TW278240B - - Google Patents
Info
- Publication number
- TW278240B TW278240B TW084109017A TW84109017A TW278240B TW 278240 B TW278240 B TW 278240B TW 084109017 A TW084109017 A TW 084109017A TW 84109017 A TW84109017 A TW 84109017A TW 278240 B TW278240 B TW 278240B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/31—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23036094A JP3202501B2 (ja) | 1994-08-31 | 1994-08-31 | 半導体記憶装置及びその製造方法 |
JP6230359A JPH0878640A (ja) | 1994-08-31 | 1994-08-31 | 半導体記憶装置及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW278240B true TW278240B (zh) | 1996-06-11 |
Family
ID=26529301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084109017A TW278240B (zh) | 1994-08-31 | 1995-08-29 |
Country Status (3)
Country | Link |
---|---|
US (2) | US5686746A (zh) |
KR (1) | KR0157189B1 (zh) |
TW (1) | TW278240B (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3488735B2 (ja) * | 1994-03-03 | 2004-01-19 | 三菱電機株式会社 | 半導体装置 |
US6617205B1 (en) * | 1995-11-20 | 2003-09-09 | Hitachi, Ltd. | Semiconductor storage device and process for manufacturing the same |
KR100239404B1 (ko) * | 1996-07-31 | 2000-01-15 | 김영환 | 디램(dram) 및 그의 셀 어레이방법 |
US5861650A (en) * | 1996-08-09 | 1999-01-19 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device comprising an FPGA |
KR100290781B1 (ko) * | 1998-06-30 | 2001-06-01 | 박종섭 | 반도체 소자 및 그 제조방법 |
KR100330716B1 (ko) * | 1999-11-15 | 2002-04-03 | 윤종용 | 도전층 패턴과 그 하부 콘택홀 간의 얼라인먼트 마진을개선할수 있는 반도체 장치의 패턴 레이아웃 구조 |
JP2003078022A (ja) | 2001-09-06 | 2003-03-14 | Mitsubishi Electric Corp | 半導体装置および半導体装置の製造方法 |
JP3736513B2 (ja) * | 2001-10-04 | 2006-01-18 | セイコーエプソン株式会社 | 電気光学装置及びその製造方法並びに電子機器 |
JP4398829B2 (ja) * | 2004-09-17 | 2010-01-13 | 株式会社東芝 | 半導体装置 |
JP2006339343A (ja) * | 2005-06-01 | 2006-12-14 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4035198A (en) * | 1976-06-30 | 1977-07-12 | International Business Machines Corporation | Method of fabricating field effect transistors having self-registering electrical connections between gate electrodes and metallic interconnection lines, and fabrication of integrated circuits containing the transistors |
US5374576A (en) * | 1988-12-21 | 1994-12-20 | Hitachi, Ltd. | Method of fabricating stacked capacitor cell memory devices |
US5172202A (en) * | 1989-05-31 | 1992-12-15 | Nec Corporation | Semiconductor memory cell having high density structure |
US5350705A (en) * | 1992-08-25 | 1994-09-27 | National Semiconductor Corporation | Ferroelectric memory cell arrangement having a split capacitor plate structure |
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1995
- 1995-08-29 TW TW084109017A patent/TW278240B/zh not_active IP Right Cessation
- 1995-08-30 KR KR1019950027757A patent/KR0157189B1/ko not_active IP Right Cessation
- 1995-08-30 US US08/521,445 patent/US5686746A/en not_active Expired - Lifetime
-
1997
- 1997-07-14 US US08/892,199 patent/US6051466A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5686746A (en) | 1997-11-11 |
KR960009184A (ko) | 1996-03-22 |
US6051466A (en) | 2000-04-18 |
KR0157189B1 (ko) | 1998-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |