TW357396B - Exposure device - Google Patents

Exposure device

Info

Publication number
TW357396B
TW357396B TW086117483A TW86117483A TW357396B TW 357396 B TW357396 B TW 357396B TW 086117483 A TW086117483 A TW 086117483A TW 86117483 A TW86117483 A TW 86117483A TW 357396 B TW357396 B TW 357396B
Authority
TW
Taiwan
Prior art keywords
location
symbol
base
plate
detection
Prior art date
Application number
TW086117483A
Other languages
English (en)
Inventor
Masanori Kato
Original Assignee
Nicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP9017647A external-priority patent/JPH10208990A/ja
Priority claimed from JP1764897A external-priority patent/JP4029134B2/ja
Application filed by Nicon Corp filed Critical Nicon Corp
Application granted granted Critical
Publication of TW357396B publication Critical patent/TW357396B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
TW086117483A 1997-01-17 1997-11-22 Exposure device TW357396B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9017647A JPH10208990A (ja) 1997-01-17 1997-01-17 露光装置
JP1764897A JP4029134B2 (ja) 1997-01-17 1997-01-17 投影露光装置

Publications (1)

Publication Number Publication Date
TW357396B true TW357396B (en) 1999-05-01

Family

ID=26354206

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086117483A TW357396B (en) 1997-01-17 1997-11-22 Exposure device

Country Status (3)

Country Link
US (1) US5978069A (zh)
KR (1) KR19980070407A (zh)
TW (1) TW357396B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3466893B2 (ja) * 1997-11-10 2003-11-17 キヤノン株式会社 位置合わせ装置及びそれを用いた投影露光装置
WO1999034416A1 (fr) * 1997-12-26 1999-07-08 Nikon Corporation Appareil d'exposition par projection et procede d'exposition
KR20010058688A (ko) * 1999-12-30 2001-07-06 황인길 스테퍼의 렌즈 배율 자동 조정 장치
EP1182509B1 (en) * 2000-08-24 2009-04-08 ASML Netherlands B.V. Lithographic apparatus, calibration method thereof and device manufacturing method
US7289212B2 (en) * 2000-08-24 2007-10-30 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufacturing thereby
US7561270B2 (en) * 2000-08-24 2009-07-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
TW527526B (en) 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6768539B2 (en) * 2001-01-15 2004-07-27 Asml Netherlands B.V. Lithographic apparatus
US6525805B2 (en) * 2001-05-14 2003-02-25 Ultratech Stepper, Inc. Backside alignment system and method
JP4164414B2 (ja) * 2003-06-19 2008-10-15 キヤノン株式会社 ステージ装置
DE102008004762A1 (de) * 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
NL2009196A (en) * 2011-08-25 2013-02-27 Asml Netherlands Bv Position measurement system, lithographic apparatus and device manufacturing method.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4814830A (en) * 1985-04-01 1989-03-21 Canon Kabushiki Kaisha Flat panel display device and manufacturing of the same
US4943733A (en) * 1987-05-15 1990-07-24 Nikon Corporation Projection optical apparatus capable of measurement and compensation of distortion affecting reticle/wafer alignment
US5734478A (en) * 1988-10-12 1998-03-31 Nikon Corporation Projection exposure apparatus
US5486896A (en) * 1993-02-19 1996-01-23 Nikon Corporation Exposure apparatus
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置

Also Published As

Publication number Publication date
KR19980070407A (ko) 1998-10-26
US5978069A (en) 1999-11-02

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees