TW202418410A - Die bonder and buffer devices for die bonder - Google Patents
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Abstract
Description
本發明的實施例涉及一種執行晶粒接合製程(die bonding process)時使用的晶粒接合機。An embodiment of the present invention relates to a die bonding machine used in performing a die bonding process.
若要製造半導體設備(semiconductor device),則需要執行各種製程,作爲其中之一有組裝封裝件(package)的製程。通常,組裝封裝件的製程包括切割半導體晶圓(semiconductor wafer)而個別化爲多個晶粒的切割製程(dicing process),以及將通過此切割製程獲得的晶粒裝載於導線架(lead frame)、印刷電路板(printed circuit board;PCB)等基板的晶粒接合製程。在此,爲了執行晶粒接合製程而使用的設備是晶粒接合機。To manufacture semiconductor devices, various processes need to be performed, one of which is the process of assembling a package. Generally, the process of assembling a package includes a dicing process to cut a semiconductor wafer into multiple individual dies, and a die bonding process to mount the dies obtained by the dicing process on a substrate such as a lead frame or a printed circuit board (PCB). Here, the equipment used to perform the die bonding process is a die bonding machine.
作爲接合設備的晶粒接合機包括晶粒供應裝置以及晶粒接合裝置。晶粒供應裝置將要裝載於基板的晶粒供應於晶粒接合裝置,晶粒接合裝置將來自晶粒供應裝置的晶粒裝載於基板。爲此,晶粒供應裝置包括將晶粒從拾取位置拾取並傳送的晶粒傳送單元(die transfer unit),晶粒接合裝置包括將晶粒供應裝置供應的晶粒拾取而移動到接合位置並施加用於裝載於基板的壓力的接合單元。A die bonding machine as a bonding device includes a die supply device and a die bonding device. The die supply device supplies a die to be loaded on a substrate to the die bonding device, and the die bonding device loads the die from the die supply device on the substrate. To this end, the die supply device includes a die transfer unit that picks up and transfers the die from a pick-up position, and the die bonding device includes a bonding unit that picks up the die supplied by the die supply device and moves it to a bonding position and applies pressure for loading on the substrate.
晶粒傳送單元包括傳送頭(transfer head),傳送頭構成爲通過垂直移動和水平移動在拾取位置和目的位置間往返的同時將晶粒從拾取位置傳送到目的位置。對此,以前的晶粒接合機在縮短用於將晶粒供應於晶粒接合裝置的晶粒傳送步驟所需的時間上只能受限。The die transfer unit includes a transfer head configured to transfer the die from the pick-up position to the destination position while moving back and forth between the pick-up position and the destination position by vertical and horizontal movement. In view of this, conventional die bonding machines are limited in shortening the time required for the die transfer step for supplying the die to the die bonding device.
在將晶粒從拾取位置傳送到接合位置的一系列過程中執行針對晶粒的上面或下面的視覺檢查。但是,這樣的視覺檢查在以前的晶粒接合機中作用爲使晶粒的傳送路徑複雜或使晶粒的傳送延遲的要因。 [現有技術文獻] [專利文獻] A visual inspection is performed on the top or bottom of a die during a series of processes of transferring the die from a pickup position to a bonding position. However, such a visual inspection has complicated the transfer path of the die or caused a delay in the transfer of the die in a conventional die bonding machine. [Prior Art Literature] [Patent Literature]
(專利文獻1)大韓民國公開專利公報第10-2017-0042955號(2017.04.20) (專利文獻2)大韓民國公開專利公報第10-2019-0019286號(2019.02.27) (專利文獻3)大韓民國公開專利公報第10-2391432號(2022.04.27) (Patent Document 1) Korean Public Patent Gazette No. 10-2017-0042955 (2017.04.20) (Patent Document 2) Korean Public Patent Gazette No. 10-2019-0019286 (2019.02.27) (Patent Document 3) Korean Public Patent Gazette No. 10-2391432 (2022.04.27)
本發明的實施例要提供一種以晶粒接合製程的速度上升爲首的在效率性提升方面更有利的晶粒接合機。An embodiment of the present invention is to provide a die bonding machine which is more advantageous in terms of improving efficiency, mainly by increasing the speed of the die bonding process.
要解决的技術問題不限於此,若爲本領域技術人員,則將可以從以下的記載明確地理解未提及的其它技術問題。The technical problems to be solved are not limited to these, and those skilled in the art will be able to clearly understand other technical problems not mentioned from the following description.
根據本發明的實施例,可以提供一種晶粒接合機的緩衝裝置,包括:旋轉晶粒臺,通過旋轉驅動單元旋轉,並具有沿著旋轉中心周圍的外周區域排列的晶粒支撐部分,晶粒支撐部分依次位於第一傳送位置、晶粒檢查位置以及第二傳送位置而傳送晶粒;以及晶粒視覺單元,將通過晶粒支撐部分傳送到晶粒檢查位置的晶粒的第一面通過直接朝向的第一拍攝路徑拍攝,將通過接合單元從第二傳送位置拾取的晶粒的第二面通過經過旋轉晶粒臺的內部的第二拍攝路徑拍攝。According to an embodiment of the present invention, a buffer device of a die bonding machine can be provided, comprising: a rotating die stage, which is rotated by a rotating drive unit and has a die supporting portion arranged along a peripheral area around a rotation center, the die supporting portion being sequentially located at a first transfer position, a die inspection position, and a second transfer position to transfer the die; and a die visual unit, which shoots the first side of the die transferred to the die inspection position through the die supporting portion through a first shooting path directly facing the die, and shoots the second side of the die picked up from the second transfer position by the bonding unit through a second shooting path passing through the interior of the rotating die stage.
可以是,旋轉晶粒臺具有由外周區域圍繞的中空區域,在晶粒支撐部分之間分別設置與中空區域連通的貫通部分。The rotating grain stage may have a hollow region surrounded by a peripheral region, and through portions communicating with the hollow region are respectively provided between the grain supporting portions.
可以是,第一拍攝路徑提供爲直接拍攝傳送到晶粒檢查位置的晶粒的第一面,第二拍攝路徑提供爲利用中空區域和貫通部分拍攝從第二傳送位置拾取的晶粒的第二面。It may be that the first photographing path is provided for directly photographing the first side of the die transferred to the die inspection position, and the second photographing path is provided for photographing the second side of the die picked up from the second transfer position using the hollow area and the through portion.
可以是,晶粒視覺單元包括第一相機模組以及第二相機模組,第一相機模組和第二相機模組配置爲在旋轉晶粒臺的周圍朝向晶粒檢查位置,第一拍攝路徑將關於傳送到晶粒檢查位置的晶粒的第一面的像直接入射於第一相機模組,晶粒視覺單元還包括:鏡模組,用於在中空區域中將關於從第二傳送位置拾取的晶粒的第二面的像反射到第二相機模組,第二拍攝路徑根據貫通部分的位置將關於第二面的像反射到第二相機模組。It can be that the grain vision unit includes a first camera module and a second camera module, the first camera module and the second camera module are configured to face the grain inspection position around the rotating grain stage, the first shooting path will directly incident the image of the first side of the grain transmitted to the grain inspection position on the first camera module, the grain vision unit also includes: a mirror module, which is used to reflect the image of the second side of the grain picked up from the second transmission position to the second camera module in the hollow area, and the second shooting path reflects the image of the second side to the second camera module according to the position of the through part.
可以是,晶粒視覺單元還包括:位置調節模組,使鏡模組在和從第二傳送位置拾取的晶粒平行的方向上移動而調節相對於從第二傳送位置拾取的晶粒的鏡模組的位置。可以是,利用鏡模組的第二拍攝路徑是直角。The crystal grain visual unit may further include: a position adjustment module, which moves the mirror module in a direction parallel to the crystal grain picked up from the second transfer position to adjust the position of the mirror module relative to the crystal grain picked up from the second transfer position. The second shooting path using the mirror module may be a right angle.
可以是,晶粒支撐部分和貫通部分沿著外周區域以相同的配置角度配置,旋轉驅動單元使旋轉晶粒臺以配置角度的單位旋轉而使晶粒支撐部分以配置角度的單位移動,第一傳送位置、晶粒檢查位置以及第二傳送位置設定爲以配置角度的單位移動的晶粒支撐部分能夠依次存在。可以是,晶粒支撐部分具備三個以上。The die support portion and the through portion may be arranged at the same configuration angle along the peripheral region, the rotation drive unit rotates the rotating die stage by the configuration angle unit and moves the die support portion by the configuration angle unit, and the first transfer position, the die inspection position, and the second transfer position are set so that the die support portion that moves by the configuration angle unit can exist in sequence. There may be three or more die support portions.
可以是,旋轉晶粒臺通過包括:旋轉軸,提供旋轉中心;旋轉部件,提供於旋轉軸上;支撐部件,從旋轉部件沿著旋轉軸的長度方向延伸並沿著旋轉中心的周圍隔著間隔配置而構成外周區域;以及晶粒臺,提供於支撐部件的每一個的前端部分,並分別具有晶粒支撐部分,晶粒支撐部分沿著外周區域排列,具有由外周區域圍繞的中空區域,在晶粒臺之間形成的空間的每一個是貫通部分。The rotating grain stage may include: a rotating shaft providing a rotation center; a rotating member provided on the rotating shaft; a supporting member extending from the rotating member along the length direction of the rotating shaft and arranged at intervals around the rotation center to form a peripheral area; and a grain stage provided at the front end portion of each of the supporting members and having a grain supporting portion respectively, the grain supporting portions being arranged along the peripheral area and having a hollow area surrounded by the peripheral area, and each of the spaces formed between the grain stages is a through portion.
可以是,旋轉晶粒臺構成爲晶粒支撐部分通過吸附方式支撐晶粒。可以是,晶粒支撐部分的每一個形成爲具有對準晶粒的容納槽。The rotating die stage may be configured such that the die support portion supports the die by adsorption. Each of the die support portions may be formed to have a receiving groove aligned with the die.
根據本發明的實施例,可以提供一種晶粒接合機的緩衝裝置,包括:旋轉晶粒臺,通過旋轉驅動單元旋轉,並具有沿著旋轉中心周圍的外周區域排列的晶粒支撐部分,晶粒支撐部分依次位於第一傳送位置、晶粒檢查位置以及第二傳送位置而傳送晶粒;以及晶粒視覺單元,將通過晶粒支撐部分傳送到晶粒檢查位置的晶粒的第一面通過直接朝向的第一拍攝路徑拍攝,將通過接合單元從第二傳送位置拾取的晶粒的第二面通過經過旋轉晶粒臺的內部的第二拍攝路徑拍攝,旋轉晶粒臺具有由外周區域圍繞的中空區域,在晶粒支撐部分之間分別設置與中空區域連通的貫通部分,第一拍攝路徑提供爲直接拍攝傳送到晶粒檢查位置的晶粒的第一面,第二拍攝路徑提供爲利用中空區域和貫通部分拍攝從第二傳送位置拾取的晶粒的第二面,晶粒視覺單元包括單個相機模組,相機模組配置爲在旋轉晶粒臺的周圍朝向晶粒檢查位置,第一拍攝路徑將關於傳送到晶粒檢查位置的晶粒的第一面的像直接入射於相機模組,晶粒視覺單元還包括:鏡模組,用於在中空區域中將關於從第二傳送位置拾取的晶粒的第二面的像反射到相機模組,第二拍攝路徑根據貫通部分的位置將關於第二面的像反射到相機模組。此時,可以是,單個相機模組能夠將焦點轉換爲用於拍攝傳送到晶粒檢查位置的晶粒的第一面的第一焦點或者用於拍攝從第二傳送位置拾取的晶粒的第二面的第二焦點。According to an embodiment of the present invention, a buffer device of a die bonding machine can be provided, comprising: a rotating die stage, which is rotated by a rotating driving unit and has a die supporting portion arranged along a peripheral area around a rotation center, the die supporting portion being sequentially located at a first transfer position, a die inspection position, and a second transfer position to transfer the die; and a die visual unit, which photographs the first side of the die transferred to the die inspection position through the die supporting portion through a first photographing path directly facing the first side, and photographs the second side of the die picked up from the second transfer position through the bonding unit through a second photographing path passing through the interior of the rotating die stage, the rotating die stage having a hollow area surrounded by the peripheral area, and two die supporting portions are respectively arranged between the die supporting portions and the second side of the die. The through portion is connected to the hollow area, the first shooting path is provided for directly shooting the first side of the grain transmitted to the grain inspection position, the second shooting path is provided for shooting the second side of the grain picked up from the second transmission position using the hollow area and the through portion, the grain visual unit includes a single camera module, the camera module is configured to face the grain inspection position around the rotating grain stage, the first shooting path will directly incident the image of the first side of the grain transmitted to the grain inspection position on the camera module, the grain visual unit also includes: a mirror module, which is used to reflect the image of the second side of the grain picked up from the second transmission position in the hollow area to the camera module, and the second shooting path reflects the image of the second side to the camera module according to the position of the through portion. At this time, a single camera module may be able to switch the focus to a first focus for photographing a first side of a die transferred to a die inspection position or a second focus for photographing a second side of a die picked up from a second transfer position.
根據本發明的實施例,可以提供一種晶粒接合機的緩衝裝置,包括:旋轉晶粒臺,通過旋轉驅動單元旋轉,具有沿著旋轉中心周圍的外周區域排列的晶粒支撐部分,晶粒支撐部分依次位於第一傳送位置、晶粒檢查位置以及第二傳送位置而傳送晶粒;以及晶粒視覺單元,將通過晶粒支撐部分傳送到晶粒檢查位置的晶粒的第一面通過直接朝向的第一拍攝路徑拍攝,將通過接合單元從第二傳送位置拾取的晶粒的第二面通過經過旋轉晶粒臺的內部的第二拍攝路徑拍攝,旋轉晶粒臺具有由外周區域圍繞的中空區域,在晶粒支撐部分之間分別設置與中空區域連通的貫通部分,第一拍攝路徑提供爲直接拍攝傳送到晶粒檢查位置的晶粒的第一面,第二拍攝路徑提供爲利用中空區域和貫通部分拍攝從第二傳送位置拾取的晶粒的第二面,貫通部分提供爲每兩個構成一對而以旋轉中心爲中心彼此相對,晶粒檢查位置設置爲和第二傳送位置相對,晶粒視覺單元包括第一相機模組以及第二相機模組,第一相機模組和第二相機模組配置爲在旋轉晶粒臺的周圍朝向晶粒檢查位置,第一拍攝路徑將關於傳送到晶粒檢查位置的晶粒的第一面的像直接入射於第一相機模組,第二拍攝路徑根據每兩個構成一對的貫通部分的位置將關於從第二傳送位置拾取的晶粒的第二面的像入射於第二相機模組。此時,可以是,晶粒視覺單元還包括:位置調節模組,使第一相機模組和第二相機模組在和要拍攝的晶粒平行的方向上移動。According to an embodiment of the present invention, a buffer device of a die bonding machine can be provided, comprising: a rotating die stage, which is rotated by a rotating driving unit, and has a die support portion arranged along a peripheral area around a rotation center, the die support portion being sequentially located at a first transfer position, a die inspection position, and a second transfer position to transfer the die; and a die visual unit, which transmits the die through the die support portion. The first side of the die to the die inspection position is photographed through the first photographing path directly facing it, and the second side of the die picked up from the second transfer position by the bonding unit is photographed through the second photographing path passing through the interior of the rotating die stage, the rotating die stage having a hollow area surrounded by a peripheral area, and through parts connected to the hollow area are respectively arranged between the die supporting parts, and the first photographing path provides In order to directly photograph the first side of the grain transmitted to the grain inspection position, the second shooting path is provided to photograph the second side of the grain picked up from the second transmission position using the hollow area and the through part, the through parts are provided to form a pair of two and are opposite to each other with the rotation center as the center, the grain inspection position is set to be opposite to the second transmission position, the grain visual unit includes a first camera module and a second camera module, the first camera module and the second camera module are configured to face the grain inspection position around the rotating grain stage, the first shooting path will directly incident on the first camera module the image of the first side of the grain transmitted to the grain inspection position, and the second shooting path will incident on the second camera module the image of the second side of the grain picked up from the second transmission position according to the position of the through parts that form a pair of two. At this time, the crystal grain visual unit may further include: a position adjustment module, which enables the first camera module and the second camera module to move in a direction parallel to the crystal grain to be photographed.
