TW223703B - - Google Patents
Info
- Publication number
- TW223703B TW223703B TW082102610A TW82102610A TW223703B TW 223703 B TW223703 B TW 223703B TW 082102610 A TW082102610 A TW 082102610A TW 82102610 A TW82102610 A TW 82102610A TW 223703 B TW223703 B TW 223703B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4115503A JP3071940B2 (ja) | 1992-04-07 | 1992-04-07 | 絶縁ゲイト型半導体装置の作製方法 |
| JP5089117A JPH06275646A (ja) | 1993-03-24 | 1993-03-24 | 薄膜トランジスタの作製方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW223703B true TW223703B (zh) | 1994-05-11 |
Family
ID=26430549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW082102610A TW223703B (zh) | 1992-04-07 | 1993-04-08 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR970003917B1 (zh) |
| CN (1) | CN1054469C (zh) |
| TW (1) | TW223703B (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3469337B2 (ja) * | 1994-12-16 | 2003-11-25 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| CN102569053B (zh) * | 2012-01-18 | 2014-12-24 | 上海华力微电子有限公司 | 一种形成高介电常数金属栅的方法 |
| JPWO2015064256A1 (ja) * | 2013-10-28 | 2017-03-09 | 富士電機株式会社 | 炭化シリコン半導体装置及びその製造方法 |
| CN105977306A (zh) * | 2016-06-21 | 2016-09-28 | 北京大学深圳研究生院 | 一种自对准薄膜晶体管及其制备方法 |
| CN107799605B (zh) * | 2017-10-27 | 2020-07-31 | 合肥鑫晟光电科技有限公司 | 一种薄膜晶体管及其制备方法、阵列基板、显示装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9008214D0 (en) * | 1990-04-11 | 1990-06-13 | Gen Electric Co Plc | Semiconductor devices |
-
1993
- 1993-04-06 KR KR93005710A patent/KR970003917B1/ko not_active IP Right Cessation
- 1993-04-07 CN CN93105438A patent/CN1054469C/zh not_active Expired - Fee Related
- 1993-04-08 TW TW082102610A patent/TW223703B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| KR930022600A (ko) | 1993-11-24 |
| CN1078068A (zh) | 1993-11-03 |
| CN1054469C (zh) | 2000-07-12 |
| KR970003917B1 (en) | 1997-03-22 |