to the memory of the storage unit connected to the bit line BL Data to make it high or low. Now consider a case where the potential of the bit line BL is a low level and 0V. At this time, when the output buffer circuit 12 operates as shown in FIG. 32 and the power supply voltage Vcc decreases, the ground voltage GND also decreases. This decrease in the ground voltage GND is transmitted to the internal circuit 11 as shown in FIG. 31, and the potential OV of the bit line BL is reduced to a negative potential level. The potential of the word line WL is 0V, so the potential difference between the gate and the source of the storage transistor QM becomes larger than OV, and the storage transistor QM · becomes a weak conduction state, and the charge (positive charge) stored in the storage node SN is stored. The bit line BL is discharged. Therefore, the storage charge of the non-selected storage unit is reduced, and the data retention characteristics of the storage unit are deteriorated. In the worst case, the memory data of the non-selected storage unit will be destroyed. (Please read the notes on the back before filling this page)

'IT 本紙張尺度適用中國國家標準(CNS ) A4規格(2Κ)Χ297公釐) 五 發明説明(7 _ 又,在選擇儲存單元保接* 肌之電位被保持於電資料’位元線 此一位元線BL之電源電壓Vee,H,右因電轉訊使 單元之高位準之寫入資料之電位:進’則寫入於選擇儲存 必要之電荷蓄存於儲存節點紐内^降低,而發生無法令 位準之資料寫入時或復原時樣地,在高 隨之會發生此傲在… 切存知點SN《電荷量降低, 此错存早n荷保持特性劣化的問題。 又’在輸出緩衝電踉ί?由、人上、 壓咖降低之場a用/’於接地線⑶上之接地電 _低又%口,用以朝低位準驅動_t MOS 4 樣與源極間電位差加大 :電-體4 態,而有電減由此一輸出節…邀成爲弱0N狀 丨出知點2流•向接地節點ib。因此, = 電位位準乃更形降低,且接地電壓 :c訊加大,且讀出資料信…低位 I 發生結51 *正確資料&lt; 問題。又,於此時, 机由電源節點13經M0S電晶體3及4流向接地節點 lb ’而發生在輪出緩衝電路之消耗電流增加之問題。 經濟部中央標準局員工消費合作社印製 圖34爲顯示習用之輸出缓衝電路之另一構成的圖 式。於圖34中,輸出緩衝電路包含:反相器13,用以接 定内邵讀出資料dl ; N〇R電路M,接受資料輸出促成信 號zoe與反相器13之輪出信號;N〇R電路匕,接受内 部讀出資料dl與資料輸出促成信號ζ〇Ε ; η溝道M〇s電 晶體16,連接在電源節點la與輸出節點2之間,在N〇R 電路14之輪出信號爲高位準時會導通;^溝道勘^電 晶體17,在NOR電路μ之輸出信韓爲高位準時會導通。 本紙張尺度顧相目家標 A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明(8 ) MOS電晶體16及17之基板領域(半導體基板或#領城),係 承受負之偏壓電壓VBB。 在資料輸出促成信號ZOE爲高位準時,NOR電路14 及電壓位準之輸出信號均爲低位準,MOS電晶體16及17 均成OFF狀態,令輸出緩衝電路成爲輸出高阻抗狀態。若 令資料輸出促成信號ZOE爲低位準,則NOR電路14及15 均作用爲反相器。在内部讀出資料dl爲低位準時,令NOR 電路14之輸出信號爲低位準,而NOR電路15之輸出信號 爲高位準,MOS電晶體17成爲OFF狀態,輸出節點2放 電至接地電壓GND位準。在内部讀出資料dl爲高位準時, NOR電路14,乏輸出信號成爲高位準,NOR電路15之輸出 信號成爲低位準,輸出節點2經由ON狀態之MOS電晶體 16而放電至電源電壓Vcc位準。 於此圖34所示之輸出緩衝電路之場合,會發生與前面 説明之輸出緩衝電路同樣之電源雜訊之問題。於如此圖34 所示之輸出緩衝電路之構成之場合,更會發生由此一基板 偏壓電壓VBB所致之問題。 圖35係概略顯示包含於圖34所示輸出緩衝電路與内 部電路中之儲存單元之剖面構造的圖式。於圖35中,輸出 緩衝電路係形成於在P型半導體基板20之表面所形成之卩 型#22内。於圖35中,僅顯示包含於輸出緩衝電路之MOS 電晶體16之構成。此一 MOS電晶體16包含:高濃度N型 雜質領域(N+雜質領域)22a與22b ;及閘極電極22c,隔著 (未圖示之)閘極絕緣膜而形成於雜質領域22a與22b間之 11 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ---------Γ1 ^------訂------- _ i S (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 A7 B7五、發明説明(9 ) 溝道領城上。雜質領域22b係連接於電源節點la上。於此 P#22之表面,形成有高濃度P型雜質領域(P+雜質領 域)22d。偏壓電壓VBB介由此一雜質領域22d施加於P#。 儲存單元係形成於在P型半導體基板20之表面與 P#22分離形成之P#24内。儲存單元包含:在P#24表面互 相隔開而形成之N型雜質領域24a與24b ;及隔著閘極絕 緣膜(未圖示)形成於雜質領域24a與24b間之溝道領域上 的閘極電極24c。雜質領城24a被連接於位元線BL,而閘 極電極24c則被連接於字元線WL。儲存單元更包含連接 於雜質領城24b之導電層24d及與導電層24d對向形成之 導電層24e a此等導電層24d及24e形成儲存電容器之電 極0 在P#24表面,更形成有承受偏壓電壓VBB之P型雜 質領域24f。此偏壓電壓VBB係自共通之偏壓電壓產生電 路饋入。亦即,P#22與P#24係介由此一偏壓電壓VBB傳 達線作電性連接。在雜質領城22e與P#22之間形成有耦合 電容22e。 在如圖36所示,發生電源雜訊,而電源電壓Vcc降低 時,由於此一寄生電容22e,P#22之電位亦降低。此一 P#22之電位降低介由雜質領城22d被傳達至P#24之N型 雜質領域24f,P#24之偏壓電壓位準亦隨之變化。η溝道 MOS電晶體之臨界値電壓係與偏壓電壓VBB之絕對値 |VBB|之平方根成比例。因此,在Ρ#24之偏壓電壓VBB 降低時,此一儲存電晶體之臨界値電壓變大。因此,成被 12 (請先閱讀背面之注意事項再填寫本頁) 裝 訂'IT This paper size applies the Chinese National Standard (CNS) A4 specification (2K) × 297 mm] 5 Description of the invention (7 _ Also, in the selected storage unit to protect * The muscle potential is maintained in electrical data' bit line this one The power supply voltage Vee, H of the bit line BL, and the potential of the data written to the high level of the cell due to the electrical transmission: "In" is written in the charge necessary for selective storage and stored in the storage node. When the level of data cannot be written or restored, such pride will occur at high heights ... The knowledge point SN will be reduced, the amount of charge will decrease, and this error will cause the problem of deterioration of the charge retention characteristics. The buffer current is reduced by a person, a person, and a person. The ground voltage on the ground line is low and low, which is used to drive the low level. T MOS 4 The potential difference between the source and the source is increased. Large: electric-body 4 state, and there is power reduction from this output node ... invited to become a weak 0N shape 丨 out of the knowledge point 2 flow to the ground node ib. Therefore, = the potential level is more reduced, and the ground voltage: c message increased, and the data letter was read out ... the low-level I occurred 51 * correct data &lt; problem. Also, here The problem is that the current consumption of the snubber circuit increases from the power node 13 through the M0S transistors 3 and 4 to the ground node lb '. Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. A diagram of another structure of the punching circuit. In FIG. 34, the output buffer circuit includes: an inverter 13 for connecting the internal readout data dl; a NOR circuit M, which receives the data output facilitating signal zoe and the inverse The phase output signal of the phaser 13; the NOR circuit, accepts the internal readout data dl and the data output enabling signal ζ〇Ε; n-channel M0s transistor 16, connected between the power node 1a and the output node 2 , When the output signal of the NOR circuit 14 is high, it will be turned on; ^ channel survey ^ transistor 17, when the output signal of the NOR circuit μ is high, it will be turned on. This paper standard Gu Xiangmu family standard A7 B7 Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the Invention (8) The substrate field of MOS transistors 16 and 17 (semiconductor substrate or # 领 城) is subject to a negative bias voltage VBB. The data output enables the signal ZOE When high, NOR power The output signals of 14 and voltage level are both low level, and the MOS transistors 16 and 17 are in the OFF state, so that the output buffer circuit becomes a high impedance output state. If the data output promotion signal ZOE is at a low level, the NOR circuit 14 and 15 both act as inverters. When the internal read data dl is at a low level, the output signal of the NOR circuit 14 is at a low level, and the output signal of the NOR circuit 15 is at a high level. The MOS transistor 17 becomes the OFF state and the output node 2 Discharge to the ground voltage GND level. When the internal read data dl is at a high level, the NOR circuit 14 becomes a high level due to the lack of output signals, the output signal of the NOR circuit 15 becomes a low level, and the output node 2 passes the ON state MOS transistor 16 and discharge to the power supply voltage Vcc level. In the case of the output buffer circuit shown in FIG. 34, the same problem of power noise as that of the output buffer circuit described above occurs. In the case of the configuration of the output buffer circuit as shown in FIG. 34, a problem due to the substrate bias voltage VBB occurs even more. FIG. 35 is a diagram schematically showing a cross-sectional structure of a memory cell included in the output buffer circuit and the internal circuit shown in FIG. 34. FIG. In FIG. 35, the output buffer circuit is formed in a 卩 -type # 22 formed on the surface of the P-type semiconductor substrate 20. In FIG. 35, only the structure of the MOS transistor 16 included in the output buffer circuit is shown. This MOS transistor 16 includes: high-concentration N-type impurity regions (N + impurity regions) 22a and 22b; and a gate electrode 22c formed between the impurity regions 22a and 22b via a gate insulating film (not shown). 11 This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) --------- Γ1 ^ ------ Order ------- _ i S (please first Read the notes on the back and fill in this page) A7 B7 printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of Inventions (9) On the channel city. The impurity region 22b is connected to the power node la. On the surface of P # 22, a high-concentration P-type impurity region (P + impurity region) 22d is formed. The bias voltage VBB is applied to P # through an impurity region 22d. The memory cell is formed in P # 24 formed on the surface of the P-type semiconductor substrate 20 separately from P # 22. The storage unit includes: N-type impurity regions 24a and 24b formed on the surface of P # 24 separated from each other; and a gate formed on the channel region between the impurity regions 24a and 24b via a gate insulating film (not shown).极 electrode 24c. The impurity collar 24a is connected to the bit line BL, and the gate electrode 24c is connected to the word line WL. The storage unit further includes a conductive layer 24d connected to the impurity collar 24b and a conductive layer 24e formed opposite to the conductive layer 24d. These conductive layers 24d and 24e form the electrodes of the storage capacitor. On the surface of P # 24, a bearing is further formed. The P-type impurity region 24f of the bias voltage VBB. This bias voltage VBB is fed from a common bias voltage generating circuit. That is, P # 22 and P # 24 are electrically connected by a bias voltage VBB transmission line. A coupling capacitor 22e is formed between the impurity collar 22e and P # 22. As shown in FIG. 36, when power supply noise occurs and the power supply voltage Vcc decreases, the potential of P # 22 also decreases due to this parasitic capacitance 22e. This potential decrease of P # 22 is transmitted to the N-type impurity region 24f of P # 24 via impurity collar 22d, and the bias voltage level of P # 24 also changes accordingly. The threshold voltage of the n-channel MOS transistor is proportional to the square root of the absolute voltage | VBB | of the bias voltage VBB. Therefore, when the bias voltage VBB of P # 24 decreases, the critical voltage of this storage transistor becomes large. Therefore, Cheng Fu 12 (Please read the notes on the back before filling this page) Binding

0C 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) A7 A70C This paper size applies to Chinese National Standard (CNS) Α4 size (210X 297 mm) A7 A7

經濟部中央標準局員工消費合作社印製 五、發明説明(1〇 / 選擇狀態之像存單元中所含之错存電晶體之電導變大,在 =:準資料寫人時,會發生無法將充分量之電荷傳達至儲 存節點(雜質領域24b)的問題。 …若由於寄生電容22e,健電屢VBB降低,P#24之 偏屢電壓位準亦隨#陷^反 M、4、人隨&lt; 降低則由於雜質領域24b與刪 間 &lt; 接合電容的電宕耦人,φ , %谷耦13,電何乃由雜質領域24b向雜質 流出,#存單元之蓄存電荷量遂降低。由於此等 知形,會發生因㈣電壓VBB之變動而 荷保持特性劣化的問題。 子早兀疋電 於半導體記憶裝置中,有隨著輪出入資料之位 心大’輸—衝轉讀目料且 《 電源雜訊亦增大α + 且此輸⑽衝電路之 牮丌曰大《倾向。又,在邏辑 亦隨著其高密度化,而有輪出㈣、守千導體裳置中, 電路且之數目亦隨之增大,㈣ 輸出餐衝 著化之傾向。均大门樣造成電源雜訊之問題呈顯 之充放電速度減小即可,但於此場:雖然降低輪出節點: 出速度之降低,故會產生i法二*於會遥成資科輪 號的問題。 ’,、、法以-速輪出資料等之輪出信 因此’本發明之目的,係提供 :低在緩衝電路動作時之電源雜訊對内部電路所:成:: …本,明之另-目的,係提供—種半導 吾儲存單元之電荷保持特性。 a k,其可改 Z紙張尺度適用中Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the invention (1/10 / The conductivity of the misstored transistor included in the image storage unit in the selected state becomes larger. The problem that a sufficient amount of charge is transferred to the storage node (impurity field 24b).… If the VBB of Genpower is reduced due to the parasitic capacitance 22e, the bias voltage level of P # 24 will also be trapped with ## ^ M, 4, &lt; The decrease is due to the coupling of the electric field of the impurity region 24b and the junction capacitor, φ,% valley coupling 13, and the electric current flows out of the impurity field 24b to the impurity, so the amount of stored charge of the #storage cell is reduced. Due to such knowledge, the problem of deterioration of the load retention characteristics due to the change in the voltage VBB occurs. In the semiconductor memory device, there is a big loss of data as the data is input and output. It is expected that the noise of the power supply will also increase α + and the output circuit will have a larger tendency. Also, in the logic, with its high density, there will be rounds, and thousands of conductors will be placed in the center. , And the number of circuits also increases, ㈣ the tendency of output The problem of power noise caused by the average door sample is obvious. The charge and discharge speed can be reduced, but in this field: Although the output node is reduced: the output speed is reduced, so i method 2 will be generated * The problem of this issue is to send out the letter of “-,” and “speed-out of data.” The purpose of the present invention is to provide: Low power noise when the buffer circuit operates to the internal circuit ::: ... The purpose is to provide the charge retention characteristics of a semiconducting storage unit. Ak, which can be changed in Z paper size.

請 閲 | 讀1 背.1 面 之1 注'I I I I丨〔 ά 1 I裝 買I 訂 線Please read | Read 1 back. 1 Side of 1 Note 'I I I I 丨 〔ά 1 I buy I order

W 13 五、發明説明(11 ) ~~〜—___ 如申請專利範園第…半導體裝 源供給線,用以傳達第i電線電位 備有:第1電 以傳達第2電源電位;内部電路,令該第=供給線,用 之第!電源電位與該第2電源供給 :=線上 爲一邊及另-邊之動作電源€壓而_二^電位作 以處理而翰出’·電容器,結情入〈信號加 電源供給線之間;第3電二第;==與第1 分開設置,用以傳達該第1 ^供給線 與該第2電源供給線分開設置,用原供給線, 線實質上依交流方式非結合,用達=第3電源供給 及緩衝電路,令該第3電源供= = : 第4電源供給線上: 理而^壓而動作’對該内部電路之輪出信號施以緩衝處 拜請專利範圍第1項之半導體裝置,備有··第1電 以傳達第1電源電位;第2電源供給線,用 2 =源電位;内部電路’令該第I電源供給線上 經濟部中央標準局員工消費合作社印製 第2電源供給線上之第2電源電位作 以處源電壓而動作,對饋入之信號加 電具有有效電容値之電容器,結合於該第! 該第ϋ泉與第1電原供給線之間;第3電源供給線,與 第4電/原供給線分開設置,且用以傳達該第1電源、電位; 供給線’與該第2電源供給線分開設置,且用以 14 1 電源電位;及_電路,令該第3«供給線 經濟部中央標準局員工消費合作社印製 五、發明説明(12 ) 上之第1電源電位與該第4電源供給線上之第2電源電位 作爲-邊及另一邊之動作電源電壓而動作,對該内部電路 之輪出信號施以緩衝處理而輸出;在該第3電源供給線盘 第4電源供給線之間,僅存在著具有實質上較該有效電容 値爲小之寄生電容器,作爲將該第3電綠供給線與該第4 電源供給線予以電容耦合之裝置。 如申請專利範圍第3項之半導體裝置,備有:&amp;電 源供給線,用以傳達第!電源電位;第2電源供給線,用 以傳達第2電源電位;内部電路,令該第ι電源供給線上 {第1電源電位與該第2電源供給線上之第2電源電位作 爲一邊及另,邊之動作電源電壓而動作,對館入之信號加 以處理而输出;具有有效電容値之電容器,耗合於該第1 電源供給線與第2電源供給線之間,·第3電源供給線,虚 電源供給線分開設置,且用以傳達該第i電碌電位; 2 4電驗給線,與該第2電驗給線分開設置,且用以 、=孩第2電源電位;緩衝電路,令該第3電源供给線上 =第i電源電位與該第4電源供給線上之第2電源電位作 2-邊及另-邊之動作電源電壓而動作,對該内部電路之 號:以緩衝處理而輸出;及具有有效電容値的〇個 間^,…合於該第3電源供給線與該第4電源供給線之 如申請專利範圍第4項之半導體裝置,備有:第 以傳達第1電源電位;第2電源供给線,用 傳達第2電源電位;内部電路,令該第丨電源供给線上 15 本紙張尺度適用 210X297公釐) t ·*· 、- (請先閲讀背面之注意事項再填寫本頁}W 13 V. Description of the invention (11) ~~~ —___ If you apply for a patent, the first semiconductor semiconductor source supply line to convey the potential of the i-th wire is equipped with: the first power to communicate the second power supply potential; the internal circuit, Let the first = supply line, use the first! Power supply potential and the second power supply: = on-line and one-side action power supply voltage while _ two ^ potential for processing and out of the "· capacitor, the result is between <signal plus power supply line; the first 3Electricity second; == Separate from the first, used to convey that the first ^ supply line is set separately from the second power supply line, using the original supply line. 3 power supply and buffer circuit, so that the third power supply = =: 4th power supply line: reasonably ^ press and operate 'the buffer circuit for the internal circuit's output signal, please call on the semiconductor in the first scope of the patent The device is equipped with the first power to communicate the first power potential; the second power supply line uses 2 = source potential; the internal circuit 'makes the first power supply line printed by the Consumer Standards Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs The second potential of the power supply line acts on the source voltage, and a capacitor with an effective capacitance 加 is applied to the fed-in signal. The third power source and the first power source supply line; the third power supply line is provided separately from the fourth power source and the original power supply line, and is used to communicate the first power source and the potential; the supply line 'and the second power source The supply line is set separately and used for the 14 1 power supply potential; and _ the circuit to make the 3 «supply line printed by the Consumers Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 5. The first power supply potential on the description of the invention (12) and the first The second power supply potential on the 4 power supply line operates as the operating power supply voltage of the-side and the other side, and the output signal of the internal circuit is buffered and output; the fourth power supply line on the third power supply reel In between, there is only a parasitic capacitor having a substantially smaller effective capacitance, as a means for capacitively coupling the third electric green supply line and the fourth power supply supply line. For example, the semiconductor device under the scope of patent application No. 3 is provided with: &amp; power supply line to convey the number! Power supply potential; a second power supply line to communicate the second power supply potential; an internal circuit that makes the first power supply line {the first power supply potential and the second power supply potential on the second power supply line as one side and the other It operates with the operating power supply voltage, and processes the signal input from the library. The capacitor with effective capacitance is consumed between the first power supply line and the second power supply line. The third power supply line, The power supply line is provided separately and is used to communicate the i-th power supply potential; 2 4 power supply lines are provided separately from the second power supply line and used to equal the second power supply potential; The third power supply line = the i-th power supply potential and the second power supply potential on the fourth power supply line operate on the 2-side and the other-side operating power supply voltages, and the number of the internal circuit is output by buffer processing ; And 0 with effective capacitance 値, ... a semiconductor device such as the fourth item in the scope of patent application, which is combined with the third power supply line and the fourth power supply line, is provided with: first to communicate the first power supply potential ; The second power supply line, used to communicate 2 power supply potential; an internal circuit, enabling the first power supply line 15 Shu scale paper applicable 210X297 mm) t · * ·, - (Read Notes on the back page and then fill}

經濟部中央標準局員工消費合作社印製 釐) Μ Β7 ~ «_ --------- 1 &quot; ~ 五、發明説明(13 ) ' 〜—' 一- 之第1電源電位與該第2電源供給線上之第2電源電位作 爲一邊及另一邊之動作電源電壓而動作,對饋入之俨號加 以處理而輸出;第1絕緣閘型電場效果電晶體,包:]第 1及第2導通節點,兩者均結合於該第}電線供給線·;及 結合於該第2電源供給線之閱極;第3電綠供給線,與該 第1電源供給線分開設置,用以傳達該第1電源電位;第4 電源供給線,與該第2電源供給線分開設置,用以傳達該 第2電源電位;緩衝電路,令該第3電源供給線上之第^ 電源電位與該第4電源供給線上之第2電源電位作爲一邊 及另-邊之動作電源電壓而動作,對來自該内部電路之餘 出信號施以緩衝處理;及第2絕緣閘型電場效果電晶體, 包括:第i及第2導通節點,分別結合於該第3電源供給 、、泉,及與該第4電源供給線呈無連接狀態之閘極。 欣如申請專利第5項之半導體裝置,料如申請專 利範圍第1至4項中任—項之裝置,更包含:第&quot;曾損器, 和第1及第3電源供給線共通地柄合,承受帛j電源電位; 及第2增扣盔,和第2及第4電源供給線共通地耦合,承 受第2電源電位。 〜如申請專職圍第6料半導體裝置,係於如申請專 利靶圍第1至4項中任一項之裝置,更包含第&quot;曾損器, 與该第1電源供給線相搞合,用以承受第i電源電位;第2 心損為,與該第2電源供給線相耦合,用以承受第2電源 電位;第3增損器,與該第!增摘器分開設置,且與第'3 電源供給線相核合’用以承受第I電源電位,·及第4增損 16 本紙張尺度適^ (請先閱讀背面之注意事項再填寫本頁}Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs) Μ Β7 ~ «_ --------- 1 &quot; ~ V. Description of the invention (13) '~-' 一-The first power supply potential and the The second power supply potential on the second power supply line operates as the operating power supply voltage on one side and the other side, and the fed-in number is processed and output; the first insulated gate-type electric field effect transistor, including: 1st and 1st 2 conduction nodes, both of which are connected to the} th power supply line; and the pole of the second power supply line; the third electric green supply line is provided separately from the first power supply line to communicate The first power supply potential; the fourth power supply line is provided separately from the second power supply line to communicate the second power supply potential; and the buffer circuit causes the third power supply potential on the third power supply line and the fourth power supply line The second power supply potential on the power supply line operates as the one-side and the other-side operating power voltages, and buffers the remaining signals from the internal circuit; and the second insulated gate-type electric field effect transistor includes: the i-th And the second conduction node are respectively connected to the third power supply ,, And springs, and gates that are not connected to the fourth power supply line. The semiconductor device that is pleased to apply for the fifth item of patent, such as the device of any one of the items 1 to 4 of the scope of patent application, further includes: the &quot; wonder device, and the common ground handle of the first and third power supply lines Close, to withstand the 电源 j power supply potential; and the second booster helmet, which is coupled to the second and fourth power supply lines in common, to withstand the second power supply potential. ~ If you apply for a full-time semiconductor device of the sixth material, it is a device such as any one of the first to fourth of the target circle of the patent application, and it also includes the &quot; loss device, which fits with the first power supply line, It is used to bear the i-th power source potential; the second heart loss is coupled to the second power supply line to bear the second power-supply potential; the third loss increaser is connected to the first! The picker is set separately and is in conjunction with the '3th power supply line' to withstand the first power supply potential, and the fourth increase and loss 16 This paper is of suitable size ^ (Please read the precautions on the back before filling this page }