根據本發明的實施例,可以提供一種晶粒接合機,包括:晶粒傳送單元,將晶粒從拾取位置傳送到第一傳送位置;接合單元,將晶粒從第二傳送位置拾取而裝載於基板;以及晶粒傳送單元和接合單元之間的緩衝裝置,緩衝裝置包括:旋轉晶粒臺,通過旋轉驅動單元旋轉,具有沿著旋轉中心周圍的外周區域排列的晶粒支撐部分,晶粒支撐部分依次位於第一傳送位置、晶粒檢查位置以及第二傳送位置而傳送晶粒;以及晶粒視覺單元,將通過晶粒支撐部分傳送到晶粒檢查位置的晶粒的第一面通過直接朝向的第一拍攝路徑拍攝,將通過接合單元從第二傳送位置拾取的晶粒的第二面通過經過旋轉晶粒臺的內部的第二拍攝路徑拍攝。According to an embodiment of the present invention, a die bonding machine can be provided, comprising: a die transfer unit, which transfers a die from a pick-up position to a first transfer position; a bonding unit, which picks up a die from a second transfer position and loads it on a substrate; and a buffer device between the die transfer unit and the bonding unit, wherein the buffer device comprises: a rotating die stage, which is rotated by a rotating drive unit and has a die arranged along a peripheral area around a rotation center. A grain supporting part, which is sequentially located at a first conveying position, a grain inspection position and a second conveying position to convey the grain; and a grain visual unit, which shoots the first side of the grain conveyed to the grain inspection position through the grain supporting part through a first shooting path directly facing the grain, and shoots the second side of the grain picked up from the second conveying position through the bonding unit through a second shooting path passing through the interior of the rotating grain stage.
在根據本發明的實施例的晶粒接合機中,可以是,旋轉晶粒臺具有由外周區域圍繞的中空區域,在晶粒支撐部分之間分別設置與中空區域連通的貫通部分。In the die bonding machine according to the embodiment of the present invention, the rotating die stage may have a hollow area surrounded by a peripheral area, and through parts communicating with the hollow area are respectively provided between the die supporting parts.
在根據本發明的實施例的晶粒接合機中,可以是,第一拍攝路徑提供爲直接拍攝傳送到晶粒檢查位置的晶粒的第一面,第二拍攝路徑提供爲利用中空區域和貫通部分拍攝從第二傳送位置拾取的晶粒的第二面。In the die bonding machine according to the embodiment of the present invention, the first shooting path may be provided for directly shooting the first side of the die transferred to the die inspection position, and the second shooting path may be provided for shooting the second side of the die picked up from the second transfer position using the hollow area and the through part.
在根據本發明的實施例的晶粒接合機中,可以是,旋轉晶粒臺的旋轉中心在水平方向上配置,晶粒傳送單元包括:傳送頭,根據以和旋轉中心平行的水平軸爲中心的擺動運動,位於拾取位置或者第一傳送位置而傳送晶粒;以及擺動驅動模組,將用於擺動運動的動力提供於傳送頭。In the grain bonding machine according to the embodiment of the present invention, the rotation center of the rotating grain stage may be arranged in the horizontal direction, and the grain transfer unit includes: a transfer head, which transfers the grain at the picking position or the first transfer position according to the swinging movement centered on the horizontal axis parallel to the rotation center; and a swinging drive module, which provides power for the swinging movement to the transfer head.
根據本發明的實施例,可以提供一種晶粒接合機,包括:晶圓臺,支撐保有晶粒的晶圓;晶圓臺驅動單元,使晶圓臺在水平方向上移動而選擇性地使晶粒位於拾取位置;晶粒傳送單元,將晶粒從拾取位置傳送到第一傳送位置;緩衝裝置,從第一傳送位置接收晶粒並將晶粒傳送到第二傳送位置;以及接合單元,將晶粒從第二傳送位置拾取而裝載於基板;緩衝裝置包括:旋轉晶粒臺,具有水平軸周圍的外周區域以及由外周區域圍繞的中空區域,沿著外周區域排列的晶粒支撐部分以及在晶粒支撐部分之間分別設置爲與中空區域連通的貫通部分以相同的配置角度配置,旋轉晶粒臺以水平軸爲中心以配置角度的單位旋轉,晶粒支撐部分和貫通部分依次位於第一傳送位置、晶粒檢查位置以及第二傳送位置;旋轉驅動單元,使旋轉晶粒臺以配置角度的單位旋轉;晶粒視覺單元,包括第一相機模組和第二相機模組,第一相機模組將通過晶粒支撐部分傳送到晶粒檢查位置的晶粒的第一面通過第一拍攝路徑拍攝,第二相機模組將通過接合單元從第二傳送位置拾取的晶粒的第二面通過第二拍攝路徑拍攝,第一相機模組和第二相機模組配置爲在旋轉晶粒臺的周圍朝向晶粒檢查位置,第一拍攝路徑將關於傳送到晶粒檢查位置的晶粒的第一面的像直接入射於第一相機模組,晶粒視覺單元還包括:鏡模組,用於在中空區域中將關於從第二傳送位置拾取的晶粒的第二面的像反射到第二相機模組,第二拍攝路徑根據貫通部分的位置將關於第二面的像反射到第二相機模組。According to an embodiment of the present invention, a die bonding machine can be provided, comprising: a wafer stage, supporting a wafer holding a die; a wafer stage driving unit, moving the wafer stage in a horizontal direction to selectively position the die at a pick-up position; a die transfer unit, transferring the die from the pick-up position to a first transfer position; a buffer device, receiving the die from the first transfer position and transferring the die to a second transfer position; and a bonding unit, picking up the die from the second transfer position and transferring the die to a second transfer position. The buffer device comprises: a rotating crystal stage, having a peripheral area around a horizontal axis and a hollow area surrounded by the peripheral area, crystal support parts arranged along the peripheral area and through parts respectively arranged between the crystal support parts to communicate with the hollow area are arranged at the same configuration angle, the rotating crystal stage rotates with the horizontal axis as the center by a unit of the configuration angle, and the crystal support parts and the through parts are sequentially located at a first transfer position, a crystal inspection position, and a crystal inspection position. position and a second transmission position; a rotation drive unit that rotates the rotating die stage by a unit of a configuration angle; a die visual unit that includes a first camera module and a second camera module, the first camera module photographing the first side of the die that is transmitted to the die inspection position through the die support portion through a first shooting path, and the second camera module photographing the second side of the die that is picked up from the second transmission position through the bonding unit through a second shooting path, the first camera module and the second The camera module is configured to face the grain inspection position around the rotating grain stage, and the first shooting path directly incidents the image of the first side of the grain transmitted to the grain inspection position on the first camera module. The grain visual unit also includes: a mirror module, which is used to reflect the image of the second side of the grain picked up from the second transmission position to the second camera module in the hollow area, and the second shooting path reflects the image of the second side to the second camera module according to the position of the through part.
技術問題的解决手段將通過以下說明的實施例、附圖等更具體且明確。另外,可以附加地提出以下提及的解决手段之外的各種解决手段。The solution to the technical problem will be more specific and clear through the following embodiments, drawings, etc. In addition, various solutions other than the solutions mentioned below can be additionally proposed.
根據本發明的實施例,可以保障上升的晶粒傳送速度,可以針對晶粒的上、下面通過簡單的結構進行檢查而沒有晶粒的傳送延遲,通過此可以大大地提升每單位時間生産量(unit per hour;UPH)。According to the embodiments of the present invention, the die transfer speed can be increased, and the upper and lower sides of the die can be inspected by a simple structure without delaying the die transfer, thereby greatly improving the unit per hour (UPH).
根據本發明的實施例,可以提供包括輕量的同時緊湊且結構上簡單而製造容易的旋轉晶粒臺的緩衝裝置。According to the embodiments of the present invention, a buffer device including a rotating die stage which is lightweight, compact, simple in structure and easy to manufacture can be provided.
發明的效果不限於此,若爲本領域技術人員,則將可以從本說明書以及所附的附圖明確地理解未提及的其它效果。The effects of the invention are not limited to these, and those skilled in the art will be able to clearly understand other effects not mentioned from this specification and the attached drawings.
以下,參照所附的附圖,針對本發明的實施例,詳細地進行說明,以使在本發明所屬的技術領域中具有通常的知識的人可以容易地實施。但是,本發明可以以各種不同的形式實現,不限於在此說明的實施例。Hereinafter, with reference to the attached drawings, embodiments of the present invention are described in detail so that a person having ordinary knowledge in the technical field to which the present invention belongs can easily implement it. However, the present invention can be implemented in various different forms and is not limited to the embodiments described here.
在說明本發明的實施例時,在針對相關的公知功能或者結構的具體說明被判斷爲可以不必要地模糊本發明的要旨的情况下,省略其具體說明,起到相似功能以及作用的部分將貫穿附圖整體使用相同的附圖標記。When describing the embodiments of the present invention, if a specific description of a related well-known function or structure is judged to be unnecessarily obscuring the gist of the present invention, the specific description will be omitted, and parts with similar functions and effects will use the same figure labels throughout the entire drawings.
