KR970060478A - Semiconductor device - Google Patents

Semiconductor device Download PDF

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KR970060478A
KR970060478A KR1019970000978A KR19970000978A KR970060478A KR 970060478 A KR970060478 A KR 970060478A KR 1019970000978 A KR1019970000978 A KR 1019970000978A KR 19970000978 A KR19970000978 A KR 19970000978A KR 970060478 A KR970060478 A KR 970060478A
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power supply
supply line
power
potential
coupled
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KR100249991B1 (en
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타카히로 츠루다
카즈타미 아리모토
마사키 츠쿠데
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키타오카 타카시
미쓰비시 덴키 가부시끼가이샤
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/003Modifications for increasing the reliability for protection
    • H03K19/00346Modifications for eliminating interference or parasitic voltages or currents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0218Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of field effect structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • H01L27/11898Input and output buffer/driver structures

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  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computing Systems (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Dram (AREA)
  • Logic Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

버퍼회로의 동작시에 있어서의 전원잡음의 영향을 저감하기 위한 구성에 관한 것으로, 버퍼회로동작시에 발생하는 전원잡음이 다른 내부회로에 영향을 미치는 것을 방지하기 위해, 내부회로(102)와 출력회로(104)에 대해서 별도로 전원선(142a, 142b) 및 접지선 (146a, 146b)를 마련하고, 내부회로의 전원선과 접지선 사이에만 안정화용 캐패시터(CI)을 마련하였다. 이러한 구성으로 하는 것에 의해, 출력회로의 전원선과 접지선의 용량결합이 없어 출력회로동작시에 있어서 전원잡음이 발생하여 그의 전원전압이 저하해도 접지전압의 저하는 발생하지 않고 일정한 전압레벨을 유지할 수 있게 된다.The present invention relates to a configuration for reducing the influence of power supply noise during the operation of the buffer circuit. In order to prevent the power supply noise generated during the operation of the buffer circuit from affecting other internal circuits, the internal circuit 102 and the output are output. The power supply lines 142a and 142b and the ground lines 146a and 146b were separately provided for the circuit 104, and a stabilizing capacitor CI was provided only between the power supply line and the ground line of the internal circuit. With this arrangement, there is no capacitive coupling between the power line and the ground line of the output circuit, so that power noise occurs during the operation of the output circuit, so that even if the power supply voltage decreases, the ground voltage does not decrease and the constant voltage level can be maintained. do.

Description

반도체장치Semiconductor device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명이 적용되는 반도체장치의 전체의 구성을 개략적으로 도시한 단면.1 is a cross-sectional view schematically showing the overall configuration of a semiconductor device to which the present invention is applied.

Claims (25)