A7 B7 經濟部中央棣準局員工消費合作社印製 五、發明説明(14 ) 器,與第2增損器分開設置,且與第4電源供給線相耦合, 用以承受第2電源電位。 如申請專利範圍第7項之半導體裝置,係於如申請專 利範圍第6項之裝置中,該緩衝電路係形成於半導體基板 領域内,且更備有偏壓電源線,該偏壓電源線係共^二耦 合於第1増損器,並自此第i增損器承受第i電綠電位。 如申請專利範圍第8項之半導體裝置,係於如申社專 利範,第5項之裝置中,更備有:電容器,被_合於^割 成和第1電源供給線之增損器相耦合之第i部分及和内部 電路相耦合第2部分的節點與第2供給線之間;及偏壓^ 源線,被耦合於形成有緩衝電路之半導體基板領域與第工 電綠電位之第2部分之間,將此第2部分上之第i電源電 位向半導體基板領域傳達。 伙如申請專利範圍第9項之半導體裝置,係於如申 =範圍第…項中任一項之裝置中,於半導體基板:域 J形=衝電路;且更備有:刪波器;及偏壓電源 、泉,與孩第3電源供給線分開設置,用以將該第!電源電 位經由該低通濾波器向該半導體基板領域傳達。 利專利範圍第1〇項之半導體裝置,係於如申請專 第9項之裝置之低通·器,包含_合於偏壓電 泉、泉人第4電源供給線間之電容器。 斤如申請專利範圍第11項之半導體裝置,係於如申社束 :粑圍第9項之裝置中,該偏壓電源線係共通耦合於二亥 第3電給線轉合之增損器上;且該低通據波器包= 17 (請先閲讀背面之注意事項再填寫本頁) .裝- 、?τ 線 ·'、 豕紙張尺度適 A4規格(21〇χ297公釐) A7 ~ -----^B7 五、發明説15 ) 〜---~~ 接在該偏壓電源線與該第2電湃扯 ,^ ^ 电脅、供给線之間的電容器。 如申請專利範圍第12項爻|馆 u 又+導體裝置,係於如申請專 利範圍第9項之裝置中,該偏壓電&gt;1 綠係電性連接於和該 第1電源供給線相連接之増損器上;且該低通濾波器包含 輕合於該偏壓電源線與該第2電綠供給線之間之電容器。 如申請專利範圍第13項之半導體裝置,係於如申請專 和範圍第9項之裝置中,更設有與該第3電源供給線及該 第4電源供給線所分別輕合之増損器分開設置,且接受該 第2電源電位之偏增損器;該低通遽波器&amp;含搞合於該偏 壓電源線及該偏壓增損器間之電容器。 如申請專利範圍第14項之半導體裝置,係於如申請專 利範圍第U項之裝置中,該K2係與第3電源供給線分開 設置’且與第3電源供給線電性耦合。 如申請專利範圍第15項之半導體裝置,係於如申請專 利範園第13項之裝置中,該偏壓電源線係耦合在該第丨電 源·供給線及第2電源供給線各自_合之增損器分開設置且 用以接受該第1電源電位之增損器上。 經濟部中央標準局員工消費合作社印裝 i.丨,I--I----ί 裝--- '·,.' C請先閲讀背面之注意事項再填寫本頁} 如申請專利範圍第16項之半導體裝置,係於如申請專 利範圍第1至6項中任一項之裝置中,該緩衝電路係形成 於半導體基板領域,且第3電源供給線亦輕合於此—半導 體基板領域。 如申請專利範圍第17項之半導體裝置,係於如申請專 利範圍第1至6項中任一項之裝置中,更備有設於第3電 源供給線及第4電源供給線之低通遽波器。該低通據波界 本紙張又度適用中國國家標準(CNS ) Α4規格(2Ι〇χ297公釐) A7 B7 經濟部中央標率局員工消費合作社印製 五、發明説明(16 ) 包含:介插於該第3電源供給線之第1電阻元件;耦合於 該第3電源供給線與該第*電源供給線之間的電容器;及 介插於該第4電源供給線間之第2電阻元件。 如申請專利範圍第18項之半導體裝置,備有:緩衝電 路’形成於半導體基板領城中,對饋入之信號施以緩衝處 理而輸出;低通濾波器;及基板偏壓產生機構,用以產生 待施加於該半導體基板領域之偏壓電壓,介由該低通濾波 器而施加於該半導體基板領域。 如申請專利範圍第19項之半導體裝置,係於如申請專 利範圍第18項之裝置中,更備有内部電路形成於和半導體 基板領域分離形成之第2半導體基板領域内,用以處理饋 入之彳&amp;號,將表示該處理結果之信號向緩衝電路饋送。來 自基板偏壓產生機構之由低通濾波器施行處理前之偏壓電 壓被施加於第2半導體基板領域。 如申請專利範圍第20項之半導體裝置,係於如申請專 利範圍第18項之裝置中,更備有:更設有:内部電路,形 成於和該半導體基板領域分離形成之第2半導體基板領 域,用以處理饋入之信號,將表示該處理結果之信號向該 緩衝電路饋入;及基板偏壓產生機構,與該基板偏壓產生 機構分別’設置,用以產生與該偏壓電壓相同電壓位準之偏 壓電屢,並施加於該第2半導體基板領域。 如申請專利範圍第21項之半導體裝置,係於如申請專 利範圍第6至17項中任一項之裝置中,該緩衝電路係形成 於該半導體基板領域内,且形成於受供給和該第丨電源電 19 卜紙張尺度適用中國國家榡準(CNS) (21()&gt;&lt;297公酱 (請先閲讀背面之注意事項再填寫本頁) -裝^ 訂 &quot;.CI. .I - I I— I— I n^i 經濟部中央標準局貝工消費合作社印裝 A7 • 丨丨 _ B*7 五,m^TTr&quot; --- 位不同之偏壓電壓的并領域内。 如申請專利範圍第22項之半導體裝置。係於如申請專 利範圍第6至17項中任一項之裝置中,該緩衝電路係形成 於該半導體基板領域内’且有不同於第i電源電位之偏壓 電位被供給至該半導體基板領域。 如申請專利範圍第23項之半導體裝置,係於如申請專 利範園第1至20項中任-項之裝置中,更包含配置成行列 狀之多數之儲存單元;該内部電路包含自該多數之儲存單 兀中選擇出儲存單元,並將該被選擇之儲存單元之記憶資 料予以讀出之電路;該緩衝電路包含將由該内部電路讀出 之資料予以輸出至裝置外部的輪出電路輪出電路。 藉由將設於緩衝電路之電源供給線間之有效電容耦合 (交流式之耦合)予以消除之方式,可防止一邊之電源供給 線上之電壓雜訊被傳達至另一邊之電源供給線,而能使此 等之電源供給線上之電壓安定化。 藉由將用以向形成有緩衝電路之基板領域内傳達第1 電源電位的偏壓電源線,經由低通濾波器加以耦合之方 式’可使此緩衝電路之基板領域之電位安定化,而能防止 因第1電源供給線之變動所生雜訊,經由此基板領域向其 他之内部電路傳達。 又’藉由將基板偏壓電壓經低通濾波器而施加於基板 領城’或藉由自與内部電路用不同之電路產生此一基板偏 屢電屢之方式,可防止因緩衝電路之電壓雜訊所致偏壓電 位之變動向其他之内部電路輪出。 (請先閲讀背面之注意事項再填寫本頁) h -裝_ 訂 線丨. ΓA7 B7 Printed by the Consumer Cooperatives of the Central Government Bureau of the Ministry of Economic Affairs. 5. Description of the Invention (14) The device is separately installed from the second loss increaser and is coupled to the fourth power supply line to withstand the second power supply potential. For example, the semiconductor device with the scope of patent application No. 7 is in the device with the scope of patent application No. 6. The buffer circuit is formed in the field of semiconductor substrates, and a bias power line is further provided. The bias power line is A total of two are coupled to the first loss reducer, and since then the i-th gainer has been subjected to the i-th electric green potential. For example, the semiconductor device in the 8th scope of the patent application is in the patent scope of Rushenshe, and the 5th device further includes: a capacitor, which is cut into the phase of the loss increaser of the first power supply line. Part i of the coupling and the node of the second part coupled to the internal circuit and the second supply line; and the bias source line, which is coupled to the semiconductor substrate field where the snubber circuit is formed, Between the two parts, the i-th power supply potential on the second part is transmitted to the semiconductor substrate field. For example, the semiconductor device for which the scope of the patent application is item 9 is in the device of any one of the scope of the scope of the application, such as the scope of the application, in the semiconductor substrate: field J-shaped = punch circuit; and more equipped: a wave deleter; and The bias power supply and the spring are provided separately from the third power supply line to connect the first! The power supply potential is transmitted to the semiconductor substrate field via the low-pass filter. The semiconductor device of the patent scope of item 10 is a low-pass device such as the device of the patent application No. 9, including a capacitor connected between the bias power source and the fourth power supply line of the spring. The semiconductor device of item 11 in the scope of the patent application is in the device of item 9 of Rushenshebei: Weiwei. The bias power line is a loss increaser that is commonly coupled to the third power line of the Haier. And the low-pass data packet = 17 (please read the precautions on the back before filling out this page). Installation-,? Τ line · ', 豕 Paper size is suitable for A4 size (21〇297mm) A7 ~ ----- ^ B7 V. Invention 15) ~ --- ~~ A capacitor connected between the bias power line and the second electrical pull, ^ ^ electric threat and supply line. For example, if the scope of the patent application is 12th, the museum + conductor device is attached to the device of the scope of the patent application, and the bias voltage &gt; 1 green system is electrically connected to the phase of the first power supply line. The connected filter; and the low-pass filter includes a capacitor lightly connected between the bias power line and the second electric green supply line. For example, the semiconductor device with the scope of patent application No. 13 is in the device with the scope of patent application No. 9 and is equipped with a destructor that is lightly connected to the third power supply line and the fourth power supply line. It is provided separately and accepts the bias power-increasing device of the second power supply potential; the low-pass wave filter &amp; includes a capacitor coupled between the bias power line and the bias power-increasing device. For example, the semiconductor device in the scope of patent application No. 14 is in the device in the scope of patent application No. U. The K2 is provided separately from the third power supply line and is electrically coupled to the third power supply line. For example, the semiconductor device with the scope of patent application No. 15 is in the device with the scope of patent application No. 13 and the bias power supply line is coupled to the respective power supply line and the second power supply line. The booster is separately provided and is used to receive the first power potential on the booster. Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs i. 丨, I--I ---- ί Pack --- ',,.' C Please read the notes on the back before filling out this page} The 16-semiconductor device belongs to the device of any one of items 1 to 6 of the patent application scope. The buffer circuit is formed in the field of semiconductor substrates, and the third power supply line is also lightly fitted here. . For example, the semiconductor device in the scope of patent application No. 17 is a device such as the device in any of the scope of patent applications No. 1 to 6, and there is a low-pass device provided in the third power supply line and the fourth power supply line. Wave device. This low-pass data sheet is compatible with the Chinese National Standard (CNS) A4 specification (2 10 × 297 mm) A7 B7 Printed by the Staff Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention (16) Contains: A first resistance element connected to the third power supply line; a capacitor coupled between the third power supply line and the * th power supply line; and a second resistance element interposed between the fourth power supply line. For example, the semiconductor device under the scope of patent application No. 18 is provided with: a buffer circuit 'formed in the semiconductor substrate collar, and the buffered signal is outputted after being fed; a low-pass filter; and a substrate bias generating mechanism for A bias voltage to be applied to the semiconductor substrate field is generated and applied to the semiconductor substrate field through the low-pass filter. For example, a semiconductor device with a scope of 19 in the patent application is a device with a scope of 18 in the patent application, and an internal circuit is formed in the second semiconductor substrate field separately from the semiconductor substrate field to process the feed. The 彳 & number feeds a signal indicating the result of the processing to the buffer circuit. The bias voltage from the substrate bias generating mechanism before being processed by the low-pass filter is applied to the second semiconductor substrate field. For example, the semiconductor device in the scope of patent application No. 20 is in the device in the scope of patent application No. 18, and further includes: an internal circuit formed in the second semiconductor substrate field separately from the semiconductor substrate field For processing a fed-in signal, feeding a signal representing the processing result to the buffer circuit; and a substrate bias generating mechanism, which are respectively 'set' with the substrate bias generating mechanism for generating the same voltage as the bias voltage A bias voltage of a voltage level is repeatedly applied to the second semiconductor substrate field. For example, a semiconductor device in the scope of patent application No. 21 is in the device in any of the scope of patent applications in Nos. 6 to 17, the buffer circuit is formed in the field of the semiconductor substrate, and丨 Power supply 19 The paper size is applicable to China National Standards (CNS) (21 () &gt; &lt; 297 male sauce (please read the precautions on the back before filling this page)-binding ^ &quot; .CI. .I -II— I— I n ^ i Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, A7 • 丨 丨 _ B * 7 Five, m ^ TTr &quot; --- In the field of the bias voltage of different bits. If applied The semiconductor device of the scope of the patent No. 22 is a device as in any of the scope of the patent application of the terms of 6 to 17, the buffer circuit is formed in the field of the semiconductor substrate 'and has a bias different from that of the i-th power source potential Piezoelectric potential is supplied to the field of semiconductor substrates. For example, a semiconductor device with a scope of 23 in the patent application is a device in any of the categories 1 to 20 of the patent application, and it also includes a majority arranged in a matrix. Storage unit; the internal circuit contains storage orders from the majority Wuzhong selects a storage unit and reads out the memory data of the selected storage unit; the buffer circuit includes a wheel-out circuit that outputs the data read by the internal circuit to a wheel-out circuit outside the device. By eliminating the effective capacitive coupling (AC-type coupling) between the power supply lines provided in the buffer circuit, it is possible to prevent voltage noise on one power supply line from being transmitted to the other power supply line, thereby enabling The voltage on these power supply lines is stabilized. This buffer can be made by coupling a bias power line for transmitting the first power potential to the area of the substrate on which the buffer circuit is formed via a low-pass filter. The potential of the substrate area of the circuit is stabilized, so that noise generated by changes in the first power supply line can be prevented from being transmitted to other internal circuits through this substrate area. Also, 'the substrate bias voltage is passed through a low-pass filter. And applied to the substrate collar city 'or by using a different circuit from the internal circuit to generate such a substrate bias and electricity, which can prevent the buffer circuit. Noise-induced bias voltage piezoelectric bit of a change to other internal circuitry of the wheel (Please read the notes on the back of this page and then fill in) h -. _ Set loaded line Shu Γ.

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本紙張从適财關 A7 B7 經濟部中央標準局員 工消費合作社印製 五、發明説明(18) - [發明之實施之形態] (整體之構成) 圖1爲概略顧示依本發明之半導體裝置之整體構成之 圖式。在圖Η,半導體裝置100包含:内部電^脱, 依馈入之信號IN而施行既定之處理;及輸出電路ι〇4,將 由㈣電路1〇2饋入之信號施以緩衝處理,而將輪出信號 (謂出資料信號)D予以輪出。内部電路搬包含:儀存單 儿行列102a,具有配置成行列狀之多數儲存單元.及行列 周邊電路職,依自外部饋入之信號IN而選擇之儲 存單凡,將該被選擇之儲存單元之資料讀出,而向輪出電 =HM饋送,此’此-行列周邊電路嶋包含位址解碼 電路、資料入電路、儲存單元行列1〇2a用之預充電/均衡 電路、及内部讀出電路(前置放大器)等。 故輸出電路U) 4構成用以將内部讀出資料信號予以放 大並向外部輸出之輸出緩衝電路,更佳爲構成輸出緩衝電 路之最終段。 圖2爲概略類示依本發明之半導體裳置之變更例之整 體構成的圖式。在圖2中,半導體裝置U0包含 衝電路_ ’用以對於自外部饋入之輸入信號IN施以緩 衝處理’而產生内部信號;内部電路⑽,對此輸入缓衝 電路n〇a K緩衝電路施以既定之處理·緩衝電路 〗]Oc將内部電路u〇b之輸出信號施以鐘衝處理,内部 電路nod ’對此缓衝電路11〇c之輪出信號進一步施以既 定《處理’·及輸出緩衝電路li〇e,將自内部電路n〇d饋 21This paper is printed from Shicaiguan A7 B7 Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the Invention (18)-[Implementation Mode of the Invention] (Overall Structure) Figure 1 is a schematic view showing a semiconductor device according to the present invention. The overall composition of the scheme. In the figure, the semiconductor device 100 includes: internal power supply, which performs a predetermined process in accordance with the input signal IN; and an output circuit ι04, which buffers the signal fed by the circuit 102, and The rotation signal (the data signal) D is rotated. The internal circuit includes: the instrument storage list 102a, which has most of the storage units arranged in rows and columns, and the peripheral circuits. The storage unit, which is selected based on the signal IN input from the outside, stores the selected storage unit. The data is read out, and the power is fed to the wheel = HM feed. This 'this-rank peripheral circuit' includes address decoding circuit, data input circuit, precharge / equalization circuit for storage unit rank 102a, and internal readout circuit. (Preamp) and so on. Therefore, the output circuit U) 4 constitutes an output buffer circuit for amplifying the internal read data signal and outputting it to the outside, and more preferably constitutes the final stage of the output buffer circuit. Fig. 2 is a diagram schematically showing the overall configuration of a modified example of a semiconductor device according to the present invention. In FIG. 2, the semiconductor device U0 includes a punch circuit _ 'used to buffer the input signal IN fed from the outside' to generate an internal signal; the internal circuit ⑽, the input buffer circuit n0a K buffer circuit Apply the predetermined processing and buffer circuit]] Oc applies the clock signal to the output signal of the internal circuit uOb, and the internal circuit nod 'applies the predetermined "processing" to the output signal of the buffer circuit 11oc. And the output buffer circuit li〇e, which will feed 21 from the internal circuit no.

---;--:----^ —— (請先閱讀背面之注意事項再填寫本頁) 、?τ • -- n t —I. 線! 經濟部中央標準局員工消費合作社印製 五、發明説明(19 ) 入之信號予以緩衝處理,而產生輪 裝置外部。此半導體裝置11()爲·二==輪出至 110b及ii〇d分別執行既定之邏辑處理。緩衝部電路 設置目的’係爲求在半導體裝鼠i 大電容之内部信號線。 1 巧速驅動較 本發明亦可應用於此一圖!所示 2所示之緩衝電路U〇c以及輸出緩衝電路U心::: 者發但是,在以下之説明中,爲便於說明,係就向裝置外 部輸出信號之輪出電路加以説明。 圖3爲顯示輪出,電路之構成之—例之圖式。在圖 =電路1〇4包含:n通道刪電晶體113,被連接在電 源節點Ula與輸出節點112之間,其間極接受内部驅動信 號Φ〇 ;及η通道MOS電晶體114,連接在輸出節點μ 與,地節點⑽之間,於其間極接受驅動信號〇。在刪 電晶體113及114之基板領域,施加有負之偏壓電壓刪。 此一輸出電路1〇4之構成,實質上與圖“所示輪出信號之 最終段之構成相同。在輪出緩衝電路中,僅於最終段設置 具有巨大之電流驅動力的M〇s電晶體。因此,可防止在此 最終段之MOS電晶體110及114之動作時的電源雜訊之影 響。圖4A〜C爲顯示圖3所示輸出電路之平面佈置及剖面 構造之一例之圖式。 在圖4A中’形成有施加負之基板偏壓電壓vBB的雜 質領域117,包圍於MOS電晶體113之活性領域(p^ii3a 及MOS電晶體114之活性領域。在雜質領域n7 22 本紙張尺度標準(CNS)機格(---;-: ---- ^ —— (Please read the notes on the back before filling this page),? Τ •-n t —I. Line! Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. 5. The description of the invention (19) The signal input is buffered and generated outside the wheel device. This semiconductor device 11 () performs two logical steps: == turns out to 110b and ii〇d, respectively. The purpose of the buffer circuit is to find the internal signal line of a large capacitor in the semiconductor. 1 Smart Drive Compared with the present invention, this picture can also be applied to this picture! The buffer circuit Uoc and the output buffer circuit U2 shown in Figure 2 are as follows: However, in the following description, for convenience of explanation, the output circuit for outputting signals to the outside of the device will be described. FIG. 3 is a diagram showing an example of the configuration of the circuit in the turn-out. In the figure = circuit 104, n-channel transistor 113 is connected between the power node Ula and output node 112, and the internal driving signal Φ〇 is received; and n-channel MOS transistor 114 is connected to the output node. μ and, between the ground node ⑽, receive the driving signal 〇 between them. In the substrate area of the transistors 113 and 114, a negative bias voltage is applied. The structure of this output circuit 104 is substantially the same as the structure of the final stage of the round-out signal shown in the figure. In the round-out buffer circuit, only the final stage of the MOS circuit with a large current driving force is provided. Crystal. Therefore, the influence of power noise during the operation of the MOS transistors 110 and 114 in this final stage can be prevented. Figures 4A to C are diagrams showing an example of the planar layout and cross-sectional structure of the output circuit shown in Figure In FIG. 4A, an impurity region 117 where a negative substrate bias voltage vBB is applied is formed and surrounds an active region of the MOS transistor 113 (p ^ ii3a and an active region of the MOS transistor 114. In the impurity region n7 22 paper Standard Standard (CNS) Frame (

A7 A7 經苯部中央襟準局員工消費合作社印製 五、發明説明(20 ) 外周’形成施加有的吸收雜訊用 118,而包圍於此雜質領域117 电壓施加領城 对於]VtOS電晶雜!,。、 電源電壓VCC1係介由低電阻 叫體113&lt; . 配線(和節點以相同符ft 表$)llla破饋入。此一電源線 目^仃號 ! 1 2 , ^ 1 &amp;具有杈切於活性領域 113a上而形成&lt;齒狀部分。傳 負域 真Dm 運㉟動㈣的用之信號線 113b具有與#電/原線1Ua之齒狀部 領城113a上之齒狀部分。此俨 、伸於活性 ,a 。號、、泉1131:)之齒狀部分成扈 M〇日體113_間極。形成具有鄰接於此-閘極電極 層而延伸之齒狀部分的輸出信於 ⑴士目心》、a 號線115。此一輪出信號線 ⑴亦具有k切過M〇S電晶體114之活 伸之齒狀部分。 a上而延 接地曰線(和接地節點以相同符號表示)mb具有横切過 MOS電日日體114 &lt;活性領域⑽上面延伸之齒狀部分。 形成具有與接地線此1Ilb之齒狀部分相鄰接而 狀部分的信號線114b。驅動信號^被傳達至此 : 114b。 现、、果 \'此配置中,係依次配置用以傳達驅動信號㈣ 齒狀部分、用以傳達電源電壓VCC1(接地電IGND)之嵩 狀邓分、及用以傳達輪出信號⑽ρ或d_或内部輸出 信號)之齒狀部分。 藉由交互地配置此齒狀部分之方式,可使活性領域 113a及114a &lt;垂直於圖面方向 &lt;長度縯短,而形成閑極 寬度較大之MOS電晶體。亦即,形成魏(間極寬度/間極 長度)較大,且電流驅動力較大之M〇s電晶體。 23 本纸張尺度適^A7 A7 Printed by the Consumers 'Cooperative of the Central Bureau of Benzene Department V. Invention Description (20) The outer periphery' forms the applied absorption noise 118, and surrounds this impurity area 117. The voltage application leads to the]] miscellaneous! . The power supply voltage VCC1 is fed through the low-resistance body 113 &lt; wiring (the same symbol as the node ft table $). This power cord No. ^ 仃! 1 2, ^ 1 & has a branch cut on the active area 113a to form a &lt; dentate portion. The signal line 113b used in the negative field of true Dm operation is provided with a toothed portion on the # 113 / ring line 113U. This 俨, extends to activity, a. No., Izumi 1131 :) The tooth-shaped part becomes 扈 M〇 日 体 113_ 间 极. The output of forming a toothed portion having an extension adjacent to the gate electrode layer is believed to be in the eyes of a woman, line a 115. This round of output signal line ⑴ also has a tooth-shaped portion cut through the extension of the MOS transistor 114 by k. The ground line (a and the ground node are represented by the same symbol) a has a toothed portion extending across the MOS electric solar body 114 &lt; active field 活性. A signal line 114b is formed to have a toothed portion adjacent to the toothed portion of the ground line 11b. The driving signal ^ is transmitted here: 114b. Now, in this configuration, the configuration is configured in order to convey the driving signal ㈣ toothed part, the song-shaped Deng points used to communicate the power voltage VCC1 (ground power IGND), and to convey the wheel-out signal ⑽ρ or d _ Or internal output signal). By alternately arranging this tooth-shaped portion, the active areas 113a and 114a &lt; the direction perpendicular to the drawing &lt; length can be shortened to form a MOS transistor with a larger idler width. That is, a Mos transistor with a large Wei (inter electrode width / inter electrode length) and a large current driving force is formed. 23 This paper is sized ^

f%先閲讀背面之注意事項#填¾本FC .裂------訂 I — β/ .11» —1— « I in A7 B7 經濟部中央樣準局員工消費合作社印製 .......... ....... ..........n.i 五、發明説明(21 ) 圖4B係顯示沿著圖4A之A-A線之剖面構造的圖式。 在圖4B中’ MOS電晶體113及114係形成於在P型半導 體基板120表面所形成之n型#52118内。被施加在此一 N 型#領域118内。於此n型#118内形成有P型#113d表面形 成有N型雜質領域119。在雜質領域119間之P#113a上形 成有閘電極層113b。雜質領域119交互地連接於電極層 111a及用以輸入驅動信號之信號線115。基板偏壓電壓 VBB經由P型雜質領域117被施加於此p#113d。 其他之内部電路係形成於和此n#118分離形成之 P#130内。基板偏壓電壓VBB經P+雜質領域132而被施加 於此 P#130 藉由先設置N#118之方式,可吸收在P#ll3d内產生 之雜訊,防止雜訊傳達至形成於其他内部電路之p#13〇。 圖4C爲顯示沿圖4A之A-A線的剖面構造之另一構 成。於圖4C中,MOS電晶體113d及114係形成於在p型 半導體基板120表面所形成之p# n3a内。於此p#n3d表 面,彼此隔開形成有N型雜質領域119,此等雜質領域119 分別交互地連接信號線lUa及輸出信號線115。又,在雜 質領域119間之P#113表面上,形成有閘電極層。基 板偏壓電壓VBB經由P+雜質領域117施於此P#113a表 面。沿此雜質領域117外周部,在P#113d内形成有承受的 N型雜質領域118。爲正値之電壓,負之基板偏壓電壓vbb 介由雜質領域117被偏壓於P#113。在P#113d中發生雜訊 之場合,係介由形成於此p#113d與雜質領域Π8間之接合 24 丨氏張中^~國家標準(士】M規格(210&gt;&lt;297公釐) —-— --- (請先閱讀背面之注意事項再填寫本頁) -裝. 、vs β 經濟部中央標準局員工消費合作社印製 A7 -------_一 . 五、發明説5 (22 ) 一&quot;^ 〜~ ~ 電容而内部電路在此P#所產生之雜訊。 在形成有MOS電晶體113及114之P#U3d,藉由.产 其外周部施加吸收雜訊用之偏壓電壓VCC2之方式,可内 部電路在其他内部電路所形成之P#所產生之雜訊(藉由電 容執合,自雜質領域119朝P#li3d餚送之雜訊)。 又,MOS電晶體114係夾隔著未圖示之場絕緣膜與圖 4B及c所示之MOS電晶體113分離而形成於同一 p#U3af% first read the notes on the back #Fill this FC .------ Order I — β / .11 »—1—« I in A7 B7 Printed by the Consumer Cooperatives of the Central Procurement Bureau of the Ministry of Economic Affairs .. ......................... ni V. INTRODUCTION TO THE INVENTION (21) Fig. 4B is a diagram showing a cross-sectional structure taken along line AA in Fig. 4A . In FIG. 4B, the 'MOS transistors 113 and 114 are formed in an n-type # 52118 formed on the surface of the P-type semiconductor substrate 120. Is applied within this N-type #field 118. An N-type impurity region 119 is formed on the surface of the P-type # 113d in the n-type # 118. A gate electrode layer 113b is formed on P # 113a between the impurity regions 119. The impurity region 119 is alternately connected to the electrode layer 111a and a signal line 115 for inputting a driving signal. The substrate bias voltage VBB is applied to this p # 113d via the P-type impurity region 117. The other internal circuits are formed in P # 130 which is formed separately from this n # 118. The substrate bias voltage VBB is applied to this P # 130 via the P + impurity field 132. By setting N # 118 first, the noise generated in P # ll3d can be absorbed, preventing the noise from being transmitted to other internal circuits. Of p # 13〇. Fig. 4C shows another configuration of the cross-sectional structure taken along the line A-A of Fig. 4A. In FIG. 4C, the MOS transistors 113d and 114 are formed in p # n3a formed on the surface of the p-type semiconductor substrate 120. On this p # n3d surface, N-type impurity regions 119 are formed spaced apart from each other. These impurity regions 119 are connected to the signal line 1Ua and the output signal line 115 alternately, respectively. A gate electrode layer is formed on the surface of P # 113 in the heterogeneous region 119. The substrate bias voltage VBB is applied to the surface of this P # 113a via the P + impurity region 117. Along the periphery of this impurity region 117, an N-type impurity region 118 is formed in P # 113d. It is a positive voltage, and a negative substrate bias voltage vbb is biased to P # 113 through the impurity region 117. When noise occurs in P # 113d, it is caused by the junction formed between p # 113d and the impurity field Π8 24 丨 Zhangzhong ^ ~ National Standard (J) M Specification (210 &gt; &lt; 297 mm) —-— --- (Please read the precautions on the back before filling out this page) -Installed. Vs. β Printed by the Consumers Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs A7 -------_ I. V. Invention 5 (22) ^ ~~~ Capacitive noise generated by the internal circuit in this P #. In the P # U3d where MOS transistors 113 and 114 are formed, absorption noise is applied to the outer periphery of the P # U3d. The method of bias voltage VCC2 can be used to generate noise generated by the internal circuit in P # formed by other internal circuits (by the capacitor, the noise transmitted from the impurity field 119 toward P # li3d). The MOS transistor 114 is separated from the MOS transistor 113 shown in FIGS. 4B and c through a field insulating film (not shown) and is formed in the same p # U3a.