在說明書中使用的術語中的至少一部分考慮在本說明書中的功能而定義,因此根據用戶、運用者意圖、慣例等可以改變。由於此,針對其術語,應該基於貫穿說明書全文的內容進行解釋。另外,在說明書中,當說到包括某構成要件時,除非特別地有相反的記載,否則這不排除其它構成要件,意指可以還包括其它構成要件。另外,當說到某部分和其它部分連接(或者,結合)時,這不僅包括直接連接(或者,結合)的情况,也包括隔著其它部分間接連接(或者,結合)的情况。At least part of the terms used in the specification are defined in consideration of the functions in the specification and may be changed according to the user, the intention of the user, custom, etc. Therefore, the terms should be interpreted based on the content throughout the specification. In addition, in the specification, when it is said that a certain constituent element is included, unless there is a special record to the contrary, this does not exclude other constituent elements and means that other constituent elements may also be included. In addition, when it is said that a certain part is connected (or combined) with other parts, this includes not only the case of direct connection (or combination) but also the case of indirect connection (or combination) through other parts.
另一方面,在附圖中構成要件的尺寸或者形狀、線的厚度等可以爲了便於理解略微誇張地表現。On the other hand, in the drawings, the size or shape of components, the thickness of lines, etc. may be expressed slightly exaggerated for easier understanding.
根據本發明的實施例的晶粒接合機可以使用於晶粒接合製程而將晶粒裝載於導線架、PCB等基板。在此,裝載於基板的晶粒可以根據工作性能等分別賦予等級。另外,這些晶粒也可以裝載於基板上的接合區域,也可以裝載於已經裝載於基板的其它晶粒上。The die bonding machine according to the embodiment of the present invention can be used in the die bonding process to load the die on a substrate such as a lead frame, a PCB, etc. Here, the die loaded on the substrate can be assigned grades according to the working performance, etc. In addition, these die can also be loaded on the bonding area on the substrate, or can be loaded on other die already loaded on the substrate.
根據本發明的第一實施例的晶粒接合機的結構、工作等繪示於圖1至圖11。The structure and operation of the die bonding machine according to the first embodiment of the present invention are shown in FIGS. 1 to 11 .
參照圖1,根據本發明的第一實施例的晶粒接合機包括:晶粒供應裝置100,用於供應要裝載於基板30的晶粒20;晶粒接合裝置200,將晶粒20裝載於基板30(即,選擇性地裝載於基板上的接合區域或者已經裝載於基板的其它晶粒上);緩衝裝置300,配置於晶粒供應裝置100和晶粒接合裝置200之間;以及控制單元(未圖示),用於控制這樣的晶粒供應裝置100、晶粒接合裝置200以及緩衝裝置300的工作。1 , a die bonding machine according to a first embodiment of the present invention includes: a die
參照圖1、圖2等,晶粒20可從拾取位置P1依次經由第一傳送位置P21、晶粒檢查位置P23以及第二傳送位置P22移動到接合位置P3。晶粒供應裝置100可以將晶粒20從拾取位置P1傳送到第一傳送位置P21,晶粒接合裝置200可以將晶粒20從第二傳送位置P22傳送到接合位置P3。緩衝裝置300可以將晶粒20從第一傳送位置P21經由晶粒檢查位置P23傳送到第二傳送位置P22。緩衝裝置300可以在第一傳送位置P21處從晶粒供應裝置100接收晶粒20的傳送,並在第二傳送位置P22處傳送到晶粒接合裝置200。1, 2, etc., the die 20 may be moved from the pick-up position P1 to the bonding position P3 via the first transfer position P21, the die inspection position P23, and the second transfer position P22 in sequence. The die
如此,與將晶粒20從拾取位置P1直接傳送到接合位置P3的直接方式相比,將晶粒20從拾取位置P1傳送到傳送位置P21、P22,並從傳送位置P21、P22傳送到接合位置P3的多段方式可以保障上升的生産性。隨著晶粒20變薄或變大,供應晶粒20所需的時間(利用後述的晶粒頂出器120和傳送頭131的晶粒拾取時間)增加,從而與晶粒裝載工作速度相比,晶粒供應工作速度可以大大減慢。晶粒20的多段方式傳送可以在這樣的環境下也防止生産性降低。Thus, compared with the direct method of directly transferring the
參照圖2等,晶粒供應裝置100包括:晶圓臺110,支撐晶圓10;晶圓臺驅動單元(未圖示),使晶圓臺110在水平方向(例:X方向以及Y方向)上移動;晶粒頂出器120,用於選擇性地使由晶圓臺110支撐的晶圓10上的晶粒20從晶圓10分離;以及晶粒傳送單元130,傳送通過晶粒頂出器120分離的晶粒20。2 and the like, the
參照圖1、圖2等,晶圓10包括通過在晶粒接合製程之前執行的切割製程而個別化的晶粒20,另外包括附著有晶粒20的切割帶11以及用於保持切割帶11的環形狀的晶圓框架(wafer frame)12。切割帶11可以邊緣部分附著於晶圓框架12的下面而通過晶圓框架12保持。個別化的晶粒20可以配置於切割帶11的中央部分上。1, 2, etc., a
晶圓臺110包括環形狀的臺基座(stage base)111、竪立於臺基座111上的支撐環(support ring )112以及提供於支撐環112的周圍的晶圓擴展器(wafer expander)113。支撐環112從下方均勻地支撐在能夠伸長的切割帶11的中央部分和邊緣部分之間。晶圓擴展器113使晶圓框架12沿著對應於垂直方向(Z方向)的上下方向向下方移動,使由支撐環112支撐的切割帶11整體地伸長,並使附著於切割帶11上的晶粒20之間的空間擴大。這種晶圓擴展器113的作用可以提升通過晶粒頂出器120的晶粒分離工作的準確性、效率性等。The
晶圓擴展器113可以包括在多個位置處分別夾持或鬆開晶圓框架12的框架夾具(frame clamp)以及用於使這些框架夾具在上下方向(Z方向)上移動的夾具升降模組。夾具升降模組可以配置於臺基座111上。The
晶圓臺驅動單元可以使臺基座111在水平方向上移動而使晶圓臺110移動到目標位置。例如,晶圓臺驅動單元可以通過使晶圓臺110在水平方向上移動,選擇性地使由晶圓臺110支撐的晶圓10上的晶粒20位於拾取位置P1。爲此,晶粒供應裝置100可以包括用於檢測由晶圓臺110支撐的晶圓10上的晶粒20中的要裝載於基板30的晶粒的晶圓視覺單元(未圖示),晶圓臺驅動單元可以工作爲根據利用晶圓視覺單元的檢測結果使晶圓臺110在水平方向上移動而使要裝載於基板30的晶粒20正確地位於拾取位置P1。The wafer stage driving unit can move the
晶粒頂出器120提供於晶圓臺110的內部,並配置爲在由晶圓臺110支撐的晶圓10的下方和拾取位置P1相對。晶粒頂出器120可以包括:帶吸附模組,利用真空吸附切割帶11;以及頂出模組,將位於拾取位置P1的晶粒20通過推起(push-up)工作沿著上下方向向上方推上去。這種晶粒頂出器120可以爲了將位於拾取位置P1的晶粒20從晶圓10分離,通過在切割帶11吸附於帶吸附模組的狀態下,通過頂出模組將拾取位置P1的晶粒20推上去,使切割帶11從拾取位置P1的晶粒20剝離。The
參照圖2至圖4,晶粒傳送單元130包括用於拾取晶粒頂出器120推上去的晶粒20的傳送頭131。第一傳送位置P21位於晶圓臺110的上方,高度高於拾取位置P1,從拾取位置P1在水平方向(例:X方向)上隔開。晶粒傳送單元130構成爲在傳送頭131通過一定角度的擺動運動在拾取位置P1和第一傳送位置P21間往返的同時,將晶粒20從拾取位置P1傳送到第一傳送位置P21。2 to 4 , the
