TW202447720A - 驅動方法、光源單元、照明單元、曝光裝置、及曝光方法 - Google Patents

驅動方法、光源單元、照明單元、曝光裝置、及曝光方法 Download PDF

Info

Publication number
TW202447720A
TW202447720A TW113112678A TW113112678A TW202447720A TW 202447720 A TW202447720 A TW 202447720A TW 113112678 A TW113112678 A TW 113112678A TW 113112678 A TW113112678 A TW 113112678A TW 202447720 A TW202447720 A TW 202447720A
Authority
TW
Taiwan
Prior art keywords
light source
current value
light
current
aforementioned
Prior art date
Application number
TW113112678A
Other languages
English (en)
Chinese (zh)
Inventor
吉田亮平
鈴木智也
阿部文彦
松村信孝
多田友行
田窪秀治
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW202447720A publication Critical patent/TW202447720A/zh

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]
    • H05B45/10—Controlling the intensity of the light
    • H05B45/18—Controlling the intensity of the light using temperature feedback
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/80—Constructional details
    • H10H29/85—Packages
    • H10H29/858—Means for heat extraction or cooling
    • H10H29/8582—Means for heat extraction or cooling characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/80—Constructional details
    • H10H29/85—Packages
    • H10H29/858—Means for heat extraction or cooling
    • H10H29/8586—Means for heat extraction or cooling comprising fluids, e.g. heat-pipes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW113112678A 2023-04-05 2024-04-03 驅動方法、光源單元、照明單元、曝光裝置、及曝光方法 TW202447720A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2023/014082 2023-04-05
PCT/JP2023/014082 WO2024209587A1 (ja) 2023-04-05 2023-04-05 駆動方法、光源ユニット、照明ユニット、露光装置、及び露光方法

Publications (1)

Publication Number Publication Date
TW202447720A true TW202447720A (zh) 2024-12-01

Family

ID=92971440

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113112678A TW202447720A (zh) 2023-04-05 2024-04-03 驅動方法、光源單元、照明單元、曝光裝置、及曝光方法

Country Status (5)

Country Link
JP (1) JPWO2024209587A1 (https=)
KR (1) KR20250160466A (https=)
CN (1) CN120958384A (https=)
TW (1) TW202447720A (https=)
WO (1) WO2024209587A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073984A (ja) * 2003-01-16 2007-03-22 Nikon Corp 照明光源装置、露光装置及び露光方法
JP2011237596A (ja) * 2010-05-10 2011-11-24 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP2012220619A (ja) * 2011-04-06 2012-11-12 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5957262B2 (ja) 2012-03-29 2016-07-27 株式会社オーク製作所 放電ランプを備えた照明装置
JP5765677B2 (ja) * 2014-01-22 2015-08-19 株式会社ニコン パターン形成装置、及びパターン形成方法

Also Published As

Publication number Publication date
WO2024209587A1 (ja) 2024-10-10
CN120958384A (zh) 2025-11-14
JPWO2024209587A1 (https=) 2024-10-10
KR20250160466A (ko) 2025-11-13

Similar Documents

Publication Publication Date Title
CN101069267A (zh) 光学积分器、照明光学装置、曝光装置以及曝光方法
JP4678493B2 (ja) 光源ユニット、照明光学装置、露光装置、および露光方法
TW202447720A (zh) 驅動方法、光源單元、照明單元、曝光裝置、及曝光方法
TWI885424B (zh) 照明單元、曝光裝置、及曝光方法
TWI876438B (zh) 光源單元、照明單元、曝光裝置、及曝光方法
TWI923077B (zh) 驅動方法、光源單元、照明單元、曝光裝置、以及曝光方法
TWI855790B (zh) 光源單元、照明單元、曝光裝置、及曝光方法
TWI920814B (zh) 曝光裝置
TWI915658B (zh) 光源單元、照明單元、曝光裝置、及曝光方法
TW202515242A (zh) 驅動方法、光源單元、照明單元、曝光裝置、以及曝光方法
CN1708828A (zh) 曝光装置以及曝光方法
TWI915769B (zh) 光源單元、照明單元、曝光裝置、以及曝光方法
TW202422239A (zh) 合成光學元件、照明單元、曝光裝置、及曝光方法
TW202505310A (zh) 光源單元、照明單元、曝光裝置、以及曝光方法
JP2021162613A (ja) 光源装置、照明装置、及び露光装置。
JP2013187505A (ja) 照明装置、照明システム、露光装置、露光方法及びデバイス製造方法
KR20260059617A (ko) 구동 방법, 광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법
TW202503431A (zh) 照明單元、曝光裝置、及曝光方法
KR20260061012A (ko) 광원 장치, 노광 장치, 및 물품의 제조 방법
TW202522131A (zh) 光源單元、照明單元、曝光裝置、以及曝光方法
TW202409743A (zh) 光源單元、照明單元、曝光裝置、及曝光方法
TW202530882A (zh) 曝光裝置
JP2023015808A (ja) 光源装置、露光装置、及び物品の製造方法