TW277144B - Making method of photoresist imaging with anti-reflection coating - Google Patents

Making method of photoresist imaging with anti-reflection coating

Info

Publication number
TW277144B
TW277144B TW84105484A TW84105484A TW277144B TW 277144 B TW277144 B TW 277144B TW 84105484 A TW84105484 A TW 84105484A TW 84105484 A TW84105484 A TW 84105484A TW 277144 B TW277144 B TW 277144B
Authority
TW
Taiwan
Prior art keywords
reflection coating
making method
photoresist
photoresist imaging
imaging
Prior art date
Application number
TW84105484A
Other languages
Chinese (zh)
Inventor
Liang-Jiuh Shiah
Dong-Long Jang
Original Assignee
Mos Electronics Taiwan Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mos Electronics Taiwan Inc filed Critical Mos Electronics Taiwan Inc
Priority to TW84105484A priority Critical patent/TW277144B/en
Application granted granted Critical
Publication of TW277144B publication Critical patent/TW277144B/en

Links

Abstract

A making method of photoresist imaging with anti-reflection coating comprises the steps of: covering one anti-reflection coating on one metal layer or metal polycide; forming one photoresist on anti-reflection coating; after being exposed and developed forming photoresist pattern as etching mask of later metal layer or metal polycide; It features that the anti-reflection coating material including CrO/CrOx is formed by reactive sputtering method.
TW84105484A 1995-05-31 1995-05-31 Making method of photoresist imaging with anti-reflection coating TW277144B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW84105484A TW277144B (en) 1995-05-31 1995-05-31 Making method of photoresist imaging with anti-reflection coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW84105484A TW277144B (en) 1995-05-31 1995-05-31 Making method of photoresist imaging with anti-reflection coating

Publications (1)

Publication Number Publication Date
TW277144B true TW277144B (en) 1996-06-01

Family

ID=51397391

Family Applications (1)

Application Number Title Priority Date Filing Date
TW84105484A TW277144B (en) 1995-05-31 1995-05-31 Making method of photoresist imaging with anti-reflection coating

Country Status (1)

Country Link
TW (1) TW277144B (en)

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