内。又,圖4A所示之活性領域113a係表示形成有圖4B 或圖4C所示之雜質領域119的領域。 特別是,在圖4C之構成之場合,於輸出電路附近設 有增損器之場合,可經由此雜質領域118,利用增損器確 實地内部電路電源雜訊,而能防止電源雜訊之影響傳達至 形成於P#130之其他内部電路。 . 在以下之説明中’輸出電路亦可具有圖4B及4c之任 一之剖面構造。 [實施形態丨] 圖5爲顯示依本發明之升高之半導體裝置之要部之構 成之圖式。在圖5中,内部電路1〇2自搞合於承受電源電 壓Vcc之增損器14〇a的電源線M2a,承受一邊之動作電 源電壓;且自耦合於承受接地電壓GND之增損器144a的 接地線146a,承受另一邊之動作電源電壓。在電源線142a 與接地線146a之間,連接著具有有效電容値(數百pF左右) 的電容器C1。 輸出電路104係自與增損器14〇a分開設置而承受電源 25 本紙張尺度適财} —--- (請先閲讀背面之注意事項再填寫本頁) 裝_ 訂 經濟部中央操準局員工消費合作社印製 A7 ----------B7 五、發明説明(23) ~~~~ ~ --— 電壓Vcc之增損器屬,經電源線㈣承受一邊之動作 電源電壓;且自與增損器他分開設置而承受接地電壓 GND之q損器144b,經接地·線而承受另一邊之動作 電源電屢。承文此輸出電路1〇4之输出節點充放電用之動 作電源電壓的節點VCC1(以相同符號表示節點及對其饋入 之電壓)係與承文吸收雜訊用之偏壓電壓之節點 VCC2共通地連接於電源線14孔。 在電源,、泉142b與接地線146b之間,並未設置具有有 效電容値的電容器,僅存在有以虛線表示之漂移電容&amp;。 此漂移電容具«PF左右之電容値,電源線難與接地 «表146b係义流方式被分離。由於因電容耦合所生之電位變 =量係與其電容器之電容値成比例,故在漂移電容Cs之電 表L十刀』之知合,即使在電源線142b與接地線146b中 之一者產生雜訊,向另一者傳達之雜訊之大小亦十分小。 將僅由此-漂移電容所爲電容輕合之狀態稱爲「交流方式 被分離」。 在圖5所示構成中,輸出電路1〇4產生動作,使用電 源線142b上之電流,即使電源線142b之電源電屢^(包 括電壓VCC1及VCC2兩者)降低,此一電位降低亦不會傳 達至接地線146b,接地線146b乃安定地保持—定之電壓 位準之接地電壓GND。因此,將輸出電路1〇4之輸出節點 放電至接地電壓位準之M0S電晶體之源極電壓不生變 化’其閘極電壓與顯示電壓爲相同値,可防止輪出節點放 電用之MOS電晶體114成爲ON狀態。 26 本紙張尺度適用中國國家標準(CNS τΐϋ;格(训㈣7公餐了 (請先閲讀背面之注意事項再填寫本頁) .裝-Inside. The active region 113a shown in FIG. 4A is a region in which the impurity region 119 shown in FIG. 4B or 4C is formed. In particular, in the case of the structure shown in FIG. 4C, when a loss-increasing device is provided near the output circuit, the power field noise of the internal circuit can be reliably used by the loss-increasing device 118 through the impurity field 118, thereby preventing the influence of the power-supply noise. It is transmitted to other internal circuits formed in P # 130. In the following description, the 'output circuit may have a cross-sectional structure of any of Figs. 4B and 4c. [Embodiment 丨] Fig. 5 is a diagram showing the structure of a main part of a semiconductor device raised according to the present invention. In FIG. 5, the internal circuit 102 is self-coupled to the power line M2a of the loss increaser 14a that receives the power supply voltage Vcc, and bears one side operation power voltage; and is self-coupled to the loss increaser 144a that receives the ground voltage GND. The ground wire 146a bears the operating power voltage on the other side. A capacitor C1 having an effective capacitance 値 (about several hundreds pF) is connected between the power supply line 142a and the ground line 146a. The output circuit 104 is installed separately from the loss increaser 14〇a and can withstand the power supply 25. This paper is suitable for paper size} ----- (Please read the precautions on the back before filling this page) Printed by employee consumer cooperatives A7 ---------- B7 V. Description of the invention (23) ~~~~ ~ ----- The loss increaser of voltage Vcc belongs to the action power voltage on one side through the power cord ㈣ And the q-losser 144b, which is provided separately from the loss increaser, and which bears the ground voltage GND, bears the action power of the other side via the ground wire. The node VCC1 of the operating power supply voltage for charging and discharging the output node of the output circuit 104 of Chengwen (the node is represented by the same symbol and the voltage fed to it) is the node VCC2 of the bias voltage used by Chengwen to absorb noise. Commonly connected to 14 holes of the power cord. Between the power source, the spring 142b and the ground line 146b, no capacitor having an effective capacitance 値 is provided, and only a drift capacitance &amp; This drift capacitor has a capacitance of about PF, and the power line is difficult to be grounded. Table 146b is separated by the sense current method. Since the potential change due to capacitive coupling is proportional to the capacitance of the capacitor, it is known in the meter of the drift capacitor Cs that even the one of the power supply line 142b and the ground line 146b is miscellaneous. The amount of noise transmitted to another is also very small. The state in which the capacitance is only light-weighted by this -drift capacitor is called "the AC method is separated". In the configuration shown in FIG. 5, the output circuit 104 operates and uses the current on the power supply line 142b. Even if the power supply of the power supply line 142b is repeatedly reduced (including both the voltages VCC1 and VCC2), this potential reduction does not Will be transmitted to the ground line 146b, the ground line 146b is a ground voltage GND which is stably maintained at a fixed voltage level. Therefore, the source voltage of the M0S transistor that discharges the output node of the output circuit 104 to the ground voltage level will not change. Its gate voltage is the same as the display voltage. The crystal 114 is turned on. 26 This paper size applies the Chinese national standard (CNS τΐϋ; grid (training for 7 meals (please read the precautions on the back before filling out this page). Packing-

'II 線 經濟部中央標準局員工消費合作社印製'II line Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs

J説明(24 ㈣…CM0S電晶體構成輪㈣路之場合,即使接 ΙΓ電 =接地電壓因輪出節點放電時之放電電流Ϊ 此升,電源、、泉142b上之電壓亦可保持—定電壓位準。因 ’可:止此—驅動信號充電用之p通道 =流供給至應被放電之輸㈣點之情形,而可以: 二='點驅動至低位準。又,於其時,可抑制由節點 W 3 點1113)流向接地節點GND(圖3之節點 Ulb)的貫通電流,可降低消耗電流。 ' 在㈣電路1()2&lt;動作時,錄出電路⑽相較,由 ;部電路102之待驅動之内部節點之負载小甚多,故電 源線142a與接地線1463上之雜訊之大小十分小,且變化 平緩,其電源雜訊可由電容器、⑴雀實予以吸收。 '圖6爲顯示增損器與插頭端子(引線框)之速接形態的 圖式。在圖6A中,内部電路1〇2之電源供給增損器15〇1, 係介由接合線151a而電性連接於插頭端子152。又,輸出 電路104用之電源供給增損器]係介由接合線⑸匕而 電性連接於同一插頭端子152。於此,電源供给增損器15〇a 及150b係表示電源電壓Vcc或接地電愿中之一者。 在以下之説明中,於統稱地表示電源電壓Vcc及接地電壓 GND之場合,係採用「電源供給」之用語。在此圖所 構成中,係由共通之插頭端子,將電源供給電壓饋入 至内部電路102及輸出電路1〇4。在輸出電路1〇4之動作 時,即使產生電源雜訊,且該電源雜訊經由接合線15巧、 插頭端子152、及接合線151a被傳達至電羱供給增 27 CNS )A^ ( 210X297^ )J description (24) ... When the CM0S transistor constitutes the wheel circuit, even if I1 = the grounding voltage is the discharge current when the wheel is discharged at the node, the voltage on the power source and the spring 142b can be maintained-constant voltage Level. Because 'may: stop here—p channel for charging the drive signal = the situation where the current is supplied to the input point that should be discharged, and can be: two =' point is driven to a low level. Also, at that time, you can By suppressing the through current flowing from the node W 3 point 1113) to the ground node GND (the node Ulb in FIG. 3), the current consumption can be reduced. 'When the circuit 1 () 2 &lt; operates, the recording circuit ⑽ is compared, the load of the internal node to be driven by the internal circuit 102 is much smaller, so the amount of noise on the power line 142a and the ground line 1463 It is very small and the change is gentle. Its power noise can be absorbed by capacitors and finches. 'FIG. 6 is a diagram showing a quick connection form of a loss increaser and a plug terminal (lead frame). In FIG. 6A, the power supply loss increaser 1501 of the internal circuit 102 is electrically connected to the plug terminal 152 via the bonding wire 151a. In addition, a power supply for the output circuit 104 is provided to the attenuator] and is electrically connected to the same plug terminal 152 via a bonding wire. Here, the power supply loss increasers 15a and 150b indicate one of the power supply voltage Vcc or the ground voltage. In the following description, when the power supply voltage Vcc and the ground voltage GND are collectively indicated, the term "power supply" is used. In the structure shown in this figure, a common plug terminal is used to feed the power supply voltage to the internal circuit 102 and the output circuit 104. During the operation of the output circuit 104, even if a power noise is generated, and the power noise is transmitted to the power supply via the bonding wire 152, the plug terminal 152, and the bonding wire 151a, the power supply is increased by 27 CNS. )

B7 ----- 五、發明説明(25 可藉由對於增損器及 C1,内部電路此一電源雜命石 又·谷為 作產生不良_ 對㈣祕102之動 和其電源雜二=線電阻及配線之漂移電容,可緩 電路電源、^劇變化’而_實利用電容器内部 之變:㈣係1 π電源供給增損器與插頭端子之連接形態 =1圖式。在圖6”,電綠供給增損器㈣及· α子^泉15U及151b而連接於各自分別設置之插頭 ^ 152b °於咸-連接形態,對輸出電路104的 ^錄線與對内部電路1(^電源供給線,係確實地被 刀離’在輪出電路1G4之動作時,可確實防止所產生之電 源雜訊傳it讀於内部電路⑽㈣源供給線。 圖7A及B,係顯示半導體裝置中之增損器之配置的 圖,、在圖7A中,沿著半導體晶片160之裝置本體形成部 162外周,配置有增損器⑽。在圖从中,雖僅顯示沿著 圖面〈垂直万向配置之半導體晶# 16〇之增損器PD,但 增損器PD亦可全部配置於此—第i電源電位心外周。 增損器PD中之適當之增損器可被利用作爲電源供給增損 器。 、 在圖7B中,於半導體晶片160之沿水平方向的中央部 配置有增損器PD,在增損||PD之列子之兩側配置半導體 裝置有本體形成領域162a及162b。藉由將增損器pD配置 在半導體晶片160之中央部的方式’可使增損器占有面積 比圖7A所示之增損器配置更降低(增損器僅排列成一 28 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) —.1』--II n ί I— - I . (請先閲讀背面之注意事項再填寫本頁)B7 ----- V. Description of the invention (25 For the loss increaser and C1, the internal circuit of this power source is a miscellaneous stone, and the operation of the valley is not good. _ The movement of the 102 and its miscellaneous power = The line resistance and the drift capacitance of the wiring can slow down the circuit power supply and the dramatic changes. However, the internal change of the capacitor is used: the connection form of the 1 π power supply loss increaser and the plug terminal = 1. Figure 6 " The electric green supply loss increaser 增 and ㈣ α ^ spring 15U and 151b are connected to the respective plugs ^ 152b ° in the salt-connected form, the ^ recording line for the output circuit 104 and the internal circuit 1 (^ power supply) The supply line is reliably cut off. When the circuit 1G4 operates, the generated power noise can be prevented from being read on the internal circuit and the source supply line. Figures 7A and B show the The layout of the attenuator is shown in FIG. 7A along the outer periphery of the device main body forming portion 162 of the semiconductor wafer 160. The attenuator ⑽ is arranged along the periphery of the device. The loss increaser PD of the semiconductor crystal # 16〇, but the loss increaser PD can also be configured all This—the i-th power source potential outer periphery. Appropriate loss increasers in the loss increaser PD can be used as power supply loss increasers. In FIG. 7B, an increase is arranged at the central portion of the semiconductor wafer 160 in the horizontal direction. Loss device PD, semiconductor devices are arranged on both sides of the loss || PD column, and there are main body forming areas 162a and 162b. By placing the loss increaser pD in the central portion of the semiconductor wafer 160, the loss increaser can be occupied The area is more reduced than that shown in Figure 7A. (The loss increasers are arranged in a 28-sheet format, which is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) —.1 ”-II n ί I—- I. (Please read the notes on the back before filling this page)

-II 經 濟 部 中 央 標 準 為 員 工 消 f 合 作 社 印 製 -------¾---- A7 五、 經濟部中央標準局員工消費合作社印製 B7 發明説明(26 ) 歹!) ’並可使晶片160之面積減小。在圖7B所示之增損|§ 配置中,増損器PD中之適當之增損器亦被利用作爲電躁 供給增損器。通常,在輸出電路附近,配置著輸出電路用 電源供给增損器;對於内部電路,則自另一防止將電源供 給電壓施加於内部電路用電源供給增損器。 於以下之説明中,增損器之配置及增損器與插頭端子 之連接,可採用此圖6A及B和圖7A及B及任一組合。 圖8爲顯示電容器C1之具體構成之一例的圖式。在圖 8A中,電容sci係由具連接有於電源線抖以之閘極、速 接於接地線146a之源極及汲極的MOS(絕緣閘極型電場效 果)電晶體所構成。藉由以M0S電晶體構成電容器C1之方 式’可實現低占有面積且具有大電容値的電容器。 圖8B係顯示圖8A所示MOS電晶體之平面佈置的圖 式。而圖8C爲概略顯示圖8B所示之B-B線的剖面構造之 圖式。在圖8B中,電源線142a與接地線146a係彼此平行 配置。此等電源供給線142a及146b係由例如第2層铭配 線層所構成。在電源線142a之下部形成有MOS電容器之 閘電極層170a。此閛電極層170a係經由接觸孔172a而連 接於由第一層鋁配線層所構成之中間層ma。此一中間層 171a則介由接觸孔173a而連接於電源線142a。在閘電極 層170a外周部之高濃度雜質領域(源極與汲極)係介由接觸 孔174a而速接著第1層鋁配線層n5a。此一配線層n5a 延伸至接地線146a下部,介由接觸孔i76a而連接於接地 線146a。藉由形成MOS電晶體使其自平面圖觀之與電源 29 良紙張尺度適用中國國家標準(CNS ) A4規格(210X29*7公釐) 經濟部中央標率局員工消費合作社印製 A7 B7五、發明説明(27) 線142a疊合之方式,可減小用以形成電容器之面積。 圖8C中,MOS電容器包含形成於半導體基板領域(半 導體基板或#領域)177a之表面的高濃度N型雜質領域178a 及178b,和隔著閘極絕緣膜(未圖示)形成於此等雜質領域 178a及178b間之基板領域177a上的閘電極層170a。閘電 極層170a介由形成於接觸孔172a之接觸材而連接於中間 層171a,中間層171a則介由形成於接觸孔173a的接觸材 而連接於電源線142a。雜質領域178a及178b介由形成於 接觸孔174之接觸材而連接配線層175a。 又,在圖8B所示之佈置中,形成有包圍於閘電極層 ' 170a之接觸孔174a,故雜質領城178a及178b係被顯示成 連接於該閘電極層周圍而形成。此雜質領域178a及178b 亦可彼此分離。 圖9係顯示對於輸出電路用之電源線142b及接地線 146b及接地線146b形成之構成的圖式.。如此圖9A所示, 對於輸出電路用之電源線142b及接地線146b亦形成MOS 電容器。此MOS電容器之源極與汲極領域(亦可爲在閘電 極層周邊所形成之雜質領域)係連接於接地線146b。但是, 此一 MOS電容器之閘電極層與電源線142b係不相連接, 閘電極層係成電性漂移狀態。藉此,而不會形成電源線142b 與接地線146b之電容耦合。 圖9B係顯示此圖9A所示之MOS電容器之平面佈置。 圖9C則概略顯示沿圖9B之C-C線之剖面構造。此圖9B 所示之佈置,除了附於末尾之參考符號以b代替a及在中 30 本纸張尺度適用中國國家橾準(CNS ) A4規格(210X297公釐) (請先聞讀背面之注意事項再填寫本頁) 裝-II The central standard of the Ministry of Economic Affairs is printed for employees 'cooperatives ----------------- A7 V. The central consumerism cooperative of the Central Standards Bureau of the Ministry of Economic Affairs prints B7 Invention Description (26) 歹!)' And The area of the wafer 160 is reduced. In the gain | loss configuration shown in FIG. 7B, a suitable gain increaser in the reducer PD is also utilized as an electric noise supply gain increaser. Usually, a power supply booster for the output circuit is arranged near the output circuit, and for the internal circuit, the power supply booster for the internal circuit is prevented from applying a power supply voltage to the internal circuit. In the following description, the configuration of the loss increaser and the connection of the loss increaser and the plug terminal can use these Figures 6A and B and Figures 7A and B and any combination thereof. FIG. 8 is a diagram showing an example of a specific configuration of the capacitor C1. In FIG. 8A, the capacitor sci is composed of a MOS (Insulated Gate-type Electric Field Effect) transistor having a gate connected to the power line, a source connected to the ground line 146a, and a drain. By forming the capacitor C1 with an M0S transistor, a capacitor having a low occupation area and a large capacitance can be realized. Fig. 8B is a view showing a planar layout of the MOS transistor shown in Fig. 8A. 8C is a diagram schematically showing a cross-sectional structure taken along the line B-B shown in FIG. 8B. In Fig. 8B, the power supply line 142a and the ground line 146a are arranged parallel to each other. These power supply lines 142a and 146b are formed of, for example, a second-layer wiring layer. A gate electrode layer 170a of a MOS capacitor is formed below the power supply line 142a. The hafnium electrode layer 170a is connected to an intermediate layer ma made of a first aluminum wiring layer through a contact hole 172a. This intermediate layer 171a is connected to the power line 142a through the contact hole 173a. The high-concentration impurity region (source and drain) in the outer periphery of the gate electrode layer 170a is immediately after the first aluminum wiring layer n5a through the contact hole 174a. This wiring layer n5a extends to the lower portion of the ground line 146a, and is connected to the ground line 146a through a contact hole i76a. By forming a MOS transistor, it can be viewed from the plan view with a power source. 29 Good paper size is applicable to Chinese National Standard (CNS) A4 specification (210X29 * 7 mm). Printed by the Consumer Standards Cooperative of the Central Standards Bureau of the Ministry of Economy. Note (27) The method of overlapping the lines 142a can reduce the area used to form the capacitor. In FIG. 8C, the MOS capacitor includes high-concentration N-type impurity regions 178a and 178b formed on the surface of the semiconductor substrate field (semiconductor substrate or #field) 177a, and these impurities are formed through a gate insulating film (not shown) The gate electrode layer 170a on the substrate region 177a between the regions 178a and 178b. The gate electrode layer 170a is connected to the intermediate layer 171a through a contact material formed in the contact hole 172a, and the intermediate layer 171a is connected to the power line 142a through a contact material formed in the contact hole 173a. The impurity regions 178a and 178b are connected to the wiring layer 175a via a contact material formed in the contact hole 174. In the arrangement shown in FIG. 8B, a contact hole 174a is formed to surround the gate electrode layer 170a. Therefore, the impurity collars 178a and 178b are shown connected to the periphery of the gate electrode layer and formed. These impurity regions 178a and 178b can also be separated from each other. FIG. 9 is a diagram showing the structure of a power line 142b, a ground line 146b, and a ground line 146b for an output circuit. As shown in FIG. 9A, the MOS capacitor is also formed for the power supply line 142b and the ground line 146b for the output circuit. The source and drain regions of the MOS capacitor (also the impurity regions formed around the gate electrode layer) are connected to the ground line 146b. However, the gate electrode layer of this MOS capacitor is not connected to the power line 142b, and the gate electrode layer is in an electrical drift state. Thereby, no capacitive coupling between the power line 142b and the ground line 146b is formed. FIG. 9B shows the planar layout of the MOS capacitor shown in FIG. 9A. Fig. 9C schematically shows a cross-sectional structure taken along a line C-C in Fig. 9B. This arrangement shown in Figure 9B, except for the reference symbol attached at the end with b instead of a and 30 medium paper sizes applicable to China National Standards (CNS) A4 specifications (210X297 mm) (Please read the note on the back first (Fill in this page again)