具體地,晶粒傳送單元130可以通過還包括在拾取位置P1的上方在水平方向(例:Y方向)上提供的擺動軸132以及用於將擺動運動所需的驅動力提供於傳送頭131的擺動驅動模組133,使傳送頭131以擺動軸132爲中心擺動。另外,晶粒傳送單元130可以還包括線性致動器134而使傳送頭131在相對於擺動軸132隔開並接近的方向上移動。例如,通過線性致動器134,可以使傳送頭131在以擺動軸132爲中心的半徑方向上移動。Specifically, the
擺動驅動模組133可以包括使擺動軸132在兩方向上旋轉的旋轉電機。線性致動器134可以包括進行直線運動的移動體,並具有第一端部以及第二端部,第一端部(固定端)提供於擺動軸132上,第二端部(自由端)保有移動體。傳送頭131可以提供於線性致動器134的第二端部(移動體)。傳送頭131可以通過吸附方式拾取並保有晶粒20。The
在觀察的晶粒傳送單元130中,爲了將晶粒20從拾取位置P1傳送到第一傳送位置P21,位於拾取位置P1的傳送頭131可以在吸附前端與拾取位置P1相對的拾取姿勢下,通過線性致動器134接近拾取位置P1上的晶粒20而將拾取位置P1上的晶粒20拾取。此時,晶粒20的上面吸附於傳送頭131的吸附前端。傳送頭131可以在拾取晶粒20後,爲了避免與晶粒頂出器120的干擾,通過線性致動器134上升,然後通過擺動驅動模組133旋轉並移動到第一傳送位置P21,從而位於第一傳送位置P21。若這樣傳送頭131構成爲利用擺動運動將晶粒20從拾取位置P1傳送到第一傳送位置P21,則與利用垂直移動和水平移動的現有技術的晶粒傳送方式相比,可以保障上升的晶粒20的傳送速度。In the observed
參照圖1,包括通過切割製程個別化的晶粒20的晶圓10收納於晶盒(cassette)40。當然,晶盒40可以構成爲可容納多個晶圓10。晶粒供應裝置100可以還包括裝載晶盒40的裝載埠(load port)140以及將從裝載埠140上的晶盒40取出的晶圓10裝載於晶圓臺110上的晶圓傳送單元150。爲了取出的晶圓10的晶圓臺110上裝載,取出的晶圓10可以沿著晶圓傳送導軌160在水平方向(例:X方向)上移動,晶圓臺110可以向沿著晶圓傳送導軌160移動的晶圓10側通過前面提及的晶圓臺驅動單元移動(例:Y方向移動)。1 , a
第二傳送位置P22高度高於第一傳送位置P21。從第一傳送位置P21傳送到第二傳送位置P22的晶粒20保持水平狀態。參照圖1、圖7等,晶粒接合裝置200包括將傳送到第二傳送位置P22的晶粒20拾取而裝載於基板30的接合單元210以及支撐接合位置P3上的基板30的接合臺220。The second transfer position P22 is higher than the first transfer position P21. The die 20 transferred from the first transfer position P21 to the second transfer position P22 remains in a horizontal state. Referring to FIG. 1 , FIG. 7 , etc., the
接合單元210包括從第二傳送位置P22拾取晶粒20的接合頭211以及用於使接合頭211移動的接合頭驅動模組。接合頭驅動模組可以由使接合頭211在垂直方向上移動的接合頭垂直驅動模組212以及使接合頭211在水平方向(例:Y方向)上移動的接合頭水平驅動模組213構成。接合單元210的接合頭211可以在水平方向(例:Y方向)上彼此隔開的第二傳送位置P22和接合位置P3間移動。接合單元210可以通過接合頭211拾取晶粒20的工作以及接合頭驅動模組(參照212、213)使接合頭211在垂直方向和水平方向上移動的工作,將晶粒20從第二傳送位置P22傳送到接合位置P3,並可以將用於將晶粒20裝載於基板30的壓力施加於晶粒20。The
接合頭211可以包括通過吸附方式拾取並保有晶粒20的接合工具(bonding tool)以及用於將接合工具保有的晶粒20加熱接合溫度的加熱器(heater)。接合頭211可以構成爲將加熱器的熱通過接合工具傳送於晶粒20。接合頭垂直驅動模組212可以連接於接合頭211,接合頭水平驅動模組213可以連接於接合頭垂直驅動模組212。接合臺220可以將支撐的基板30加熱到接合溫度。The
基板30收納於料盒(magazine)內。基板30從第一料盒50供應於接合位置P3,晶粒20的裝載完成後收納於第二料盒55。晶粒接合裝置200可以還包括基板傳送單元230。基板傳送單元230可以將基板30從第一料盒50傳送到接合臺220上,並且可以將基板30從接合臺220傳送到第二料盒55。基板30可以在水平方向(例:X方向)上彼此隔開的第一料盒50和第二料盒55之間沿著基板傳送導軌240的引導更準確地移動。基板傳送單元230可以包括握持或放開基板30的一個以上的夾持器(gripper)231以及使夾持器231在水平方向(例:X方向)上移動的夾持器驅動模組232。The
參照圖2、圖9、圖10等,緩衝裝置300包括旋轉晶粒臺(參照310、330、340)、旋轉驅動單元320以及晶粒視覺單元350。緩衝裝置300可以通過安裝結構物設置爲位於晶圓臺110的上方。2, 9, 10, etc., the
旋轉晶粒臺將與擺動軸132平行的方向(例:Y方向)的水平軸(horizontal axis)A作爲旋轉中心。旋轉晶粒臺具有以水平軸A爲中心的外周區域301以及由外周區域301圍繞的中空區域302,在外周區域301設置晶粒支撐部分341以及貫通部分303。The rotating crystal stage has a horizontal axis A parallel to the swing axis 132 (eg, Y direction) as the rotation center. The rotating crystal stage has a
外周區域301提供於中空區域302的周圍。中空區域302提供於外周區域301的內部,由空的空間構成。晶粒支撐部分341分別支撐晶粒20。晶粒支撐部分341沿著外周區域301隔著間隔排列爲彼此隔開。貫通部分303設置爲在晶粒支撐部分341之間分別與中空區域302連通。晶粒支撐部分341以及貫通部分303根據事前設定的配置角度(以下,稱爲設定角度)沿著外周區域301以相同間隔配置。例如,若設置四個晶粒支撐部分341,則也設置四個貫通部分303,因此在此情况下的設定角度爲45度,四個晶粒支撐部分341和四個貫通部分303以45度間隔交替配置。The
旋轉晶粒臺可以僅以水平軸A爲中心的一方向上旋轉。旋轉晶粒臺通過旋轉驅動單元320以設定角度的單位旋轉。例如,若晶粒支撐部分341是四個,由此貫通部分303也是四個,則旋轉驅動單元320以45度爲單位使旋轉晶粒臺旋轉。當然,根據這種旋轉晶粒臺的步進旋轉,晶粒支撐部分341與貫通部分303一起以設定角度的單位移動。The rotating die stage can rotate only in one direction with the horizontal axis A as the center. The rotating die stage is rotated by the
晶粒支撐部分341以及貫通部分303可以通過設定角度單位的旋轉移動依次位於第一傳送位置P21和第二傳送位置P22,並可以在從第一傳送位置P21移動到第二傳送位置P22的過程中依次位於晶粒檢查位置P23。晶粒支撐部分341和貫通部分303的旋轉運動反復,從而晶粒支撐部分341和貫通部分303可以反復第一傳送位置P21、晶粒檢查位置P23以及第二傳送位置P22順序的經由過程。當然,第一傳送位置P21、晶粒檢查位置P23以及第二傳送位置P22設定爲具有晶粒支撐部分341和貫通部分303可以依次存在的配置結構。The
這樣的旋轉晶粒臺包括配置於水平軸A上的旋轉軸310、提供於旋轉軸310上的旋轉部件331、提供於旋轉部件331的支撐部件332以及由支撐部件332分別支撐的晶粒臺340。在圖9中附圖標記330是旋轉框架,旋轉框架330包括旋轉部件331和支撐部件332。Such a rotating die stage includes a
旋轉軸310通過旋轉驅動單元320以設定角度的單位旋轉。旋轉部件331可以形成爲具有圓盤結構。可以是,旋轉驅動單元320配置於旋轉部件331的後方(或者,前方),旋轉軸310配置於旋轉驅動單元320和旋轉部件331之間。旋轉驅動單元320可以包括連接於旋轉軸310的旋轉電機。The
支撐部件332從旋轉部件331向與旋轉軸310的長度方向平行的水平方向(例:Y方向)延伸。支撐部件332沿著水平軸A的周圍隔著間隔配置爲彼此隔開而構成外周區域301。支撐部件332可以向旋轉部件331的前方(或者,後方)凸出。晶粒臺340分別提供於支撐部件332的前端部分。晶粒臺340分別具有晶粒支撐部分341。晶粒臺340配置在晶粒支撐部分341朝向水平軸A的內側和其相反的外側中的外側。The
根據這種旋轉晶粒臺的結構,可以提供這樣的旋轉晶粒臺,晶粒支撐部分341沿著外周區域301排列,具有由外周區域301圍繞的中空區域302,在晶粒臺340之間形成的空間是貫通部分303,晶粒支撐部分341和貫通部分303沿著外周區域301以設定角度的間隔配置。另外,通過中空區域302和貫通部分303,可以提供輕量、結構簡單、製造容易的旋轉晶粒臺。According to the structure of the rotating die stage, a rotating die stage can be provided, wherein the
旋轉晶粒臺構成爲晶粒臺340的晶粒支撐部分341分別以吸附方式支撐晶粒20。如圖11所示,晶粒支撐部分341形成爲分別對準晶粒20的容納槽的形狀。晶粒臺340以分別將晶粒20容納於容納槽的狀態支撐。作爲一例,容納槽可以形成爲與晶粒20對應的形狀而對準晶粒20的方向等。晶粒臺340在各個晶粒支撐部分341(即容納槽)的底部設置通過真空吸附晶粒20的一個以上吸附孔342。The rotating grain stage is constituted by a
參照圖3,從拾取位置P1移動到第一傳送位置P21的傳送頭131從拾取姿勢轉換爲傳送姿勢。傳送頭131可以在拾取姿勢時處於垂直狀態(傳送頭拾取的晶粒處於水平狀態)(參照圖2),可以在傳送姿勢時處於相對於垂直方向以預定的角度傾斜的狀態(例如,從拾取姿勢旋轉90度的水平狀態)(傳送頭拾取的晶粒處於垂直狀態)。晶粒臺340可以在第一傳送位置P21處從傳送頭131接收晶粒20的傳送(參照圖3),將接收的晶粒20通過設定角度單位的旋轉移動傳送到第二傳送位置P22,並在第二傳送位置P22處將傳送的晶粒20傳送到接合頭211(參照圖7)。3 , the
晶粒臺340在位於第一傳送位置P21時,晶粒支撐部分341與傳送姿勢的傳送頭131的吸附前端相對。此時,傳送頭131通過線性致動器134的工作接近吸附前端相對的晶粒支撐部分341,並將從拾取位置P1傳送的晶粒20放置於接近的晶粒支撐部分341。通過此,晶粒20以對準狀態容納於晶粒支撐部分341,下面(第二面)吸附於晶粒支撐部分341。When the
若晶粒臺340移動到外周區域301的頂點,則位於第二傳送位置P22。晶粒臺340在位於第二傳送位置P22時,晶粒支撐部分341與位於第二傳送位置P22的接合頭211的接合工具相對。此時,接合頭211通過接合頭垂直驅動模組212接近接合工具相對的晶粒支撐部分341,並拾取接近的晶粒支撐部分341從第一傳送位置P21傳送的晶粒20。此時,晶粒20的上面(第一面)吸附於接合工具。If the
晶粒視覺單元350包括第一相機模組351、第二相機模組352以及鏡模組353。晶粒視覺單元350爲了晶粒20的視覺檢查,獲得關於通過晶粒支撐部分341傳送到晶粒檢查位置P23的晶粒20的上面(第一面)的圖像,並獲得關於通過接合頭211從第二傳送位置P22拾取的晶粒20的下面(第二面)的圖像。The die
第一相機模組351和第二相機模組352提供於旋轉晶粒臺的周圍。第一以及第二相機模組351、352在旋轉晶粒臺的周圍配置爲朝向晶粒檢查位置P23,通過單獨的框架等固定位置。晶粒檢查位置P23位於旋轉晶粒臺的側方,從而第一以及第二相機模組351、352也向旋轉晶粒臺的側方設置。The
第一以及第二相機模組351、352配置在旋轉晶粒臺的側方的結構可以防止緩衝裝置300的上下尺寸增大,並且可以防止晶粒傳送路徑延長。若相機模組配置在旋轉晶粒臺的下方,則由於確保相機模組的工作距離(working distance,WD),緩衝裝置300的上下尺寸增大,將旋轉晶粒臺和拾取位置P1靠近地設置於晶圓臺110的上方可能受限。若緩衝裝置300的上下尺寸增大而旋轉晶粒臺從拾取位置P1在水平方向上遠離的現象、第一傳送位置P21和拾取位置P1間的高度差變大的現象等發生,則可以是,晶粒傳送路徑延長而晶粒傳送速度減慢。The structure in which the first and
鏡模組353配置於中空區域302,針對旋轉晶粒臺以水平軸A爲中心旋轉,位置通過單獨的框架等固定而保持靜止狀態。鏡模組353包括相對於第二傳送位置P22和晶粒檢查位置P23傾斜的鏡子,鏡子提供爲可以映照來自第二傳送位置P22側的像而向晶粒檢查位置P23側反射。The
第一相機模組351可以和通過晶粒支撐部分341傳送到晶粒檢查位置P23的晶粒20的上面相對。對此,傳送到晶粒檢查位置P23的晶粒20的上面可以直接暴露於第一相機模組351。因此,晶粒視覺單元350可以通過關於傳送到晶粒檢查位置P23的晶粒20的上面的像直接入射於第一相機模組351的第一拍攝路徑而拍攝、獲得關於晶粒20的上面的圖像。The
根據旋轉晶粒臺旋轉的角度,晶粒支撐部分341之間的貫通部分303可以位於第二傳送位置P22和晶粒檢查位置P23。在接合頭211從第二傳送位置P22拾取晶粒20的狀態下,若貫通部分303位於第二傳送位置P22和晶粒檢查位置P23,則關於通過接合頭211從第二傳送位置P22拾取的晶粒20的下面的像可以映射於鏡模組353的鏡子,映射於鏡子的像可以反射到第二相機模組352。對此,從第二傳送位置P22拾取的晶粒20的下面可以通過配置有鏡模組353的中空區域302以及與其連通的貫通部分303暴露於第二相機模組352。因此,晶粒視覺單元350可以通過關於從第二傳送位置P22拾取的晶粒20的下面的像通過鏡模組353的反射作用入射於第二相機模組352的第二拍攝路徑而拍攝、獲得關於晶粒20的下面的圖像。According to the angle of rotation of the rotating die stage, the through
爲了關於晶粒20的下面的拍攝圖像的質量提高,針對通過接合頭211拾取的晶粒20的下面,第二相機模組382利用鏡模組353拍攝的第二拍攝路徑(光軸)如圖8所示優選爲以直角折射。In order to improve the quality of the image taken on the bottom of the die 20 , the second shooting path (optical axis) taken by the second camera module 382 using the
用於第一相機模組351的第一拍攝路徑和用於第二相機模組352的第二拍攝路徑可以長度彼此不同。第一相機模組351可以保持爲設定爲可以針對傳送到晶粒檢查位置P23的晶粒20的上面獲得清晰的圖像的第一焦點的狀態。第二相機模組352可以保持爲設定爲可以針對通過接合頭211從第二傳送位置P22拾取的晶粒20的下面獲得清晰的圖像的第二焦點的狀態。The first shooting path for the
通過接合頭211拾取的晶粒20根據尺寸或相對於接合工具的吸附位置,下面的整體可以不映射於鏡模組353。由此,儘管沒有圖示,晶粒視覺單元350可以還包括使鏡模組353在作爲和通過接合頭211拾取的晶粒20平行的方向的水平方向(例:X方向以及Y方向)上精密地移動而調節相對於通過接合頭211拾取的晶粒20的鏡模組353的位置調節模組。根據這種鏡模組353用位置調節模組,可以容易地變更相對於通過接合頭211拾取的晶粒20的下面的鏡模組353的位置關係,從而將關於通過接合頭211拾取的晶粒20的下面的更準確的像提供於第二相機模組352。The entire bottom of the die 20 picked up by the
圖2表示晶粒頂出器120從位於拾取位置P1的晶粒20剝離切割帶11,並且傳送頭131拾取位於拾取位置P1的晶粒20的狀態。另外,圖2表示旋轉晶粒臺以設定角度旋轉而晶粒臺340中的任一個(參照第一晶粒臺340a)位於第一傳送位置P21的狀態。作爲一例,在晶粒臺340以及它們之間的貫通部分303各設置四個的情况下,若任一個晶粒臺(參照第一晶粒臺340a)位於第一傳送位置P21,則其餘三個晶粒臺中的任兩個分別位於晶粒檢查位置P23以及第二傳送位置P22。FIG2 shows a state where the
圖3表示傳送頭131爲了將拾取的晶粒20傳送於位於第一傳送位置P21的晶粒臺(參照第一晶粒臺340a)而從拾取位置P1移動到第一傳送位置P21的狀態。FIG. 3 shows a state in which the
圖4表示傳送頭131將拾取的晶粒20傳送於位於第一傳送位置P21的晶粒臺(參照第一晶粒臺340a)後返回到拾取位置P1的狀態。另外,圖4表示位於第一傳送位置P21的晶粒臺(參照第一晶粒臺340a)從傳送頭131接收晶粒20的傳送而以吸附方式支撐後旋轉晶粒臺以設定角度旋轉的狀態。作爲一例,在晶粒臺340以及它們之間的貫通部分303各設置四個的情况下,若位於第一傳送位置P21的晶粒臺340從傳送頭131接收晶粒20的傳送後旋轉晶粒臺以設定角度(45度)旋轉,則任三個貫通部分303分別位於第一傳送位置P21、晶粒檢查位置P23以及第二傳送位置P22。Fig. 4 shows a state where the
圖5表示旋轉晶粒臺在圖4的狀態下以設定角度旋轉,另一晶粒臺(參照第二晶粒臺340b)位於第一傳送位置P21,傳送頭131將晶粒20傳送於位於第一傳送位置P21的另一晶粒臺(參照第二晶粒臺340b)的狀態。FIG. 5 shows that the rotating die stage is rotated at a set angle in the state of FIG. 4 , another die stage (refer to the
圖6表示隨著旋轉晶粒臺以設定角度反復旋轉,從傳送頭131接收晶粒20的傳送的晶粒臺(參照第一晶粒臺340a)位於晶粒檢查位置P23,第一相機模組351拍攝傳送到晶粒檢查位置P23的晶粒20的上面的狀態。另外,圖6表示又另一晶粒臺(參照第三晶粒臺340c)位於第一傳送位置P21,傳送頭131將晶粒20傳送於位於第一傳送位置P21的又另一晶粒臺(參照第三晶粒臺340c)的狀態。FIG6 shows that as the rotating die stage repeatedly rotates at a set angle, the die stage (refer to the
圖7表示隨著旋轉晶粒臺以設定角度反復旋轉,位於晶粒檢查位置P23的晶粒臺(參照第一晶粒臺340a)移動,位於第二傳送位置P22,從而晶粒20從晶粒檢查位置P23傳送到第二傳送位置P22,由此支撐晶粒的另一晶粒臺(參照第二晶粒臺340b)位於晶粒檢查位置P23的狀態。另外,圖7表示接合頭211從第二傳送位置P22拾取晶粒的狀態。另外,圖7表示又另一晶粒臺(參照第四晶粒臺340d)位於第一傳送位置P21,傳送頭131將晶粒20傳送於位於第一傳送位置P21的又另一晶粒臺(參照第四晶粒臺340d)的狀態。FIG. 7 shows that as the rotating die stage repeatedly rotates at a set angle, the die stage (refer to the
圖8表示從位於第二傳送位置P22的晶粒臺(參照第一晶粒臺340a)拾取晶粒20的接合頭211上升,旋轉晶粒臺以設定角度旋轉的狀態。此時,通過接合頭211拾取的晶粒20的下面通過配置有鏡模組353的中空區域302以及與其連通的貫通部分303暴露於第二相機模組352。另外,圖8表示鏡模組353將關於晶粒20的下面的像反射到第二相機模組352,第二相機模組352通過此獲得關於晶粒20的下面的圖像的狀態。另外,圖8表示傳送頭131將拾取的晶粒20傳送到位於第一傳送位置P21的晶粒臺340後返回到拾取位置P1的狀態。FIG8 shows a state in which the