제1전원전위를 전달하는 제1전원공급선(142a:142d,142e), 제2전원전위를 전달하는 제2전원공급선(146a:146fb, 146fa, 146e), 상기 제1전원공급선상의 상기 제1전원전위와 상기 제2전원공급선상의 상기 제2전원전위를 한쪽 및 다른쪽 동작전원전위로서 각각 동작시키고 인가된 신호를 처리해서 출력하는 내부회로(102:110b,110c:402,404,408,406,410), 유의(有意, significant)의 용량값을 갖고, 상기 제1전원공급선과 상기 제2전원공급선 사이에 결합되는 캐패시터(C1:C5,C6), 상기 제1전원공급선과는 별도로 마련되어 상기 제1전원전위를 전달하는 제3전원공급선(142b:142f), 상기 제2전원공급선과는 별도로 마련되고 또한 상기 제3전원공급선과 실질적으로 교류적(alternating current manner)으로 비결합상태(non-coupled state)로 되어 상기 제2전원전위를 전달하는 제4전원공급선(146b;146f) 및 상기 제3전원공급선상의 상기 제1전원전위와 상기 제4전원공급선 상의 상기 제2전원전위를 한쪽 및 다른쪽 동작전원전위로서 각각 동작시키고 상기 내부회로의 출력신호를 버퍼처리해서 출력하는 버퍼회로를 포함하는 반도체장치.First power supply lines 142a (142d and 142e) for transmitting a first power potential, second power supply lines (146a: 146fb, 146fa, and 146e) for transmitting a second power potential, and the first on the first power supply line Internal circuits 102: 110b, 110c: 402, 404, 408, 406, 410 that operate the power potential and the second power potential on the second power supply line as one and the other operating power potential, respectively, and process and output an applied signal. capacitor (C1: C5, C6) coupled between the first power supply line and the second power supply line, and provided separately from the first power supply line to transfer the first power potential. Third power supply lines 142b and 142f are provided separately from the second power supply line and are in a non-coupled state substantially alternating with the third power supply line. A fourth power supply line (146b; 146f) for transmitting a second power potential; A buffer circuit for operating the first power potential on the third power supply line and the second power potential on the fourth power supply line as one and the other operating power potential, respectively, and buffering and outputting the output signal of the internal circuit; A semiconductor device. 제1하에 있어서, 상기 제3전원공급선(142b;142f)과 상기 제4전원공급선(146b;146f) 사이에는 상기 유의의 용량값보다 작은 용량값을 갖는 기생용량(Cs)만이 상기 제3전원공급선과 상기 제4전원공급선을 서로 용량결합하는 수단으로서 존재하는 반도체장치.In the first power supply line, only the parasitic capacitance Cs having a capacitance smaller than the significant capacitance is between the third power supply line 142b and 142f and the fourth power supply line 146b and 146f. And the fourth power supply line as means for capacitively coupling each other. 제1항에 있어서, 상기 제3전원공급선(142b;142f)과 상기 제4전원공급선(146b;146f) 사이에 결합되고 상기 유의의 용량값을 갖는 캐패시터의 수는 0개인 반도체장치.2. The semiconductor device of claim 1, wherein the number of capacitors coupled between the third power supply line (142b; 142f) and the fourth power supply line (146b; 146f) and having the significant capacitance value is zero. 제1항에 있어서, 상기 캐패시터(C1;C4,C5)는, 상기 제2전원공급선(146b)에 결합되는 제1 및 제2도통노드와 상기 제1전원공급선(142a)에 결합되는 게이트를 갖는 제1절연게이트형 전계효과 트랜지스터(170a,178a,177a)를 구비하고, 상기 반도체 장치는, 상기 제4전원공급선(146b)에 결합되는 제1 및 제2도통노드와 상기 제4전원공급선(142b)과 전기적으로 분리되는 게이트를 갖는 제2절연게이트형 전계효과 트랜지스터(171b,177b,178b)를 더 포함하는 반도체장치.2. The capacitor of claim 1, wherein the capacitors C1, C4, and C5 have first and second conductive nodes coupled to the second power supply line 146b, and gates coupled to the first power supply line 142a. A first insulated gate field effect transistor (170a, 178a, 177a), and the semiconductor device includes first and second conductive nodes coupled to the fourth power supply line (146b) and the fourth power supply line (142b). And a second insulated gate field effect transistor (171b, 177b, 178b) having a gate electrically separated from each other. 제1항에 있어서, 상기 제1 및 제3전원공급선이 공통으로 결합되고 또한 외부에서 인가되는 제1전원전위를 받는 제1패드(140)와, 상기 제2 및 제4전원공급선이 공통으로 결합되고 또한 외부로부터 인가되는 제2전원전위를 받는 제2패드(144)를 더 포함하는 반도체장치.According to claim 1, wherein the first and the third power supply line is commonly coupled and the first pad 140 receives a first power potential applied from the outside, and the second and fourth power supply line is commonly coupled And a second pad (144) receiving a second power potential applied from the outside. 