TW286413B - - Google Patents
Info
- Publication number
- TW286413B TW286413B TW083103642A TW83103642A TW286413B TW 286413 B TW286413 B TW 286413B TW 083103642 A TW083103642 A TW 083103642A TW 83103642 A TW83103642 A TW 83103642A TW 286413 B TW286413 B TW 286413B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5125067A JPH08176808A (ja) | 1993-04-28 | 1993-04-28 | 寿命警報機能を備えたスパッタリングタ−ゲット |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW286413B true TW286413B (OSRAM) | 1996-09-21 |
Family
ID=14901005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW083103642A TW286413B (OSRAM) | 1993-04-28 | 1994-04-23 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5487823A (OSRAM) |
| EP (1) | EP0622823B1 (OSRAM) |
| JP (1) | JPH08176808A (OSRAM) |
| KR (1) | KR970001004B1 (OSRAM) |
| DE (1) | DE69404372T2 (OSRAM) |
| TW (1) | TW286413B (OSRAM) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6179975B1 (en) * | 1996-10-02 | 2001-01-30 | National Semiconductor Corporation | Method of monitoring target/component consumption for dual use titanium/titanium nitride sputtering |
| US7063773B2 (en) * | 2000-08-17 | 2006-06-20 | Tosoh Smd, Inc. | High purity sputter targets with target end-of-life indication and method of manufacture |
| KR101047722B1 (ko) * | 2002-10-21 | 2011-07-08 | 캐보트 코포레이션 | 스퍼터링 타겟 조립체 형성 방법 및 그로부터 제조된조립체 |
| US6702930B1 (en) | 2003-05-08 | 2004-03-09 | Seagate Technology Llc | Method and means for enhancing utilization of sputtering targets |
| US20050178653A1 (en) * | 2004-02-17 | 2005-08-18 | Charles Fisher | Method for elimination of sputtering into the backing plate of a target/backing plate assembly |
| US7282122B2 (en) * | 2004-03-26 | 2007-10-16 | Taiwan Semiconductor Manufacturing Company | Method and system for target lifetime |
| US20060081459A1 (en) * | 2004-10-18 | 2006-04-20 | Applied Materials, Inc. | In-situ monitoring of target erosion |
| US7891536B2 (en) * | 2005-09-26 | 2011-02-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | PVD target with end of service life detection capability |
| CN100529160C (zh) * | 2005-09-26 | 2009-08-19 | 台湾积体电路制造股份有限公司 | 可消耗材料的厚板及物理气相沉积靶材料 |
| JP4560500B2 (ja) * | 2005-09-26 | 2010-10-13 | 台湾積體電路製造股▲ふん▼有限公司 | スラブの寿命検出方法 |
| US20070068796A1 (en) * | 2005-09-26 | 2007-03-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of using a target having end of service life detection capability |
| US8795486B2 (en) * | 2005-09-26 | 2014-08-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | PVD target with end of service life detection capability |
| US9127362B2 (en) | 2005-10-31 | 2015-09-08 | Applied Materials, Inc. | Process kit and target for substrate processing chamber |
| US20070125646A1 (en) * | 2005-11-25 | 2007-06-07 | Applied Materials, Inc. | Sputtering target for titanium sputtering chamber |
| US8968536B2 (en) * | 2007-06-18 | 2015-03-03 | Applied Materials, Inc. | Sputtering target having increased life and sputtering uniformity |
| US7901552B2 (en) | 2007-10-05 | 2011-03-08 | Applied Materials, Inc. | Sputtering target with grooves and intersecting channels |
| DE102010052341B4 (de) * | 2010-11-25 | 2015-02-12 | Von Ardenne Gmbh | Schutzvorrichtung an Rohrtargets |
| TWI470103B (zh) * | 2011-10-27 | 2015-01-21 | Solar Applied Mat Tech Corp | 具有警示功能之濺鍍靶材 |
| CN103088304A (zh) * | 2011-10-28 | 2013-05-08 | 光洋应用材料科技股份有限公司 | 具有警示功能的溅镀靶材 |
| US20130206589A1 (en) * | 2012-02-14 | 2013-08-15 | Solar Applied Materials Technology Corp. | Sputtering Target Having Alarm Function |
| JP2013185230A (ja) * | 2012-03-09 | 2013-09-19 | Solar Applied Materials Technology Corp | アラーム機能を有するスパッタリングターゲット |
| US10060023B2 (en) | 2012-10-19 | 2018-08-28 | Infineon Technologies Ag | Backing plate for a sputter target, sputter target, and sputter device |
| CN102994970B (zh) * | 2012-11-16 | 2014-12-10 | 京东方科技集团股份有限公司 | 一种靶材使用检测系统和方法 |
| CN106032565A (zh) * | 2015-03-11 | 2016-10-19 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 靶材组件及物理气相沉积设备 |
| CN111172507A (zh) * | 2020-03-05 | 2020-05-19 | 东莞南玻工程玻璃有限公司 | 平面靶材烧穿报警系统 |
| US11424111B2 (en) * | 2020-06-25 | 2022-08-23 | Taiwan Semiconductor Manufacturing Company Limited | Sputtering target assembly to prevent overetch of backing plate and methods of using the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0046154B1 (en) * | 1980-08-08 | 1984-11-28 | Battelle Development Corporation | Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus |
| US4345968A (en) * | 1981-08-27 | 1982-08-24 | Ncr Corporation | End point detection using gas flow |
| US4545882A (en) * | 1983-09-02 | 1985-10-08 | Shatterproof Glass Corporation | Method and apparatus for detecting sputtering target depletion |
| DE3630737C1 (de) * | 1986-09-10 | 1987-11-05 | Philips & Du Pont Optical | Kathodenzerstaeubungseinrichtung mit einer Vorrichtung zur Messung eines kritischen Target-Abtrages |
| CH669609A5 (OSRAM) * | 1986-12-23 | 1989-03-31 | Balzers Hochvakuum |
-
1993
- 1993-04-28 JP JP5125067A patent/JPH08176808A/ja active Pending
-
1994
- 1994-04-23 TW TW083103642A patent/TW286413B/zh active
- 1994-04-26 US US08/233,171 patent/US5487823A/en not_active Expired - Fee Related
- 1994-04-27 KR KR1019940008918A patent/KR970001004B1/ko not_active Expired - Fee Related
- 1994-04-27 EP EP94106586A patent/EP0622823B1/en not_active Expired - Lifetime
- 1994-04-27 DE DE69404372T patent/DE69404372T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08176808A (ja) | 1996-07-09 |
| DE69404372D1 (de) | 1997-08-28 |
| KR970001004B1 (ko) | 1997-01-25 |
| DE69404372T2 (de) | 1998-02-26 |
| EP0622823B1 (en) | 1997-07-23 |
| US5487823A (en) | 1996-01-30 |
| EP0622823A1 (en) | 1994-11-02 |