-IT Α7 Β7 經濟部中央.標準局員工消費合作社印製 五、發明説明(28 ) 間層171b與電源線142b之間未設有接觸部外,均與圖8B 所示之MOS電容器之平面佈置相同。 圖9C所示之剖面構造亦與圖8C所示之剖面構造,除 了附於末尾之參考符號以b代替a及在中間層Π lb與電源 線142b之間未存在有由接觸孔形成之導電材料外,其他均 相同。藉由對於輸出電路用電源線142b及接地線146b亦 先形成好MOS電容器方式,可利用習用半導體裝置之對輸 出電路用電源線形成電容器有的佈置。僅在製造步驟中, 不形成MOS電容器此之閘電極層與電源線142b之接觸部 而已。因此,對於習用半導體裝置之製造步驟不必大幅地 變更,即可實現此升高1之構成。 又,於此一圖8及圖9所示之MOS電容器中,係使用 η溝道MOS電晶體。亦可採用p溝道MOS電晶體作爲MOS 電容器。在採用此Ρ溝道MOS電晶體之場合,閘電極層係 連接於接地線,而雜質領域(源極/汲極領域)則連接於電源 線(此係對内部電路之電容器而言;對於輸出電路,則電源 線係與雜質領域分離” 如上述,依本發明之升高,由於輸出電路之電源線與 接地線係信號而成交流方式非耦合狀態,故可防止在輸出 電路動作時之電源雜訊被傳達至此一輸出電路之另一邊之 電源供給線,而能令輸出電路安定地動作。 [實施形態] 圖10係顯示依本發明之實施形態2之半導體裝置之要 部之構成之圖式。此一圖1〇所示之半導體裝置,除了對於 31 (請先閱讀背面之注意事項再填寫本頁) h 裝. 線 本紙張从適用中國國家標準(CNS ) ( 210X297^7 經濟部中央標準局員工消費合作社印製 A7 —_____ — B7 五、發明説明(29) -- 内部電路1〇2及輸出電路104共通地設置有電源增損器 140及接地增損器144彳,其他均與_ 5所示之半導體裳 置相同。即使在内部電路用之電源、線_及輪出電路用\ 電源線142b共通地連接於此一電源增損器14〇,且内部電 路用接地線146a及輸出電路用接地線_共通地連接於 接地增損器144之場合,由於電綠線142b與接地線_ 彼此父流方式被分離,故在輪出電路1〇4在動作之場合, 亦可防止電源線U2b與接地線146b之—邊之電源雜:向 另一邊傳達。此時,可考慮例如在電源線14几所產生之電 源雜訊經由增損器140被傳達到内部電路1〇2之電源線 142a之情形。但是,藉由此電源線14孔、增損器14〇及電 源線142a之配線電阻及配線漂移電容,可使此電源雜訊減 小’且令其變化速度平緩,利用耦合在電源線與接地 線146b間之電容器C1,將此電源雜訊吸收。於輪出電路 104之動作時,電源線1421)上之電源雜訊爲電源電壓 〈電位降低’且接地線146b上之電源雜訊爲其接地電壓 GND &lt;電位位料升高,僅產生可由電容器ο予以補償 之雜訊。 、 上述,依實施形態2,即使在輪出電路與内部電路 兩者均共通地設有電源增㈣及接地增損器之場合,亦可 藉由在輸出電路用之電源線142b與接地線14讣之間不設 電容器(交流方式被分離)之方式,而防止在輸出電路ι〇4 &lt;動作時所產生之電源雜訊對於内部電路102所造成之爹 響。 矽 32 n-rl-li— I In u n ——I y (請先閱讀背面之注意事項再填寫本頁) -訂 ---線--IT Α7 Β7 Printed by the central government of the Ministry of Economic Affairs. Printed by the Consumer Cooperatives of the Bureau of Standards. 5. Description of the invention (28) There is no contact between the interlayer 171b and the power line 142b, and they are all arranged in the same plane as the MOS capacitor shown in Figure 8B. the same. The cross-sectional structure shown in FIG. 9C is also the same as the cross-sectional structure shown in FIG. 8C, except that the reference symbol attached to the end is replaced by b and there is no conductive material formed by a contact hole between the intermediate layer Π lb and the power line 142b. Other than that, it is the same. By forming the MOS capacitor method for the power supply line 142b and the ground line 146b for the output circuit, it is possible to use the conventional semiconductor device to form an arrangement of the capacitors for the power supply line for the output circuit. Only in the manufacturing step, the contact portion between the gate electrode layer of the MOS capacitor and the power supply line 142b is not formed. Therefore, the manufacturing steps for conventional semiconductor devices need not be significantly changed to realize the structure of the increase of one. In the MOS capacitor shown in Figs. 8 and 9, an n-channel MOS transistor is used. A p-channel MOS transistor can also be used as a MOS capacitor. When this P-channel MOS transistor is used, the gate electrode layer is connected to the ground line, and the impurity area (source / drain area) is connected to the power line (for the capacitors of the internal circuit; for the output Circuit, the power supply line is separated from the impurity field. "As mentioned above, according to the invention, the power supply line of the output circuit and the ground line signal form an AC-coupled state, which prevents the power supply when the output circuit is operating. Noise is transmitted to the power supply line on the other side of this output circuit, so that the output circuit can be operated stably. [Embodiment] FIG. 10 is a diagram showing the configuration of the main part of a semiconductor device according to Embodiment 2 of the present invention. For this semiconductor device shown in Figure 10, except for 31 (please read the precautions on the back before filling this page) h. The line paper is from the applicable Chinese National Standard (CNS) (210X297 ^ 7 Central Ministry of Economic Affairs) Printed by the Consumer Bureau of Standards Bureau A7 —_____ — B7 V. Description of the Invention (29)-The internal circuit 102 and the output circuit 104 are commonly provided with a power supply increaser 140 and a ground increaser 144 彳, the others are the same as the semiconductor dress shown in _ 5. Even the power supply for internal circuits, wires, and power supply circuits for power-out circuits 142b are commonly connected to this power loss increaser 14 〇, and the internal When the circuit ground wire 146a and the output circuit ground wire _ are commonly connected to the ground attenuator 144, the electric green wire 142b and the ground wire _ are separated from each other by the parent stream method, so the circuit 104 operates in turn. In this case, it is also possible to prevent the power line noise on one side of the power line U2b and the ground line 146b from being transmitted to the other side. At this time, it may be considered that the power noise generated by the power line 14 is transmitted to the booster 140 to the The situation of the power line 142a of the internal circuit 102. However, by the wiring resistance and wiring drift capacitance of the power supply line 14 holes, the attenuator 14o, and the power line 142a, this power supply noise can be reduced, and the The change speed is gentle, and the power supply noise is absorbed by the capacitor C1 coupled between the power supply line and the ground line 146b. When the turn-out circuit 104 operates, the power supply noise on the power supply line 1421) is the power supply voltage <potential reduction 'And the electricity on the ground wire 146b The source noise is that the ground voltage GND &lt; potential material rises, and only noise which can be compensated by the capacitor is generated. As described above, according to Embodiment 2, even in the turn-out circuit and the internal circuit, both are provided in common. In the case of power supply gain and ground loss increaser, it is also possible to prevent the output circuit from being installed in the output circuit by not providing a capacitor between the power supply line 142b and the ground line 14 接地 for the output circuit (the AC method is separated). &lt; Power noise generated during operation has a loud effect on internal circuit 102. Silicon 32 n-rl-li— I In un ——I y (Please read the precautions on the back before filling this page)-Order ---line-

.1 —I. I -II 1 -I «.1 —I. I -II 1 -I «

HI I 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(30 ) [實施形態3] 、圖11爲顯示依本發明之實施形態3之半導體裝置之要 部之構成之圖式。在圖U中,係對於内部電路ι〇2設有電 源、增損器140a及接地增損器144a,且對於輪出電路1〇4 設有電源增損器丨働及接地增損器⑽。内部電路搬 自其電源増損器140a經由電源線仙承受電源電壓 Vcc,且自接地增損器! 44a經由接地線!輪承受接地電 ,㈣。在電源線142a與接地線心之間,連接有電容 器C1。輸出電路104自與電源增損器咖分別設置之電 源增損器i働,經由電源線142b在其動作電源節點vcci 承受電源電壓VeC;且自與接地增損器U4a分別設置之接 ^增損器M4b,經由接地線祕,在其接地節·點遍承 X接地電壓GND。輸出電路1〇4更介由連接於内部電路用 =電源增損器UOa的吸收雜訊用之偏壓電源線142。而承 受吸收雜訊用之偏壓雷厭Vr( 袖麼%壓VCC2。電源線142b與接地線 146b係彼此分離,未設有電容器。 即使輸出電路104動作,而電源線U2b之電位降低, «線⑽與吸收雜訊用之偏壓電源線_係分別連接 在不同之增損器丨杨及14()a,其吸收雜訊用之偏壓電壓 VCC2係安定地保持於一定之電壓位準。此吸收雜訊用之 ^電壓VCC2係如圖犯或4C所示般,被施加在形成於 =出電路周邊郅。因此,可防止在電源雜訊產生時,偏壓 ,源電壓VCC2發生變動,而此電源雜訊經由P型半導體 基板(參照圖4B及4C)傳達至内部電路之p難。 本紙張尺度適HI I Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the Invention (30) [Embodiment 3] Figure 11 is a diagram showing the structure of the main parts of a semiconductor device according to Embodiment 3 of the present invention. In FIG. U, a power source, a gain increaser 140a, and a ground gain increaser 144a are provided for the internal circuit ι02, and a power supply gain increaser and a ground gain increaser ⑽ are provided for the turn-out circuit 104. The internal circuit is moved from its power supply destructor 140a to the power supply voltage Vcc via the power line, and it is self-grounded to the increaser! 44a via ground wire! The wheel bears grounding electricity, ㈣. A capacitor C1 is connected between the power supply line 142a and the ground core. The output circuit 104 is provided with a power supply gain booster i 分别 separately from the power supply gain booster, and bears the power supply voltage VeC at its operating power node vcci via the power line 142b; and it is connected to the ground gain gain booster U4a separately. The device M4b bears the X ground voltage GND at its ground node and point via the ground wire. The output circuit 104 is connected to an internal circuit bias power supply line 142 for noise absorption of the power supply gain booster UOa. The bias voltage Vr2 (sleeve voltage VCC2 for receiving noise) is separated from the power line 142b and the ground line 146b, and no capacitor is provided. Even if the output circuit 104 operates, the potential of the power line U2b decreases, « Bias and noise-biased power supply lines_ are connected to different gain reducers 丨 Yang and 14 () a, respectively, and the noise-absorbing bias voltage VCC2 is kept stable at a certain voltage level The voltage VCC2 for noise absorption is applied around the output circuit as shown in Figure 4C or 4C. Therefore, it is possible to prevent the bias and the source voltage VCC2 from changing when power noise is generated. However, this power noise is difficult to be transmitted to the internal circuit via the P-type semiconductor substrate (refer to FIGS. 4B and 4C).

經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(31 ) 止在輪出電路104動作時,電源雜訊對内部電路102造成 影響。又,可抑制此偏壓電源電壓VCC2發生變動,且偏 壓電壓VBB發生變動,致使施加於形成内部電路有之P# 的基板偏壓電壓VBB發生變動,而能防止内部電路102之 誤動作。 又,與前一實施形態同樣,由於輸出電路104之電源 線142b及接地線146b係依交流方式被分離,故可抑制此 一輸出電路104之電源雜訊内部電路102造成影響。 又,此一偏壓電源線142c亦可不耦合於增損器140a, 而連接在内部電路102與電容器Cl間之電源線142a之一 部份。即令於電源增損器140a及140b係連接在同一插頭 端子,電源雜訊不被插頭端子作内部電路而傳達至内部電 路用之電源線之場合,此一電源雜訊亦爲電容器C1所吸 收,而可不受電源雜訊之影響,安定地供給偏壓電源電壓 VCC2 ° 如上述,依本發明之實施形態3,由於將傳達輸出電 路104之吸收雜訊用之偏壓電壓的偏壓電源線電性耦合於 和輸出電路用之電源增損器分別設置之内部電路用電源增 損器,故可不受輸出電路動作時之電源雜訊之影響,安定 地供給,能防止此吸收雜訊用之偏壓電壓VCC2之變動對 内部電路102所造成之影響,進而可抑制在輸出電路104 動作時之電源雜訊對内部電路102所生之影響。 又,由於電源線142b及146b係對於輸出電路104依 交流方式被分離,即使在輸出電路104之動作時,電源雜 34 (請先閲讀背面之注意事項再填寫本頁) 裝^ *11 線 本紙張尺度適用中國國家標準(CNS ) A4规格(210X297公釐) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(32 ) '一' — -~ 訊發生於—邊之電源供給線之場合,亦可防止此電源雜訊 被傳達至另一邊之電源供給線。 … [實施形態4] 圖12係顯示依本發明之實施形態4之半導體裝置之要 部《構成之圖式。在圖12所示之構成中,係對於内部電路 1〇2與輸Α電路1G4,共通地設置電源增損器⑽及接地 增損器144。内部電路1〇2係經由電源線仙,自電源货 相器M0接受電源電壓Vcc作爲一邊之動作電源電屢,^ 自接地增損器]44經由接地線146a接受接地電壓咖作 爲另一邊之動作電源電壓。輸出電路1〇4係自電源增损器 14〇經由電轉142b接受電源電壓ν“作爲—邊之動作電 源電壓vccl,且自接地增損器144經由電源線i條接受 接地電壓GND作爲另一邊之電源電壓。 對於内部電路102之電源線1423,係由電容器ci之 一邊電極之連接節點NA,將其分割爲連接於電源増損器 140之第1部分142aa,及連接於内部電路1〇2之第2部分 l42ab。用以傳達吸收雜訊用之偏壓電壓至輸出電路Μ# 的偏壓電源線142e,係與電源線⑽分別設置,而連接 於此内部電路之電源線142a之第2部分142仏。電源線 142b係與接地線146b係交流方式被分離。 、在輸出電路1〇4發生動作而電源線142b產生電源雜訊 之場合,此—電源雜訊可能經由增損器142而傳達至電源 線142a之第!部分142aa。但是,被傳達至此第i部分Μ〗⑽ 的電源雜訊,可由對於内部電路1〇2設置之電容器Ο加以 _ 35 本纸張尺舰财_^T^TT4i格(21Gx.2^y ---,--------裝__ .% (請先閱讀背面之注意事項再填寫本頁) 訂 A7 經 中 央 標 準 局 Μ 工 消 f 合 社 印 製Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the Invention (31) When the circuit 104 is activated, noise from the power supply will affect the internal circuit 102. In addition, it is possible to suppress variations in the bias power supply voltage VCC2 and variations in the bias voltage VBB, thereby causing variations in the substrate bias voltage VBB applied to the P # formed in the internal circuit, and preventing malfunction of the internal circuit 102. Also, as in the previous embodiment, since the power supply line 142b and the ground line 146b of the output circuit 104 are separated by an AC method, the influence of the power supply noise internal circuit 102 of this output circuit 104 can be suppressed. In addition, this bias power line 142c may not be coupled to the attenuator 140a, but may be a part of the power line 142a connected between the internal circuit 102 and the capacitor C1. That is, when the power loss increasers 140a and 140b are connected to the same plug terminal, and the power noise is not transmitted to the power line for the internal circuit by the plug terminal as an internal circuit, this power noise is also absorbed by the capacitor C1. The bias power supply voltage VCC2 can be stably supplied without being affected by power supply noise. As described above, according to Embodiment 3 of the present invention, the bias power supply line that transmits the bias voltage for noise absorption of the output circuit 104 is transmitted. The power supply gain increaser for the internal circuit, which is separately coupled to the power supply gain increaser for the output circuit, is not affected by the power noise during the output circuit operation, and is supplied stably, which can prevent this bias for noise absorption. The influence of the change in the voltage VCC2 on the internal circuit 102 can further suppress the influence of power noise on the internal circuit 102 when the output circuit 104 operates. In addition, since the power lines 142b and 146b are separated from the output circuit 104 in an AC manner, even when the output circuit 104 is operating, the power supply is miscellaneous 34 (please read the precautions on the back before filling this page). Paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (32) '一' —-~ The news occurred on the side of the power supply line In this case, this power noise can be prevented from being transmitted to the power supply line on the other side. [Embodiment 4] FIG. 12 is a diagram showing the main components of the semiconductor device according to Embodiment 4 of the present invention. In the configuration shown in FIG. 12, a power supply gain increaser 接地 and a ground gain increaser 144 are provided in common for the internal circuit 102 and the input A circuit 1G4. The internal circuit 102 is powered by the power line, and the power supply phase device M0 receives the power supply voltage Vcc as one side of the power supply. ^ Self-grounded gain increaser] 44 receives the ground voltage via the ground line 146a as the other side of the operation. voltage. The output circuit 104 receives the power supply voltage ν "from the power supply booster 14 through the electric switch 142b as the action power supply voltage vccl on one side, and the ground gain increaser 144 receives the ground voltage GND as the other side through the power cord i Power supply voltage. The power supply line 1423 of the internal circuit 102 is divided by the connection node NA of one of the side electrodes of the capacitor ci, which is divided into the first part 142aa connected to the power supply destructor 140 and the internal circuit 102 Part 2 l42ab. The bias power line 142e used to convey the bias voltage used to absorb noise to the output circuit M # is provided separately from the power line ⑽, and the second part of the power line 142a connected to this internal circuit 142 仏. The power line 142b is separated from the ground line 146b in an AC mode. When the output circuit 104 operates and the power line 142b generates power noise, this—power noise may be transmitted through the gain increaser 142. To the power line 142a, the first! Part 142aa. However, the power noise transmitted to this part i M can be added to the capacitor 0 for the internal circuit 102. _ 35 paper ruler __T ^ TT4i (21Gx.2 ^ y ---, -------- loaded __% (Read the back of the precautions to fill out this page) A7 set by the Central Bureau of Standards Μ workers elimination f Lloyd PRINTED

B/ 發明説明(33 ) 吸收。因此,乃可防止在此輸出電路1〇4動作時所產生電 =雜訊被傳達至偏壓電源線142c,可使偏壓電壓VCC2安 足地保持於一定之電壓位準。而能防止在輪出電路1〇4: 動作時所產生之電源雜訊内部電路造成之影響。 如上述,依本發明實施形態4,在内部電路及輸出電 路共通地設置有電源增損器之場合,由於係將供給輸出電 路〈動作電源電壓之電源線與吸收雜訊用之偏壓電源線分 開設置,且將此一偏壓電源線連接在内部電路用電源線之 第2部分,故於輸出電路動作時所產生之電源雜訊會由對 内部電路之電容器加以吸收,藉此以防止電源雜訊對偏壓 電壓所造成之影響,而能安定地供給偏壓電壓。 、又,由於對於輸出電路之電源線及接地線係依交流方 式被分離,故可得到與實施形態2同樣地效果。 [實施形態5] 圖13爲顯示依本發明之實施形態5之半導體裝置之要 部又構成之圖式。在圖13中,係對於内部電路102設置電 療增損器14〇a及接地增損器144a,且對輪出電路^設 置與此等增損器140a、144a分開另設置電源增損器〗4〇b f接地增損器144b。内部電路1〇2係與前面之升高至4同 樣j經由電源線142a電源增損器自40接受電源電壓Vcc 作爲一邊之動作電源電壓,並自接地增損器144經由接地 線146a接受接地電壓GND作爲另一邊之動作電源電壓。 在電綠線142a與接地線146a之間連接有電容器cj。 輪出電路104係自電源增損器140經由電源線14沘自 36 ---------------Γ丨裝—— 一 ' (請先閱讀背面之注意事項异填寫本貫) 訂---- -線----- 111 m · 本紙狀^ 適用 cns ) Α4» (ηοχΊ^^γ A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明(34 ) 電源增損器140b接受一邊動作電源電壓VCC1,且自接地 增損器144b接受接地電壓GND作爲另一邊之 動作電源電#。此-輸出電路1〇4更介由與電源線⑽分 別設置之偏壓電源線142c,自電源增損器14肋承受電源 電壓Vcc係爲吸收雜訊用之偏壓電壓vcc2。在此吸收雜 偏屢電源線142c與偏屡電壓供給節點VCC2之間,介插有 電阻=,且在偏壓電源線丨42c與接地線1之間連接有 ,容器C3。藉由此一電阻R3與電容器^形成低通遽波 器,偏壓電源線142c上之電源雜訊,係利用由此電阻尺及 電容器C3所構成之低通渡波器予以吸收。電源雜訊係由 急劇之電流變化而產生,爲高頻成份,利用低通遽波器予 以濾波。 電阻係由例如多晶秒所構成,與構成偏壓電源線142c 之銘配線層作電性連接。電阻R具有例如數K至數十ΚΩ &lt;電阻値。電容器C3係由先前之實施形態丨中所説明過之 Μ⑽電容器所構成,其電容俊具有數百pF之大小。此一 電容器C3之電容値,與對於内部電路1〇2設置之電容器 C1具有、4略相JS]程度之大小。因此,在輸出電路1〇4之動 作時的電源雜訊可藉此-電容器C3予以吸收。 在輸出電路1〇4之動作時,於電源線l42b產生電源雜 訊,而此電源雜訊被傳達至偏壓電源線142c之場合,可藉 由以電阻R及電容器C3所形成之低通渡波器,將此電源 雜A丁以濾波處理,而能防止電源雜訊被傳達至輸出電路 104之偏壓電壓供給節點ν(χ2。因此,乃可抑制在輪出 請 先’I 閱 I 1'丨 面 | 之II [ 事II r 填II裝 頁 訂 線 37 本紙張尺錢财麵家髀( 五、發明説明(35 電路1〇4中’於輪出電路1〇4之動作時之 1壓電MCC2而對内部電路搬造成影響。^由此 係上 =電:之實施形態5,由於對於輪出電路 版/供料分㈣設健電轉,且在亡 :壓電源線設低通據波器,故可防止在輸出電路動:J = 電源、雜訊對偏壓雷厭、4 作f &lt; 給至输出㈣η 影響,而可將偏壓電壓安定地供 動二IS影:此,乃可一偏壓電㈣ 心路器及接地增損器係各與内部電路及 雜稽讀^電路動作時之電源 雜訊被傳達至内部電路。 [實施形態6] 經濟部中央標隼局員工消費合作社印製 =4爲顯示依本發日狀實施形態6之半導體裝置μ 38 經濟部中ί準f I合作社s 、、發明説明(36 同本發明&lt;實施形態6中,係與實施形態5相 在輸出電路動作時,即使於電 合,亦可料低通錢㊉μ雜訊^ 處理⑽m對此—電μ訊施以據波 電壓保持於—定&lt;電壓位準,而能防止在 影:電路之動作時所產生之電轉訊對内部電路搬造成B / Description of the invention (33) Absorption. Therefore, it is possible to prevent electric noise generated when the output circuit 104 is operated from being transmitted to the bias power line 142c, and the bias voltage VCC2 can be kept at a certain voltage level satisfactorily. It can prevent the influence of the internal circuit of power noise generated during the turn-out circuit 104: operation. As described above, according to the fourth embodiment of the present invention, in the case where a power loss increaser is provided in common to the internal circuit and the output circuit, the power supply line for supplying the output circuit (the operating power voltage and the bias power line for absorbing noise) are used. Separately set, and connect this bias power line to the second part of the internal circuit power line, so the power noise generated during the output circuit operation will be absorbed by the capacitor of the internal circuit to prevent power The influence of noise on the bias voltage can stably supply the bias voltage. In addition, since the power supply line and the ground line of the output circuit are separated by an AC method, the same effect as that of the second embodiment can be obtained. [Embodiment 5] Fig. 13 is a diagram showing the main configuration of a semiconductor device according to Embodiment 5 of the present invention. In FIG. 13, an electrotherapy loss increaser 14a and a ground loss increaser 144a are provided for the internal circuit 102, and a power loss increaser is separately provided for the wheel-out circuit ^ separately from these loss increasers 140a and 144a. 4 〇bf ground loss increaser 144b. The internal circuit 102 is the same as the previous step up to 4. It receives the power supply voltage Vcc from 40 as the power supply voltage via the power supply line 142a via the power supply booster 142a, and receives the ground voltage from the ground booster 144 through the ground line 146a. GND is used as the operating power voltage on the other side. A capacitor cj is connected between the electric green line 142a and the ground line 146a. The turn-out circuit 104 is installed from the power loss increaser 140 through the power cord 14 沘 36 --------------- Γ 丨-one '(please read the precautions on the back first and fill in different Original order) Order ---- -line ----- 111 m · Paper-like ^ Applicable to cns Α4 »(ηοχΊ ^^ γ A7 B7 Printed by the Staff Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention (34) The power loss increaser 140b receives the operating power supply voltage VCC1 on one side, and the self-ground loss increaser 144b accepts the ground voltage GND as the other operation power supply #. This-output circuit 104 is further provided by a bias provided separately from the power line ⑽. The power supply line 142c is pressed, and the power supply voltage Vcc received from the rib of the power supply attenuator 14 is a bias voltage vcc2 for absorbing noise. The noise absorption power supply line 142c and the power supply node VCC2 are interposed therebetween. Resistance =, and is connected between the bias power line 42c and the ground line 1, the container C3. By a resistor R3 and the capacitor ^ to form a low-pass wave filter, the power noise on the bias power line 142c, It is absorbed by a low-pass wave filter composed of this resistance scale and capacitor C3. Power supply noise is caused by a sharp current The high-frequency component is generated and filtered by a low-pass chirp. The resistor is composed of, for example, polycrystalline seconds, and is electrically connected to the wiring layer constituting the bias power line 142c. The resistor R has, for example, several K Up to several tens of KΩ &lt; resistance 电容器. Capacitor C3 is composed of the M⑽ capacitor described in the previous embodiment, and its capacitance has a size of hundreds of pF. The capacitance of this capacitor C3 is the same as for the internal circuit. The capacitor C1 set at 10 has a size of approximately 4 JS]. Therefore, power noise during the operation of the output circuit 104 can be absorbed by this capacitor C3. The operation of the output circuit 104 When power noise is generated on the power line l42b, and this power noise is transmitted to the bias power line 142c, the power noise can be mixed with a low-pass filter formed by a resistor R and a capacitor C3. The filtering process can prevent the power noise from being transmitted to the bias voltage supply node ν (χ2 of the output circuit 104. Therefore, it can be suppressed in the turn-out. Please read “I read I 1” first | II | II [事 II r Fill II gutter 37 paper ruler面面 家 髀 (V. Description of the invention (35 in Circuit 104) The 1 piezoelectric MCC2 during the operation of the output circuit 104 affects the internal circuit movement. ^ This system = electricity: implementation Form 5, because the power circuit is set for the circuit board / feeding branch, and the low-voltage data line is installed on the power supply line, it can prevent the output circuit from moving: J = power supply, noise and bias lightning It can affect the output ㈣η, and can supply the bias voltage stably to the two IS shadows: This is a bias circuit. The circuit device and the ground loss increaser are each connected to the internal circuit and miscellaneous circuits. The power noise during the inspection ^ circuit operation is transmitted to the internal circuit. [Embodiment 6] Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs = 4 is a semiconductor device showing Embodiment 6 according to this issue. Invention &lt; In the sixth embodiment, when the output circuit is operating in the same phase as in the fifth embodiment, even if it is switched on, it can be expected to have low pass money. —Set the &lt; voltage level, and can prevent the electrical transmission generated during the operation of the circuit:

[實施形態7J 圖15爲顯示依本發明之實施形態7之半導體裝置之要 部'構成之圖。在圖15所示之構成中,係對於内部電路 =2设置有電源增損器咖及接地增損器⑷a,且與此等 增損器140a及144a分開地,對於輪出電路1〇4另設有電 碌增損器140b及接地增損器難。與圖13所示之構成同 樣地,内部電路102自電源增損器140a經由電源線142a 承又電源電壓Vce作爲-邊之動作電源電壓。且自接地增 損器144a,承受接地電壓GND作爲另一邊之電源電壓。 輪出電路104係自電源增損器14〇b,介由電源線14孔承 受電源電屢Vcc作爲一邊之動作電源電廢vcc〗,並自接 地增損器144b介由接地線146b承受接地電壓GND作爲另 一 it之動作電源電壓。 對於輸出電路104,設有將電源電壓Vcc作爲吸收雜 訊用之偏壓電壓而予以傳達的偏壓電源線丨42c。對於偏屢 電源線142c,係與例如圖13所示之構成同樣地,設有低 通濾波器。此一低通濾波器包含介插於偏壓電源線M2c 之電阻R,及連接在偏壓電源線142c與對於内部電路i02 39 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) II--^----ίβ----- ' (請先閱讀背面之注意事項再填寫本頁) m n m ί . 線-----------[Embodiment 7J] Fig. 15 is a diagram showing the configuration of essential parts of a semiconductor device according to a seventh embodiment of the present invention. In the configuration shown in FIG. 15, a power gain increaser and a ground gain increaser ⑷a are provided for the internal circuit = 2, and these gain increasers 140a and 144a are separately provided for the turn-out circuit 104. It is difficult to provide a power loss increaser 140b and a ground loss increaser. In the same manner as the configuration shown in Fig. 13, the internal circuit 102 receives the power supply voltage Vce from the power supply attenuator 140a via the power supply line 142a as the -side operating power supply voltage. The self-grounded gain 144a bears the ground voltage GND as the power supply voltage on the other side. The turn-out circuit 104 is a self-power loss increaser 14b, and the power supply Vcc is received through the power cord 14 hole as one side. GND is used as the operating power supply voltage of another it. The output circuit 104 is provided with a bias power line 42c that transmits the power supply voltage Vcc as a bias voltage for noise absorption. The bias power line 142c is provided with a low-pass filter in the same manner as that shown in Fig. 13, for example. This low-pass filter includes a resistor R interposed in the bias power line M2c, and is connected between the bias power line 142c and the internal circuit i02 39. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) II-^ ---- ίβ ----- '(Please read the precautions on the back before filling out this page) mnm ί. Line -----------

I— I I I HI n · • I— « ! — A7 B7 五、發明説明(37 ) 之接地線146a(或接地增損器144a)間之電容器C3。 在輸出電路104動作,而於電源線142b產生電源雜訊 之場合,電源雜訊係利用由此電阻R及電容器C3所形成 之低通濾波器加以濾波處理而予吸收,偏壓電壓vcc2保 持既定之電壓位準。在輸出電路1〇4之動作時,即使於接 地線146b產生電源雜訊,而接地線14讣之接地電屢 &lt;電位位準升高,於此場合,因爲接地增似_與接地 増損器144a係分別設置,而可防止在此接地線14补上所 產生之電源雜訊經由構成低通濾波器之電容器c3,被回 饋至偏壓電源線142c。因此,在輪出電路ι〇4之動作時, 即使於電源線142b及接地線146b之任-者產生電源雜 訊,亦可藉由此一低通據波器(電阻R及電容器⑼,對於 電源雜訊加以濾波處理而予吸收,可將偏壓電壓安 定地保持於一定之電壓位準。 又,由於電源、線142b與接地線祕係依交流方式被 分離,故可防止此一輸出電路1〇4動作時之電源雜讯在電 源線l42b與接地線i46b之間被傳達。 如上述,依本發明之實施形態7,係對於内部電路及 經濟部中央標準局員工消費合作社印製 輪出電路各自分別設置電源增損器及接地增損器,且在將 偏壓電壓傳達至輸出電路的偏壓電源線設有低通遽波器, 並將此-低通據波器之電容器連接在偏壓電源線與内部電 路用接地線之間,故即使於在輸出電路動作時之電源雜訊 發生於接地線之場合,亦可防止此一電源雜孰對偏壓電磨 造成影響。 Μ氏張尺度適用中國國家標準(CNS) M規格 210X297 公釐) 經濟部中央標準局員工消費合作社印製 A7 -----B7 五、發明説明(38 ) 又,由於輸出電路之電源線係與接地線依交流方式被 分離’故可得到與實施形態1同樣之效果。 &gt; [實施形態8] 圖16係顯示之依本發明實施形態8之半導體裝冒之要 部之構成之圖。於此-圖16所示之構成中,係對於=電 路1〇2及輸出電路104共通地設置電源增損器14〇及接地 增損器i 44。内部電路i 02係' 經由電源、、線i仏自電源増損 器140承受電源電壓Vcc ’且經由接地線祕自接地二損 器144承受接地電壓GND。輪出電路1〇4經由電源線二孔 自電源增損器140承受電源電壓Vcc作蛊 1 vcc作爲動作電源電壓 vcc,且經由接地線146b自接地增損器144承受接地電 壓GND作爲另-邊之動作電源電壓。用以傳達$出電路 104之吸收雜訊用之偏壓電壓的偏壓電源線μ。係與此— 電源線142b分別設置。 ^ 在圖16所示之構成中,係與圖14所示構成不同,設 於偏壓電源線142c之構成低通濾波器的電容器,被= 接在和接地增損器M4分別設置之增損器與偏壓電源 K ㈣M #設有電阻R。藉由將構成低 通濾波姦之電容器C3 ,連接在和用以供給作爲另—邊 動作電源電壓之接地電壓GND的接地增損器144分別設亂 之接地增損器144c與偏壓電源線142c之間的方式, 在接地線146b中,於輪出電路1〇4之動作時產生電源 訊,而接地電壓GND之電壓位準升高,此一電容器 不受該電源雜訊之影響,故可防止流過此接地線⑽之 之 置 雜 亦 電 (請先閱讀背面之注意事項再填寫本頁} .裴· ’丁 、-° 線 Φ 41 木紙張尺度適用中國國家標準(CNS ) A4規格 A7 B7 五、發明説明(39 ) 源雜訊對於輪出電路刚之㈣電壓vcc成 輸出電路H)4發生動作,而於 成如響在 偽人^ ^ ^ ^ 家、、泉142b屋生電源雜訊之 t二;可由以電容器C3及電阻R形成之低 予以吸收’同樣可抑制電源雜訊對偏壓電壓 VCC2之影響。 蚵偏壓電壓 因此,依本如狀實施„8,係在圖14所示之會施 形態6所示構成之效果之外,更與動作電源電壓供給用之 增損器分別地另設低通據波器專用之增損器,將構成低通 遽波k電暮器連接在此—專用之增損器與偏壓電源線之 間,故即使在接地線上產生電源雜訊之場合,亦可將輪出 電路《吸收雜訊収偏壓電壓安定地保持於-定電壓位 準;即使在電源線及接地線之任一者於輪出電路之動作時 產生電源雜訊,亦可將偏壓電壓败2|定地保持於一定 電壓位準,進而可防止在輸出電路動作時產生之電源雜訊 對於内部電路造成影響。 [實施形態9] 圖17爲顯示本發明之半導體裝置之要部之構成之 圖。於圖17所示構成中,係與對於内部電路1〇2之電源增 損器140a及接地增損器144a分別地,另外設置對於輸出 電路104之電源增搔器140b及接地增損器14仆。内部電 路102係經由電源線142a自此一電源_増損器i4〇a承受電 源電壓Vcc作爲一邊之動作電源電壓;且經由接地線 146a,自此一接地增損器144a承受接地電壓gnD作爲另 一邊之動作電源電壓。在電源線142a與接地線146a之間 42 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐〉 t I n^i - f—^— -1 /y! I — - - (^lf - :1 (請先閲讀背面之注意事項再填寫本頁) -*-11^: 1·-ι~··* .— 'βτ------^ —— 經濟部中央標準局員工消費合作社印製 -I II ί ί Hr Α7 Β7 經濟部中央標準局員工消費合作社印製 五、發明説明(40 ) 速接電容器C1。 輪出電路104自電源增損器140b經由電源線142b承 受電源電壓Vcc作爲一邊之動作電源電壓VCC1,且自接 地增損器144b經由接地線146b承受接地電壓GND作爲另 一邊之動作電源電壓。 輸出電路104更自連接於電源增損器140a之偏壓電源 線l42c,經由低通濾波器承受電源電壓Vcc作爲吸收雜訊 用之偏壓電壓VCC2。低通濾波器包含插設於偏壓電源線 142c之電阻R,及連接在偏壓電源線142c與接地線146a 之間的電容器C3。 偏墨電源線142c係自用以供給輸出電路1 〇4之動作電 源電壓的電源增損器140b及接地增損器14仆完全分離。 因此,即使輸出電路104發生動作,在電源線14孔或接地 線146b產生電源雜訊,此一偏壓電源線142^亦不受其影 響,而可安定地保持於一定之電壓位準。 又,藉由在偏壓電源線142c設置低通濾波器之方式, :使=族加在電源增損器14如之電壓產生雜訊之場合,亦 I確實地*此-低通賴器加以吸收,而能安定地供給一 定&lt; 電壓位準之偏壓電壓VCC2至輸出電路。 二發明之實施形態9,由於將偏壓電源線 置之電源供給增損器,故可不受輸 電轉訊之影響,安定地將偏壓電 雜訊對於”電顧Μ料。作所生電源 1--—43 (請先閲讀背面之注意事項再填寫本頁) .裝· 、1Τ 1 - ItI— I I I HI n · • I— «! — A7 B7 V. Capacitor C3 between the ground wire 146a (or the ground booster 144a) of the invention description (37). When the output circuit 104 operates and a power noise is generated on the power line 142b, the power noise is absorbed by a filtering process using a low-pass filter formed by the resistor R and the capacitor C3, and the bias voltage vcc2 remains fixed. Voltage level. During the operation of the output circuit 104, even if power supply noise is generated on the ground line 146b, the ground level of the ground line 14 讣 is repeatedly &lt; the potential level is increased. In this case, because the ground is increased and the ground is damaged The devices 144a are provided separately, and it is possible to prevent the power supply noise generated on the ground line 14 from being fed back to the bias power line 142c through the capacitor c3 constituting the low-pass filter. Therefore, even when power supply noise is generated in any of the power line 142b and the ground line 146b during the operation of the circuit ι04, a low-pass data wave receiver (resistance R and capacitor ⑼, for The power supply noise is filtered and absorbed, and the bias voltage can be kept at a certain voltage level stably. In addition, because the power supply, the line 142b and the ground line are separated by the AC method, this output circuit can be prevented. The power noise during the 104 operation is transmitted between the power line l42b and the ground line i46b. As described above, according to Embodiment 7 of the present invention, it is printed out for the internal circuit and the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. The circuit is provided with a power gain reducer and a ground gain reducer respectively, and a low-pass chirp is provided on the bias power line that transmits the bias voltage to the output circuit, and the capacitor of this-low-pass wave filter is connected to Between the bias power line and the ground wire for the internal circuit, even if the power noise occurs when the output circuit is operating on the ground line, it can prevent this power noise from affecting the bias electric mill. Zhang Applicable to China National Standard (CNS) M specification 210X297 mm) Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs A7 ----- B7 V. Description of the invention (38) In addition, because the power line and grounding line of the output circuit Since it is separated by the communication method, the same effect as that of the first embodiment can be obtained. &gt; [Embodiment 8] Fig. 16 is a diagram showing the structure of a main part of a semiconductor package according to Embodiment 8 of the present invention. In the configuration shown in FIG. 16, a power supply gain booster 14 and a ground gain booster i 44 are provided in common to the = circuit 102 and the output circuit 104. The internal circuit i 02 is connected to the power supply voltage Vcc ′ via the power supply line and the line power source 140, and to the ground voltage GND via the grounding line loss 144 via the ground line. The wheel-out circuit 104 receives the power supply voltage Vcc from the power loss increaser 140 through the two holes of the power line, and acts as 1 vcc as the operating power voltage vcc, and receives the ground voltage GND from the ground loss increaser 144 as the other side via the ground line 146b. Operating power supply voltage. A bias power line μ for transmitting a bias voltage for noise absorption of the output circuit 104. This is the case-the power cord 142b is provided separately. ^ The structure shown in FIG. 16 is different from the structure shown in FIG. 14. The capacitor constituting the low-pass filter provided on the bias power line 142 c is connected to the gain increase connected to the ground gain increaser M4. The resistor and bias power K 电源 M # are provided with a resistor R. A capacitor C3 constituting a low-pass filter is connected to the ground attenuator 144 and a ground attenuator 144 for supplying a ground voltage GND as another side operating power voltage, and a random ground attenuator 144c and a bias power line 142c are provided. In this way, in the ground line 146b, a power signal is generated during the operation of the wheel-out circuit 104, and the voltage level of the ground voltage GND is raised. This capacitor is not affected by the power noise, so it can be Prevent miscellaneous electricity from flowing through this grounding wire (please read the precautions on the back before filling out this page). Pei 'Ding,-° wire Φ 41 Wood paper dimensions are applicable to China National Standard (CNS) A4 specifications A7 B7 V. Description of the invention (39) The source noise acts on the output circuit just after the voltage vcc becomes the output circuit PD), and Yu Chengru sounds at the dummy ^ ^ ^ ^ It can be absorbed by the low formed by capacitor C3 and resistor R ', which can also suppress the influence of power noise on the bias voltage VCC2.蚵 The bias voltage is therefore implemented in accordance with the condition „8, which is in addition to the effect of the configuration shown in FIG. 14 as shown in FIG. 14 and has a low pass separately from the loss increaser for the operation power supply. A special loss-increasing device for the wave device connects the low-pass k-wave electric transformer—the dedicated loss-increasing device and the bias power line, so it can also be used in the case of power noise on the ground line. Keep the out-of-circuit circuit absorbing noise and receiving the bias voltage stable at-constant voltage level; even if any power line and ground wire generate power noise during the operation of the out-of-circuit circuit, the bias voltage can also be set. Voltage loss 2 | The ground is kept at a certain voltage level, which can prevent the power supply noise generated during the output circuit from affecting the internal circuit. [Embodiment 9] FIG. 17 shows the main parts of the semiconductor device of the present invention. Structure diagram. In the structure shown in FIG. 17, the power amplifier 140a and the ground amplifier 144a for the internal circuit 102 are separately provided, and the power amplifier 140b and the ground amplifier for the output circuit 104 are separately provided. Damager 14. The internal circuit 102 is The power supply line 142a has been subjected to the power supply voltage Vcc as the operating power supply voltage on one side; and the ground gain 144a has been subjected to the grounding voltage gnD as the operating power supply voltage on the other side through the ground line 146a. Between the power line 142a and the ground line 146a 42 This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) t I n ^ i-f — ^ — -1 / y! I —--(^ lf-: 1 (Please read the notes on the back before filling this page)-*-11 ^: 1 · -ι ~ ·· *. — 'βτ ------ ^ —— Staff of Central Bureau of Standards, Ministry of Economic Affairs Printed by the Consumer Cooperative-I II ί Hr Α7 Β7 Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the invention (40) Quick-connect capacitor C1. The wheel-out circuit 104 receives power from the power amplifier 140b via the power cable 142b. The voltage Vcc is used as the operating power supply voltage VCC1 on one side, and the self-grounding attenuator 144b receives the ground voltage GND as the operating power supply voltage at the other side through the ground line 146b. The output circuit 104 is also a bias power line connected to the power attenuator 140a l42c, withstand the power supply voltage Vcc via a low-pass filter The bias voltage VCC2 for absorbing noise. The low-pass filter includes a resistor R inserted in the bias power line 142c, and a capacitor C3 connected between the bias power line 142c and the ground line 146a. Ink bias power line 142c It is completely separated from the power supply gain 140b and the ground gain 14 which are used to supply the operating power voltage of the output circuit 104. Therefore, even if the output circuit 104 operates, a power supply noise is generated in the power line 14 hole or the ground line 146b. It is not affected by this bias power line 142 ^, but can be kept at a certain voltage level stably. In addition, by setting a low-pass filter on the bias power line 142c, the following applies to the case where the voltage of the power loss increaser 14 generates noise: It absorbs and can stably supply a bias voltage VCC2 of a certain voltage level to the output circuit. Embodiment 9 of the second invention, because the power supply of the bias power line is provided to the loss increaser, it can be free from the influence of power transmission and transmission, and the bias electrical noise can be stabilized to the "electricity monitoring material". --- 43 (Please read the precautions on the back before filling out this page). Installation · , 1Τ 1-It

、發明説明(41 經濟部中央椁準局員工消費合作社印製 [實施形態10] 圖18爲顯示依本發明之實施形態1〇之半導體裝置之 要那之構成之圖。在此一圖18所示構成中,係與圖㈣ ^構成不同,爲了㈣電I線142,專用地設有電源增 ^⑽及接地增損器144e。構成低波器之電容器 C3趣合在此專用之電源增損器刚C與接地增損器144c &lt;其他之構成與圖17所不構成相同,在對應之部分附 上相同之參考號碼。 在此« 18所不之構成之|合,偏壓電源線&lt; 電源增揭器UOc及接地增損器⑽,係如對於内部電路 ⑽之電源增損器觸及接地增損器⑽,與對於輪出電 =〇4之«增損器屬及接地增損器1440_置。 :電r及内部電路1 °2之動作時’即使電 :電壓Vee或接地電壓GND發生變化,亦不受這此之影 響,而可受定地將-定之偏壓電壓vcc2供給至輪出 又,即使在電源雜訊傳達至此—電源增損器14 %合,吓可利用由電阻R及電容 器,對此電源雜訊施以據波處理;^低通遽波 之急劇變化,能安定地保持偏壓電二偏壓電壓體 如上述,依本發明之實施形態1〇 Γ104之雜訊吸收用之偏_,而設置 增損器及接地增損器,故可抑制於輪::用4原 雜訊對於此一偏壓電壓所造成之影 日 &lt;電源 由此-偏壓電壓VCC2而傳達至内部而可抑制雜孰經 44 本紙張尺度適用中麵家辟(CNS )Description of the invention (41 Printed by the Consumers' Cooperative of the Central Government Bureau of the Ministry of Economic Affairs [Embodiment Mode 10] FIG. 18 is a diagram showing the essential structure of a semiconductor device according to Embodiment 10 of the present invention. FIG. 18 is shown here. The structure shown is different from that shown in Figure ㈣. In order to power the I-line 142, a power supply gain and ground loss increaser 144e are provided exclusively. The capacitor C3 constituting the low-wave converter matches the power loss of the dedicated power supply. Device C and ground gain increaser 144c &lt; other components are not the same as those in FIG. 17, and the same reference numbers are attached to the corresponding parts. Here, «18 does not have the same structure, the bias power line &lt; The power supply booster UOc and the ground booster ⑽, such as the power gain booster for the internal circuit 触 touching the ground booster 与, and the «gain booster belongs to ground power loss booster for the power output of the wheel = 〇4 1440_set .: When the electric r and the internal circuit operate at 1 ° 2 ', even if the electric: voltage Vee or the ground voltage GND changes, it will not be affected by this, and it will be able to supply the -definite bias voltage vcc2. Until the turn out, even when the power noise is passed here—the power loss increaser is 14%, scaring The resistor R and the capacitor are used to apply wave processing to the noise of the power supply. ^ The sharp change of the low-pass wave can stably maintain the bias voltage. The bias voltage body is as described above, according to Embodiment 1 of the present invention. The noise absorption of Γ104 is biased, and a loss increaser and a ground loss increaser are set, so it can be suppressed in the wheel :: 4 original noises are used for the shadow caused by this bias voltage &lt; the power source is- The bias voltage VCC2 is transmitted to the inside and the noise can be suppressed. 44 This paper is suitable for mid-range home cleaning (CNS)

經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(42 ) '-- [實施形態11] 圖19爲顯示依本發明之實施形態1;[之半導體裝置之 要部之構成之圖。在圖19中,内部電路1〇2經由電源線 142a自電源增損器14〇a承受電源電壓Vcc作爲一邊之動 作電源電壓;且經由接地線146a自接地增損器144&amp;承受 接地電壓GND作爲另一邊之動作電源電壓。電容器。被 連接於電源線142a與接地線146a之間。 輸出電路104係自和此電源增損器14如分別設置之電 源增損H 140b ’經由電源、線142b承受電源電屢—作爲 一邊之動作電源電壓VCC1及雜訊抑制用偏壓電壓 VCC2,並自4和接地增損器14如分別設置之接地增損器 144c,經由接地線_承受接地電壓gnd作爲另一邊之 動1電源電壓。在電源線142b之節點nb與接地線祕 疋節點NC之間,連接有電容器C4。又,在節點·與電 源增損器]40b之間插設有電阻R1 ’在節點呢與接地增 損器⑽之間連接有電阻R2。電阻IU及R2各具有數⑶ 疋電阻値。電容HC4具有數百冲之電容値。 於此圖19所讀成之場合,對於自電源線⑷匕被傳 電源雜訊的低通遽波器,係由電容器C4與電阻幻所 it;且:容器4與電阻R2係作用爲對於自接地線146b 傳達 &lt; 電源雜訊的低通遽波器。 在輸出電路104《動作時,於電源線⑷匕之電位降低 時’此—節點NB&lt;妹降低衫被傳達至錢增損器 震。在此—節點_之電位降低經由電容器C4朝節點 j W尺度適用中國 --------------^--- . (請先閱讀背面之注意事項再填寫本頁) .丨線 -I -1 - - j— - I - I «II 11 A7 B7 經濟部中央襟隼局員工消費合作社印製 五、發明綱(43 ) ~~ NC被傳達至場合,藉由以電容器c4及電阻R2形成之低 通濾波器,此一電位降低受到濾波處理,不會傳達至接地 增損器144c。 在输出電路104施行放電動作,而接地線146b之接地 電壓GND之電位位準升高之場合,節點Nc之電位上升藉 由以電容器C4及電阻R2所形成之低通濾波器予以濾波處 不會傳達至接地增損器1 44c。又,即使因爲電容哭 ,使得節點NB之電位隨著此節點之電位上升而上 升,亦可藉由以電阻R1及電容器C4形成之低通遽波器, 而抑制此電源雜訊之向電源增損器14〇b傳達。 因此,在此輸出電路104動作時所受之電源雜訊被傳 達至電源增損器觸及接地增損器]他,而可防止其對 電路Η)2ϋ成料。特収,藉㈣㈣電路以 増損器140&amp;及144a和輸出電路1〇4之增損器⑽及 =設置之方式,可防止在此輸出電路1〇4之動作時所生 電源雜訊傳達至内部電路1〇2之電源供給增損器。 如士述,依本發明之實施形gn’由於對於輸出電路 及内部電路各別地設置電源供給增損器,且在 損器與輸出電路之電源供給節點之間設置低通據波^增 收在輸出電路所產生之電源雜訊,故可防止在輪出^吸 作時之電源雜訊被傳達至内部電路之電碌供給線。電路動 [實施形態12] ° 圖2G係顯示依本糾之實族形態12之 要部之構成:t圖。此—圖2G所示之播 ㈣裳置&lt; ⑽所K構成,除了電源增損器 46 Α規格(2〗ΟΧ;297公釐)Printed by the Consumer Standards Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the Invention (42) '-[Embodiment Mode 11] Figure 19 is a diagram showing the structure of the main part of a semiconductor device according to Embodiment 1 of the invention; [ . In FIG. 19, the internal circuit 102 receives the power supply voltage Vcc as the one-side operating power supply voltage from the power supply booster 14a via the power line 142a; and the ground booster 144 &amp; receives the ground voltage GND as the ground voltage via the ground line 146a. Operating power supply voltage on the other side. Capacitor. It is connected between the power supply line 142a and the ground line 146a. The output circuit 104 is a power supply gain H 140b which is provided separately from the power supply gain increaser 14 through the power supply and the line 142b to withstand the power supply repeatedly-as one side operation power supply voltage VCC1 and noise suppression bias voltage VCC2, and If the ground attenuator 144c and the ground attenuator 14 are separately provided, they bear the ground voltage gnd as the power supply voltage of the other side via the ground line_. A capacitor C4 is connected between the node nb of the power line 142b and the ground node NC. A resistor R1 'is interposed between the node and the power supply booster] 40b, and a resistor R2 is connected between the node and the ground booster ⑽. The resistors IU and R2 each have a number ⑶ 疋 resistance 値. The capacitor HC4 has a capacitor 数百 of several hundred rushes. In the case read in FIG. 19, for the low-pass oscillating device transmitting the power noise from the power line, the capacitor C4 and the resistor R2 are used; and the container 4 and the resistor R2 function as The ground line 146b is a low-pass filter that transmits &lt; power noise. When the output circuit 104 "is in operation, when the potential of the power line is reduced," this-the node NB &lt; sister lowering shirt is transmitted to the money increaser shock. Here — the potential reduction of node_ is applied to China through the capacitor C4 towards the node j W scale. -------------- ^ ---. (Please read the precautions on the back before filling this page) . 丨 Line-I -1--j--I-I «II 11 A7 B7 Printed by the Consumer Cooperatives of the Central Commission of the Ministry of Economic Affairs. 5. Outline of Invention (43) ~~ NC was conveyed to the occasion by using capacitors. In the low-pass filter formed by c4 and resistor R2, this potential reduction is subjected to filtering processing and will not be transmitted to the ground attenuator 144c. When the output circuit 104 performs a discharge operation and the potential level of the ground voltage GND of the ground line 146b rises, the potential rise of the node Nc is not filtered by a low-pass filter formed by the capacitor C4 and the resistor R2. Conveyed to ground attenuator 1 44c. In addition, even if the potential of the node NB rises with the rise of the potential of this node because of the capacitor crying, it is possible to suppress the increase of the noise of this power supply to the power supply by the low-pass wave filter formed by the resistor R1 and the capacitor C4. The loss device 14b communicates. Therefore, the power noise received by this output circuit 104 when it is operated is transmitted to the power gain contactor touching the ground gain booster, and it can prevent the circuit from becoming a material. Special collection. By means of the circuit, the loss reducer 140 &amp; and 144a and the output circuit 104 gain increaser are set to prevent the power noise generated during the operation of this output circuit 104 from being transmitted to The power supply of the internal circuit 102 is supplied to the booster. As stated, according to the embodiment of the present invention, since a power supply gain increaser is separately provided for the output circuit and the internal circuit, and a low-pass data wave is provided between the loser and the power supply node of the output circuit. The power noise generated by the output circuit can prevent the power noise from being transmitted to the power supply line of the internal circuit during the turn-out operation. Circuit operation [Embodiment 12] ° Figure 2G shows the structure of the main part of the real family form 12 according to the present correction: t diagram. This—as shown in Fig. 2G, the structure of ㈣ 衣 ㈣ &;, except for the power loss increaser 46 Α specifications (2〗 〇〇; 297 mm)