제1항에 있어서, 상기 제1전원공급선(142;142d;142e)이 결합되고 또한 외부로부터 인가되는 제1전원전위를 받는 제1패드(140a;140d,140c), 상기 제2전원공급선이 결합되고 또한 외부로부터 인가되는 제2전원전위를 받는 제2패드(144a;144d,144e), 상기 제1패드와는 별도로 마련되고 상기 제3전원공급선(142b,142f)이 결합되며 또한 외부로부터 인가되는 제1전원전위를 받는 제3패드(140b;140f) 및 상기 제2패드와는 별도로 마련되고 상기 제4전원공급선이 결합되며 또한 외부로부터 인가되는 제2전원전위를 받는 제4패드(144b;144f)를 더 포함하는 반도체장치.The method of claim 1, wherein the first power supply line (142; 142d; 142e) is coupled to the first pad (140a; 140d, 140c) receiving a first power potential applied from the outside, the second power supply line is coupled And second pads (144a; 144d and 144e) receiving second power potentials applied from the outside, provided separately from the first pads, and coupled to the third power supply lines (142b and 142f) and applied from the outside. Third pads 140b and 140f receiving a first power potential and fourth pads 144b and 144f provided separately from the second pad and coupled to the fourth power supply line and receiving a second power potential applied from the outside. A semiconductor device further comprising). 제6항에 있어서, 상기 버퍼회로(104)는 반도체 기판영역(118;113d)상에 형성되고, 상기 반도체 장치는, 상기 제1전원공급선(142a)이 결합되는 패드에 공통으로 결합되고, 상기 패드에서 상기 제1전원전위를 받아서 이를 상기 반도체 기판영역으로 전달하는 바이어스전원선(142d)을 더 포함하는 반도체장치.The semiconductor device of claim 6, wherein the buffer circuit 104 is formed on the semiconductor substrate regions 118 and 113d, and the semiconductor device is commonly coupled to a pad to which the first power supply line 142a is coupled. And a bias power line (142d) for receiving the first power potential from a pad and transferring it to the semiconductor substrate region. 재5항에 있어서, 상기 버퍼회로(104)는 반도체 기판영역(118;113d)상에 형성되고, 또한 상기 캐패시터(CI)는 상기 패드에 결합되는 제1부분(142aa)과 상기 내부회로(102)에 결합되는 제2부분(142ab)으로 분할하는 노드(NA)에 결합되는 한쪽 전극을 갖고, 상기 반도체 장치는, 상기 제1전원공급선의 상기 제2부분과 상기 반도체 기판영역 사이에 결합되고, 상기 제2부분상의 상기 제1전원전위를 상기 반도체 기판영역으로 전달하는 바이어스전원선(142c)을 더 포함하는 반도체장치.5. The buffer circuit (104) of claim 5, wherein the buffer circuit (104) is formed on the semiconductor substrate regions (118 and 113d), and the capacitor (CI) is coupled to the pad and the first portion (142aa) and the internal circuit (102). Has one electrode coupled to a node NA divided into a second portion 142ab coupled to the semiconductor device, the semiconductor device is coupled between the second portion of the first power supply line and the semiconductor substrate region, And a bias power line (142c) for transferring said first power potential on said second portion to said semiconductor substrate region. 제1항에 있어서, 상기 버퍼회로(104)는 반도체 기판영역(118;113d)상에 형성되고, 상기 반도체 장치는 로우패스필터(R,C3;R1,C4), 상기 제3전원공급선(142b)과는 별도로 마련되고, 상기 제1전원전위를 상기 로우패스필터를 거쳐서 상기 반도체 기판영역으로 전달하는 바이어스 전원선(142c)을 더 포함하는 반도체장치.The semiconductor device of claim 1, wherein the buffer circuit 104 is formed on the semiconductor substrate regions 118 and 113d, and the semiconductor device includes a low pass filter (R, C3; R1, C4) and the third power supply line 142b. And a bias power supply line (142c) for providing the first power supply potential to the semiconductor substrate region through the low pass filter. 제9항에 있어서, 상기 로우패스필터(R,C3)는 상기 바이어스 전원선(142c)과 상기 제4전원공급선(146b)사이에 결합되는 캐패시터(C3;C4)를 포함하는 반도체장치.10. The semiconductor device of claim 9, wherein the low pass filter (R, C3) includes a capacitor (C3; C4) coupled between the bias power line (142c) and the fourth power supply line (146b). 제9항에 있어서, 상기 바이어스전원선(142c)은 상기 제3전원공급선(142b)이 결합되는 패드(140;140b)에 공통으로 결합되고, 또한 상기 로우패스필터(R,C3)는 상기 바이어스전원선과 상기 제2전원공급선(146i)사이에 결합되는 캐패시터(C3)를 포함하는 반도체장치.The method of claim 9, wherein the bias power line 142c is commonly coupled to the pads 140 and 140b to which the third power supply line 142b is coupled, and the low pass filters R and C3 are biased. And a capacitor (C3) coupled between a power line and the second power supply line (146i). 