TW223701B - Metal etching texture method - Google Patents

Metal etching texture method

Info

Publication number
TW223701B
TW223701B TW82107375A TW82107375A TW223701B TW 223701 B TW223701 B TW 223701B TW 82107375 A TW82107375 A TW 82107375A TW 82107375 A TW82107375 A TW 82107375A TW 223701 B TW223701 B TW 223701B
Authority
TW
Taiwan
Prior art keywords
mask layer
precursory
recording media
etching
metal etching
Prior art date
Application number
TW82107375A
Other languages
Chinese (zh)
Inventor
Jau-Jier Chu
Chung-Yu Ting
Jiunn-Shyong Horng
Jye-Yen Cheng
Jia-Shyong Lin
Mei Rong Tseng
Original Assignee
Ind Tech Res Inst
Trace Storage Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst, Trace Storage Technology Corp filed Critical Ind Tech Res Inst
Priority to TW82107375A priority Critical patent/TW223701B/en
Application granted granted Critical
Publication of TW223701B publication Critical patent/TW223701B/en

Links

Abstract

One type of metal etching texture method consists of the followingprocedures: 1. preparing one precursory magnetic recording media with substrate; 2. processing the surface of precursory magnetic recording media as anon-wetted surface for mask layer material; 3. plating the mask layer material on the surface of precursory magneticrecording media, then heating the precursory magnetic recordingmedia to form a texturing mask layer of predetermined surface form; 4. etching the mask layer with splash etching or reaction ion etchingmethod until the mask layer is removed totally, then duplicating thesurface form of texturing mask layer on the surface of the precursorymagnetic recording media.
TW82107375A 1993-09-06 1993-09-06 Metal etching texture method TW223701B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW82107375A TW223701B (en) 1993-09-06 1993-09-06 Metal etching texture method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW82107375A TW223701B (en) 1993-09-06 1993-09-06 Metal etching texture method

Publications (1)

Publication Number Publication Date
TW223701B true TW223701B (en) 1994-05-11

Family

ID=51348214

Family Applications (1)

Application Number Title Priority Date Filing Date
TW82107375A TW223701B (en) 1993-09-06 1993-09-06 Metal etching texture method

Country Status (1)

Country Link
TW (1) TW223701B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI484671B (en) * 2010-01-14 2015-05-11 Wen Pin Chen Light emitting diode and method making the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI484671B (en) * 2010-01-14 2015-05-11 Wen Pin Chen Light emitting diode and method making the same

Similar Documents

Publication Publication Date Title
MY137198A (en) Master information carrier, method for producing the carrier, method and apparatus for writing information into magnetic record medium using the carrier
DE3266738D1 (en) Apparatus for regulating substrate temperature in a continuous plasma deposition process
YU95081A (en) Process for the manufacturing of a multilayer protecting and/or decorating coating on the surface of a metal substrate
EP0563992A3 (en) Method and apparatus for the manufacture of metallic surface layers on substrates
DE3267190D1 (en) Method of producing metal images or patterns on and/or below the surface of a substrate comprising a semiconducting lightsensitive compound
EP0310031A3 (en) Substrate for a magnetic disk and process for its production
GB2230539B (en) Improvements in or relating to a method of producing an erosion-resistant surface layer on a metallic workpiece
EP0154183A3 (en) Process for forming a wear-resistant layer on a substrate
EP0304969A3 (en) Process for forming a pattern film
DE3570458D1 (en) Process for forming a wear-resistant layer on a substrate
EP0221752A3 (en) High energy padding method utilizing coating containing copper
JPS5736434A (en) Magnetic recording medium and its production
TW223701B (en) Metal etching texture method
GB2192197B (en) Method of forming a metal film on the surface of a substrate metal
IT8147567A0 (en) PROCEDURE FOR PRODUCING A METALLIC SUBSTRATE WITH A WEAR-RESISTANT SURFACE AND SUBSTRATES OBTAINED SO
EP0149408A3 (en) Method and apparatus for the deposition of a thin layer on a substrate by a reactive plasma
GB9320310D0 (en) Production of carriers for surface plasmon resonance
DE3475297D1 (en) Process for forming a thin insulative coating on a substrate
EP0133916A3 (en) Process for forming a thin insulative coating on a substrate
IL109238A (en) Method and apparatus for process control
JPS5733438A (en) Vanishing method of magnetic disk
JPS6476520A (en) Magnetic recording medium and its production
JPS5747878A (en) Decorating method for metallic article with printed pattern
JPS52130429A (en) Method of treating surface of metal substrate
EP0490784A3 (en) A process of forming a high temperature superconductor on a metal substrate surface