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Application filed by Ind Tech Res Inst, Trace Storage Technology CorpfiledCriticalInd Tech Res Inst
Priority to TW82107375ApriorityCriticalpatent/TW223701B/en
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Publication of TW223701BpublicationCriticalpatent/TW223701B/en
One type of metal etching texture method consists of the followingprocedures: 1. preparing one precursory magnetic recording media with substrate; 2. processing the surface of precursory magnetic recording media as anon-wetted surface for mask layer material; 3. plating the mask layer material on the surface of precursory magneticrecording media, then heating the precursory magnetic recordingmedia to form a texturing mask layer of predetermined surface form; 4. etching the mask layer with splash etching or reaction ion etchingmethod until the mask layer is removed totally, then duplicating thesurface form of texturing mask layer on the surface of the precursorymagnetic recording media.
Master information carrier, method for producing the carrier, method and apparatus for writing information into magnetic record medium using the carrier