TW282523B - - Google Patents

Info

Publication number
TW282523B
TW282523B TW083105332A TW83105332A TW282523B TW 282523 B TW282523 B TW 282523B TW 083105332 A TW083105332 A TW 083105332A TW 83105332 A TW83105332 A TW 83105332A TW 282523 B TW282523 B TW 282523B
Authority
TW
Taiwan
Application number
TW083105332A
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Application granted granted Critical
Publication of TW282523B publication Critical patent/TW282523B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW083105332A 1993-06-15 1994-06-11 TW282523B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14388593 1993-06-15
JP06509294A JP3393919B2 (ja) 1993-06-15 1994-04-01 カラーフィルター形成用ポジ型レジスト組成物

Publications (1)

Publication Number Publication Date
TW282523B true TW282523B (zh) 1996-08-01

Family

ID=26406226

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083105332A TW282523B (zh) 1993-06-15 1994-06-11

Country Status (6)

Country Link
US (1) US5492790A (zh)
EP (1) EP0629917B1 (zh)
JP (1) JP3393919B2 (zh)
KR (1) KR950001417A (zh)
DE (1) DE69413312T2 (zh)
TW (1) TW282523B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000014602A1 (en) * 1998-09-04 2000-03-16 Polaroid Corporation Process for forming a color filter
US7148265B2 (en) * 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
WO2006024617A1 (en) * 2004-09-03 2006-03-09 Huntsman Advanced Materials (Switzerland) Gmbh Compositions containing anthraquinone dyes
US9547238B2 (en) 2012-10-16 2017-01-17 Eugen Pavel Photoresist with rare-earth sensitizers

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4808501A (en) * 1985-10-15 1989-02-28 Polaroid Corporation, Patent Dept. Method for manufacturing an optical filter
JPH0769605B2 (ja) * 1988-02-25 1995-07-31 富士写真フイルム株式会社 感光性組成物
US5212042A (en) * 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
JP2694393B2 (ja) * 1990-09-07 1997-12-24 富士写真フイルム株式会社 画像形成材料及びそれを用いる画像形成方法
GB9105750D0 (en) * 1991-03-19 1991-05-01 Minnesota Mining & Mfg Speed stabilised positive-acting photoresist compositions
US5275909A (en) * 1992-06-01 1994-01-04 Ocg Microelectronic Materials, Inc. Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye
EP0628599B1 (en) * 1992-12-24 1998-12-09 Sumitomo Chemical Company Limited Photosensitive resin composition for color filter
JP3837581B2 (ja) * 1993-02-02 2006-10-25 住友化学株式会社 カラーフイルター用アゾ色素及びカラーフイルターの製造方法

Also Published As

Publication number Publication date
US5492790A (en) 1996-02-20
EP0629917A2 (en) 1994-12-21
EP0629917A3 (en) 1995-12-06
KR950001417A (ko) 1995-01-03
DE69413312T2 (de) 1999-02-25
JPH07140665A (ja) 1995-06-02
DE69413312D1 (de) 1998-10-22
EP0629917B1 (en) 1998-09-16
JP3393919B2 (ja) 2003-04-07

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