TW287314B - - Google Patents
Info
- Publication number
- TW287314B TW287314B TW083110217A TW83110217A TW287314B TW 287314 B TW287314 B TW 287314B TW 083110217 A TW083110217 A TW 083110217A TW 83110217 A TW83110217 A TW 83110217A TW 287314 B TW287314 B TW 287314B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
- H10P72/722—Details of electrostatic chucks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8839094A JPH07297265A (ja) | 1994-04-26 | 1994-04-26 | 静電チャック |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW287314B true TW287314B (ca) | 1996-10-01 |
Family
ID=13941474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW083110217A TW287314B (ca) | 1994-04-26 | 1994-11-04 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH07297265A (ca) |
| KR (1) | KR950034652A (ca) |
| TW (1) | TW287314B (ca) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7042697B2 (en) | 2000-05-19 | 2006-05-09 | Ngk Insulators, Ltd. | Electrostatic chucks and electrostatically attracting structures |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09260474A (ja) * | 1996-03-22 | 1997-10-03 | Sony Corp | 静電チャックおよびウエハステージ |
| CN1127750C (zh) | 1996-12-27 | 2003-11-12 | 佳能株式会社 | 减少电荷的薄膜,图象形成装置及其制造方法 |
| JP4236292B2 (ja) * | 1997-03-06 | 2009-03-11 | 日本碍子株式会社 | ウエハー吸着装置およびその製造方法 |
| JPH11209182A (ja) * | 1998-01-22 | 1999-08-03 | Sumitomo Metal Ind Ltd | プラズマ耐食部材 |
| JPH11214491A (ja) * | 1998-01-22 | 1999-08-06 | Toshiba Ceramics Co Ltd | ウエハ保持装置及びその製造方法 |
| WO1999059201A1 (en) * | 1998-05-11 | 1999-11-18 | Applied Materials Inc | Polished ceramic chuck for low backside particles in semiconductor plasma processing |
| US6717116B1 (en) | 1999-08-10 | 2004-04-06 | Ibiden Co., Ltd. | Semiconductor production device ceramic plate |
| JP2002057207A (ja) * | 2000-01-20 | 2002-02-22 | Sumitomo Electric Ind Ltd | 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置 |
| JP4529690B2 (ja) * | 2000-01-20 | 2010-08-25 | 住友電気工業株式会社 | 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置 |
| JP4272786B2 (ja) * | 2000-01-21 | 2009-06-03 | トーカロ株式会社 | 静電チャック部材およびその製造方法 |
| JP3808286B2 (ja) * | 2000-06-07 | 2006-08-09 | 住友大阪セメント株式会社 | 静電チャック |
| JP3693895B2 (ja) | 2000-07-24 | 2005-09-14 | 住友大阪セメント株式会社 | 可撓性フィルムの静電吸着装置、可撓性フィルムの静電吸着方法、可撓性フィルムの表面処理方法 |
| KR20020064508A (ko) * | 2001-02-02 | 2002-08-09 | 삼성전자 주식회사 | 정전 척 |
| JP4493251B2 (ja) | 2001-12-04 | 2010-06-30 | Ｔｏｔｏ株式会社 | 静電チャックモジュールおよび基板処理装置 |
| DE10232080B4 (de) * | 2002-07-15 | 2015-10-01 | Integrated Dynamics Engineering Gmbh | Elektrostatischer Greifer und Verfahren zu dessen Herstellung |
| KR100571158B1 (ko) * | 2003-10-09 | 2006-04-13 | 에스엔티 주식회사 | 무소결 질화알루미늄 정전척 및 그 제조방법 |
| JP2007150351A (ja) * | 2007-02-15 | 2007-06-14 | Toto Ltd | 静電チャック |
| JP5270310B2 (ja) * | 2008-11-13 | 2013-08-21 | 東京エレクトロン株式会社 | 静電チャック及び基板処理装置 |
| JP2010177698A (ja) * | 2010-04-12 | 2010-08-12 | Fujitsu Semiconductor Ltd | 静電チャックの製造方法 |
| JP2010166086A (ja) * | 2010-04-12 | 2010-07-29 | Fujitsu Semiconductor Ltd | 静電チャックを用いた半導体製造装置 |
| JP6038698B2 (ja) | 2013-03-22 | 2016-12-07 | 日本碍子株式会社 | セラミックス部材及び半導体製造装置用部材 |
| KR101787931B1 (ko) * | 2013-11-29 | 2017-10-18 | 가부시끼가이샤 도시바 | 플라즈마 장치용 부품 및 그 제조 방법 |
| WO2016042957A1 (ja) | 2014-09-16 | 2016-03-24 | 日本碍子株式会社 | セラミック構造体、基板保持装置用部材及びセラミック構造体の製法 |
| US11848223B2 (en) | 2018-02-20 | 2023-12-19 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chuck device and method for producing electrostatic chuck device |
| KR102632768B1 (ko) * | 2019-06-28 | 2024-02-01 | 엔지케이 인슐레이터 엘티디 | 웨이퍼 배치대 |
| KR102792302B1 (ko) * | 2020-07-13 | 2025-04-08 | 교세라 가부시키가이샤 | 시료 유지구 |
| CN119208237B (zh) * | 2024-09-27 | 2025-07-18 | 广东精瓷新材料有限公司 | 一种高介电高击穿强度的静电卡盘及其制备方法 |
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1994
- 1994-04-26 JP JP8839094A patent/JPH07297265A/ja active Pending
- 1994-11-04 TW TW083110217A patent/TW287314B/zh active
-
1995
- 1995-01-21 KR KR1019950001027A patent/KR950034652A/ko not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7042697B2 (en) | 2000-05-19 | 2006-05-09 | Ngk Insulators, Ltd. | Electrostatic chucks and electrostatically attracting structures |
Also Published As
| Publication number | Publication date |
|---|---|
| KR950034652A (ko) | 1995-12-28 |
| JPH07297265A (ja) | 1995-11-10 |