TW202420510A - Component having anchoring structure and method for producing a component having anchoring structure - Google Patents

Component having anchoring structure and method for producing a component having anchoring structure Download PDF

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Publication number
TW202420510A
TW202420510A TW112125222A TW112125222A TW202420510A TW 202420510 A TW202420510 A TW 202420510A TW 112125222 A TW112125222 A TW 112125222A TW 112125222 A TW112125222 A TW 112125222A TW 202420510 A TW202420510 A TW 202420510A
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Taiwan
Prior art keywords
carrier
shell
metal rods
conductive surface
assembly
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TW112125222A
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Chinese (zh)
Inventor
麥可 齊索斯伯格
克勞斯 瑞恩路柏
安德烈斯 布羅塞
貢納爾 彼得森
賽門 傑瑞比
托拜斯 吉布爾
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奧地利商Ams歐斯朗股份公司
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Publication of TW202420510A publication Critical patent/TW202420510A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483Containers
    • H01L33/486Containers adapted for surface mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3142Sealing arrangements between parts, e.g. adhesion promotors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49579Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
    • H01L23/49582Metallic layers on lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/54Encapsulations having a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

A component (10) is provided which comprises a carrier (1) and a housing body (2), wherein the carrier (1) comprises an electrically conductive surface (1A) and wherein the housing body (2) is electrically insulating and is mechanically fixed to the electrically conductive surface (1A) of the carrier (1). A mechanical connection between the carrier (1) and the housing body (2) is enhanced by an anchoring structure (3), wherein the anchoring structure (3) comprises metal rods (3A) penetrating into the housing body (2). The metal rods (3A) are nano-rods and/or micro-rods and are distributed meadow-like in places on the electrically conductive surface (1A) of the carrier (1). Moreover, a method for producing such a component (10) is provided.

Description

具有錨固結構的組件及用於製造具有錨固結構的組件之方法Component with anchoring structure and method for manufacturing component with anchoring structure

指明一種具有一錨固結構的組件。此外,提供一種用於製造具有一錨固結構的一組件或複數個此類組件之方法。A component having an anchoring structure is specified. In addition, a method for manufacturing a component or a plurality of such components having an anchoring structure is provided.

包含一載體及形成於該載體上之一殼體的一習知組件可由於該殼體與該載體之間的不良機械連接或不良黏著,而展現出不足的機械穩定度。A known assembly comprising a carrier and a housing formed on the carrier may exhibit insufficient mechanical stability due to a poor mechanical connection or poor adhesion between the housing and the carrier.

一目的係提供一種具有一錨固結構的組件,其構造成加強該組件之一載體與一殼體之間的機械連接,致使該組件之一改良機械穩定度。另一目的係提供一種簡化但有效率的用於製造此類組件或複數個此類組件之方法。One object is to provide a component having an anchoring structure configured to strengthen the mechanical connection between a carrier and a housing of the component, resulting in an improved mechanical stability of the component. Another object is to provide a simplified but efficient method for manufacturing such a component or a plurality of such components.

這些目的係藉依據獨立請求項之組件及藉連同獨立請求項描述之方法解決。該組件或該方法之另外具體實施例係另外請求項之標的。These objects are solved by an assembly according to the independent claims and by a method described in conjunction with the independent claims. Further specific embodiments of the assembly or of the method are the subject matter of the further claims.

依據一組件之至少一個具體實施例,該組件包括一載體及一殼體。該載體包括一導電表面。該殼體係電氣絕緣的且機械地固定至該載體之該導電表面。該載體與該殼體之間的一機械連接係藉一錨固結構加強。該錨固結構包括穿透至該殼體中之複數個金屬棒,其中該等金屬棒係奈米棒及/或微米棒,且以草地般分布於該載體之該導電表面上某些位置。According to at least one specific embodiment of an assembly, the assembly includes a carrier and a housing. The carrier includes a conductive surface. The housing is electrically insulating and mechanically fixed to the conductive surface of the carrier. A mechanical connection between the carrier and the housing is reinforced by an anchoring structure. The anchoring structure includes a plurality of metal rods penetrating into the housing, wherein the metal rods are nanorods and/or microrods and are distributed like a grass field at certain locations on the conductive surface of the carrier.

在此,該導電表面可為層該載體之一主體的一頂部表面,例如一導線架或具有金屬層之一絕緣基板等之表面。Here, the conductive surface may be a top surface of a main body of the carrier, such as a surface of a lead frame or an insulating substrate having a metal layer.

依據該組件之至少一個具體實施例,該等金屬棒具有從30奈米到20微米之橫向直徑,譬如從30奈米到10微米、從30奈米到5微米、從30奈米到2微米、從100奈米到10微米、從300奈米到10微米或從500奈米到5微米。在此,該等金屬棒可具有呈任何幾何外形之剖面。例如,此等剖面係呈圓、類似圓、橢圓或呈不規則形狀。該等金屬棒可展現一空心剖面或一填滿剖面。例如,該等金屬棒之直徑係藉對應金屬棒的最大橫向擴張提供。換言之,一金屬棒之直徑應被理解為該金屬棒之一剖面的最大橫向延伸。該等金屬棒可由如銅、金、銀、鉑、鎳或錫等金屬形成。According to at least one specific embodiment of the assembly, the metal rods have a lateral diameter from 30 nm to 20 μm, such as from 30 nm to 10 μm, from 30 nm to 5 μm, from 30 nm to 2 μm, from 100 nm to 10 μm, from 300 nm to 10 μm or from 500 nm to 5 μm. Here, the metal rods can have a cross-section with any geometric shape. For example, these cross-sections are circular, quasi-circular, elliptical or irregularly shaped. The metal rods can present a hollow cross-section or a filled cross-section. For example, the diameter of the metal rods is provided by the maximum lateral expansion of the corresponding metal rod. In other words, the diameter of a metal rod should be understood as the maximum lateral extension of a cross-section of the metal rod. The metal rods may be formed from metals such as copper, gold, silver, platinum, nickel or tin.

該等直徑在奈米棒的情況下可從30奈米到1微米,譬如從30奈米到900奈米、從30奈米到600奈米、從30奈米到300奈米、從30奈米到100奈米、或從100奈米到1微米、從300奈米到1微米、從500奈米到1微米或從600奈米到1微米。在微米棒的情況下,該等直徑可從1微米到20微米、從3微米到20微米、從5微米到20微米或從10微米到20微米。所有金屬棒可能皆為奈米棒、微米棒或奈米棒與微米棒之混合。In the case of nanorods, the diameters may be from 30 nm to 1 μm, such as from 30 nm to 900 nm, from 30 nm to 600 nm, from 30 nm to 300 nm, from 30 nm to 100 nm, or from 100 nm to 1 μm, from 300 nm to 1 μm, from 500 nm to 1 μm, or from 600 nm to 1 μm. In the case of microrods, the diameters may be from 1 μm to 20 μm, from 3 μm to 20 μm, from 5 μm to 20 μm, or from 10 μm to 20 μm. All metal rods may be nanorods, microrods, or a mixture of nanorods and microrods.

一橫向方向被理解為,與該載體之一主延伸表面平行(例如與該載體之該主體的該頂部表面平行)之一方向。一垂直方向被理解為,與該載體之該主延伸表面及/或與該載體之該主體的該頂部表面正交之一方向。該垂直方向與該橫向方向係彼此正交。A transverse direction is understood to be a direction parallel to a main extension surface of the carrier, for example parallel to the top surface of the body of the carrier. A vertical direction is understood to be a direction orthogonal to the main extension surface of the carrier and/or to the top surface of the body of the carrier. The vertical direction and the transverse direction are orthogonal to each other.

依據該組件之至少一個具體實施例,該等金屬棒具有從2微米到100微米之垂直高度,例如從2微米到80微米、從2微米到50微米、從2微米到20微米、從2微米到10微米、從2微米到5微米、或從5微米到100微米、從10微米到100微米、從20微米到100微米、從30微米到100微米、從50微米到100微米、或從60微米到100微米。According to at least one specific embodiment of the component, the metal rods have a vertical height from 2 microns to 100 microns, for example, from 2 microns to 80 microns, from 2 microns to 50 microns, from 2 microns to 20 microns, from 2 microns to 10 microns, from 2 microns to 5 microns, or from 5 microns to 100 microns, from 10 microns to 100 microns, from 20 microns to 100 microns, from 30 microns to 100 microns, from 50 microns to 100 microns, or from 60 microns to 100 microns.

所有金屬棒可能具有大概相同的垂直高度。例如,個別金屬棒中之任一者的垂直高度與所有金屬棒之平均垂直高度不致相差超過該平均垂直高度之50%、30%、20%、10%、5%或3%。All of the metal bars may have approximately the same vertical height. For example, the vertical height of any one of the individual metal bars may not differ from the average vertical height of all of the metal bars by more than 50%, 30%, 20%, 10%, 5%, or 3% of the average vertical height.

依據該組件之至少一個具體實施例,金屬棒之數量大於10、20、30、50、100、300、或大於1000。取決於該等金屬棒之直徑的尺寸,鄰接金屬棒之間的橫向距離可大於或小於該等金屬棒之平均直徑,譬如該平均直徑之0.1到10倍、該平均直徑之0.7到7倍、該平均直徑之0.5到5倍、該平均直徑之0.3到3倍、或該平均直徑之0.2到2倍。According to at least one specific embodiment of the assembly, the number of metal rods is greater than 10, 20, 30, 50, 100, 300, or greater than 1000. Depending on the size of the diameters of the metal rods, the lateral distance between adjacent metal rods can be greater than or less than the average diameter of the metal rods, such as 0.1 to 10 times the average diameter, 0.7 to 7 times the average diameter, 0.5 to 5 times the average diameter, 0.3 to 3 times the average diameter, or 0.2 to 2 times the average diameter.

依據該組件之至少一個具體實施例,該殼體係一模製體。一模製體被理解為意指可藉一封裝過程形成之一電氣絕緣體。一封裝過程一般被理解為意指依據一指明的外形成型一模製化合物的過程,且倘必要時選擇性地在溫度或壓力之作用下固化。特別地,術語「封裝過程」包含至少模製、射出成形模製、真空射出成形模製、薄膜輔助模製、轉注模製及壓縮模製。該殼體可由一電氣絕緣模製材料製作,例如一塑膠、諸如環氧樹脂或聚矽氧等一可鑄聚合物。例如,該殼體係藉壓縮模製或藉薄膜輔助模製形成。該模製材料可含有填料顆粒,譬如二氧化矽顆粒及二氧化泰坦顆粒或碳黑。According to at least one specific embodiment of the component, the housing is a molded body. A molded body is understood to mean an electrically insulating body that can be formed by a packaging process. A packaging process is generally understood to mean a process of shaping a molding compound according to a specified shape and, if necessary, selectively curing it under the action of temperature or pressure. In particular, the term "packaging process" includes at least molding, injection molding, vacuum injection molding, film-assisted molding, transfer molding and compression molding. The housing can be made of an electrically insulating molding material, such as a plastic, a castable polymer such as epoxy or silicone. For example, the housing is formed by compression molding or by film-assisted molding. The molding material may contain filler particles, such as silicon dioxide particles and titania particles or carbon black.

