TW239222B - - Google Patents
Info
- Publication number
- TW239222B TW239222B TW083105646A TW83105646A TW239222B TW 239222 B TW239222 B TW 239222B TW 083105646 A TW083105646 A TW 083105646A TW 83105646 A TW83105646 A TW 83105646A TW 239222 B TW239222 B TW 239222B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930011746A KR960011461B1 (ko) | 1993-06-25 | 1993-06-25 | 회절빛 제어 마스크 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW239222B true TW239222B (zh) | 1995-01-21 |
Family
ID=19358076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083105646A TW239222B (zh) | 1993-06-25 | 1994-06-22 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5571641A (zh) |
JP (1) | JPH081890B2 (zh) |
KR (1) | KR960011461B1 (zh) |
DE (1) | DE4422038C2 (zh) |
TW (1) | TW239222B (zh) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0792647A (ja) * | 1993-09-27 | 1995-04-07 | Nec Corp | ホトマスク |
KR100253580B1 (ko) * | 1996-10-02 | 2000-04-15 | 김영환 | 스티칭 노광 공정에 사용되는 마스크 |
US6040892A (en) | 1997-08-19 | 2000-03-21 | Micron Technology, Inc. | Multiple image reticle for forming layers |
US6379868B1 (en) * | 1999-04-01 | 2002-04-30 | Agere Systems Guardian Corp. | Lithographic process for device fabrication using dark-field illumination |
US20020180608A1 (en) * | 2001-05-04 | 2002-12-05 | Sphericon Ltd. | Driver alertness monitoring system |
US6857220B2 (en) * | 2001-06-21 | 2005-02-22 | Bobby D. King | Flexible fishing lure tails and appendages |
CA2515793A1 (en) * | 2003-02-14 | 2004-09-02 | The Board Of Trustees Of The Leland Stanford Junior University | Optical lithography using both photomask surfaces |
US6982135B2 (en) | 2003-03-28 | 2006-01-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pattern compensation for stitching |
EP1664858A1 (en) * | 2003-07-24 | 2006-06-07 | Explay Ltd. | Method for production of micro-optics structures |
KR100598497B1 (ko) * | 2003-12-31 | 2006-07-10 | 동부일렉트로닉스 주식회사 | 이중 노광 패턴 형성 방법 |
KR100790292B1 (ko) * | 2006-06-28 | 2008-01-02 | 주식회사 하이닉스반도체 | 반도체 소자의 미세패턴 형성 방법 |
DE102015117556A1 (de) * | 2015-10-15 | 2017-04-20 | Universität Kassel | Mikrostruktur und Verfahren zur Herstellung einer Mikrostruktur in einer Fotolithographietechnik |
JP6645371B2 (ja) * | 2016-07-15 | 2020-02-14 | オムロン株式会社 | 光デバイス及び立体表示方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4223083A (en) * | 1977-12-27 | 1980-09-16 | Tektronix, Inc. | Virtual mask exposure system for CRT screen manufacture |
US4947413A (en) * | 1988-07-26 | 1990-08-07 | At&T Bell Laboratories | Resolution doubling lithography technique |
JPH02101423A (ja) * | 1988-10-11 | 1990-04-13 | Ricoh Co Ltd | 光学的読取装置 |
JP2630694B2 (ja) * | 1991-07-12 | 1997-07-16 | 日本電信電話株式会社 | 投影露光装置用マスク |
DE69215942T2 (de) * | 1991-04-05 | 1997-07-24 | Nippon Telegraph & Telephone | Verfahren und System zur optischen Projetkionsbelichtung |
JP3250563B2 (ja) * | 1992-01-17 | 2002-01-28 | 株式会社ニコン | フォトマスク、並びに露光方法及びその露光方法を用いた回路パターン素子製造方法、並びに露光装置 |
US5387484A (en) * | 1992-07-07 | 1995-02-07 | International Business Machines Corporation | Two-sided mask for patterning of materials with electromagnetic radiation |
JPH06161092A (ja) * | 1992-11-17 | 1994-06-07 | Nippon Steel Corp | 露光用マスク |
-
1993
- 1993-06-25 KR KR1019930011746A patent/KR960011461B1/ko not_active IP Right Cessation
-
1994
- 1994-06-22 TW TW083105646A patent/TW239222B/zh not_active IP Right Cessation
- 1994-06-23 DE DE4422038A patent/DE4422038C2/de not_active Expired - Fee Related
- 1994-06-24 JP JP14359994A patent/JPH081890B2/ja not_active Expired - Fee Related
- 1994-06-27 US US08/266,173 patent/US5571641A/en not_active Expired - Lifetime
-
1996
- 1996-08-09 US US08/695,297 patent/US5698350A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5571641A (en) | 1996-11-05 |
JPH081890B2 (ja) | 1996-01-10 |
US5698350A (en) | 1997-12-16 |
DE4422038C2 (de) | 2002-11-14 |
JPH0722308A (ja) | 1995-01-24 |
DE4422038A1 (de) | 1995-02-02 |
KR950001919A (ko) | 1995-01-04 |
KR960011461B1 (ko) | 1996-08-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |