TW357284B - Method for bonding a pellicle onto a body to be protected, the protected body with the pellicle thus obtained, pellicle for ultraviolet ray and a case for use in a pellicle - Google Patents

Method for bonding a pellicle onto a body to be protected, the protected body with the pellicle thus obtained, pellicle for ultraviolet ray and a case for use in a pellicle

Info

Publication number
TW357284B
TW357284B TW087101668A TW87101668A TW357284B TW 357284 B TW357284 B TW 357284B TW 087101668 A TW087101668 A TW 087101668A TW 87101668 A TW87101668 A TW 87101668A TW 357284 B TW357284 B TW 357284B
Authority
TW
Taiwan
Prior art keywords
pellicle
protected
unit
bonding
onto
Prior art date
Application number
TW087101668A
Other languages
English (en)
Inventor
Takamasa Tsumoto
Shigeto Shigematsu
Hiroaki Nakagawa
Masahiro Kondo
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP02907397A external-priority patent/JP4112649B2/ja
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of TW357284B publication Critical patent/TW357284B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
TW087101668A 1997-02-10 1998-02-09 Method for bonding a pellicle onto a body to be protected, the protected body with the pellicle thus obtained, pellicle for ultraviolet ray and a case for use in a pellicle TW357284B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2622597 1997-02-10
JP02907397A JP4112649B2 (ja) 1997-02-13 1997-02-13 紫外線用ペリクルおよびペリクル用ケース

Publications (1)

Publication Number Publication Date
TW357284B true TW357284B (en) 1999-05-01

Family

ID=26363968

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087101668A TW357284B (en) 1997-02-10 1998-02-09 Method for bonding a pellicle onto a body to be protected, the protected body with the pellicle thus obtained, pellicle for ultraviolet ray and a case for use in a pellicle

Country Status (5)

Country Link
EP (1) EP0893736A4 (zh)
KR (1) KR20000064877A (zh)
CA (1) CA2251550A1 (zh)
TW (1) TW357284B (zh)
WO (1) WO1998035270A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544693B2 (en) 2001-01-26 2003-04-08 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle
US6593035B1 (en) 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
KR101164460B1 (ko) * 2006-04-07 2012-07-18 신에쓰 가가꾸 고교 가부시끼가이샤 리소그래피용 펠리클
JP2008065258A (ja) * 2006-09-11 2008-03-21 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
KR100928505B1 (ko) * 2007-10-22 2009-11-26 주식회사 동부하이텍 반도체 소자 제작 방법 및 장치
EP2592123B1 (en) * 2010-07-09 2020-02-19 Mitsui Chemicals, Inc. Pellicle and mask adhesive agent for use in same
JP6150300B2 (ja) 2014-04-04 2017-06-21 信越化学工業株式会社 ペリクルの貼り付け部確認方法
GB2534404A (en) * 2015-01-23 2016-07-27 Cnm Tech Gmbh Pellicle

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772793B2 (ja) * 1986-09-05 1995-08-02 三井石油化学工業株式会社 ペリクル
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
JPH0442156A (ja) * 1990-06-08 1992-02-12 Daicel Chem Ind Ltd ペリクル
JPH04237056A (ja) * 1991-01-21 1992-08-25 Daicel Chem Ind Ltd ペリクル
JPH0667409A (ja) * 1992-08-21 1994-03-11 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル

Also Published As

Publication number Publication date
WO1998035270A1 (fr) 1998-08-13
EP0893736A4 (en) 2000-06-28
EP0893736A1 (en) 1999-01-27
CA2251550A1 (en) 1998-08-13
KR20000064877A (ko) 2000-11-06

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