依據該組件之至少一個具體實施例,該載體係由一導電材料製作之一導線架,譬如由銅或銅合金製作。該導電表面可為該導線架之一表面,譬如該導線架之一頂部表面。According to at least one specific embodiment of the assembly, the carrier is a lead frame made of a conductive material, such as copper or a copper alloy. The conductive surface can be a surface of the lead frame, such as a top surface of the lead frame.

該導線架可包括一第一次區域及與該第一次區域分隔開之一第二次區域。該第一次區域及該第二次區域可被該殼體橫向地圍繞,且因此與該殼體彼此機械地連接。沿一垂直方向,該第一次區域及/或該第二次區域可至少在某些位置延伸通過該殼體。該第一次區域及該第二次區域可分派給該組件之不同電極性。該第一次區域及該第二次區域可構造成將該組件電氣接觸至一外部電壓源。The lead frame may include a first region and a second region separated from the first region. The first region and the second region may be laterally surrounded by the housing and thus mechanically connected to each other with the housing. In a vertical direction, the first region and/or the second region may extend through the housing at least at certain locations. The first region and the second region may be assigned to different polarities of the component. The first region and the second region may be configured to electrically contact the component to an external voltage source.

依據該組件之至少一個具體實施例,該載體包括一絕緣基板。該絕緣基板可能包括複數個通孔及/或電流分散結構。該載體可進一步包括一金屬層,其中該載體之該導電表面係該金屬層之一表面。例如,該載體包括一陶瓷基板,具有在其上形成之該金屬層。該金屬層可結構化且包括可在空間上分離的複數個次區域。該載體亦可為一印刷電路板。According to at least one specific embodiment of the assembly, the carrier comprises an insulating substrate. The insulating substrate may include a plurality of through holes and/or current spreading structures. The carrier may further include a metal layer, wherein the conductive surface of the carrier is a surface of the metal layer. For example, the carrier comprises a ceramic substrate having the metal layer formed thereon. The metal layer may be structured and include a plurality of sub-regions that may be separated in space. The carrier may also be a printed circuit board.

依據該組件之至少一個具體實施例,該組件進一步包括一第一半導體晶片。該第一半導體晶片可配置於該導電表面之一第一次區域上,其中該第一次區域未被該等金屬棒覆蓋。例如,該第一半導體晶片係構造成發射電磁輻射。該組件可能包括複數個第一半導體晶片。According to at least one specific embodiment of the assembly, the assembly further comprises a first semiconductor chip. The first semiconductor chip may be arranged on a first subregion of the conductive surface, wherein the first subregion is not covered by the metal rods. For example, the first semiconductor chip is configured to emit electromagnetic radiation. The assembly may comprise a plurality of first semiconductor chips.

該組件可進一步包括一第二半導體晶片,其中該第二半導體晶片係配置於未被該等金屬棒覆蓋之該導電表面的另一區域上。該第二半導體晶片可依反平行方式電氣地連接至該第一半導體晶片。該第二半導體晶片可為一保護二極體。該第二半導體晶片可嵌於該殼體內。例如該第一半導體晶片未被該殼體覆蓋。The assembly may further include a second semiconductor chip, wherein the second semiconductor chip is disposed on another area of the conductive surface not covered by the metal rods. The second semiconductor chip may be electrically connected to the first semiconductor chip in an anti-parallel manner. The second semiconductor chip may be a protection diode. The second semiconductor chip may be embedded in the housing. For example, the first semiconductor chip is not covered by the housing.

依據該組件之至少一個具體實施例,該錨固結構進一步包括複數個繫柵。例如,該等繫柵係形成為該載體之橫向部件。該等繫柵可具有該載體之最小垂直厚度。例如,該等繫柵係以在該組件之複數個側表面上之方式圍繞該殼體,該等繫柵係與該殼體齊平。According to at least one specific embodiment of the assembly, the anchoring structure further comprises a plurality of ties. For example, the ties are formed as lateral parts of the carrier. The ties may have the minimum vertical thickness of the carrier. For example, the ties surround the housing in a manner on a plurality of side surfaces of the assembly, the ties being flush with the housing.

依據該組件之至少一個具體實施例,該錨固結構進一步包括複數個階梯形元件。該等階梯形元件可在該載體之複數個側表面形成。該殼體可錨固至該等階梯形元件。如此,該殼體可防止沿一垂直方向與該載體脫離。在該載體之該頂部表面的平面視圖中,該階梯形元件可形成為一倒階梯且可能無法看到。According to at least one specific embodiment of the assembly, the anchoring structure further comprises a plurality of step-shaped elements. The step-shaped elements may be formed on a plurality of side surfaces of the carrier. The housing may be anchored to the step-shaped elements. In this way, the housing may be prevented from being separated from the carrier in a vertical direction. In a plan view of the top surface of the carrier, the step-shaped elements may be formed as an inverted staircase and may not be visible.

依據該組件之至少一個具體實施例,該組件進一步包括一封裝層。譬如,該封裝層係形成於該殼體之一開口中。該封裝層可錨固至該等金屬棒。該封裝層可以是透明的或者包括複數個填料及/或可具有一透鏡之形狀。該封裝層可能包括一轉換元件或者是該轉換元件。例如,複數個磷光體顆粒嵌於該封裝層之材料內。在俯視圖中,該封裝層可至少部分地或完全地覆蓋該第一半導體晶片。該封裝層可能藉所謂「外露晶模製(exposed die molding)」概念形成。According to at least one specific embodiment of the component, the component further includes a packaging layer. For example, the packaging layer is formed in an opening of the shell. The packaging layer can be anchored to the metal rods. The packaging layer can be transparent or include a plurality of fillers and/or can have the shape of a lens. The packaging layer may include a conversion element or be the conversion element. For example, a plurality of phosphor particles are embedded in the material of the packaging layer. In a top view, the packaging layer may at least partially or completely cover the first semiconductor chip. The packaging layer may be formed by the so-called "exposed die molding" concept.

依據一種用於製造具有一載體及一殼體之一組件的方法之一具體實施例,該方法包括形成一錨固結構於該載體之一導電表面上的步驟,其中該錨固結構包括作為奈米棒及/或微米棒之複數個金屬棒。該等金屬棒係以草地般分布於該載體之該導電表面上某些位置。該方法進一步包括於該載體上至少某些位置形成該殼體之步驟。該殼體係由一電氣絕緣材料製作且機械地固定至該載體之該導電表面,使得該等金屬棒穿透或突出至該殼體中,以加強該載體與該殼體之間的機械連接。According to one embodiment of a method for manufacturing an assembly having a carrier and a shell, the method includes a step of forming an anchoring structure on a conductive surface of the carrier, wherein the anchoring structure includes a plurality of metal rods as nanorods and/or microrods. The metal rods are distributed like grass at certain locations on the conductive surface of the carrier. The method further includes a step of forming the shell at at least certain locations on the carrier. The shell is made of an electrically insulating material and mechanically fixed to the conductive surface of the carrier so that the metal rods penetrate or protrude into the shell to strengthen the mechanical connection between the carrier and the shell.

依據該方法之至少一個具體實施例,形成錨固結構於載體之導電表面上的步驟係藉使用一模板執行,其包括作為奈米孔及/或微米孔之複數個貫穿孔。該模板可配置或形成於該載體之該導電表面上,且該等金屬棒係形成於該等貫穿孔內。例如,該模板係預製的且配置於該載體之該導電表面上。該等金屬棒可形成於該模板之該等貫穿孔內。According to at least one specific embodiment of the method, the step of forming the anchoring structure on the conductive surface of the carrier is performed by using a template, which includes a plurality of through holes as nanoholes and/or microholes. The template can be arranged or formed on the conductive surface of the carrier, and the metal rods are formed in the through holes. For example, the template is prefabricated and arranged on the conductive surface of the carrier. The metal rods can be formed in the through holes of the template.

依據該方法之至少一個具體實施例,形成錨固結構於載體之導電表面上包括藉使用一光刻過程於該導電表面上形成具有作為奈米孔及/或微米孔之複數個貫穿孔的一模板之步驟。在此情況下,該模板可直接地形成於該載體上。該等金屬棒可形成於該模板之該等貫穿孔中。該模板可由一可光構造的材料製作,例如由一可光刻的鈍態或活性的漆製作。According to at least one specific embodiment of the method, forming the anchoring structure on the conductive surface of the carrier includes the step of forming a template having a plurality of through holes as nanoholes and/or microholes on the conductive surface by using a photolithography process. In this case, the template can be formed directly on the carrier. The metal rods can be formed in the through holes of the template. The template can be made of a photostructurable material, for example, a photolithographically passive or reactive lacquer.

依據該方法之至少一個具體實施例,形成殼體之步驟係接續在形成錨固結構之步驟後。譬如,形成殼體之步驟係藉一模製或鑄造過程執行。在此,一模製材料可施加於該等金屬棒上某些位置,使得該等金屬棒在該模製材料固化之前,穿透至該殼體中。According to at least one specific embodiment of the method, the step of forming the shell is subsequent to the step of forming the anchor structure. For example, the step of forming the shell is performed by a molding or casting process. Here, a molding material can be applied to certain locations on the metal rods so that the metal rods penetrate into the shell before the molding material solidifies.

該方法特別地適合於製造本案中所描述之一組件。描述與該組件有關之特徵因此亦可用於該方法,且反之亦然。The method is particularly suitable for producing a component described in the present case. Features described in connection with the component may therefore also be applied to the method, and vice versa.

等同、等效或等效地作用的元件係在圖式中以相同參考符號指示。圖式係概略圖示出,且因此並非必然地確實按比例。相對較小的元件、且特別是層厚度可相當誇張大地圖示出,以作較佳的解釋說明。Identical, equivalent or equivalently acting elements are indicated in the drawings by the same reference symbols. The drawings are diagrammatic and therefore not necessarily true to scale. Relatively small elements and in particular layer thicknesses may be shown quite exaggerated for better illustration.

圖1A係以剖視圖顯示一組件10之一範例。組件10包括一載體1,其具有一頂部表面1A。頂部表面1A係一導電表面1A。例如,載體1包括一主體,其由一導電材料形成。頂部表面1A可為該主體之一頂部表面。一金屬層(例如一鎳鈀金層)亦可能形成於該主體上。在此情況下,作為一導電表面之頂部表面1A在此類金屬層之一表面可形成於至少某些位置。FIG. 1A shows an example of an assembly 10 in cross-section. Assembly 10 includes a carrier 1 having a top surface 1A. Top surface 1A is a conductive surface 1A. For example, carrier 1 includes a body formed of a conductive material. Top surface 1A may be a top surface of the body. A metal layer (e.g., a nickel-palladium-gold layer) may also be formed on the body. In this case, top surface 1A as a conductive surface may be formed at least at some locations on a surface of such a metal layer.

該主體可為一導線架6。導線架6或載體1可包括一第一次區域61及一第二次區域62,該第二次區域係藉一中間區域60而與第一次區域61橫向地分隔開。The main body may be a lead frame 6. The lead frame 6 or the carrier 1 may include a first sub-region 61 and a second sub-region 62, the second sub-region being separated from the first sub-region 61 by an intermediate region 60 in a transverse direction.

複數個金屬棒3A係形成於頂部表面1A上某些位置,譬如在第一次區域61及第二次區域62二者表面上某些位置。例如,金屬棒3A係奈米棒及/或微米棒,在載體1之頂部表面1A上以草地般分布。金屬棒3A可覆蓋頂部表面1A之總面積的至少5%或10%且至多80%,例如頂部表面1A之總面積的10%到70%、10%到60%、10%到50%、10%到40%之間、或10%到30%之間。金屬棒3A可形成或可為一錨固結構之部分,該錨固結構係構造成加強載體1與組件10之一殼體2之間的機械連接。A plurality of metal rods 3A are formed at certain locations on the top surface 1A, such as at certain locations on the surfaces of both the first region 61 and the second region 62. For example, the metal rods 3A are nanorods and/or microrods, which are distributed like a lawn on the top surface 1A of the carrier 1. The metal rods 3A may cover at least 5% or 10% and at most 80% of the total area of the top surface 1A, such as 10% to 70%, 10% to 60%, 10% to 50%, 10% to 40%, or 10% to 30% of the total area of the top surface 1A. The metal rods 3A may form or may be part of an anchoring structure, which is configured to strengthen the mechanical connection between the carrier 1 and a housing 2 of the assembly 10.

如圖1A中顯示者,殼體2係配置於載體1之頂部表面1A上至少某些位置,其中金屬棒3A穿透至殼體2中。是以,殼體2係錨固至金屬棒3A,致使殼體2與載體1之間黏著強度的加強。As shown in FIG. 1A , the housing 2 is disposed at least at some positions on the top surface 1A of the carrier 1 , wherein the metal rod 3A penetrates into the housing 2 . Therefore, the housing 2 is anchored to the metal rod 3A, so that the adhesive strength between the housing 2 and the carrier 1 is enhanced.

殼體2係電氣絕緣的。殼體2可為一模製體。一模製體可被理解為,意指藉一鑄造或模製過程形成之一體。是以,殼體2可由一模製材料形成。通常,模製化合物對金屬表面(譬如對一鎳鈀金層或一銅層之表面或其他金屬表面)的黏著相當低。例如,平滑且平坦的金屬層未提供充分的機械錨固。建議施加金屬棒3A至載體1之頂部表面1A,使得載體1可與殼體2錨固。如圖1A中以俯視圖顯示者,殼體2可完全地覆蓋金屬棒3A。然而,金屬棒3A中之某些者並未被殼體2覆蓋。The housing 2 is electrically insulating. The housing 2 may be a molded body. A molded body may be understood to mean a body formed by a casting or molding process. Thus, the housing 2 may be formed by a molding material. Typically, the adhesion of molding compounds to metal surfaces, such as the surface of a nickel-palladium layer or a copper layer or other metal surfaces, is quite low. For example, a smooth and flat metal layer does not provide sufficient mechanical anchoring. It is recommended to apply metal rods 3A to the top surface 1A of the carrier 1 so that the carrier 1 can be anchored to the housing 2. As shown in FIG. 1A in a top view, the housing 2 may completely cover the metal rods 3A. However, some of the metal rods 3A are not covered by the housing 2.

例如,載體1之頂部表面1A並未被金屬棒3A完全地覆蓋。未被金屬棒3A覆蓋之頂部表面1A的次區域可構造成接收一個或數個半導體晶片4及/或如同接合電線7之電氣連接。如圖1A中顯示者,組件10包括至少一個第一光電子半導體晶片41,該至少一個第一光電子半導體晶片可為一光電子半導體晶片41。第一光電子半導體晶片41可構造成,在組件10之操作期間,放射或偵測電磁輻射,譬如光譜之可見、紫外線或紅外線區域中的電磁輻射。是以,組件10可構造成放射或偵測光譜之可見、紫外線或紅外線區域中的光。For example, the top surface 1A of the carrier 1 is not completely covered by the metal rod 3A. Sub-regions of the top surface 1A not covered by the metal rod 3A can be configured to receive one or more semiconductor chips 4 and/or electrical connections such as bonding wires 7. As shown in Figure 1A, the assembly 10 includes at least one first optoelectronic semiconductor chip 41, which can be an optoelectronic semiconductor chip 41. The first optoelectronic semiconductor chip 41 can be configured to emit or detect electromagnetic radiation, such as electromagnetic radiation in the visible, ultraviolet or infrared regions of the spectrum during operation of the assembly 10. Therefore, the assembly 10 can be configured to emit or detect light in the visible, ultraviolet or infrared regions of the spectrum.

如圖1A中顯示者,組件10具有一磷光體層81,其配置或固定於第一半導體晶片41上。磷光體層81可包括一輻射透射材料,其具有嵌於其中之複數個螢光顆粒,以用於光轉換,其中該等螢光顆粒可構造成將藍光譜範圍中之紫外線輻射及/或電磁輻射轉換成綠、黃、紅或紅外線光譜範圍中之電磁輻射。As shown in Fig. 1A, the assembly 10 has a phosphor layer 81 disposed or fixed on the first semiconductor chip 41. The phosphor layer 81 may include a radiation transmissive material having a plurality of fluorescent particles embedded therein for light conversion, wherein the fluorescent particles may be configured to convert ultraviolet radiation and/or electromagnetic radiation in the blue spectral range into electromagnetic radiation in the green, yellow, red or infrared spectral range.

例如,磷光體層81並未完全地覆蓋第一半導體晶片41之一頂部表面。未被磷光體層81覆蓋之區域可構造成接收一電氣連接,例如一第一接合電線71。磷光體層81可能完全地覆蓋第一半導體晶片41之整個光學界面。該光學界面可藉第一半導體晶片41之一頂部表面界定,電磁輻射係在第一半導體晶片41之操作期間,通過該光學界面放射。第一接合電線71可將第一半導體晶片41電氣地連接至導線架6或載體1之第二次區域62。第一半導體晶片41係配置於導線架6或載體1之第一次區域61上,且其整個底部側可電氣地連接至第一次區域61。是以,第一半導體晶片41可電氣地連接至載體1或導線架6之第一次區域61及第二次區域62。組件10具有一底部表面10B,其可在第一次區域61及第二次區域62之底部表面形成於某些位置。是以,組件10經由其底部表面10B電氣地連接至一外部電源供應器。底部表面10B可能在殼體2之表面形成於某些位置。For example, the phosphor layer 81 does not completely cover a top surface of the first semiconductor chip 41. The area not covered by the phosphor layer 81 can be configured to receive an electrical connection, such as a first bonding wire 71. The phosphor layer 81 may completely cover the entire optical interface of the first semiconductor chip 41. The optical interface can be defined by a top surface of the first semiconductor chip 41, through which electromagnetic radiation is emitted during operation of the first semiconductor chip 41. The first bonding wire 71 can electrically connect the first semiconductor chip 41 to the second secondary region 62 of the lead frame 6 or the carrier 1. The first semiconductor chip 41 is arranged on the first secondary region 61 of the lead frame 6 or the carrier 1, and its entire bottom side can be electrically connected to the first secondary region 61. Therefore, the first semiconductor chip 41 can be electrically connected to the first and second regions 61 and 62 of the carrier 1 or the lead frame 6. The component 10 has a bottom surface 10B, which can be formed at certain positions on the bottom surfaces of the first and second regions 61 and 62. Therefore, the component 10 is electrically connected to an external power supply via its bottom surface 10B. The bottom surface 10B may be formed at certain positions on the surface of the housing 2.

載體1一側表面1S可能未被殼體2覆蓋,且因此可從外部觸及。是以,載體1之側表面1S亦可用於將組件10電氣地連接至一外部電源供應器。例如,載體1之第一次區域61及/或第二次區域62具有外部的側表面1S,其並未被殼體2之材料至少在某些位置或完全地覆蓋。沿一橫向方向,第一次區域61及/或第二次區域62可與殼體2齊平。然而,中間區域60可被殼體2之材料填滿,使得第一次區域61及/或第二次區域62之內側表面可被殼體2之材料覆蓋。殼體2可形成為單一件,且因此為相連的。在頂部表面1A之一平面視圖中,殼體2可完全地覆蓋第二次區段62且部分地覆蓋第一次區段61。A side surface 1S of the carrier 1 may not be covered by the housing 2 and may therefore be accessible from the outside. Therefore, the side surface 1S of the carrier 1 may also be used to electrically connect the assembly 10 to an external power supply. For example, the first and/or second regions 61, 62 of the carrier 1 have an external side surface 1S which is not covered by the material of the housing 2 at least in certain locations or completely. In a transverse direction, the first and/or second regions 61, 62 may be flush with the housing 2. However, the middle region 60 may be filled with the material of the housing 2 so that the inner surface of the first and/or second regions 61, 62 may be covered by the material of the housing 2. The housing 2 may be formed as a single piece and may therefore be connected. In a plan view of the top surface 1A, the housing 2 may completely cover the second subsection 62 and partially cover the first subsection 61.

組件10具有一外耦合表面,其可在磷光體層81之一外表面形成。磷光體層81之外表面可曝露。譬如,取決於封裝過程,磷光體層81之外耦合表面係在該模製過程後移除封裝材料或藉實行該模製過程而曝露,使得磷光體層81之外表面未在該封裝過程或模製過程期間被該模製材料覆蓋。The component 10 has an out-coupling surface, which may be formed on an outer surface of the phosphor layer 81. The outer surface of the phosphor layer 81 may be exposed. For example, depending on the encapsulation process, the out-coupling surface of the phosphor layer 81 is exposed by removing the encapsulation material after the molding process or by performing the molding process, so that the outer surface of the phosphor layer 81 is not covered by the molding material during the encapsulation process or the molding process.

組件10具有一頂部表面10A。頂部表面10A係在殼體2之表面形成於某些位置。在此情況下,殼體2可在組件10之頂部表面10A上從外部觸及。頂部表面10A可包括磷光體層81之一表面。磷光體層81之表面及殼體2之表面可在一垂直位置處彼此齊平,如圖1A中顯示者。The assembly 10 has a top surface 10A. The top surface 10A is formed at some position on the surface of the housing 2. In this case, the housing 2 can be touched from the outside on the top surface 10A of the assembly 10. The top surface 10A may include a surface of the phosphor layer 81. The surface of the phosphor layer 81 and the surface of the housing 2 may be flush with each other at a vertical position, as shown in FIG. 1A.

圖1B中顯示之一組件10的示範實施例係與圖1A中顯示之組件10的示範實施例在以俯視圖顯示時大致一致。與圖1A偏差者在於,載體1之側表面1S可能被殼體2之材料覆蓋。在橫向方向上,殼體2可完全地圍繞載體1。在此情況下,載體1之第一次區域61及第二次區域62係被殼體2圍繞。組件10之側表面10S可完全地或大部分地由殼體2之側表面提供。與此偏差者在於,組件10之側表面10S亦可能包括譬如圖5B及圖6B中顯示之繫柵3B的表面及/或階梯形元件3C。The exemplary embodiment of an assembly 10 shown in FIG. 1B is substantially identical to the exemplary embodiment of the assembly 10 shown in FIG. 1A when shown in a top view. A deviation from FIG. 1A is that the side surface 1S of the carrier 1 may be covered by the material of the housing 2. In the transverse direction, the housing 2 may completely surround the carrier 1. In this case, the first and second regions 61, 62 of the carrier 1 are surrounded by the housing 2. The side surface 10S of the assembly 10 may be provided completely or largely by the side surface of the housing 2. A deviation from this is that the side surface 10S of the assembly 10 may also include the surface of the grating 3B shown in, for example, FIGS. 5B and 6B and/or the stepped element 3C.

在圖1B中,圖示出金屬棒3A在載體1之頂部表面1A上的分布。被金屬棒3A完全地或至少在某些位置覆蓋之頂部表面1A的區域係被圖1B中之虛線架構或圍繞。頂部表面1A之這些區域可被殼體2覆蓋。然而,該覆蓋在圖1B中係以一透視方式顯示,使得可看到金屬棒3A之分布。如圖1A及圖1B中顯示者,金屬棒3A在頂部表面1A上形成草地般區域。In FIG. 1B , the distribution of the metal rods 3A on the top surface 1A of the carrier 1 is illustrated. The areas of the top surface 1A that are completely or at least in certain locations covered by the metal rods 3A are framed or surrounded by the dotted lines in FIG. 1B . These areas of the top surface 1A can be covered by the housing 2 . However, the covering is shown in a perspective manner in FIG. 1B , so that the distribution of the metal rods 3A can be seen. As shown in FIG. 1A and FIG. 1B , the metal rods 3A form a grass-like area on the top surface 1A.

如圖1B中顯示者,第一次區域61包括一安裝表面,其為頂部表面1A之部分且未被金屬棒3A覆蓋。在橫向方向上,該安裝表面可被金屬棒3A完全地圍繞。半導體晶片4或41係配置於該安裝表面上。第二次區域62包括一接觸表面,其為頂部表面1A之部分且未被金屬棒3A覆蓋。在橫向方向上,該接觸表面可被金屬棒3A部分地或完全地圍繞。該接觸表面係構造成接收第一接合電線71,其跨越中間區域60。As shown in FIG. 1B , the first sub-region 61 includes a mounting surface that is part of the top surface 1A and is not covered by the metal rod 3A. In the lateral direction, the mounting surface can be completely surrounded by the metal rod 3A. The semiconductor chip 4 or 41 is arranged on the mounting surface. The second sub-region 62 includes a contact surface that is part of the top surface 1A and is not covered by the metal rod 3A. In the lateral direction, the contact surface can be partially or completely surrounded by the metal rod 3A. The contact surface is configured to receive a first bonding wire 71 that spans the middle region 60.

如圖1A及圖1B中顯示者,殼體2可鄰接半導體晶片4之所有側表面。第一接合電線71可全部地嵌於殼體2內。第一次區段61及/或第二次區段62、及因此載體1可具有筆直且大致平滑的(複數個)側表面1S。金屬棒3A形成錨固結構3,其強化載體1與殼體2之間的機械連接。As shown in FIG. 1A and FIG. 1B , the housing 2 may be adjacent to all side surfaces of the semiconductor chip 4. The first bonding wire 71 may be completely embedded in the housing 2. The first subsection 61 and/or the second subsection 62, and thus the carrier 1, may have straight and substantially smooth side surfaces 1S. The metal rod 3A forms an anchoring structure 3, which strengthens the mechanical connection between the carrier 1 and the housing 2.

可能並非需要如繫柵3B及/或階梯形元件3C之另外的錨固元件來達成具有高機械穩定度之一組件10。特別地在小型組件10(例如小型發光二極體(LED)封裝)的情況下,無任何或幾乎無任何空間可用於形成另外的錨固元件,則金屬棒3A可形成錨固結構3之僅有的錨固元件。在此情況下,錨固結構3可取消如階梯形元件3C及/或繫柵3B之另外的錨固元件,譬如圖5B及圖6B中顯示者。Additional anchoring elements such as tie grids 3B and/or step-shaped elements 3C may not be necessary to achieve a component 10 with high mechanical stability. In particular in the case of small components 10, such as small light-emitting diode (LED) packages, there is no or hardly any space available for forming additional anchoring elements, and the metal rod 3A may form the only anchoring element of the anchoring structure 3. In this case, the anchoring structure 3 may dispense with additional anchoring elements such as step-shaped elements 3C and/or tie grids 3B, as shown in, for example, FIGS. 5B and 6B.

是以,在操作期間或已在製造期間,譬如當組件10之分離或單一化(譬如藉鋸切)實施的機械應力情況下,可能避免裂痕或裂縫出現在組件10中,或者在極端情況下,載具1(例如導線架6)之部分被扯出殼體2。當無繫柵3B時,由於單一化將僅在殼體2內實施,因此組件10之單一化可依一簡化且穩固的方式實施。Thus, in the case of mechanical stresses during operation or already during manufacturing, such as when the separation or singulation of the component 10 is carried out (e.g. by sawing), it is possible to avoid cracks or fissures appearing in the component 10 or, in extreme cases, parts of the carrier 1 (e.g. the lead frame 6) being pulled out of the housing 2. When there is no tie grid 3B, the singulation of the component 10 can be carried out in a simplified and robust manner, since the singulation will only be carried out within the housing 2.

圖2A中顯示之一組件10的示範實施例係與圖1A中顯示之組件10的示範實施例大致一致。與圖1A偏差者在於,依據圖2A,殼體2包括一開口或一孔腔20,第一半導體晶片41係配置於該開口或該孔腔中。孔腔20具有複數個傾斜內壁,此等傾斜內壁係與第一半導體晶片41分隔開且與第一接合電線71分隔開。在此情況下,第一接合電線71並未嵌於殼體2內。The exemplary embodiment of an assembly 10 shown in FIG. 2A is substantially identical to the exemplary embodiment of the assembly 10 shown in FIG. 1A . The deviation from FIG. 1A is that, according to FIG. 2A , the housing 2 includes an opening or a cavity 20 in which the first semiconductor chip 41 is disposed. The cavity 20 has a plurality of inclined inner walls that are separated from the first semiconductor chip 41 and from the first bonding wire 71. In this case, the first bonding wire 71 is not embedded in the housing 2.

孔腔20之一底部表面可包括殼體2之表面、載體1之主體或導線架6的第一次區域61及第二次區域62之表面。孔腔20之底部表面可取消金屬棒3A,或者可至少在某些位置設有金屬棒3A。孔腔20可充滿如圖4或圖6A中顯示之一封裝層82(例如充滿電氣絕緣且輻射透射)的一封裝材料,譬如透光的材料。金屬棒3A亦可提供在載體1與封裝層82之間的附加機械連接。A bottom surface of the cavity 20 may include the surface of the housing 2, the surface of the first region 61 and the second region 62 of the main body of the carrier 1 or the lead frame 6. The bottom surface of the cavity 20 may eliminate the metal rod 3A, or may be provided with the metal rod 3A at least in some positions. The cavity 20 may be filled with a packaging material such as a light-transmitting material (e.g., filled with an electrically insulating and radiation-transmissive packaging layer 82 as shown in FIG. 4 or FIG. 6A). The metal rod 3A may also provide an additional mechanical connection between the carrier 1 and the packaging layer 82.

與圖1A進一步偏差者,相似於圖1B,在橫向方向上,載體1可被殼體2完全地圍繞。這亦在圖2B中明確地顯示,其中圖2B中顯示之一組件10的示範實施例係與圖1B中顯示之組件10的示範實施例大致一致。圖2B中顯示之組件10可與圖2A中顯示之組件10等同。Further deviating from FIG. 1A , similar to FIG. 1B , in the lateral direction, the carrier 1 can be completely surrounded by the housing 2 . This is also clearly shown in FIG. 2B , where an exemplary embodiment of an assembly 10 shown in FIG. 2B is substantially identical to the exemplary embodiment of the assembly 10 shown in FIG. 1B . The assembly 10 shown in FIG. 2B can be identical to the assembly 10 shown in FIG. 2A .

如圖2B中顯示者,組件10進一步包括一第二半導體晶片42,其中第二半導體晶片42係配置於載體1之第二次區域62上。例如,第二半導體晶片42係依反平行方式電氣連接至第一半導體晶片41。第二半導體晶片42可為一保護二極體,例如一靜電放電(ESD)晶片。第二半導體晶片42可經由其底部側電氣連接至第二次區域62,且經由跨越中間區域60之一第二接合電線72電氣連接至第一次區域61。如圖2B中指示者,可以使第二半導體晶片42嵌於殼體2內。孔腔20在圖2B中係藉一實線之邊框所標記的一區域指示。是以,第二半導體晶片42可位於孔腔20外側。如圖1B中顯示者,在圖2B中,被虛線圍繞之區域係可被殼體2覆蓋且錨固至殼體2之金屬棒3A的區域。As shown in FIG. 2B , the assembly 10 further includes a second semiconductor chip 42, wherein the second semiconductor chip 42 is disposed on the second subregion 62 of the carrier 1. For example, the second semiconductor chip 42 is electrically connected to the first semiconductor chip 41 in an antiparallel manner. The second semiconductor chip 42 may be a protection diode, such as an electrostatic discharge (ESD) chip. The second semiconductor chip 42 may be electrically connected to the second subregion 62 via its bottom side and to the first subregion 61 via a second bonding wire 72 across the middle region 60. As indicated in FIG. 2B , the second semiconductor chip 42 may be embedded in the housing 2. The cavity 20 is indicated in FIG. 2B by an area marked by a solid line frame. Thus, the second semiconductor chip 42 may be located outside the cavity 20. As shown in FIG. 1B , in FIG. 2B , the area surrounded by the dotted line is the area of the metal rod 3A that can be covered by the housing 2 and anchored to the housing 2 .

圖3中顯示之一組件10的示範實施例係與圖1A中顯示之組件10的示範實施例大致一致。與圖1A偏差者在於,依據圖3,載體1之主體可由一電氣絕緣材料形成。載體1之主體可形成為單一件,且因此為相連的。譬如,載體1之主體係一絕緣基板5。絕緣基板5可為一陶瓷基板、一印刷電路板(PCB)或相似物。The exemplary embodiment of an assembly 10 shown in FIG. 3 is substantially identical to the exemplary embodiment of an assembly 10 shown in FIG. 1A . A deviation from FIG. 1A is that, according to FIG. 3 , the main body of the carrier 1 may be formed of an electrically insulating material. The main body of the carrier 1 may be formed as a single piece and thus connected. For example, the main body of the carrier 1 is an insulating substrate 5. The insulating substrate 5 may be a ceramic substrate, a printed circuit board (PCB) or the like.

