TW252126B - - Google Patents

Info

Publication number
TW252126B
TW252126B TW083100542A TW83100542A TW252126B TW 252126 B TW252126 B TW 252126B TW 083100542 A TW083100542 A TW 083100542A TW 83100542 A TW83100542 A TW 83100542A TW 252126 B TW252126 B TW 252126B
Authority
TW
Taiwan
Application number
TW083100542A
Original Assignee
Shinetsu Chem Ind Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chem Ind Co filed Critical Shinetsu Chem Ind Co
Application granted granted Critical
Publication of TW252126B publication Critical patent/TW252126B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
    • C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
TW083100542A 1993-03-24 1994-01-22 TW252126B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5089225A JP2764674B2 (ja) 1993-03-24 1993-03-24 ポリイミドシリコ−ン樹脂前駆体組成物

Publications (1)

Publication Number Publication Date
TW252126B true TW252126B (zh) 1995-07-21

Family

ID=13964801

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083100542A TW252126B (zh) 1993-03-24 1994-01-22

Country Status (4)

Country Link
US (1) US5376733A (zh)
JP (1) JP2764674B2 (zh)
KR (1) KR100266998B1 (zh)
TW (1) TW252126B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271131B1 (en) * 1998-08-26 2001-08-07 Micron Technology, Inc. Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers
JP4509247B2 (ja) * 1999-04-30 2010-07-21 東レ・ダウコーニング株式会社 シリコーン含有ポリイミド樹脂、シリコーン含有ポリアミック酸およびそれらの製造方法
JP5355970B2 (ja) 2008-09-16 2013-11-27 株式会社ジャパンディスプレイ 液晶表示装置
JP6036253B2 (ja) * 2012-02-29 2016-11-30 Jsr株式会社 液晶配向剤、液晶配向膜および液晶表示素子
KR20140097940A (ko) 2013-01-30 2014-08-07 삼성디스플레이 주식회사 실리콘 산화물과 실리콘 질화물을 포함하는 배리어층을 구비한 ｔｆｔ기판, 상기 ｔｆｔ 기판을 포함하는 유기 발광 표시 장치 및 상기 tft 기판의 제조 방법
WO2017138447A1 (ja) * 2016-02-08 2017-08-17 東レ株式会社 樹脂組成物、樹脂層、永久接着剤、仮貼り接着剤、積層フィルム、ウエハ加工体および電子部品または半導体装置の製造方法
KR102040413B1 (ko) 2018-06-07 2019-11-04 주식회사 엘지화학 실록산 화합물 및 이를 포함하는 폴리이미드 전구체 조성물

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2823195A (en) * 1955-02-21 1958-02-11 Dow Corning Organosilicon polyamide compositions and method of making same
US3325450A (en) * 1965-05-12 1967-06-13 Gen Electric Polysiloxaneimides and their production
US3847867A (en) * 1971-01-20 1974-11-12 Gen Electric Polyetherimides
GB2168065B (en) * 1984-12-05 1990-04-25 Gen Electric Polyanhydride-siloxanes and polyimide-siloxanes obtained therefrom
US4795680A (en) * 1986-05-09 1989-01-03 General Electric Company Polyimide-siloxanes, method of making and use
US4820781A (en) * 1987-06-29 1989-04-11 General Electric Company Blends of silicone copolymer and polyetherimide
JPS6485220A (en) * 1987-09-25 1989-03-30 Hitachi Chemical Co Ltd Protective coating material composition for semiconductor device
CA1317048C (en) * 1987-10-01 1993-04-27 Hiroshi Mori Thermoplastic resin composition
US4975490A (en) * 1987-11-18 1990-12-04 Toray Silicone Company, Ltd. Phthalic acid ester-modified organopolysiloxane and method for its preparation

Also Published As

Publication number Publication date
US5376733A (en) 1994-12-27
KR100266998B1 (ko) 2000-09-15
JPH06279680A (ja) 1994-10-04
KR950026948A (ko) 1995-10-16
JP2764674B2 (ja) 1998-06-11

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