제9항에 있어서, 상기 바이어스전원선(142c)은 상기 제1전원공급선(142b)이 접속되는 패드(140a)에 전기적으로 접속되고, 상기 로우패스필터(C3,R)는 상기 바이어스전원선과 상기 제2전원공급선(146a)사이에 결합되는 캐패시터(C3)를 포함하는 반도체장치.The bias power supply line 142c is electrically connected to a pad 140a to which the first power supply line 142b is connected, and the low pass filters C3 and R are connected to the bias power supply line. A semiconductor device comprising a capacitor (C3) coupled between the second power supply line (146a). 제9항에 있어서, 상기 제3전원공급선(146a) 및 상기 제4전원공급선(140b) 각각이 결합되는 패드(140,144;140a,140b,144a,144b)와는 별도로 마련되고 상기 제2전원전위를 받는 바이어스패드(144c)를 더 포함하고, 상기 로우패스필터(R,C3)는 상기 바이어스전원선(142c)과 상기 바이어스패드 사이에 결합되는 캐패시터(C3)를 포함하는 반도체장치.10. The method of claim 9, wherein the third power supply line 146a and the fourth power supply line 140b are respectively provided separately from the pads 140, 144; 140a, 140b, 144a, and 144b to be coupled and receive the second power potential. And a bias pad (144c), wherein the low pass filter (R, C3) includes a capacitor (C3) coupled between the bias power line (142c) and the bias pad. 제13항에 있어서, 상기 바이어스전원선(142c)은 상기 제3전원공급선(146b)과는 별도로 마련되고 또한 상기 제3전원공급선이 결합되는 패드(140)에 전기적으로 접속되는 반도체장치.The semiconductor device according to claim 13, wherein the bias power line (142c) is provided separately from the third power supply line (146b) and electrically connected to a pad (140) to which the third power supply line is coupled. 제13항에 있어서, 상기 바이어스전원선(142c)은 상기 제1 및 제3전원공급선(146a,142b)이 결합되는 패드(140a,140b)와는 별도로 마련되고 또한 상기 제1전원전위를 받는 패드(140c)에 결합되는 반도체장치.The pad of claim 13, wherein the bias power line 142c is provided separately from the pads 140a and 140b to which the first and third power supply lines 146a and 142b are coupled and receives the first power potential. A semiconductor device coupled to 140c). 제1항에 있어서, 상기 버퍼회로(104)는 반도체 기판영역(118;113d)상에 형성되고, 상기 제3전원공급선(142b)은 상기 반도체 기판영역에 대해서도 상기 제1전원전위를 공급하는 반도체장치.The semiconductor device of claim 1, wherein the buffer circuit 104 is formed on the semiconductor substrate regions 118 and 113d, and the third power supply line 142b supplies the first power potential to the semiconductor substrate region. Device. 제16항에 있어서, 상기 제3전원공급선(146b) 및 상기 제4전원공급선(146b)에 마련되는 로우패스필터(C4,R1,R2)를 더 포함하고, 상기 로우패스필터는 상기 제3전원공급선에 삽입되는 제1저항소자(R1), 상기 제3전원공급선과 상기 제4전원공급선 사이에 결합되는 캐패시터(C4) 및 상기 제4전원공급선에 삽입되는 제2저항소자(R2)를 포함하는 반도체장치.The method of claim 16, further comprising a low pass filter (C4, R1, R2) provided in the third power supply line (146b) and the fourth power supply line (146b), the low pass filter is the third power source And a first resistor element R1 inserted into a supply line, a capacitor C4 coupled between the third power supply line and the fourth power supply line, and a second resistor element R2 inserted into the fourth power supply line. Semiconductor device. 반도체 기판영역에 형성되고 인가된 신호를 버퍼처리해서 출력하는 버퍼회로(104), 로우패스필터(210;212) 및 상기 반도체 기판영역에 인가될 바이어스전위를 발생해서 상기 로우패스필터를 거쳐서 상기 반도체 기판영역으로 인가하는 기판바이어스 발생수단(200;202a,202b) 을 포함하는 반도체장치.A buffer circuit 104, a low pass filter 210; 212, and a bias potential to be applied to the semiconductor substrate region are generated by buffering and outputting a signal formed in the semiconductor substrate region and passing through the low pass filter. A semiconductor device comprising substrate bias generating means (200; 202a, 202b) applied to a substrate region. 