載體1包括一金屬層50。金屬層50可為由銅、金、銀、鉑、鎳及錫中至少一者製作或包括至少一者、或者為一鎳鈀金層之一金屬層。金屬層50具有一垂直厚度,其顯著地較絕緣基板5之一垂直厚度小,例如至少小於3、5、10、20或至少50倍。金屬層50可劃分成複數個在空間上分離的次區域51及52,其中次區域51及52可構造成接收半導體晶片4及/或如接合電線7之電氣連接。金屬層50亦可包括複數個條形區域,其形成為導體軌跡,用於電氣連接譬如呈相同電極性之不同次區域51及52。The carrier 1 comprises a metal layer 50. The metal layer 50 may be a metal layer made of or comprising at least one of copper, gold, silver, platinum, nickel and tin, or a nickel-palladium-gold layer. The metal layer 50 has a vertical thickness which is significantly smaller than a vertical thickness of the insulating substrate 5, for example, at least 3, 5, 10, 20 or at least 50 times smaller. The metal layer 50 may be divided into a plurality of spatially separated sub-regions 51 and 52, wherein the sub-regions 51 and 52 may be configured to receive the semiconductor chip 4 and/or electrical connections such as bonding wires 7. The metal layer 50 may also include a plurality of strip-shaped regions formed as conductor tracks for electrically connecting, for example, different sub-regions 51 and 52 of the same polarity.

作為載體1之一導電表面1A的頂部表面1A可在金屬層50之一表面形成。金屬棒3A可在金屬層50之表面的複數個預定區域上形成,譬如生長。The top surface 1A as a conductive surface 1A of the carrier 1 may be formed on a surface of the metal layer 50. The metal rods 3A may be formed on a plurality of predetermined regions on the surface of the metal layer 50, for example, by growth.

圖4中顯示之一組件10的示範實施例係與圖2A中顯示之組件10的示範實施例大致一致。對比地,依據圖4,相似於圖3,載體1可包括一絕緣基板5及一金屬層50。The exemplary embodiment of an assembly 10 shown in FIG4 is substantially consistent with the exemplary embodiment of the assembly 10 shown in FIG2A. In contrast, according to FIG4, similar to FIG3, the carrier 1 may include an insulating substrate 5 and a metal layer 50.

此外,孔腔20充滿一封裝層82,其錨固至在孔腔20之一底部表面上形成的金屬棒3A。在此,金屬棒3A穿透至封裝層82中,以強化載體1與封裝層82之間的機械連接。封裝層82可部分地或完全地填滿該孔腔。組件10之頂部表面10A可在封裝層82之一頂部表面部分地形成且在殼體2之一頂部表面部分地形成。封裝層82之頂部表面可為如圖4中顯示之一平表面,或者凹地或凸地彎曲,譬如圖6A中顯示之圓頂型。封裝層82可具有一透鏡之外形。譬如第一接合電線71等接合電線7可全部地嵌於封裝層82內。In addition, the cavity 20 is filled with a packaging layer 82, which is anchored to a metal rod 3A formed on a bottom surface of the cavity 20. Here, the metal rod 3A penetrates into the packaging layer 82 to strengthen the mechanical connection between the carrier 1 and the packaging layer 82. The packaging layer 82 can partially or completely fill the cavity. The top surface 10A of the component 10 can be partially formed on a top surface of the packaging layer 82 and partially formed on a top surface of the shell 2. The top surface of the packaging layer 82 can be a flat surface as shown in Figure 4, or it can be concavely or convexly curved, such as the dome shape shown in Figure 6A. The packaging layer 82 can have the appearance of a lens. The bonding wires 7, such as the first bonding wire 71, can be completely embedded in the packaging layer 82.

圖5A中顯示之一組件10的示範實施例係與圖1A中顯示之組件10的示範實施例大致一致。除了圖1A中顯示之金屬棒3A以外,依據圖5A,錨固結構3可進一步包括繫柵3B及/或階梯形元件3C。The exemplary embodiment of an assembly 10 shown in Fig. 5A is substantially identical to the exemplary embodiment of the assembly 10 shown in Fig. 1A. In addition to the metal rod 3A shown in Fig. 1A, according to Fig. 5A, the anchoring structure 3 may further include a grating 3B and/or a stepped element 3C.

在本案中,一繫柵3B可被理解為載體1之一橫向部,其可沿一橫向方向延伸至組件10之一側表面10S。是以,繫柵3B係在組件10之側表面10S處可見。在組件10之側表面10S處,繫柵3B可具有單一化痕跡。這係由於繫柵3B被分離(例如在單一化過程期間切割或鋸切),譬如在圖7D中顯示者。在載體1之頂部表面1A的平面視圖中,繫柵3B係形成為從載體1之第一次區域61或第二次區域62橫向地延伸之條帶。繫柵3B通常具有較第一次區域61或第二次區域62之總長度或總寬度小的一較小橫向長度或寬度,例如至少小於3、4、5、6或10倍。In the present case, a tie 3B can be understood as a transverse portion of the carrier 1, which can extend in a transverse direction to a side surface 10S of the component 10. Therefore, the tie 3B is visible at the side surface 10S of the component 10. At the side surface 10S of the component 10, the tie 3B can have singulation marks. This is due to the tie 3B being separated (for example cut or sawed during the singulation process), such as shown in FIG. 7D. In a plan view of the top surface 1A of the carrier 1, the tie 3B is formed as a strip extending transversely from the first or second area 61, 62 of the carrier 1. The grating 3B typically has a smaller transverse length or width than the total length or total width of the first or second region 61, 62, for example, at least 3, 4, 5, 6 or 10 times smaller.

在本案中,一階梯形元件3C可被理解為載體1之一過切(德文:咬邊)。在階梯形元件3C之位置處,載體1具有一減少的垂直高度,譬如載體1之總厚度從20%到80%、從20%到70%、從20%到60%、從20%到50%或從20%到40%的減少。不同於繫柵3B,在載體1之頂部表面1A的平面視圖中,由於階梯形元件3C係位於載體1之頂部表面1A下方,因此該階梯形元件通常不可見。在載體1之頂部表面1A下方,階梯形元件3C可大致沿第一次區域61或第二區域62之整個橫向長度或寬度延伸。階梯形元件3C可位於第一次區域61與第二次區域62之間的中間區域60旁邊。階梯形元件3C亦可位於載體1之側表面1S旁邊。倘載體1被殼體2圍繞,則階梯形元件3C通常在組件10之側表面10S處不可見。In the present case, a trapezoidal element 3C can be understood as an overcut (German: undercut) of the carrier 1. At the location of the trapezoidal element 3C, the carrier 1 has a reduced vertical height, for example a reduction of the total thickness of the carrier 1 from 20% to 80%, from 20% to 70%, from 20% to 60%, from 20% to 50% or from 20% to 40%. Unlike the grating 3B, the trapezoidal element 3C is generally not visible in a plan view of the top surface 1A of the carrier 1, since it is located below the top surface 1A of the carrier 1. Below the top surface 1A of the carrier 1, the trapezoidal element 3C can extend approximately along the entire transverse length or width of the first region 61 or the second region 62. The step-shaped element 3C may be located beside the middle area 60 between the first sub-area 61 and the second sub-area 62. The step-shaped element 3C may also be located beside the side surface 1S of the carrier 1. If the carrier 1 is surrounded by the housing 2, the step-shaped element 3C is usually not visible at the side surface 10S of the assembly 10.

圖5B中顯示之一組件10的示範實施例係與圖5A中顯示之組件10的示範實施例在以俯視圖顯示時大致一致。如圖5B中顯示者,載體1之第一次區域61及第二次區域62中的每一者可包括數個繫柵3B,在此例如分別為六及四個繫柵3B。在頂部表面1A下方之(複數個)階梯形元件3C可存在,但未在圖5B中明確地顯示。通常,階梯形元件3C具有較繫柵3B大之一較大橫向寬度或一較大橫向長度。階梯形元件3C可具有較繫柵3B大之一較大垂直厚度。繫柵3B係構造成在製造期間連接不同組件10之不同載體1的不同第一次區域61及/或不同第二次區域62。由於在組件10之單一化過程中,繫柵3B被切斷,因此繫柵3B通常設計成具有小尺寸。The exemplary embodiment of an assembly 10 shown in FIG5B is substantially identical to the exemplary embodiment of the assembly 10 shown in FIG5A when shown in a top view. As shown in FIG5B , each of the first and second regions 61, 62 of the carrier 1 may include a plurality of ties 3B, here for example six and four ties 3B, respectively. (Multiple) step-shaped elements 3C below the top surface 1A may be present, but are not explicitly shown in FIG5B . Typically, the step-shaped elements 3C have a larger lateral width or a larger lateral length than the ties 3B. The step-shaped elements 3C may have a larger vertical thickness than the ties 3B. The tie gate 3B is configured to connect different first sub-regions 61 and/or different second sub-regions 62 of different carriers 1 of different components 10 during manufacturing. Since the tie gate 3B is cut during the singulation process of the component 10, the tie gate 3B is generally designed to have a small size.

結合圖3及圖4,繫柵3B可能在金屬層50之一次區域形成。階梯形元件3C可藉由構造絕緣基板5形成,譬如藉局部地減少絕緣基板5之垂直厚度而形成。3 and 4, the tie gate 3B may be formed in a primary region of the metal layer 50. The step-shaped element 3C may be formed by structuring the insulating substrate 5, for example, by locally reducing the vertical thickness of the insulating substrate 5.

圖6A中顯示之一組件10的示範實施例係與圖2A中顯示之組件10的示範實施例大致一致。除了金屬棒3A以外,依據圖6A且相似於圖5A,錨固結構3可進一步包括繫柵3B及/或階梯形元件3C。此外,在圖6A中,明確地顯示出,孔腔20完全地充滿封裝層82,其為圓頂型且具有一透鏡之外形。此外,明確地顯示出,形成於孔腔20之底部表面上的金屬棒3A係穿透至封裝層82中。The exemplary embodiment of an assembly 10 shown in FIG. 6A is substantially identical to the exemplary embodiment of the assembly 10 shown in FIG. 2A . In addition to the metal rod 3A, the anchoring structure 3 may further include a grating 3B and/or a stepped element 3C according to FIG. 6A and similar to FIG. 5A . Furthermore, in FIG. 6A , it is clearly shown that the cavity 20 is completely filled with the encapsulation layer 82, which is dome-shaped and has the appearance of a lens. Furthermore, it is clearly shown that the metal rod 3A formed on the bottom surface of the cavity 20 penetrates into the encapsulation layer 82.