經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(44 ) 。140及接地增損器144係對於内部電路102及輸出電路104 共通地設置以外,均與圖19所示之構成相同,對於對應部 分均附上相同之參考號碼。如此圖20所示般,在電源增損 器140及接地增損器144係對於内部電路102及輸出電路 104共通地設置之場合,藉由在電源線142b及接地線146b 分別設置低通濾波器之方式,於輸出電路104之動作時, 在電源線142b或接地線146b所產生之電源雜訊可由此一 低通濾波器予以吸收,而能抑制其經由增損器140及144, 向内部電路102之電源線142a或接地線146a傳達,能使 内部電路102安定地動作。 [實施形態Π] 圖21係概略顯示係本發明之實施形態13之半導體裝 置之構成的圖式。在圖21中,係對於内部電路102及輸出 電路104共通地設置用以將偏壓電壓VBB施加於基板領域 的VBB產生電路200。此一 VBB產生電路200包含:振 盪器200a,可產生在高位準(電源電壓Vcc位準)與低位準 (接地電壓GND)之間變化的時鐘信號;進料泵電容200b, 依振盪器200a所輸出之時鐘信號,施行進行栗動作,而令 節點ND之電位變化;固定用η通道MOS電晶體200c, 用以將節點ND之電位之高位準固定於臨界値電壓Vth位 準;輸出用η通道MOS電晶體200d,依節點ND之電位, 經由偏壓電壓傳達線201a將偏壓電壓VBB傳達至内部電 路102 ;及輸出用之η溝道MOS電晶體200e,依節點ND 之電位,經由偏壓電壓傳達線201b將負的偏壓電壓VBB 47 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) •裝· 訂 線 • / 經濟部中央標準局員工消費合作社印製 A7 〜-------._B7 五、發明説明(45) ~ _ 傳達至輪出電路104。 MOS電晶體200C係以其閘極及一邊之導通端子連接 在%點NB ’且其另一邊之導通端手連接在接地節點。輪 出用MOS電晶體200d,係以其閘極及一邊之導通節點連 接在偏壓電壓傳達線2〇ia,另一邊之導通節點則連接在偏 壓電壓傳達線201b,且其另一邊之導通端子連接於節點 ND。 在振盪器200a所輸出之時鐘信號爲高位準時,由於進 料泵電容,使節點ND之電位成爲高位準,一旦此節點]^][) 之電位成爲高位準,M〇s電晶體2〇〇c即導通,節點nd 之電位降低至MOS電晶體2〇〇c之臨界值電壓vth之電壓 位準。節點ND之電位爲正的電位位準,使M〇s電晶體2〇〇d 及200e成爲逆向偏壓狀態,而成〇FF狀態。 自振盪器200a輸出之時鐘信號一旦成爲低位準,由於 進料泵電容200b節點ND之電位乃降低至Vth_Vcc之位 準。回應此一節點ND之電位降低,M〇s電晶體2〇〇d及 2〇Oe即導通,偏壓電壓傳達線2〇la及2〇lb各自之電位與 節點ND之電位之差一旦達於M〇s電晶體2〇〇d及2〇如之 臨界値電壓Vth以下,MOS電晶體200d及200e即成〇FF 狀態。藉由反複進行此一動作,偏壓電壓傳達線2〇la及 201b之電位最終會降低至2 · Vth-Vcc之電位位準。 在圖21所示構成中,用以傳達對於輸出電路1〇4之偏 壓電壓VBB的偏壓電壓傳達線20ib,係和用以傳達係於 内部電路102之基板偏壓電壓VBB的偏壓電塵傳達線2〇 j a 48 本紙張尺度適用中國國家標準(CNS ) A4規格(21〇χ297公釐) (請先閲讀背面之注意事項再填寫本頁) •裝· 訂 線--- i in A7 ------------- Β7 五、發明説明(46) ~~ — 各別設置。因此,輸出電路1()4㈣生 電壓VBB有變化,此一輪 Μ吏其偏壓 调出電路1〇4之偏厭费粧 變化亦不會傳達至内部電路 壓VBB之 电路102,而可保持内部 之偏壓電壓VBB於安定。 1電路102 如上述,依本發明之實施形態13 ,由於係 路與輸出電路各別設置偏傳達線,故於輪 作^即使輸出電路之基板偏屢電屢有變化,亦可抑j 一 化對内部電路之偏壓電壓的影響。 [實施形態14] 圖22爲顯示依本發明之實施形態u的半導體裝置之 整體構成之圖式。於圖22中,來自侧產生電^2二 基板偏壓f壓VBB經由低通驗器21()骸至輸出電路 104。此低通濾波器210係設在輸出電路1〇4附近。來自 VBB產生電路2〇〇之基板偏壓電屢vbb ,經由偏壓電壓傳 達線201 ,而不經低通濾波器21〇直接饋入至内部電路 102 〇 低通濾波器210包含串聯連接之電阻元件21〇a與 21 〇b ’及連接在電阻21 〇a與21 〇b之連接節點與電源供給 節點之間的電容器21〇c。供給至此電容器210c之一邊電 極的電源供給電壓亦可爲電源電壓Vcc,且可爲接地電壓 GND。又,此偏壓電壓傳達線201亦可爲一根之配線,且 可如圖21所示般,對於輸出電路丨〇4及内部電路1〇2各自 分別設置。在輸出電路104發生動作,而產生電源雜訊之 場合’由於基板領城之P丼和雜質領域(圖4B及C之雜質 49 本^張尺〉A4規格(2丨0X 297公釐) 請 閲 讀 背 之. 注 意 事 項 再 填 寫 本 頁 裝 訂 線 € 經濟部中央標準局員工消費合作社印製 A7 ____B7 五、發明説明(47 ) 領域119與P丼113d)之間之電容耦合,基板電位產生變 化。但是,於此一輸出電路104中,即使基板電位發生變 ,,而偏壓電壓VBB發生變化,亦可藉由低通濾波器21〇 予以濾波處理,而能防止此一偏壓電壓之變化傳達至内部 電路102。又,藉由使來自VBB產生電路2〇〇之基板偏壓 電壓經由低通濾波器210供給至輪出電路1〇4,可安定地 將基板偏壓電壓供給至此輪出電路1〇4之基板領域。因 此,於此一輸出電路1〇4之動作時所產生之電源雜訊,乃 由安定地被供給之基板偏壓電壓VBB予以吸收,而能抑制 在輪出電路104之基板電位之變動。藉此方式,乃可防止 輸出電路104之基板領域之電位變動經由半導體基板 120(參考圖4B及C) ’而被傳達至形成有内部電路1〇2的 基板領域,防止在此輸出電路1〇4之動作時所產生之電源 雜Λ對内部電路1〇2造成影響。又,在偏壓電壓傳達線^ 中即使產生雜訊,亦可利用低通濾波器21〇施以濾波處 理,故此雜訊並不傳達至輪出電路1〇4,而可經常安定地 保持輸出電路1〇4之基板偏壓電壓VBB於既定之電位位 準。藉此’可防止雜訊被傳達至輸出電路1〇4之基板領域, 經濟部中央標準局員工消費合作社印製 並抑制因爲此一雜訊而造成輸出電路1〇4之電源供給電位 發生變化。 又,此一圖22所示構成,可與先前之實施形態i至13 中任者相組合使用,只要在輸出電路1〇4之附近設有用 以使基板偏壓電壓VBB達到安定化之低通濾波器21〇即 可。 本紙張尺度適 A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明(48 ) 如上述,依本發明之實施形態14,由於在輸出電路 104之附近設有低通濾波器,故在輸出電路104之動作時, 即使在基板領域產生雜訊,亦可防止此一雜訊被傳達至内 部電路102之基板領域。又,藉由此一低通濾波器之設置, 可將偏壓電壓安定地供給至輸出電路之基板領域。因而, 在輸出電路動作時,即使產生電源雜訊,亦可將基板領域 之電位安定地保持於既定電位位準,而防止此一電源雜訊 經由基板領域而傳達至内部電路。 [實施形態15] 圖23爲概略顯示依本發明之實施形態15之半導體裝 置之整體構成的圖式。在圖23所示構成之中,對於輸出電 路104設有VBB產生電路202a,而對於内部電路102設 有VBB產生電路202a,而對於内部電路102設有VBB產 生電路202b。如此一圖23所示,藉由對於輸出電路104 及内部電路102各自分別設置VBB產生電路202a與202b 之方式,可使輸出電路104之基板偏壓電壓安定化。即使 在輸出電路104之動作時產生電源雜訊,亦可抑制此一輸 出電路104之基板領域之電位。因此,可防止雜訊經由此 半導體裝置之基板領域由輸出電路104被傳達至内部電路 102。而能防止在輸出電路104之動作時的電源雜訊對内 部電路102產生影響。又,假定在輸出電路104之動作時, 於其基板領城產生雜訊,此一雜訊亦可藉由對於輸出電路 104設置之VBB產生電路202a予以吸收。因此,於此輸出 電路104,即使在基板偏壓電壓VBB產生雜訊,亦可防止 51 (請先閱讀背面之注意事項再填寫本頁) 、-5Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (44). 140 and ground gain increaser 144 are the same as those shown in FIG. 19 except that the internal circuit 102 and the output circuit 104 are provided in common, and the same reference numbers are attached to corresponding parts. As shown in FIG. 20, when the power supply gain increaser 140 and the ground gain increaser 144 are provided in common for the internal circuit 102 and the output circuit 104, low-pass filters are provided on the power supply line 142b and the ground line 146b, respectively. In this way, during the operation of the output circuit 104, the power noise generated by the power line 142b or the ground line 146b can be absorbed by this low-pass filter, and it can be suppressed from passing through the gain increasers 140 and 144 to the internal circuit. The power line 142a or the ground line 146a of 102 transmits the internal circuit 102 to operate stably. [Embodiment Π] Fig. 21 is a diagram schematically showing the structure of a semiconductor device according to Embodiment 13 of the present invention. In Fig. 21, a VBB generating circuit 200 for applying a bias voltage VBB to the substrate area is provided in common to the internal circuit 102 and the output circuit 104. The VBB generating circuit 200 includes: an oscillator 200a, which can generate a clock signal that changes between a high level (the power supply voltage Vcc level) and a low level (the ground voltage GND); the feed pump capacitance 200b, according to the oscillator 200a The output clock signal performs a chest action to change the potential of the node ND. The n-channel MOS transistor 200c is fixed to fix the high level of the potential of the node ND to the threshold voltage Vth level. The n-channel is used for the output. The MOS transistor 200d transmits the bias voltage VBB to the internal circuit 102 via the bias voltage transmission line 201a according to the potential of the node ND; and the n-channel MOS transistor 200e for output uses the bias according to the potential of the node ND The voltage transmission line 201b will have a negative bias voltage VBB 47. This paper size applies the Chinese National Standard (CNS) A4 size (210 X 297 mm) (Please read the precautions on the back before filling out this page). / Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs A7 ~ -------._ B7 V. Description of the invention (45) ~ _ Conveyed to the rotation circuit 104. The MOS transistor 200C is connected to the gate and one side of the conduction terminal at the% point NB ′ and the other side of the conduction terminal is manually connected to the ground node. The MOS transistor 200d for wheel output is connected to the bias voltage transmission line 20ia with its gate and one conduction node on one side, and the conduction node on the other side is connected to the bias voltage transmission line 201b, and the conduction on the other side The terminal is connected to the node ND. When the clock signal output from the oscillator 200a is at a high level, the potential of the node ND becomes a high level due to the capacitance of the feed pump. Once this node] ^] [) becomes a high level, the M0s transistor 200 c is turned on, and the potential of the node nd decreases to the voltage level of the threshold voltage vth of the MOS transistor 200c. The potential of the node ND is a positive potential level, so that the Mos transistor 200d and 200e become a reverse biased state and become an 0FF state. Once the clock signal output from the oscillator 200a becomes a low level, the potential of the node ND of the feed pump capacitor 200b decreases to the level of Vth_Vcc. In response to the reduction of the potential of this node ND, the Mos transistor 200d and 200Oe are turned on, and the difference between the potential of each of the bias voltage transmission lines 20la and 20lb and the potential of the node ND reaches once The MOS transistors 200d and 200 are below the threshold voltage Vth, and the MOS transistors 200d and 200e are in an OFF state. By repeating this operation, the potentials of the bias voltage transmission lines 201a and 201b will eventually decrease to a potential level of 2 · Vth-Vcc. In the configuration shown in FIG. 21, a bias voltage transmission line 20ib for transmitting the bias voltage VBB of the output circuit 104 is a bias voltage for transmitting a substrate bias voltage VBB of the internal circuit 102. Dust transmission line 2〇ja 48 This paper size is applicable to China National Standard (CNS) A4 (21〇 × 297mm) (Please read the precautions on the back before filling this page) • Binding and binding --- i in A7 ------------- Β7 V. Description of the Invention (46) ~~ — Individual settings. Therefore, the output voltage VBB of the output circuit 1 () 4 has changed. In this round, the bias and change of the bias call-out circuit 104 will not be transmitted to the internal circuit voltage VBB circuit 102, which can maintain the internal The bias voltage VBB is stable. 1 Circuit 102 As described above, according to Embodiment 13 of the present invention, since the transmission line and the output circuit are provided with bias transmission lines, respectively, it is rotated. Even if the substrate bias of the output circuit changes frequently, it can also suppress j Influence of the bias voltage of the internal circuit. [Embodiment 14] FIG. 22 is a diagram showing the overall configuration of a semiconductor device according to Embodiment u of the present invention. In FIG. 22, the secondary side generates a substrate bias voltage VBB through the low-pass detector 21 () to the output circuit 104. The low-pass filter 210 is provided near the output circuit 104. The substrate bias voltage from the VBB generating circuit 2000 is repeatedly vbb, and is fed directly to the internal circuit 102 via the bias voltage transmission line 201 without the low-pass filter 210. The low-pass filter 210 includes a series-connected resistor The components 21 oa and 21 ob ′ and a capacitor 21 oc connected between a connection node of the resistors 21 oa and 21 ob and a power supply node. The power supply voltage supplied to one side electrode of the capacitor 210c may also be the power supply voltage Vcc, and may be the ground voltage GND. In addition, the bias voltage transmission line 201 may be a single wiring, and as shown in FIG. 21, the output circuit 104 and the internal circuit 102 may be separately provided. When the output circuit 104 is operating and power noise occurs, 'Because of P 丼 and impurities in the substrate collar (Figure 4B and C impurities 49 books ^ Zhang Ruler> A4 specifications (2 丨 0X 297 mm) Please read Note. Please fill in the gutter on this page again. Printed by A7 __B7 of the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the invention (47) Capacitive coupling between field 119 and P 丼 113d), the substrate potential changes. However, in this output circuit 104, even if the substrate potential changes and the bias voltage VBB changes, it can be filtered by the low-pass filter 21 to prevent the change in the bias voltage from being transmitted. To internal circuit 102. Furthermore, by supplying the substrate bias voltage from the VBB generating circuit 200 to the wheel-out circuit 104 via the low-pass filter 210, the substrate bias voltage can be stably supplied to the substrate of the wheel-out circuit 104. field. Therefore, the power supply noise generated during the operation of this output circuit 104 is absorbed by the substrate bias voltage VBB supplied in a stable manner, and the variation of the substrate potential in the wheel-out circuit 104 can be suppressed. In this way, it is possible to prevent the potential change in the substrate area of the output circuit 104 from being transmitted to the substrate area where the internal circuit 102 is formed via the semiconductor substrate 120 (refer to FIGS. 4B and C), thereby preventing the output circuit 1 The power supply Λ generated during the operation of 4 will affect the internal circuit 102. In addition, even if noise is generated in the bias voltage transmission line ^, the low-pass filter 21 can be used for filtering, so the noise is not transmitted to the wheel-out circuit 104, and the output can be constantly and stably maintained. The substrate bias voltage VBB of the circuit 104 is at a predetermined potential level. This is used to prevent noise from being transmitted to the substrate area of the output circuit 104, and printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs, and to suppress the power supply potential of the output circuit 104 from changing due to this noise. In addition, this structure shown in FIG. 22 can be used in combination with any of the previous embodiments i to 13, as long as a low pass is provided near the output circuit 104 to stabilize the substrate bias voltage VBB. The filter 21 is sufficient. This paper is suitable for A7 B7. Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the invention (48) As mentioned above, according to Embodiment 14 of the present invention, since a low-pass filter is provided near the output circuit 104, When the output circuit 104 operates, even if noise is generated in the substrate area, it is possible to prevent this noise from being transmitted to the substrate area of the internal circuit 102. In addition, with the arrangement of a low-pass filter, the bias voltage can be stably supplied to the substrate area of the output circuit. Therefore, even when power supply noise occurs during the output circuit operation, the potential in the substrate area can be stably maintained at a predetermined potential level, and this power noise is prevented from being transmitted to the internal circuit through the substrate area. [Embodiment 15] FIG. 23 is a diagram schematically showing the overall configuration of a semiconductor device according to Embodiment 15 of the present invention. In the configuration shown in Fig. 23, a VBB generating circuit 202a is provided for the output circuit 104, a VBB generating circuit 202a is provided for the internal circuit 102, and a VBB generating circuit 202b is provided for the internal circuit 102. As shown in FIG. 23, by setting the VBB generating circuits 202a and 202b to the output circuit 104 and the internal circuit 102, respectively, the substrate bias voltage of the output circuit 104 can be stabilized. Even if a power noise is generated during the operation of the output circuit 104, the potential of the substrate area of the output circuit 104 can be suppressed. Therefore, it is possible to prevent noise from being transmitted from the output circuit 104 to the internal circuit 102 through the substrate area of the semiconductor device. It is possible to prevent power noise from affecting the internal circuit 102 during the operation of the output circuit 104. In addition, it is assumed that when the output circuit 104 operates, noise is generated in the base circuit of the substrate. This noise can also be absorbed by the VBB generating circuit 202a provided for the output circuit 104. Therefore, in this output circuit 104, even if noise is generated in the substrate bias voltage VBB, it can also prevent 51 (please read the precautions on the back before filling this page), -5