제18항에 있어서, 상기 반도체 기판영역과 분리해서 형성되는 제2반도체 기판영역(130)에 형성되고 인가된 신호를 처리해서 이 처리결과를 나타내는 신호를 상기 버퍼회로로 전달하는 내부회로(102;110b,110d)를 더 포함하고, 상기 제2반도체 기판영역은 상기 기판바이어스 발생수단(200;202b)으로부터의 상기 로우패스필터에 의한 필터처리전의 바이어스전위를 받는 반도체장치.19. An internal circuit (102) according to claim 18, further comprising: an internal circuit (102) for processing a signal formed in and applied to a second semiconductor substrate region (130) formed separately from said semiconductor substrate region to transfer a signal representing the processing result to said buffer circuit; 110b and 110d, wherein the second semiconductor substrate region receives a bias potential before the filter process by the low pass filter from the substrate bias generating means (200; 202b). 제18항에 있어서, 상기 반도체 기판영역(118;113d,302)과 분리해서 형성되는 제2반도체 기판영역(130)에 형성되고 인가된 신호를 처리해서 이 처리결과를 나타내는 신호를 상기 버퍼회로로 인가하는 내부회로(102)및 상기 기판바이어스 발생수단(202a)과는 별도로 마련되고 상기 바이어스전위와 동일한 전위레벨의 바이어스 전위를 발생해서 상기 제2반도체 기판영역에 인가하는 기판바이어스 발생수단(202b)을 더 포함하는 반도체장치.19. The signal according to claim 18, wherein a signal formed in the second semiconductor substrate region 130 formed separately from the semiconductor substrate regions 118, 113d, and 302 is applied to process the applied signal to the buffer circuit. The substrate bias generating means 202b, which is provided separately from the internal circuit 102 and the substrate bias generating means 202a to apply, generates a bias potential having the same potential level as the bias potential and applies it to the second semiconductor substrate region. A semiconductor device further comprising. 제1항에 있어서, 상기 버퍼회로(104)는 반도체 기판영역(118)상에 형성되고 또한 상기 제1전원전위와는 다른 바이어스전위가 공급되는 웰영역(117)내에 형성되며, 상기 반도체 기판영역에는 상기 제1전원전위가 공급되는 반도체장치.The semiconductor substrate region of claim 1, wherein the buffer circuit 104 is formed on a semiconductor substrate region 118 and is formed in a well region 117 to which a bias potential different from the first power source potential is supplied. The semiconductor device is supplied with the first power potential. 제1항에 있어서, 상기 버퍼회로(104)는 반도체 기판영역(113d)내에 형성되고 또한 상기 반도체 기판영역은 상기 제1전원전위와는 다른 바이어스전위로 바이어스되며 또한 제1전원전위가 공급되는 영역(118)을 구비하는 반도체장치.The semiconductor device according to claim 1, wherein the buffer circuit 104 is formed in the semiconductor substrate region 113d and the semiconductor substrate region is biased with a bias potential different from the first power potential and is supplied with the first power potential. A semiconductor device comprising 118. 제1항에 있어서, 행열형상으로 배열되는 여러개의 메모리셀(102a;406)을 더 포함하고, 상기 내부회로(102;404,408,410)는 상기 여러개의 메모리셀에서 어느 메모리셀을 선택하고 이 선택된 메모리셀의 기억데이타를 리드하는 회로(102b;404)를 포함하고, 상기 버퍼회로(104;400)는 상기 내부회로에 의해 리드된 데이타를 장치외부로 출력하는 출력버퍼회로(104;400)를 구비하는 반도체장치.The memory device of claim 1, further comprising a plurality of memory cells (102a; 406) arranged in a row shape, wherein the internal circuits (102; 404, 408, 410) select a memory cell from the plurality of memory cells and select the selected memory cell. A circuit (102b; 404) for reading the stored data of the buffer circuit; and the buffer circuit (104; 400) includes an output buffer circuit (104; 400) for outputting data read by the internal circuit to the outside of the apparatus. Semiconductor device. 제21항에 있어서, 상기 바이어스전위를 발생하고 이 바이어스전위를 로우 패스 필터(210;212)를 거쳐서 상기 웰영역(117)에 공급하는 수단(200;202b)을 더 포함하는 반도체장치.22. The semiconductor device of claim 21, further comprising means (200; 202b) for generating the bias potential and supplying the bias potential to the well region (117) via a low pass filter (210; 212). 제22항에 있어서, 상기 바이어스전위를 발생하고 이 바이어스전위를 로우 패스 필터(210;212)를 거쳐서 상기 반도체 기판 영역(113d)에 공급하는 수단(200;202b)을 더 포함하는 반도체장치.23. The semiconductor device of claim 22, further comprising means (200; 202b) for generating the bias potential and supplying the bias potential to the semiconductor substrate region (113d) via a low pass filter (210; 212). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019970000978A 1996-01-25 1997-01-15 Output buffer circuit in a semiconductor device KR100249991B1 (en)

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