圖6B中顯示之一組件10的示範實施例係與圖2B中顯示之組件10的示範實施例大致一致。除了金屬棒3A以外,依據圖6B且相似於圖5B,錨固結構3可進一步包括繫柵3B及/或階梯形元件3C。圖6B中以俯視圖顯示之組件可為圖6A中以剖視圖顯示之組件10。The exemplary embodiment of an assembly 10 shown in FIG6B is substantially identical to the exemplary embodiment of the assembly 10 shown in FIG2B . In addition to the metal rod 3A, the anchoring structure 3 may further include a grating 3B and/or a stepped element 3C according to FIG6B and similar to FIG5B . The assembly shown in a top view in FIG6B may be the assembly 10 shown in a cross-sectional view in FIG6A .

圖7A至圖7D顯示出用於製造複數個組件10之一些方法步驟。藉本方法製造之組件10可為本案中描述之組件10的任一者。為了清晰易懂,與圖7A至圖7D連結僅明確地顯示出譬如在圖3、圖5A及圖5B中描述之組件10的製造。7A to 7D show some method steps for manufacturing a plurality of components 10. The components 10 manufactured by the method can be any of the components 10 described in the present case. For the sake of clarity, the connection with FIGS. 7A to 7D only explicitly shows the manufacture of components 10 such as those described in FIGS. 3, 5A and 5B.

依據圖7A,提供一載體複合物1V。載體複合物1V包括複數個載體1。每一個載體1可包括至少一個第一次區域51或61,及至少一個第二次區域52或62。某一第一次區域51或61可藉繫柵3B機械地連接至某一鄰接第二次區域52或62、或者至另一第一次區域51或61。某一第二次區域52或62可藉繫柵3B機械地連接至某一鄰接第一次區域51或61、或者至另一第二次區域52或62。第一次區域51或61及第二次區域52或62可為在譬如一絕緣基板5上形成之一導線架6或一金屬層50之部分。According to FIG. 7A , a carrier complex 1V is provided. The carrier complex 1V includes a plurality of carriers 1. Each carrier 1 may include at least one first region 51 or 61, and at least one second region 52 or 62. A first region 51 or 61 may be mechanically connected to an adjacent second region 52 or 62, or to another first region 51 or 61, by means of a tie 3B. A second region 52 or 62 may be mechanically connected to an adjacent first region 51 or 61, or to another second region 52 or 62, by means of a tie 3B. The first region 51 or 61 and the second region 52 or 62 may be part of a lead frame 6 or a metal layer 50 formed on, for example, an insulating substrate 5.

一模板9係配置或形成於載體複合物1V上。模板9包括複數個為奈米孔及/或微米孔之貫穿孔9H。貫穿孔9H之分布可適應於圖7B中顯示之第一次區域51或61、第二次區域52或62及/或繫柵3B的尺寸及幾何形狀。模板9可包括複數個無貫穿孔9H的第一次區域91及第二次區域92。模板9之第一次區域91及/或第二次區域92中之每一者可被貫穿孔9H橫向地圍繞。在俯視圖中未覆蓋載體複合物1V之第一次區域51或61、第二次區域52或62及/或繫柵3B的模板9之其他區域亦可無貫穿孔9H。A template 9 is arranged or formed on the carrier complex 1V. The template 9 includes a plurality of through holes 9H which are nanopores and/or micropores. The distribution of the through holes 9H can be adapted to the size and geometry of the first region 51 or 61, the second region 52 or 62 and/or the grating 3B shown in FIG. 7B . The template 9 may include a plurality of first regions 91 and second regions 92 without through holes 9H. Each of the first region 91 and/or the second region 92 of the template 9 may be laterally surrounded by the through holes 9H. Other regions of the template 9 which do not cover the first region 51 or 61, the second region 52 or 62 and/or the grating 3B of the carrier complex 1V in the top view may also be free of through holes 9H.

模板9可由一電氣絕緣材料形成。包括貫穿孔9H之模板9例如可使用一光刻方法,預製或直接地形成於載體複合物1V上,譬如載體1之頂部表面1A上。在該光刻方法之情況下,模板9可由一可光構造的材料製作,例如由一可光刻的鈍態或活性的漆製作。The template 9 can be formed from an electrically insulating material. The template 9 including the through holes 9H can be prefabricated or directly formed on the carrier composite 1V, such as the top surface 1A of the carrier 1, for example using a photolithography method. In the case of the photolithography method, the template 9 can be made of a photostructurable material, for example, a photolithographically passive or reactive lacquer.

金屬棒3A可在貫穿孔9H內及/或通過該貫穿孔形成。金屬棒3A之形成可依許多方式完成,例如使用貫穿孔9H之毛細作用,此等貫穿孔作為孔隙/通道且允許一溶解材料之溶液在溶劑緩慢蒸發後進入該等孔隙。亦可能使用電沈積,其中載體1之頂部表面1A用作為一電極,譬如用於電鍍之陰極。另一選擇為,可使用無電解鍍,其中一催化劑係施加至貫穿孔9H之壁,這促使金屬沈積於模板9之活性化孔隙上。如此方式製造之微米或奈米材料係呈線或小管之外形。是以,一般地,金屬棒3A可為線或小管。The metal rod 3A can be formed in and/or through the through-hole 9H. The formation of the metal rod 3A can be accomplished in many ways, such as by using the capillary action of the through-hole 9H, which acts as a pore/channel and allows a solution of a dissolved material to enter the pores after the solvent evaporates slowly. It is also possible to use electrodeposition, in which the top surface 1A of the carrier 1 is used as an electrode, such as a cathode for electroplating. Alternatively, electroless plating can be used, in which a catalyst is applied to the wall of the through-hole 9H, which promotes metal deposition on the activated pores of the template 9. The micron or nano material manufactured in this way is in the shape of a wire or a small tube. Therefore, generally, the metal rod 3A can be a wire or a small tube.

如圖7C中顯示者,金屬棒3A係形成於載體複合物1V上或載體1上之預定位置中。形成殼體2之步驟可接續在形成金屬棒3A之步驟或形成錨固結構3之步驟後。例如,在殼體2形成之前,移除模板9。As shown in FIG7C , the metal rod 3A is formed in a predetermined position on the carrier composite 1V or on the carrier 1. The step of forming the shell 2 may be subsequent to the step of forming the metal rod 3A or the step of forming the anchor structure 3. For example, the template 9 is removed before the shell 2 is formed.

譬如第一半導體晶片41及/或第二半導體晶片42等半導體晶片4可配置於載體1之第一次區域51或61及/或第二次區域52或62的預定位置上。在橫向方向上,該等半導體晶片4中之每一者可被金屬棒3A部分地或完全地圍繞。Semiconductor chips 4, such as the first semiconductor chip 41 and/or the second semiconductor chip 42, may be arranged at predetermined positions of the first and/or second regions 51 or 61 and/or 52 or 62 of the carrier 1. In the lateral direction, each of the semiconductor chips 4 may be partially or completely surrounded by the metal rod 3A.

此外,在殼體2形成之前或期間,可藉形成接合電線7(譬如藉形成第一接合電線71及/或第二接合電線72)將半導體晶片4電氣地連接至對應載體1之某一另外的第一或第二次區域51、61、52或62。Furthermore, before or during the formation of the housing 2 , the semiconductor chip 4 may be electrically connected to another first or second subregion 51 , 61 , 52 or 62 of the corresponding carrier 1 by forming bonding wires 7 (eg, by forming first bonding wires 71 and/or second bonding wires 72 ).

形成殼體2之步驟可藉一模製或鑄造過程執行,其中一模製材料係施加於金屬棒3A上至少某些位置,使得金屬棒3A在該模製材料固化之前,穿透至殼體2中。是以,殼體2係形成於載體複合物1V上或載體1上至少某些位置。在此,殼體2係由一電氣絕緣材料製作,且機械地固定至作為載體1之導電表面1A的頂部表面1A,使得金屬棒3A穿透至殼體2中,以加強載體1與殼體2之間的機械連接。The step of forming the shell 2 can be performed by a molding or casting process, in which a molding material is applied to at least some positions of the metal rod 3A so that the metal rod 3A penetrates into the shell 2 before the molding material solidifies. Therefore, the shell 2 is formed on the carrier composite 1V or at least some positions on the carrier 1. Here, the shell 2 is made of an electrically insulating material and is mechanically fixed to the top surface 1A as the conductive surface 1A of the carrier 1 so that the metal rod 3A penetrates into the shell 2 to strengthen the mechanical connection between the carrier 1 and the shell 2.

依據圖7D,組件10可沿複數個單一化線9L被單一化。在俯視圖中,單一化線9L與繫柵3B交叉。是以,繫柵3B可被切斷。組件10之側表面10S或載體1之側表面1S係沿單一化線9L形成。是以,繫柵3B可在譬如圖5A至圖6B中顯示之側表面1S或10S處可見。在側表面1S或10S上,繫柵3B可具有單一化痕跡,譬如來自一鋸切過程之機械痕跡。According to FIG. 7D , the component 10 can be singulated along a plurality of singulation lines 9L. In the top view, the singulation lines 9L intersect the grating 3B. Thus, the grating 3B can be cut. The side surface 10S of the component 10 or the side surface 1S of the carrier 1 is formed along the singulation lines 9L. Thus, the grating 3B can be visible at the side surface 1S or 10S shown in, for example, FIGS. 5A to 6B . On the side surface 1S or 10S, the grating 3B can have singulation marks, for example mechanical marks from a sawing process.

如本案中描述者,金屬棒3A可用於將殼體2及/或一封裝層82錨固至載體1,特別地至載體1之一金屬的頂部表面1A。頂部表面1A之布局以及材料二者因此大多可自由地選擇,且用於黏著之有效表面面積加大。用於金屬棒3A之可能材料可為銅、金、銀、鉑、鎳、錫等。在殼體2係一環氧樹脂模製化合物(EMC)之情況下,例如銅,由於銅的高黏著特性而為金屬棒3A之非常合適的材料。As described in the present case, the metal rod 3A can be used to anchor the housing 2 and/or the encapsulation layer 82 to the carrier 1, in particular to a metallic top surface 1A of the carrier 1. Both the layout and the material of the top surface 1A can thus be mostly freely selected, and the effective surface area for adhesion is increased. Possible materials for the metal rod 3A can be copper, gold, silver, platinum, nickel, tin, etc. In the case of the housing 2 being an epoxy molding compound (EMC), copper, for example, is a very suitable material for the metal rod 3A due to its high adhesion properties.

金屬棒3A之幾何形狀及放置,譬如可使用一預製模板9等許多方式界定,或者可在載體1上經由一光步驟界定。金屬棒3A之分布可因此非常確切地且精細地界定。此外,倘具有金屬棒3A之次區域的光刻清晰度與薄膜結合,且此等薄膜之離子軌跡蝕刻通道決定金屬棒3A之直徑及密度,則金屬棒3A之分布可依一簡化方式預先界定。The geometry and placement of the metal rods 3A can be defined in many ways, for example using a prefabricated template 9, or can be defined on the carrier 1 by a photoprocess. The distribution of the metal rods 3A can thus be defined very accurately and finely. Furthermore, the distribution of the metal rods 3A can be predefined in a simplified manner if the photolithographic resolution of the sub-areas with metal rods 3A is combined with thin films, and the ion track etching channels of these thin films determine the diameter and density of the metal rods 3A.