本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(49 ) 此一雜訊被傳達至内部電路1〇2之基板領域。 如上述’依本發明之實施形態15,由於在内部電路及 輸出電路各別設置VBB產生電路,故可使輪出電路之基板 偏壓電壓安定化,而能防止在輸出電路之動作時所產生之 電源雜訊對於内部電路發生影響。 [實施形態16] 圖24爲概略顯示依本發明之實施形態μ之半導體裝 置之要部之構成之圖。圖24所示之構成,除了在輸出電路 104與VBB產生電路202a之間設有低通濾波器212之點 外’均與圖23所示之構成相同。此一低通濾波器212,對 於自\^8產*生電路2〇2a產生之基板偏壓電壓予以濾波處 理,再傳達至輪出電路1〇4。因此,即使自VBb產生電路 202a產生雜訊,亦可由此低通濾波器212施以濾波處理, 防止此雜訊被傳達至輪出電路1〇4之基板領域。藉此,乃 可安定地保持輪出電路104之基板電位,將輸出電路1〇4 之動作時因爲電源雜訊所造成之基板電位之變動加以吸 收,防止此電源雜訊經由半導體基板.對内部電路1 造成 影響。又,藉由低通濾波器2丨2可防止輸出電路1〇4之基 板領域之基板偏壓電壓(因雜訊之影響而)發生劇烈變化, 故可抑制因此一基板偏壓電壓之變動,致使雜訊經由半導 體基板被傳達至内部電路1〇2。 如上述,依本發明之實施形態16,由於在供輸出電路 專用設置之VBB產生電路之輸出部設有低通濾波器,故可 使輪出電路之基板偏壓電壓安定化,在輪出電路1〇4動作 52 本國國家標準(CNS )八4夫脉(训乂聊公董)&quot; —--— 7a ---,-----丨裝--.----訂------線-----1 ,'*-Μ* f請先閲讀背面之注意事項再填寫本頁} . 經濟部中央標準局員工消費合作社印製 A 7 B7五、發明説明(50 ) 時之電源雜訊於基板領域被吸收,而能防止電源雜訊對内 部電路產生影響&quot; 在圖21圖24所示之構成中,於本發明被應用於内部 緩衝器之場合,亦可不用VBB產生電路,而代以採用產生 内部高電壓VPP(較内部動作電源電壓更高之電壓位準)的 電路(内部緩衝器具有CMOS構成,且於其基板領城施加高 電壓之場合)。 圖25爲顯示場合輸出電路之變化例之構成的圖式。圖 25 A爲顯示此一輸出電路之剖面構造,而圖25B爲顯示其 電性等償電路之圖式。 在圖25A中,輸出電路係在形成於P型半導體基板300 之上部的P丼302内形成。於此P丼302之表面,更形成 有N丼303。在此N丼303表面,彼此隔開形成有P +雜 質領域305a及305b。於此等雜質領城305a及305b之間, 隔著閘極絕緣膜(未圖示)形成有閘電極層306。N丼303 介由N +雜質領域304承受偏壓電壓VCC2。P+雜質領 城305a承受電源電壓VCC1。 在P丼302表面,N+雜質領域307a與307b係彼此 隔開而形成。在此等雜質領域307a與307b間之P丼302 上,隔著閘極絕緣膜(未圖示)形成有閘電極層308。P丼 302更介由包圍於此P丼302而形成之P +雜質領域309 而承受基板偏壓電壓VBB。N+雜質領域307a承受接地 電壓GND。P+雜質領城305b與N +雜質領域307b係彼 此連接。 53 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 線 Φ A7 __ 五、發明説明(51 ) 此一圖25A所π之輪出電路,係如圖25B所示般,備 有由P溝道MOS電晶體PQ與n溝道M〇s電晶體Nq所構 成之CMOS構成。如圖25B所示般,p溝道M〇s電晶體 PQ之源極承受電源電壓VCC1,其基板領域承受偏壓電壓 VCC2。MOS電晶體NQ之源極承受接地電壓gnd,基板 領域承受基板偏壓電壓VBB。 在如此圖25A及B所示之CM〇s構成之場合,亦可利 用先前之實施形態1至16之構成。此時,亦可利用在圖 25A中,於P丼302和P型半導體基板3〇〇之境界領域, 如圖4B或圖4C所示般形成有用以吸收雜訊&lt;N +領城(雜 質領域或丼領域),而偏壓電壓VCC2被施加於此吸收雜訊 用之領域的構成。 [半導體裝置之具體例] 圖26爲顯示依本發明之半導體裝置之具體構成的圖 式。此一圖26所示之半導體裝置,係由施行邏辑處理的邏 辑電路LSI,及和儲存資料之記憶體LSI形成於同一晶片 上之系統LSI所構成。 經濟部中央椁隼局員工消費合作社印製 在圖26中,半導體裝置包含邏辑處理部與記憶部。於 此一邏辑處理部與記憶部,共通地設有用以施行與裝置外 部之資料及信號之輸出入的輸出入緩衝電路400。邏辑處 理部包含自輸出入緩衝電路400及後面説明之記憶部接受 資料及/或信號,而施行既定之處理的邏辑電路402。記億 部包含:儲存單元行列406,具有排列成行列狀之動態型 儲存單元;DRAM控制電路404,控制對此儲存單元行列 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部中央標準局員工消費合作社印製 A7 ____-____B7 五、發明説明(52 ) 〜~~~~ '——— 406之存取;字元線驅動器彻,在dram㈣電路 之控制下’將儲存單元㈣_之行(字猶)朝選擇狀能 驅動;及謂出放大器410,用以感測放大連接於在備存單 元行列4〇6中被選擇之行的儲存單元之資料,並予鎖定。 邏辑電路402僅對於自此儲存單元行列4〇6讀出^資 料’或待寫入之資料,施以既定之邏辑處理。又,〇編 控制電路404亦可爲依照經由輪出入緩衝電路4〇〇饋入之 控制信號及位址信號,而控制儲存單元行列4〇6之儲存單 元選擇動作的構成。並且,亦可不採此,而將邏辑電路術 探用如下構成,亦即依照介由輪出入緩·衝電路4〇〇饋入之 資料及控紹言號,對此資料施以既定之處理,且依控制信 號產生對於儲存單元行列406之寫入資料,並依控制信號 而控制DRAM控制電路404之動作。DRAM控制電^ 404、字元線驅動器408及讀出放大器41〇係對應於圖j 所示之行列周邊電路l〇2b,而DRAM控制電路4〇4則依 自輸出入緩衝電路400或邏辑電路402饋入之資料及控制 信號以及位址信號而執行儲存單元選擇動作。 瀆出放大器410包含對應於儲存單元行列4〇6之儲存 單元各列(位元線對)設置之讀出放大電路。此一讀出放大 電路備有鎖定型讀出放大器之構成,該構成係由用以將對 應之列(位元線對)之電位依差分方式予以放大之交叉輕合 之MOS電晶體所構成。 對於邏辑電路402、DRAM控制電路404及字元線驅 動器408共通地設置電源增損器I46d,且於邏辑電路 本紙張尺度適用中國國家標準(CNS ) M規格(21〇&gt;&lt;297公釐) (請先閲讀背面之注意事項再填寫本頁} 裝· 、1T_ €)、 A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明(53 ) 402、DRAM控制電路404共通式設置接地增損器144d。 邏辑電路402自此一電源增損器140d經由主電源線142d 及副電源線142da,接受一邊之動作電源電壓Vcc,且自 接地增損器144d經由接地線146fa接受接地電壓GND。 DRAM控制電路404經由主電源線142d及副電源線142ab 自電源增損器140d接受電源電壓Vcc,且經由接地線146fb 自接地增損器144d接受接地電壓GND。字元線驅動器408 經由主電源線142d及副電源線142dc自電源增損器140d 接受電源電壓Vcc,且經由基板偏壓電壓傳達線201c接受 負的偏壓電壓VBB。藉由以來自外部之電源電壓Vcc(2.5 V) 作爲一邊之動作電源電壓,令邏辑電路402及DRAM控制 電路404動作之方式,可使此等電路高速地動作。又,於 讀出放大器410具有分時讀出放大器之構成,且配置在位 元線對之間之場合,DRAM控制電路404會產生用以將非 選擇位元線對予以切開之位元線分離信號。令此一位元線 分離信號之高位準,比儲存單元行列406内之高位準更高 (爲了消除分離電晶體之臨界値電壓損失)。因此,DRAM 控制電路404利用電源電壓Vcc。字元線驅動器408將儲 存單元行列406内之選擇字元線驅動至升壓電壓位準(爲 了消除儲存單元電晶體之臨界値電壓之影響)。爲了產生此 一升壓電壓,而將電源電壓Vcc饋入至字元線驅動器408。 字元線驅動器408接受負的偏壓電壓Vbb作爲另一邊之動 作電源電壓,其目的係在於防止因儲存單元行列406中之 非選擇字元線之電容耦合所致電位之升高,使非選擇儲存 56 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) —J------IK —裝------訂------線 (請先閱讀背面之注意事項再填寫本頁) 五 經濟部中央標準局員工消費合作社印製 、發明説明(54 單疋之電晶體導通,而造成記憶電荷流出的情形。 …對於讀出放大器410,設有電源增損器14如及接地增 相器144e。降屋電路412將輕合於此一電源增損器wo。 之電源線他上&lt; ㈣電屢〜予以轉,產生内部降屢 電壓Vd(L8V),經由讀出放大電源線143而供給至讀出放 大器楊。在讀出放大電源線143與電源線略之間,設 有回應控制信號φ而導通之開關㈣sw。在對半導體裝 置施加電源時’令此—開關元件請成爲導通狀態,令此 内部降低電壓Vd高速地上升。又,在讀出放大器之 動作前’令此開關元件SW成爲ON狀態,使讀出放大電 源線143上《電源電壓Vd之電壓位準降低,抑制讀出放 ,器4H)動作時之電源電壓Vd之降低,以高速使其進行 讀出動作4出放大器41〇之另—邊之電源電壓係自接地 增損器144e經接地線他饋入。因此,讀出放大器彻 在動作時將各對應位元線對)上之電位,驅動至接地 電壓GND及内部降壓電壓Vd之電壓位準。將已受内部降 低之電壓vd利用作爲讀出放大器41〇之一邊之電源電 壓,藉此’較伴隨著儲存單元㈣4G6之大域容量化, 使儲存單元被微細化,亦可保證儲存單元電晶體之絕緣耐 壓特性。 對此-電’ 142d及142e,分別設有独 器C5及C6。 對於輪出入緩衝㈣400,4用地設有電源、増損器 I40f及接地増損@ H4f。對此輸出入緩衝電路伽,係自 諳k, 閱 讀 背This paper size applies to China National Standard (CNS) A4 (210X297 mm). Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. A7 B7. 5. Description of the invention (49) This noise is transmitted to the substrate of internal circuit 102. field. As described above, according to the embodiment 15 of the present invention, since the VBB generating circuit is provided in the internal circuit and the output circuit, the substrate bias voltage of the wheel-out circuit can be stabilized, and it can be prevented from occurring during the operation of the output circuit. The power noise has an impact on the internal circuit. [Embodiment 16] FIG. 24 is a diagram schematically showing a configuration of a main part of a semiconductor device according to an embodiment of the present invention. The structure shown in Fig. 24 is the same as the structure shown in Fig. 23 except that a low-pass filter 212 is provided between the output circuit 104 and the VBB generating circuit 202a. This low-pass filter 212 filters and processes the substrate bias voltage generated by the circuit 202a produced by the ^ 8 production circuit, and then transmits it to the circuit 104. Therefore, even if noise is generated from the VBb generation circuit 202a, the low-pass filter 212 can be subjected to filtering processing to prevent this noise from being transmitted to the substrate area of the wheel-out circuit 104. With this, it is possible to stably maintain the substrate potential of the wheel-out circuit 104, absorb the variation of the substrate potential caused by the power supply noise during the operation of the output circuit 104, and prevent this power supply noise from passing through the semiconductor substrate. Circuit 1 affects. In addition, the low-pass filter 2 丨 2 can prevent the substrate bias voltage (due to the influence of noise) of the substrate area of the output circuit 104 from changing drastically, so it can suppress the variation of a substrate bias voltage. As a result, noise is transmitted to the internal circuit 102 via the semiconductor substrate. As described above, according to Embodiment 16 of the present invention, since a low-pass filter is provided at the output portion of the VBB generating circuit provided exclusively for the output circuit, the substrate bias voltage of the wheel-out circuit can be stabilized. 1〇4 action 52 National Standards (CNS) of the eighty-four husbands and daughters (executive chat chat director) &quot; ----- 7a ---, ----- 丨 installed --.---- order- ---- Line ----- 1, '* -Μ * f Please read the notes on the back before filling out this page}. Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A 7 B7 V. Invention Description (50 ) When power noise is absorbed in the field of the substrate, it can prevent power noise from affecting the internal circuit. "In the structure shown in Figure 21 and Figure 24, when the present invention is applied to the internal buffer, it can also be Instead of VBB generation circuit, use a circuit that generates internal high voltage VPP (a higher voltage level than the internal operating power supply voltage) (where the internal buffer has a CMOS structure and high voltage is applied to its substrate collar). FIG. 25 is a diagram showing a configuration of a modified example of an output circuit in a case. Fig. 25A is a diagram showing a cross-sectional structure of this output circuit, and Fig. 25B is a diagram showing its electrical equalization circuit. In FIG. 25A, the output circuit is formed in P 丼 302 formed on the upper portion of the P-type semiconductor substrate 300. On the surface of P 丼 302, N 丼 303 is further formed. P + impurity regions 305a and 305b are formed on the N 丼 303 surface at a distance from each other. Between these impurity collars 305a and 305b, a gate electrode layer 306 is formed via a gate insulating film (not shown). N 丼 303 receives the bias voltage VCC2 through the N + impurity region 304. The P + impurity collar 305a withstands the power supply voltage VCC1. On the surface of P 丼 302, N + impurity regions 307a and 307b are formed apart from each other. A gate electrode layer 308 is formed on P 丼 302 between these impurity regions 307a and 307b via a gate insulating film (not shown). P 丼 302 is further subjected to a substrate bias voltage VBB through a P + impurity region 309 formed around the P 丼 302. The N + impurity region 307a is subjected to a ground voltage GND. The P + impurity collar 305b and the N + impurity region 307b are connected to each other. 53 This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling out this page) Binding and binding line Φ A7 __ 5. Description of the invention (51) This figure is shown in Figure 25A As shown in FIG. 25B, the π wheel-out circuit is provided with a CMOS structure composed of a P-channel MOS transistor PQ and an n-channel Mos transistor Nq. As shown in FIG. 25B, the source of the p-channel Mos transistor PQ is subjected to the power supply voltage VCC1, and the substrate region thereof is subjected to the bias voltage VCC2. The source of the MOS transistor NQ is subjected to the ground voltage gnd, and the substrate area is subjected to the substrate bias voltage VBB. In the case of the CMOS structure shown in Figs. 25A and 25B, the structures of the previous embodiments 1 to 16 can also be used. At this time, in FIG. 25A, in the boundary area of P 丼 302 and P-type semiconductor substrate 300, as shown in FIG. 4B or FIG. 4C, it is possible to form a useful structure to absorb noise &lt; N + Lingcheng (impurity Field or chirped field), and the bias voltage VCC2 is applied to the composition of the field for noise absorption. [Specific Example of Semiconductor Device] Fig. 26 is a view showing a specific configuration of a semiconductor device according to the present invention. This semiconductor device shown in FIG. 26 is composed of a logic circuit LSI that performs logic processing and a system LSI that is formed on the same chip as a memory LSI that stores data. Printed by the Consumer Affairs Cooperative of the Central Government Office of the Ministry of Economic Affairs In Figure 26, the semiconductor device includes a logic processing unit and a memory unit. The logic processing unit and the memory unit are provided with an input / output buffer circuit 400 for performing input and output of data and signals external to the device. The logic processing unit includes a logic circuit 402 that receives data and / or signals from the input / output buffer circuit 400 and a memory unit described later, and executes predetermined processing. The Billion Unit includes: storage unit rank 406, which has dynamic storage units arranged in rows and rows; DRAM control circuit 404, which controls the rank of this storage unit. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) Economy Printed by the Consumer Standards Cooperative of the Ministry of Standards, Ministry of Standards, A7 ____-____ B7 V. Description of the Invention (52) ~~~~~ '——— Access to 406; the character line driver is completely under the control of the dram circuit. The line (字) can be driven toward the selection state; and the amplifier 410 is used to sense and lock the data of the storage unit connected to the selected line in the reserve unit rank 406 and lock it. The logic circuit 402 applies predetermined logic processing only to the data read from the storage unit rank 406 or the data to be written. The 0-code control circuit 404 may be configured to control the storage unit selection operation of the storage unit rank 406 in accordance with the control signal and the address signal fed through the wheel-in / out buffer circuit 400. In addition, instead of adopting this, the logic circuit technology can be used as follows, that is, according to the data and control statements that are fed in through the round-out buffer circuit 400, and the data is given a predetermined treatment. , And write data to the storage unit rank 406 according to the control signal, and control the operation of the DRAM control circuit 404 according to the control signal. The DRAM control circuit 404, the word line driver 408, and the sense amplifier 41 ° correspond to the rank peripheral circuit 102b shown in FIG. J, and the DRAM control circuit 400 is based on the self-input buffer circuit 400 or logic. The circuit 402 feeds data and control signals and address signals to perform a storage unit selection operation. The amplifier 410 includes a sense amplifier circuit corresponding to each column (bit line pair) of the memory cell in the memory cell row 406. This sense amplifier circuit is provided with a lock-type sense amplifier, which is composed of a cross-light MOS transistor for amplifying the potential of a corresponding column (bit line pair) in a differential manner. For the logic circuit 402, the DRAM control circuit 404, and the word line driver 408, a power loss increaser I46d is provided in common, and the Chinese national standard (CNS) M specification (21〇 &gt; &lt; 297) is applied to the paper standard of the logic circuit. (Mm) (Please read the precautions on the back before filling in this page} Equipment, 1T_ €), A7 B7 Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention (53) 402, DRAM control circuit 404 common formula A ground loss increaser 144d is provided. The logic circuit 402 receives a power supply voltage Vcc from one side via a main power line 142d and a sub power line 142da, and the ground voltage increaser 144d receives a ground voltage GND through a ground line 146fa. The DRAM control circuit 404 receives the power supply voltage Vcc from the power supply booster 140d via the main power supply line 142d and the sub power supply line 142ab, and receives the ground voltage GND from the ground booster 144d through the ground line 146fb. The word line driver 408 receives the power supply voltage Vcc from the power supply booster 140d through the main power supply line 142d and the sub power supply line 142dc, and receives the negative bias voltage VBB through the substrate bias voltage transmission line 201c. By using the external power supply voltage Vcc (2.5 V) as an operating power supply voltage, the logic circuit 402 and the DRAM control circuit 404 are operated, so that these circuits can operate at high speed. In addition, when the sense amplifier 410 has a time-sharing sense amplifier and is arranged between the bit line pairs, the DRAM control circuit 404 generates bit lines for separating the non-selected bit line pairs. signal. The high level of this one-bit line separation signal is higher than the high level in the memory cell rank 406 (in order to eliminate the critical 値 voltage loss of the separation transistor). Therefore, the DRAM control circuit 404 uses the power supply voltage Vcc. The word line driver 408 drives the selected word line in the memory cell rank 406 to a boosted voltage level (in order to eliminate the influence of the threshold voltage of the memory cell transistor). To generate such a boosted voltage, the power supply voltage Vcc is fed to the word line driver 408. The word line driver 408 accepts the negative bias voltage Vbb as the operating power supply voltage on the other side, and its purpose is to prevent the bit position from increasing due to the capacitive coupling of the non-selected word line in the memory cell rank 406, so that the non-selected Storage 56 This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X 297mm) —J ------ IK —Packing ------ Order ------ Line (Please read the back first Please pay attention to this page, please fill in this page) 5. Printed by the Consumers Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs, and the invention description (54) The transistor is turned on, causing memory charge to flow out.… For the sense amplifier 410, a power supply Loss device 14 and grounding phase increaser 144e. House drop circuit 412 will be lightly connected to this power loss increaser wo. The power line of it will be turned on and off to generate internal voltage Vd (L8V). Is supplied to the sense amplifier via the sense amplifier power supply line 143. Between the sense amplifier power supply line 143 and the power supply line, a switch 导 sw which is turned on in response to the control signal φ is provided. When power is applied to the semiconductor device ' Let this—the switching element be turned on In order to increase the internal reduced voltage Vd at a high speed, and before the operation of the sense amplifier, the switch element SW is turned on, so that the voltage level of the "supply voltage Vd on the sense amplifier power line 143 is reduced, and reading is suppressed. When the power supply voltage Vd decreases when the device is in operation, the readout operation is performed at a high speed. The power supply voltage on the other side of the amplifier 41 is fed from the ground attenuator 144e through the ground wire. Therefore, the sense amplifier drives the potential on the corresponding bit line pair) to the voltage level of the ground voltage GND and the internal step-down voltage Vd during operation. The voltage vd that has been internally reduced is used as the power supply voltage on one side of the sense amplifier 41, thereby 'comparing with the large area capacity of the storage unit ㈣4G6, so that the storage unit is miniaturized, and the storage unit transistor Insulation withstand voltage characteristics. For this-electricity '142d and 142e, separate devices C5 and C6 are provided, respectively. For the wheel in / out buffer ㈣400, the 4 sites are provided with a power supply, a reducer I40f, and a ground 増 @ H4f. The input and output buffer circuits are Gamma, which is from 谙 k.

I 裝 線 57 本紙張尺度適用中國國家標隼 幻公釐)I loading line 57 This paper size is applicable to the Chinese national standard (magic mm)

經漭部中央襟準局員工消費合作社印製 五、發明説明(55 ) 電源增損器104f經由電源線142f供給有電源電壓Vcc, 且自接地增損器144f經由接地線146f供給有接地電壓 GND。對於電源線U2f未設有退耦用之電容器。又,此 輸出入緩衝電路400係利用來自電源增損器140f之電源電 壓Vcc及來自接地增損器144f之接地電壓GND作爲動作 電源電壓。在先前之實施形態中所説明之吸收雜訊用之偏 壓電壓(VCC2),只要能利用先前之實施形態中之任一者之 構成即可。 特別佳之情形是輸出入緩衝電路400僅包含在先前之 實施形態中所説明過之連接在外部插頭端子的最終段之輸 出電路,及耦合於外部輪入端子的初級輪入電路。在輸出 入資料信號之場合,此一電路4〇〇亦可包含用以回應控制 資料之輸出入之信號而動作之部分。 在如上述之系統LSI中,亦與内部電路之增損器分別 地,另外設置輸出入緩衝電路4〇〇特別是輪出電路用電源 增U及接地增損器,且對於内部電路用之電源線設置退 ,用之電容器,藉此方式可防止此—輸出人緩衝電路(特別 是輸出電路)動作時之電源雜訊對内部電路所造成之影 響,而能實現安定動作之高信賴性之系統⑶。 如上述’依本發明,可防止在輸出電路及内部緩衝哭 等^緩衝電路動作時所產生之電源雜訊對其他内部電路; 成影響。 (圖式之簡單說明) 圖1爲概略顯示應用本發明之半導體裝置之整體 本纸張尺度適 (請先閱讀背面之注意事項再填寫本頁) .裝- -訂 線---- 邐 • 111 I 1 · 58 經濟部中央標準局員工消費合作社印製 本紙張 A7 -------— —B7 五、發明説明(56 ) 〜'~~&quot; :—~~~- 成的圖式。 圖2爲顯示應用本發明之半導體裝置之另一構成的圖 式。 圖3爲顯示圖1所示輪出電路之具體構成的圖式。 —圖4A爲顯示圖3所示輪出電路之平面佈置,圖4B爲 顯π沿圖4A &lt; A-A線之剖面構造的圖式。圖4C爲顯示沿 圖4A之A-A線之剖面構造之變化例的圖式。 、圖5爲顯示依本發明之實族形態之半導體裳置之要部 之構成之圖。 圖6爲顯示依本發明之半導體裝置之增損器與外部插 頭端子之連接形態之圖式。 圖7爲顯示依本發明之半導體裝置之增損器之配置之 圖8爲顯示圖5所示電容器之電性等償電路、平面饰 置及剖面構造之圖式。 雪々^ 9爲圖5所5^輪出電路之電源線與接地線間之 ”谷姦&lt;!性等價電路、平面佈置及剖面構造之圖式。 =1G爲顯示依本發明之實施形態2之半導 部&lt;構成之圖。 =11爲顯示依本發明之實施形態3之半導體裝置之要 邱又構成之圖。 :12爲顯示依本發明之實施形態4之半導體裝置之要 % &lt;構成之圖。 圖13爲顯示依本發明之實施形態5之半導體裝置之要 尺度適用 --IT------κ\- n I ·.'... (請先閲讀背面之注意事項再填寫本頁)Printed by the Employees ’Cooperative of the Ministry of Economic Affairs, Central Government, and V. Description of the Invention (55) The power supply booster 104f is supplied with the power supply voltage Vcc via the power line 142f, and the self-ground booster 144f is supplied with the ground voltage GND via the ground line 146f . No capacitor for decoupling is provided for the power line U2f. The input / output buffer circuit 400 uses the power supply voltage Vcc from the power supply attenuator 140f and the ground voltage GND from the ground attenuator 144f as the operating power supply voltage. The bias voltage (VCC2) for noise absorption described in the previous embodiment may be any one as long as it can use the structure of any of the previous embodiments. It is particularly preferable that the input / output buffer circuit 400 includes only the output circuit connected to the final stage of the external plug terminal as described in the previous embodiment, and the primary wheel-in circuit coupled to the external wheel-in terminal. In the case of input / output data signals, this circuit 400 may also include a part which operates in response to the input / output signals of the control data. In the system LSI as described above, an input / output buffer circuit 400 is provided separately from a gain increaser of the internal circuit, especially a power supply booster U and a ground gain increaser for the turn-out circuit. The line is set back, and a capacitor is used. In this way, it can prevent this—the output noise from the buffer circuit (especially the output circuit) of the power supply from affecting the internal circuit. ⑶. As described above, according to the present invention, power supply noise generated during the operation of the output circuit and the internal buffer circuit can be prevented from affecting other internal circuits. (Brief description of the drawings) Figure 1 is a schematic showing the overall paper size of the semiconductor device to which the present invention is applied (please read the precautions on the back before filling this page). Installation--Threading ---- 逦 • 111 I 1 · 58 Printed paper A7 by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs --------- --B7 V. Description of the invention (56) ~ '~~ &quot;:-~~~- formula. Fig. 2 is a view showing another configuration of a semiconductor device to which the present invention is applied. FIG. 3 is a diagram showing a specific structure of a turn-out circuit shown in FIG. 1. — FIG. 4A is a plan view showing the layout of the turn-out circuit shown in FIG. 3, and FIG. 4B is a diagram showing a cross-sectional structure of π along the line of FIG. 4A &lt; A-A. Fig. 4C is a diagram showing a modification example of the cross-sectional structure taken along the line A-A in Fig. 4A. Fig. 5 is a diagram showing the structure of a main part of a semiconductor dress according to a real family form of the present invention. Fig. 6 is a diagram showing a connection form of a loss increaser of a semiconductor device according to the present invention and an external plug terminal. Fig. 7 is a diagram showing a configuration of a loss increaser of a semiconductor device according to the present invention. Fig. 8 is a diagram showing an electrical equalization circuit, a plane decoration and a cross-sectional structure of the capacitor shown in Fig. 5. Snow 々 9 is a diagram of the "equivalent circuit, planar layout, and cross-section structure" between the power line and the ground line of the 5 ^ turn-out circuit in Figure 5. = 1G shows the implementation according to the present invention Figure 2 shows the structure of the semiconductor device &lt; = 11 is a diagram showing the structure of the semiconductor device according to the third embodiment of the present invention.: 12 is the figure showing the requirements of the semiconductor device according to the fourth embodiment of the present invention. % &lt; Structure diagram. Fig. 13 shows the application of the main dimensions of a semiconductor device according to the fifth embodiment of the present invention--IT ------ κ \-n I · .'... (Please read the back first (Notes for filling in this page)

、1T 線 €) 59 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(57 ) 部之構成之圖。 圖14爲顯示依本發明之實施形態6之半導體裝置之要 部之構成之圖。 圖15爲顯示依本發明之實施形態7之半導體裝置之要 部之構成之圖。 圖16爲顯示依本發明之實施形態8之半導體裝置之要 部之構成之圖。 圖17爲顯示依本發明之實施形態9之半導體裝置之要 部之構成之圖。 圖18爲顯示依本發明之實施形態10之半導體裝置之 要部之構成之圖。 圖19爲顯示依本發明之實施形態11之半導體裝置之 要部之構成之圖。 圖20爲顯示依本發明之實施形態12之半導體裝置之 要部之構成之圖。 -圖21爲顯示依本發明之實施形態13之半導體裝置之 要部之構成之圖。 圖22爲顯示依本發明之實施形態14之半導體裝置之 要部之構成之圖。 圖23爲顯示依本發明之實施形態15之半導體裝置之 要部之構成之圖。 圖24爲顯示依本發明之實施形態16之半導體裝置之 要部之構成之圖。 圖25爲顯示應用本發明之緩衝電路之變化例之剖面 60 (請先閱讀背面之注意事項再填寫本頁) -裝. 訂 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部中央標準局員工消費合作社印製 A7 --.~~___!7 五、發明説明(58 ) &quot; ~~ --- 構造及電性等價電路之圖示。 圖26爲顯示依本發明之半導體裝置之具體例之圖 式。 圖27爲顯示習用讀崎衝電路之構成之圖式。 圖28爲顯示習用之輸出緩衝電路之動作之波形圖。 圖29爲顯示習用之半導體裝置之電源供給線之 的圖式。 圖30爲用以説明圖29所示構成之問題點的圖式。 圖31爲顯示習用之半導體裝置之變化例的圖式。 圖32爲用以説明圖31所示半導體裝置之問題點的圖 式。 * 圖33爲用以説明習用之半導體裝置之具體問題點的 圖式。 圖34爲顯示習用之輸出緩衝電路之變化例的圖式。 圖35爲顯示備有圖34所示輪出緩衝電路之半導體記 憶裝置之要部之剖面構造之圖式。 圖36爲用以説明圖35所示之半導體裝置之問題點之 圖式。 (符號説明) 100〜半導體裝置,102〜内部電路,1〇4〜輸出電路, 110〜半導體裝置,110c〜緩衝電路,11〇e〜輸出緩衝電 路,140、140a至140f〜電源增損器,142a、142b、 142d 土 142f〜電源線’ i42c〜偏壓電源線,144、144a 土 144f〜接地增損器,146a、146b、146d至146f〜接 61 1本紙張尺度適用中國國家標準1CNS )八4規格⑺〇&gt;&lt;297公^ ------ (請先閲讀背面之注意事項存填寫本頁) 裝. 訂 線—----- €) A7 ___________B7 五、發明説明(59 ) 地線,162、162a、162b〜半導體裝置本體電路,Cl、 C3 〜電容器,R、Rl、R2 〜電阻,200、202a、202b 〜VBB產生電路,201、201a、201b〜基板偏壓電壓傳 達線,210、212〜低通濾波器,300〜半導體基板,302 〜P丼,303〜N丼,120〜半導體基板,118〜吸收雜 訊用之偏壓電壓施加領域(N丼或N +雜質領域),H7〜p +雜質領域,119〜N +雜質領域。 ------------π------.^ (請先閲讀背面之注意事項再填寫本頁)(1T line €) 59 Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs A7 B7 V. Illustration of the structure of the (57) Department of Invention. Fig. 14 is a diagram showing the configuration of main parts of a semiconductor device according to a sixth embodiment of the present invention. Fig. 15 is a diagram showing the configuration of main parts of a semiconductor device according to a seventh embodiment of the present invention. Fig. 16 is a diagram showing the configuration of main parts of a semiconductor device according to an eighth embodiment of the present invention. Fig. 17 is a diagram showing the configuration of main parts of a semiconductor device according to a ninth embodiment of the present invention. Fig. 18 is a diagram showing a configuration of a main part of a semiconductor device according to a tenth embodiment of the present invention. Fig. 19 is a diagram showing a configuration of a main part of a semiconductor device according to an eleventh embodiment of the present invention. Fig. 20 is a diagram showing a configuration of a main part of a semiconductor device according to a twelfth embodiment of the present invention. -Fig. 21 is a diagram showing a configuration of a main part of a semiconductor device according to a thirteenth embodiment of the present invention. Fig. 22 is a diagram showing a configuration of a main part of a semiconductor device according to a fourteenth embodiment of the present invention. Fig. 23 is a diagram showing a configuration of a main part of a semiconductor device according to a fifteenth embodiment of the present invention. Fig. 24 is a diagram showing a configuration of a main part of a semiconductor device according to a sixteenth embodiment of the present invention. Figure 25 is a cross-section 60 showing a modified example of the snubber circuit to which the present invention is applied (please read the precautions on the back before filling out this page)-Packing. The size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs A7-. ~~ ___! 7 V. Description of the Invention (58) &quot; ~~ --- Diagram of the structure and electrical equivalent circuit. Fig. 26 is a view showing a specific example of a semiconductor device according to the present invention. FIG. 27 is a diagram showing the structure of a conventional read-out circuit. FIG. 28 is a waveform diagram showing the operation of a conventional output buffer circuit. Fig. 29 is a diagram showing a power supply line of a conventional semiconductor device. FIG. 30 is a diagram for explaining a problem of the configuration shown in FIG. 29. FIG. 31 is a diagram showing a modified example of a conventional semiconductor device. FIG. 32 is a diagram for explaining a problem of the semiconductor device shown in FIG. 31. FIG. * FIG. 33 is a diagram for explaining specific problems of a conventional semiconductor device. FIG. 34 is a diagram showing a modified example of a conventional output buffer circuit. Fig. 35 is a diagram showing a cross-sectional structure of a main part of a semiconductor memory device provided with a wheel-out buffer circuit shown in Fig. 34; FIG. 36 is a diagram for explaining a problem of the semiconductor device shown in FIG. 35. FIG. (Symbol description) 100 to semiconductor devices, 102 to internal circuits, 104 to output circuits, 110 to semiconductor devices, 110c to snubber circuits, 110e to output snubber circuits, 140, 140a to 140f, power supply amplifiers, 142a, 142b, 142d soil 142f ~ power line 'i42c ~ bias power line, 144, 144a soil 144f ~ ground gain increaser, 146a, 146b, 146d to 146f ~ connect 61 1 This paper size applies to Chinese National Standard 1CNS) 4Specifications ⑺〇 &gt; &lt; 297 Gong ^ ------ (Please read the precautions on the back and fill in this page first). Binding. —----- €) A7 ___________B7 V. Description of the invention (59 ) Ground wire, 162, 162a, 162b ~ Semiconductor device circuit, Cl, C3 ~ Capacitor, R, Rl, R2 ~ Resistor, 200, 202a, 202b ~ VBB generating circuit, 201, 201a, 201b ~ substrate bias voltage transmission Line, 210, 212 ~ low-pass filter, 300 ~ semiconductor substrate, 302 ~ P 丼, 303 ~ N 丼, 120 ~ semiconductor substrate, 118 ~ bias voltage application area for noise absorption (N 丼 or N + impurities Field), H7 ~ p + impurity field, 119 ~ N + impurity field. ------------ π ------. ^ (Please read the notes on the back before filling this page)

