TW252126B - - Google Patents
Info
- Publication number
- TW252126B TW252126B TW083100542A TW83100542A TW252126B TW 252126 B TW252126 B TW 252126B TW 083100542 A TW083100542 A TW 083100542A TW 83100542 A TW83100542 A TW 83100542A TW 252126 B TW252126 B TW 252126B
- Authority
- TW
- Taiwan
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
- C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5089225A JP2764674B2 (ja) | 1993-03-24 | 1993-03-24 | ポリイミドシリコ−ン樹脂前駆体組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW252126B true TW252126B (zh) | 1995-07-21 |
Family
ID=13964801
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083100542A TW252126B (zh) | 1993-03-24 | 1994-01-22 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5376733A (zh) |
JP (1) | JP2764674B2 (zh) |
KR (1) | KR100266998B1 (zh) |
TW (1) | TW252126B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6271131B1 (en) * | 1998-08-26 | 2001-08-07 | Micron Technology, Inc. | Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers |
JP4509247B2 (ja) * | 1999-04-30 | 2010-07-21 | 東レ・ダウコーニング株式会社 | シリコーン含有ポリイミド樹脂、シリコーン含有ポリアミック酸およびそれらの製造方法 |
JP5355970B2 (ja) | 2008-09-16 | 2013-11-27 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
JP6036253B2 (ja) * | 2012-02-29 | 2016-11-30 | Jsr株式会社 | 液晶配向剤、液晶配向膜および液晶表示素子 |
KR20140097940A (ko) | 2013-01-30 | 2014-08-07 | 삼성디스플레이 주식회사 | 실리콘 산화물과 실리콘 질화물을 포함하는 배리어층을 구비한 tft기판, 상기 tft 기판을 포함하는 유기 발광 표시 장치 및 상기 tft 기판의 제조 방법 |
WO2017138447A1 (ja) * | 2016-02-08 | 2017-08-17 | 東レ株式会社 | 樹脂組成物、樹脂層、永久接着剤、仮貼り接着剤、積層フィルム、ウエハ加工体および電子部品または半導体装置の製造方法 |
KR102040413B1 (ko) | 2018-06-07 | 2019-11-04 | 주식회사 엘지화학 | 실록산 화합물 및 이를 포함하는 폴리이미드 전구체 조성물 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2823195A (en) * | 1955-02-21 | 1958-02-11 | Dow Corning | Organosilicon polyamide compositions and method of making same |
US3325450A (en) * | 1965-05-12 | 1967-06-13 | Gen Electric | Polysiloxaneimides and their production |
US3847867A (en) * | 1971-01-20 | 1974-11-12 | Gen Electric | Polyetherimides |
GB2168065B (en) * | 1984-12-05 | 1990-04-25 | Gen Electric | Polyanhydride-siloxanes and polyimide-siloxanes obtained therefrom |
US4795680A (en) * | 1986-05-09 | 1989-01-03 | General Electric Company | Polyimide-siloxanes, method of making and use |
US4820781A (en) * | 1987-06-29 | 1989-04-11 | General Electric Company | Blends of silicone copolymer and polyetherimide |
JPS6485220A (en) * | 1987-09-25 | 1989-03-30 | Hitachi Chemical Co Ltd | Protective coating material composition for semiconductor device |
CA1317048C (en) * | 1987-10-01 | 1993-04-27 | Hiroshi Mori | Thermoplastic resin composition |
US4975490A (en) * | 1987-11-18 | 1990-12-04 | Toray Silicone Company, Ltd. | Phthalic acid ester-modified organopolysiloxane and method for its preparation |
-
1993
- 1993-03-24 JP JP5089225A patent/JP2764674B2/ja not_active Expired - Fee Related
-
1994
- 1994-01-22 TW TW083100542A patent/TW252126B/zh active
- 1994-03-23 KR KR1019940005834A patent/KR100266998B1/ko not_active IP Right Cessation
- 1994-03-23 US US08/216,385 patent/US5376733A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5376733A (en) | 1994-12-27 |
KR100266998B1 (ko) | 2000-09-15 |
JPH06279680A (ja) | 1994-10-04 |
KR950026948A (ko) | 1995-10-16 |
JP2764674B2 (ja) | 1998-06-11 |