將可為一射出成形模製體之一殼體錨固在一基板或一導線架上時,金屬棒技術之使用在許多方面皆有利。The use of metal rod technology when anchoring a housing, which may be an injection molded body, to a substrate or a lead frame is advantageous in many ways.

例如,由於模製表面在模製過程期間(例如在射出成形模製期間)仍保持未被佔用,因此金屬棒3A之位置將清楚界定,使得甚至當可能的孔腔模製時,仍不致與該模製過程衝突。For example, since the molding surface remains unoccupied during the molding process (e.g. during injection molding), the position of the metal rod 3A will be clearly defined so that even when possible cavities are molded, there will be no conflict with the molding process.

用於附接該等半導體晶片及用於線接合的安裝區可維持在小的。半導體晶片4及/或接合電線7可能在很大的熱機械應力發生時脫離的風險將可顯著地減少。The mounting area for attaching the semiconductor chips and for wire bonding can be kept small. The risk that the semiconductor chip 4 and/or the bonding wire 7 may become detached when large thermomechanical stresses occur can be significantly reduced.

金屬棒3A尺寸及/或金屬棒3A之間隔或密度可適合於填充顆粒之尺寸,此等填充顆粒可嵌於殼體2內及/或封裝層82內。例如,金屬棒3A之間的橫向距離可較此等填充顆粒之尺寸或直徑大或小。The size of the metal rods 3A and/or the spacing or density of the metal rods 3A can be adapted to the size of the filling particles, which can be embedded in the shell 2 and/or in the packaging layer 82. For example, the lateral distance between the metal rods 3A can be larger or smaller than the size or diameter of the filling particles.

使用金屬棒3A,殼體2及/或封裝層82對載體1之CTE(熱膨脹係數)匹配的需求可減少。因此,可能使用透明或透光材料,用於殼體2及/或用於封裝層82。By using the metal rod 3A, the need for CTE (coefficient of thermal expansion) matching of the housing 2 and/or the encapsulation layer 82 to the carrier 1 can be reduced. Therefore, it is possible to use transparent or light-transmitting materials for the housing 2 and/or for the encapsulation layer 82.

例如,在殼體2係一模製體之情況下,該模製體環繞載體1(例如導線架6)之主體的模配合可變得更緊密,在孔腔模製時,將減少或簡化所謂的去毛邊過程。由於導線架6與該模製體之間的間隙所致之諸如塗布材料一般之滲漏及焊接熔劑或類似的低黏度材料之滲漏(例如聚矽氧滲漏)的問題,將被消除或至少顯著地減少。於模製過程期間,例如在液體聚集態下之殼體2與頂部表面1A之間,由於加壓液態模製化合物的洩漏,使得該去毛邊過程變得必要。For example, in the case where the housing 2 is a molded body, the mold fit of the molded body around the main body of the carrier 1 (e.g., the lead frame 6) can become tighter, which will reduce or simplify the so-called deburring process during cavity molding. Problems such as general leakage of coating materials and leakage of welding flux or similar low-viscosity materials (e.g., silicone leakage) due to the gap between the lead frame 6 and the molded body will be eliminated or at least significantly reduced. During the molding process, for example, the deburring process becomes necessary due to leakage of pressurized liquid molding compound between the housing 2 in a liquid aggregate state and the top surface 1A.

如上述者,金屬棒3A也是不僅用於可藉射出成形模製形成的殼體2且用於其他材料之一有效錨固,且因此可用於錨固譬如呈透明封裝或透鏡(諸如可藉壓縮模製或調配而製造的聚矽氧透鏡)形式的封裝層82。As mentioned above, the metal rod 3A is also used not only for the shell 2 which can be formed by injection molding but also for effective anchoring of one of the other materials, and can therefore be used to anchor a packaging layer 82 in the form of a transparent package or lens (such as a silicone lens which can be manufactured by compression molding or compounding).

除了機械連接以外,金屬棒3A亦改良熱耦合,且因此有助於更有效地消散熱損失。不存在金屬棒3A時,環氧樹脂模製化合物(EMC)與載體1之間(例如從環氧樹脂模製化合物到銅)的CTE轉變可極其急劇。藉由在作為微米線及/或奈米線之金屬棒3A中模製,CTE轉變將變得平滑,由此將顯著地改良熱機械可靠性。In addition to the mechanical connection, the metal rods 3A also improve thermal coupling and thus help to dissipate heat losses more efficiently. Without the presence of the metal rods 3A, the CTE transition between the epoxy molding compound (EMC) and the carrier 1 (e.g. from the epoxy molding compound to copper) can be very sharp. By molding in the metal rods 3A as microwires and/or nanowires, the CTE transition will become smooth, thereby significantly improving the thermo-mechanical reliability.

是以,封裝金屬棒3A減少奈米線及/或奈米線EMC化合物之CTE。EMC材料本身不再需要針對CTE精確地匹配載體1,甚至不使用無機填料,例如二氧化矽顆粒。這容許以較少的無機填料處理較多的可填充EMC。殼體2或固化的EMC因此更易延展,這進一步增加組件10之穩定度。封裝的金屬棒3A亦提供應力吸收且增加組件10之機械穩定度。Thus, the encapsulated metal rod 3A reduces the CTE of the nanowire and/or nanowire EMC compound. The EMC material itself no longer needs to be precisely matched to the carrier 1 with respect to CTE, even without the use of inorganic fillers, such as silica particles. This allows more fillable EMC to be processed with less inorganic filler. The housing 2 or the cured EMC is thus more ductile, which further increases the stability of the assembly 10. The encapsulated metal rod 3A also provides stress absorption and increases the mechanical stability of the assembly 10.

組件10可為一LED封裝,其具有譬如作為一射出成形模製體之殼體2。是以,組件10可為一預先模製封裝、一四方平面無引線(QFN)封裝或薄膜輔助模製(FAM)封裝,其具有該殼體在載體1上的良好錨固,該載體包括譬如一導線架、陶瓷基板或一PCB。倘殼體2之材料(譬如環氧樹脂或聚矽氧或混合物)的黏著在金屬表面上相當不良,亦可能用附加的機械錨固,例如藉使用另外的錨固結構,如載體1中之階梯形元件3C或繫柵3B形式的過切。然而,特別地在小型組件10(譬如小型LED封裝)之情況下,倘無空間或僅有小空間可用於此目的,則僅使用金屬棒3A亦可足以達成一高度穩定的組件10。The component 10 may be an LED package having a housing 2, for example, as an injection molded body. Thus, the component 10 may be a pre-molded package, a quad flat no-lead (QFN) package or a film-assisted molding (FAM) package, having a good anchoring of the housing on a carrier 1, which comprises, for example, a lead frame, a ceramic substrate or a PCB. If the material of the housing 2 (e.g. epoxy or silicone or a mixture) has a rather poor adhesion on metal surfaces, additional mechanical anchoring is also possible, for example by using further anchoring structures, such as overcuts in the form of step elements 3C or tie bars 3B in the carrier 1. However, particularly in the case of small components 10 such as small LED packages, if no space or only little space is available for this purpose, the use of metal rods 3A alone may be sufficient to achieve a highly stable component 10 .

本申請案主張德國專利申請案第102022117093.4號之優先權,該案之揭示內容係藉參考方式包含於此中。This application claims priority to German Patent Application No. 102022117093.4, the disclosure of which is incorporated herein by reference.

本發明並非藉參考示範實施例所作之發明說明而限於示範實施例。本發明反而包括任何新穎特徵及特徵之任何組合,特別地包含請求項中特徵的任何組合,即使該特徵或該組合本身並未在專利請求項或示範實施例中明確地指示時亦然。The present invention is not limited to the exemplary embodiments by the invention description made with reference to the exemplary embodiments. Instead, the present invention includes any novel features and any combination of features, especially including any combination of features in the claims, even if the feature or the combination itself is not explicitly indicated in the patent claims or the exemplary embodiments.

10:組件 10A:組件之頂部表面 10B:組件之底部表面 10S:組件之側表面 1:載體 1A:載體之頂部表面/載體之導電表面 1S:載體之側表面 1V:載體複合物 2:殼體 20:殼體之孔腔 3:錨固結構 3A:金屬棒 3B:繫柵 3C:階梯形元件 4:半導體晶片 41:第一半導體晶片 42:第二半導體晶片 5:絕緣基板 50:金屬層 51:金屬層/載體之第一次區域 52:金屬層/載體之第二次區域 6:導線架 61:導線架/載體之第一次區域 62:導線架/載體之第二次區域 60:中間區域 7:接合電線 71:第一接合電線 72:第二接合電線 81:磷光體層 82:封裝層 9:模板 91:模板之第一次區域 92:模板之第二次區域 9H:模板之貫穿孔 9L:單一化線 10: Component 10A: Top surface of component 10B: Bottom surface of component 10S: Side surface of component 1: Carrier 1A: Top surface of carrier/conductive surface of carrier 1S: Side surface of carrier 1V: Carrier composite 2: Housing 20: Hole of housing 3: Anchor structure 3A: Metal rod 3B: Tie bar 3C: Step element 4: Semiconductor chip 41: First semiconductor chip 42: Second semiconductor chip 5: Insulating substrate 50: Metal layer 51: First region of metal layer/carrier 52: Second region of metal layer/carrier 6: Lead frame 61: First region of lead frame/carrier 62: Second region of lead frame/carrier 60: Middle region 7: Bonding wire 71: First bonding wire 72: Second bonding wire 81: Phosphor layer 82: Packaging layer 9: Template 91: First region of template 92: Second region of template 9H: Through hole of template 9L: Singularization line

該組件或該方法之另外具體實施例及進一步發展將由以下連同圖1A、圖1B、圖2A、圖2B、圖3、圖4、圖5A、圖5B、圖6A、圖6B、圖7A、圖7B、圖7C及圖7D闡明之具體實施例而顯而易見。 圖1A及圖1B以剖視圖及以俯視圖顯示出一組件之範例的概略圖示。 圖2A、圖2B、圖3、圖4、圖5A、圖5B、圖6A及圖6B以剖視圖及以俯視圖顯示出一組件之另外範例的概略圖示。 圖7A、圖7B、圖7C及圖7D顯示出用於製造至少一個組件或複數個此類組件之一些方法步驟的概略圖示。 Further specific embodiments and further developments of the component or the method will become apparent from the specific embodiments described below in conjunction with FIGS. 1A, 1B, 2A, 2B, 3, 4, 5A, 5B, 6A, 6B, 7A, 7B, 7C and 7D. FIGS. 1A and 1B show schematic diagrams of examples of a component in cross-section and in top view. FIGS. 2A, 2B, 3, 4, 5A, 5B, 6A and 6B show schematic diagrams of further examples of a component in cross-section and in top view. FIGS. 7A, 7B, 7C and 7D show schematic diagrams of some method steps for manufacturing at least one component or a plurality of such components.