以上工作可以通過控制單元控制。緩衝裝置300可以在反復執行以上工作的同時,將來自晶粒供應裝置100的晶粒20傳送到晶粒接合裝置200,可以暫時地保管晶粒20,並可以獲得用於針對晶粒20的上面和下面執行視覺檢查的圖像。The above operations can be controlled by the control unit. The
如所觀察的那樣構成的根據本發明的第一實施例的晶粒接合機的晶粒臺340沿著以水平軸A爲中心的圓周方向以設定角度的單位旋轉而依次位於第一傳送位置P21、晶粒檢查位置P23以及第二傳送位置P22,因此可以不延遲地將晶粒20從晶粒供應裝置100傳送到晶粒接合裝置200,在此過程中暫時地保管晶粒20,因此可以保障提升的工作速度。另外,如所觀察的那樣構成的根據本發明的第一實施例的晶粒接合機利用作爲旋轉晶粒臺的內部空間的中空區域302,並獲得關於通過接合頭211拾取的晶粒20的下面的視覺檢查用圖像,因此可以簡單地抑制通過晶粒視覺單元350的緩衝裝置300的體積增大,並可以針對晶粒20的下面獲得良好的圖像。As observed, the
根據本發明的第二實施例的晶粒接合機的主要部繪示於圖12。如圖12所示,根據本發明第二實施例的晶粒接合機與本發明的第一實施例相比,區別在於晶粒視覺單元350構成爲可以沒有鏡模組(參照圖2的353)而拍攝晶粒20的下面等。The main part of the die bonding machine according to the second embodiment of the present invention is shown in FIG12. As shown in FIG12, the die bonding machine according to the second embodiment of the present invention is different from the first embodiment of the present invention in that the die
爲此,在根據本發明的第二實施例的晶粒接合機中,旋轉晶粒臺可以提供爲根據設定角度(例如,45度)沿著外周區域301以相同間隔配置的晶粒支撐部分341和貫通部分303具備爲偶數,貫通部分303每兩個構成一對而以水平軸(旋轉晶粒臺的旋轉中心)爲中心彼此相對。另外,第二傳送位置P22和晶粒檢查位置P23可以設置爲彼此相對。第一相機模組354和第二相機模組355可以在旋轉晶粒臺的周圍配置爲朝向晶粒檢查位置P23而根據每兩個構成一對的貫通部分303的位置也和第二傳送位置P22相對。For this purpose, in the die bonding machine according to the second embodiment of the present invention, the rotating die stage may be provided so that the
圖12的(a)表示第一相機模組354通過第一拍攝路徑直接拍攝傳送到晶粒檢查位置P23的晶粒20的上面的狀態、接合頭211拾取傳送到第二傳送位置P22的晶粒20的狀態等。FIG. 12( a ) shows a state where the
圖12的(b)表示從如圖12的(a)的狀態,從第二傳送位置P22拾取晶粒20的接合頭211上升,旋轉晶粒臺旋轉相當於設定角度,從而彼此相對且構成對的任兩個貫通部分303分別位於晶粒檢查位置P23和第二傳送位置P22,第二相機模組355拍攝通過接合頭211拾取的晶粒20的下面的狀態。此時,第二相機模組355通過經過分別位於晶粒檢查位置P23和第二傳送位置P22的貫通部分303以及和這兩個貫通部分303連通的中空區域302的第二拍攝路徑,沒有鏡模組(參照圖2的353)而拍攝晶粒20的下面。FIG. 12( b ) shows a state in which the
根據晶粒20的尺寸、相對於晶粒臺340及/或接合頭211的晶粒20的吸附位置、第一相機模組354及/或第二相機模組355的位置等,通過晶粒臺340傳送到晶粒檢查位置P23的晶粒20的上面也可以不整體地暴露於第一相機模組354,通過接合頭211拾取的晶粒20的下面可以不整體地暴露於第二相機模組355。由此,儘管沒有圖示,根據本發明的第二實施例的晶粒接合機的晶粒視覺單元350可以還包括位置調節模組,該位置調節模組通過使第一相機模組354和第二相機模組355在作爲和要拍攝的晶粒(傳送到晶粒檢查位置P23的晶粒、通過接合頭211拾取的晶粒)平行的方向的水平方向(例:X方向以及Y方向)上迅速且精確地移動,調節相對於要拍攝的晶粒20的第一相機模組354和第二相機模組355的位置。根據這樣的相機模組用位置調節模組,可以迅速且容易地變更相對於要拍攝的晶粒20的上面和下面的第一相機模組354和第二相機模組355的位置,從而將關於要拍攝的晶粒20的上面和下面的更準確的像提供於第一相機模組354和第二相機模組355。Depending on the size of the die 20, the adsorption position of the die 20 relative to the
圖12的(a)表示爲了將通過晶粒臺340傳送到晶粒檢查位置P23的晶粒20的上面通過第一相機模組354準確地拍攝,使第一相機模組354和第二相機模組355移動的狀態。圖12的(b)表示爲了將通過接合頭211拾取的晶粒20的下面通過第二相機模組355準確地拍攝,使第一相機模組354和第二相機模組355移動的狀態。FIG12(a) shows a state where the
根據本發明的第三實施例的晶粒接合機主要部繪示於圖13。如圖13所示,根據本發明第三實施例的晶粒接合機與本發明的第一實施例相比,區別僅在於晶粒視覺單元350構成爲可以利用單個相機模組356獲得晶粒20的關於上面的圖像和關於下面的圖像。The main part of the die bonding machine according to the third embodiment of the present invention is shown in FIG13. As shown in FIG13, the die bonding machine according to the third embodiment of the present invention is different from the first embodiment of the present invention only in that the die
可以是,在根據本發明的第三實施例的晶粒接合機中,相機模組356配置爲在旋轉晶粒臺周圍和傳送到晶粒檢查位置P23的晶粒20的上面正面相對,配置於中空區域302中的鏡模組357提供爲映射關於通過接合頭211拾取的晶粒20的下面的像並反射到相機模組356。當然,鏡模組357包括鏡子,針對旋轉晶粒臺旋轉,位置通過單獨的框架等固定而保持靜止狀態。It may be that in the die bonding machine according to the third embodiment of the present invention, the
相機模組356構成爲可以將焦點轉換爲可以針對傳送到晶粒檢查位置P23的晶粒20的上面獲得清晰的圖像的第一焦點或者可以針對通過接合頭211從第二傳送位置P22拾取的晶粒20的下面獲得清晰的圖像的第二焦點。The
圖13的(a)表示相機模組356將傳送到晶粒檢查位置P23的晶粒20的上面通過第一拍攝路徑以第一焦點直接拍攝的狀態、接合頭211拾取傳送到第二傳送位置P22的晶粒20的狀態等。FIG. 13( a ) shows a state where the
圖13的(b)表示從如圖13的(a)的狀態,從第二傳送位置P22拾取晶粒20的接合頭211上升,旋轉晶粒臺旋轉相當於設定角度,從而任兩個貫通部分303分別位於晶粒檢查位置P23和第二傳送位置P22,從第一焦點轉換爲第二焦點的相機模組356將通過接合頭211拾取的晶粒20的下面利用鏡模組357拍攝的狀態。此時,相機模組356通過經過分別位於晶粒檢查位置P23和第二傳送位置P22的貫通部分303以及和這兩個貫通部分303連通的中空區域302的第二拍攝路徑,拍攝晶粒20的下面。FIG. 13( b ) shows that the
這樣的根據本發明的第三實施例的晶粒接合機通過單個相機模組356拍攝晶粒20的上面和下面,因此可以通過更簡單化的結構執行針對晶粒20的視覺檢查。The die bonding machine according to the third embodiment of the present invention photographs the top and bottom of the die 20 using a
以上說明了本發明,但是本發明不由公開的實施例以及所附的附圖限定,可以在不脫離本發明的技術構想的範圍以內由通常的技術人員進行各種變更。另外,在本發明的實施例中說明的技術構想也可以各自獨立地實施,也可以兩個以上彼此組合實施。The present invention is described above, but the present invention is not limited by the disclosed embodiments and the attached drawings, and various changes can be made by ordinary technical personnel within the scope of the technical concept of the present invention. In addition, the technical concept described in the embodiments of the present invention can also be implemented independently, or two or more can be combined and implemented.