經濟部中央標準局員工消費合作社印製 62 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)Printed by the Employees' Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs 62

Claims (1)

申叫專利範圍 經濟部中央檩隼局員x 動作電源電壓而動作,纟::™…邊及另一 處理而輪出。 卜複内部電路之❹信號施以 2·—種半導體裝置,備有: 第1電源供給線,用以傳達第1電源電位; 第2電源供給線,用以傳達第2電源電位; 内部電路,令該第!電源供給線上之第】電源電 孩第2電源供給線上之第2電源電位作爲—邊及另一士 動作電源電壓而動作,對饋人之信號加以處理而輸出 具有有放電么値之電容器,結合於該第^電源供多 用 用 以 邊: 緩IThe scope of the application is called the patent scope. The member of the Central Bureau of the Ministry of Economic Affairs x acts on the power supply voltage. The signal of the internal circuit is applied to a 2 · semiconductor device including: a first power supply line for transmitting a first power supply potential; a second power supply line for transmitting a second power supply potential; an internal circuit, Make the first! The first power supply line] The second power supply potential of the second power supply line of the power supply is operated as a side and another driver operating power voltage. The signal fed to the person is processed to output a capacitor with a discharge. The ^ power supply is used for multiple purposes: Slow I I-種半導體裝置,備有: 第=源供給線,用以傳達第1電源電位; 供給線,用以傳達第2電源電位. 内郅電路,令兹敏 ’ 該第2電源供給線上;:供給線上&lt;第1電源電位與 動作電源、電壓而動作,對C-邊及另-邊之 電容聚Λ,. 饋入號加以處理而輸出; 之間;°於麵1電源供給線與第2電源供給線 以傳==給線,電源供給線分開設置, 得運邊第1電源電位; 供給線,與該第2電縣给線分開設置, 傳達該第2電源電;:^質上依交流方式非結合’用 第令㈣3電縣給線上源電位4 该第4電源供給線上泛 動作-Λ第2㈣電位作爲一邊及另 63 本紙張尺度適财國An I-type semiconductor device includes: a first source supply line for transmitting a first power supply potential; a supply line for transmitting a second power supply potential; an internal circuit that causes Zimin 'the second power supply supply line; The supply line &lt; the first power supply potential operates with the operating power supply and voltage, and the capacitors on the C-side and the other-side are connected to each other for processing and output; between; 2 The power supply line is set to pass == the line, and the power supply line is set separately to obtain the first power supply potential; the supply line is set separately from the second power supply line to convey the second power supply; Non-combination in accordance with the method of communication 'using the order of the 3 electric county to the line source potential 4 the fourth power supply line pan action-Λ 2nd potential as one side and the other 63 paper size 申請專利範圍 與第2電碌供給線之間; 經濟部中央標準局員工消費合作社印製 第3電源、供給線,與兹 用以傳達該第1電源電位;1電源供給線分開設置,且 第4電源供給線,擻兮 用以傳達該第2電源電2電源供給線分開設置,且 緩衝電路,今該筮 該第4電療供给線上之第2 線上之第1電源電位與 動作電源、電壓而動作, 二、電位作爲-邊及另-邊之 處理而輪出; '内部電路之輪出信號施以緩衝 在該第3電源供給線與篦 著具有實質上㈣有效電容値㈣給線&lt;間’僅存在 該第3電綠供給線與該第4電生電容器,作爲將 置。 ‘家供給線予以電容耦合之裝 3.—種半導體裝置,備有: 給線’用以傳達第1電線電位; ^電原供給線,用以傳達第2電躁電位;. 郅電路,令該第!電源供给 該莫、、κω 求上又第1電源電位與 邊第2以供給線上&lt;第2_ 動作電碌電壓而動作,對饋入之作2爲-邊及另-. L 了谫入芡乜號加以處理而輸出; 具有有效電容蚊電容器,_ 與第2電源、供給線之間; 逐第1電源供給 第3電源供給線,也該第〗雪,、搭# 用以後n U第1電,原供給線分開設 用乂傳達蔹第1電源電位; 第4電源供給線,與該第2電源、供給線分開設 邊之 .置,J 置 {請先閲讀背面之注意事項再填寫本頁} 裝· 訂 本紙張尺度適用Between the scope of patent application and the second power supply line; the third consumer power supply line printed by the Employees' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs is used to communicate the first power supply potential; the first power supply line is set separately, and the The 4 power supply line is used to convey the second power supply line. The 2 power supply line is separately provided, and the buffer circuit is now the first power supply potential of the second line on the fourth electrotherapy supply line, the operating power supply, and the voltage. Action, two, the potential is rotated out as -side and other-side processing; 'the internal circuit's turn-out signal is buffered in the third power supply line and has a substantially effective capacitance to the line &lt; There are only the third electric green supply line and the fourth electric generating capacitor, which are to be placed. 'Home supply line to be capacitively coupled 3.—A semiconductor device equipped with: a feed line' to communicate the potential of the first wire; ^ Electrogen supply line to communicate the second electric potential; 郅 Circuit, order The first! The power supply, Mo, and ωω are calculated by the first power supply potential and the second. The second line operates on the supply line &lt; 2_ action electric voltage, and acts as the feed-in side and the other. L 谫 入 谫The 加以 number is processed and output; there is an effective capacitance mosquito capacitor between _ and the second power supply and the supply line; the first power supply is supplied to the third power supply line, and the first snow, and take # U after the n first Electricity, the original power supply line is used for opening, and the first power supply potential is transmitted. The fourth power supply line is separated from the second power supply and power supply line. Install, J install {Please read the precautions on the back before filling in this Page} Binding and binding paper size _ 六、申請專利範圍 用以傳達該第2電源電位; 經濟部中央標準局員工消費合作社印製 緩衝電路,令該第3電源 孩第4電源供給線上 果上&lt;第1電源電位與 =作電源、電壓而動作,對該内口:二邊及另, 處理而輪出;及 電路〈輪出信號施以緩衝 具有有效電容値的〇個 給線與該第4電源供給線之間。&quot;〜合於該第3電源供 4.-種半導體裝置,備有: 源供給線,用以傳達第1電源'電位; 電綠供給線’用以傳達第2電源電位. 内部電路’令該第!電源供電 :第2電㈣給線上之第2電源電位作爲 第壓而動作,對饋入之信號加以處理而輪出; 第1絕緣閘型電場效果雷a 通節赴“ 句欢果電卵體,包括:第1及第2導 ’兩者均結合於該第i㈣供 2.電療供給線之I及H茨第 以值! 3電源供給線’與該第1電源供給線分開設置,用 乂傳達蔹第1電源電位; 7棉第4電源供給線’與該第2電源供給線分開設置,用 以傳達該第2電源電位; Γ緩衝電路,令該第3電源供給線上之第1電源電位與 藏第4電源供給線上之第2電源電位作爲一邊及另一邊之 動作電t電壓而動作,對來自該内部電路之輸出信號族以 緩衝處理;及 65 本紙張錢公酱) --1--------^—-*裝__ (請先閎讀背面之注意事項再填寫本頁) 訂 Α8 Β8 C8 D8 經濟部中央標準局員工消費合作社印製 申請專利範圍 、.絕緣閘型電場效果電晶體,包括:第1及第2導 通知點,分別結合於該第3電源供給線;及與該第4電源 供給線電性分離之閘極。 申叫專利範圍第1、2、3或4項之半導體裝置, 更備有: 第1增損器,和該第丨及第3電源供給線共 a, 用以接受自外部饋人之第!電源電位;及 〇 、第^増損器’和該第2及第4電源供給線共通地結合, 用以接丈來自外部之第2電源電位。 更備4專利11圍第1、2、3或4項之半導體裝置’ 自:1増損器,與該第i電源供給線相結合,用 來自外那之第!電源電位,· 换又 =2增損器’與該第2電源供給線㈣合 來自外郅之第2電源電位; 径又 第3增損器’與該第!增損器分 :源供給線相結合,用以接受來自外部之第,電療=3 ,日娲為,興蔹第2增損时刀-叫莰置,且血 電源供給線相結合,用以接受來自外部之第2電= 7.如申請專利範圍第6財半導體μ,_ . 錢衝電路係形成於半導體基板領域内; 隸Ϊ更備有偏壓電源線,其係共通_合於和該第 源供給_合之增損器上,並自該增損器接受該第!_ 6. The scope of the patent application is used to communicate the second power supply potential. The buffering circuit is printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs, so that the third power supply and the fourth power supply line will be &lt; the first power supply potential and the operation. The power supply and the voltage are operated, and the inner port: the two sides and the other, are processed and rotated out; and the circuit (rounded out signal) buffers between 0 supply lines with effective capacitance 値 and the fourth power supply line. &quot; ~ The third power supply 4.-semiconductor device is provided with: a source supply line for transmitting the potential of the first power supply; an electric green supply line for transmitting the potential of the second power supply. Internal circuit 'order The first! Power supply: the second electric potential of the second electric line acts as the first voltage, and processes the fed-in signal to rotate out; the first insulated gate-type electric field effect is to go to the "Juhuan fruit electric egg" Including: The first and second guides are both combined in the "i" supply 2. I and H of the electrotherapy supply line! 3 power supply line 'is set separately from the first power supply line, use 乂The first power supply potential is communicated; the 7th cotton power supply line 4 is provided separately from the second power supply line to communicate the second power supply potential; the Γ buffer circuit enables the first power supply potential on the third power supply line The second potential of the fourth power supply line and the second power source on Tibet are operated as the operating voltage t on one side and the other side, and the output signal family from the internal circuit is buffered; and 65 paper money sauce) --1- ------- ^ —- * 装 __ (Please read the precautions on the back before filling out this page) Order Α8 Β8 C8 D8 Scope of patent application for printing by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs. Type electric field effect transistor, including: first and second guidance notice points, Do not combine it with the third power supply line; and a gate electrode that is electrically separated from the fourth power supply line. The semiconductor device claimed in the patent scope No. 1, 2, 3 or 4 is further equipped with: And a third power supply line, a, for receiving the first! Power supply potential from the external feed; and 0, the third power loss device, and the second and fourth power supply lines in common. It is used to connect the second potential of the power supply from the outside. There are 4 semiconductor devices with patent No. 1, 2, 3, or 4 in the patent. From: 1 damager, combined with the i-th power supply line, The second from the outside! Power supply potential, change = 2 gains 'and the second power supply line combined with the second power supply potential from the outside; the third third gain' and the first! Device points: The combination of source supply lines is used to receive the first from the outside, electrotherapy = 3, the sundial is, the second increase in the loss of the knife-called 莰 set, and the blood power supply line is combined to receive from The second external power = 7. If the patent application scope is the sixth financial semiconductor μ, _. The money red circuit is formed in the field of semiconductor substrates; Biasing power supply line, which based on common _ engaged and the engagement of the second supply source _ loss is increased, and from the increase of the loss accepts! 經濟部中央標準局員工消費合作社印製 電位’而向該半導體基板領域傳達。 8·如申請衫m園第5料半㈣裝置,其中: 該緩衝電路係形成於半導體基板領域内·,且 該電容器具有仙合於分割成第】部分與第2部分之 邊電極,該第1部料合於該第1電源供給線 曰只為,而該第2部分耦合於該内部電路; 並備有偏壓電源線,輕合於該第1電源、供給線之第2 郅分和該半導體基板領域之間,將該第2部分上之第Η 源電位向該半導體基板领域傳達。 9.如申請專利範圍第卜2、3或4項之半導體裝置, 該緩衝電路係形成於半導體基板領域内; 且更備有:低通濾波器;及偏壓電源線,與該第3電 源供給線分開設置,用以將該第i電源電位經由該低通據 波器向該半導體基板領域傳達。 &quot; 10·如申請專利範圍第9項之半導體裝置,其中,該低 通濾波器包含耦合於該偏壓電源線與該第4電源供給線門 11.如申請專利範圍第9項之半導體裝置,其中,該偏 愿電源線係共通耦合於和該第3電源供給線耦合之增損器 上;且該低通濾波器包含連接在參偏壓電源線與該^ 2電 源供給線之間的電容器。 Π.如申請專利範圍第9項之半導體裝置,其中,該偏 壓電源線係電性連接於和該第1電源供給線相連接之辦^ 67 本紙張尺度適用中國國家標準.(CNS ) Α4规格(210X29.7公釐) J 1- - - -...... -- - - :κ、- —i -Λ -- (請先閎讀背面之注意事項再填寫本頁) -訂 六、申請專利範圍 器上;且該低通遽波器包含輕合於該偏壓電源線與該第 電源供給線之間之電容器。 13.如申請專利範圍第9項之半導體裝置,其中,私 有與該第3電源供給線及該第4電源供給線所分別輕人、 增損器分開設置,且接受該第2電源電位之偏増摘器= 低通渡波器包含糕合於該偏壓電源線及該偏、 電容器。 只益間又 14. 如申請專利範園第13項之半導體裝置,、 偏壓電源線係與該第3電源供给線分開設置,且電性= 於該第3電源供給線所耦合之增損器上。 連接 15. 如申請專利範圍第13J頁之半.導體裝置,、 偏壓電源線係耦合在該第i電源供給線及第2電綠俾丄: 各自稱合之增損器分開設置且用以接 、—、' 增損器上。 接又该第1電碌電位之 16.如申請專利範圍第r、2、3或 道 置,其中,該緩衝電路係形成於半導體基板領域:導:裝 第3電賴祕騎於料導體絲料亦 : 源蕾符。 喊第1電 17.如申請專職圍第1、2、3或4項之 置,其中,更備有設於該第3電源供給線及該第體裝 給線之低通料器,該低itm'包含:介插 源供 Γ給線之第1電阻元件^合於該第3電源:2電 第4電源供給線之間的電容器;及介插於該 = 線間之第2電阻元件。 电得、供給 68Employees of the Central Bureau of Standards of the Ministry of Economic Affairs printed the potentials' to the semiconductor substrates. 8 · If you apply for the fifth material and half of the device, the buffer circuit is formed in the field of semiconductor substrates, and the capacitor has a side electrode that is divided into the first part and the second part. One part is connected to the first power supply line, and the second part is coupled to the internal circuit; and a bias power line is provided, which is lightly connected to the second power supply line of the first power and supply line. Between the semiconductor substrate field, the third source potential on the second part is transmitted to the semiconductor substrate field. 9. If the semiconductor device according to claim 2, 3, or 4 of the patent application scope, the buffer circuit is formed in the field of semiconductor substrates; and further includes: a low-pass filter; and a bias power line with the third power source The supply lines are provided separately to communicate the i-th power source potential to the semiconductor substrate field via the low-pass data wave device. &quot; 10. The semiconductor device according to item 9 of the patent application scope, wherein the low-pass filter includes a gate coupled to the bias power line and the fourth power supply line 11. The semiconductor device according to item 9 of the patent application scope Wherein, the preferred power line is commonly coupled to a loss increaser coupled to the third power supply line; and the low-pass filter includes a power supply line connected between the reference bias power line and the ^ 2 power supply line. Capacitor. Π. If the semiconductor device of the scope of application for the patent No. 9 item, wherein the bias power line is electrically connected to the office connected to the first power supply line ^ 67 This paper size applies to Chinese national standards. (CNS) Α4 Specifications (210X29.7mm) J 1--------: κ,--i -Λ-(Please read the precautions on the back before filling this page)-Order 6. The scope of the patent application; and the low-pass chirp includes a capacitor lightly connected between the bias power line and the first power supply line. 13. The semiconductor device according to item 9 of the scope of patent application, wherein the private power supply is separately provided from the third power supply line and the fourth power supply line, and the gain increaser is separately provided, and the bias of the second power supply potential is accepted. Picker = Low-pass filter includes the bias power line and the capacitor. The only benefit is 14. If the semiconductor device of the patent application No. 13 of the patent application, the bias power line is separately provided from the third power supply line, and the electrical property = the increase or loss coupled to the third power supply line Device. Connection 15. For example, the conductor device on page 13J of the scope of the patent application, and the bias power line are coupled to the i-th power supply line and the second electric green line: separate loss increasers are provided and used for Connect, —, 'on the loss increaser. In turn, the first electric potential 16. If the scope of patent application is No. r, 2, 3 or Dao, wherein the buffer circuit is formed in the field of semiconductor substrates: Guide: the third electric relay is mounted on the material conductor wire Material: Yuan Lei Fu. Shout No. 1 17. If you apply for a full-time perimeter item 1, 2, 3, or 4, which includes a low-feeder installed on the third power supply line and the first body supply line, the low itm 'includes: a first resistance element interposed between the source for the Γ supply line, a capacitor coupled between the third power supply: the second power supply line, and a second resistance element interposed between the = lines. Electricity, supply 68 申請專利範圍 18. A8 B8 C8 D8 種半導體裝置,備有 經濟部中央標準局員工消費合作社印製 緩衝電路,形成於半導體基板領域中,/對饋入之信號 施以緩衝處理而輸出; 低通濾波器;及 基板偏壓產生機構,用以產生待施加於該半導體基板 領域之偏壓電壓,介由該低通濾波器而施加於該半導體基 板領域。 19·如申請專利範園第18項之半導體裝置,其中,更 備有:内部電路,形成於和該半導體基板領域分離形成之 第2半導體基板領域,用以處理餚入之信號,將表示該處 理結果之信號向該緩衝電路傳達;該第2半導體基板領域 接受來自該基板偏壓產生機構之由該低通濾波器施行濾波 處理前之電源雜訊。 20. 如申請專利範圍第18項之半導體裝置,其中,更 設有: 内部電路,形成於和該半導體基板領域分離形成之第 2半導體基板領域,用以處理饋入之信號,將表示該處理 結果之信號向該緩衝電路饋入;及 基板偏壓產生機構,與該基板偏壓產生機構分別設 置,用以產生與該偏壓電壓相同電壓位準之偏壓電壓, 施加於該第2半導體基板領域。 21. 如申請專利範圍第7項之半導體裝置,其中,該〜 衝電路係形成於該半導體基板領城内,且形成於受供給和 該第1電源電位不同之偏壓電壓的丼領域&lt;内。 並 緩 請 先 閲 讀 之 注. 事 項 再 t 裝 言Γ 69 本紙張尺度逋用中國國家標準.(CNS ) A4規格(210X297公釐) 六 A8 B8 C8 D8 申请專利範圍 22.如申請專利範圍第7項之半導體裝 衝電路係形成於該半導辦其也·由 星具中邊鲛 、於+導基板領城内’且該半導體基板領 又偏壓至與該第1電源電位不同之偏4電壓。 、23.如申請專利範圍第1、2、3、.4、18、19或2〇 =導體裝置,其中,該半導體裝置包含配置成行列狀 存單元;該内部電路包含自該多數之儲存單元 =擇^存單元,並將該被選擇之儲存單以記憶資料 電路;該緩衝電路包含將由該内部電路讀出之 貧秆丁以輪出至裝置外部的輸出緩衝電路。 24. 如申請專利範園第9項之半導體裝置,其中,該緩 衝電路係形成於該半導體基板領域内,且形成ς受供給和 該第1電源電位不同之偏壓電壓的井領域内。 25. 如申請專利範圍第9項之半導體裝置,其中,該緩 =路:形成於該半導體基板領域内’且該半導體基板領 城係焚偏壓至與該第1電源電位不同之偏壓電壓 26. 如申請專利範圍第16項之半導體裝置,其中該 缓衝電路麵成於料導體妹領域内,㈣ 和該第1電源電位不同之偏壓電壓的并領域内。 27. 如申請專利範圍第16項之半導體裝置,其中,該 缓衝電路係形成於該半導體基板領域内,且該半導 ^ 領城係受偏壓至與該第1電源電位不同之偏壓電114 70 {誇先聞讀背面之注意事項再填寫本頁j .裝· 經濟部中失標準局員工消費合作社印製 中國國家標準.(CNS ) A4規格( 210X297公釐)Patent application scope 18. A8 B8 C8 D8 semiconductor devices with buffer circuits printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs, formed in the field of semiconductor substrates, / buffered input signals and output; low-pass A filter; and a substrate bias generating mechanism for generating a bias voltage to be applied to the semiconductor substrate field and applied to the semiconductor substrate field through the low-pass filter. 19. If the semiconductor device of the patent application No. 18 is applied, it further includes: an internal circuit formed in the second semiconductor substrate field separate from the semiconductor substrate field. The signal used to process the signal will be displayed. The signal of the processing result is transmitted to the buffer circuit; the second semiconductor substrate field receives power noise from the substrate bias generating mechanism before the low-pass filter performs filtering processing. 20. The semiconductor device according to item 18 of the scope of patent application, further comprising: an internal circuit formed in a second semiconductor substrate field separated from the semiconductor substrate field, and used to process the input signal, which indicates the processing. The resulting signal is fed to the buffer circuit; and a substrate bias generating mechanism is provided separately from the substrate bias generating mechanism to generate a bias voltage at the same voltage level as the bias voltage, and is applied to the second semiconductor. Substrate field. 21. The semiconductor device according to item 7 of the scope of patent application, wherein the ~ circuit is formed in the semiconductor substrate collar and is formed in a region &lt; that is supplied with a bias voltage different from the first power supply potential . Please read the note first. Matters to mention 69 69 This paper size adopts the Chinese national standard. (CNS) A4 size (210X297 mm) Six A8 B8 C8 D8 Patent scope 22. If the scope of patent application is the seventh The semiconductor semiconductor circuit is formed in the semiconductor device. It is also formed by the edge of the star, in the + conductive substrate collar ', and the semiconductor substrate collar is biased to a voltage different from the first power supply potential. . 23. If the scope of the patent application is No. 1, 2, 3, .4, 18, 19, or 20 = conductor device, the semiconductor device includes memory cells arranged in rows and columns; the internal circuit includes memory cells from the majority = Select a storage unit, and use the selected storage order as a memory data circuit; the buffer circuit includes an output buffer circuit that rotates the lean stems read out by the internal circuit to the outside of the device. 24. The semiconductor device according to item 9 of the patent application park, wherein the buffer circuit is formed in the field of the semiconductor substrate and formed in a well field receiving a bias voltage different from the first power supply potential. 25. The semiconductor device according to item 9 of the scope of patent application, wherein the slow = road: formed in the semiconductor substrate field 'and the semiconductor substrate collar system is biased to a bias voltage different from the first power source potential 26. For the semiconductor device according to item 16 of the patent application scope, wherein the buffer circuit surface is formed in a field of a material conductor, and a field of a bias voltage having a potential different from that of the first power source. 27. The semiconductor device according to item 16 of the application, wherein the buffer circuit is formed in the field of the semiconductor substrate, and the semiconductor system is biased to a bias voltage different from the first power supply potential. Telegraph 114 70 {Read the precautions on the back before filling in this page j. Install and print the Chinese National Standard. (CNS) A4 size (210X297 mm) by the Consumer Consumption Cooperative of the Bureau of Standards and Loss of the Ministry of Economic Affairs.
TW085101635A 1996-01-25 1996-02-09 Semiconductor device TW382668B (en)

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JP2997241B1 (en) * 1998-07-17 2000-01-11 株式会社半導体理工学研究センター Low switching noise logic circuit
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JP4795670B2 (en) * 2004-06-18 2011-10-19 三星電子株式会社 Shared decoupling capacitance
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JP5175597B2 (en) * 2007-11-12 2013-04-03 エスケーハイニックス株式会社 Semiconductor integrated circuit
JP5552027B2 (en) 2010-11-01 2014-07-16 ルネサスエレクトロニクス株式会社 Semiconductor device
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JP3667855B2 (en) 2005-07-06

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