1:載體 1: Carrier

1A:載體之頂部表面/載體之導電表面 1A: Top surface of carrier/conductive surface of carrier

1S:載體之側表面 1S: Side surface of the carrier

2:殼體 2: Shell

3:錨固結構 3: Anchor structure

3A:金屬棒 3A: Metal rod

4:半導體晶片 4: Semiconductor chip

6:導線架 6: Conductor frame

7:接合電線 7: Joining wires

10:組件 10: Components

10A:組件之頂部表面 10A: Top surface of component

10B:組件之底部表面 10B: Bottom surface of the component

10S:組件之側表面 10S: Side surface of component

41:第一半導體晶片 41: First semiconductor chip

60:中間區域 60: Middle area

61:導線架/載體之第一次區域 61: The first area of the wire frame/carrier

62:導線架/載體之第二次區域 62: Second area of the wire frame/carrier

71:第一接合電線 71: First bonding wire

81:磷光體層 81: Phosphor layer

Claims (16)

一種包括一載體(1)及一殼體(2)之組件(10),其中 該載體(1)包括一導電表面(1A), 該殼體(2)係電氣絕緣的且機械地固定至該載體(1)之該導電表面(1A), 該載體(1)與該殼體(2)之間的機械連接係藉一錨固結構(3)加強,及 該錨固結構(3)包括穿透至該殼體(2)中之複數個金屬棒(3A),其中該等金屬棒(3A)係奈米棒及/或微米棒,且以草地般分布於該載體(1)之該導電表面(1A)上某些位置。 A component (10) comprising a carrier (1) and a shell (2), wherein the carrier (1) comprises a conductive surface (1A), the shell (2) is electrically insulated and mechanically fixed to the conductive surface (1A) of the carrier (1), the mechanical connection between the carrier (1) and the shell (2) is reinforced by an anchoring structure (3), and the anchoring structure (3) comprises a plurality of metal rods (3A) penetrating into the shell (2), wherein the metal rods (3A) are nanorods and/or microrods and are distributed like grass at certain positions on the conductive surface (1A) of the carrier (1). 如請求項1之組件(10),其中該等金屬棒(3A)具有從30奈米到20微米之橫向直徑。An assembly (10) as claimed in claim 1, wherein the metal rods (3A) have a lateral diameter ranging from 30 nanometers to 20 micrometers. 如請求項1至2中任一項之組件(10),其中該等金屬棒(3A)具有從2微米到100微米之垂直高度。An assembly (10) as claimed in any one of claims 1 to 2, wherein the metal rods (3A) have a vertical height ranging from 2 microns to 100 microns. 如請求項1至3中任一項之組件(10),其中該殼體(2)係一模製體。An assembly (10) as claimed in any one of claims 1 to 3, wherein the shell (2) is a molded body. 如請求項1至4中任一項之組件(10),其中該載體(1)係由一導電材料製作之一導線架(6),且該導電表面(1A)係該導線架(6)之一表面。A component (10) as claimed in any one of claims 1 to 4, wherein the carrier (1) is a lead frame (6) made of a conductive material, and the conductive surface (1A) is a surface of the lead frame (6). 如請求項5之組件(10),其中 該導線架(6)包括一第一次區域(61)及與該第一次區域(61)分隔開之一第二次區域(62), 該第一次區域(61)及該第二次區域(62)係被該殼體(2)橫向地圍繞,且因此與該殼體(2)彼此機械地連接,及 沿一垂直方向,該第一次區域(61)及/或該第二次區域(62)至少在某些位置延伸通過該殼體(2)。 As a component (10) of claim 5, wherein the lead frame (6) includes a first region (61) and a second region (62) separated from the first region (61), the first region (61) and the second region (62) are laterally surrounded by the housing (2) and are thus mechanically connected to the housing (2), and along a vertical direction, the first region (61) and/or the second region (62) extend through the housing (2) at least at certain locations. 如請求項1至4中任一項之組件(10),其中該載體(1)包括一絕緣基板(5)及一金屬層,其中該導電表面(1A)係該金屬層之一表面。A component (10) as claimed in any one of claims 1 to 4, wherein the carrier (1) comprises an insulating substrate (5) and a metal layer, wherein the conductive surface (1A) is a surface of the metal layer. 如請求項1至7中任一項之組件(10),其進一步包括一第一半導體晶片(4,41),其中該第一半導體晶片(4,41)係配置於該導電表面(1A)之第一次區域上,該第一次區域未被該等金屬棒(3A)覆蓋。A component (10) as claimed in any one of claims 1 to 7, further comprising a first semiconductor chip (4, 41), wherein the first semiconductor chip (4, 41) is arranged on a first area of the conductive surface (1A), and the first area is not covered by the metal rods (3A). 如請求項8之組件(10),其進一步包括一第二半導體晶片(4,42),其中該第二半導體晶片(4,42)係配置於未被該等金屬棒(3A)覆蓋之該導電表面(1A)的另一區域上,及其中該第二半導體晶片(4,42)係依反平行方式電氣地連接至該第一半導體晶片(4,41)。The component (10) of claim 8 further comprises a second semiconductor chip (4, 42), wherein the second semiconductor chip (4, 42) is arranged on another area of the conductive surface (1A) not covered by the metal rods (3A), and wherein the second semiconductor chip (4, 42) is electrically connected to the first semiconductor chip (4, 41) in an anti-parallel manner. 如請求項1至9中任一項之組件(10),其中該錨固結構(3)進一步包括複數個繫柵(3B),該等繫柵係該載體(1)之橫向部件,具有該載體(1)之最小垂直厚度且被該殼體(2)圍繞,使得在該組件(10)之複數個側表面(10S)上,該等繫柵係與該殼體(2)齊平。An assembly (10) as claimed in any one of claims 1 to 9, wherein the anchoring structure (3) further comprises a plurality of gratings (3B), which are transverse parts of the carrier (1), have the minimum vertical thickness of the carrier (1) and are surrounded by the shell (2), so that on a plurality of side surfaces (10S) of the assembly (10), the gratings are flush with the shell (2). 如請求項1至10中任一項之組件(10),其中該等錨固結構(3)進一步包括在該載體(1)之複數個側表面(1S)形成的複數個階梯形元件(3,3C),其中該殼體(2)係錨固至該等階梯形元件(3,3C)且防止沿一垂直方向與該載體(1)脫離。An assembly (10) as claimed in any one of claims 1 to 10, wherein the anchoring structure (3) further includes a plurality of stepped elements (3, 3C) formed on a plurality of side surfaces (1S) of the carrier (1), wherein the housing (2) is anchored to the stepped elements (3, 3C) and prevented from being separated from the carrier (1) in a vertical direction. 如請求項1至11中任一項之組件(10),其進一步包括一封裝層(82),其中該封裝層(82)係形成於該殼體(2)之一開口中,且錨固至該等金屬棒(3A)。An assembly (10) as claimed in any one of claims 1 to 11, further comprising a packaging layer (82), wherein the packaging layer (82) is formed in an opening of the housing (2) and anchored to the metal rods (3A). 一種用於製造具有一載體(1)及一殼體(2)的一組件(10)之方法,其包括: 形成一錨固結構(3)於該載體(1)之一導電表面(1A)上,其中該錨固結構(3)包括作為奈米棒及/或微米棒之複數個金屬棒(3A),該等金屬棒係以草地般分布於該載體(1)之該導電表面(1A)上某些位置;及 形成該殼體(2)於該載體(1)上至少某些位置,其中該殼體(2)係由一電氣絕緣材料製作且機械地固定至該載體(1)之該導電表面(1A),使得該等金屬棒(3A)穿透至該殼體(2)中,以加強該載體(1)與該殼體(2)之間的機械連接。 A method for manufacturing an assembly (10) having a carrier (1) and a shell (2), comprising: forming an anchoring structure (3) on a conductive surface (1A) of the carrier (1), wherein the anchoring structure (3) comprises a plurality of metal rods (3A) as nanorods and/or microrods, the metal rods being distributed like grass at certain positions on the conductive surface (1A) of the carrier (1); and forming the shell (2) at least at certain positions on the carrier (1), wherein the shell (2) is made of an electrically insulating material and mechanically fixed to the conductive surface (1A) of the carrier (1), so that the metal rods (3A) penetrate into the shell (2) to strengthen the mechanical connection between the carrier (1) and the shell (2). 如請求項13之方法,其中形成錨固結構(3)於載體(1)之導電表面(1A)上的步驟係藉使用一模板(9)執行,該模板包括作為奈米孔及/或微米孔之複數個貫穿孔(9H),其中該模板(9)係預製的且配置於該載體(1)之該導電表面(1A)上,其中且該等金屬棒(3A)係形成於該等貫穿孔(9H)內。A method as claimed in claim 13, wherein the step of forming an anchoring structure (3) on the conductive surface (1A) of the carrier (1) is performed by using a template (9), which includes a plurality of through holes (9H) serving as nanoholes and/or microholes, wherein the template (9) is prefabricated and arranged on the conductive surface (1A) of the carrier (1), and wherein the metal rods (3A) are formed in the through holes (9H). 如請求項13之方法,其中形成錨固結構(3)於載體(1)之導電表面(1A)上的步驟包括: 藉使用一光刻過程,形成一模板(9)於該導電表面(1A)上,該模板具有作為奈米孔及/或微米孔之複數個貫穿孔(9H);及 形成該等金屬棒(3A)於該等貫穿孔(9H)中。 The method of claim 13, wherein the step of forming an anchoring structure (3) on a conductive surface (1A) of a carrier (1) comprises: forming a template (9) on the conductive surface (1A) by using a photolithography process, the template having a plurality of through holes (9H) as nanoholes and/or microholes; and forming the metal rods (3A) in the through holes (9H). 如請求項13至15中任一項之方法,其中 形成殼體(2)之步驟係接續在該形成錨固結構(3)之步驟後, 形成殼體(2)之步驟係藉一模製過程或鑄造過程執行,其中一模製材料係施加於該等金屬棒(3A)上某些位置,使得該等金屬棒(3A)在該模製材料固化之前,穿透至該殼體(2)中。 A method as claimed in any one of claims 13 to 15, wherein the step of forming the shell (2) is subsequent to the step of forming the anchor structure (3), and the step of forming the shell (2) is performed by a molding process or a casting process, wherein a molding material is applied to certain positions on the metal rods (3A) so that the metal rods (3A) penetrate into the shell (2) before the molding material solidifies.
TW112125222A 2022-07-08 2023-07-06 Component having anchoring structure and method for producing a component having anchoring structure TW202420510A (en)

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JP6291713B2 (en) * 2013-03-14 2018-03-14 日亜化学工業株式会社 Light-emitting element mounting substrate, light-emitting device including the same, and lead frame
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