TW287314B - - Google Patents

Info

Publication number
TW287314B
TW287314B TW083110217A TW83110217A TW287314B TW 287314 B TW287314 B TW 287314B TW 083110217 A TW083110217 A TW 083110217A TW 83110217 A TW83110217 A TW 83110217A TW 287314 B TW287314 B TW 287314B
Authority
TW
Taiwan
Application number
TW083110217A
Other languages
Chinese (zh)
Original Assignee
Shinetsu Chem Ind Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chem Ind Co filed Critical Shinetsu Chem Ind Co
Application granted granted Critical
Publication of TW287314B publication Critical patent/TW287314B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
TW083110217A 1994-04-26 1994-11-04 TW287314B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8839094A JPH07297265A (ja) 1994-04-26 1994-04-26 静電チャック

Publications (1)

Publication Number Publication Date
TW287314B true TW287314B (sv) 1996-10-01

Family

ID=13941474

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083110217A TW287314B (sv) 1994-04-26 1994-11-04

Country Status (3)

Country Link
JP (1) JPH07297265A (sv)
KR (1) KR950034652A (sv)
TW (1) TW287314B (sv)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7042697B2 (en) 2000-05-19 2006-05-09 Ngk Insulators, Ltd. Electrostatic chucks and electrostatically attracting structures

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09260474A (ja) * 1996-03-22 1997-10-03 Sony Corp 静電チャックおよびウエハステージ
CN1127750C (zh) 1996-12-27 2003-11-12 佳能株式会社 减少电荷的薄膜,图象形成装置及其制造方法
JP4236292B2 (ja) 1997-03-06 2009-03-11 日本碍子株式会社 ウエハー吸着装置およびその製造方法
JPH11214491A (ja) * 1998-01-22 1999-08-06 Toshiba Ceramics Co Ltd ウエハ保持装置及びその製造方法
JPH11209182A (ja) * 1998-01-22 1999-08-03 Sumitomo Metal Ind Ltd プラズマ耐食部材
WO1999059201A1 (en) * 1998-05-11 1999-11-18 Applied Materials Inc Polished ceramic chuck for low backside particles in semiconductor plasma processing
WO2001013423A1 (fr) * 1999-08-10 2001-02-22 Ibiden Co., Ltd. Plaque ceramique pour dispositif de production de semi-conducteurs
JP4529690B2 (ja) * 2000-01-20 2010-08-25 住友電気工業株式会社 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置
JP2002057207A (ja) * 2000-01-20 2002-02-22 Sumitomo Electric Ind Ltd 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置
JP4272786B2 (ja) * 2000-01-21 2009-06-03 トーカロ株式会社 静電チャック部材およびその製造方法
JP3808286B2 (ja) * 2000-06-07 2006-08-09 住友大阪セメント株式会社 静電チャック
JP3693895B2 (ja) 2000-07-24 2005-09-14 住友大阪セメント株式会社 可撓性フィルムの静電吸着装置、可撓性フィルムの静電吸着方法、可撓性フィルムの表面処理方法
KR20020064508A (ko) * 2001-02-02 2002-08-09 삼성전자 주식회사 정전 척
JP4493251B2 (ja) 2001-12-04 2010-06-30 Toto株式会社 静電チャックモジュールおよび基板処理装置
DE10232080B4 (de) * 2002-07-15 2015-10-01 Integrated Dynamics Engineering Gmbh Elektrostatischer Greifer und Verfahren zu dessen Herstellung
EP1676309A1 (en) * 2003-10-09 2006-07-05 SNT Co., Ltd. Electro-static chuck with non-sintered aln and a method of preparing the same
JP2007150351A (ja) * 2007-02-15 2007-06-14 Toto Ltd 静電チャック
JP5270310B2 (ja) * 2008-11-13 2013-08-21 東京エレクトロン株式会社 静電チャック及び基板処理装置
JP2010166086A (ja) * 2010-04-12 2010-07-29 Fujitsu Semiconductor Ltd 静電チャックを用いた半導体製造装置
JP2010177698A (ja) * 2010-04-12 2010-08-12 Fujitsu Semiconductor Ltd 静電チャックの製造方法
JP6038698B2 (ja) 2013-03-22 2016-12-07 日本碍子株式会社 セラミックス部材及び半導体製造装置用部材
WO2015080135A1 (ja) * 2013-11-29 2015-06-04 株式会社東芝 プラズマ装置用部品及びその製造方法
JP5926870B1 (ja) 2014-09-16 2016-05-25 日本碍子株式会社 セラミック構造体、基板保持装置用部材及びセラミック構造体の製法
JP7140183B2 (ja) * 2018-02-20 2022-09-21 住友大阪セメント株式会社 静電チャック装置および静電チャック装置の製造方法
KR102632768B1 (ko) * 2019-06-28 2024-02-01 엔지케이 인슐레이터 엘티디 웨이퍼 배치대
US20230245918A1 (en) * 2020-07-13 2023-08-03 Kyocera Corporation Sample holder

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7042697B2 (en) 2000-05-19 2006-05-09 Ngk Insulators, Ltd. Electrostatic chucks and electrostatically attracting structures

Also Published As

Publication number Publication date
JPH07297265A (ja) 1995-11-10
KR950034652A (ko) 1995-12-28

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