10:晶圓 11:切割帶 12:晶圓框架 20:晶粒 30:基板 40:晶盒 50:第一料盒 55:第二料盒 100:晶粒供應裝置 110:晶圓臺 111:臺基座 112:支撐環 113:晶圓擴展器 120:晶粒頂出器 130:晶粒傳送單元 131:傳送頭 132:擺動軸 133:擺動驅動模組 134:線性致動器 140:裝載埠 150:傳送單元 160:傳送導軌 200:晶粒接合裝置 210:接合單元 211:接合頭 212:接合頭垂直驅動模組 213:接合頭水平驅動模組 220:接合臺 230:基板傳送單元 231:夾持器 232:夾持器驅動模組 240:傳送導軌 300:緩衝裝置 301:外周區域 302:中空區域 303:貫通部分 310:旋轉軸 320:旋轉驅動單元 330:旋轉框架 331:旋轉部件 332:支撐部件 340:晶粒臺 340a:第一晶粒臺 340b:第二晶粒臺 340c:第三晶粒臺 340d:第四晶粒臺 341:支撐部分 342:吸附孔 350:晶粒視覺單元 351:第一相機模組 352:第二相機模組 353:鏡模組 356:相機模組 357:鏡模組 A:水平軸 P1:拾取位置 P21:第一傳送位置 P22:第二傳送位置 P23:晶粒檢查位置 P3:接合位置 10: Wafer 11: Cutting tape 12: Wafer frame 20: Die 30: Substrate 40: Crystal box 50: First material box 55: Second material box 100: Die supply device 110: Wafer table 111: Table base 112: Support ring 113: Wafer expander 120: Die ejector 130: Die transfer unit 131: Transfer head 132: Swing axis 133: Swing drive module 134: Linear actuator 140: Loading port 150: Transfer unit 160: Transfer rail 200: Die bonding device 210: Bonding unit 211: Bonding head 212: bonding head vertical drive module 213: bonding head horizontal drive module 220: bonding platform 230: substrate transfer unit 231: clamp 232: clamp drive module 240: transfer rail 300: buffer device 301: peripheral area 302: hollow area 303: through-portion 310: rotation axis 320: rotation drive unit 330: rotation frame 331: rotation component 332: support component 340: die stage 340a: first die stage 340b: second die stage 340c: third die stage 340d: Fourth die stage 341: Support part 342: Adsorption hole 350: Die visual unit 351: First camera module 352: Second camera module 353: Mirror module 356: Camera module 357: Mirror module A: Horizontal axis P1: Pickup position P21: First transfer position P22: Second transfer position P23: Die inspection position P3: Joining position
圖1是概念性地表示根據本發明的第一實施例的晶粒接合機的平面圖。 圖2至圖8是表示在根據本發明的第一實施例的晶粒接合機中向晶粒接合裝置供應晶粒的結構及其工作的簡要圖。 圖9以及圖10是分別表示根據本發明的第一實施例的晶粒接合機的旋轉晶粒臺的平面圖以及在B方向上看的局部截面圖。 圖11是表示圖9等所示的晶粒臺的立體圖。 圖12是表示根據本發明的第二實施例的晶粒接合機的一部分的簡要圖。 圖13是表示根據本發明的第三實施例的晶粒接合機的一部分的簡要圖。 FIG. 1 is a conceptual plan view of a die bonding machine according to the first embodiment of the present invention. FIG. 2 to FIG. 8 are schematic diagrams showing the structure of supplying a die to a die bonding device and its operation in the die bonding machine according to the first embodiment of the present invention. FIG. 9 and FIG. 10 are a plan view and a partial cross-sectional view of a rotating die stage of the die bonding machine according to the first embodiment of the present invention, respectively. FIG. 11 is a three-dimensional view of the die stage shown in FIG. 9 and the like. FIG. 12 is a schematic diagram showing a portion of a die bonding machine according to the second embodiment of the present invention. FIG. 13 is a schematic diagram showing a portion of a die bonding machine according to the third embodiment of the present invention.
10:晶圓 10: Wafer
11:切割帶 11: Cutting belt
12:晶圓框架 12: Wafer frame
20:晶粒 20: Grain
110:晶圓臺 110: Wafer table
111:臺基座 111: Table base
112:支撐環 112:Support ring
113:晶圓擴展器 113: Wafer expander
120:晶粒頂出器 120: Grain ejector
130:晶粒傳送單元 130: Chip transfer unit
131:傳送頭 131: Transmitter
132:擺動軸 132: Swing axis
133:擺動驅動模組 133: Swing drive module
134:線性致動器 134: Linear actuator
210:接合單元 210:Joining unit
211:接合頭 211:Joint head
212:接合頭垂直驅動模組 212:Joint head vertical drive module
213:接合頭水平驅動模組 213: Joint head horizontal drive module
302:中空區域 302: Hollow area
303:貫通部分 303: The through part
340:晶粒臺 340: Chip stage
340a:第一晶粒臺 340a: First chip stage
351:第一相機模組 351: First camera module
352:第二相機模組 352: Second camera module
353:鏡模組 353:Mirror module
P1:拾取位置 P1: Pickup position
P21:第一傳送位置 P21: First transmission position
P22:第二傳送位置 P22: Second transmission position
P23:晶粒檢查位置 P23: Grain inspection position
Claims (20)
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KR10-2022-0138707 | 2022-10-25 | ||
KR1020220138707A KR20240057908A (en) | 2022-10-25 | 2022-10-25 | Die bonder |
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Publication Number | Publication Date |
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TW202418410A true TW202418410A (en) | 2024-05-01 |
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TW112128166A TW202418410A (en) | 2022-10-25 | 2023-07-27 | Die bonder and buffer devices for die bonder |
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KR (1) | KR20240057908A (en) |
CN (1) | CN117936408A (en) |
TW (1) | TW202418410A (en) |
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KR20170042955A (en) | 2015-10-12 | 2017-04-20 | 세메스 주식회사 | Die bonding apparatus |
KR102037950B1 (en) | 2017-08-17 | 2019-10-29 | 세메스 주식회사 | Wafer supply module and die bonding apparatus including the same |
KR102391432B1 (en) | 2017-10-19 | 2022-04-27 | 세메스 주식회사 | Die transfer module and die bonding apparatus including the same |
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