TW347484B - Phase shift mask and method for manufacturing the same - Google Patents

Phase shift mask and method for manufacturing the same

Info

Publication number
TW347484B
TW347484B TW086105551A TW86105551A TW347484B TW 347484 B TW347484 B TW 347484B TW 086105551 A TW086105551 A TW 086105551A TW 86105551 A TW86105551 A TW 86105551A TW 347484 B TW347484 B TW 347484B
Authority
TW
Taiwan
Prior art keywords
phase shift
shift mask
manufacturing
same
region
Prior art date
Application number
TW086105551A
Other languages
English (en)
Inventor
Shin In-Kyun
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Application granted granted Critical
Publication of TW347484B publication Critical patent/TW347484B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW086105551A 1996-06-29 1997-04-28 Phase shift mask and method for manufacturing the same TW347484B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960025926A KR100219485B1 (ko) 1996-06-29 1996-06-29 위상반전 마스크 및 그 제조방법

Publications (1)

Publication Number Publication Date
TW347484B true TW347484B (en) 1998-12-11

Family

ID=19464815

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086105551A TW347484B (en) 1996-06-29 1997-04-28 Phase shift mask and method for manufacturing the same

Country Status (4)

Country Link
US (1) US5814424A (zh)
JP (1) JP3998756B2 (zh)
KR (1) KR100219485B1 (zh)
TW (1) TW347484B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100429860B1 (ko) * 1997-05-27 2004-06-16 삼성전자주식회사 교번형 위상반전 마스크 및 그 제조방법
KR100393230B1 (ko) * 2001-08-16 2003-07-31 삼성전자주식회사 잔막율을 조절할 수 있는 포토레지스트 패턴의 형성방법
JP2003114514A (ja) * 2001-10-02 2003-04-18 Sharp Corp マスクを用いたパターンの転写方法、ハーフトーンマスク、及びその製造方法、並びに回路基板の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04269750A (ja) * 1990-12-05 1992-09-25 American Teleph & Telegr Co <Att> 離隔特徴をフォトレジスト層に印刷する方法
US5418095A (en) * 1993-01-21 1995-05-23 Sematech, Inc. Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process
KR0151427B1 (ko) * 1994-03-04 1999-02-18 문정환 위상 반전마스크 및 그의 제조방법

Also Published As

Publication number Publication date
JP3998756B2 (ja) 2007-10-31
KR980005324A (ko) 1998-03-30
JPH1069061A (ja) 1998-03-10
US5814424A (en) 1998-09-29
KR100219485B1 (ko) 1999-09-01

Similar Documents

Publication Publication Date Title
AU629059B2 (en) Trilevel performance gas generator
DK0960109T3 (da) Fremgangsmåde til fremstilling af tolterodin
EA199700170A1 (ru) Способ получения некоторых азациклогексапетидов
EP0395425A3 (en) Mask, mask producing method and pattern forming method using mask
AU2434997A (en) Optical female urethroscope
AP9400666A0 (en) Benzofuran derivatives.
EP0675550A3 (en) Light-transparent, electrically conductive oxide layer and its manufacturing processes.
MXPA03005230A (es) Lente de contacto con patron de iris opaco.
EP0643331A3 (en) Halftone phase shift mask, halftone blank phase shift mask and method of manufacturing the blank mask.
TW365654B (en) Electronic device phase shift mask and method using the same
WO1997001127A3 (en) Backprojection transparency viewer
AU6658896A (en) Dehydration of primary alcohols
TW337556B (en) Phase shifting light shade, the phase shifting light shade frame and its manufacturing method
FI98770B (fi) Hierarkkinen synkronointimenetelmä
EP0475694A3 (en) Optical mask using phase shift and method of producing the same
AUPN134395A0 (en) Ocean wave producing means
DE69529457D1 (de) Hierarchisches synchronisierungsverfahren
WO2000024920A3 (de) VERFAHREN ZUR GEWINNUNG VON η-DECALACTON
GB9604275D0 (en) Well jar accelerator with expansion chamber
AU1096397A (en) Boiler with fast steam generation
DE69620605D1 (de) Hydromechanisches getriebe
EP0812956A4 (en) HIGH QUALITY PAPER AND MANUFACTURING METHOD THEREOF
EP0640642A3 (en) Process for the preparation of polydimethylsiloxanes.
TW347484B (en) Phase shift mask and method for manufacturing the same
NO960510L (no) Fremgangsmåte for å fremstille små, diskrete, sfæriske addukter

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees