TW221499B - - Google Patents

Info

Publication number
TW221499B
TW221499B TW081101635A TW81101635A TW221499B TW 221499 B TW221499 B TW 221499B TW 081101635 A TW081101635 A TW 081101635A TW 81101635 A TW81101635 A TW 81101635A TW 221499 B TW221499 B TW 221499B
Authority
TW
Taiwan
Application number
TW081101635A
Other languages
Chinese (zh)
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of TW221499B publication Critical patent/TW221499B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/08—Copolymers of styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
TW081101635A 1991-03-01 1992-03-03 TW221499B (index.php)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3036029A JPH04274428A (ja) 1991-03-01 1991-03-01 オフセット印刷用感光性組成物

Publications (1)

Publication Number Publication Date
TW221499B true TW221499B (index.php) 1994-03-01

Family

ID=12458293

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081101635A TW221499B (index.php) 1991-03-01 1992-03-03

Country Status (7)

Country Link
US (1) US5393637A (index.php)
EP (1) EP0501834A1 (index.php)
JP (1) JPH04274428A (index.php)
KR (1) KR920018520A (index.php)
AU (1) AU647243B2 (index.php)
CA (1) CA2061968A1 (index.php)
TW (1) TW221499B (index.php)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08319456A (ja) * 1995-04-28 1996-12-03 E I Du Pont De Nemours & Co 印刷回路用の水系処理可能な軟質の光画像化可能耐久被覆材
DE69610242T2 (de) * 1995-04-28 2001-05-17 E.I. Du Pont De Nemours And Co., Wilmington Auf photographischem Weg aufzeichnende und durch Wasser entwickelbare, dauerhafte Mehrschichtbeschichtungen für Leiterplatten
US5643657A (en) * 1995-04-28 1997-07-01 E. I. Du Pont De Nemours And Company Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
WO1997034197A1 (en) * 1996-03-11 1997-09-18 Hoechst Celanese Corporation Resin compositions for photoresist applications
US5942560A (en) * 1996-09-02 1999-08-24 Mitsubishi Pencil Kabushiki Kaisha Colored resin fine particle water base dispersion liquid for water base ink
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
JP3052917B2 (ja) * 1997-10-24 2000-06-19 日本電気株式会社 化学増幅系レジスト
US20040192876A1 (en) * 2002-11-18 2004-09-30 Nigel Hacker Novolac polymer planarization films with high temparature stability
JP4426526B2 (ja) * 2003-07-17 2010-03-03 ハネウエル・インターナシヨナル・インコーポレーテツド 最新式のマイクロエレクトロニクス用途およびデバイス用の平坦化膜およびそれらの製造方法
KR100611446B1 (ko) * 2004-05-18 2006-08-10 제일모직주식회사 수성 현상가능한 감광성 코팅액 조성물의 제조방법
US8563213B2 (en) * 2004-07-16 2013-10-22 Transitions Optical, Inc. Methods for producing photosensitive microparticles
JP2006181838A (ja) * 2004-12-27 2006-07-13 Fuji Photo Film Co Ltd 平版印刷版原版
JP2007079153A (ja) * 2005-09-14 2007-03-29 Nippon Paint Co Ltd 感光性樹脂組成物
JP2007079152A (ja) * 2005-09-14 2007-03-29 Nippon Paint Co Ltd 感光性樹脂組成物
US7700264B2 (en) 2005-10-31 2010-04-20 Nippon Paint Co., Ltd. Photosensitive resin composition, image forming material and image forming method using thereof
WO2007091442A1 (ja) * 2006-02-10 2007-08-16 Konica Minolta Medical & Graphic, Inc. 平版印刷版材料
EP2011643B1 (en) * 2007-07-02 2010-10-13 FUJIFILM Corporation Planographic printing plate precursor and printing method using the same
JP2009236942A (ja) * 2008-03-25 2009-10-15 Fujifilm Corp 平版印刷版原版及びその製版方法
JP5481339B2 (ja) * 2009-09-30 2014-04-23 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP2012140600A (ja) * 2010-12-13 2012-07-26 Konica Minolta Business Technologies Inc 蓄熱マイクロカプセルとその製造方法
US8916334B2 (en) 2013-01-28 2014-12-23 Hewlett-Packard Development Company, L.P. Micro-composite material for three-dimensional printing

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3895082A (en) * 1971-05-27 1975-07-15 Du Pont Polymer composition
JPS603170B2 (ja) * 1976-03-24 1985-01-26 三井東圧化学株式会社 凸版用感光性樹脂組成物
US4273851A (en) * 1979-05-29 1981-06-16 Richardson Graphics Company Method of coating using photopolymerizable latex systems
US4414278A (en) * 1982-04-22 1983-11-08 E. I. Du Pont De Nemours And Company Crosslinked triacrylate polymer beads
US4550073A (en) * 1982-04-22 1985-10-29 E. I. Du Pont De Nemours And Company Overcoated photohardenable element having surface protuberances
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
JPS61162501A (ja) * 1985-01-10 1986-07-23 Nippon Paint Co Ltd 高エネルギ−線硬化樹脂組成物
US4726877A (en) * 1986-01-22 1988-02-23 E. I. Du Pont De Nemours And Company Methods of using photosensitive compositions containing microgels
US4753865A (en) * 1986-01-22 1988-06-28 E. I. Du Pont De Nemours And Company Photosensitive compositions containing microgels
JPH0746224B2 (ja) * 1986-06-27 1995-05-17 日本ペイント株式会社 感光性フレキソ印刷版
JPS6317903A (ja) * 1986-07-10 1988-01-25 Nippon Paint Co Ltd 光硬化性樹脂組成物
JPH0693118B2 (ja) * 1987-06-15 1994-11-16 日本製紙株式会社 感光性シート
JPH0693119B2 (ja) * 1988-01-26 1994-11-16 日本製紙株式会社 感光性シート
JPH0219848A (ja) * 1988-07-08 1990-01-23 Hoechst Gosei Kk 感光性樹脂組成物
US5077175A (en) * 1988-08-30 1991-12-31 E. I. Du Pont De Nemours And Company Plasticized polyvinyl alcohol release layer for a flexographic printing plate
US4956252A (en) * 1988-08-30 1990-09-11 E. I. Dupont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US4894315A (en) * 1988-08-30 1990-01-16 E. I. Du Pont De Nemours And Company Process for making flexographic printing plates with increased flexibility
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition

Also Published As

Publication number Publication date
AU647243B2 (en) 1994-03-17
US5393637A (en) 1995-02-28
CA2061968A1 (en) 1992-09-02
KR920018520A (ko) 1992-10-22
AU1135092A (en) 1992-09-03
JPH04274428A (ja) 1992-09-30
EP0501834A1 (en) 1992-09-02

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